JP2010159450A - Support structure of catalyst body in catalytic chemical vapor-deposition apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a support structure of catalyst body in a catalytic chemical vapor-deposition apparatus achieving the long-term repetitive use of the catalyst body by preventing film adhesion on a holding member for holding the catalyst body. <P>SOLUTION: A adhesion-preventive unit 1 is divided into an upper member 1a and a lower member 1b in the direction substantially orthogonal to the axis of a catalyst body 4 with a part in a vicinity of the axis of the catalyst body 4 being a border. Consequently, a holding member 20 and the adhesion-preventive unit 1 are detachably suitable for a column support 130 of a catalytic chemical vapor-deposition apparatus in a non-contact manner with the catalyst body 4. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

  The present invention relates to a catalyst body support structure of a catalytic chemical vapor deposition apparatus that holds a catalyst body used in a catalytic chemical vapor deposition apparatus.

  Catalytic chemical vapor deposition (Catalytic Chemical Vapor Deposition Technique) is a catalytic chemical vapor deposition apparatus that heats a catalyst body of a predetermined shape placed in a vacuum vessel and heats the raw material gas injected into the vacuum vessel. Contact the catalyst body, decompose the raw material gas by catalytic cracking reaction on the surface of the heated catalyst body, transport the decomposed species to the substrate held at low temperature in the vacuum vessel (deposit) and deposit the thin film It is an apparatus for forming, and is widely used for the production of semiconductor thin films and polymer thin films (Patent Document 1). The metal catalyst body is heated by being energized to a high temperature, and a cooling cycle is repeated in which a predetermined amount of thin film is formed on the substrate and then returned to room temperature.

  In the vacuum vessel of the catalytic chemical vapor deposition apparatus, the decomposition species of the source gas is transported to a substrate held at a low temperature to form a thin film, but a holding member (frame body) that holds the inner wall of the vacuum vessel and the catalyst body In addition, the decomposition species of the raw material gas adheres and an adhesion film is easily formed. For this reason, it is necessary to periodically remove (clean) the adhering film adhering to the inner wall of the vacuum vessel or the holding member for holding the catalyst body.

  As a method of removing the attached film in the vacuum vessel, there is a method of removing the attached film by injecting a cleaning gas into the vacuum vessel and reacting the cleaning gas with the attached film and exhausting the generated gaseous substance. Known (Patent Document 1). Also, in semiconductor processing equipment, there is a known method for maintaining the cleanliness in a vacuum container within a certain range by attaching a deposition plate in advance to the inner wall of the vacuum vessel and periodically replacing these deposition plates. (Patent Document 2). On the other hand, in order to prevent the film from adhering to the gripping member (frame body) that grips the catalyst body, it is known in the literature that a box-shaped deposition cover with a through hole through which the catalyst wire passes is disposed opposite to be attached to the frame body. (Patent Document 3).

Japanese Patent No. 3780364 JP 2000-164564 A JP 2002-93723 A

  However, since the method for removing an attached film using the cleaning gas described in Patent Document 1 uses a chemical reaction between the cleaning gas and the attached film, continuous catalytic chemical vapor deposition in which the inside of the apparatus has a complicated shape is used. In the apparatus, the cleaning gas does not reach every corner, and the film adhering to the inner wall of the apparatus or the gripping member (frame body) cannot be removed sufficiently. Further, the deposition preventing plate described in Patent Document 2 is a plate-like member that can be applied only to the inner wall of a simple vacuum vessel.

  As shown in FIG. 13, the protective cover described in Patent Document 3 has box-shaped protective covers 301 and 302 in which through-holes for passing catalyst wires (described as heating elements 3) are formed so as to face each other. Are attached to the short side of the rectangular frame 31 that grips the catalyst wire, and the portions protected by the deposition covers 301 and 302 are limited to the periphery of the end of the catalyst wire. Places other than the periphery of the part (long side) are exposed. For this reason, an adhesion film is formed at a location (long side) other than the periphery of the catalyst wire end of the frame 31. Moreover, it is not easy to attach or remove the deposition cover from the rectangular frame 31 without applying vibration or impact to the catalyst wires that are arranged in a zigzag pattern or at narrow intervals. Absent. For example, a tungsten wire is generally used as a catalyst wire. However, a tungsten wire that is heated by heating and red-hot at a high temperature is once softened, and when it is returned to room temperature after use, it becomes brittle by being heat-treated. Therefore, if vibration or impact is applied to the tungsten wire heated to normal temperature, it may break easily, and if it breaks, it cannot be reused.

