JP2010163498A - Polyimide-based resin porous film or coating and method for producing the same - Google Patents

Polyimide-based resin porous film or coating and method for producing the same Download PDF

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JP2010163498A
JP2010163498A JP2009005169A JP2009005169A JP2010163498A JP 2010163498 A JP2010163498 A JP 2010163498A JP 2009005169 A JP2009005169 A JP 2009005169A JP 2009005169 A JP2009005169 A JP 2009005169A JP 2010163498 A JP2010163498 A JP 2010163498A
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coating
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polyimide
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Kiyoshi Shimizu
潔 清水
Shinichi Morisuna
進一 盛砂
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Daicel Corp
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Daicel Chemical Industries Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a polyimide-based resin porous film or coating which is thin but has a large number of pores, high porosity and a large water contact angle. <P>SOLUTION: A polymer solution includes an organic solvent mixture containing 30-99 wt.% of a cyclic ether (A) and 1-40 wt.% of a cyclic alcohol (B) which is a nonsolvent for a polyimide-based resin and has a boiling point higher than that of the cyclic ether (A), and 1-20 pts.wt. of a polyimide-based resin based on 100 pts.wt. of the organic solvent mixture. The polymer solution is cast into film or applied to a base material, then heated to remove an organic solvent to provide the polyimide-based resin porous film or coating. In the film or coating, porosity is 20-80%, an average pore size in the film or coating section is 0.1-10 μm, thickness is more than twice the average pore size and 1-100 μm, and water contact angle is 65°or larger. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、連続微小孔が多数形成され、且つ強度を備えた多孔性フィルム若しくは被膜、又は該被膜で被覆された被覆物、及びそれらの製造方法に関する。   The present invention relates to a porous film or coating having a large number of continuous micropores and having strength, or a coating coated with the coating, and a method for producing the same.

強度などの物理的、耐熱性などの化学的および比誘電率などの電気的に様々な優れた特性を有するポリイミド系樹脂は、これを多孔体に加工することで、その特性を生かした有用な素材として産業上の様々な用途に検討がなされてきた。   Polyimide resin with various excellent properties such as physical properties such as strength, chemical properties such as heat resistance and electrical properties such as relative dielectric constant, is useful by taking advantage of these properties by processing this into a porous body. It has been studied for various industrial uses as a material.

ポリイミド系樹脂多孔体の製法の一つとして、あらかじめ化学発泡剤を添加した樹脂組成物を成形することで多孔体を作成する技術(特開昭61−148244号公報)が開示されているが、特殊な発泡剤を用いて高温で熱溶融加工する必要があり、加工方法として微細な空孔を均質に持ち、かつ100μm以下の薄い多孔体を得るのに適した方法ではなかった。また、化学発泡剤の残渣が残留する問題もあった。あるいは、化学発泡剤によらず有機溶剤などを発泡剤として利用する方法として、あらかじめ成形加工したポリイミド系樹脂体に親和性のある有機溶剤を浸透含有させた後、加熱処理することで有機溶剤を発泡させて多孔体を得る手段(特開昭61−126146号公報)の開示があるが、あらかじめ押し出し成形などで加工された樹脂組成物に加熱加圧下で有機溶剤を強制的に含浸させるなど過酷な条件にさらす必要があり、溶剤の発泡も条件によっては不均質であったりクラックを生じるなど制約が大きかった。   As one method for producing a polyimide-based resin porous body, a technique for creating a porous body by molding a resin composition to which a chemical foaming agent has been added in advance (Japanese Patent Laid-Open No. 61-148244) has been disclosed. It was necessary to heat melt process at a high temperature using a special foaming agent, and it was not a method suitable for obtaining a thin porous body having fine pores uniformly and having a thickness of 100 μm or less as a processing method. There is also a problem that a residue of the chemical foaming agent remains. Alternatively, as a method of using an organic solvent or the like as a foaming agent regardless of a chemical foaming agent, an organic solvent having an affinity for a polyimide resin body that has been molded and processed in advance is impregnated and then heat-treated to remove the organic solvent. Although there is a disclosure of means for obtaining a porous body by foaming (Japanese Patent Laid-Open No. Sho 61-126146), it is severe such as forcibly impregnating an organic solvent under heat and pressure in a resin composition processed in advance by extrusion molding or the like. It was necessary to expose to various conditions, and the foaming of the solvent was severely restricted depending on the conditions, such as heterogeneity and cracks.

一方、ポリイミド系樹脂を非プロトン性良溶剤などに溶解したポリマー溶液を、該非プロトン性良溶剤と相溶性を有する水などの非溶剤と接触させることにより乾湿式紡糸と通常称される方法で多孔質膜化する技術(特開平11−537号公報)、ポリマー溶液に温度変化を与えることで多孔化する熱誘起相分離法を用いた技術(特開平6−166116号公報)などポリマー溶液の相分離現象を用いる方法も行われている。さらに、この方法によればポリマー溶液の相分離方法を工夫することで、多孔構造を有するとともに表面の濡れ性に優れたポリイミド系樹脂多孔性フィルムを提供することもできる(特開2007−126638号公報)。しかし、いずれも最終的に水で溶剤や添加物を抽出、洗浄することから、抽出・洗浄による排水が大量に発生するほか、得られたポリイミド系樹脂多孔体から水を蒸発乾燥しなければならないなど問題があった。また、得られる多孔体もしくは多孔膜の空孔が水で満たされている湿潤状態であるため、乾燥したポリイミド系樹脂多孔体を得るためには水を蒸発乾燥しなければならないなど問題があった。   On the other hand, a polymer solution obtained by dissolving a polyimide resin in an aprotic good solvent or the like is contacted with a non-solvent such as water having compatibility with the aprotic good solvent to obtain a porous material by a method commonly called dry-wet spinning. Phases of polymer solution, such as a technology for forming a film (Japanese Patent Laid-Open No. 11-537) and a technology using a heat-induced phase separation method that makes a polymer solution porous by giving a temperature change (Japanese Patent Laid-Open No. 6-166116) A method using a separation phenomenon is also performed. Furthermore, according to this method, a polyimide resin porous film having a porous structure and excellent surface wettability can be provided by devising a phase separation method of a polymer solution (Japanese Patent Laid-Open No. 2007-126638). Publication). However, in both cases, the solvent and additives are finally extracted and washed with water, so that a large amount of waste water is generated by extraction and washing, and water must be evaporated and dried from the obtained porous polyimide resin. There was a problem. Moreover, since the pores of the obtained porous body or porous membrane are in a wet state filled with water, there is a problem that water must be evaporated and dried to obtain a dried polyimide resin porous body. .

この様なポリマーの非溶剤(水など)による溶剤の抽出を伴わない多孔体の形成方法として、ポリマーの溶剤を加熱、蒸発させる方法(乾式相分離法)がある。しかし、ポリイミド系樹脂の場合、低沸点の塩素系溶剤(環境問題などから取り扱いに規制が多く使い難い)に溶解したポリマー溶液から溶剤を蒸発させつつ、空気中の水分を吸湿することで表面粗化による白化させる技術(特開昭60−139413号公報)が開示されている程度で、十分な大きさの空孔を有し空孔率が高い多孔体を得られていない。これには、溶剤の蒸発のみによる相分離現象を生じるポリマー溶液が、安定で均質な状態で得られないことが原因と思われる。ポリマーの良溶剤に溶解した均質なポリマー溶液を流延、成形後に加熱して溶剤を除去することで、無機フィラーを含有するボイドなどを含まない均質なポリイミド系樹脂フィルムを得る技術(特開2006−213805号公報)や、環状ジエーテル類を含む特定組成の有機溶剤を用いることで安定で均質なポリマー溶液を得ることができ、そのポリマー溶液を流延、成形後に加熱して溶剤を除去することで、ポリイミド系樹脂フィルムを得る技術(特開2006−291179号公報)などが開示されているが、十分な大きさの空孔を有し空孔率が高いポリイミド系樹脂多孔体を得るまでに至っていなかった。   As a method for forming a porous body without extraction of a solvent with a non-solvent (such as water) of such a polymer, there is a method of heating and evaporating a polymer solvent (dry phase separation method). However, in the case of polyimide resin, surface roughness is obtained by absorbing moisture in the air while evaporating the solvent from a polymer solution dissolved in a low-boiling chlorine solvent (which is difficult to use due to environmental problems). A porous body having sufficiently large pores and a high porosity has not been obtained to the extent that a technology for whitening by forming is disclosed (JP-A-60-139413). This is presumably because a polymer solution that causes a phase separation phenomenon only due to evaporation of the solvent cannot be obtained in a stable and homogeneous state. A technology for obtaining a homogeneous polyimide resin film that does not contain voids containing inorganic fillers by casting a homogeneous polymer solution dissolved in a good polymer solvent and removing the solvent by heating after molding -213805) and an organic solvent having a specific composition containing cyclic diethers can be used to obtain a stable and homogeneous polymer solution, which is cast and heated after molding to remove the solvent. However, a technique for obtaining a polyimide resin film (Japanese Patent Laid-Open No. 2006-291179) is disclosed, but until a polyimide resin porous body having sufficiently large pores and a high porosity is obtained. It was not reached.

特開昭61−148244号公報JP 61-148244 A 特開昭61−126146号公報JP 61-126146 A 特開平11−537号公報Japanese Patent Laid-Open No. 11-537 特開平6−166116号公報JP-A-6-166116 特開2007−126638号公報JP 2007-126638 A 特開昭60−139413号公報JP-A-60-139413 特開2006−213805号公報JP 2006-213805 A 特開2006−291179号公報JP 2006-291179 A

本発明の目的は、厚みが薄く、薄くても多数の空孔を有し、空孔率が高く、水に対する接触角の大きいポリイミド系樹脂多孔フィルム又は被膜を提供することにある。   An object of the present invention is to provide a polyimide-based resin porous film or coating film that is thin and has a large number of pores even when it is thin, has a high porosity, and has a large contact angle with water.

本発明の他の目的は、厚みが薄く、薄くても多数の空孔を有し、空孔率の高いポリイミド系樹脂多孔フィルム又は被膜を簡易に且つ効率よく製造する方法を提供することにある。   Another object of the present invention is to provide a method for easily and efficiently producing a polyimide-based resin porous film or coating having a small thickness and a large number of pores even when the thickness is small, and a high porosity. .

本発明のさらに他の目的は、厚みが薄く、薄くても多数の空孔を有し、空孔率が高く、水に対する接触角の大きいポリイミド系樹脂多孔被膜で被覆された被覆物の製造方法及び該方法で得られる被覆物を提供することにある。   Still another object of the present invention is a method for producing a coating coated with a polyimide-based resin porous coating that is thin, has a large number of pores even if it is thin, has a high porosity, and has a large contact angle with water. And providing a coating obtained by the method.

本発明者らは、上記目的を達成するため鋭意検討した結果、環状エーテル(A)と、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)と、ポリイミド系樹脂とを特定の割合で含むポリマー溶液をフィルム状に流延するか又は基材に塗布した後、加熱により有機溶媒を除去すると、厚みが薄く且つ空孔率の高いポリイミド系樹脂フィルムが効率よく得られることを見出し、本発明を完成した。   As a result of intensive studies to achieve the above object, the present inventors have found that the cyclic ether (A), the cyclic alcohol (B) which is a non-solvent for the polyimide resin and has a higher boiling point than the cyclic ether (A), and the polyimide After casting a polymer solution containing a specific resin in a specific ratio into a film or applying it to a substrate, the organic solvent is removed by heating, resulting in an efficient polyimide resin film with a thin thickness and high porosity The present invention has been completed by finding that it can be obtained well.

