JP2010135425A - Reaction force processing mechanism, stage apparatus provided with the same, and semiconductor inspection apparatus provided with the stage apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a downsized reaction force processing mechanism, a stage apparatus provided with the reaction force processing mechanism, and a semiconductor inspection apparatus provided with the stage apparatus. <P>SOLUTION: The reaction force processing mechanism 21 for processing reaction force applied to a plate 3 by the movement of an X axis stage 7 provided in the stage apparatus is provided with: a linear motor 26 for reaction processing which is provided with a magnet shaft 26A fixed to the plate 3 and a coil unit 26B connected to a rack and applies force to the plate 3; a first guide part 30 which is provided between the coil unit 26B and the plate 3 and guides the coil unit 26B in an X axis direction relative to the plate 3; and a transmission mechanism 27 which is provided between the coil unit 26B and the rack, and transmits the force in the X axis direction applied to the coil unit 26B to the rack. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a reaction force processing mechanism provided in a stage apparatus for processing a reaction force generated by movement of a stage, a stage apparatus including the reaction force processing mechanism, and a semiconductor inspection apparatus including the stage apparatus.

Conventionally, there is JP-A-11-329962 as a technique in such a field. The stage device described in this publication includes a foundation, a surface plate supported by the foundation via a vibration damping device, a stage that moves on the surface plate, and a foundation that applies force to the surface plate. A reaction force processing actuator for canceling the reaction force applied to the surface plate by the movement of the stage.
JP-A-11-329962

  By the way, when a linear motor is employed as the reaction force processing actuator in the above-described conventional stage device, the stator of the linear motor is fixed to the foundation and the mover is fixed to the surface plate. In this case, if a relative displacement occurs between the foundation and the surface plate due to an external force or the like, the stator and the mover may come into contact with each other and the linear motor may be damaged. If the interval between the stator and the mover is increased in order to avoid this damage, there is a problem that the linear motor, that is, the stage device is increased in size.

  It is an object of the present invention to provide a reaction force processing mechanism that can be miniaturized, a stage device including the reaction force processing mechanism, and a semiconductor inspection apparatus including the stage device.

  The present invention is provided in a stage apparatus having a gantry, a surface plate supported by the gantry via a vibration isolation unit, and a stage that is disposed on the surface plate and moves in the direction of a predetermined first axis, In a reaction force processing mechanism for processing a reaction force applied to a surface plate by moving a stage, the reaction force processing mechanism includes a mover fixed to the surface plate and a stator connected to a mount, and applies a force to the surface plate. A linear motor for force processing, a first guide portion provided between the stator and the surface plate, for guiding the stator in the direction of the first axis with respect to the surface plate; and between the stator and the mount And a transmission means for transmitting the force in the direction of the first axis applied to the stator to the gantry.

  In this reaction force processing mechanism, when the reaction force applied to the surface plate by the movement of the stage is processed, the stator is driven via the transmission means by driving the mover relative to the stator in the reaction force processing linear motor. A force that displaces the surface plate fixed to the mover in the direction of the first axis with respect to the gantry connected to the base can be generated, thereby counteracting the reaction force applied to the surface plate. In addition, since the stator is also connected to the surface plate via the first guide portion, the stator and the surface plate, that is, the stator and the stator, even if relative displacement occurs between the gantry and the surface plate. It is possible to suppress relative displacement from occurring between the movable element. Therefore, in this reaction force processing mechanism, the contact between the stator and the mover can be suppressed without increasing the distance between the stator and the mover, so that the reaction force processing mechanism can be downsized.

  Further, the first guide portion is in at least one of a direction of the second axis orthogonal to the direction of the first axis and a direction of the third axis orthogonal to the direction of the first axis and the direction of the second axis. It is preferable to restrain the movement of the stator with respect to the surface plate. According to this configuration, since the movement of the stator with respect to the surface plate is restricted by the first guide portion, it is possible to suppress the occurrence of relative displacement between the stator and the surface plate, that is, the stator and the mover. This prevents contact between the stator and the mover.