  As described above, conventionally, there is no effective measure for removing the adhered film on the gripping member (frame body) that grips the catalyst body, and the film formation on the substrate or the base film is processed in one to several lots. Each time, the gripping member must be disassembled and washed, and the actual condition is that the catalyst body (catalyst wire) broken by vibration or impact is discarded in the process of disassembly. However, a large amount of labor is expended because the gripping member (frame body) that grips the catalyst body is disassembled, cleaned, and reassembled.

  Therefore, the purpose of the present invention is to provide an adhesion unit that is easy to desorb and prevent film adhesion to the gripping member that grips the catalyst body, without breaking the catalyst body during desorption before and after cleaning the device, It is an object of the present invention to provide a catalyst body support structure for a catalytic chemical vapor deposition apparatus that enables repeated use of the catalyst body over a long period of time.

  The catalyst support structure of the catalytic chemical vapor deposition apparatus of the present invention includes a pair of gripping members that are arranged to face each other and grip both ends in the axial direction of a catalyst body having a predetermined shape, and a protective member incorporating the gripping member. An adhesion unit, and the adhesion prevention unit is composed of an upper member and a lower member that are divided vertically in a direction substantially perpendicular to the axis of the catalyst body, with the vicinity of the axis of the catalyst body as a boundary.

  According to the present invention, the anti-adhesion unit comprises an upper member and a lower member that are vertically divided in a direction substantially perpendicular to the axis of the catalyst body, with the vicinity of the axis of the catalyst body as a boundary. The upper member or the lower member can be detachably attached to the catalytic chemical vapor deposition apparatus in a non-contact state with the catalyst body. If the upper member and the lower member of the case-shaped adhesion preventing unit are fitted to each other, it is easy to cover the periphery of the grip member excluding the vicinity of the shaft of the catalyst body without a gap. . Therefore, it is possible to prevent the holding member constituting a part of the frame body from being deposited.

  The present invention is characterized in that a bridging member that fixes the interval between the gripping members is detachably attached to the gripping member.

  According to the present invention, the bridging member fixes the gap between the gripping members so that it can be detachably attached to the catalytic chemical vapor deposition apparatus without applying excessive vibration or impact to the catalyst body. .

  The present invention attaches the bridging member to the gripping member, attaches the gripping member to the lower member of the deposition preventing unit, removes the bridging member, and then attaches the upper member of the deposition preventing unit. The gripping member is covered.

  According to the present invention, since the predetermined space is secured by removing the bridging member at the time of film formation, the flow path of the source gas injected into the vacuum vessel can be expanded, and the source gas While maintaining good contact reaction with the catalyst body, the deposited species generated in the catalyst body do not adhere to the bridging member and become inactivated, and the deposited species surely reach the substrate, thereby improving material efficiency and deposition. The speed can be improved. Conventionally, a large-sized catalyst body support frame has been required to secure the flow path, but the catalyst body and gripping member can be detached even with a small-sized catalyst body support frame, which is lightweight and easy to replace. In addition, the degree of freedom in device design increases. Further, unlike the conventional rectangular frame, in the present invention, since the bridging member is removed and used, no thin film is deposited on the bridging member.

  In the present invention, the conductive metal fittings that are arranged to face each other and grip the catalyst body and form an electric circuit that energizes the catalyst body, and at least one of the opposite conductive metal fittings is separated from the other conductive metal fitting. It is characterized by comprising a spring for pushing.

  According to the present invention, the catalyst body is tensioned to prevent the catalyst body from drooping by the spring that pushes at least one of the opposing metal fittings away from the other metal fitting. Even when the medium is energized and heated, there is no deformation (sag) of the catalyst body. For this reason, the size of the hollow part of the said holding member can be made small, without the said catalyst body contacting the hollow part of the said holding member which lets the said catalyst body pass, and disconnecting. Therefore, the intrusion of the raw material gas from the recessed portion of the gripping member can be minimized, and film adhesion to the gripping member can be minimized.

  In the present invention, the catalyst body is preferably made of a rod.

  Conventionally, as the catalyst body, a catalyst wire made of a wire is commercially available in a spool shape (reel shape), and the catalyst wire made of the spool-like wire is pulled and used straight. The catalyst wire made of spool-like wire is bent into a spool shape (reel shape) in the manufacturer's manufacturing process, and already bent into a bow at the time of use, making it easy to bend at high temperatures and providing shape stability (non-sag) Inferior. Further, in order to apply tension in the axial direction of the catalyst wire made of a spool-shaped wire, the catalyst wire bent in a bow must be pulled straight, and is pulled with extra tension. According to the present invention, since the catalyst body is made of a rod, the catalyst body can be pulled straight with a small tension compared to a catalyst body made of a spool-like wire. In addition, the catalyst body made of a rod is excellent in shape stability, and it is easy to maintain a straight state. In this specification, not only a bar viewed from the material side, but also a catalyst body that does not have a step of bending into a spool (reel) is expressed as a bar.

