JP2010091854A - Liquid crystal display device and method of manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To improve a display grade in both of a reflection area and a transmission area, and also to prevent the corrosion due to the etchant of a pixel electrode. <P>SOLUTION: A liquid crystal display device 1 is provided with: a first transparent electrode 21 arranged over a transmission area 18 and a reflection area 19, and laminated on the surface of an insulating film 31; a reflective electrode 23 arranged in the reflection area 19, and laminated on the surface of a part in the first transparent electrode 21; and a second transparent electrode 22 arranged over the transmission area 18 and the reflection area 19 and laminated across the entire surface of the reflective electrode 23, and also laminated on the surface of the first transparent electrode 21 at the outside of the reflective electrode 23. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a transflective liquid crystal display device and a manufacturing method thereof.

  The transflective liquid crystal display device includes a transmission region and a reflection region for each pixel which is the minimum unit of an image and is arranged in a matrix. The transflective liquid crystal display device displays the reflection mode by reflecting the external light in the reflective area when the external light is sufficiently bright, and displays light from the backlight in the transmissive area when the external light is dark. The transmission mode is displayed through the screen. Therefore, the transflective liquid crystal display device can maintain high contrast and obtain high visibility without being affected by the brightness of external light.

  That is, the transmission region has a transparent electrode made of ITO or the like so as to transmit the light of the backlight, and has a reflection electrode made of a metal film in the reflection region so as to reflect outside light.

  For example, a transflective liquid crystal display device 100 disclosed in Patent Document 1 includes a TFT 102 and an interlayer insulating film 103 covering the TFT 102 on a glass substrate 101 as shown in FIG. 4 which is an enlarged sectional view. A reflective electrode 104 formed on the surface of the interlayer insulating film 103 and a transparent electrode 106 formed on the interlayer insulating film 103 so as to cover the reflective electrode 104 are formed. The reflective electrode 104 is not directly electrically connected to the drain electrode 105 of the TFT 102, and the lower part of the transparent electrode 106 is electrically connected to the drain electrode 105.

  Thus, not only ITO but also IZO can be used as the material of the transparent electrode 106, and flicker is effectively prevented.

  In addition, as shown in FIG. 5 which is an enlarged cross-sectional view, a transflective liquid crystal display device 100 disclosed in Patent Document 2 includes a TFT 102 and an interlayer insulating film 103 covering the TFT 102 on a glass substrate 101. The first transparent electrode 111, the reflective electrode 104, and the second transparent electrode 112 are laminated in this order on the interlayer insulating film 103.

  The side end surfaces of the first transparent electrode 111, the reflective electrode 104, and the second transparent electrode 112 are formed on the interlayer insulating film 103 so as to form one plane as a whole perpendicular to the surface of the glass substrate 101. Has been.

Then, the reflective electrode 104 and the second transparent electrode 112 are patterned with the same mask pattern, and wet etching is performed at once using the same etching solution.
JP 2004-109797 A JP 2006-330130 A

  However, in the liquid crystal display device of Patent Document 1, since the transparent electrode has the same film thickness in the reflective region and the transmissive region, the optimal transmittance of light and the optimal color of display in each region. It cannot be adjusted independently. Therefore, if the film thickness with the optimal transmittance differs from the film thickness with the optimal reflectance, one of the characteristics must be sacrificed, and the display quality in any region is prevented from deteriorating. I can't.

  Further, as shown in FIG. 6 which is an enlarged sectional view, when the transparent electrode 106 exposed from the resist 107 is etched using an iron chloride-based etchant, the end portion of the transparent electrode 106 is formed of the interlayer insulating film 103. As a result of rising from the surface and entering the etchant 108 through the gap, there is a problem that the reflective electrode 104 is etched and eroded.

  In the liquid crystal display device of Patent Document 2 described above, since the side end surfaces of the first transparent electrode 111, the reflective electrode 104, and the second transparent electrode 112 are aligned on the interlayer insulating film 103, the reflective electrode actually When the 104 and the second transparent electrode 112 are collectively etched, the etchant may enter between the first transparent electrode 111 and the reflective electrode 104 and the reflective electrode 104 may be eroded.