  Moreover, it is preferable that a transmission means absorbs the displacement of the stator with respect to a mount frame in directions other than the direction of a 1st axis | shaft. According to this configuration, even if relative displacement occurs between the gantry and the stator, stress in any direction other than the direction of the first axis is released in the transmission means, so that an excessive load is applied to the transmission means. Can be avoided, thereby improving the durability of the transmission means, that is, the durability of the reaction force processing mechanism.

  The transmission means includes a second guide portion for guiding the stator in the direction of the second axis perpendicular to the direction of the first axis, and the direction of the third axis perpendicular to the direction of the first axis and the direction of the second axis. It is preferable to have at least one of the third guide portion for guiding the stator. According to this configuration, absorption of the displacement of the stator relative to the gantry is realized in at least one of the second axis direction and the third axis direction.

  The transmission means includes a first transmission member provided on the stator side, a second transmission member provided on the gantry side, and a universal joint that connects the first transmission member and the second transmission member. It is preferable to have. According to this structure, absorption of the rotational displacement of the stator with respect to the gantry is realized by rotatably connecting the first transmission member and the second transmission member by the universal joint.

  The universal joint is disposed between the first and second transmission members, and is formed in a sphere that forms a gap between the first and second transmission members, and the first and second transmission members, respectively. And a recess into which a part of the sphere enters. According to this configuration, absorption of rotational displacement of the stator relative to the gantry can be realized with a simple structure.

  The stage apparatus which concerns on this invention was equipped with the reaction force processing mechanism as described in any one of Claims 1-6. According to this stage apparatus, since the reaction force processing mechanism according to the present invention is provided, the stage apparatus can be downsized in accordance with the downsizing of the reaction force processing mechanism.

  A semiconductor inspection apparatus according to the present invention includes the stage apparatus according to claim 7. According to this semiconductor inspection apparatus, since the reaction force processing mechanism according to the present invention is provided, the semiconductor inspection apparatus can be downsized in accordance with the downsizing of the stage apparatus.

  According to the present invention, the apparatus can be miniaturized.

  Hereinafter, preferred embodiments of a reaction force processing mechanism according to the present invention, a stage device including the reaction force processing mechanism, and a semiconductor inspection apparatus including the stage device will be described in detail with reference to the drawings. As shown in the drawing, the X axis and the Y axis are 90 degrees on the horizontal plane, the vertical direction is defined as the Z axis direction, and the X axis, Y axis, and Z axis are used below when necessary.

  As shown in FIGS. 1 to 4, the stage apparatus 1 is incorporated in a semiconductor inspection apparatus (not shown) for inspecting the external appearance of a semiconductor wafer, for example, and is arranged to face an inspection device such as a microscope. This is an XY stage device used for position adjustment of a semiconductor wafer. The stage apparatus 1 includes a base 2 serving as a base, a square plate-like surface plate 3 disposed on the base 2, a Y-axis stage 4 that moves in the Y-axis direction along the surface 3, and a Y-axis stage 4. A Y-axis shaft motor 5 that functions as a drive unit for the X-axis, an X-axis stage 7 that moves on the Y-axis stage 4 in the X-axis direction (the direction of the first axis), and an X-axis that functions as a drive unit for the X-axis stage 7 A shaft motor 6.

  The gantry 2 has four legs 2a that stand on a factory floor or the like. Two first beam members 2b extending in the X-axis direction and two second beam members 2c extending in the Y-axis direction are spanned between the legs 2a. A third beam member 2d extending in the Y-axis direction is provided between the first beam members 2b. The third beam member 2d is provided at a position shifted from a line connecting the centers of the two first beam members 2b (see FIG. 5).

  Four vibration isolation units 8 are fixed to the upper ends of the four legs 2a of the gantry 2, respectively. A surface plate 3 is fixed to the upper surface of the vibration isolation unit 8. The vibration isolation unit 8 is made of, for example, an elastic material such as an air spring or rubber, and is removed by attenuating vibration transmitted from the gantry 2 to the surface plate 3.

  In the center of the surface plate 3, a substantially rectangular opening 3a extending in the Y-axis direction is formed. A Y-axis magnet shaft 5A extending in the Y-axis direction is disposed in the opening 3a, and both ends of the Y-axis magnet shaft 5A are supported by a pair of Y-axis shaft support portions 10 fixed to the surface plate 3. ing. On the upper surface of the surface plate 3, a Y-axis linear scale 11 extending in the Y-axis direction is disposed along the opening 3a.

