JP2010109198A - Method of manufacturing wiring board - Google Patents

Method of manufacturing wiring board Download PDF

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JP2010109198A
JP2010109198A JP2008280577A JP2008280577A JP2010109198A JP 2010109198 A JP2010109198 A JP 2010109198A JP 2008280577 A JP2008280577 A JP 2008280577A JP 2008280577 A JP2008280577 A JP 2008280577A JP 2010109198 A JP2010109198 A JP 2010109198A
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conductive paste
resin film
insulating sheet
hole
burr
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JP5083906B2 (en
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Ryuichi Chuma
隆一 中馬
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Kyocera SLC Technologies Corp
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Kyocera SLC Technologies Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a wiring board of minute wiring excelling in electrical connection reliability between a penetration conductor and a wiring conductor and having high electrical insulation reliability between adjacent wiring conductors. <P>SOLUTION: This method of manufacturing the wiring board includes a process of forming a ring-like barr 1a swelled from a one-side principal surface of an insulation sheet 1 and forming a ring-like projection 2a projecting at a height not smaller than that of the burr 1a on the resin film 2 outside the burr 1a, by energy by irradiating an opening edge on a one-side principal surface side of a through-hole 3 with laser light in a process of boring the through-hole 3 making a resin film 2 and the insulation sheet 1 communicate with each other by irradiating the insulation sheet 1 with the resin film 2 stuck thereto with the laser light through the resin film 2 from the one-side principal surface side, then filling conductive paste 4 in a through-hole 4 up to the height of the projection 2a, and thereafter wiping the conductive paste 4 up to the height of the burr 1a. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、配線基板の絶縁層となる絶縁シートにレーザ加工により貫通孔を穿孔するとともに、その貫通孔内に導電ペーストを充填した後、絶縁シートの主面に金属箔から成る配線導体を、前記導電ペーストの端部を覆うように埋入する工程を含む配線基板の製造方法に関するものである。   The present invention pierces through holes by laser processing in an insulating sheet to be an insulating layer of a wiring board, and after filling the through holes with a conductive paste, wiring conductors made of metal foil on the main surface of the insulating sheet, The present invention relates to a method of manufacturing a wiring board including a step of embedding so as to cover an end portion of the conductive paste.

従来から、半導体素子等の電子部品を搭載するために用いられる配線基板として、ガラスクロス等の耐熱性繊維基材に未硬化の熱硬化性樹脂組成物を含浸させた絶縁シートを熱硬化させて成る絶縁層と銅箔等の金属箔から成る配線導体とを交互に積層すると共に、絶縁層を挟んで上下に位置する配線導体同士を、絶縁層に形成された貫通孔内に充填された導電ペーストを硬化させて成る貫通導体により電気的に接続して成る配線基板が知られている。   Conventionally, an insulating sheet impregnated with an uncured thermosetting resin composition in a heat-resistant fiber base material such as glass cloth is used as a wiring board used for mounting electronic components such as semiconductor elements. Insulating layers and wiring conductors made of metal foil such as copper foil are alternately laminated, and conductive conductors filled in through-holes formed in the insulating layer with the wiring conductors positioned above and below the insulating layer sandwiched between them. There is known a wiring board formed by electrically connecting through a through conductor formed by curing a paste.

この配線基板は、例えば下記のようにして製造される。
(a)まず、耐熱性繊維基材に未硬化の熱硬化性樹脂組成物を含浸させた厚みが30〜200μm程度の絶縁シートの両主面にポリエチレンテレフタレート等の熱可塑性樹脂から成る厚みが10〜30μm程度の樹脂フィルムを剥離可能に貼着する。
(b)次に、樹脂フィルムが貼着された絶縁シートに一方の主面側から樹脂フィルムを通して出力が2〜3mJでパルス幅が20〜40μsのレーザ光を一箇所につき4〜8回繰り返し照射することにより上下の樹脂フィルムおよび絶縁シートを連通する貫通孔を穿孔する。このように、出力が2〜3mJと低くパルス幅が20〜40μsと短いレーザ光を一箇所につき4〜8回繰り返し照射することによりレーザ光の照射によるエネルギーが貫通孔周辺の絶縁シートおよび樹脂フィルムに大きな変形を起こさないようにしている。
(c)次に、樹脂フィルムおよび絶縁シートを連通する貫通孔内に金属等の導電粉末および未硬化の熱硬化性樹脂組成物から成る導電ペーストを前記一方の主面側の樹脂フィルム上からスクリーン印刷(圧入)で充填する。なお、この場合、貫通孔の形成された樹脂フィルムが印刷用のマスクとして用いられ、貫通孔内に導電ペーストを充填した後に前記主面側の樹脂フィルム上を無塵布で拭き、樹脂フィルム上に残った導電ペーストを除去するとともに充填された導電ペーストの表面を平坦化する。
(d)次に、貫通孔内に導電ペーストが充填された絶縁シートの両主面から樹脂フィルムを剥離して除去する。このとき、絶縁シートの貫通孔内に充填された導電ペーストは樹脂フィルムの厚み分に対応して絶縁シートの主面から突出した状態となる。
(e)次に、別途、支持フィルム上に金属箔から成る配線導体を所定パターンに剥離可能に形成しておいた転写シートを、絶縁シートの少なくとも一方の主面に、前記配線導体が導電ペーストの端部を覆うようにして圧接して埋入させた後、絶縁シートの主面から支持フィルムを剥離除去することにより配線導体を転写する。
(f)ついで、配線導体が転写された絶縁シートを複数枚積層し、180〜240℃の温度で数分〜数時間、熱プレスを用いて加熱加圧し、前記絶縁シートおよび前記導電ペーストを硬化させて配線基板を得る。
This wiring board is manufactured as follows, for example.
(A) First, a thickness made of a thermoplastic resin such as polyethylene terephthalate is 10 on both main surfaces of an insulating sheet having a thickness of about 30 to 200 μm in which a heat-resistant fiber base material is impregnated with an uncured thermosetting resin composition. A resin film of about 30 μm is stuck so as to be peelable.
(B) Next, a laser beam having an output of 2 to 3 mJ and a pulse width of 20 to 40 μs is repeatedly irradiated 4 to 8 times per place on the insulating sheet having the resin film adhered thereto through the resin film from one main surface side. By doing so, a through-hole communicating with the upper and lower resin films and the insulating sheet is drilled. Thus, by repeatedly irradiating a laser beam with a low output of 2-3 mJ and a short pulse width of 20-40 μs 4 to 8 times per place, the energy by the laser beam irradiation is an insulating sheet and a resin film around the through hole. To prevent major deformation.
(C) Next, a conductive paste made of a conductive powder such as metal and an uncured thermosetting resin composition is screened from above the resin film on the one main surface side in a through hole communicating with the resin film and the insulating sheet. Fill by printing (press-fit). In this case, the resin film in which the through hole is formed is used as a mask for printing, and after filling the through hole with the conductive paste, the resin film on the main surface side is wiped with a dust-free cloth, The remaining conductive paste is removed and the surface of the filled conductive paste is flattened.
(D) Next, the resin film is peeled and removed from both main surfaces of the insulating sheet filled with the conductive paste in the through holes. At this time, the conductive paste filled in the through holes of the insulating sheet is in a state of protruding from the main surface of the insulating sheet corresponding to the thickness of the resin film.
(E) Next, a transfer sheet in which a wiring conductor made of a metal foil is separately formed on a support film so as to be peeled into a predetermined pattern, and the wiring conductor is a conductive paste on at least one main surface of the insulating sheet. Then, the wiring conductor is transferred by peeling and removing the support film from the main surface of the insulating sheet.
(F) Next, a plurality of insulating sheets to which the wiring conductors are transferred are stacked, and heated and pressed using a hot press at a temperature of 180 to 240 ° C. for several minutes to several hours to cure the insulating sheet and the conductive paste. To obtain a wiring board.