  The present invention has been made in view of such a point, and an object of the present invention is to improve display quality in both the reflective region and the transmissive region of the transflective liquid crystal display device and to improve the display quality of the pixel electrode. The goal is to prevent erosion by the etchant.

  In order to achieve the above object, a liquid crystal display device according to the present invention has a transmissive region for transmitting light and performing transmissive display, and a reflective region for reflecting external light and performing reflective display. A transflective liquid crystal display device, the first transparent electrode disposed over the transmissive region and the reflective region, laminated on the surface of the insulating film, and disposed in the reflective region, the first transparent electrode The reflective electrode laminated on a part of the surface of the first transparent electrode is disposed over the transmission region and the reflective region, and is laminated on the entire surface of the reflective electrode. And a second transparent electrode laminated on the surface.

  The first transparent electrode and the second transparent electrode are preferably made of the same material.

  At least one of the first transparent electrode and the second transparent electrode may be ITO.

  At least one of the first transparent electrode and the second transparent electrode may be IZO.

  The reflective electrode is preferably made of a metal material containing Al.

  The end portion of the first transparent electrode and the end portion of the second transparent electrode are preferably formed so as to be aligned with each other outside the reflective electrode.

  The method for manufacturing a liquid crystal display device according to the present invention includes a transmissive region for transmitting light and performing transmissive display, and a reflective region for reflecting light by reflecting external light, and the transmissive region described above. A first transparent electrode disposed over the region and the reflective region and laminated on the surface of the insulating film; a reflective electrode disposed in the reflective region and laminated on a part of the surface of the first transparent electrode; The second transparent electrode is disposed across the transmission region and the reflection region, and is laminated on the entire surface of the reflection electrode, and is laminated on the surface of the first transparent electrode outside the reflection electrode. A method of manufacturing a transflective liquid crystal display device, comprising: forming a first transparent conductive film on the insulating film; forming a metal film on a surface of the first transparent conductive film; The metal film is patterned by photolithography. A step of forming a reflective electrode; a step of forming a second transparent conductive film on the entire surface of the reflective electrode and outside the reflective electrode; and a step of forming the first transparent conductive film and the second transparent conductive film. And patterning collectively by photolithography to form the first transparent electrode from the first transparent conductive film and to form the second transparent electrode from the second transparent conductive film.

  The first transparent electrode and the second transparent electrode are preferably made of the same material.

  At least one of the first transparent electrode and the second transparent electrode may be ITO.

  At least one of the first transparent electrode and the second transparent electrode may be IZO.

  The reflective electrode is preferably made of a metal material containing Al.

-Action-
Next, the operation of the present invention will be described.

  The liquid crystal display device according to the present invention performs transmissive display by transmitting light in the transmissive region, while performing reflective display by reflecting external light in the reflective region. In the reflection region, external light passes through the second transparent electrode and is reflected by the reflective electrode on the back surface side of the second transparent electrode. The reflected light reflected by the reflective electrode is emitted to the user side after passing through the second transparent electrode.

  On the other hand, in the transmissive region, light enters the first transparent electrode from the insulating film side, passes through the first transparent electrode and the second transparent electrode, and then is emitted to the user side.

  Therefore, since it is possible to change the film thickness of the transparent electrode through which light is transmitted between the reflective region and the transmissive region, the optimal transmittance of light and the optimal color of display are individually and independently set in each region. Can be adjusted.

  Furthermore, the reflective electrode is sandwiched between the first transparent electrode and the second transparent electrode, and the outer edge portion is covered with the second transparent electrode over the entire circumference. Then, since the second transparent electrode is laminated on the surface of the first transparent electrode outside the reflective electrode, the first transparent electrode and the second transparent electrode are etched by simultaneously etching the first transparent electrode and the second transparent electrode. Can be patterned. In addition, at that time, the bonding strength between the first transparent electrode and the second transparent electrode is made larger than the bonding strength between the first transparent electrode or the second transparent electrode and the insulating film, so that the etchant becomes the first transparent electrode and the second transparent electrode. It becomes possible not to enter from between the two transparent electrodes. Therefore, the corrosion due to the etchant of the reflective electrode can be prevented.