  In the present invention, the catalyst body is preferably a straight rod-shaped or straight linear catalyst body. Examples of the shape of the catalyst body include rod shape or wire shape, coil shape, plate shape or foil shape, and mesh shape. Since the catalyst body is a straight rod-like or straight linear catalyst body, it is easy to pin the catalyst body with the conductive metal fitting.

  According to the present invention, the anti-adhesion unit comprises an upper member and a lower member that are vertically divided in a direction substantially perpendicular to the axis of the catalyst body, with the vicinity of the axis of the catalyst body as a boundary. The upper member or the lower member can be detachably attached to the catalytic chemical vapor deposition apparatus in a non-contact state with the catalyst body. If the upper member and the lower member of the case-shaped adhesion preventing unit are fitted to each other, it is easy to cover the periphery of the grip member excluding the vicinity of the shaft of the catalyst body without a gap. . Therefore, it is possible to prevent the holding member constituting a part of the frame body from being deposited.

  According to the present invention, the bridging member fixes the gap between the gripping members so that it can be detachably attached to the catalytic chemical vapor deposition apparatus without applying excessive vibration or impact to the catalyst body. . According to the present invention, since the predetermined space is secured by removing the bridging member during film formation, the flow path of the source gas injected into the vacuum vessel can be expanded, and the source gas The contact reaction of the catalyst body with the catalyst body is kept good, and the deposited species generated in the catalyst body are not attached to the bridging member and deactivated. The deposition rate can be improved. Conventionally, a large-sized catalyst body support frame has been required to secure the flow path, but the catalyst body and gripping member can be detached even with a small-sized catalyst body support frame, which is lightweight and easy to replace. In addition, the degree of freedom in device design increases. Further, unlike the conventional rectangular frame, in the present invention, since the bridging member is removed and used, no thin film is deposited on the bridging member.

  According to the present invention, the catalyst body is tensioned to prevent the catalyst body from drooping by the spring that pushes at least one of the opposing metal fittings away from the other metal fitting. Even when the medium is energized and heated, there is no deformation (sag) of the catalyst body. For this reason, the size of the hollow part of the said holding member can be made small, without the said catalyst body contacting the hollow part of the said holding member which lets the said catalyst body pass, and disconnecting. Therefore, the intrusion of the raw material gas from the recessed portion of the gripping member can be minimized, and film adhesion to the gripping member can be minimized.

  Therefore, by providing a deposition unit that is easy to detach, the film can be prevented from adhering to the gripping member that grips the catalyst body, and the catalyst body can be removed for a long time without breaking the catalyst body during detachment before and after cleaning the apparatus. A catalyst support structure for a catalytic chemical vapor deposition apparatus that can be used repeatedly is realized.

It is a perspective view which shows the catalyst body support structure which attached the adhesion prevention unit of embodiment to which this invention is applied. It is a perspective view which shows the attachment process of the adhesion prevention unit of the said embodiment. It is a perspective view which shows the attachment process of the adhesion prevention unit of the said embodiment. It is a perspective view which shows the attachment process of the adhesion prevention unit of the said embodiment. It is a perspective view which shows the attachment process of the adhesion prevention unit of the said embodiment. It is a perspective view which shows the attachment process of the adhesion prevention unit of the said embodiment. It is a perspective view which shows the catalyst body support structure which attached the adhesion prevention unit of other embodiment to which this invention is applied. It is a perspective view which shows the attachment process of the adhesion prevention unit of the said embodiment. It is a perspective view which shows the attachment process of the adhesion prevention unit of the said embodiment. It is sectional drawing which shows an example of the catalytic chemical vapor deposition apparatus to which the catalyst body support structure of this invention is applied. It is a structural diagram showing an example of a catalyst body support frame to which the catalyst body support structure of the present invention is applied. FIG. 3 is a structural view showing a catalyst body support structure portion extracted from the catalyst body support frame. It is a perspective view which shows the conventional catalyst body support frame and a deposition cover.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