すなわち、本発明は、環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量部のポリイミド系樹脂を含むポリマー溶液をフィルム状に流延するか又は基材に塗布した後、有機溶剤を乾燥除去して得られる、空孔率が20〜80%、フィルム又は被膜断面の孔の平均孔径が0.1〜10μm、厚みが前記平均孔径の2倍以上で且つ1〜100μm、水に対する接触角が65°以上であるポリイミド系樹脂多孔フィルム又は被膜を提供する。   That is, the present invention is an organic containing 30 to 99% by weight of cyclic ether (A), 1 to 40% by weight of cyclic alcohol (B) which is a non-solvent of polyimide resin and has a boiling point higher than that of cyclic ether (A). A solvent solution and a polymer solution containing 1 to 20 parts by weight of a polyimide resin with respect to 100 parts by weight of the organic solvent mixture are cast into a film or applied to a substrate, and then the organic solvent is removed by drying. The porosity is 20 to 80%, the average pore diameter of the film or coating cross section is 0.1 to 10 μm, the thickness is twice or more the average pore diameter and 1 to 100 μm, and the contact angle with water is Provided is a polyimide-based resin porous film or coating film having an angle of 65 ° or more.

前記ポリイミド系樹脂多孔フィルム又は被膜において、有機溶剤混合液は、環状エーテル(A)、環状アルコール(B)に加えて、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点が高く環状アルコール(B)より沸点の低い有機溶剤であって、環状エーテル、環状ケトン及び環状アルカンからなる群より選択された少なくとも1種の有機溶剤(C)を1〜40重量%含有する混合液であってもよい。   In the polyimide resin porous film or coating, the organic solvent mixed solution is a non-solvent of the polyimide resin in addition to the cyclic ether (A) and the cyclic alcohol (B) and has a higher boiling point than the cyclic ether (A) and is cyclic. An organic solvent having a boiling point lower than that of alcohol (B) and containing 1 to 40% by weight of at least one organic solvent (C) selected from the group consisting of cyclic ethers, cyclic ketones and cyclic alkanes. May be.

環状エーテル(A)の沸点が110℃未満であり、環状アルコール(B)の沸点が110℃以上であってもよい。   The boiling point of the cyclic ether (A) may be less than 110 ° C, and the boiling point of the cyclic alcohol (B) may be 110 ° C or more.

有機溶剤混合液が実質的にハロゲン原子含有溶剤を含まないのが好ましい。   It is preferable that the organic solvent mixture does not substantially contain a halogen atom-containing solvent.

ポリマー溶液の粘度は5〜10000mPa・sの範囲であるのが好ましい。   The viscosity of the polymer solution is preferably in the range of 5 to 10,000 mPa · s.

本発明は、また、環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量部のポリイミド系樹脂を含むポリマー溶液を基材に塗布した後、有機溶剤を乾燥除去して得られる、空孔率が20〜80%、被膜断面の孔の平均孔径が0.1〜10μm、厚みが前記平均孔径の2倍以上で且つ1〜100μm、水に対する接触角が65°以上であるポリイミド系樹脂多孔フィルム被膜で被覆された被覆物を提供する。   The present invention also includes 30 to 99% by weight of cyclic ether (A), 1 to 40% by weight of cyclic alcohol (B) which is a non-solvent of polyimide resin and has a boiling point higher than that of cyclic ether (A). Porosity obtained by applying a solvent mixture and a polymer solution containing 1 to 20 parts by weight of a polyimide-based resin to 100 parts by weight of the organic solvent mixture and drying and removing the organic solvent. Is a polyimide-based resin porous film having an average pore diameter of 0.1 to 10 μm, a thickness of 1 to 100 μm and a contact angle with water of 65 ° or more. A coating coated with a coating is provided.

本発明は、さらに、環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量%のポリイミド系樹脂を含むポリマー溶液をフィルム状に流延するか又は基材に塗布した後、有機溶剤を乾燥除去することを特徴とするポリイミド系樹脂多孔フィルム又は被膜の製造方法を提供する。   The present invention further includes 30 to 99% by weight of cyclic ether (A), 1 to 40% by weight of cyclic alcohol (B) which is a non-solvent of polyimide resin and has a boiling point higher than that of cyclic ether (A). A solvent solution and a polymer solution containing 1 to 20% by weight of a polyimide resin with respect to 100 parts by weight of the organic solvent solution are cast into a film or applied to a substrate, and then the organic solvent is removed by drying. Provided is a method for producing a polyimide-based resin porous film or film.

前記ポリイミド系樹脂多孔フィルムの製造方法において、液温度−30℃〜50℃のポリマー溶液を流延又は塗布した後、(流延又は塗布時液温−20℃)〜(流延又は塗布時液温+50℃)の範囲の温度で1秒以上保持し、次いでポリイミド系樹脂のガラス転移点以下の温度で加熱して有機溶剤を除去してもよい。   In the method for producing the polyimide resin porous film, after casting or coating a polymer solution having a liquid temperature of −30 ° C. to 50 ° C., (liquid temperature at casting or coating −20 ° C.) to (liquid at casting or coating) The organic solvent may be removed by holding at a temperature in the range of (temperature + 50 ° C.) for 1 second or longer and then heating at a temperature not higher than the glass transition point of the polyimide resin.

本発明は、さらにまた、環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量%のポリイミド系樹脂を含むポリマー溶液を基材に塗布した後、有機溶剤を乾燥除去することを特徴とするポリイミド系樹脂多孔被膜で被覆された被覆物の製造方法を提供する。   The present invention further contains 30 to 99% by weight of cyclic ether (A) and 1 to 40% by weight of cyclic alcohol (B) which is a non-solvent for polyimide resin and has a boiling point higher than that of cyclic ether (A). A polyimide characterized in that an organic solvent mixed solution and a polymer solution containing 1 to 20% by weight of a polyimide resin with respect to 100 parts by weight of the organic solvent mixed solution are applied to a substrate, and then the organic solvent is dried and removed. A method for producing a coating coated with a porous resin porous coating is provided.

前記ポリイミド系樹脂多孔被膜で被覆された被覆物の製造方法において、液温度−30℃〜50℃のポリマー溶液を基材に塗布した後、(塗布時液温−20℃)〜(塗布時液温+50℃)の範囲の温度で1秒以上保持し、次いでポリイミド系樹脂のガラス転移点以下の温度で加熱して有機溶剤を除去してもよい。   In the manufacturing method of the coating material coat | covered with the said polyimide resin porous film, after apply | coating the polymer solution of liquid temperature-30 degreeC-50 degreeC to a base material, (liquid temperature at the time of application | coating -20 degreeC)-(liquid at the time of application | coating) The organic solvent may be removed by holding at a temperature in the range of (temperature + 50 ° C.) for 1 second or longer and then heating at a temperature not higher than the glass transition point of the polyimide resin.

本発明によれば、厚みが薄く、薄くても多数の空孔を有し、空孔率が高く、水に対する接触角の大きいポリイミド系樹脂多孔フィルムが提供される。   ADVANTAGE OF THE INVENTION According to this invention, even if it is thin, even if it is thin, it has many void | holes, the porosity is high, and the polyimide resin porous film with a large contact angle with respect to water is provided.

本発明のポリイミド系樹脂多孔フィルムの製造法によれば、乾式相分離法において特定の有機溶剤を組み合わせて用いるため、厚みが薄く、薄くても多数の空孔を有し、空孔率の高いポリイミド系樹脂多孔フィルムを簡易に且つ効率よく製造することができる。また、水に対する接触角の大きいポリイミド系樹脂多孔フィルムを簡易に且つ効率よく製造できる。さらに、本発明の製造法によれば、従来の乾式相分離法のように有害性の高い塩素系溶剤を使用する必要がなく、しかも低揮発性溶剤や水溶性ポリマーや塩化リチウム等の添加剤抽出工程を設ける必要がないので、簡易な設備で製造可能である点で優れている。なお、従来の湿式/乾湿式法では、水溶性ポリマーや塩化リチウム等の開口助剤となる添加剤成分を加えて多孔化させているが、本発明の方法では、添加剤成分を任意量添加することで濡れ性を撥水性から親水性までコントロールすることも可能である。従来の湿式/乾湿式法では、凝固槽中にて、加えられた水溶性ポリマーや塩化リチウム等の開口助剤の抽出度合いで濡れ性をコントロールしるため、濃度管理を適切に行うことは困難であったが、本発明では添加量を調整することで濡れ性を容易にコントロールできる。   According to the method for producing a polyimide-based resin porous film of the present invention, since a specific organic solvent is used in combination in the dry phase separation method, the thickness is thin, even if it is thin, it has a large number of pores and has a high porosity. A polyimide resin porous film can be produced easily and efficiently. In addition, a polyimide resin porous film having a large contact angle with water can be produced easily and efficiently. Furthermore, according to the production method of the present invention, it is not necessary to use a highly toxic chlorine-based solvent as in the conventional dry phase separation method, and an additive such as a low-volatile solvent, a water-soluble polymer, or lithium chloride is used. Since it is not necessary to provide an extraction process, it is excellent in that it can be manufactured with simple equipment. In addition, in the conventional wet / dry wet method, an additive component serving as an opening aid such as a water-soluble polymer or lithium chloride is added to make it porous, but in the method of the present invention, an arbitrary amount of additive component is added. By doing so, it is possible to control wettability from water repellency to hydrophilicity. In conventional wet / dry wet methods, it is difficult to control the concentration properly in the coagulation tank because the wettability is controlled by the degree of extraction of the added water-soluble polymer and opening aid such as lithium chloride. However, in the present invention, the wettability can be easily controlled by adjusting the addition amount.

また、従来の湿式法においては、多孔体(多孔フィルム又は被膜)形成のためのドープを水などの凝固槽に導き、良溶媒と水などの貧溶媒との置換が行われるため、多孔体はドープの塗布厚み〜ドープ塗布厚みの1/3程度になる。薄い多孔体を作成するためには、ドープの塗布厚みを薄くする必要があるが、50μm以下の薄い多孔体を作成するためには塗布部の機械精度を上げる必要があり、高価な装置が必要となる。これに対し、本発明の製造法は、乾燥後、溶媒が揮発することが特徴であり、溶剤置換は行われないため、多孔体はドープ塗布厚みの1/3〜1/10になる。このため、50μm以下の薄い多孔体を作成する場合においても、ドープの塗布厚みは厚く、機械精度の高い特殊な装置は不要であることから、薄い多孔フィルム又は被膜の作製に有利である。   In the conventional wet method, the dope for forming the porous body (porous film or coating) is guided to a coagulation tank such as water, and the good solvent is replaced with a poor solvent such as water. It becomes about 1/3 of the dope coating thickness to the dope coating thickness. In order to create a thin porous body, it is necessary to reduce the coating thickness of the dope, but in order to create a thin porous body of 50 μm or less, it is necessary to increase the mechanical accuracy of the coating part and an expensive apparatus is required. It becomes. On the other hand, the production method of the present invention is characterized in that the solvent volatilizes after drying, and solvent substitution is not performed, so that the porous body becomes 1/3 to 1/10 of the dope coating thickness. For this reason, even when a thin porous body having a thickness of 50 μm or less is prepared, the dope is thickly applied, and a special apparatus with high mechanical accuracy is not required, which is advantageous for producing a thin porous film or coating.