しかしながら、この従来の配線基板の製造方法においては、貫通孔内に導電ペーストを充填した後、前記主面側の樹脂フィルム上を無塵布で拭き取る際に貫通孔内に充填された導電ペーストの一部が無塵布により掻き取られ、その分、樹脂フィルムを除去した後の絶縁シートの主面から突出する導電ペーストの高さが低くなる。このように絶縁シートの主面から突出する導電ペーストの高さが低い場合、絶縁シートの主面に金属箔から成る配線導体を導電ペーストの端部を覆うようにして圧接して埋入させる際、配線導体と導電ペーストとが十分に圧接されずに導電ペーストが硬化した貫通導体とこれに接続された配線導体との間の電気的接続信頼性が低下してしまう。   However, in this conventional method of manufacturing a wiring board, after filling the through hole with the conductive paste, when wiping the resin film on the main surface side with a dust-free cloth, the conductive paste filled in the through hole A part of the conductive paste is scraped off by a dust-free cloth, and accordingly, the height of the conductive paste protruding from the main surface of the insulating sheet after removing the resin film is lowered. When the conductive paste protruding from the main surface of the insulating sheet is low in this way, when the wiring conductor made of metal foil is pressed and embedded in the main surface of the insulating sheet so as to cover the end of the conductive paste In addition, the reliability of electrical connection between the through conductor in which the conductive paste is cured without being sufficiently pressed against the wiring conductor and the wiring conductor connected thereto is deteriorated.

また、樹脂フィルムの除去後に樹脂シートの主面から突出する導電ペーストは、その側面が保持されていないので形状が崩れ易く、そのため貫通孔周辺の絶縁シート主面上に滲んだり広がったりしやすい。そのような滲みや広がりがあると、絶縁シートの主面に金属箔から成る配線導体を導電ペーストの端部を覆うように圧接して転写した際に、細い配線導体であると導電ペーストが配線導体からはみ出してしまい、その結果、隣接する配線導体間の電気的な絶縁信頼性が低下するため、配線導体の微細化が困難であるという問題があった。
特開2003−283129号公報
In addition, the conductive paste protruding from the main surface of the resin sheet after removing the resin film is not easily held in shape because the side surfaces are not retained, and therefore, the conductive paste tends to spread or spread on the main surface of the insulating sheet around the through hole. If there is such spreading or spreading, when the wiring conductor made of metal foil is transferred to the main surface of the insulating sheet by pressure contact so as to cover the end of the conductive paste, the conductive paste will be wired if it is a thin wiring conductor. As a result, the electrical insulation reliability between the adjacent wiring conductors is lowered, which makes it difficult to miniaturize the wiring conductors.
JP 2003-283129 A

本発明の課題は、貫通孔内に導電ペーストが充填された絶縁シートの主面に金属箔から成る配線導体を導電ペーストの端部を覆うように圧接して転写した際に、配線導体と導電ペーストとが良好に圧接されるとともに導電ペーストが配線導体からはみ出すことがなく、その結果、導電ペーストが硬化した貫通導体と配線導体との間の電気的な接続信頼性に優れるとともに隣接する配線導体間における電気的な絶縁信頼性の高い微細配線の配線基板を提供することである。   The problem of the present invention is that when a wiring conductor made of a metal foil is transferred to the main surface of an insulating sheet filled with a conductive paste in a through-hole so as to cover the end of the conductive paste, the wiring conductor and the conductive material are electrically conductive. The paste is well pressed and the conductive paste does not protrude from the wiring conductor. As a result, the electrical connection reliability between the through conductor and the wiring conductor with the cured conductive paste is excellent, and the adjacent wiring conductor It is to provide a wiring substrate of fine wiring with high electrical insulation reliability.

