JP2010067812A - Method of optimizing recipe and system for treating substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide the method of optimizing a recipe which can automatically optimize the recipe without increasing user's work burden and prevents a deterioration and a variation in treatment quality of a substrate, and a system for treating a substrate. <P>SOLUTION: A plurality of candidate recipes are stored in a database unit 31. The treatment and inspection of a substrate W are performed using the candidate recipes sequentially. An apparatus 30 for optimizing a recipe selects a temporary best recipe from the plurality of candidate recipes based on a quality parameter QP sent from an apparatus 20 for inspecting the substrate. The apparatus 30 for optimizing the recipe creates a plurality of new candidate recipes based on the temporary best recipe. The best recipe is obtained by repeating the creation of the candidate recipe and the treatment and inspection of the substrate W until the quality parameter becomes a predetermined reference value or more. Consequently, the recipe can be automatically optimized without increasing user's work burden and a deterioration and a variation in the treatment quality of the substrate can be prevented. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention optimizes a recipe indicating processing conditions of a substrate while processing and inspecting a substrate such as a semiconductor substrate, a glass substrate for a liquid crystal display device, a glass substrate for a photomask, a substrate for an optical disk, a substrate for a micro device, etc. Regarding technology.

  In a substrate manufacturing process, a substrate processing apparatus that performs various processes on a substrate is used. The substrate processing apparatus reads a recipe indicating various processing conditions such as processing type, processing order, processing time, and supply amount of processing liquid, and processes the substrate according to the processing conditions specified by the recipe. Such a recipe is prepared for each type of substrate to be processed. Conventionally, a user creates a recipe using a tool such as a remote recipe editor and provides the created recipe to the substrate processing apparatus.

  A conventional substrate processing apparatus that processes a substrate based on a recipe is disclosed in Patent Document 1, for example.

JP 2007-157773 A

  Conventionally, a user provides a substrate processing apparatus with a recipe optimized by preliminarily executing conditions. However, when each part of the substrate processing apparatus becomes obsolete due to long-term use or an external factor such as atmospheric pressure changes in the installation environment of the substrate processing apparatus, the optimal processing conditions for the substrate may change. For this reason, when a substrate is processed based on a certain recipe over a long period of time, the processing quality of the substrate may be degraded or may vary.

  In order to prevent such deterioration and variation in the processing quality of the substrate, for example, it is conceivable that the user periodically reviews the recipe, creates a new recipe, and provides it to the substrate processing apparatus. However, the creation of a new recipe by the user and the various operations associated therewith are undesirable because they increase the user's workload.

  The present invention has been made in view of such circumstances, and recipe optimization that automatically performs recipe optimization without increasing the work burden on the user and prevents deterioration and variation in substrate processing quality. It is an object to provide a method and a substrate processing system.

  In order to solve the above-mentioned problem, the invention according to claim 1 is a recipe optimization method for optimizing a recipe indicating a processing condition of a substrate while processing and inspecting the substrate, and a plurality of candidate recipes are determined in advance. Recipe storage step for storing in the storage unit, substrate processing step for sequentially processing a plurality of substrates using the plurality of candidate recipes sequentially, and a substrate for sequentially inspecting the substrates processed in the substrate processing step The inspection process and a predetermined information processing apparatus include a selection process for selecting a best recipe from the plurality of candidate recipes based on an inspection result acquired in the substrate inspection process.

  The invention according to claim 2 is the recipe optimization method according to claim 1, wherein the information processing apparatus newly creates a plurality of candidate recipes based on the best recipe selected in the selection step. The method further includes a recipe creating step, and further using the candidate recipe created in the recipe creating step to further execute the substrate processing step, the substrate inspection step, and the selection step.

  The invention according to claim 3 is the recipe optimization method according to claim 2, wherein the recipe creation step and the substrate processing step until the inspection result acquired in the substrate inspection step satisfies a predetermined standard. And the substrate inspection step and the selection step are repeated.

  The invention according to claim 4 is the recipe optimization method according to claim 2 or claim 3, wherein, in the recipe creation step, the difference between the inspection result obtained for the best recipe and the ideal inspection result Based on the above, a new candidate recipe is created.