本発明のポリイミド系樹脂多孔フィルム又は被膜は、優れた耐熱性を有する上、断熱性、低誘電特性、吸音性、印刷性、物質の充填性などに優れているため、断熱材、吸液シート、低誘電率絶縁層、気体/液体などの分離膜などに使用可能である。具体的用途例として、電線の被覆や積層回路の被覆材が挙げられる。また、本発明のポリイミド系樹脂多孔フィルム又は被膜は空隙率が高いため誘電率が低く、接触角も高いため、液が浸透しにくい。したがって、本発明のポリイミド系樹脂多孔フィルム又は被膜は、印刷基材及びインクの受像層としても好適で、本発明の多孔フィルム又は被膜に印刷する細い線描写に優れ、導体インクを用いると印刷配線用基材などとしても有用である。湿式/乾湿式法における多孔質体では、空隙率が高く誘電率が低いものはあるが、接触角が低く、液が浸透しやすいため、液の接触により回路間でショートを起こしやすい。   The polyimide-based resin porous film or coating of the present invention has excellent heat resistance, heat insulation, low dielectric properties, sound absorption, printability, substance filling property, etc. It can be used for low dielectric constant insulating layers, gas / liquid separation membranes, and the like. Specific examples of applications include wire coating and laminated circuit coating. Moreover, since the polyimide resin porous film or coating of the present invention has a high porosity, the dielectric constant is low and the contact angle is also high, so that the liquid is difficult to penetrate. Therefore, the polyimide resin porous film or coating of the present invention is also suitable as a printing substrate and an image receiving layer for ink, and is excellent in fine line drawing printed on the porous film or coating of the present invention. It is also useful as a base material for use. Some porous bodies in the wet / dry wet process have a high porosity and a low dielectric constant. However, since the contact angle is low and the liquid easily permeates, a short circuit is likely to occur between the circuits due to the liquid contact.

実施例1で得られた多孔フィルムの断面の電子顕微鏡写真(SEM)である。2 is an electron micrograph (SEM) of a cross section of the porous film obtained in Example 1. FIG. 実施例4で得られた多孔フィルムの断面の電子顕微鏡写真(SEM)である。4 is an electron micrograph (SEM) of a cross section of the porous film obtained in Example 4.

本発明のポリイミド系樹脂多孔フィルム又は被膜は、環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量部のポリイミド系樹脂を含むポリマー溶液をフィルム状に流延するか又は基材に塗布した後、加熱により有機溶剤を除去して得られる、空孔率が20〜80%、フィルム又は被膜断面の孔の平均孔径が0.1〜10μm、厚みが前記平均孔径の2倍以上で且つ1〜100μm、水に対する接触角が65°以上のポリイミド系樹脂多孔フィルム又は被膜である。   The polyimide-based resin porous film or coating of the present invention has a cyclic ether (A) of 30 to 99% by weight, a non-solvent of the polyimide-based resin and a cyclic alcohol (B) having a boiling point higher than that of the cyclic ether (A). After casting an organic solvent mixed solution containing 40% by weight and a polymer solution containing 1 to 20 parts by weight of a polyimide-based resin with respect to 100 parts by weight of the organic solvent mixed solution, or after applying to a substrate The porosity obtained by removing the organic solvent by heating is 20 to 80%, the average pore diameter of the hole in the cross section of the film or film is 0.1 to 10 μm, the thickness is at least twice the average pore diameter, and 1 to It is a polyimide resin porous film or film having a contact angle of 100 μm and water of 65 ° or more.

環状エーテル(A)としては、例えば、テトラヒドロフラン、1,2−ジオキソラン、1,3−ジオキソラン、1,2−ジオキソール、1,3−ジオキソール等の5員環状エーテル;1,3−ジオキサン、1,4−ジオキサン、1,4−ジオキセン、1,4−ジオキシン等の6員環状エーテルなどの5〜10員環状エーテルなどが挙げられる。環状エーテル(A)は環状モノエーテル、環状ジエーテル等の何れであってもよいが、環状ジエーテルがより好ましい。環状エーテル(A)はポリイミド系樹脂の良溶媒として機能する。環状エーテル(A)としては、当該ポリアミド系樹脂の溶解度が5g/100g以上である溶剤が好ましい。   Examples of the cyclic ether (A) include 5-membered cyclic ethers such as tetrahydrofuran, 1,2-dioxolane, 1,3-dioxolane, 1,2-dioxole, 1,3-dioxole; 1,3-dioxane, 1, Examples include 5- to 10-membered cyclic ethers such as 4-dioxane, 1,4-dioxene, and 6-membered cyclic ethers such as 1,4-dioxin. The cyclic ether (A) may be any of cyclic monoether, cyclic diether, etc., but cyclic diether is more preferable. The cyclic ether (A) functions as a good solvent for the polyimide resin. As cyclic ether (A), the solvent whose solubility of the said polyamide-type resin is 5 g / 100g or more is preferable.

これらの環状エーテルは置換基を有していてもよい。置換基としては、例えば、ヒドロキシル基、ヒドロキシアルキル基(メチロール基などのヒドロキシC1-6アルキル基など)、アルキル基(メチル、エチル、プロピル、ブチルなどのC1-6アルキル基など)、アルコキシ基(メトキシ、エトキシ、ブトキシなどのC1-6アルコキシ基など)、アルコキシアルキル基(メトキシメチル、エトキシメチルなどのC1-6アルキルC1-6アルコキシ基など)、アシルオキシアルキル基(アセチルオキシメチル基などのC2-4アシルオキシC1-6アルキル基など)などが挙げられる。 These cyclic ethers may have a substituent. Examples of the substituent include a hydroxyl group, a hydroxyalkyl group (such as a hydroxy C 1-6 alkyl group such as a methylol group), an alkyl group (such as a C 1-6 alkyl group such as methyl, ethyl, propyl, butyl, etc.), alkoxy Groups (such as C 1-6 alkoxy groups such as methoxy, ethoxy and butoxy), alkoxyalkyl groups (such as C 1-6 alkyl C 1-6 alkoxy groups such as methoxymethyl and ethoxymethyl), acyloxyalkyl groups (acetyloxymethyl) C 2-4 acyloxy C 1-6 alkyl group such as a group) and the like.

環状エーテル(A)は、これらの置換基を複数有していてもよく、さらに、同一炭素上に2個の置換基を有していてもよい。特に、1,3−ジオキソランについては、多数の誘導体(置換体)が知られている。なお、環状エーテル(A)は、環境汚染性や腐食性の点から、ハロゲン原子を含有しないのが好ましい。   The cyclic ether (A) may have a plurality of these substituents, and may further have two substituents on the same carbon. In particular, for 1,3-dioxolane, many derivatives (substitutes) are known. In addition, it is preferable that cyclic ether (A) does not contain a halogen atom from an environmental pollution property or a corrosive point.

これらの環状エーテルは、一種単独で又は二種以上を組み合わせて使用できる。これらの環状エーテルのうち、5〜8員環状エーテル、特に5員環状エーテル(1,3−ジオキソラン又はその誘導体などの5員環状ジエーテル)が好ましい。   These cyclic ethers can be used singly or in combination of two or more. Of these cyclic ethers, 5- to 8-membered cyclic ethers, particularly 5-membered cyclic ethers (5-membered cyclic diethers such as 1,3-dioxolane or derivatives thereof) are preferable.

環状エーテル(A)としては、沸点(常圧)が110℃未満であることが好ましい。環状エーテル(A)の沸点は、より好ましくは100℃未満、特に好ましくは80℃未満である。環状エーテル(A)の沸点が110℃を超える場合には、環状アルコール(B)の沸点が更に高くなり、環状エーテル(A)、環状アルコール(B)を共に乾燥させる温度も高くなる。例えば240℃程度の温度では、ポリイミド系樹脂が熱溶融し、多孔化しなくなることが多い。なお、環状エーテル(A)の沸点が30℃未満であると、揮発性が高く混合溶剤の組成変動が起こりやすいため、多孔体の形成が困難になりやすい。   The cyclic ether (A) preferably has a boiling point (normal pressure) of less than 110 ° C. The boiling point of the cyclic ether (A) is more preferably less than 100 ° C, particularly preferably less than 80 ° C. When the boiling point of the cyclic ether (A) exceeds 110 ° C., the boiling point of the cyclic alcohol (B) is further increased, and the temperature for drying the cyclic ether (A) and the cyclic alcohol (B) is also increased. For example, at a temperature of about 240 ° C., the polyimide resin often melts and does not become porous. When the boiling point of the cyclic ether (A) is less than 30 ° C., the volatility is high and the composition of the mixed solvent is likely to change, so that it is difficult to form a porous body.

環状アルコール(B)としては、ポリイミド系樹脂の非溶剤であり且つ前記環状エーテル(A)より沸点の高い環状アルコール(脂環に直接ヒドロキシル基が結合しているアルコール)であれば特に限定されない。環状アルコールは置換基を有していてもよく、該置換基としては、前記環状エーテル(A)において例示した置換基などが挙げられる。環状アルコール(B)は、環境汚染性や腐食性の点から、ハロゲン原子を含有しないのが好ましい。なお、ポリアミド系樹脂の非溶剤とは、当該ポリアミド系樹脂の溶解度が1g/100g以下の溶媒をいう。   The cyclic alcohol (B) is not particularly limited as long as it is a non-solvent for a polyimide resin and has a boiling point higher than that of the cyclic ether (A) (an alcohol in which a hydroxyl group is directly bonded to an alicyclic ring). The cyclic alcohol may have a substituent, and examples of the substituent include the substituents exemplified in the cyclic ether (A). The cyclic alcohol (B) preferably does not contain a halogen atom from the viewpoint of environmental pollution and corrosivity. In addition, the non-solvent of a polyamide-type resin means the solvent whose solubility of the said polyamide-type resin is 1 g / 100g or less.

環状アルコール(B)としては、例えば、シクロペンタノール、メチルシクロペンタノール、シクロへキサノール、メチルシクロヘキサノール、ジメチルシクロヘキサノール、シクロヘキサンジオール、シクロヘプタノール等の5〜10員環状アルコールなどが挙げられる。   Examples of the cyclic alcohol (B) include 5- to 10-membered cyclic alcohols such as cyclopentanol, methylcyclopentanol, cyclohexanol, methylcyclohexanol, dimethylcyclohexanol, cyclohexanediol, and cycloheptanol.

環状アルコール(B)としては、沸点(常圧)が110℃以上であることが好ましい。環状アルコール(B)の沸点は、より好ましくは120℃以上、さらに好ましくは130℃以上、特に好ましくは150℃以上である。環状アルコール(B)の沸点が低いと、多孔体の形成が困難になりやすい。環状アルコール(B)沸点はポリイミド系樹脂のガラス転移点より低いことが好ましい。ポリイミド系樹脂のガラス転移点より高いと樹脂が溶融し、多孔化が困難になりやすい。   The cyclic alcohol (B) preferably has a boiling point (normal pressure) of 110 ° C. or higher. The boiling point of the cyclic alcohol (B) is more preferably 120 ° C. or higher, further preferably 130 ° C. or higher, and particularly preferably 150 ° C. or higher. When the boiling point of the cyclic alcohol (B) is low, it is difficult to form a porous body. The boiling point of the cyclic alcohol (B) is preferably lower than the glass transition point of the polyimide resin. If it is higher than the glass transition point of the polyimide-based resin, the resin is melted and it is difficult to make it porous.

本発明において、前記有機溶剤混合液は、環状エーテル(A)及び環状アルコール(B)に加えて、他の有機溶剤を含んでいてもよい。他の有機溶剤として、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点が高く環状アルコール(B)より沸点の低い有機溶剤であって、環状エーテル、環状ケトン及び環状アルカンからなる群より選択された少なくとも1種の有機溶剤(C)が挙げられる。   In the present invention, the organic solvent mixed solution may contain another organic solvent in addition to the cyclic ether (A) and the cyclic alcohol (B). Another organic solvent is a polyimide-based resin non-solvent, an organic solvent having a boiling point higher than that of the cyclic ether (A) and lower than that of the cyclic alcohol (B), and the group consisting of a cyclic ether, a cyclic ketone, and a cyclic alkane The at least 1 sort (s) of organic solvent (C) selected more is mentioned.