本発明の発明者は、両主面に樹脂フィルムが貼着された絶縁シートに一方の主面側から樹脂フィルムを通してレーザ光を照射して樹脂フィルムおよび絶縁シートを連通する貫通孔を穿孔する際に、出力が5〜9mJの高出力でかつパルス幅が60〜100μsと長パルスのレーザ光を照射することにより穿孔すると、レーザ光の照射によるエネルギーにより貫通孔周囲の樹脂フィルムおよび絶縁シートが軟化溶融するとともに、貫通孔におけるレーザ光が入射された側の開口縁に絶縁シートを構成する熱硬化性樹脂組成物から成るリング状のバリが絶縁シートの主面から5〜20μmの高さに立設されるとともに、その外側に樹脂フィルムを構成する熱可塑性樹脂から成るリング状の突起が前記バリ以上の高さに形成されることを知見し、それを基に本発明を案出するに至った。   When the inventor of the present invention perforates a through hole that communicates a resin film and an insulating sheet by irradiating a laser beam through the resin film from one main surface side to an insulating sheet having a resin film attached to both main surfaces. In addition, when the punching is performed by irradiating a laser beam having a high output of 5 to 9 mJ and a pulse width of 60 to 100 μs, the resin film and the insulating sheet around the through hole are softened by the energy of the laser beam irradiation. A ring-shaped burr made of a thermosetting resin composition constituting the insulating sheet stands at a height of 5 to 20 μm from the main surface of the insulating sheet at the opening edge on the side where the laser beam is incident in the through hole. It was found that a ring-shaped projection made of a thermoplastic resin constituting the resin film was formed on the outside of the burrs at a height higher than that. The present invention has been devised based on this.

本発明における配線基板の製造方法は、熱硬化性樹脂組成物を含有する絶縁シートの両主面に熱可塑性樹脂から成る樹脂フィルムを剥離可能に貼着させる工程と、前記樹脂フィルムが貼着された前記絶縁シートに一方の主面側から前記樹脂フィルムを通してレーザ光を照射することにより前記樹脂フィルムおよび前記絶縁シートを連通する貫通孔を穿孔する工程と、前記樹脂フィルムおよび前記絶縁シートを連通する前記貫通孔内に前記一方の主面側から導電ペーストを充填する工程と、前記貫通孔内に前記導電ペーストが充填された前記絶縁シートの両主面から前記樹脂フィルムを剥離して除去する工程と、前記樹脂フィルムが除去された前記絶縁シートの前記主面に金属箔から成る配線導体を前記導電ペーストの端部を覆うように埋入する工程とを具備する配線基板の製造方法であって、前記貫通孔を穿孔する工程において、前記貫通孔における前記一方の主面側の開口縁に前記レーザ光の照射によるエネルギーで前記絶縁シートの前記一方の主面から隆起された前記熱硬化性樹脂組成物から成るリング状のバリを形成するとともに、前記バリの外側に前記レーザ光の照射によるエネルギーで溶融されて前記樹脂フィルム上に前記バリ以上の高さに突出する前記熱可塑性樹脂から成るリング状の突起を形成し、前記導電ペーストを充填する工程において、前記突起の高さまで前記導電ペーストを充填した後、該導電ペーストを前記バリの高さまで拭き取ることを特徴とするものである。   In the method for producing a wiring board according to the present invention, the step of adhering a resin film made of a thermoplastic resin to both main surfaces of an insulating sheet containing a thermosetting resin composition is attached, and the resin film is attached. Further, the step of piercing the resin film and the insulating sheet by irradiating the insulating sheet with laser light from one main surface side through the resin film, and the resin film and the insulating sheet are communicated. A step of filling the through hole with a conductive paste from the one main surface side, and a step of peeling and removing the resin film from both main surfaces of the insulating sheet filled with the conductive paste in the through hole. And embedding a wiring conductor made of a metal foil on the main surface of the insulating sheet from which the resin film has been removed so as to cover an end portion of the conductive paste. A method of manufacturing a wiring board comprising: a step of drilling the through-hole, wherein in the step of drilling the through-hole, the insulating sheet of the insulating sheet is energized by irradiation with the laser light at an opening edge on the one main surface side in the through-hole. A ring-shaped burr made of the thermosetting resin composition raised from one main surface is formed, and the burr is melted on the outside of the burr by the energy of the laser light irradiation and is more than the burr on the resin film. In the step of forming the ring-shaped protrusions made of the thermoplastic resin protruding to the height of the conductive paste and filling the conductive paste, the conductive paste is filled up to the height of the protrusions, It is characterized by wiping off.

本発明の配線基板の製造方法によれば、熱可塑性樹脂から成る樹脂フィルムが貼着された熱硬化性樹脂組成物を含有する絶縁シートに一方の主面側から樹脂フィルムを通してレーザ光を照射することにより樹脂フィルムおよび絶縁シートを連通する貫通孔を穿孔する工程において、前記貫通孔における前記一方の主面側の開口縁にレーザ光の照射によるエネルギーで絶縁シートの前記一方の主面から隆起された熱硬化性樹脂組成物から成るリング状のバリを形成するとともに、該バリの外側にレーザ光の照射によるエネルギーで溶融されて樹脂フィルム上に前記バリ以上の高さに突出する熱可塑性樹脂から成るリング状の突起を形成し、次に、樹脂フィルムおよび絶縁シートを連通する貫通孔内に前記一方の主面側から導電ペーストを充填する工程において、前記突起の高さまで導電ペーストを充填した後、該導電ペーストを前記バリの高さまで拭き取ることから、絶縁シートの前記一方の主面から突出する導電ペーストの高さを前記バリの高さに応じた十分な高さとすることができるとともに、絶縁シートの前記一方の主面から突出する導電ペーストは前記バリにより側面が保持されるので、滲んだり広がったりすることがない。したがって、本発明の配線基板の製造方法によれば、貫通孔内に導電ペーストが充填された絶縁シートの主面に金属箔から成る配線導体を導電ペーストの端部を覆うように圧接して転写した際に、配線導体と導電ペーストとが良好に圧接されるとともに導電ペーストが配線導体からはみ出すことがなく、その結果、導電ペーストが硬化した貫通導体と配線導体との間の電気的な接続信頼性に優れるとともに隣接する配線導体間における電気的な絶縁信頼性の高い微細配線の配線基板を提供することできる。   According to the method for manufacturing a wiring board of the present invention, an insulating sheet containing a thermosetting resin composition to which a resin film made of a thermoplastic resin is attached is irradiated with laser light from one main surface side through the resin film. Thus, in the step of drilling a through hole that communicates the resin film and the insulating sheet, the opening edge on the one main surface side in the through hole is raised from the one main surface of the insulating sheet by energy by laser light irradiation. Forming a ring-shaped burr made of the thermosetting resin composition, and being melted by the energy of laser light irradiation on the outside of the burr and protruding from the thermoplastic resin above the burr on the resin film Ring-shaped projections are formed, and then the conductive paste is filled from the one main surface side into the through holes communicating with the resin film and the insulating sheet. In the step, after the conductive paste is filled up to the height of the protrusion, the conductive paste is wiped up to the height of the burr, so that the height of the conductive paste protruding from the one main surface of the insulating sheet is the height of the burr. The conductive paste protruding from the one main surface of the insulating sheet is held by the burrs, so that the conductive paste does not spread or spread. Therefore, according to the method for manufacturing a wiring board of the present invention, the wiring conductor made of metal foil is pressed onto the main surface of the insulating sheet filled with the conductive paste in the through holes so as to cover the end of the conductive paste. In this case, the wiring conductor and the conductive paste are pressed against each other well, and the conductive paste does not protrude from the wiring conductor. As a result, the electrical connection reliability between the through-conductor and the wiring conductor, where the conductive paste is cured, is ensured. In addition, it is possible to provide a fine wiring substrate with excellent electrical properties and high electrical insulation reliability between adjacent wiring conductors.