  The invention according to claim 5 is the recipe optimization method according to any one of claims 2 to 4, wherein, in the recipe creation step, conditions included in a plurality of newly created candidate recipes Characterized by partially increasing or decreasing the value.

  The invention according to claim 6 is a substrate processing system for optimizing a recipe indicating substrate processing conditions while processing and inspecting a substrate, a substrate processing apparatus for performing predetermined processing on the substrate, and processing A substrate inspection apparatus that performs a predetermined inspection on a subsequent substrate; and a recipe optimization apparatus that is connected to be communicable with the substrate processing apparatus and the substrate inspection apparatus. A recipe storage means for storing candidate recipes, and a transmission means for sequentially transmitting the plurality of candidate recipes to the substrate processing apparatus, wherein the substrate processing apparatus receives candidates sequentially received from the recipe optimization apparatus A plurality of substrates are sequentially processed using a recipe, and the substrate inspection apparatus sequentially inspects the substrates processed by the substrate processing apparatus and transmits inspection results to the recipe optimization apparatus. The recipe optimizing apparatus, based on the inspection result received from the substrate inspection device, and further comprising a selection means for selecting the best recipe from the plurality of candidate recipes.

  The invention according to claim 7 is the substrate processing system according to claim 6, wherein the recipe optimization device newly creates a plurality of candidate recipes based on the best recipe selected by the selection means. Further comprising a recipe creating means, using a plurality of candidate recipes created by the recipe creating means, sending a candidate recipe by the sending means, processing a substrate by the substrate processing apparatus, and a substrate by the substrate inspection apparatus And the selection of the best recipe by the selection means is further executed.

  The invention according to claim 8 is the substrate processing system according to claim 7, wherein a new candidate recipe is created by the recipe creating means until an inspection result acquired by the substrate inspection apparatus satisfies a predetermined standard. The transmission of the candidate recipe by the transmission means, the processing of the substrate by the substrate processing apparatus, the inspection of the substrate by the substrate inspection apparatus, and the selection of the best recipe by the selection means are repeated.

  The invention according to claim 9 is the substrate processing system according to claim 7 or claim 8, wherein the recipe creating means is based on a difference between an inspection result obtained for the best recipe and an ideal inspection result. And creating a new candidate recipe.

  A tenth aspect of the present invention is the substrate processing system according to any one of the seventh to ninth aspects, wherein the recipe creating means sets condition values included in a plurality of newly created candidate recipes. , Characterized by a partial increase or decrease.

  According to the invention which concerns on Claims 1-5, the recipe optimization method uses a recipe storage process which memorizes a plurality of candidate recipes in a predetermined storage part, and a plurality of candidate recipes in order, and makes a plurality of substrates. A plurality of candidates based on the inspection results obtained in the substrate inspection process, the substrate processing process for sequentially processing, the substrate inspection process for sequentially inspecting the substrates processed in the substrate processing process, and the predetermined information processing apparatus Selecting a best recipe from the recipes. For this reason, a recipe can be automatically optimized without increasing a user's work load, and deterioration and variation in substrate processing quality can be prevented.

  In particular, according to the invention according to claim 2, the recipe optimization method further includes a recipe creation process in which the information processing apparatus newly creates a plurality of candidate recipes based on the best recipe selected in the selection process. The substrate processing step, the substrate inspection step, and the selection step are further executed using the candidate recipe created in the recipe creation step. For this reason, the best recipe can be selected from better candidate recipes.

  In particular, according to the invention according to claim 3, the recipe optimization method includes a recipe creation step, a substrate processing step, a substrate inspection step, until an inspection result acquired in the substrate inspection step satisfies a predetermined standard. Repeat the selection process. For this reason, the recipe can be automatically improved until a predetermined processing quality is obtained.

  In particular, according to the invention according to claim 4, in the recipe creation step, a new candidate recipe is created based on the difference between the inspection result obtained for the best recipe and the ideal inspection result. For this reason, the candidate recipe from which higher processing quality is obtained can be created appropriately.

  In particular, according to the invention according to claim 5, in the recipe creation step, the condition values included in the plurality of newly created candidate recipes are partially increased or decreased. For this reason, it is possible to prevent the condition value from being fixed to a specific value, and to make more condition values candidates.