有機溶剤(C)としては、単独ではポリイミド系樹脂を溶解しないが、混合溶剤中にて、ポリイミド系樹脂を析出、ゲル化させないものであればよい。有機溶剤(C)の沸点は好ましくは110℃未満、より好ましくは100℃未満、特に好ましくは80℃未満である。有機溶剤(C)の沸点が高いと乾燥後に残留して多孔体の形成が損なわれることがある。また、有機溶剤(C)の沸点が30℃未満の場合には、揮発性が高く混合溶剤の組成変動が起こりやすいため、多孔体の形成が困難になりやすい。   As the organic solvent (C), any polyimide resin can be used as long as it does not dissolve the polyimide resin alone but does not precipitate and gel the polyimide resin in the mixed solvent. The boiling point of the organic solvent (C) is preferably less than 110 ° C, more preferably less than 100 ° C, and particularly preferably less than 80 ° C. If the boiling point of the organic solvent (C) is high, it may remain after drying and the formation of the porous body may be impaired. In addition, when the boiling point of the organic solvent (C) is less than 30 ° C., the volatility is high and the composition of the mixed solvent is likely to fluctuate, so that it is difficult to form a porous body.

前記環状エーテルとしては、例えば、テトラヒドロフラン、1,2−ジオキソラン、1,3−ジオキソラン、1,2−ジオキソール、1,3−ジオキソール等の5員環状エーテル;1,3−ジオキサン、1,4−ジオキサン、1,4−ジオキセン、1,4−ジオキシン等の6員環状エーテルなどの5〜10員環状エーテルなどが挙げられる。前記環状ケトンとしては、例えば、シクロペンタノン、シクロヘキサノン等のシクロアルカノンなどの5〜15員環状ケトンなどが挙げられる。また、前記環状アルカンとしては、シクロブタン、シクロペンタン、シクロへキサン等の4〜15員環状アルカンなどが挙げられる。   Examples of the cyclic ether include 5-membered cyclic ethers such as tetrahydrofuran, 1,2-dioxolane, 1,3-dioxolane, 1,2-dioxole, 1,3-dioxole; 1,3-dioxane, 1,4- And 5- to 10-membered cyclic ethers such as 6-membered cyclic ethers such as dioxane, 1,4-dioxene and 1,4-dioxin. Examples of the cyclic ketone include 5- to 15-membered cyclic ketones such as cycloalkanones such as cyclopentanone and cyclohexanone. Examples of the cyclic alkane include 4- to 15-membered cyclic alkanes such as cyclobutane, cyclopentane, and cyclohexane.

これらの環状エーテル、環状ケトン、環状アルカンは環に置換基を有していてもよい。置換基としては、例えば、ヒドロキシル基、ヒドロキシアルキル基(メチロール基などのヒドロキシC1-6アルキル基など)、アルキル基(メチル、エチル、プロピル、ブチルなどのC1-6アルキル基など)、アルコキシ基(メトキシ、エトキシ、ブトキシなどのC1-6アルコキシ基など)、アルコキシアルキル基(メトキシメチル、エトキシメチルなどのC1-6アルキルC1-6アルコキシ基など)、アシルオキシアルキル基(アセチルオキシメチル基などのC2-4アシルオキシC1-6アルキル基など)などが挙げられる。環状エーテル、環状ケトン、環状アルカンは、これらの置換基を複数有していてもよく、さらに、同一炭素上に2個の置換基を有していてもよい。環に置換基を有する環状アルカンとして、例えば、メチルシクロブタン、メチルシクロペンタン、メチルシクロヘキサン等が挙げられる。環状エーテル、環状ケトン、環状アルカンは、環境汚染性や腐食性の点から、ハロゲン原子を含有しないのが好ましい。 These cyclic ethers, cyclic ketones, and cyclic alkanes may have a substituent in the ring. Examples of the substituent include a hydroxyl group, a hydroxyalkyl group (such as a hydroxy C 1-6 alkyl group such as a methylol group), an alkyl group (such as a C 1-6 alkyl group such as methyl, ethyl, propyl, butyl, etc.), alkoxy Groups (such as C 1-6 alkoxy groups such as methoxy, ethoxy and butoxy), alkoxyalkyl groups (such as C 1-6 alkyl C 1-6 alkoxy groups such as methoxymethyl and ethoxymethyl), acyloxyalkyl groups (acetyloxymethyl) C 2-4 acyloxy C 1-6 alkyl group such as a group) and the like. The cyclic ether, cyclic ketone, and cyclic alkane may have a plurality of these substituents, and may further have two substituents on the same carbon. Examples of the cyclic alkane having a substituent in the ring include methylcyclobutane, methylcyclopentane, and methylcyclohexane. Cyclic ethers, cyclic ketones, and cyclic alkanes preferably do not contain halogen atoms from the viewpoint of environmental pollution and corrosivity.

環状エーテル、環状ケトン、環状アルカンは、一種単独で又は二種以上を組み合わせて使用できる。有機溶剤(C)としては、上記のなかでも、5〜8員環状エーテル(特に、テトラヒドロフラン)、5〜8員環状ケトン(特に、シクロペンタノン)、5〜8員環状アルカン(特に、シクロペンタン)などが好ましい。   Cyclic ether, cyclic ketone, and cyclic alkane can be used singly or in combination of two or more. As the organic solvent (C), among these, a 5- to 8-membered cyclic ether (particularly tetrahydrofuran), a 5- to 8-membered cyclic ketone (particularly cyclopentanone), and a 5- to 8-membered cyclic alkane (particularly cyclopentane). Etc.) are preferred.

前記有機溶剤混合液は実質的にハロゲン原子含有溶剤を含まないのが好ましい。実質的にハロゲン原子含有溶剤を含まないとは、ハロゲン原子含有溶剤の含有量が1重量%以下であることをいう。   It is preferable that the organic solvent mixed solution does not substantially contain a halogen atom-containing solvent. The phrase “substantially free of a halogen atom-containing solvent” means that the content of the halogen atom-containing solvent is 1% by weight or less.

有機溶剤混合液の好ましい例として以下のものが挙げられる。
(1)環状エーテル(A)としての5員環状ジエーテルと、環状アルコール(B)としての5〜10員環状アルコール(特に、6員環状アルコール)とを含む混合液(例えば、1,3−ジオキソランとシクロヘキサノールとを含む混合液、1,3−ジオキソランとメチルシクロヘキサノールとを含む混合液)
(2)環状エーテル(A)としての5員環状ジエーテルと、環状アルコール(B)としての5〜10員環状アルコール(特に、6員環状アルコール)と、有機溶剤(C)としての5〜8員環状ケトン(特に、5員環状ケトン)とを含む混合液(例えば、1,3−ジオキソランとシクロヘキサノール(又はメチルシクロヘキサノール)とシクロペンタノンとを含む混合液)
(3)環状エーテル(A)としての5員環状ジエーテルと、環状アルコール(B)としての5〜10員環状アルコール(特に、6員環状アルコール)と、有機溶剤(C)としての5〜8員環状ケトン(特に、テトラヒドロフラン)とを含む混合液(例えば、1,3−ジオキソランとシクロヘキサノール(又はメチルシクロヘキサノール)とテトラヒドロフランとを含む混合液)
(4)環状エーテル(A)としての5員環状ジエーテルと、環状アルコール(B)としての5〜10員環状アルコール(特に、6員環状アルコール)と、有機溶剤(C)としての5〜8員環状アルカン(特に、5員環状アルカン)とを含む混合液(例えば、1,3−ジオキソランとシクロヘキサノール(又はメチルシクロヘキサノール)とシクロペンタンとを含む混合液)
Preferred examples of the organic solvent mixture include the following.
(1) A mixed solution (for example, 1,3-dioxolane) containing a 5-membered cyclic diether as the cyclic ether (A) and a 5- to 10-membered cyclic alcohol (particularly a 6-membered cyclic alcohol) as the cyclic alcohol (B) And liquid mixture containing cyclohexanol, liquid mixture containing 1,3-dioxolane and methylcyclohexanol)
(2) 5-membered cyclic diether as cyclic ether (A), 5- to 10-membered cyclic alcohol (particularly 6-membered cyclic alcohol) as cyclic alcohol (B), and 5- to 8-membered as organic solvent (C) A liquid mixture containing a cyclic ketone (particularly a 5-membered cyclic ketone) (for example, a liquid mixture containing 1,3-dioxolane, cyclohexanol (or methylcyclohexanol) and cyclopentanone)
(3) 5-membered cyclic diether as cyclic ether (A), 5- to 10-membered cyclic alcohol (particularly 6-membered cyclic alcohol) as cyclic alcohol (B), and 5- to 8-membered as organic solvent (C) Liquid mixture containing cyclic ketone (especially tetrahydrofuran) (for example, liquid mixture containing 1,3-dioxolane, cyclohexanol (or methylcyclohexanol) and tetrahydrofuran)
(4) 5-membered cyclic diether as cyclic ether (A), 5- to 10-membered cyclic alcohol (particularly 6-membered cyclic alcohol) as cyclic alcohol (B), and 5- to 8-membered as organic solvent (C) Liquid mixture containing cyclic alkane (particularly 5-membered cyclic alkane) (for example, liquid mixture containing 1,3-dioxolane, cyclohexanol (or methylcyclohexanol) and cyclopentane)

前記有機溶剤混合液中の環状エーテル(A)の含有量は30〜99重量%であり、好ましくは60〜98重量%、さらに好ましくは70〜97重量%である。前記有機溶剤混合液中の環状アルコール(B)の含有量は1〜40重量%であり、好ましくは2〜35重量%、さらに好ましくは3〜30重量%である。前記有機溶剤混合液中の有機溶剤(C)の含有量は、例えば1〜40重量%、好ましくは2〜35重量%、さらに好ましくは3〜20重量%である。   The content of the cyclic ether (A) in the organic solvent mixed solution is 30 to 99% by weight, preferably 60 to 98% by weight, more preferably 70 to 97% by weight. The content of the cyclic alcohol (B) in the organic solvent mixture is 1 to 40% by weight, preferably 2 to 35% by weight, and more preferably 3 to 30% by weight. Content of the organic solvent (C) in the said organic solvent liquid mixture is 1 to 40 weight%, for example, Preferably it is 2 to 35 weight%, More preferably, it is 3 to 20 weight%.

ポリイミド系樹脂としては、好ましくはイミド系ポリマー、アミドイミド系ポリマー、ポリエーテルイミド系ポリマーなどが用いられる。各ポリマーは、ホモポリマーでもよく、他のモノマー成分を含むブロック、グラフト、ランダム共重合体でもよい。これらポリマーは単独で用いてもよいし、複数ポリマーの混合物でもよい。   As the polyimide resin, an imide polymer, an amideimide polymer, a polyetherimide polymer, or the like is preferably used. Each polymer may be a homopolymer or a block, graft, or random copolymer containing other monomer components. These polymers may be used alone or as a mixture of a plurality of polymers.

アミドイミド系ポリマーは、従来公知のものが使用できるが、通常無水トリメリット酸とジイソシアネートとの反応、又は無水トリメリット酸クロライドとジアミンとの反応により重合した後、イミド化することによって製造することができる。例えば、下記式(1)で表される繰り返し単位を有するアモコ・ジャパン製品の「トーロン4000T」や東洋紡績(株)の「バイロマックス」などが用いられる。   As the amidoimide-based polymer, conventionally known polymers can be used, but they can usually be produced by imidization after polymerization by reaction of trimellitic anhydride and diisocyanate or reaction of trimellitic anhydride chloride and diamine. it can. For example, “Toron 4000T” of Amoco Japan product having a repeating unit represented by the following formula (1), “Viromax” of Toyobo Co., Ltd., etc. are used.