  When manufacturing the liquid crystal display device, first, a first transparent conductive film is formed on the insulating film. Next, a metal film is formed on the surface of the first transparent conductive film, and this metal film is patterned by photolithography to form a reflective electrode. Thereafter, a second transparent conductive film is formed on the entire surface of the reflective electrode and on the outside of the reflective electrode. Next, the first transparent conductive film and the second transparent conductive film are collectively patterned by photolithography to form a first transparent electrode from the first transparent conductive film, and the second transparent conductive film To form a second transparent electrode.

  By manufacturing in this way, the end part of the first transparent electrode and the end part of the second transparent electrode are formed in alignment with each other outside the reflective electrode.

  According to the present invention, since the thickness of the transparent electrode can be made different between the reflective region and the transmissive region, the optimal transmittance of light and the optimal color of display are individually and independently set in each region. Can be adjusted. Therefore, the display quality in both the reflective region and the transmissive region can be improved. In addition, since the reflective electrode can be sandwiched between the first transparent electrode and the second transparent electrode, and the outer edge portion can be covered with the second transparent electrode over the entire circumference, the etchant is connected to the first transparent electrode and the second transparent electrode. It is possible to prevent erosion caused by the etchant of the reflective electrode by preventing intrusion from between the two transparent electrodes.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The present invention is not limited to the following embodiment.

Embodiment 1 of the Invention
1 and 2 show Embodiment 1 of the present invention.

  FIG. 1 is an enlarged cross-sectional view showing a main part of the liquid crystal display device 1 according to the first embodiment. FIG. 2 is an enlarged cross-sectional view of the transparent conductive film during etching in the first embodiment.

  The liquid crystal display device 1 according to the first embodiment is a transflective liquid crystal display device, which transmits a backlight light serving as a light source and performs transmissive display, and reflects external light. And a reflective area 19 for performing reflective display.

  The liquid crystal display device 1 includes a TFT substrate 11 as a switching element substrate, a counter substrate (not shown) disposed to face the TFT substrate, and a liquid crystal layer (not shown) interposed between the TFT substrate 11 and the counter substrate. ). The liquid crystal layer is enclosed and sealed between the TFT substrate 11 and the counter substrate by a frame-shaped sealing member (not shown). A backlight (not shown) is disposed on the back side of the TFT substrate 11 (that is, the side opposite to the liquid crystal layer).

  The counter substrate includes, for example, a common electrode made of ITO or the like, a color filter, a black matrix, and the like formed on the surface of the glass substrate on the liquid crystal layer side, and a polarizing plate attached to the side opposite to the liquid crystal layer. Yes.

  On the other hand, the TFT substrate 11 is configured as a so-called active matrix substrate. On the TFT substrate 11, a plurality of pixels (not shown), which are display unit areas, are arranged in a matrix. A plurality of gate wirings (not shown) are formed on the TFT substrate 11 so as to extend in parallel with each other. In addition, a plurality of source wirings (not shown) are formed on the TFT substrate 11 in parallel with each other, and are arranged so as to be orthogonal to the gate wiring. As a result, the TFT substrate 11 is formed with a pattern of gate lines and source lines in a grid pattern.

  Each pixel is formed by a rectangular region partitioned by the gate wiring and the source wiring. In each pixel, a pixel electrode 12 for driving the liquid crystal layer is formed. As will be described later, the pixel electrode 12 is configured by laminating a first transparent electrode 21, a reflective electrode 23, and a second transparent electrode 22 in this order.

  Each pixel is provided with a TFT (Thin-Film Transistor) 13 which is a switching element for switching and driving the pixel electrode 12. The TFT 13 includes a gate electrode 14 connected to the gate wiring, a source electrode 15 connected to the source wiring, and a drain electrode 16 connected to the pixel electrode 12.