次に、本発明の一実施形態例にかかる配線基板の製造方法について添付の図面を参照して詳細に説明する。図1(a)乃至図4(m)は、本実施形態例の配線基板の製造方法を説明するための工程毎の概略説明図であり、図5は、図1(c)における要部拡大図、図6は、図2(d)における要部拡大図、図7は、図2(e)における要部拡大図、図8は、図2(f)における要部拡大図である。   Next, a method for manufacturing a wiring board according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1A to FIG. 4M are schematic explanatory diagrams for each process for explaining a method of manufacturing a wiring board according to the present embodiment, and FIG. 5 is an enlarged view of a main part in FIG. FIGS. 6 and 6 are enlarged views of essential parts in FIG. 2D, FIG. 7 is an enlarged view of essential parts in FIG. 2E, and FIG. 8 is an enlarged view of essential parts in FIG.

先ず、図1(a)に示すように、配線基板の絶縁層となる絶縁シート1と、樹脂フィルム2とを準備する。絶縁シート1は、厚みが30〜200μm程度、幅および長さがそれぞれ20〜60cm程度の長方形であり、耐熱繊維の束を縦横に織ってシート状にした耐熱繊維基材に未硬化の熱硬化性樹脂組成物を含浸させた後、乾燥あるいは半硬化状態としたものである。耐熱繊維としては、例えばガラス繊維やアラミド繊維・全芳香族エステル繊維等が用いられ、また熱硬化性樹脂組成物としては、例えばエポキシ樹脂やビスマレイミドトリアジン樹脂、アリル変性ポリフェニレンエーテル樹脂等の樹脂組成物が用いられる。また、樹脂フィルム2は、厚みが10〜30μm程度であり、例えばポリエチレンテレフタレート等の熱可塑性樹脂から成るフィルムが用いられる。   First, as shown to Fig.1 (a), the insulating sheet 1 used as the insulating layer of a wiring board and the resin film 2 are prepared. The insulating sheet 1 is a rectangle having a thickness of about 30 to 200 μm, a width and a length of about 20 to 60 cm, respectively, and a heat-resistant fiber base material obtained by weaving a bundle of heat-resistant fibers vertically and horizontally into a sheet shape, and uncured thermosetting. The resin composition is impregnated and then dried or semi-cured. As the heat-resistant fiber, for example, glass fiber, aramid fiber, wholly aromatic ester fiber or the like is used, and as the thermosetting resin composition, for example, an epoxy resin, a bismaleimide triazine resin, an allyl-modified polyphenylene ether resin, or the like. Things are used. The resin film 2 has a thickness of about 10 to 30 μm, and a film made of a thermoplastic resin such as polyethylene terephthalate is used.

次に、図1(b)に示すように、絶縁シート1の上下両主面に樹脂フィルム2を、図示しない粘着層を介して剥離可能に貼着する。次に、図1(c)に示すように、上下面に樹脂フィルム2が貼着された絶縁シート1に複数の貫通孔3を形成する。貫通孔3の形成は、上下に樹脂フィルム2が貼着された絶縁シート1を図示しない平坦な吸着テーブル上に載置するとともに、その上面側から出力が5〜9mJでかつパルス幅が60〜100μsのレーザ光を各貫通孔3の形成位置に対してそれぞれ3回ずつ照射することにより行われる。このとき、出力が5〜9mJの高出力でかつパルス幅が60〜100μsと長パルスのレーザ光を照射することから、図5に要部拡大図で示すように、レーザ光の照射によるエネルギーにより貫通孔3の周囲の樹脂フィルム2および絶縁シート1が軟化溶融するとともに、貫通孔3におけるレーザ光が入射された側の開口縁に絶縁シート1を構成する熱硬化性樹脂組成物から成るリング状のバリ1aが絶縁シート1の上面に5〜20μmの高さに立設されるとともに、その外側の樹脂フィルム2上に樹脂フィルム2を構成する熱可塑性樹脂から成るリング状の突起2aが前記バリ1a以上の高さに形成される。   Next, as shown in FIG.1 (b), the resin film 2 is stuck on the up-and-down both main surfaces of the insulating sheet 1 so that peeling is possible through the adhesion layer which is not shown in figure. Next, as shown in FIG.1 (c), the several through-hole 3 is formed in the insulating sheet 1 by which the resin film 2 was stuck on the upper and lower surfaces. The through-hole 3 is formed by placing the insulating sheet 1 with the resin film 2 stuck on the top and bottom on a flat suction table (not shown), and having an output of 5 to 9 mJ and a pulse width of 60 to 60 from the upper surface side. This is performed by irradiating the formation position of each through-hole 3 three times each with 100 μs of laser light. At this time, a laser beam having a high output of 5 to 9 mJ and a pulse width of 60 to 100 μs is irradiated, so as shown in the enlarged view of the main part in FIG. The resin film 2 and the insulating sheet 1 around the through hole 3 are softened and melted, and the ring shape is formed of a thermosetting resin composition that forms the insulating sheet 1 at the opening edge of the through hole 3 on which the laser beam is incident. The burr 1a is erected on the upper surface of the insulating sheet 1 at a height of 5 to 20 μm, and the ring-shaped protrusion 2a made of a thermoplastic resin constituting the resin film 2 is formed on the resin film 2 on the outside. It is formed at a height of 1a or more.