イミド系ポリマーは、従来公知のものが使用できるが、テトラカルボン酸成分とジアミン成分との反応によりポリアミック酸を得て、それをさらにイミド化することにより製造することができる。イミド系ポリマーの場合も耐熱性があり、前述のアミドイミド系ポリマーと同様の性質を有している。   Although a conventionally well-known thing can be used for an imide type polymer, it can manufacture by obtaining polyamic acid by reaction with a tetracarboxylic-acid component and a diamine component, and imidating it further. The imide polymer is also heat resistant and has the same properties as the above-mentioned amide imide polymer.

ポリエーテルイミド系ポリマーとしては、従来公知のものが使用できるが、下記式(2)で表される繰り返し単位を含むポリエーテルイミド系ポリマーなどが挙げられる。   As the polyetherimide polymer, a conventionally known polymer can be used, and examples thereof include a polyetherimide polymer containing a repeating unit represented by the following formula (2).

式中、R1及びR2は、同一又は異なって、芳香族炭化水素環を含む2価の有機基を示す。前記芳香族炭化水素環には、単環または多環の芳香族炭素環及び芳香族複素環が含まれる。単環の芳香族炭化水素環としては、ベンゼン環が挙げられる。多環の芳香族炭化水素環としては、例えば、ナフタレン環、アントラセン環などの2つ以上の芳香環がそれぞれ2個以上の原子を共有した縮合環構造をもつもの;ビフェニル環、ビフェニレン環、フルオレン環、スチルベン環などの2つ以上の芳香環が単結合等の連結基を介して結合した構造のものなどが挙げられる。これらの環は、反応や高分子架橋体の物性を損なわない範囲で置換基を有していてよい。置換基としては、アルキル基(メチル、エチル基等の炭素数1〜4のアルキル基など)、ハロアルキル基(トリフルオロメチル基等の炭素数1〜4のハロアルキル基など)、アリール基(フェニル、ナフチル基等)、ハロゲン原子(フッ素原子、塩素原子、臭素原子など)、アルコキシ基(メトキシ、エトキシ基等の炭素数1〜4のアルコキシ基等)、ヒドロキシル基、カルボキシル基、シアノ基、ニトロ基等が挙げられる。 In the formula, R 1 and R 2 are the same or different and each represents a divalent organic group containing an aromatic hydrocarbon ring. The aromatic hydrocarbon ring includes a monocyclic or polycyclic aromatic carbocyclic ring and aromatic heterocyclic ring. Examples of the monocyclic aromatic hydrocarbon ring include a benzene ring. Examples of the polycyclic aromatic hydrocarbon ring include those having a condensed ring structure in which two or more aromatic rings such as naphthalene ring and anthracene ring each share two or more atoms; biphenyl ring, biphenylene ring, fluorene Examples thereof include a structure in which two or more aromatic rings such as a ring and a stilbene ring are bonded via a linking group such as a single bond. These rings may have a substituent as long as the properties of the reaction and the crosslinked polymer are not impaired. Examples of the substituent include an alkyl group (such as an alkyl group having 1 to 4 carbon atoms such as methyl and ethyl groups), a haloalkyl group (such as a haloalkyl group having 1 to 4 carbon atoms such as trifluoromethyl group), an aryl group (phenyl, Naphthyl groups, etc.), halogen atoms (fluorine atoms, chlorine atoms, bromine atoms, etc.), alkoxy groups (such as alkoxy groups having 1 to 4 carbon atoms such as methoxy and ethoxy groups), hydroxyl groups, carboxyl groups, cyano groups, nitro groups Etc.

芳香族炭化水素環を含む2価の有機基の具体例としては、下記式で表される価の有機基が挙げられる。   Specific examples of the divalent organic group containing an aromatic hydrocarbon ring include a valent organic group represented by the following formula.

式中、nは1〜10の整数を示す。前記有機基に含まれるベンゼン環は、反応や高分子架橋体の物性を損なわない範囲で置換基(例えば、前記例示の置換基)を有していてよい。   In formula, n shows the integer of 1-10. The benzene ring contained in the organic group may have a substituent (for example, the exemplified substituent) as long as the physical properties of the reaction and polymer crosslinked product are not impaired.

好ましいR1は、例えば、下記式で表される2価の有機基である。 Preferable R 1 is, for example, a divalent organic group represented by the following formula.

特に好ましいR1は、下記式で表される2価の有機基である。 Particularly preferred R 1 is a divalent organic group represented by the following formula.

好ましいR2には、例えば、下記式で表される2価の有機基が含まれる。 Preferable R 2 includes, for example, a divalent organic group represented by the following formula.

実際には、市販品、例えば次の一般式で表される繰り返し単位を有するゼネラル・エレクトリック社製品「ULTEM1000」などをそのまま用いることができる。   Actually, a commercially available product, for example, General Electric product “ULTEM1000” having a repeating unit represented by the following general formula can be used as it is.

ポリマー溶液中のポリイミド系樹脂の量は、有機溶剤混合液100重量部に対して1〜20重量部であり、好ましくは3〜18重量部、さらに好ましくは5〜15重量部である。ポリイミド系樹脂の量が有機溶剤混合液100重量部に対して20重量部を超えると、液の安定性が悪く固化しやすくなり、ポリイミド系樹脂の量が有機溶剤混合液100重量部に対して1重量部未満では、塗布・乾燥後の厚みが薄くなり多孔体を形成しにくい。   The amount of the polyimide resin in the polymer solution is 1 to 20 parts by weight, preferably 3 to 18 parts by weight, and more preferably 5 to 15 parts by weight with respect to 100 parts by weight of the organic solvent mixed solution. If the amount of the polyimide resin exceeds 20 parts by weight with respect to 100 parts by weight of the organic solvent mixture, the liquid becomes unstable and easily solidifies, and the amount of the polyimide resin is 100 parts by weight of the organic solvent mixture. If it is less than 1 part by weight, the thickness after coating and drying becomes thin and it is difficult to form a porous body.

ポリマー溶液の調製法としては一般的な方法を採用できる。環状エーテル(A)、環状アルコール(B)、有機溶剤(C)及びポリイミド系樹脂の溶解・混合の方法に限定はなく、従来公知の装置を用いて行うことができる。常温・常圧にて撹拌・溶解してもよいし、加温・加圧下にて撹拌・溶解した後、流延又は塗布温度に戻してもよい。材料を一括混合して溶解液を調製してもよいし、ポリイミド系樹脂を、環状エーテル(A)、環状アルコール(B)、有機溶剤(C)の有機溶剤混合液処方の一部の種類や一部の量を混合した後、残りの溶剤を添加する多段での溶解工程を経てもよい。また、ポリイミド系樹脂は全量一括して添加してもよいし、多数回に分けて添加してもよい。   As a method for preparing the polymer solution, a general method can be adopted. There is no limitation on the method for dissolving and mixing the cyclic ether (A), the cyclic alcohol (B), the organic solvent (C), and the polyimide resin, and it can be carried out using a conventionally known apparatus. The mixture may be stirred and dissolved at room temperature and normal pressure, or may be returned to the casting or coating temperature after stirring and dissolving under heating and pressure. The material may be mixed at once to prepare a solution, or the polyimide resin may be a kind of organic solvent mixed liquid formulation of cyclic ether (A), cyclic alcohol (B), or organic solvent (C). You may pass through the melt | dissolution process in the multistage which adds the remaining solvent, after mixing a part quantity. Moreover, all the polyimide resins may be added all at once, or may be added in multiple times.

ポリマー溶液は、さらに慣用の添加剤、例えば、架橋又は硬化剤、消泡剤、塗布性改良剤、増粘剤、滑剤、安定剤(酸化防止剤、紫外線吸収剤、熱安定剤、耐光安定剤など)、染料、顔料、帯電防止剤、アンチブロッキング剤、有機・無機の充填剤、親水化剤(親水性ポリマーなど)を含んでいてもよい。   The polymer solution further contains conventional additives such as crosslinking or curing agents, antifoaming agents, coatability improving agents, thickeners, lubricants, stabilizers (antioxidants, UV absorbers, heat stabilizers, light stabilizers). Etc.), dyes, pigments, antistatic agents, antiblocking agents, organic and inorganic fillers, and hydrophilizing agents (hydrophilic polymers, etc.).

水透過性を持たせる目的などから、多孔フィルム又は被膜表面を親水性にすることも有用である。本発明の製造方法では、環状エーテル(A)、環状アルコール(B)の混合液、又は環状エーテル(A)、環状アルコール(B)、有機溶剤(C)の混合液に親水化剤をあらかじめ少量(例えば、有機溶剤混合液100重量部に対して、0.1〜2重量部)添加しておくことで、多孔フィルム又は被膜表面を親水化させることも可能である。   It is also useful to make the porous film or the coating surface hydrophilic for the purpose of imparting water permeability. In the production method of the present invention, a small amount of the hydrophilizing agent is previously added to the mixed solution of the cyclic ether (A) and the cyclic alcohol (B) or the mixed solution of the cyclic ether (A), the cyclic alcohol (B), and the organic solvent (C). By adding (for example, 0.1 to 2 parts by weight with respect to 100 parts by weight of the organic solvent mixed solution), the porous film or the coating surface can be hydrophilized.

従来湿式とよばれる製法による多孔体・中空糸においては、添加した親水化剤を水などの凝固槽にて抽出する度合いにより、親水性をコントロールしていたが、本発明では不揮発性の親水化剤は添加した量が多孔体中に確実に残留するため、親水化剤の添加量が容易にコントロールできる点が優れている。   Conventionally, in porous bodies and hollow fibers by a manufacturing method called wet, the hydrophilicity was controlled by the degree to which the added hydrophilizing agent was extracted in a coagulation tank such as water. Since the added amount of the agent remains reliably in the porous body, it is excellent in that the added amount of the hydrophilizing agent can be easily controlled.

好ましい親水化剤の例としては、水溶性ポリマーが挙げられる。例えば、ポリエチレングリコール、ポリビニルピロリドン、ポリエチレンオキサイド、ポリビニルアルコール、ポリアクリル酸、多糖類等やその誘導体、及びこれらの混合物などが挙げられる。これらの水溶性ポリマーは一種単独で又は二種以上を組み合わせて使用できる。   Examples of preferred hydrophilizing agents include water-soluble polymers. Examples thereof include polyethylene glycol, polyvinyl pyrrolidone, polyethylene oxide, polyvinyl alcohol, polyacrylic acid, polysaccharides, derivatives thereof, and mixtures thereof. These water-soluble polymers can be used singly or in combination of two or more.

ポリマー溶液(ポリイミド系樹脂溶剤組成物)は液状であり、粘度は5〜10000mPa・sであるのが好ましく、より好ましくは20〜800mPa・s、特に好ましくは30〜100mPa・sである。ポリイミド系樹脂を有機溶剤混合液100重量部に対して1重量部以上含むポリマー溶液では、通常、粘度は5mPa・s以上となる。粘度が10000mPa・sを超える高粘度液は均質な塗布が困難となり、均質な厚みを持った多孔体の形成が難しくなるため、好ましくない。   The polymer solution (polyimide-based resin solvent composition) is liquid and preferably has a viscosity of 5 to 10,000 mPa · s, more preferably 20 to 800 mPa · s, and particularly preferably 30 to 100 mPa · s. In a polymer solution containing 1 part by weight or more of polyimide resin with respect to 100 parts by weight of the organic solvent mixed solution, the viscosity is usually 5 mPa · s or more. A high-viscosity liquid having a viscosity exceeding 10,000 mPa · s is not preferable because uniform coating becomes difficult and formation of a porous body having a uniform thickness becomes difficult.

