JP2010153687A - Substrate transport robot and substrate transport apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate transport robot which saves footprints while securing a necessary and sufficient operation range, is clean, and has high throughput. <P>SOLUTION: The substrate transport robot includes: first and second robot sections 25a and 25b each comprising a hand 13, an arm portion 24 supporting the hand 13 atop, and a body 16 supporting the arm portion 24; a first travel base 15a supporting the first robot section 25a; a second travel base 15b supporting the second robot section 25b; and a common base 18 supporting the first travel base 15a and second travel base 15b, wherein the first robot section 25a and the second robot section 25b each can travel freely by the first and second travel bases. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a transfer robot that is used in a semiconductor manufacturing apparatus and a substrate inspection apparatus, and transfers a substrate such as a semiconductor, a liquid crystal, and a reticle to a target position in the apparatus, and in particular, is installed in a locally cleaned housing. The present invention relates to an optimal substrate transfer robot.

In a semiconductor or liquid crystal manufacturing apparatus, exposure apparatus, and substrate inspection apparatus (hereinafter collectively referred to as a semiconductor manufacturing apparatus), particularly when a substrate such as a semiconductor wafer, a liquid crystal, or a reticle is transported, it is generally a horizontal articulated type. A transfer robot is used. In a recent semiconductor manufacturing apparatus, this transfer robot is installed in a so-called locally cleaned housing in which a clean downflow airflow that has passed through a filter installed at the top is isolated from the outside by the housing. This housing is a substrate transfer device installed on the front surface of the semiconductor manufacturing apparatus, and is called a front end (for example, Patent Document 1).
FIG. 6A is a top view showing an example of a semiconductor manufacturing apparatus having the front end 30. In FIG. 6A, the substrate transport robot 10 is disposed at the approximate center in the front end 30. The substrate transfer robot 10 accommodates an elevating mechanism (not shown) and can move up and down in a vertical direction, a first arm 11 provided on the body 16 and connected to be rotatable in a horizontal direction, and the first arm 11. The second arm 12 is provided at the tip of the second arm 12 and is rotatably connected in the horizontal direction, and the hand 13 is rotatably connected to the tip of the second arm 12 and places the substrate W thereon. . The substrate transport robot 10 transports the substrate W mounted on the hand 13 to a target position while raising and lowering the body 16 and the upper arm from the first arm 11 and rotating each arm by the lifting mechanism. An opener 31 (referred to as a POD opener or a FOUP opener) is mounted on the outer side surface of the front end 30 so that the substrate W can be taken into the front end 30 by opening and closing its lid. ) Are provided. According to the opener 31, the substrate W can be taken out into the front end 30 without allowing a relatively unclean atmosphere outside the front end 30 to enter the front end 30. In addition, an apparatus called an aligner 35 that detects and arranges (aligns) the direction of the substrate W is also installed in a part of the front end 30. Alternatively, although not shown, a buffer or the like on which the substrate W is temporarily placed is also installed. A processing chamber 34 for processing the substrate W is connected to the outer side surface of the front end 30. In the processing chamber 34, predetermined processing such as CVD, etching, and exposure is performed on the substrate W, for example. In this way, the substrate transfer robot 10 installed in the locally cleaned housing takes out the substrate W in the cassette 32 that can be taken out by the opener 31 and transfers it to the aligner 35 for alignment. The substrate W that has been completed is transferred to the processing chamber 34. Then, the substrate W processed in the processing chamber 34 is stored in the cassette 32 again.

The front end 30 as described above is also called a mini-environment, EFEM, or the like, but is not connected to the processing chamber 34, and only a plurality of the openers 31 are provided on the outer side surface of the front end 30. A housing for transferring the substrate W between the cassettes 32 while the substrate transfer robot 10 performs alignment by the aligner 35 between the plurality of cassettes 32 mounted on the opener 31 has also been developed. This case is called a sorter.
Regardless of the front end or the sorter, the substrate transfer robot 10 must access a large number of access points such as the opener 31 and the aligner 35 within a limited space in the locally cleaned housing. On the other hand, since there is a demand for downsizing the front end 30 for the purpose of reducing the footprint of the semiconductor manufacturing apparatus, the substrate transfer robot 10 installed in the front end 30 is small and clean, and is necessary and It is required to have a sufficient operating range.