  Thus, the signal voltage is supplied from the source wiring to the pixel electrode 12 via the source electrode 15 and the drain electrode 16 in a state where the scanning voltage is applied to the gate electrode 14 via the gate wiring. .

  The laminated structure of the TFT substrate 11 will be further described in detail with reference to FIG.

  The TFT substrate 11 includes a glass substrate 25 as a transparent substrate. The TFT 13 and the pixel electrode 12 are formed on the glass substrate 25 on the liquid crystal layer side, and a polarizing plate (not shown) is provided on the opposite side of the liquid crystal layer. Is pasted.

A buffer layer 26 is formed on the liquid crystal layer side surface of the glass substrate 25. The buffer layer 26 is made of, for example, a stacked body in which SiO ₂ and SiNO are stacked in this order, or SiO ₂ .

  On the surface of the buffer layer 26, the semiconductor layer 27 of the TFT 13 is patterned in an island shape. The semiconductor layer 27 is made of, for example, CGS (Continuous Grain silicon), LPS (Low-Temperature Poly-Silicon), α-Si (amorphous silicon), or the like. .

A gate insulating film 28 is formed on the buffer layer 26 so as to cover the semiconductor layer 27. The gate insulating film 28 is composed of a stacked body in which SiN and SiO ₂ are stacked in this order, SiO ₂ , SiN, or the like.

  A gate electrode 14 is formed on the surface of the gate insulating film 28 so as to face the semiconductor layer 27. The gate electrode 14 is configured by, for example, a stacked body in which TaN and W are stacked in this order, a stacked body in which Mo, MoW, Ti, and Al are stacked in this order, or the like.

A buffer layer 29 is formed on the gate insulating film 28 so as to cover the gate electrode 14. The buffer layer 29 is made of, for example, a laminated body in which SiO ₂ and SiN are laminated in this order, a laminated body in which SiO ₂ , SiN, and SiO ₂ are laminated in this order, SiO ₂ , SiN, or the like.

  A source electrode 15 and a drain electrode 16 are formed on the surface of the buffer layer 29. The source electrode 15 and the drain electrode 16 are connected to the semiconductor layer 27 through contact holes 30 formed through the buffer layer 29 and the gate insulating film 28, respectively. The source electrode 15 and the drain electrode 16 are a laminated body in which Ti, Al, and Ti are laminated in this order, a laminated body in which Ti and Al are laminated in this order, and a laminated body in which TiN, Al, and TiN are laminated in this order. Body, a laminated body in which Mo, Al—Nd, and Mo are laminated in this order, or a laminated body in which Mo, Al, and Mo are laminated in this order.

  A transparent resin film 31 that is an insulating film is formed on the buffer layer 29 so as to cover the source electrode 15 and the drain electrode 16. The transparent resin film 31 is made of a photosensitive resin.

  A pixel electrode 12 is formed on the surface of the transparent resin film 31. The pixel electrode 12 is configured by laminating a first transparent electrode 21, a reflective electrode 23, and a second transparent electrode 22 in this order.

  The first transparent electrode 21 is disposed over the transmissive region 18 and the reflective region 19 and is laminated on the surface of the transparent resin film 31. The first transparent electrode 21 is connected to the drain electrode 16 through a contact hole 32 formed through the transparent resin film 31. The first transparent electrode 21 is made of ITO or IZO.

  The reflective electrode 23 is disposed in the reflective region 19 and is laminated on a part of the surface of the first transparent electrode 21. The reflective electrode 23 is disposed so as to overlap the TFT 13 and is made of a metal material containing Al.

  The second transparent electrode 22 is disposed across the transmissive region 18 and the reflective region 19 and is laminated on the entire surface of the reflective electrode 23, and is laminated on the surface of the first transparent electrode 21 outside the reflective electrode 23. Yes. The second transparent electrode 22 is made of the same material as the first transparent electrode 21. That is, the first transparent electrode 21 and the second transparent electrode 22 are made of ITO or IZO, respectively.

  The material of the first transparent electrode 21 and the second transparent electrode 22 is not limited to this, and at least one of the first transparent electrode 21 and the second transparent electrode 22 may be ITO or IZO. It may be constituted by.