ポリマー溶液(ポリイミド系樹脂溶剤組成物)の流延、塗布方法は特に限定されず、慣用の方法であるコーターによる連続・単板コート、各種印刷機による印刷(グラビア、オフセット、インクジェット、スクリーン、メタルマスクなど)、ディッピング、ディスペンサなどによる描写、中空を始め異形の押出し、スプレーコート、刷毛などによる塗装などの方法を用いることができる。また、刷毛塗工、吹き付け、浸漬引き上げなど塗膜形成に用いられる一般的な方法で、被被覆物の表面に本発明の多孔被膜を形成させることもできる。   The casting and coating method of the polymer solution (polyimide resin solvent composition) is not particularly limited, and is a conventional method of continuous / single-plate coating by a coater, printing by various printing machines (gravure, offset, inkjet, screen, metal) Mask, etc.), dipping, drawing with a dispenser, etc., extruding a hollow or other shapes, spray coating, painting with a brush, etc. can be used. Moreover, the porous film of this invention can also be formed on the surface of a to-be-coated object by the general method used for coating-film formation, such as brush coating, spraying, and immersion pulling.

生産性の観点から特に好ましい流延、塗布方法としては、コーターによる方法で、例えば、ロールコーター、エアナイフコーター、ブレードコーター、ロッドコーター、リバースコーター、バーコーター、コンマコーター、ディップ・スクイズコーター、ダイコーター、グラビアコーター、シルクスクリーンコーター等を用いた方法である。   Particularly preferred casting and coating methods from the viewpoint of productivity are coater methods such as roll coaters, air knife coaters, blade coaters, rod coaters, reverse coaters, bar coaters, comma coaters, dip squeeze coaters, and die coaters. , Gravure coater, silk screen coater and the like.

流延の際に用いる基板、塗布基材(被塗布物)には公知の材料を用いることができる。具体的には、紙、織布、不織布(ポリプロピレン製不織布、ポリアミド製不織布等)、メッシュ(ポリエステル繊維メッシュ、SUSメッシュ等)、プラスチック、ガラス、セラミックス、金属などが挙げられる。好ましい基板、基材は、ガラス板、金属箔(銅箔、アルミニウム箔、SUSフィルムなど)、プラスチックフィルム(ポリエチレンテレフタレートフィルム、ポリイミドフィルム、多孔体を形成する樹脂と同じ組成の樹脂フィルム等)、金属線(銅線など)などである。基板、基材は空孔を有していてもよい。空孔を有するフィルムとして、2軸延伸ポリテトラフルオロエチレンフィルム(PTFEフィルム)、2軸延伸ポリエチレンフィルム、ポリエチレン粒子を固めたフィルムなどが挙げられる。   A well-known material can be used for the board | substrate used in the case of casting, and a coating base material (to-be-coated object). Specific examples include paper, woven fabric, nonwoven fabric (polypropylene nonwoven fabric, polyamide nonwoven fabric, etc.), mesh (polyester fiber mesh, SUS mesh, etc.), plastic, glass, ceramics, metal, and the like. Preferred substrates and base materials are glass plates, metal foils (copper foil, aluminum foil, SUS film, etc.), plastic films (polyethylene terephthalate film, polyimide film, resin film having the same composition as the resin forming the porous body), metal, etc. Wire (such as copper wire). The substrate and the base material may have holes. Examples of the film having pores include a biaxially stretched polytetrafluoroethylene film (PTFE film), a biaxially stretched polyethylene film, and a film obtained by solidifying polyethylene particles.

塗布基材の形状に限定はなく、平面状(連続したロール状、板状)、立体形状、糸状或いは線状であってもよい。表面は平滑でもよく、粗化された構造や凹凸を有してもよいし、穴の開いた構造であってもよい。   There is no limitation on the shape of the coated substrate, and it may be flat (continuous roll, plate), three-dimensional, thread, or linear. The surface may be smooth, may have a roughened structure or unevenness, or may have a structure with a hole.

塗布基材が、紙、布、多孔性基材などの場合、ポリマー溶液の一部が基材の内部に入り込み一体化した多孔フィルムが形成される場合も多く、ポリイミド系樹脂で構成された多孔フィルムが形成された後、基材から剥離させた多孔フィルムのみ、或いは基材と一体となった多孔フィルムとして適宜利用することができる。   When the coated substrate is paper, cloth, porous substrate, etc., a porous film in which a part of the polymer solution enters the substrate and is integrated is often formed. After the film is formed, only the porous film peeled off from the substrate or the porous film integrated with the substrate can be used as appropriate.

ポリマー溶液(ポリイミド系樹脂溶剤組成物)の流延又は塗布時の温度は、−30℃〜50℃であるのが好ましい。流延又は塗布時の液温が−30℃未満であると、液が凝固しやすくなり、長期保管が困難となる。また、流延又は塗布時の液温が50℃を超える温度では、溶剤の揮発が激しく、均質な塗布が難しい上、引火防止等安全対策のための設備費が高くなり好ましくない。   The temperature during casting or application of the polymer solution (polyimide resin solvent composition) is preferably -30 ° C to 50 ° C. When the liquid temperature at the time of casting or coating is less than −30 ° C., the liquid is easily solidified, and long-term storage becomes difficult. Further, when the temperature of the liquid at the time of casting or coating exceeds 50 ° C., the volatilization of the solvent is severe and uniform coating is difficult, and the equipment cost for safety measures such as prevention of ignition is high, which is not preferable.

流延又は塗布後の乾燥により形成された多孔体(多孔フィルム又は多孔被膜)は、基板又は基材の表面に付着した状態でもよく、基板又は基材から剥離し、多孔体単体(支持体無しの自立した多孔フィルム)として剥離してもよい。多孔体単体として剥離する場合、工業的には、ベルト状又はドラム状基材の上に、ドープをダイから基板上に連続的に押し出して流延し、乾燥後、ベルト状又はドラム状基材から剥離し巻き取る方法が一般的である。基材表面に多孔被膜が形成されたものは本発明の被覆物に該当する。   The porous body (porous film or porous coating) formed by casting or drying after coating may be in a state of adhering to the surface of the substrate or base material, and peeled off from the substrate or base material, and the porous body alone (no support) The self-supporting porous film may be peeled off. When peeling as a single porous body, industrially, a dope is continuously extruded from a die onto a substrate on a belt-like or drum-like base material, cast, dried, and then belt-like or drum-like base material. The method of peeling and winding from is common. What formed the porous film in the base-material surface corresponds to the coating of this invention.

流延又は塗布後の乾燥条件に制限はないが、多孔化を容易に形成する条件として、流延又は塗布後、(流延又は塗布時液温−20℃)〜(流延又は塗布時液温+50℃)の範囲の温度で1秒以上保持し、次いで、ポリイミド系樹脂のガラス転移点以下の温度にて加熱乾燥することが好ましい。   There is no limitation on the drying conditions after casting or coating, but as conditions for easily forming a porous structure, after casting or coating, (liquid temperature at casting or coating −20 ° C.) to (liquid at casting or coating). It is preferable to hold at a temperature in the range of (temperature + 50 ° C.) for 1 second or longer, and then heat-dry at a temperature not higher than the glass transition point of the polyimide resin.

流延又は塗布後、(流延又は塗布時の液温−20℃)より低い温度に冷却すると、多孔化形成まで著しく時間がかかり好ましくない。また、流延又は塗布時の液温より50℃を超える温度に急激に昇温すると、低沸点溶剤が急激に揮発し、多孔体の孔径が100μm以上となり、所望の多孔体が得ることが困難となる。(流延又は塗布時液温−20℃)〜(流延又は塗布時液温+50℃)の範囲の温度で保持する時間は、1秒以上が好ましく、より好ましくは5秒以上、特に好ましくは10秒以上である。この間、風を吹き付けてもよいし、無風下にて保持してもよい。目安として、流延又は塗布液の白化が確認されればよい。かかる保持条件を経た後の加熱乾燥において、乾燥温度及び時間は、残留溶剤の量により任意に設定できるが、ポリイミド系樹脂のガラス転移点以下の温度にて乾燥することが好ましい。加熱乾燥温度は、例えば30℃〜200℃、好ましくは50〜180℃、特に好ましくは80〜150℃である。   After casting or coating, cooling to a temperature lower than (liquid temperature at casting or coating −20 ° C.) is not preferable because it takes a long time to form a porous structure. Further, when the temperature is rapidly raised to a temperature exceeding 50 ° C. from the liquid temperature at the time of casting or coating, the low boiling point solvent is volatilized rapidly and the pore diameter of the porous body becomes 100 μm or more, and it is difficult to obtain a desired porous body. It becomes. The time for holding at a temperature in the range of (liquid temperature at casting or coating −20 ° C.) to (liquid temperature at casting or coating + 50 ° C.) is preferably 1 second or more, more preferably 5 seconds or more, particularly preferably. 10 seconds or more. During this time, wind may be blown or may be held under no wind. As a guide, casting or whitening of the coating solution may be confirmed. In the heat drying after passing through such holding conditions, the drying temperature and time can be arbitrarily set depending on the amount of residual solvent, but it is preferable to dry at a temperature not higher than the glass transition point of the polyimide resin. The heating and drying temperature is, for example, 30 ° C to 200 ° C, preferably 50 to 180 ° C, and particularly preferably 80 to 150 ° C.

本発明のポリイミド系樹脂多孔フィルム又は被膜は、乾燥後の塗膜の断面に0.1〜10μmの孔が厚み方向に、少なくとも2つ以上観察される。すなわち、多孔フィルム又は被膜の厚みは、孔の平均孔径の2倍以上である。孔はいわゆるフィンガータイプのものではなく、孔径の揃ったスポンジタイプの構造となる。多孔フィルム又は被膜の表面、裏面は開口してもよいし、開口していなくてもよい。孔は独立の孔であっても連続した孔でもよい。電子顕微鏡写真(SEM)を用いることで、容易に孔が観察できる。   In the polyimide resin porous film or coating of the present invention, at least two or more pores of 0.1 to 10 μm are observed in the thickness direction in the cross section of the coating after drying. That is, the thickness of the porous film or coating is at least twice the average pore diameter. The hole is not a so-called finger type, but has a sponge type structure with a uniform hole diameter. The front and back surfaces of the porous film or coating may be opened or may not be opened. The holes may be independent holes or continuous holes. A hole can be easily observed by using an electron micrograph (SEM).

多孔フィルム又は被膜の断面の孔の平均孔径は、0.1〜10μmであることが好ましい。さらに好ましくは0.5〜7μm、特に好ましくは、1〜5μmである。平均孔径が10μmを超えると、メッシュ状になりやすく、好ましくない。   It is preferable that the average hole diameter of the hole of the cross section of a porous film or a film is 0.1-10 micrometers. More preferably, it is 0.5-7 micrometers, Most preferably, it is 1-5 micrometers. When the average pore diameter exceeds 10 μm, it tends to be in a mesh shape, which is not preferable.