  In order to secure the necessary and sufficient operating range, it is common to provide a traveling mechanism 19 that travels the body 16 along the direction in which the cassettes 32 are lined up (the lateral width direction of the front end 30) as shown in FIG. . In the layout of the front end 30 as shown in FIG. 6, the substrate transport robot 10 accesses all aligners 35, the processing chambers 34, and the openers 31 unless the travel mechanism 19 moves the substrate transport robot 10 to increase the operating range. It is not possible. The traveling mechanism 19 is configured by, for example, a linear motor. By this traveling mechanism 19, the operating range of the arm of the substrate transport robot 10 is moved to expand the operating range, thereby enabling access to the opener 31 and the like that are remote from the substrate transport robot 10.

However, requirements for the substrate transfer robot 10 are required to have a high throughput in addition to a footprint saving and cleanness while ensuring a necessary and sufficient operating range as described above. That is, in order to improve the production number of semiconductor manufacturing, the substrate carrying robot 10 is required to increase the number of pieces that can be carried per unit time.
Accordingly, the substrate transfer robot 10 as described above is required to have high-speed movement performance in order to improve throughput. Therefore, it is necessary to increase the moving speed of the traveling mechanism 19 and each arm. A metal material such as an aluminum alloy or stainless steel is mainly used for the components of each axis of the traveling mechanism 19 and the arm. In order to increase the moving speed of each axis, it is necessary to reduce the weight of moving parts, but to provide the same rigidity as conventional parts and to reduce the weight, special and expensive materials such as ceramics and CFRP are used. It is necessary to use it, which increases the cost.
Further, in order to increase the moving speed, it is necessary to increase the capacity of the drive motor and increase the rigidity of the drive mechanism. However, there is a problem that the drive mechanism is increased in size and goes against the weight reduction.
Furthermore, if the operation speed of each axis is set to a large value, there is a problem that if the instantaneous power failure occurs while the substrate transfer robot 10 is moving with the substrate W mounted, the transferred wafer is dropped.
The present invention has been made in view of such problems, and an object of the present invention is to provide a substrate transfer robot and a substrate transfer apparatus that improve the throughput of the substrate transfer robot 10 and that are clean and footprint-saving.
JP 2004-44989 A (FIG. 2)