このように貫通孔3におけるレーザ光が入射された側の開口縁に絶縁シート1を構成する熱硬化性樹脂組成物から成るリング状のバリ1aが形成されるのは、出力が5〜9mJの高出力で長パルス幅が60〜100μsの長パルスのレーザ光の照射により分解されて貫通孔3から上方に噴出する高温のガスにより貫通孔3の周囲の軟化溶融した熱硬化性樹脂組成物が前記噴出の圧力で上方に押し出されるためであると推察される。また、バリ1aの外側の樹脂フィルム2上に樹脂フィルム2を構成する熱可塑性樹脂から成るリング状の突起2aが前記バリ1a以上の高さに形成されるのは、レーザ光の照射によるエネルギーで貫通孔3の周囲の樹脂フィルム2が大きく溶け広がるとともにその溶け広がった縁が表面張力の影響でリング状に盛り上がるためであると推察される。   Thus, the ring-shaped burr 1a made of the thermosetting resin composition constituting the insulating sheet 1 is formed at the opening edge of the through-hole 3 on the side where the laser beam is incident. The output is 5 to 9 mJ. A thermosetting resin composition softened and melted around the through-hole 3 by a high-temperature gas that is decomposed by irradiation with a long-pulse laser beam having a high output and a long pulse width of 60 to 100 μs and is ejected upward from the through-hole 3. It is inferred that this is because it is pushed upward by the pressure of the ejection. Moreover, the ring-shaped protrusion 2a made of a thermoplastic resin constituting the resin film 2 is formed on the resin film 2 outside the burr 1a at a height higher than the burr 1a because of the energy of laser light irradiation. It is presumed that the resin film 2 around the through-hole 3 melts and spreads greatly, and the melted and spread edge rises in a ring shape due to the influence of surface tension.

なお、照射されるレーザ光の出力が5mJ未満、または照射されるレーザ光のパルス幅が60μs未満であると、高さが5〜20μmのバリ1aを良好に形成することが困難となり、照射されるレーザ光の出力が9mJを超える、または照射されるレーザ光のパルス幅が100μsを超えると、絶縁シート1の熱硬化性樹脂組成物が熱劣化し、配線導体との貼着性が低下するので、後述する転写工程おいて配線導体が剥離してしまう危険がある。したがって、照射されるレーザ光は、その出力が5〜9mJでパルス幅が60〜100μsの範囲であることが好ましい。また、バリ1aの絶縁シート1の上面からの高さが5μm未満であると、絶縁シート1の上面から突出する導電ペースト4の高さを、バリ1aで側面が保持された状態で十分に高いものとすることができず、後述する配線導体5の転写工程において配線導体5と導電ペースト4とが十分に圧接されずに導電ペースト4が硬化した貫通導体14とこれに接続された配線導体5との間の電気的接続信頼性が低下してしまい、20μmを超えると、そのような高さのバリ1aを形成するために出力が9mJを超え、かつパルス幅が100μsを超える高エネルギーのレーザ光を照射しなければならず、そのような高エネルギーのレーザ光の照射により絶縁シート1およびこれを載置する吸着テーブルへのダメージが大きなものとなってしまう。したがって、バリ1aの絶縁シート1の上面からの高さは5〜20μmの範囲であることが好ましい。   If the output of the irradiated laser beam is less than 5 mJ or the pulse width of the irradiated laser beam is less than 60 μs, it is difficult to form a burr 1a having a height of 5 to 20 μm, and the irradiation is performed. When the output of the laser beam exceeds 9 mJ or the pulse width of the irradiated laser beam exceeds 100 μs, the thermosetting resin composition of the insulating sheet 1 is thermally deteriorated and the adhesiveness to the wiring conductor is reduced. Therefore, there is a risk that the wiring conductor may be peeled off in a transfer step described later. Therefore, it is preferable that the irradiated laser beam has an output of 5 to 9 mJ and a pulse width of 60 to 100 μs. Further, if the height of the burr 1a from the top surface of the insulating sheet 1 is less than 5 μm, the height of the conductive paste 4 protruding from the top surface of the insulating sheet 1 is sufficiently high with the side surfaces held by the burr 1a. In the transfer process of the wiring conductor 5 described later, the wiring conductor 5 and the conductive paste 4 are not sufficiently pressed together and the through conductor 14 is cured and the wiring conductor 5 connected thereto. The reliability of the electrical connection between the power source and the laser is reduced, and when it exceeds 20 μm, a high-energy laser having an output exceeding 9 mJ and a pulse width exceeding 100 μs in order to form a burr 1a having such a height. Light must be irradiated, and the damage to the insulating sheet 1 and the suction table on which the insulating sheet 1 is placed becomes large due to the irradiation of such high-energy laser light. Therefore, the height of the burr 1a from the upper surface of the insulating sheet 1 is preferably in the range of 5 to 20 μm.