(Catalytic chemical vapor deposition system)
First, an outline of a catalytic chemical vapor deposition apparatus to which the catalyst support structure of the present invention is applied will be described. FIG. 10 is a sectional view showing a continuous catalytic chemical vapor deposition apparatus. The catalytic chemical vapor deposition apparatus 100 is connected to a casing (vacuum vessel) 103, source gas supply means 102 for supplying source gas from below the casing 103, and power supply means 101 via a power line 111. The heated catalyst body 4, the gripping member that stretches the catalyst body 4, the deposition unit 1 that adheres the gripping member, and the base material film 107 that is to be deposited are drawn out to the deposition area to form the substrate A roller mechanism 105 that winds the film 117 and an exhaust unit (vacuum pump) 104 that is connected to the lower side of the housing 103 and exhausts the used raw material gas are provided. Arrow a indicates the flow of the source gas. The source gas supplied from the source gas supply means 102 is discharged into the vacuum container 103 from the gas supplier 112 having a large number of gas blowing holes 122. The roller mechanism 105 includes three rollers 105A, 105B, and 105C and a plurality of tension rollers 115 (two tension rollers in FIG. 5). The base film 107 wound in advance on the winding roller 105A is drawn out to the film forming area in the vicinity of the catalyst body 4 and brought into close contact with the cooling roller 105B, and the starting end of the base film 107 is taken up by the winding roller 105C. It is done. The cooling roller 105 </ b> B includes a cooling unit, and the decomposed high temperature gas is formed on the base film 107 by holding the base film 107 at a low temperature. Then, the film-formed base film 117 is wound around the winding roller 105C. The tension roller 115 applies a predetermined tension to the base film 107 (and 117) so that the base film 107 (and 117) does not wrinkle. As the base film 107, a film-like substrate is used, or a plate-like substrate is attached to a transport film.

  Next, a film forming procedure using a catalytic chemical vapor deposition apparatus to which the catalyst support structure of the present invention is applied will be described below (see FIG. 10). First, the base film 107 previously wound around the winding roller 105A is drawn out to the film forming area near the catalyst body 4 and brought into close contact with the cooling roller 105B, and the starting end of the base film 107 is wound around the winding roller 105C. Make it. Next, the vacuum vessel 103 is evacuated to a predetermined degree of vacuum by the vacuum pump 104 connected to the vacuum vessel 103 via the duct 114. The catalyst body 4 stretched on the catalyst body support frame 1 is heated by energization. For example, when a tungsten wire is used as the catalyst body 4, the material is heated to 1800 ° C. by energization, the source gas is released from the gas supplier 112 into the vacuum vessel 103, the source gas is brought into contact with the heated catalyst body 4, The raw material gas is decomposed by a catalytic decomposition reaction on the surface of the catalyst body 4, and the decomposition species is transported (deposited) to the exposed surface of the base film 107 on the cooling roller 105 </ b> B holding the low temperature to form a thin film. Then, the formed base film 117 is continuously wound up by the winding roller 105C. The remaining gas is discharged out of the apparatus by the vacuum pump 104 (see arrow a). When the film formation of the specified amount is completed, the supply of the source gas from the source gas supply unit 102 to the vacuum vessel 103 is stopped, and the power supply from the power supply unit 101 to the catalyst body 4 is stopped. Then, the vacuum pump 104 is stopped, a predetermined gas (air, nitrogen, etc.) is injected into the vacuum container 103 to be atmospheric pressure, and the film-formed substrate film 117 wound around the winding roller 105C is removed from the apparatus. Take out.

  Next, the cleaning procedure of the catalytic chemical vapor deposition apparatus to which the catalyst support structure of the present invention is applied will be described below (see FIG. 10). After the film formation is completed, the inside of the apparatus is cleaned. First, the connection between the power line 111 and the power plate electrically connected to the catalyst body 4 is disconnected, and the catalyst body 4 and the catalyst support frame 2 and the adhesion preventing unit 1 are removed by a removal method described later and taken out outside the apparatus. Next, the inner wall of the vacuum vessel 103 and the adhesion preventing plate (not shown) attached to the roller mechanism 105 are removed and taken out of the apparatus. Dust that has fallen from the protective plate is removed from the inside of the apparatus using a cleaning means such as a vacuum cleaner, blower, or hand wipe. Next, a new deposition prevention plate is attached to the inner wall of the apparatus and the roller mechanism 105, and the catalyst body 4 and the catalyst body support frame that have been used up to the previous time are continuously used. And the power line 111 and the electrode plate are connected. Then, the base film 107 is loaded on the winding roller 105A. Thereafter, the film forming procedure and the cleaning procedure are repeated. Then, the removed anti-adhesion plate and the anti-adhesion unit 1 remove the film adhering to the surface by blasting or acid cleaning, perform pure water cleaning and drying, and regenerate them in a dust-free state.