In order to solve the above problem, the present invention is configured as follows.
The invention according to claim 1 is a substrate transport robot for transporting a substrate to a target position, a hand for holding the substrate, an arm portion for supporting the hand at a tip, and supporting the arm portion. A first and second robot parts comprising a body, a first traveling base that supports the first robot part, a second traveling base that supports the second robot part, and the first And a common base that supports the second traveling base, wherein the first robot unit and the second robot unit are freely movable by the first and second traveling bases, respectively. The substrate transport robot is characterized by being capable of traveling at a high speed.
According to a second aspect of the present invention, the common base supports the first traveling base and the second traveling base on a vertical plane, and the first traveling base and the second traveling base are mutually connected. 2. The substrate transfer robot according to claim 1, wherein the substrate transfer robot is disposed above and below and supports the first robot unit and the second robot unit so that they can run in parallel with each other.
According to a third aspect of the present invention, the first traveling base extends in a horizontal direction more than the second traveling base, and the first robot unit and the second robot unit are at the same height. The substrate transport robot according to claim 2, wherein the substrate transport robot is supported by each of the first travel base and the second travel base.
According to a fourth aspect of the present invention, the hand includes a first hand and a second hand, and each of the first hand and the second hand is freely rotatable with a common rotating shaft at the tip of the arm portion. The substrate transfer robot according to claim 1, wherein the substrate transfer robot is rotatably supported by the robot.
According to a fifth aspect of the present invention, the arm portion is rotatably supported in a horizontal direction at a tip end of the first arm, one end of which is rotatably supported in a horizontal direction on a lifting shaft whose one end is lifted and lowered from the body. And the first and second robot parts are mutually connected to such an extent that the turning of one of the first arms does not interfere with the virtual line when the other lifting shaft travels. When approaching and being supported by the first travel base and the second travel base and one arm portion is raised by the lifting shaft, the other arm portion can travel under the one arm portion. A substrate transfer robot according to claim 3, wherein the substrate transfer robot is provided.
The invention according to claim 6 is characterized in that when the first and second robot parts run by the running base, the arm parts run while the elbows of the arm parts face each other. The substrate transfer robot according to claim 5 is provided.
The invention according to claim 7 is a locally cleaned housing, wherein the substrate transport robot stores a substrate transport robot for transporting a substrate therein, wherein the substrate transport robot includes a hand for holding a substrate; A first and a second robot part comprising an arm part for supporting the hand at a tip; a body for supporting the arm part; a first traveling base for supporting the first robot part; A second traveling base that supports the two robot units, and a common base that supports the first traveling base and the second traveling base, and the common base is disposed on a side surface of the inner wall of the substrate transfer apparatus. The substrate transfer device is installed, wherein the first robot unit and the second robot unit can freely travel by the first and second traveling bases, respectively.
According to an eighth aspect of the present invention, the common base supports the first traveling base and the second traveling base in a vertical plane, and the first traveling base and the second traveling base are mutually connected. 8. The substrate transfer apparatus according to claim 7, wherein the substrate transfer apparatus is disposed above and below and supports the first robot unit and the second robot unit so that they can run in parallel with each other.
According to a ninth aspect of the present invention, the first traveling base extends in a horizontal direction more than the second traveling base, and the first robot unit and the second robot unit are at the same height. The substrate transport apparatus according to claim 7, wherein the substrate transport apparatus is supported by each of the first traveling base and the second traveling base.
According to a tenth aspect of the present invention, the hand includes a first hand and a second hand, and each of the first hand and the second hand is freely rotatable with a common rotating shaft at the tip of the arm portion. The substrate transfer robot according to claim 7, wherein the substrate transfer robot is rotatably supported on the substrate.
According to an eleventh aspect of the present invention, the arm portion can be rotated in the horizontal direction at the tip of the first arm, the first arm having one end rotatably supported in a horizontal direction on a lifting shaft that moves up and down from the body. And the first and second robot parts are mutually connected to such an extent that the turning of one of the first arms does not interfere with the virtual line when the other lifting shaft travels. When approaching and being supported by the first travel base and the second travel base and one arm portion is raised by the lifting shaft, the other arm portion can travel under the one arm portion. The substrate carrying robot according to claim 9, wherein the substrate carrying robot is provided.
According to a twelfth aspect of the present invention, when the first and second robot parts each run by the running base, the arm parts run while the elbows of the arm parts face each other. A substrate transfer robot according to claim 11.
According to a thirteenth aspect of the present invention, there is provided a semiconductor manufacturing apparatus including the substrate transfer robot according to the first aspect.
According to a fourteenth aspect of the present invention, there is provided a semiconductor manufacturing apparatus comprising the substrate transfer apparatus according to the seventh aspect.

As described above, according to the present invention, since the operations of the first and second robot units can be performed at the same time, the substrate can be carried in and out at two access points at the same time, and the throughput can be improved. In addition, a substrate transfer robot having a small footprint can be provided in spite of having two robot units. In addition, since the common base of the traveling mechanism can be installed on the inner wall side surface of the substrate transfer device, clean transfer is possible without disturbing the clean airflow of the fan filter provided in the substrate transfer device.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

First, in the substrate transfer robot 10 according to the present invention, the configuration of the robot unit excluding the traveling mechanism 19 will be described. As will be described later, since the substrate transfer robot 10 of the present invention has two robot units, a single robot unit will be described as a representative. FIGS. 4A and 4B are external views of one robot unit in the substrate transfer robot 10 excluding the traveling mechanism 19. In addition, the same number is attached | subjected about the location equivalent to a prior art.
4 (a) and 4 (b), the robot unit includes a plate-like traveling base 15 having a plane on a vertical surface, a body 16 positioned on a side surface of the traveling base 15, and an arm rotatably attached to the body 16. It is generally composed of a portion 24 and a hand 13 that is rotatably attached to the tip of the arm portion 24.
The arm portion 24 is rotatable in the horizontal direction on the distal end of the first arm 11 and the first arm 11 having a proximal end rotatably attached to the lifting shaft 14 that moves up and down on the upper surface of the body 16. The second arm 12 is provided with a base end, and the hand 13 is provided with a base end rotatably attached in a horizontal direction on the tip of the second arm 12. A substrate W is mounted on the hand 13. The elevating shaft 14 is moved up and down on the Z axis by an elevating mechanism (not shown) housed in the body 16 as shown in FIG. The first arm 11 rotates about the θ1 axis with respect to the body 16. The second arm 12 rotates about the θ2 axis with respect to the first arm 11. The hand 13 rotates about the θ3 axis with respect to the second arm 12.
The hand 13 in this embodiment is composed of two first hands 13a and a second hand 13b that are vertically stacked as shown in FIG. 4C, and a substrate W can be mounted on each hand. . The first and second hands can rotate independently about a common axis θ3 axis and θ4 axis, respectively.
As described above, the robot unit of this embodiment includes the θ1 axis of the first arm rotation axis, the θ2 axis of the second arm rotation axis, the rotation axes θ3 and θ4 axes of the upper and lower hands 10, and the lifting and lowering of the arm unit 24. It is composed of a total of 5 degrees of freedom of the Z axis.