  The Y-axis magnet shaft 5A is inserted into a through hole that penetrates the block-shaped Y-axis coil unit 5B in the Y-axis direction. An air-core coil extending in the Y-axis direction is disposed in the Y-axis coil unit 5B. The through hole of the Y-axis coil unit 5B is formed so as to pass through the central air core part of the air core coil, and the Y axis magnet shaft 5A is passed through the air core part of the air core coil. A Y-axis stage 4 is fixed on the upper surface of the Y-axis coil unit 5B. The Y-axis magnet shaft 5 </ b> A and the Y-axis coil unit 5 </ b> B constitute a Y-axis shaft motor 5 that functions as a drive unit for the Y-axis stage 4.

  On the surface plate 3, two Y-axis guide rails 12A extending in the Y-axis direction are provided with the opening 3a interposed therebetween. On the lower surface of the Y-axis stage 4, two Y-axis slider portions 12B that slide along the Y-axis guide rail 12A are provided. The Y-axis guide rail 12A and the Y-axis slider portion 12B constitute a Y-axis guide portion 12 for guiding the Y-axis stage 4 in the Y-axis direction.

  The Y-axis stage 4 is a member having a U-shaped cross section while extending in the X-axis direction. A Y-axis scale head (not shown) is attached to the lower part of the Y-axis stage 4 so as to face the Y-axis linear scale 11 on the surface plate 3. The Y axis scale head detects the position of the Y axis stage 4 with respect to the surface plate 3 in the Y axis direction by optically detecting the scale of the Y axis linear scale 11.

  An X-axis magnet shaft 6 </ b> A extending in the X-axis direction is fixed to one side surface (side surface extending in the X-axis direction) of the Y-axis stage 4. Both ends of the X-axis magnet shaft 6 </ b> A are supported by a pair of X-axis shaft support portions 14 fixed to the side surface of the Y-axis stage 4. The X-axis coil unit 6B has the same configuration as the Y-axis coil unit 5B described above. An X-axis magnet shaft 6A is inserted into a through hole that penetrates the X-axis coil unit 6B in the X-axis direction. The upper surface of the X-axis coil unit 6B is fixed to one end of a plate-like X-axis stage 7 extending in the Y-axis direction. The X-axis magnet shaft 6 </ b> A and the X-axis coil unit 6 </ b> B constitute an X-axis shaft motor 6 that functions as a drive unit for the X-axis stage 7.

  Two X-axis guide rails 15 </ b> A extending in the X-axis direction are provided on the upper surface of the Y-axis stage 4. In addition, two X-axis slider portions 15B that slide along the X-axis guide rail 15A are provided on the lower surface of the X-axis stage 7. The X-axis guide rail 15A and the X-axis slider portion 15B constitute an X-axis guide portion 15 that guides the X-axis stage 7 in the X-axis direction.

  An X-axis linear scale 16 extending in the X-axis direction is provided on the other side surface of the Y-axis stage 4. An X-axis scale head 17 is attached to the other end of the X-axis stage 7 in the Y-axis direction (the end opposite to the end where the X-axis coil unit 6B is fixed) so as to face the X-axis linear scale 16. Yes. The X-axis scale head 17 detects the position of the X-axis stage 7 relative to the surface plate 3 in the X-axis direction by optically detecting the scale of the X-axis linear scale 16.

  As shown in FIGS. 1 and 6 to 8, X-axis stage reaction for processing reaction force applied to the surface plate 3 by movement of the X-axis stage 7 is provided at both ends of the surface plate 3 in the Y-axis direction. A force processing mechanism 21 is provided. The reaction force processing mechanism 21 is disposed on an extension line of the Y-axis magnet shaft 5A. The reaction force processing mechanism 21 is not necessarily arranged on the extension line of the Y-axis magnet shaft 5A, and may be provided on the surface plate 3 along the moving direction of the X-axis stage 7, that is, along the X-axis. That's fine. In addition, it is not always necessary to provide it on both ends of the surface plate 3, and it is effective even if it is provided only on one end.