次に、図2(d)に示すように樹脂フィルム2および絶縁シート1を連通する貫通孔3内に導電ペースト4を充填する。貫通孔3内に導電ペースト4を充填するには、上面側の樹脂フィルム2上に導電ペースト4を供給するとともに、その上を硬質ゴム製のスキージを導電ペースト4を掻きながら摺動させることにより充填する方法が採用される。このとき、貫通孔3内に充填された導電ペースト4は、図6に要部拡大図で示すように、突起2aの高さまで充填される。なお、導電ペースト4は、例えば錫と銀とビスマスと銅との合金から成る金属粉末とトリアリルシアヌレートやトリアリルイソシアヌレート、トリスエポキシプロピルイソシアヌレート、トリス(2−ヒドロキシエチル)イソシアヌレート等のトリアジン系熱硬化性樹脂とを含有している。そして、前記金属粉末同士の接触により導電性を呈する。なお、前記金属粉末の含有量は、導電ペースト4の総量に対して、80〜95重量%が好ましい。金属粉末の含有量が80重量%より少ないと、トリアジン系熱硬化性樹脂により金属粉末同士の接続が妨げられ、導通抵抗が上昇してしまう傾向があり、95重量%を超えると、金属粉末およびトリアジン系熱硬化性樹脂を含有した導電ペーストの粘度が上がり過ぎて良好に充填ができない傾向にある。その後、図2(e)に示すように、上面側の樹脂フィルム2の表面を無塵布Aにより拭いて樹脂フィルム2上に残った導電ペースト4を拭き取るとともに貫通孔3に充填された導電ペースト4の表面を平坦化する。このとき、図7に要部拡大図で示すように、貫通孔3に充填された導電ペースト4に含有される金属粉末のうち、大きな粉末が優先的に拭き取られて導電ペースト4の高さがバリ1aと同じ高さになるとともに貫通孔3の上面側の開口近傍には小さな金属粉末が多く残る。このように、導電ペースト4の高さをバリ1aの高さに応じた十分な高さとするとともに導電ペースト4の貫通孔3の開口付近に小さな金属粉末を多く残すと、後述するように、絶縁シート1の上面に金属箔から成る配線導体5を転写する際に、導電ペースト4と配線導体5とを良好に圧接させることができるとともに両者の間の接触点が増え、その結果、導電ペースト4と配線導体5との電気的な接続信頼性を極めて高いものとすることができる。   Next, as shown in FIG. 2 (d), the conductive paste 4 is filled into the through-hole 3 that communicates the resin film 2 and the insulating sheet 1. In order to fill the through hole 3 with the conductive paste 4, the conductive paste 4 is supplied onto the resin film 2 on the upper surface side, and a squeegee made of hard rubber is slid on the conductive paste 4 while scratching the conductive paste 4. A filling method is adopted. At this time, the conductive paste 4 filled in the through hole 3 is filled to the height of the protrusion 2a as shown in the enlarged view of the main part in FIG. The conductive paste 4 is made of, for example, a metal powder made of an alloy of tin, silver, bismuth and copper, triallyl cyanurate, triallyl isocyanurate, trisepoxypropyl isocyanurate, tris (2-hydroxyethyl) isocyanurate, etc. A triazine-based thermosetting resin. And it exhibits electroconductivity by contact between the metal powders. In addition, the content of the metal powder is preferably 80 to 95% by weight with respect to the total amount of the conductive paste 4. When the content of the metal powder is less than 80% by weight, the connection between the metal powders is hindered by the triazine-based thermosetting resin, and the conduction resistance tends to increase. When the content exceeds 95% by weight, the metal powder and There is a tendency that the viscosity of the conductive paste containing the triazine-based thermosetting resin is so high that it cannot be satisfactorily filled. Thereafter, as shown in FIG. 2 (e), the surface of the resin film 2 on the upper surface side is wiped with a dust-free cloth A to wipe away the conductive paste 4 remaining on the resin film 2 and the conductive paste filled in the through holes 3. The surface of 4 is flattened. At this time, as shown in the enlarged view of the main part in FIG. 7, the metal powder contained in the conductive paste 4 filled in the through-hole 3 is preferentially wiped off and the height of the conductive paste 4 is increased. However, a lot of small metal powder remains in the vicinity of the opening on the upper surface side of the through hole 3. Thus, if the height of the conductive paste 4 is set to a sufficient height corresponding to the height of the burr 1a and a large amount of small metal powder is left in the vicinity of the opening of the through-hole 3 of the conductive paste 4, insulation will be performed as described later. When the wiring conductor 5 made of a metal foil is transferred to the upper surface of the sheet 1, the conductive paste 4 and the wiring conductor 5 can be brought into good pressure contact with each other, and the number of contact points between them increases. As a result, the conductive paste 4 And the electrical connection reliability between the wiring conductor 5 and the wiring conductor 5 can be made extremely high.

次に、図2(f)に示すように、絶縁シート1の両主面から樹脂フィルム2を剥離して除去する。このとき、図8に要部拡大図で示すように、絶縁シート1の上面から突出する導電ペースト4は、その側面がバリ1aに保持されるので、絶縁シート1の上面に滲んだり広がったりすることがない。したがって、後述するように、絶縁シート1の上面に金属箔から成る配線導体5を転写する際に、導電ペースト4が配線導体5からはみ出すことがなく、その結果、隣接する配線導体5間における電気的な絶縁信頼性を高いものとすることができる。   Next, as shown in FIG. 2 (f), the resin film 2 is peeled off from both main surfaces of the insulating sheet 1 and removed. At this time, as shown in the enlarged view of the main part in FIG. 8, the side surface of the conductive paste 4 protruding from the upper surface of the insulating sheet 1 is held by the burr 1a, so that it spreads or spreads on the upper surface of the insulating sheet 1. There is nothing. Therefore, as will be described later, when the wiring conductor 5 made of metal foil is transferred to the upper surface of the insulating sheet 1, the conductive paste 4 does not protrude from the wiring conductor 5, and as a result, the electrical connection between the adjacent wiring conductors 5 is prevented. The insulation reliability can be made high.