(Catalyst body support frame)
Next, the structure of the catalyst support frame 2 used in the catalyst support structure of the present invention will be described. Fig.11 (a) is a front view which shows the catalyst body support frame of this embodiment, FIG.11 (b) is the side view. The catalyst body support frame 2 of the present embodiment includes a fixing member such as a screw or a bolt by disposing two rod-shaped bridging members 80 each having a quadrangular cross section and two rod-shaped frame bodies 21 (20) having a quadrangular cross section. This is a quadrangular frame that is fixed and combined with each other (FIG. 11A). The catalyst body 4 is a single wire having a circular cross section and straight in the axial direction. In FIG. 11A, the catalyst bodies 4 are shifted by the center interval between the adjacent catalyst bodies 4 at positions where the catalyst bodies 4 are parallel to each other. Two catalyst bodies 4 are respectively held by a pair of conductive fittings 50 (51 and 52) of the same shape arranged facing each other. Then, one catalyst body 4 is held by each of the conductive fittings 53 adjacent to the bridging member 80. In the present embodiment, a total of six catalyst bodies 4 are stretched on the catalyst body support frame 2. A plurality of springs 6 that apply tension in the direction in which the catalyst body 4 is stretched are incorporated in the frame body 21 on one side (FIG. 11A).

  The spring 6 is a compression coil spring made of a heat-resistant metal or ceramics. In FIG. 11A, two springs 6 are built in the frame body 21 at positions parallel to each other, and the conductive fitting 51 on the side close to the spring 6 is used. Is arranged to push away from the conductive metal fittings 52 and 53 on the side farther from the spring 6. One conductive fitting 53 is connected to the negative potential side of the power supply means 101 via the power line 111, and the other conductive fitting 53 is connected to the positive potential side of the power supply means 101 via the power line 111, and the catalyst body. An electric circuit for energizing 4 is configured. The frame body 21 is made of ceramics such as alumina or metal such as stainless steel, and at least the contact surface with the conductive metal fittings 50 (51, 52, 53) is electrically insulated. The bridging member 80 is made of ceramic, metal, or plastic with good dimensional stability.

  The conductive metal fitting 50 is made of a metal material having a high melting point and low electrical resistance, such as stainless steel or molybdenum. In FIG. 11, the catalyst bodies 4 are electrically connected in series. In this embodiment, springs 6 incorporated in the frame body 21 and providing tension in the direction in which the catalyst body 4 is stretched are arranged facing each other across the frame body 21 so as to grip the catalyst body 4 and energize the catalyst body 4. By pushing at least one of the plurality of conductive fittings 50 constituting the electric circuit to be moved away from the other conductive fittings 52 and 53, tension is applied only in the direction in which the catalyst body 4 is stretched. In FIG. 11, the spring 6 is incorporated only in the frame 21 on the conductive metal fitting 51 side, but the spring 6 may be incorporated only in the frame 21 on the conductive metal fitting 52, 53 side. It may be built in each of the bodies 21 and 21. In the present embodiment, the catalyst body 4 is electrically connected in series, but the catalyst body 4 may be electrically connected in parallel.

  FIG. 12 is a structural diagram showing the catalyst body support structure portion extracted from the catalyst body support frame 2 of the present embodiment and enlarged. 12 (a) is a front view of the catalyst support structure portion as viewed from above, and FIG. 12 (b) is a cross-sectional view of the catalyst support structure portion as viewed from above. FIG. ) Is a front view of the catalyst support structure disassembled and viewed from above. The conductive metal fitting 51 (50) includes a main body 511 and a plate-like member 516 that holds the catalyst body 4 between the main body 511. The main body 511 and the plate-like member 516 are clamped by the bolt 7 to hold the catalyst body 4. (FIG. 12 (c)). A pair of tubular portions 512 projecting in the direction of the frame body 21 at a predetermined interval are formed in the main body 511 of the conductive metal 51, and a position corresponding to the tubular portion 512 of the frame body 21 is from the outer periphery of the tubular portion 512. An inner peripheral through hole 212 having a larger inner diameter is formed, and the tubular portion 512 is inserted into the pair of through holes 212 in a non-contact manner (FIG. 12). An insertion hole 5121 for inserting the catalyst body 4 is formed from the tip of the tubular portion 512 of the conductive metal fitting 51 to the side surface of the positioning guide portion 514 (the surface opposite to the tubular portion 512). The inner diameter of the insertion hole 5121 is slightly larger than the outer diameter of the catalyst body 4, and the catalyst body 4 is inserted into the insertion hole 5121 without contact (FIG. 12). A groove-shaped portion 5122 having a semicircular cross section is formed continuously with the insertion hole 5121 at a predetermined position of the main body 511 to which the plate member 516 is attached (FIG. 12C). When the end portion of the catalyst body 4 is inserted into the insertion hole 5121 at the tip of the tubular portion 512 and penetrates the positioning guide portion 514 so as to substantially traverse the groove shape portion 5122, the upper half of the catalyst body 4 is formed in the groove shape portion 5122. The catalyst body 4 is sandwiched between the main body 511 of the conductive metal 51 and the plate-like member 516. The plate-like member 516 is positioned by a positioning guide portion 514 protruding upward from the main body 511 by a height corresponding to the thickness of the plate-like member 516, and is fastened and fixed by a bolt 7 (FIG. 12A). ). The conductive fitting 52 is the same as the conductive fitting 51 and holds two catalyst bodies 4. The conductive metal 53 has the same structure as the conductive metal 51 except that it holds one catalyst body 4.