  Moreover, according to the invention which concerns on Claims 6-10, a recipe optimization apparatus contains the recipe memory | storage means to memorize | store a some candidate recipe, and the transmission means to transmit a some candidate recipe to a substrate processing apparatus sequentially. The substrate processing apparatus sequentially processes a plurality of substrates using candidate recipes received sequentially from the recipe optimization apparatus, and the substrate inspection apparatus sequentially inspects the substrates processed by the substrate processing apparatus. At the same time, the inspection result is transmitted to the recipe optimizing device, and the recipe optimizing device further includes selection means for selecting the best recipe from a plurality of candidate recipes based on the inspection result received from the substrate inspection device. For this reason, a recipe can be automatically optimized without increasing a user's work load, and deterioration and variation in substrate processing quality can be prevented.

  In particular, according to the invention according to claim 7, the recipe optimizing device further includes a recipe creating means for creating a plurality of candidate recipes anew based on the best recipe selected by the selecting means, and the recipe creating means Using the created candidate recipes, transmission of candidate recipes by the transmission means, processing of the substrate by the substrate processing apparatus, inspection of the substrate by the substrate inspection apparatus, and selection of the best recipe by the selection means, Let it run. For this reason, the best recipe can be selected from better candidate recipes.

  In particular, according to the invention according to claim 8, the substrate processing system creates a new candidate recipe by the recipe creation unit and a candidate by the transmission unit until the inspection result acquired by the substrate inspection apparatus satisfies a predetermined standard. The recipe transmission, the substrate processing by the substrate processing apparatus, the substrate inspection by the substrate inspection apparatus, and the selection of the best recipe by the selection means are repeated. For this reason, the recipe can be automatically improved until a predetermined processing quality is obtained.

  In particular, according to the invention of claim 9, the recipe creating means creates a new candidate recipe based on the difference between the inspection result obtained for the best recipe and the ideal inspection result. For this reason, the candidate recipe from which higher processing quality is obtained can be created appropriately.

  In particular, according to the invention of claim 10, the recipe creating means partially increases or decreases the condition values included in the plurality of newly created candidate recipes. For this reason, it is possible to prevent the condition value from being fixed to a specific value, and to make more condition values candidates.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

<1. Configuration of substrate processing system>
FIG. 1 is a diagram showing a configuration of a substrate processing system 1 according to an embodiment of the present invention. The substrate processing system 1 is a system for optimizing a recipe indicating processing conditions for a substrate W while processing and inspecting the substrate W in a manufacturing process of the substrate W, which is a semiconductor wafer. As shown in FIG. 1, the substrate processing system 1 includes a substrate processing apparatus 10, a substrate inspection apparatus 20, and a recipe optimization apparatus 30.

  FIG. 2 is a diagram illustrating a schematic configuration of the substrate processing apparatus 10. The substrate processing apparatus 10 is a so-called batch type processing apparatus that processes a plurality of substrates W while transporting them collectively. As shown in FIG. 2, the substrate processing apparatus 10 includes a carry-in / out unit 11, a chemical processing unit 12, a multi-function processing unit 13, a drying processing unit 14, a transfer robot 15, and a control unit 16. .

  The chemical processing unit 12 includes a chemical tank 12a for storing chemicals such as sulfuric acid, ammonia water, hydrochloric acid, hydrofluoric acid, hydrogen peroxide water, and a mixed solution thereof, and a lifter that moves up and down while holding a plurality of substrates W. 12b. The chemical processing unit 12 lowers the lifter 12b and immerses a plurality of substrates W in the chemical stored in the chemical tank 12a, thereby cleaning the substrate W with the chemical.

  The multi-function processing unit 13 includes a multi-function tank 13 a that stores chemical liquid and pure water while sequentially replacing them, and a lifter 13 b that moves up and down while holding a plurality of substrates W. The multi-function processing unit 13 lowers the lifter 13b to immerse a plurality of substrates W in the liquid stored in the multi-function tank 13a, and sequentially supplies chemical liquid and pure water to the multi-function tank 13a. A cleaning process is performed on the substrate W.