  The reaction force processing mechanism 21 is connected to the gantry 2 via a magnet shaft (movable element) 26A fixed to the surface plate 3 via block-like support bases 22 and 23 and a transmission means (transmission means) 27 described later. And a reaction force processing shaft motor (reaction force processing linear motor) 26 including a block-shaped coil unit (stator) 26B. The reaction force processing shaft motor 26 has the same configuration as the X-axis shaft motor 6 described above, and a magnet shaft 26A extending in the X-axis direction is inserted into a through-hole penetrating the coil unit 26B in the X-axis direction. ing.

  A transmission mechanism 27 is provided between the coil unit 26B and the gantry 2 to transmit the force in the X-axis direction applied to the coil unit 26B to the gantry. The transmission mechanism 27 includes a first stator coupling member 28 and a second stator coupling member 29 coupled to the coil unit 26B, a displacement mechanism portion 31 for absorbing the displacement of the coil unit 26B with respect to the gantry 2, And a gantry coupling member 40 coupled to the gantry 2.

  The first stator connecting member 28 is a U-shaped member opened toward the surface plate 3 in the Y-axis direction, and is fixed to the lower surface of the coil unit 26B. Between the first stator connecting member 28 and the surface plate 3, a first guide portion 30 that guides the coil unit 26 </ b> B in the X-axis direction along the surface plate 3 is provided. The first guide portion 30 includes a first guide rail 30 </ b> A fixed to the surface plate 3 and a first slider portion 30 </ b> B fixed to the first stator connecting member 28. The first guide rail 30A extends in the X-axis direction, and the first slider portion 30B slides in the X-axis direction along the first guide rail 30A.

  An L-shaped second stator connection member 29 is fixed to the lower end of the first stator connection member 28. The first stator connecting member 28 and the second stator connecting member 29 are reinforced with a spring-like reinforcing plate. A displacement mechanism 31 for absorbing the displacement of the coil unit 26 </ b> B relative to the gantry 2 is coupled to the lower end of the second stator coupling member 29. Between the displacement mechanism section 31 and the gantry 2, a gantry coupling member 40 having an L-shaped cross section for coupling the displacement mechanism section 31 and the gantry 2 is provided.

  The displacement mechanism section 31 includes a second guide section 32 that absorbs displacement in the Z-axis direction (second axis direction) of the coil unit 26B, a rotation mechanism section 33 that absorbs rotational displacement of the coil unit 26B, and a coil unit. And a third guide portion 34 that absorbs displacement in the Y-axis direction (the direction of the third axis) of 26B. Furthermore, the rotation mechanism unit 33 includes a block-shaped first transmission member 35 and a second transmission member 36, and a sphere 37 disposed between the first transmission member 35 and the second transmission member 36, It comprises four restraining bolts 38 for restraining toward the distance between the first transmission member 35 and the second transmission member 36.

  The second guide portion 32 has the same configuration as that of the first guide portion 30, and includes a second guide rail 32 </ b> A fixed to the second stator connecting member 29 and a first transmission member 35. And a second slider portion 32B fixed to the head. The second guide rail 32A extends in the Z-axis direction, and the second slider portion 32B slides in the Z-axis direction along the second guide rail 32A.

  The 1st transmission member 35 and the 2nd transmission member 36 are arrange | positioned facing the X-axis direction. A substantially conical recess 35 a is formed on the inner surface of the first transmission member 35 (the surface facing the second transmission member 36). Similarly, a substantially conical recess 36a is formed on the inner surface of the second transmission member 36 (the surface facing the first transmission member 35). Both ends of the sphere 37 enter the recesses 35a and 36a in the X-axis direction, and a gap is formed between the first transmission member 35 and the second transmission member 36 in this state. The spherical body 37 and the recesses 35a and 36a constitute a universal joint 39 that rotatably connects the first transmission member 35 and the second transmission member 36.