  Conventionally, a phenomenon (silicidation) in which a tungsten wire, which is a kind of catalyst body 4, reacts with a silane gas, which is a kind of raw material gas, to generate a silicon compound is known. It has been confirmed that the film formation rate is decreased due to the decrease in the heat generation amount. This silicidation proceeds from the end of the catalyst body 4 having a low catalyst body temperature. According to the present embodiment, the catalyst body 4 is inserted into the through-hole 5121 having a slightly larger diameter than the tubular portion 512 formed in the tubular portion 512 of the conductive fitting 51 in a non-contact manner, so that the convex portion of the conductive fitting is formed. Even if the raw material gas penetrates into the end portion of the catalyst body by suppressing the ingress of the raw material gas, it is decomposed before reaching the end portion of the catalyst body 4, so that the catalyst body 4 having a low catalyst body temperature. It is possible to prevent silicidation at the end of the substrate. Further, since the tubular portion 512 of the main body 511 of the conductive metal fitting 51 (50) through which the vicinity of the end of the catalyst body 4 is inserted is inserted into the through-hole 212 formed in the frame body 21 in a non-contact manner, it is energized and heated to generate heat. Heat conduction from the catalyst body 4 to the frame body 21 is suppressed. The conductive metal fitting 51 (50) is provided with a pair of cylindrical portions (convex portions) 513 protruding in the direction of the frame body 21 at a predetermined interval, and the outer periphery of the cylindrical portion 513 is the outer periphery of the cylindrical portion 513. A compression coil spring 6 having a larger inner circumference is inserted (FIG. 12). A hollow portion 213 is formed at a position corresponding to the columnar portion 513 of the frame body 21 at a position that is larger than the outer periphery of the compression coil spring 6 and shallower than the entire length of the compression coil spring 6, and A recessed portion 214 is formed at an inner periphery smaller than the inner periphery of the compression coil spring 6 and deeper than the entire length of the cylindrical portion 513, and the central axes of these recessed portions 213 and 214 are the same, and these recessed portions A cylindrical portion 513 is inserted into 213 and 214 (FIG. 12). According to the present embodiment, one of the two catalyst bodies 4 arranged at a predetermined interval is held by one of the conductive fittings 50, and the two compression coil springs 6 arranged at a predetermined interval remove at least one of the conductive fittings 50. It becomes the composition to push. The compression coil spring 6 does not necessarily expand / contract only in the axial direction but may expand / contract slightly in directions other than the axial direction due to processing variations of components, thermal history, and the like, and so-called twist may occur. According to the present embodiment, even when the compression coil spring 6 is twisted, the two catalyst bodies 4 gripped by one of the conductive fittings 50 at a predetermined interval are pulled so as to be parallel to each other with equal tension, and the catalyst body There is no short circuit due to contact between the four.

  Moreover, the catalyst body 4 of this embodiment consists of a rod, and can be pulled straight with a small tension compared with the catalyst body which consists of a conventional spool-shaped wire. Further, the catalyst body 4 made of a rod is excellent in shape stability, and it is easy to maintain a straight state.

(First embodiment of the present invention)
The deposition unit of the catalytic chemical vapor deposition apparatus according to the first embodiment of the present invention, the catalyst support structure provided with the deposition unit, and a method for attaching the deposition unit will be described below. FIG. 1 is a perspective view showing a catalyst body support structure to which an adhesion preventing unit of this embodiment is attached. 2 to 4 are perspective views showing the attachment process of the deposition preventing unit.