  As shown in FIG. 1, the end portion of the first transparent electrode 21 and the end portion of the second transparent electrode 22 are formed so as to be aligned with each other outside the reflective electrode 23 (left side in FIG. 1). In other words, the end of the first transparent electrode 21 and the end of the second transparent electrode 22 constitute a continuous side surface. Thus, the pixel electrode 12 including three layers of the first transparent electrode 21, the reflective electrode 23, and the second transparent electrode 22 is formed in the reflective region 19, while the first transparent electrode 21 and the transparent electrode 18 are formed in the transmissive region 18. A pixel electrode 12 composed of two layers of the second transparent electrode 22 is formed.

  In the liquid crystal display device 1, as shown in FIG. 1, in the reflection region 19, the external light transmitted through the second transparent electrode 22 is reflected by the reflection electrode 23 and emitted to the liquid crystal layer side to perform reflection display. Is called. On the other hand, in the transmissive region 18, the light from the backlight is sequentially transmitted through the first transparent electrode 21 and the second transparent electrode 22 and emitted to the liquid crystal layer side, thereby performing transmissive display.

-Manufacturing method-
Next, a method for manufacturing the liquid crystal display device will be described.

  First, the buffer layer 26 is uniformly formed on the glass substrate 25, and the semiconductor layer 27 is formed on the surface of the buffer layer 26 by patterning into an island shape by photolithography. Subsequently, the gate insulating film 28 is formed, and the gate electrode 14 is formed on the surface thereof by photolithography. Next, after forming a buffer layer 29 on the gate insulating film 28, a contact hole 30 is formed through the semiconductor layer 27.

  Next, the source electrode 15 and the drain electrode 16 are formed on the surface of the buffer layer 29 so as to be connected to the semiconductor layer 27 through the contact holes 30, respectively. Thereafter, a transparent resin film 31 is formed on the buffer layer 29, and contact holes 32 are formed through the transparent resin film 31.

  Next, a first transparent conductive film such as ITO or IZO is formed on the transparent resin film 31. Subsequently, a metal film is formed on the surface of the first transparent conductive film. Thereafter, the reflective film 23 is formed by patterning the metal film by photolithography.

  Next, a second transparent conductive film such as ITO or IZO is formed on the entire surface of the reflective electrode 23 and outside the reflective electrode 23. Thereafter, the first transparent conductive film and the second transparent conductive film are collectively patterned by photolithography to form the first transparent electrode 21 from the first transparent conductive film, and the second transparent conductive film. From this, the second transparent electrode 22 is formed. By manufacturing in this way, the end portion of the first transparent electrode 21 and the end portion of the second transparent electrode 22 are formed in alignment with each other outside the reflective electrode 23.

  In this way, the TFT substrate 11 is manufactured. On the other hand, a common electrode, a color filter, etc. are formed on a glass substrate to manufacture a counter substrate. Then, the liquid crystal display device 1 is manufactured by bonding the counter substrate and the TFT substrate 11 through a sealing member and a liquid crystal layer.

-Effect of Embodiment 1-
Therefore, according to the first embodiment, the liquid crystal display device 1 transmits the external light to the second transparent electrode 22 in the reflection region 19 and reflects it on the reflection electrode 23 on the back surface side of the second transparent electrode 22. be able to. Then, the reflected light reflected by the reflective electrode 23 can be emitted to the liquid crystal layer side (user side) after passing through the second transparent electrode 22. On the other hand, in the transmissive region, the light of the backlight is incident on the first transparent electrode 21 from the transparent resin film 31 side and transmitted through the first transparent electrode 21 and the second transparent electrode 22, and then the liquid crystal layer side (use To the person side).

  Therefore, since it becomes possible to make the film thicknesses of the transparent electrodes 21 and 22 through which light is transmitted in the reflective region 19 and the transmissive region 18 different from each other, the optimal transmittance of light and the optimal color of display are obtained. Each region can be adjusted independently. Therefore, the display quality in both the reflective area 19 and the transmissive area 18 can be improved.