孔径の測定には、電子顕微鏡写真を用いることができる。フィルム又は被膜断面の任意の10点以上の孔についてその面積を測定し、まずその平均値を平均孔面積Saveとした。次に、次式からその孔が真円であると仮定した時の孔径に換算し、その値を平均孔径とした。ここでπは円周率を表す。
平均孔径=2×(Save/π)1/2
An electron micrograph can be used for the measurement of the pore diameter. The area of 10 or more arbitrary holes in the cross section of the film or coating was measured, and the average value was defined as the average hole area Save. Next, it converted into the hole diameter when it assumed that the hole was a perfect circle from the following formula, and the value was made into the average hole diameter. Here, π represents a circumference ratio.
Average pore diameter = 2 × (Save / π) 1/2

多孔フィルム又は被膜の厚みは1〜100μmであり、より好ましくは2〜50μm、特に好ましくは5〜30μmである。多孔フィルム又は被膜の厚みが100μmを超えると、溶剤の乾燥が困難となり、多孔体を形成しにくくなる。また、多孔フィルム又は被膜の厚みが1μm未満では、塗布ムラが発生しやすい。   The thickness of the porous film or coating is 1 to 100 μm, more preferably 2 to 50 μm, and particularly preferably 5 to 30 μm. When the thickness of the porous film or coating exceeds 100 μm, it becomes difficult to dry the solvent, and it becomes difficult to form a porous body. Moreover, if the thickness of the porous film or coating is less than 1 μm, uneven coating tends to occur.

本発明の多孔フィルム又は被膜では、空孔率(空隙率)は20〜80%である。空孔率は、より好ましくは20〜70%、特に好ましくは30〜70%である。空孔率が80%を超える高空隙率では、多孔体強度に劣り、20%未満では、多孔体のメリットが出にくい。空孔率は次式より求めることができる。ここで、Vはフィルム(被膜)の体積、Wはフィルム(被膜)の重量、Dはフィルム(被膜)素材の密度である。なお、ポリアミドイミドの密度は1.45(g/cm3)、ポリイミドの密度は1.35(g/cm3)とした。
空孔率(%)=100−100×W/(D・V)
In the porous film or coating of the present invention, the porosity (porosity) is 20 to 80%. The porosity is more preferably 20 to 70%, particularly preferably 30 to 70%. If the porosity is higher than 80%, the strength of the porous body is inferior. If the porosity is less than 20%, the merit of the porous body is hardly obtained. The porosity can be obtained from the following equation. Here, V is the volume of the film (coating film), W is the weight of the film (coating film), and D is the density of the film (coating film) material. The density of polyamideimide was 1.45 (g / cm 3 ), and the density of polyimide was 1.35 (g / cm 3 ).
Porosity (%) = 100−100 × W / (D · V)

本発明のポリイミド系樹脂多孔フィルム又は被膜では、表面の水に対する接触角は65°以上であり、好ましくは65〜90°である。接触角の測定には協和界面科学(株)製の接触角測定装置「Drop Master700」を使用できる。蒸留水を試験液とし、フィルム又は被膜表面に滴下し、液滴の接触角を測定する。   In the polyimide resin porous film or coating of the present invention, the contact angle of the surface with respect to water is 65 ° or more, preferably 65 to 90 °. For the measurement of the contact angle, a contact angle measuring device “Drop Master 700” manufactured by Kyowa Interface Science Co., Ltd. can be used. Using distilled water as a test solution, the solution is dropped on the surface of the film or coating, and the contact angle of the droplet is measured.

以下に、実施例に基づいて本発明をより詳細に説明するが、本発明はこれらの実施例により限定されるものではない。これらの結果を表1に示す。平均孔径、空孔率、水に対する接触角は前記の方法により求めた。   Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples. These results are shown in Table 1. The average pore diameter, porosity, and contact angle with water were determined by the methods described above.

実施例1
1,3−ジオキソラン153重量部、シクロヘキサノール27重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)20重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は10重量%、粘度は60mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を1分あてた後、120℃のオーブンで3分間乾燥させた。乾燥後の多孔フィルムの厚みは12μm、空孔率は38%、水との接触角は85°、フィルム断面の孔の平均孔径は2μmであった。図1にフィルム断面のSEM写真を掲載した。
Example 1
In 153 parts by weight of 1,3-dioxolane and 27 parts by weight of cyclohexanol, 20 parts by weight of a polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan GK, glass transition point 217 ° C.) is dissolved at room temperature to obtain a polymer solution ( Polyimide solution) was prepared. This polymer solution had a solid content of 10% by weight and a viscosity of 60 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air at 25 ° C. was applied for 1 minute, followed by drying in an oven at 120 ° C. for 3 minutes. The thickness of the porous film after drying was 12 μm, the porosity was 38%, the contact angle with water was 85 °, and the average pore diameter of the holes in the film cross section was 2 μm. FIG. 1 shows an SEM photograph of the film cross section.

実施例2
1,3−ジオキソラン247重量部、シクロヘキサノール38重量部、テトラヒドロフラン95重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)20重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は5重量%、粘度は47mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を1分あてた後、120℃のオーブンで3分間乾燥させた。乾燥後の多孔フィルムの厚みは7μm、空孔率は33%、水との接触角は90°、フィルム断面の孔の平均孔径は1μmであった。
Example 2
20 parts by weight of polyimide resin (SABIC Innovative Plastics Japan “Ultem 1000”, glass transition point 217 ° C.) 20 parts by weight are dissolved in 247 parts by weight of 1,3-dioxolane, 38 parts by weight of cyclohexanol and 95 parts by weight of tetrahydrofuran at room temperature. To prepare a polymer solution (polyimide solution). This polymer solution had a solid content of 5% by weight and a viscosity of 47 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air at 25 ° C. was applied for 1 minute, followed by drying in an oven at 120 ° C. for 3 minutes. The thickness of the porous film after drying was 7 μm, the porosity was 33%, the contact angle with water was 90 °, and the average pore diameter of the holes in the film cross section was 1 μm.

実施例3
1,3−ジオキソラン126重量部、シクロヘキサノール27重量部、シクロペンタノン27重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)20重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は10重量%、粘度は58mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を1分あてた後、120℃のオーブンで3分間乾燥させた。乾燥後の多孔フィルムの厚みは17μm、空孔率は72%、水との接触角は83°、フィルム断面の孔の平均孔径は5μmであった。
Example 3
To 126 parts by weight of 1,3-dioxolane, 27 parts by weight of cyclohexanol, and 27 parts by weight of cyclopentanone, 20 parts by weight of a polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan GK, glass transition point 217 ° C.) To prepare a polymer solution (polyimide solution). The solid content of this polymer solution was 10% by weight, the viscosity was 58 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air at 25 ° C. was applied for 1 minute, followed by drying in an oven at 120 ° C. for 3 minutes. The thickness of the porous film after drying was 17 μm, the porosity was 72%, the contact angle with water was 83 °, and the average pore diameter of the holes in the film cross section was 5 μm.

実施例4
1,3−ジオキソラン144重量部、シクロヘキサノール18重量部、テトラヒドロフラン18重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)20重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は10重量%、粘度は55mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み256μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を1分あてた後、120℃のオーブンで3分間乾燥させた。乾燥後の多孔フィルムの厚みは15μm、空孔率は64%、水との接触角は91°、フィルム断面の孔の平均孔径は2μmであった。図2にフィルム断面のSEM写真を掲載した。
Example 4
In 144 parts by weight of 1,3-dioxolane, 18 parts by weight of cyclohexanol, and 18 parts by weight of tetrahydrofuran, 20 parts by weight of a polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan GK, glass transition point 217 ° C.) are dissolved at room temperature. To prepare a polymer solution (polyimide solution). This polymer solution had a solid content of 10% by weight and a viscosity of 55 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate using a Baker type applicator so as to have a thickness of 256 μm. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air at 25 ° C. was applied for 1 minute, followed by drying in an oven at 120 ° C. for 3 minutes. The thickness of the porous film after drying was 15 μm, the porosity was 64%, the contact angle with water was 91 °, and the average pore diameter of the holes in the film cross section was 2 μm. FIG. 2 shows an SEM photograph of the film cross section.

実施例5
1,3−ジオキソラン144重量部、シクロヘキサノール18重量部、テトラヒドロフラン18重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)20重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は10重量%、粘度は55mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を3分あてた後、25℃にて24時間放置し、乾燥させた。乾燥後の多孔フィルムの厚みは14μm、空孔率は66%、水との接触角は87°、フィルム断面の孔の平均孔径は2μmであった。
Example 5
In 144 parts by weight of 1,3-dioxolane, 18 parts by weight of cyclohexanol, and 18 parts by weight of tetrahydrofuran, 20 parts by weight of a polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan GK, glass transition point 217 ° C.) are dissolved at room temperature. To prepare a polymer solution (polyimide solution). This polymer solution had a solid content of 10% by weight and a viscosity of 55 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air with an ambient temperature of 25 ° C. was applied for 3 minutes, and then left at 25 ° C. for 24 hours to be dried. The thickness of the porous film after drying was 14 μm, the porosity was 66%, the contact angle with water was 87 °, and the average pore diameter of the holes in the film cross section was 2 μm.

実施例6
1,3−ジオキソラン144重量部、シクロヘキサノール18重量部、テトラヒドロフラン18重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)20重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は10重量%、粘度は55mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥は、60℃のオーブン中に3分間置くことで行った。乾燥後の多孔フィルムの厚みは17μm、空孔率は59%、水との接触角は90°、フィルム断面の孔の平均孔径は2μmであった。
Example 6
In 144 parts by weight of 1,3-dioxolane, 18 parts by weight of cyclohexanol, and 18 parts by weight of tetrahydrofuran, 20 parts by weight of a polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan GK, glass transition point 217 ° C.) are dissolved at room temperature. To prepare a polymer solution (polyimide solution). This polymer solution had a solid content of 10% by weight and a viscosity of 55 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. Drying was performed by placing in an oven at 60 ° C. for 3 minutes. The thickness of the porous film after drying was 17 μm, the porosity was 59%, the contact angle with water was 90 °, and the average pore diameter of the holes in the film cross section was 2 μm.

実施例7
1,3−ジオキソラン144重量部、シクロヘキサノール18重量部、シクロペンタノン18重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテムXH6050」、ガラス転移点247℃)20重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は10重量%、粘度は35mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を1分あてた後、120℃のオーブンで3分間乾燥させた。乾燥後の多孔フィルムの厚みは16μm、空孔率は48%、水との接触角は84°、フィルム断面の孔の平均孔径は2μmであった。
Example 7
20 parts by weight of polyimide resin (SABIC Innovative Plastics Japan “Ultem XH6050”, glass transition point 247 ° C.) is added to 144 parts by weight of 1,3-dioxolane, 18 parts by weight of cyclohexanol and 18 parts by weight of cyclopentanone at room temperature. To prepare a polymer solution (polyimide solution). The solid content of this polymer solution was 10% by weight, the viscosity was 35 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air at 25 ° C. was applied for 1 minute, followed by drying in an oven at 120 ° C. for 3 minutes. The thickness of the porous film after drying was 16 μm, the porosity was 48%, the contact angle with water was 84 °, and the average pore diameter of the holes in the film cross section was 2 μm.

実施例8
1,3−ジオキソラン144重量部、シクロヘキサノール10重量部、シクロペンタン10重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)20重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は10重量%、粘度は48mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を1分あてた後、120℃のオーブンで3分間乾燥させた。乾燥後の多孔フィルムの厚みは13μm、空孔率は43%、水との接触角は88°、フィルム断面の孔の平均孔径は2μmであった。
Example 8
To 144 parts by weight of 1,3-dioxolane, 10 parts by weight of cyclohexanol, and 10 parts by weight of cyclopentane, 20 parts by weight of a polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan GK, glass transition point 217 ° C.) is used at room temperature. The polymer solution (polyimide solution) was prepared by dissolution. The solid content of this polymer solution was 10% by weight, the viscosity was 48 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air at 25 ° C. was applied for 1 minute, followed by drying in an oven at 120 ° C. for 3 minutes. The thickness of the porous film after drying was 13 μm, the porosity was 43%, the contact angle with water was 88 °, and the average pore diameter of the holes in the film cross section was 2 μm.