  The holding bolts 38 are respectively inserted into through holes 36 b formed at the four corners of the second transmission member 36. The diameters of these through holes 36b are formed larger than the diameters of the holding bolts 38 to be inserted. Further, a screw groove is formed at the distal end portion of the holding bolt 38 and is screwed with a female screw portion 35 b formed in the first transmission member 35. The head of the restraining bolt 38 protrudes from the surface opposite to the facing surface of the second transmission member 36. A spring portion 38 a for urging the transmission member 36 toward the first transmission member 35 is provided.

  In the rotation mechanism section 33 configured as described above, the rotational displacement around the X axis, the rotational displacement around the Y axis, and the rotational displacement around the Z axis of the coil unit 26B are absorbed. Specifically, when the coil unit 26 </ b> B is rotationally displaced with respect to the gantry 2, the rotational displacement of the coil unit 26 </ b> B is absorbed without being transmitted to the gantry 2 due to the rotation of the first transmission member 35 in the universal joint 39. The At this time, since the diameter of the through hole 36b of the second transmission member 36 is formed larger than the diameter of the suppression bolt 38, the suppression bolt 38 rotates integrally with the first transmission member 35, and the first transmission member 35 rotates. The rotation of the transmission member 35 is not hindered. Further, since the second transmission member 36 is urged toward the first transmission member 35 by the spring portion 38a of the holding bolt 38, the sphere 37 is prevented from falling off during rotation.

  The third guide portion 34 has the same configuration as the first guide portion 30, and is fixed to the third guide rail 32 </ b> A fixed to the gantry connecting member 40 and the second transmission member 36. And a third slider portion 34B. The third guide rail 34A extends in the Y-axis direction, and the third slider portion 34B slides in the Y-axis direction along the third guide rail 34A.

  In the displacement mechanism portion 31, when the coil unit 26B is displaced in the Z-axis direction with respect to the gantry, the second slider portion 32B in the second guide portion 32 slides in the Z-axis direction, so that the coil unit 26B is displaced. Absorbs. Further, when the coil unit 26B is displaced in the Y-axis direction with respect to the gantry, the third slider portion 34B in the third guide portion 34 slides in the Y-axis direction, thereby absorbing the displacement of the coil unit 26B. When the coil unit 26B is rotationally displaced with respect to the gantry 2, the first transmission member 35 rotates with respect to the second transmission member 36, thereby absorbing the rotational displacement of the coil unit 26B. In this manner, the displacement mechanism unit 31 absorbs the displacement of the coil unit 26B in directions other than the X-axis direction. On the other hand, in the displacement mechanism portion 31, when the coil unit 26B is displaced in the X-axis direction, the second guide portion 32, the first transmission member 35, the spherical body 37, the second transmission member 36, and the third guide portion. 34, the displacement of the coil unit 26 </ b> B, that is, the force is transmitted to the gantry 2.

  In the reaction force processing mechanism 21 having the above configuration, when the reaction force applied to the surface plate 3 due to the movement of the X-axis stage 7 is processed, the reaction force processing shaft motor 26 causes the magnet shaft 26A to be applied to the coil unit 26B. By driving, a force is generated for displacing the surface plate 3 fixed to the magnet shaft 26A in the X-axis direction with respect to the gantry 2 connected to the coil unit 26B via the transmission mechanism 27, and thereby the surface plate 3 The reaction force applied to can be countered.

  Further, since the coil unit 26B is also connected to the surface plate 3 via the first guide portion 30, even if a relative displacement occurs between the gantry 2 and the surface plate 3, the coil unit 26B It is possible to suppress relative displacement between the surface plate 3, that is, the coil unit 26B and the magnet shaft 26A. Specifically, the displacement of the coil unit 26 </ b> B in a direction other than the X-axis direction is absorbed by the displacement mechanism unit 31 and is not transmitted to the gantry 2. As a result, the coil unit 26B is displaced integrally with the surface plate 3, that is, the magnet shaft 26A, in a direction other than the X-axis direction, which is the direction in which the shaft motor 26 is movable, so that the relative rotation between the coil unit 26B and the magnet shaft 26A is achieved. The occurrence of displacement can be prevented, and contact between the coil unit 26B and the magnet shaft 26A can be prevented. Accordingly, in the reaction force processing mechanism 21, it is possible to prevent the coil unit 26B and the magnet shaft 26A from contacting each other without increasing the distance between the coil unit 26B and the magnet shaft 26A. Thus, the size of the stage device 1 can be reduced.