Next, the overall configuration of the substrate transfer robot 10 of the present invention will be described. FIG. 1 is a top view (a) and a side sectional view (b) showing a front end 30 to which a substrate transfer robot 10 of the present invention is applied. The basic configuration of the front end 30 is the same as that described with reference to FIG. An operator 22 indicates an operator who installs the cassette 32 on the opener 31. Assume that the front side of the front end 30 is a side on which the operator 22 can access the opener 31, and the back side of the front end 30 is the side on which the processing chamber 34 is installed. In this embodiment, the aligner 35 is installed on the same back side as the processing chamber 34.
As shown in FIG. 1, in the substrate transfer robot 10 of the present invention, two traveling units 19 described above are provided in one traveling mechanism 19. The traveling mechanism 19 includes a common base 18, a linear guide 17, and a traveling base 15. The traveling base 15 is a member that supports the body 16 in the robot unit described above. The common base 18 is installed on the inner wall of the front end 30 on the side where a plurality of processing chambers 34 are arranged on the outer wall. There are a plurality of linear guides 17 that support the traveling base 15 and guide the robot unit so that it can move along the direction in which the processing chamber 34 and the opener 31 are arranged. The traveling base 15 includes a first traveling base 15a and a second traveling base 15b, and these are movable freely in parallel with each other. The traveling base 15 is driven by a linear motor (not shown) or a rotary motor and a ball screw. The first travel base 15a and the second travel base 15b each support the above-described robot unit. For the sake of explanation, the robot part supported by the first traveling base 15a is referred to as a first robot part 25a, and the robot part supported by the second traveling base 15b is referred to as a second robot part 25b.
In the substrate transfer robot 10 of the present invention, the second robot portion 25b is supported by the second traveling base 15b so as to be able to travel at a position close to the inner wall on the back side in the front end 30. The first robot unit 25a is supported by the first traveling base 15a so as to be able to travel at a position closer to the inner wall on the front side than the second robot unit 25b. The first traveling base 15a is installed below the second traveling base 15b in the common base 18, and is further extended to the front side to support the first robot unit 25a. Thus, the first robot unit 25a and the second robot unit 25b are supported so as to have substantially the same height. The first robot unit 25a and the second robot unit 25b travel on the first traveling base 15a and the second traveling base 15b, respectively, and extend the arm unit 24 to extend all the openers 31, the processing chamber 34, and the aligner 35 in the figure. Is accessible. Further, the arm portions 24 of the first robot portion and the second robot portion are moved up and down by the lift shaft 14 described above, and the hand 13 can access the uppermost substrate W from the lowermost stage of the cassette 32.
That is, as described above, the traveling mechanism 19 of the substrate transfer robot 10 according to the present invention has two traveling bases 15 on one common base 18, and each traveling base 15 includes a robot unit. Therefore, the throughput of transporting the substrate W to the plurality of processing chambers 34 can be improved.
In addition, since the two common robot units 18 are provided on the common base 18, the installation area of the conventional substrate transfer robot 10 described with reference to FIG. Further, in the present invention, the traveling mechanism 19 is configured to be installed on the side surface of the inner wall of the front end 30, so that the downward flow of the clean air from the fan filter 33 is not obstructed below the front end 30. Can be discharged.