  The drying processing unit 14 includes a pure water tank 14 a that stores pure water, and a lifter 14 b that moves up and down while holding a plurality of substrates W. The drying processing unit 14 immerses a plurality of substrates W in pure water stored in the pure water tank 14a, depressurizes the internal space of the drying processing unit 14, and then lifts the lifter 14b to remove the plurality of substrates W. By pulling up from the pure water, water droplets adhering to the substrate W are removed.

  The transport robot 15 is a mechanism for transporting the substrate W between the loading / unloading unit 11 and the processing units 12, 13, and 14 while collectively holding a plurality of substrates W with a pair of hands.

  When processing the substrate W in the substrate processing apparatus 10, first, the cassette C storing a plurality of substrates W is set in the carry-in / out unit 11. The transport robot 15 sequentially transports the plurality of substrates W taken out from the cassette C to the chemical processing unit 12, the multi-function processing unit 13, and the drying processing unit 14. In the chemical solution processing unit 12, the multifunction processing unit 13, and the drying processing unit 14, predetermined processing is performed on the substrate W. Then, the processed substrate W is transferred to the loading / unloading unit 11 by the transfer robot 15 and stored in the cassette C again.

  The control unit 16 is a processing unit for controlling the operation of each unit of the substrate processing apparatus 10 (lifters 12b, 13b, 14b, transfer robot 15, supply / drainage mechanism, decompression mechanism, etc.). The control unit 16 is realized by a computer having a CPU and a memory, for example. The control unit 16 is communicably connected to each unit of the substrate processing apparatus 10. Moreover, the control part 16 is connected so that communication with the recipe optimization apparatus 30 is also possible. The control unit 16 receives the file storing the recipe from the recipe optimizing device 30, and advances the processing of the substrate W by controlling the operation of each unit according to the processing conditions specified by the recipe.

  Returning to FIG. The substrate inspection apparatus 20 is an apparatus for inspecting the substrate W carried out from the substrate processing apparatus 10. The substrate inspection apparatus 20 performs inspections such as detection of unevenness on the main surface of the substrate W, detection of foreign matter, observation of watermarks, measurement of film pressure, and the like by a known inspection method. The inspection items performed in the substrate inspection apparatus 20 may be a part of the above, or may include inspection items other than the above.

  When the substrate inspection apparatus 20 acquires the inspection results of the respective items, the substrate inspection apparatus 20 calculates the quality parameter QP of the inspected substrate W based on these inspection results. Here, the quality parameter QP is calculated as a value of 0 or more and 1 or less so that it becomes 1 when the inspection result is an ideal value in all inspection items and becomes smaller as the inspection result deviates from the ideal value. . That is, the quality parameter QP is a comprehensive numerical value of the processing quality of the substrate.

  The substrate inspection apparatus 20 is connected to the recipe optimization apparatus 30 so as to be communicable. The quality parameter QP calculated in the substrate inspection apparatus 20 is transmitted from the substrate inspection apparatus 20 to the recipe optimization apparatus 30.

  The recipe optimization apparatus 30 is an apparatus for transmitting a file storing a recipe to the substrate processing apparatus 10 and optimizing the recipe based on the quality parameter QP received from the substrate inspection apparatus 20. The recipe optimizing device 30 is constituted by, for example, a computer (information processing device) having a CPU and a memory. When the computer operates according to a predetermined program 32, transmission of a file storing a recipe and optimization of a recipe are performed. Realize the process.

  A database unit 31 that stores a plurality of candidate recipes R1, R2,... Described later is connected to the recipe optimization device 30. The database unit 31 is configured by a storage device such as a hard disk device.

<2. Recipe optimization procedure>
Next, the procedure for optimizing the recipe while processing and inspecting the substrate W in the substrate processing system 1 will be described with reference to the flowchart of FIG.

  First, the user creates a plurality of candidate recipes, and stores the created candidate recipes in the database unit 31 of the recipe optimization device 30 (step S1). In this embodiment, since the recipe is optimized while processing the substrate W as a product, all candidate recipes are recipes that are known to obtain a certain level of quality (that is, not necessarily the best). It is desirable that the recipe be applicable to the product.