  Further, in the reaction force processing mechanism 21, the coil unit 26B is integrally displaced with the magnet shaft 26A in a direction other than the X-axis direction, so that the mover and the stator are moved in a direction other than the moving direction of the mover such as a shaft motor. Therefore, it is possible to employ a motor that comes into contact with each other as a reaction force processing linear motor, which is advantageous for downsizing the reaction force processing linear motor, that is, downsizing the stage apparatus 1.

  Further, in the reaction force processing mechanism 21, substantially conical concave portions 35 a and 36 a are formed on the inner surfaces of the first transmission member 35 and the second transmission member 36. By configuring the universal joint 39 from the recesses 35a and 36a and the sphere 37, the rotation mechanism 33 can be simplified, that is, the reaction force processing mechanism 21 can be simplified.

  Further, in the displacement mechanism unit 31, in order to absorb the relative displacement between the gantry 2 and the coil unit 26B in directions other than the X-axis direction, vibration of the floor surface on which the gantry 2 is installed is transmitted to the coil unit 26B. Can be suppressed. As a result, it is possible to suppress the relative displacement between the surface plate 3 from which the vibration from the gantry 2 is removed by the vibration isolation unit 8 and the magnet shaft 26A and the coil unit 26B. Thus, the durability of the reaction force processing mechanism 21 is improved.

  Further, even when relative displacement occurs between the gantry 2 and the coil unit 26B, stress in any direction other than the X-axis direction is released in the displacement mechanism unit 31, so that the transmission mechanism 27 It is possible to avoid an excessive load from being applied, thereby improving the durability of the transmission mechanism 27, that is, the durability of the reaction force processing mechanism 21.

  As shown in FIGS. 4 and 5, a Y-axis stage reaction force processing mechanism 41 for processing a reaction force applied to the surface plate 3 by the movement of the Y-axis stage 4 is provided on the lower surface of the surface plate 3. ing. In the reaction force processing mechanism 41, unlike the reaction force processing mechanism 21, the first axis direction described in the claims corresponds to the Y-axis direction.

  The reaction force processing mechanism 41 is a block-like shape connected to the gantry 2 via a magnet shaft (movable element) 43A fixed to the surface plate 3 via a block-like support base 42 and a transmission means (transmission means) 44. And a reaction force processing shaft motor (reaction force processing linear motor) 43 including a coil unit (stator) 43B.

  The reaction force processing shaft motor 43 has the same configuration as the reaction force processing shaft motor 26 described above, and a magnet shaft 43A extending in the Y-axis direction has a through-hole that penetrates the coil unit 43B in the Y-axis direction. It is inserted.

  A transmission mechanism 44 is provided between the coil unit 43B and the third beam member 2d of the gantry 2 to transmit the force in the Y-axis direction applied to the coil unit 43B to the gantry. The transmission mechanism 44 includes a stator coupling member coupled to the coil unit 43B, a displacement mechanism unit having the same configuration as the displacement mechanism unit 31 described above, and a gantry coupling member coupled to the gantry 2. Yes. Further, a fourth guide portion 45 that guides the coil unit 43B in the Y-axis direction is provided between the transmission mechanism 44 and the lower surface of the surface plate 3. In the reaction force processing mechanism 41, the fourth guide portion 45 corresponds to the first guide portion described in the claims.

  With the reaction force processing mechanism 41 configured as described above, the same effects as those of the reaction force processing mechanism 21 described above can be obtained. Further, by providing the reaction force processing mechanism 41 on the lower surface of the surface plate 3, the stage device 1 can be downsized as compared with the case where it is provided on the side of the surface plate 3 or the like.

  It goes without saying that the present invention is not limited to the embodiment described above. For example, a magnet-facing linear motor having a U-shaped yoke to which a pair of opposing magnets are fixed and a coil disposed between the magnets may be employed as the reaction force processing linear motor.

  Further, the displacement mechanism unit 31 may omit any mechanism among the second guide unit 32, the rotation mechanism unit 33, and the third guide unit 34, that is, a direction in which the displacement mechanism unit 31 does not absorb the displacement. May be present. Further, the arrangement of these mechanisms is not limited to the order and position described above.