次に、図3(g)に示すように、別途、ポリエチレンナフタレート等の樹脂フィルムから成る支持フィルム6の一方の主面上に銅箔等の金属箔から成る配線導体5が剥離可能に貼着された転写シート7を準備する。この支持フィルム6上の配線導体5は、支持フィルム6の一方の主面に銅箔等の金属箔を間に図示しない粘着材を介して貼着した後、その金属箔をフォトリソグラフィー技術により所定のパターンにエッチングすることにより形成される。配線導体5の厚みは5〜30μm程度である。   Next, as shown in FIG. 3G, a wiring conductor 5 made of a metal foil such as a copper foil is detachably pasted on one main surface of a support film 6 made of a resin film such as polyethylene naphthalate. The attached transfer sheet 7 is prepared. The wiring conductor 5 on the support film 6 has a metal foil such as a copper foil attached to one main surface of the support film 6 via an adhesive material (not shown), and then the metal foil is predetermined by a photolithography technique. It is formed by etching the pattern. The thickness of the wiring conductor 5 is about 5 to 30 μm.

次に、図3(h)に示すように、絶縁シート1の上面に支持フィルム6上の配線導体5を導電ペースト4の端部を覆うように重ねてプレスにより圧接して埋入した後、図3(i)に示すように、支持フィルム6を除去することにより、配線導体5を転写する。このとき、絶縁シート1の上面から突出する導電ペースト4は、バリ1aにより側面が保持された状態で十分な高さを有しており、絶縁シート1の上面に滲んだり広がったりすることがない。したがって、配線導体5と導電ペースト4とが良好に圧接されるとともに導電ペースト4が配線導体5からはみ出すことがない。   Next, as shown in FIG. 3 (h), the wiring conductor 5 on the support film 6 is overlaid on the upper surface of the insulating sheet 1 so as to cover the end portion of the conductive paste 4, and is pressed and embedded by pressing, As shown in FIG. 3 (i), the wiring conductor 5 is transferred by removing the support film 6. At this time, the conductive paste 4 protruding from the upper surface of the insulating sheet 1 has a sufficient height in a state where the side surface is held by the burr 1a, and does not spread or spread on the upper surface of the insulating sheet 1. . Therefore, the wiring conductor 5 and the conductive paste 4 are in good pressure contact, and the conductive paste 4 does not protrude from the wiring conductor 5.

次に、図4(j)に示すように、上述のようにして貫通孔3に導電ペースト4が充填されているとともに表面に配線導体5が埋入された絶縁シート1を配線基板の製造に必要な形態で複数枚揃える(ここでは絶縁シート1が3枚の場合を示している)とともに、図4(k)に示すように、それらの絶縁シート1を所定の配置で上下に積層した状態でプレスしながら加熱し、絶縁シート1の熱硬化性樹脂組成物および導電ペースト4の熱硬化性樹脂組成物を熱硬化させることにより、複数の絶縁シート1が硬化した絶縁層11と配線導体5とが交互に積層されているとともに、導電ペースト4が硬化した貫通導体14により上下の配線導体5が電気的に接続された配線基板10が得られる。このとき、上述したように、配線導体5と導電ペースト4とが良好に圧接されているとともに導電ペースト4が配線導体5からはみ出していないので、導電ペースト4が硬化した貫通導体14と配線導体5との間の電気的な接続信頼性に優れるとともに隣接する配線導体5間における電気的な絶縁信頼性の高い微細配線の配線基板10を提供することが可能となる。   Next, as shown in FIG. 4 (j), the insulating sheet 1 in which the through-hole 3 is filled with the conductive paste 4 and the wiring conductor 5 is embedded on the surface as described above is used for the manufacture of the wiring board. A plurality of sheets are prepared in a necessary form (here, the case where there are three insulating sheets 1 is shown), and as shown in FIG. 4 (k), the insulating sheets 1 are stacked vertically in a predetermined arrangement. The insulating layer 11 and the wiring conductor 5 in which the plurality of insulating sheets 1 are cured by heating and thermosetting the thermosetting resin composition of the insulating sheet 1 and the thermosetting resin composition of the conductive paste 4. And the wiring board 10 in which the upper and lower wiring conductors 5 are electrically connected by the through conductors 14 in which the conductive paste 4 is cured are obtained. At this time, as described above, since the wiring conductor 5 and the conductive paste 4 are in good pressure contact and the conductive paste 4 does not protrude from the wiring conductor 5, the through conductor 14 and the wiring conductor 5 in which the conductive paste 4 is hardened. It is possible to provide a fine wiring substrate 10 having excellent electrical connection reliability between them and high electrical insulation reliability between adjacent wiring conductors 5.

(a)〜(c)は、本発明の配線基板の製造方法を説明するための工程毎の概略断面図である。(A)-(c) is a schematic sectional drawing for every process for demonstrating the manufacturing method of the wiring board of this invention. (d)〜(f)は、本発明の配線基板の製造方法を説明するための工程毎の概略断面図である。(D)-(f) is a schematic sectional drawing for every process for demonstrating the manufacturing method of the wiring board of this invention. (g)〜(i)は、本発明の配線基板の製造方法を説明するための工程毎の概略断面図である。(G)-(i) is a schematic sectional drawing for every process for demonstrating the manufacturing method of the wiring board of this invention. (j),(k)は、本発明の配線基板の製造方法を説明するための工程毎の概略断面図である。(J), (k) is a schematic sectional drawing for every process for demonstrating the manufacturing method of the wiring board of this invention. は、図1(c)における要部拡大図である。These are the principal part enlarged views in FIG.1 (c). は、図2(d)における要部拡大図である。These are the principal part enlarged views in FIG.2 (d). は、図2(e)における要部拡大図である。These are the principal part enlarged views in FIG.2 (e). は、図2(f)における要部拡大図である。These are the principal part enlarged views in FIG.2 (f).