  In addition, the reflective electrode 23 can be held between the first transparent electrode 21 and the second transparent electrode 22, and the outer edge portion of the reflective electrode 23 can be covered with the second transparent electrode 22 over the entire circumference. . Furthermore, since the second transparent electrode 22 is laminated on the surface of the first transparent electrode 21 outside the reflective electrode 23, the first transparent electrode 21 and the second transparent electrode 22 are simultaneously etched, and these first transparent electrodes The electrode 21 and the second transparent electrode 22 can be patterned together.

  In addition, at that time, the bonding strength between the first transparent electrode 21 and the second transparent electrode 22 is made larger than the bonding strength between the first transparent electrode 21 or the second transparent electrode 22 and the transparent resin film 31, and iron chloride is used. The etchant of the system can be prevented from entering between the first transparent electrode 21 and the second transparent electrode 22. Therefore, the corrosion by the etchant of the reflective electrode 23 can be prevented.

  That is, as shown in FIG. 2 showing enlarged ends of the first transparent electrode 21 and the second transparent electrode 22, when patterning the first transparent electrode 21 and the second transparent electrode 22 in a lump, the resist 35 is removed. Etching is performed after formation on the surface of the second transparent conductive film. At this time, the bonding force between the first transparent conductive film (first transparent electrode 21) and the transparent resin film 31 is such that the first transparent conductive film (first transparent electrode 21) and the second transparent conductive film (second). Since it is smaller than the bonding force with the transparent electrode 22), the end of the first transparent electrode 21 may be peeled off from the transparent resin film 31 during etching. However, since the second transparent electrode 22 is bonded to the first transparent electrode 21 with a strong bonding force, the etchant 36 may enter the gap between the first transparent electrode 21 and the transparent resin film 31. Intrusion between the 36 first transparent electrodes 21 and the second transparent electrodes 22 can be prevented. As a result, the first transparent electrode 21 and the second transparent electrode 22 can be etched using a salt iron-based etchant.

<< Embodiment 2 of the Invention >>
FIG. 3 shows a second embodiment of the present invention.

  FIG. 3 is an enlarged cross-sectional view showing a main part of the liquid crystal display device 1 according to the second embodiment. In the following embodiments, the same portions as those in FIGS. 1 and 2 are denoted by the same reference numerals, and detailed description thereof is omitted.

  In the first embodiment, the pixel electrode 12 is connected to the semiconductor layer 27 of the TFT 13 via the drain electrode 16, whereas in the second embodiment, the pixel electrode 12 is connected to the drain electrode 16 by the second transparent electrode 22. It is designed to be connected directly.

  That is, the liquid crystal display device 1 includes a TFT substrate 11, a counter substrate 42, and a liquid crystal layer 43 provided between the substrates 11 and 42. In FIG. 3, the detailed configuration of the counter substrate 42 is not shown.

  The TFT 13 in this embodiment is a bottom gate type TFT, and the surface of the semiconductor layer 27 is covered with a protective film 44. The protective film 44 is covered with the buffer layer 29. A contact hole 30 penetrating the buffer layer 29 and the protective film 44 is formed above the semiconductor layer 27.

  A first transparent electrode 21 made of ITO or IZO is formed on the surface of the buffer layer 29 serving as an insulating film and inside the contact hole 30, whereby the first transparent electrode 21 is connected to the semiconductor layer 27. . As in the first embodiment, the reflective electrode 23 is formed on the surface of the first transparent electrode 21, and the second transparent electrode 22 is formed on the first transparent electrode so as to cover the reflective electrode 23. Are stacked.

-Effect of Embodiment 2-
Therefore, according to the second embodiment as well, it is possible to make the thicknesses of the transparent electrodes 21 and 22 through which light is transmitted in the reflective region 19 and the transmissive region 18 different from each other. Display quality can be improved. In addition, since the outer edge portion of the reflective electrode 23 can be covered with the second transparent electrode 22 over the entire circumference, it is possible to prevent corrosion due to the etchant of the reflective electrode 23. Further, the manufacturing process can be simplified by omitting the structure of the drain electrode 16.