  Further, the universal joint 39 is not limited to the one composed of the sphere 37 and the recesses 35a and 36a. For example, in the 1st transmission member 35 or the 2nd transmission member 36, you may be comprised from a spherical projection part and the conical recessed part into which the front-end | tip of this projection part enters. A so-called universal joint may be adopted as the universal joint 39.

  Further, the first to fourth guide portions are not limited to linear guides, and may be configured by, for example, a leaf spring or an elastic body that can be displaced only in a predetermined direction, and may guide the coil unit in a predetermined direction. Good.

  The transmission mechanism 27 is not necessarily provided between the gantry 2 and the coil unit 26B, and may be provided between the floor and the coil unit 26B, for example. In this case, the reaction force of the reaction force processing mechanism 21 is transmitted not to the gantry 2 but to the floor.

It is a perspective view which shows the stage apparatus which concerns on this invention. It is a top view which shows the stage apparatus of FIG. It is a side view which shows the stage apparatus of FIG. It is sectional drawing which follows the IV-IV line of FIG. It is sectional drawing which follows the VV line of FIG. It is a side view of the reaction force processing mechanism shown in FIG. It is sectional drawing which follows the VII-VII line of FIG. It is a perspective view of the transmission mechanism shown in FIG.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Stage apparatus, 2 ... Base, 3 ... Surface plate, 4 ... Y-axis stage, 7 ... X-axis stage, 8 ... Anti-vibration unit, 21, 41 ... Reaction force processing mechanism, 26, 43 ... Reaction force processing shaft Motor (reaction force processing linear motor), 26A, 43A ... magnet shaft (mover), 26B, 43B ... coil unit (stator), 27, 44 ... transmission mechanism (transmission means), 30 ... first guide section 32 ... 2nd guide part, 34 ... 3rd guide part, 35 ... 1st transmission member, 35a ... Recessed part, 36 ... 2nd transmission member, 36a ... Recessed part, 37 ... Sphere, 39 ... Universal joint, 45. Fourth guide part (first guide part).

Claims (8)

The stage is provided in a stage device including a gantry, a surface plate supported by the gantry via a vibration isolation unit, and a stage that is disposed on the surface plate and moves in the direction of a predetermined first axis. In the reaction force processing mechanism that processes the reaction force applied to the surface plate by the movement of
A linear motor for reaction force processing that has a mover fixed to the surface plate, and a stator connected to the gantry, and applies force to the surface plate;
A first guide portion provided between the stator and the surface plate, for guiding the stator in the direction of the first axis with respect to the surface plate;
A reaction force processing mechanism, comprising: a transmission means provided between the stator and the gantry and transmitting a force in the direction of the first axis applied to the stator to the gantry.   The first guide portion is at least one of a second axis direction orthogonal to the first axis direction and a third axis direction orthogonal to the first axis direction and the second axis direction. The reaction force processing mechanism according to claim 1, wherein movement of the stator with respect to the surface plate is restricted.   The reaction force processing mechanism according to claim 1, wherein the transmission unit absorbs a displacement of the stator with respect to the gantry in a direction other than the direction of the first axis.   The transmission means includes a second guide portion for guiding the stator in a direction of a second axis orthogonal to the direction of the first axis, and a third orthogonal to the direction of the first axis and the direction of the second axis. The reaction force processing mechanism according to claim 3, further comprising at least one of a third guide portion that guides the stator in the axial direction.   The transmission means connects the first transmission member provided on the stator side, the second transmission member provided on the gantry side, and the first transmission member and the second transmission member. The reaction force processing mechanism according to claim 3, further comprising a universal joint.   The universal joint is disposed between the first and second transmission members, and a spherical body that forms a gap between the first and second transmission members, and the first and second transmission members, respectively. The reaction force processing mechanism according to claim 5, further comprising a recessed portion that is formed and into which a part of the sphere enters.   A stage apparatus comprising the reaction force processing mechanism according to any one of claims 1 to 6.   A semiconductor inspection apparatus comprising the stage apparatus according to claim 7.

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