  FIG. 4 is a diagram illustrating an example of a plurality of candidate recipes stored in the database unit 31. In the example of FIG. 4, five candidate recipes R <b> 1 to R <b> 5 are stored in the database unit 31. As shown in FIG. 4, the plurality of candidate recipes R1 to R5 are stored in the database unit 31 in the form of a table TB, and condition values t1, t2, and t3 are defined for each candidate recipe. In the table TB, an area for storing the quality parameter QP is prepared for each candidate recipe.

  In the present embodiment, the condition values t1, t2, and t3 of the candidate recipe indicate processing times in the respective processing units of the chemical processing unit 12, the multi-function processing unit 13, and the drying processing unit 14. For example, in the candidate recipe R1, the chemical treatment unit 12 performs an immersion process for 100 seconds, the multifunctional processing unit 13 performs an immersion process for 50 seconds, and the drying processing unit 14 performs a drying process for 150 seconds.

  The recipe optimizing apparatus 30 selects one candidate recipe Rn from the plurality of candidate recipes R1 to R5 stored in the database unit 31 (n = 1, 2, 3, 4, 5 in the example of FIG. 4). And the selected candidate recipe Rn is transmitted to the control unit 16 of the substrate processing apparatus 10 (step S2).

  The substrate processing apparatus 10 processes the substrate W according to the candidate recipe Rn received from the recipe optimization apparatus 30 (step S3). That is, the transfer robot 15 sequentially transfers the substrate W to the chemical solution processing unit 12, the multi-function processing unit 13, and the drying processing unit 14, and each processing unit 12, 13, and 14 performs predetermined processing on the substrate W. Is done. In the chemical processing unit 12, the multi-function processing unit 13, and the drying processing unit 14, the substrate W is processed over the processing time specified by the candidate recipe Rn.

  When the processing of the substrate W in the substrate processing apparatus 10 is completed, the user or a predetermined transport mechanism takes out the substrate W from the loading / unloading unit 11 of the substrate processing apparatus 10 and transports the processed substrate W to the substrate inspection apparatus 20 ( Step S4).

  Subsequently, the substrate inspection apparatus 20 performs a predetermined inspection on the substrate W (step S5). The substrate inspection apparatus 20 performs inspections such as detection of unevenness on the main surface of the substrate W, detection of foreign matter, observation of watermarks, measurement of film pressure, and the like by a known inspection method. When the inspection of the substrate W is completed, the substrate inspection apparatus 20 calculates a quality parameter QP that is a numerical value of 0 or more and 1 or less based on the acquired inspection result. Then, the board inspection apparatus 20 transmits the calculated quality parameter QP to the recipe optimization apparatus 30 (step S6).

  When receiving the quality parameter QP from the board inspection apparatus 20, the recipe optimizing apparatus 30 stores the received quality parameter QP in association with the candidate recipe Rn (step S7). Specifically, in the table TB of the database unit 31, the received quality parameter QP is recorded in the quality parameter column of the candidate recipe Rn.

  Thereafter, the recipe optimizing device 30 determines whether or not the quality parameters QP corresponding to all candidate recipes R1 to R5 have been acquired (step S8). There is an unselected candidate recipe, that is, a candidate recipe in which the processing of the substrate W based on the candidate recipe and the inspection of the processed substrate W are not performed and the quality parameter QP corresponding to the candidate recipe is not acquired. In that case (No in step S8), the process returns to step S2, selects one unselected candidate recipe, and repeats the processes in steps S2 to S8.

  By repeating the processes of steps S2 to S8, the recipe optimization device 30 eventually acquires quality parameters QP corresponding to all candidate recipes R1 to R5. FIG. 5 shows an example of a table TB in which acquisition of quality parameters QP corresponding to all candidate recipes R1 to R5 is completed. When the recipe optimizing apparatus 30 acquires the quality parameters QP corresponding to all the candidate recipes R1 to R5 in this way (Yes in step S8), all the quality parameters QP become equal to or higher than a preset reference value. It is determined whether or not (step S9).