符号の説明Explanation of symbols

1 絶縁シート
1a バリ
2 樹脂フィルム
2a 突起
3 貫通孔
4 導電ペースト
5 配線導体
10 配線基板
DESCRIPTION OF SYMBOLS 1 Insulation sheet 1a Burr 2 Resin film 2a Protrusion 3 Through-hole 4 Conductive paste 5 Wiring conductor 10 Wiring board

Claims (3)

熱硬化性樹脂組成物を含有する絶縁シートの両主面に熱可塑性樹脂から成る樹脂フィルムを剥離可能に貼着させる工程と、前記樹脂フィルムが貼着された前記絶縁シートに一方の主面側から前記樹脂フィルムを通してレーザ光を照射することにより前記樹脂フィルムおよび前記絶縁シートを連通する貫通孔を穿孔する工程と、前記樹脂フィルムおよび前記絶縁シートを連通する前記貫通孔内に前記一方の主面側から導電ペーストを充填する工程と、前記貫通孔内に前記導電ペーストが充填された前記絶縁シートの両主面から前記樹脂フィルムを剥離して除去する工程と、前記樹脂フィルムが除去された前記絶縁シートの前記主面に金属箔から成る配線導体を前記導電ペーストの端部を覆うように埋入する工程とを具備する配線基板の製造方法であって、前記貫通孔を穿孔する工程において、前記貫通孔における前記一方の主面側の開口縁に前記レーザ光の照射によるエネルギーで前記絶縁シートの前記一方の主面から隆起された前記熱硬化性樹脂組成物から成るリング状のバリを形成するとともに、前記バリの外側に前記レーザ光の照射によるエネルギーで溶融されて前記樹脂フィルム上に前記バリ以上の高さに突出する前記熱可塑性樹脂から成るリング状の突起を形成し、前記導電ペーストを充填する工程において、前記突起の高さまで前記導電ペーストを充填した後、該導電ペーストを前記バリの高さまで拭き取ることを特徴とする配線基板の製造方法。   A step of adhering a resin film made of a thermoplastic resin to both main surfaces of an insulating sheet containing a thermosetting resin composition in a peelable manner, and one main surface side of the insulating sheet on which the resin film is bonded Irradiating a laser beam through the resin film to form a through hole that communicates the resin film and the insulating sheet, and the one main surface in the through hole that communicates the resin film and the insulating sheet. Filling the conductive paste from the side, peeling the resin film from both main surfaces of the insulating sheet filled with the conductive paste in the through-holes, and removing the resin film Embedding a wiring conductor made of a metal foil on the main surface of the insulating sheet so as to cover an end of the conductive paste. In the step of drilling the through-hole, the thermosetting raised from the one main surface of the insulating sheet by energy by irradiation of the laser light at the opening edge on the one main surface side in the through-hole Forming a ring-shaped burr made of an adhesive resin composition, and being melted by the energy by irradiation of the laser beam on the outside of the burr, and protruding from the thermoplastic resin above the burr on the resin film In the step of forming the ring-shaped protrusion and filling the conductive paste, the conductive paste is filled up to the height of the protrusion, and then the conductive paste is wiped up to the height of the burr. Method. 前記バリの前記絶縁シート主面からの高さが5〜20μmであることを特徴とする請求項1に記載の配線基板の製造方法。   The method of manufacturing a wiring board according to claim 1, wherein a height of the burr from the main surface of the insulating sheet is 5 to 20 μm. 前記貫通孔を形成する工程において、前記レーザ光の出力が5〜9mJでパルス幅が 60〜100μsであることを特徴とする請求項1または2に記載の配線基板の製造方法。

3. The method of manufacturing a wiring board according to claim 1, wherein in the step of forming the through hole, the output of the laser beam is 5 to 9 mJ and the pulse width is 60 to 100 μs.

JP2008280577A 2008-10-30 2008-10-30 Wiring board manufacturing method Expired - Fee Related JP5083906B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9456494B2 (en) 2011-10-21 2016-09-27 Murata Manufacturing Co., Ltd. Multilayer wiring substrate, probe card, and method for manufacturing multilayer wiring substrate
WO2018092480A1 (en) * 2016-11-17 2018-05-24 大日本印刷株式会社 Through-electrode substrate, semiconductor device using through-electrode substrate, and through-electrode substrate manufacturing method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11214839A (en) * 1998-01-23 1999-08-06 Kyocera Corp Production of circuit board
JP2000174404A (en) * 1998-12-09 2000-06-23 Matsushita Electric Ind Co Ltd Circuit-board connecting material, its manufacture, and manufacture of multilayer circuit board using the connecting material
JP2001217547A (en) * 2000-02-03 2001-08-10 Matsushita Electric Ind Co Ltd Circuit board, intermediate product thereof and method of manufacturing thereof
JP2001237540A (en) * 1999-12-15 2001-08-31 Matsushita Electric Ind Co Ltd Circuit forming board and method of manufacturing the same
JP2002368414A (en) * 2001-06-11 2002-12-20 Matsushita Electric Ind Co Ltd Method and apparatus for manufacturing highly conductive wiring board, and wiring board

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11214839A (en) * 1998-01-23 1999-08-06 Kyocera Corp Production of circuit board
JP2000174404A (en) * 1998-12-09 2000-06-23 Matsushita Electric Ind Co Ltd Circuit-board connecting material, its manufacture, and manufacture of multilayer circuit board using the connecting material
JP2001237540A (en) * 1999-12-15 2001-08-31 Matsushita Electric Ind Co Ltd Circuit forming board and method of manufacturing the same
JP2001217547A (en) * 2000-02-03 2001-08-10 Matsushita Electric Ind Co Ltd Circuit board, intermediate product thereof and method of manufacturing thereof
JP2002368414A (en) * 2001-06-11 2002-12-20 Matsushita Electric Ind Co Ltd Method and apparatus for manufacturing highly conductive wiring board, and wiring board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9456494B2 (en) 2011-10-21 2016-09-27 Murata Manufacturing Co., Ltd. Multilayer wiring substrate, probe card, and method for manufacturing multilayer wiring substrate
WO2018092480A1 (en) * 2016-11-17 2018-05-24 大日本印刷株式会社 Through-electrode substrate, semiconductor device using through-electrode substrate, and through-electrode substrate manufacturing method

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