比較例1
1,3−ジオキソラン144重量部、シクロペンタノン36重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)36重量部を室温で溶解させ、ポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の固形分は10重量%、粘度は42mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を1分あてた後、120℃のオーブンで3分間乾燥させた。乾燥後の多孔フィルムの厚みは5μm、空孔率は4%、水との接触角は85°、フィルム断面に孔は観察されなかった。
Comparative Example 1
In 144 parts by weight of 1,3-dioxolane and 36 parts by weight of cyclopentanone, 36 parts by weight of a polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan GK, glass transition point 217 ° C.) are dissolved at room temperature to obtain a polymer solution. (Polyimide solution) was prepared. The solid content of this polymer solution was 10% by weight, the viscosity was 42 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air at 25 ° C. was applied for 1 minute, followed by drying in an oven at 120 ° C. for 3 minutes. The thickness of the porous film after drying was 5 μm, the porosity was 4%, the contact angle with water was 85 °, and no holes were observed in the film cross section.

比較例2
1,3−ジオキソラン50重量部、シクロヘキサノール40重量部、シクロペンタノン10重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)10重量部を溶解させようとしたが、液がゲル化し、基板上に流延できなかった。
Comparative Example 2
In 50 parts by weight of 1,3-dioxolane, 40 parts by weight of cyclohexanol, and 10 parts by weight of cyclopentanone, 10 parts by weight of a polyimide resin (SABIC Innovative Plastics Japan “Ultem 1000”, glass transition point 217 ° C.) are dissolved. However, the solution gelled and could not be cast on the substrate.

比較例3
1,3−ジオキソラン75重量部、シクロヘキサノール9.35重量部、テトラヒドロフラン9.35重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)25重量部を溶解させようとしたが、液がゲル化し、基板上に流延できなかった。
Comparative Example 3
75 parts by weight of 1,3-dioxolane, 9.35 parts by weight of cyclohexanol, 9.35 parts by weight of tetrahydrofuran, 25 parts by weight of polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan LLC, glass transition point 217 ° C.) However, the solution gelled and could not be cast on the substrate.

比較例4
N−メチルピロリドン80重量部、シクロヘキサノール20重量部に、ポリイミド系樹脂(SABICイノベーティブプラスチックジャパン合同会社製「ウルテム1000」、ガラス転移点217℃)を室温で溶解させ、固形分は10重量%のポリマー溶液(ポリイミド溶解液)を調製した。このポリマー溶液の粘度は68mPa・sであり、液状態はゲル化せず良好であった。
このポリイミド溶解液をガラス基板上にベーカー式アプリケータを用い、厚み127μmとなるように流延した。液温度、流延時の雰囲気温度は25℃であった。乾燥には、ヘアドライヤーを用い、25℃の雰囲気温度の風を1分あてた後、200℃のオーブンで3分間乾燥させた。乾燥後の多孔フィルムの厚みは5μm、空孔率は2%、水との接触角は91°、フィルム断面に孔は観察されなかった。
Comparative Example 4
In 80 parts by weight of N-methylpyrrolidone and 20 parts by weight of cyclohexanol, polyimide resin (“Ultem 1000” manufactured by SABIC Innovative Plastics Japan GK, glass transition point 217 ° C.) is dissolved at room temperature, and the solid content is 10% by weight. A polymer solution (polyimide solution) was prepared. The viscosity of this polymer solution was 68 mPa · s, and the liquid state was good without gelation.
This polyimide solution was cast on a glass substrate to a thickness of 127 μm using a Baker type applicator. The liquid temperature and the ambient temperature during casting were 25 ° C. For drying, a hair dryer was used, and air at an ambient temperature of 25 ° C. was applied for 1 minute, followed by drying in an oven at 200 ° C. for 3 minutes. The thickness of the porous film after drying was 5 μm, the porosity was 2%, the contact angle with water was 91 °, and no holes were observed in the film cross section.

Claims (10)

環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量部のポリイミド系樹脂を含むポリマー溶液をフィルム状に流延するか又は基材に塗布した後、有機溶剤を乾燥除去して得られる、空孔率が20〜80%、フィルム又は被膜断面の孔の平均孔径が0.1〜10μm、厚みが前記平均孔径の2倍以上で且つ1〜100μm、水に対する接触角が65°以上であるポリイミド系樹脂多孔フィルム又は被膜。   30 to 99% by weight of cyclic ether (A), an organic solvent mixture containing 1 to 40% by weight of cyclic alcohol (B) which is a non-solvent of polyimide resin and has a boiling point higher than that of cyclic ether (A), A polymer solution containing 1 to 20 parts by weight of a polyimide resin with respect to 100 parts by weight of an organic solvent mixed solution is cast into a film or applied to a substrate, and then obtained by drying and removing the organic solvent. Polyimide having a porosity of 20 to 80%, an average pore diameter of the film or coating cross section of 0.1 to 10 μm, a thickness of 2 to 100 μm and a contact angle with water of 65 ° or more of the average pore diameter. Based resin porous film or coating. 有機溶剤混合液が、環状エーテル(A)、環状アルコール(B)に加えて、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点が高く環状アルコール(B)より沸点の低い有機溶剤であって、環状エーテル、環状ケトン及び環状アルカンからなる群より選択された少なくとも1種の有機溶剤(C)を1〜40重量%含有する混合液である請求項1記載のポリイミド系樹脂多孔フィルム又は被膜。   The organic solvent mixed solution is a non-solvent of polyimide resin in addition to the cyclic ether (A) and the cyclic alcohol (B) and has a higher boiling point than the cyclic ether (A) and lower boiling point than the cyclic alcohol (B). 2. The polyimide-based resin porous film according to claim 1, which is a mixed solution containing 1 to 40% by weight of at least one organic solvent (C) selected from the group consisting of cyclic ethers, cyclic ketones and cyclic alkanes. Or coating. 環状エーテル(A)の沸点が110℃未満であり、環状アルコール(B)の沸点が110℃以上である請求項1又は2記載のポリイミド系樹脂多孔フィルム。   The polyimide resin porous film according to claim 1 or 2, wherein the cyclic ether (A) has a boiling point of less than 110 ° C, and the cyclic alcohol (B) has a boiling point of 110 ° C or higher. 有機溶剤混合液が実質的にハロゲン原子含有溶剤を含まない請求項1〜3の何れかの項に記載のポリイミド系樹脂多孔フィルム又は被膜。   The polyimide resin porous film or coating according to any one of claims 1 to 3, wherein the organic solvent mixed solution does not substantially contain a halogen atom-containing solvent. ポリマー溶液の粘度が5〜10000mPa・sである請求項1〜4の何れかの項に記載のポリイミド系樹脂多孔フィルム又は被膜。   The polyimide resin porous film or coating according to any one of claims 1 to 4, wherein the polymer solution has a viscosity of 5 to 10,000 mPa · s. 環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量部のポリイミド系樹脂を含むポリマー溶液を基材に塗布した後、有機溶剤を乾燥除去して得られる、空孔率が20〜80%、被膜断面の孔の平均孔径が0.1〜10μm、厚みが前記平均孔径の2倍以上で且つ1〜100μm、水に対する接触角が65°以上であるポリイミド系樹脂多孔フィルム被膜で被覆された被覆物。   30 to 99% by weight of cyclic ether (A), an organic solvent mixture containing 1 to 40% by weight of cyclic alcohol (B) which is a non-solvent of polyimide resin and has a boiling point higher than that of cyclic ether (A), After applying a polymer solution containing 1 to 20 parts by weight of a polyimide resin to 100 parts by weight of an organic solvent mixed solution on a substrate, the porosity obtained by drying and removing the organic solvent is 20 to 80%, Coating covered with a polyimide-based resin porous film coating having an average pore diameter of 0.1 to 10 μm, a thickness of 1 to 100 μm and a contact angle with water of 65 ° or more of the average pore diameter of the cross section of the coating object. 環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量%のポリイミド系樹脂を含むポリマー溶液をフィルム状に流延するか又は基材に塗布した後、有機溶剤を乾燥除去することを特徴とするポリイミド系樹脂多孔フィルム又は被膜の製造方法。   30 to 99% by weight of cyclic ether (A), an organic solvent mixture containing 1 to 40% by weight of cyclic alcohol (B) which is a non-solvent of polyimide resin and has a boiling point higher than that of cyclic ether (A), A polymer solution containing 1 to 20% by weight of a polyimide resin with respect to 100 parts by weight of an organic solvent mixed solution is cast into a film or applied to a substrate, and then the organic solvent is dried and removed. A method for producing a polyimide-based resin porous film or coating. 液温度−30℃〜50℃のポリマー溶液を流延又は塗布した後、(流延又は塗布時液温−20℃)〜(流延又は塗布時液温+50℃)の範囲の温度で1秒以上保持し、次いでポリイミド系樹脂のガラス転移点以下の温度で加熱して有機溶剤を除去する請求項7記載のポリイミド系樹脂多孔フィルム又は被膜の製造方法。   After casting or coating a polymer solution having a liquid temperature of −30 ° C. to 50 ° C., the temperature is in the range of (liquid temperature at casting or coating—20 ° C.) to (liquid temperature at casting or coating + 50 ° C.) for 1 second. The manufacturing method of the polyimide resin porous film or film of Claim 7 which hold | maintains above and then heats at the temperature below the glass transition point of a polyimide resin, and removes an organic solvent. 環状エーテル(A)を30〜99重量%、ポリイミド系樹脂の非溶剤であり且つ環状エーテル(A)より沸点の高い環状アルコール(B)を1〜40重量%含有する有機溶剤混合液と、該有機溶剤混合液100重量部に対して1〜20重量%のポリイミド系樹脂を含むポリマー溶液を基材に塗布した後、有機溶剤を乾燥除去することを特徴とするポリイミド系樹脂多孔被膜で被覆された被覆物の製造方法。   30 to 99% by weight of cyclic ether (A), an organic solvent mixture containing 1 to 40% by weight of cyclic alcohol (B) which is a non-solvent of polyimide resin and has a boiling point higher than that of cyclic ether (A), A polymer solution containing 1 to 20% by weight of a polyimide resin with respect to 100 parts by weight of an organic solvent mixed solution is applied to a substrate, and then the organic solvent is dried and removed. A method for producing a coating. 液温度−30℃〜50℃のポリマー溶液を基材に塗布した後、(塗布時液温−20℃)〜(塗布時液温+50℃)の範囲の温度で1秒以上保持し、次いでポリイミド系樹脂のガラス転移点以下の温度で加熱して有機溶剤を除去する請求項9記載のポリイミド系樹脂多孔被膜で被覆された被覆物の製造方法。   After a polymer solution having a liquid temperature of −30 ° C. to 50 ° C. is applied to the substrate, it is held for 1 second or more at a temperature in the range of (liquid temperature at application −20 ° C.) to (liquid temperature at application + 50 ° C.), and then polyimide The manufacturing method of the coating body coat | covered with the polyimide resin porous film of Claim 9 which heats at the temperature below the glass transition point of a resin, and removes an organic solvent.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012167181A (en) * 2011-02-14 2012-09-06 Daicel Corp Porous film containing inorganic particle, and method for producing the same
JP2016222912A (en) * 2015-06-01 2016-12-28 ユニチカ株式会社 Aromatic amide-based polymer solution and porous aromatic amide-based film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012167181A (en) * 2011-02-14 2012-09-06 Daicel Corp Porous film containing inorganic particle, and method for producing the same
JP2016222912A (en) * 2015-06-01 2016-12-28 ユニチカ株式会社 Aromatic amide-based polymer solution and porous aromatic amide-based film

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