  In order to form a flow path of the source gas in the vacuum vessel of the catalytic chemical vapor deposition apparatus 100, the deposition unit 1 of the present embodiment has two struts (side walls) 130, 130 formed at predetermined intervals. Each is attached and covers the gripping member 20 that grips the end of the catalyst body 4 having a predetermined shape (FIG. 1). The catalyst body 4 is a single bar-shaped single line that is circular in cross section and straight in the axial direction, and is gripped by the gripping members 20 in parallel positions. A cylindrical body 512 for preventing silicidation is added at the boundary between the end of the catalyst body 4 and the gripping member 20, and on the opposite side of the catalyst body 4 of the deposition preventing unit 1 arranged on one side. A set of electrode plates 55 for supplying electricity to the catalyst body 4 is added (FIG. 1). The deposition preventing unit 1 includes an upper member 1a and a lower member 1b, and the upper member 1a and the lower member 1b are divided in a direction substantially perpendicular to the axis of the catalyst body 4 with the vicinity of the axis of the catalyst body 4 as a boundary ( FIG. 1). The upper member 1a and the lower member 1b are made of a heat-resistant insulating ceramic such as alumina or zirconia, or a heat-resistant metal such as stainless steel or molybdenum in which a portion in contact with an electric circuit is insulated.

  The attachment procedure of the deposition preventing unit 1 of this embodiment will be described below. First, a bracket for fixing the lower member 1b to the column 130 is attached to the two columns (side walls) 130, 130 formed at a predetermined interval. The depressions 11 are arranged facing each other and fixed to the columns 130 (FIG. 1). On the other hand, a bridging member 80 for keeping the gap between the gripping members 20 is attached to a pair of gripping members 20 with fixing brackets 9 such as screws and hexagon bolts, and the catalyst body 4 is stretched (FIG. 2). ). Then, the lower half of the gripping member 20 is accommodated in the lower member 1b of the two deposition units 1 installed in advance (FIG. 3). The inner size of the lower member 1b of the deposition preventing unit 1 is such a size that the gripping member 20 just fits. A semicircular recess 11 formed in the lower member 1 b is formed at the boundary between the catalyst body 4 and the gripping member 20 arranged at a predetermined interval, and the deposition preventing unit 1 is not attached to the catalyst body 4. It becomes a window to be in contact.

  And after accommodating the lower half of the holding member 20 in the lower member 1b of the deposition preventing unit 1, a set of electrode plates 55 is attached by a fixing bracket 19 such as a screw or a hexagon bolt. The electrode plate 55 has an L-shape, and one side of the L-shape is attached to the holding member 20 by the fixing bracket 19 and is electrically connected to the catalyst body 4 via the conductive bracket 50, and the other side of the L-shape is Projecting to the outside of the lower member 1b to form an extraction electrode (FIG. 3). The electrode plate 55 is made of a metal material having a high melting point and low electrical resistance, such as stainless steel or molybdenum. Next, the fixing bracket 9 of the bridging member 80 is loosened, the bridging member 80 is removed, and the upper members 1a of the two adhesion preventing units 1 are attached to the upper half of the gripping member 20 (FIG. 4). Here, a rectangular groove (notch) 12 for releasing the electrode plate 55 is formed in the upper member 1a on the side where the electrode plate 55 is attached (FIG. 4). According to the deposition unit 1 of the present embodiment, the deposition unit 1 is only formed with the recess 11 for projecting the cylindrical body 512 and the groove 12 for drawing out the electrode plate. By attaching 1 to the gripping member 20, the gripping member 20 can be completely covered.

  FIG. 5 and FIG. 6 are perspective views showing the attachment process of the deposition preventing unit according to another example of the embodiment. The upper member 1a of the adhesion preventing unit 1 of the present embodiment includes an extension member 13 that extends downwards other than the surface having the semicircular recess 11 (FIGS. 5 and 6), and the inner side of the upper member 1a. The dimension is set to a dimension slightly larger than the outer dimension of the lower member 1b. According to the present embodiment, the upper member 1a of the deposition preventing unit 1 is fitted to the lower member 1b, and the extension member 13 of the upper member 1a covers about 3/4 of the outer periphery of the lower member 1b. The gap between 1a and the lower member 1b can be almost eliminated.

(Second embodiment of the present invention)
An adhesion prevention unit of the catalytic chemical vapor deposition apparatus of the second embodiment of the present invention, a catalyst body support structure provided with the adhesion prevention unit, and a method for attaching the adhesion prevention unit will be described below. FIG. 7 is a perspective view showing a catalyst body support structure to which the deposition preventing unit of this embodiment is attached. 8 and 9 are perspective views showing the attachment process of the deposition preventing unit.