  As described above, the present invention is useful for a transflective liquid crystal display device and a manufacturing method thereof.

FIG. 1 is an enlarged cross-sectional view illustrating a main part of the liquid crystal display device according to the first embodiment. FIG. 2 is an enlarged cross-sectional view of the transparent conductive film during etching in the first embodiment. FIG. 3 is an enlarged cross-sectional view showing a main part of the liquid crystal display device according to the second embodiment. FIG. 4 is an enlarged cross-sectional view showing a main part of a conventional liquid crystal display device. FIG. 5 is an enlarged cross-sectional view showing a main part of a conventional liquid crystal display device. FIG. 6 is an enlarged cross-sectional view of a transparent conductive film during conventional etching.

Explanation of symbols

1 Liquid crystal display device
11 TFT substrate
12 pixel electrodes
13 TFT
18 Transmission area
19 Reflection area
21 First transparent electrode
22 Second transparent electrode
23 Reflective electrode
25 glass substrate
29 Buffer layer (insulating film)
31 Transparent resin film (insulating film)
35 resist
36 Etchant

Claims (11)

A transflective liquid crystal display device having a transmissive region for transmitting light and performing transmissive display, and a reflective region for reflecting light by reflecting external light,
A first transparent electrode that is disposed over the transmission region and the reflection region and is laminated on the surface of the insulating film;
A reflective electrode disposed in the reflective region and laminated on a part of the surface of the first transparent electrode;
A second transparent electrode disposed over the surface of the first transparent electrode outside the reflective electrode and disposed over the entire surface of the reflective electrode. A liquid crystal display device. The liquid crystal display device according to claim 1.
The liquid crystal display device, wherein the first transparent electrode and the second transparent electrode are made of the same material. The liquid crystal display device according to claim 1.
The liquid crystal display device, wherein at least one of the first transparent electrode and the second transparent electrode is ITO. The liquid crystal display device according to claim 1.
The liquid crystal display device, wherein at least one of the first transparent electrode and the second transparent electrode is IZO. The liquid crystal display device according to claim 1.
The liquid crystal display device, wherein the reflective electrode is made of a metal material containing Al. The liquid crystal display device according to claim 1.
An end portion of the first transparent electrode and an end portion of the second transparent electrode are formed in alignment with each other outside the reflective electrode. A transmissive region for transmitting light and performing transmissive display; and a reflective region for reflecting light by reflecting external light;
A first transparent electrode that is disposed over the transmissive region and the reflective region and is laminated on the surface of the insulating film;
A reflective electrode disposed in the reflective region and laminated on a part of the surface of the first transparent electrode;
The second transparent electrode is disposed across the transmission region and the reflection region, and is laminated on the entire surface of the reflection electrode, and is laminated on the surface of the first transparent electrode outside the reflection electrode. A method of manufacturing a transflective liquid crystal display device,
Forming a first transparent conductive film on the insulating film;
Forming a metal film on the surface of the first transparent conductive film and patterning the metal film by photolithography to form the reflective electrode;
Forming a second transparent conductive film on the entire surface of the reflective electrode and on the outside of the reflective electrode;
The first transparent conductive film and the second transparent conductive film are collectively patterned by photolithography to form the first transparent electrode from the first transparent conductive film, and the second transparent conductive film Forming the second transparent electrode. The method for manufacturing a liquid crystal display device. In the manufacturing method of the liquid crystal display device of Claim 7,
The method for manufacturing a liquid crystal display device, wherein the first transparent electrode and the second transparent electrode are made of the same material. In the manufacturing method of the liquid crystal display device of Claim 7,
At least one of said 1st transparent electrode and said 2nd transparent electrode is ITO, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. In the manufacturing method of the liquid crystal display device of Claim 7,
At least one of said 1st transparent electrode and said 2nd transparent electrode is IZO, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. In the manufacturing method of the liquid crystal display device of Claim 7,
The method for manufacturing a liquid crystal display device, wherein the reflective electrode is made of a metal material containing Al.

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