JP2010093245A5

JP2010093245A5 - Exposure apparatus, maintenance method, and device manufacturing method

Info

Publication number: JP2010093245A5
Application number: JP2009210447A
Authority: JP
Filing date: 2009-09-11
Publication date: 2012-11-01

Claims

An exposure apparatus for exposing a substrate with exposure light, comprising:
Has the generated by introducing a process gas into the discharge space gas first supply port capable of supplying, by contacting the cleaning target member and the gas supplied from the first supply port, said cleaning target member Exposure device equipped with a cleaning device to clean the

The cleaning device includes a second supply port for supplying a second gas to the periphery of the first space to which the gas is supplied from the first supply port, and an exhaust port for discharging at least a part of the gas in the first space. the exposure apparatus according to claim 1, wherein the organic and.

Predetermined space,
And an adjusting device for adjusting an environment of the predetermined space by supplying the first gas to the predetermined space;
The exposure apparatus according to claim 2, wherein the second gas is at substantially the same temperature as the first gas.

The exposure apparatus according to claim 2, wherein the second gas is substantially the same type as the first gas.

The substrate is exposed to the exposure light through an exposure liquid,
The exposure apparatus according to any one of claims 1 to 4 , wherein the cleaning target member is in contact with an exposure liquid.

The process gas includes a first process gas and a second process gas.
The cleaning device includes a first supply passage for supplying the first process gas into the discharge space, and a second supply path for supplying the second process gas to the discharge space, the discharge space And a switching device capable of switching between a first state in which the second supply path communicates with the first supply path, and a second state in which the discharge space communicates with the second supply path,
In the first state, and cleaning the cleaning target member by supplying the first process gas is generated is introduced into the discharge space gas from said first supply port,
In the second state, the second process gas is introduced into the discharge space and the gas generated is supplied from the first supply port and brought into contact with the member, and the liquid repellency of the surface of the member against the exposure liquid The exposure apparatus according to claim 5, wherein

The first process gas contains oxygen,
The exposure apparatus according to claim 6 , wherein the second process gas contains a fluorine compound.

8. The exposure apparatus according to claim 7, wherein the first process gas or the second process gas includes at least one of argon gas, krypton gas, xenon gas, radon gas, neon gas, and nitrogen gas.

In the second state, wherein by contacting the cleaned member and the gas supplied from the first supply port, according to claim 6-8 to enhance the liquid repellency with respect to the exposure surface liquid of the cleaning target member An exposure apparatus according to any one of the preceding claims.

The exposure apparatus according to any one of claims 5 to 9 , wherein at least a part of the surface of the substrate faces the member to be cleaned during the exposure of the substrate.

The member to be cleaned includes a porous member,
11. The exposure apparatus according to claim 10, wherein the exposure liquid is recovered through the porous member.

11. The exposure apparatus according to claim 10 , wherein the member to be cleaned has a supply port capable of supplying an exposure liquid, a recovery port capable of recovering the exposure liquid, or both.

A recovery port capable of recovering the exposure liquid;
And a recovery channel communicating with the recovery port,
The exposure apparatus according to any one of claims 5 to 11 , wherein a surface of the cleaning target member includes an inner surface of the recovery flow channel.

And said recovery port and the vacuum source is connected via the recovery flow passage, by sucking the gas supplied from the first supply port from said collection port, said gas supplied from the first supply port The exposure apparatus according to claim 13 , wherein the exposure device is in contact with the inner surface of the recovery flow channel.

A supply port capable of supplying an exposure liquid;
And a supply channel communicating with the supply port,
The surface of the cleaning target member, the supply channel claims 5 to 11, including the inner surface of, 13, and an exposure apparatus according to any one claim of 14.

And the supply port and the vacuum source is connected through the supply passage by sucking the gas supplied from the first supply port from said supply port, the gas supplied from the first supply port The exposure apparatus according to claim 15 , wherein the light source and the inner surface of the supply flow channel are brought into contact with each other.

The exposure apparatus according to any one of claims 1 to 16 , wherein the cleaning target member is movable to a position where the exposure light can be irradiated.

The member to be cleaned includes at least one of a first member and a second member disposed between the first member and a gap.
The exposure apparatus according to claim 17 , wherein the gas from the first supply port is supplied into the gap.

The cleaning target member, an exposure apparatus according to claim 17 or 18, wherein comprising a substrate holding member capable of holding the substrate.

A substrate holding member capable of holding the substrate;
The cleaning target member is at least partially are in the arrangement according to claim 17 or 18 exposure apparatus according around the substrate held by the substrate holding member.

The exposure apparatus according to any one of claims 17 to 20 , wherein the member to be cleaned includes at least a part of a measuring device capable of receiving the exposure light .

A movable member movable to a position where the exposure light can be emitted;
The exposure apparatus according to any one of claims 1 to 21 , wherein the first supply port is provided in the movable member.

Exposing the substrate using the exposure apparatus according to any one of claims 1 to 22 ;
Developing the exposed substrate.

A maintenance method of an exposure apparatus for exposing a substrate with exposure light, comprising:
A maintenance method including: cleaning a member to be cleaned by bringing a generated gas into contact with a member to be cleaned by introducing a process gas into a discharge space .