  The adhesion preventing unit 1 of the present embodiment covers the catalyst body support frame 2 as it is without removing the bridging member 80 from the catalyst body support frame 2 that holds the end of the catalyst body 4 having a predetermined shape. Yes (Figure 7). The deposition preventing unit 1 is composed of a window frame-shaped upper member 1a and a lower member 1b whose central portions are opened. The upper member 1a and the lower member 1b are separated from each other around the axis of the catalyst body 4 as a boundary. 4 is divided in a direction substantially perpendicular to the axis 4 (FIG. 7).

  The attachment procedure of the deposition preventing unit 1 of this embodiment will be described below. First, it fixes by attaching the bracket for fixing the lower member 1b to the support | pillar 130 to the two support | pillars (side wall) 130, 130 formed in the predetermined space | interval (FIG. 8). Then, the lower half of the catalyst support frame 2 is housed in the lower member 1b of the deposition preventing unit 1 (FIG. 9). The inner size of the lower member 1b of the deposition preventing unit 1 is such a size that the gripping member 20 just fits. A semicircular recess 11 formed in the lower member 1 b is formed at the boundary between the catalyst body 4 and the gripping member 20 arranged at a predetermined interval, and the deposition preventing unit 1 is attached to the catalyst body 4. Non-contact.

  Then, a set of electrode plates 55 are attached by fixing brackets 19 such as screws and hexagon bolts. The electrode plate 55 has an L-shape, and one side of the L-shape is attached to the holding member 20 by the fixing bracket 19 and is electrically connected to the catalyst body 4 via the conductive bracket 50, and the other side of the L-shape is Projecting to the outside of the lower member 1b to form an extraction electrode (FIG. 9). The electrode plate 55 is made of a metal material having a high melting point and low electrical resistance, such as stainless steel or molybdenum. Next, the upper member 1a of the deposition preventing unit 1 is attached to the upper half of the catalyst support frame 2 (FIG. 9). According to the deposition preventing unit 1 of the present embodiment, the catalyst body support frame 2 can be covered as it is without removing the bridging member 80 from the catalyst body support frame 2, so that it is easy to mount and remove. is there.

  As described above, the present invention is not limited to the embodiment described above. For example, the present invention can be applied to an annular catalyst support frame. In addition, the attachment method is also exemplified. For example, when it is difficult to replace the deposition unit in the apparatus, a part of the jig or gas discharge plate to be attached at the same interval as the support column outside the apparatus in advance is attached. It is also possible to prepare and place the gripping member in the deposition preventing unit in the same manner as in the above-described embodiment, and then install it in the apparatus. After installation, if the jig is removed or does not interfere with the gas flow path, the jig may be left attached. If the work space inside the device is small, when removing the gripping member from the deposition unit, the catalyst unit may come into contact with the inner wall of the device during the work and break, so replace the deposition unit outside the machine. Is easier to work with. Thus, it goes without saying that the present invention can be modified as appropriate without departing from the spirit of the present invention.

1 Protection unit,
1a Upper member of the deposition preventing unit,
1b Lower member of the deposition unit,
2 catalyst body support frame,
20 gripping member (frame),
4 catalyst body,
50, 51, 52, 53 conductive metal fittings,
55 electrode plate,
80 bridging member,
100 catalytic chemical vapor deposition equipment,
130 Prop (side wall)

Claims (4)

  A pair of gripping members which are arranged facing each other and grip both ends in the axial direction of a catalyst body having a predetermined shape; and an adhesion prevention unit incorporating the gripping member, and the adhesion prevention unit includes a shaft of the catalyst body. A catalyst body support structure for a catalytic chemical vapor deposition apparatus, comprising an upper member and a lower member that are divided vertically in a direction substantially perpendicular to the axis of the catalyst body with a vicinity as a boundary.   The catalyst body support structure for a catalytic chemical vapor deposition apparatus according to claim 1, wherein a bridging member that fixes the gap between the gripping members is detachably attached to the gripping member.   After attaching the bridging member to the gripping member, attaching the gripping member to the lower member of the deposition preventing unit, removing the bridging member, attaching the upper member of the deposition preventing unit, The catalyst body supporting structure of the catalytic chemical vapor deposition apparatus according to claim 2, wherein the catalyst body supporting structure is covered. Conductive metal fittings that are arranged facing each other and grip the catalyst body and constitute an electric circuit that energizes the catalyst body, and a spring that pushes at least one of the opposing metal fittings away from the other conductive metal fitting. The catalyst body support structure for a catalytic chemical vapor deposition apparatus according to any one of claims 1 to 3, wherein

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