Furthermore, in the present invention, at least the arm portion 24 of the first robot portion 25a is located further below the arm portion 24 of the second robot portion 25b than when the lowermost substrate W of the cassette 32 is accessed. Can descend. On the other hand, at least the arm part 24 of the second robot part 25b can be lowered to a position positioned further below when the arm part 24 of the first robot part 25a is accessing the processing chamber 34.
This is shown in FIG. 1 (a) and FIG. In FIG. 1A, when the second robot unit 25b is accessing the substrate W near the lowermost stage of any cassette 32, the arm unit 24 of the first robot unit 25a is the first arm of the second robot unit 25b. 11 on the lower surface. In FIG. 2, when the first robot unit 25 a is accessing the processing chamber 34, the arm unit 24 of the second robot unit 25 b is located further on the lower surface than the first arm 11 of the first robot unit 25 a. Yes. Thus, even when the two robot units are accessing the access point on the side opposite to the side where one of the two robot units is installed, the other drives the lower surface of the one arm unit 24 to drive the traveling mechanism 19. It is possible to run by.

Here, in the present invention, in order to further reduce the depth dimension 20 of the front end 30 as much as possible, the first arm 11 of one arm portion 24 is disposed at a position that does not contact the other lifting shaft 14. Yes. For example, the first robot unit is installed at a position where the first arm 11 of the first robot unit can turn without interfering with the lifting shaft traveling line 23 that is a traveling line when the lifting shaft 14 of the second robot unit travels. (See FIG. 1B). As a result, even if the two robot parts are at the same position in the width direction of the front end 30, one arm part 24 moves up the lifting shaft 14 higher than the other arm part 24, so that each arm part Since 24 interferences can be avoided, the two robot units can approach each other as much as possible in the depth direction of the front end 30, and the depth dimension 20 which is the depth dimension of the front end 30 can be reduced.
Further, with this configuration, at least each of the robot units is in a state in which the arm unit 24 is contracted with respect to each arm unit 24 when the traveling mechanism 19 drives in the width direction of the front end 30, and each first unit The arm 11 is controlled to run with the tip of the arm 11, that is, the elbow of the arm unit 24 facing the inside of each robot unit. For example, as shown in FIGS. 1A and 1B, the arm portion 24 of the first robot portion always has the front end of the first arm 11 facing the substantially back side of the front end 30 and the front end of the second arm 12 when traveling. The vehicle travels while being controlled so that the front end of the front end 30 faces substantially the front side and the front end of the hand 13 faces the left or right direction of the front end 30. As a result, even if the second robot unit is in the state of accessing the access point on the front side of the front end 30, the first robot unit is not in a position where even the height direction of the arm unit 24 interferes, the second robot unit It is possible to access the target access point safely through the lower surface of the arm portion 24 without interfering with the surroundings, and the depth direction of the front end 30 can be minimized. FIG. 3 is a top view showing these states. In FIG. 3, when both the first robot part and the second robot part are traveling, the arm parts 24 are traveling with their elbows facing each other inward. Of course, when one runs behind the other, the position in the height direction of the other arm portion 24 is detected, and the arm portion 24 is lowered to a position lower than that, or is run while being lowered. To do.

As described above, according to the substrate transfer robot 10 of the present invention, since the operations of the first robot unit and the second robot unit can be performed simultaneously, the substrate can be carried in / out at two access points simultaneously as shown in FIG. As a result, the throughput of the substrate transfer apparatus can be improved. In addition, a substrate transfer robot having a small footprint can be provided in spite of having two robot units. In addition, since the common base 18 of the traveling mechanism 19 can be installed on the inner wall side surface of the front end 30, clean conveyance can be performed without disturbing the clean airflow of the fan filter 33.
In this embodiment, each of the first robot unit and the second robot unit 13 has two hands. However, even if the first robot unit has one hand, the throughput is higher than the conventional one. Needless to say, it will improve.

The figure which shows the front end to which the board | substrate conveyance robot of this invention was applied. The side view which shows the state in which the 1st robot part is accessing the access point of the other side FIG. 1 is a top view showing a state where each robot unit is traveling. External view showing only the robot portion of the substrate transfer robot of the present invention In FIG. 1, a top view showing a state where two robot units are simultaneously accessing two access points. Diagram showing a conventional substrate transfer robot and front end incorporating it

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Substrate transfer robot 11 1st arm 12 2nd arm 13 Hand 13a 1st hand 13b 2nd hand 14 Lifting shaft 15 Traveling base 15a 1st traveling base 15b 2nd traveling base 16 Body 17 Linear guide 18 Base 19 Traveling mechanism

20 Depth dimension 21 Width dimension 22 Worker 23 Elevating shaft travel line 24 Arm part 25 Robot part 25a First robot part 25b Second robot part

30 Front end (Board transfer device)
31 Opener 32 Cassette 33 Fan filter 34 Processing chamber 35 Aligner

W substrate

Claims (14)

In the substrate transfer robot that transfers the substrate to the target position,
First and second robot units each including a hand that holds the substrate, an arm unit that supports the hand at a tip, and a body that supports the arm unit;
A first traveling base that supports the first robot part; a second traveling base that supports the second robot part;
A common base that supports the first traveling base and the second traveling base;
The substrate transport robot, wherein the first robot unit and the second robot unit can freely travel on the first and second travel bases, respectively.   The common base supports the first traveling base and the second traveling base in a vertical plane, and the first traveling base and the second traveling base are arranged above and below each other, and 2. The substrate transfer robot according to claim 1, wherein the robot unit and the second robot unit are supported so as to be able to run in parallel with each other.   The first traveling base extends in a horizontal direction with respect to the second traveling base, and the first traveling base and the second traveling robot have the same height. The substrate transfer robot according to claim 2, wherein the substrate transfer robot is supported by each of the second traveling base and the second traveling base.   The hand is composed of a first hand and a second hand, and each of the first hand and the second hand is supported so as to be freely rotatable with respect to each other by a common rotating shaft at the tip of the arm portion. The substrate transfer robot according to claim 1, wherein: A first arm whose one end is rotatably supported in a horizontal direction on an elevating shaft whose one end is raised and lowered from the body; a second arm that is rotatably supported in a horizontal direction on a tip end of the first arm; Consisting of
The first and second robot parts are moved closer to each other to the extent that the turning of one of the first arms does not interfere with the virtual line when the other lifting shaft travels, and the first traveling base and the second traveling 4. The substrate transfer according to claim 3, wherein the other arm portion can run under a portion of the one arm portion when the one arm portion is supported by a base and lifted by the lifting shaft. robot.   6. The substrate transfer robot according to claim 5, wherein when the first and second robot parts run by the running base, the arm parts run with the elbows of the arm parts facing each other. . In a substrate transport apparatus that houses a substrate transport robot that transports a substrate inside, which is a locally cleaned housing,
The substrate transfer robot includes first and second robot units each including a hand that holds a substrate, an arm unit that supports the hand at a tip, and a body that supports the arm unit;
A first traveling base that supports the first robot part; a second traveling base that supports the second robot part;
A common base that supports the first traveling base and the second traveling base;
The common base is installed on an inner wall side surface of the substrate transfer device;
The substrate transfer apparatus, wherein the first robot part and the second robot part can freely travel by the first and second traveling bases, respectively.   The common base supports the first traveling base and the second traveling base in a vertical plane, and the first traveling base and the second traveling base are arranged above and below each other, and 8. The substrate transfer apparatus according to claim 7, wherein the robot unit and the second robot unit are supported so as to be able to run in parallel with each other.   The first traveling base extends in a horizontal direction with respect to the second traveling base, and the first traveling base and the second traveling robot have the same height. The substrate transfer device according to claim 7, wherein the substrate transfer device is supported by each of the second traveling base and the second traveling base.   The hand is composed of a first hand and a second hand, and each of the first hand and the second hand is supported so as to be freely rotatable with respect to each other by a common rotating shaft at the tip of the arm portion. 8. The substrate transfer robot according to claim 7, wherein A first arm whose one end is rotatably supported in a horizontal direction on an elevating shaft whose one end is raised and lowered from the body; a second arm that is rotatably supported in a horizontal direction on a tip end of the first arm; Consisting of
The first and second robot parts are moved closer to each other to the extent that the turning of one of the first arms does not interfere with the virtual line when the other lifting shaft travels, and the first traveling base and the second traveling 10. The substrate transfer according to claim 9, wherein when the one arm portion is supported by a base and is raised by the elevating shaft, the other arm portion can run under the one arm portion. robot.   12. The substrate transfer robot according to claim 11, wherein when the first and second robot parts each run by the running base, the arm parts run while the elbows of the arm parts face each other. .   A semiconductor manufacturing apparatus comprising the substrate transfer robot according to claim 1.   A semiconductor manufacturing apparatus comprising the substrate transfer apparatus according to claim 7.

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