  If there is a quality parameter QP that is less than the reference value among the acquired quality parameters QP (No in step S9), the recipe optimizing device 30 selects the candidate recipe (in FIG. 5) that has obtained the highest quality parameter QP. In the example, the candidate recipe R1) is designated as the provisional best recipe Ra at that time. Then, the recipe optimization device 30 newly creates a plurality of candidate recipes based on the provisional best recipe Ra (step S10).

  Here, the procedure for creating a new candidate recipe in step S10 will be described below with reference to the flowchart of FIG.

  When creating a new candidate recipe from the provisional best recipe Ra, first, a difference d between the quality parameter QP obtained for the provisional best recipe Ra and 1 that is an ideal value of the quality parameter is calculated (step S101). In the example of FIG. 5, since the quality parameter QP obtained for the provisional best recipe Ra is 0.9456, the difference d is d = 1−0.9456 = 0.0544≈0.05. The difference d indicates to what extent the quality of the substrate W is different from the ideal state when the provisional best recipe Ra is used.

  Next, by multiplying the calculated difference d by the condition values t1, t2, and t3 of the provisional best recipe Ra, adjustment values Δt1, Δt2, and the condition values t1, t2, and t3 of the provisional best recipe Ra are obtained. Δt3 is calculated (step S102). In the example of FIG. 5, the condition values of the provisional best recipe Ra are t1 = 100, t2 = 50, and t3 = 150. Therefore, the respective adjustment values are Δt1 = d · t1 = 5, Δt2 = d · t2 = 2.5≈3, Δt3 = d · t3 = 7.5≈8.

  Thereafter, new condition values t1, t2, and t3 are calculated by adding and subtracting the adjustment values Δt1, Δt2, and Δt3 to the condition values t1, t2, and t3 of the provisional best recipe Ra, respectively (step S103). In the above example, the new condition value t1 is t1 ± Δt1 = 100 ± 5 = 105,95, the new condition value t2 is t2 ± Δt2 = 50 ± 3 = 53,47, and the new condition value t3. Is t3 ± Δt3 = 150 ± 8 = 158,142.

  Then, the recipe optimization device 30 creates eight new candidate recipes R1 to R8 by combining the calculated new condition values t1, t2, and t3 (step S104). FIG. 7 is a diagram illustrating an example of eight newly created candidate recipes R1 to R8. The eight newly created recipes R1 to R8 are stored in the table TB of the database unit 31 as shown in FIG.

  Further, as shown in FIG. 8, the recipe optimizing apparatus 30 slightly changes some of the condition values in the new candidate recipes R1 to R8 (step S105). In the example of FIG. 8, the condition value t1 of the new candidate recipe R4 and the condition value t3 of the new candidate recipe R8 are slightly changed, but the candidate recipe and the condition value to be changed are random. You may choose. The change rate of the condition value may be about 1%, for example, and the increase and decrease may be generated with a probability of 1/2, for example. In this way, if some of the condition values are slightly changed, the condition values of the created candidate recipes are prevented from being fixed to a specific value (becomes a local solution). Therefore, more condition values can be considered as candidates.

  Returning to FIG. When new candidate recipes R1 to R8 are created, the recipe optimization device 30 selects one candidate recipe Rn from the new candidate recipes R1 to R8, and the selected candidate recipe Rn is selected from the substrate processing apparatus 10. (Step S2). Thereafter, the substrate processing system 1 repeats the processes of steps S2 to S8, and acquires quality parameters QP corresponding to the respective new candidate recipes R1 to R8. FIG. 9 shows an example of the table TB in which the acquisition of the quality parameter QP corresponding to each of the new candidate recipes R1 to R8 has been completed.

  Thereafter, the recipe optimizing device 30 determines whether or not the quality parameters QP corresponding to all candidate recipes R1 to R8 are equal to or greater than a preset reference value (step S9). If there is a quality parameter QP less than the reference value (No in step S9), the recipe optimizing apparatus 30 again designates the temporary best recipe Ra and new candidate recipes R1 to R8 based on the temporary best recipe Ra. (Step S10).

  When the processes of steps S2 to S10 are repeated, the quality parameters QP corresponding to all candidate recipes R1 to R8 eventually become equal to or higher than the reference value. FIG. 10 shows an example of the table TB when the quality parameters QP corresponding to all candidate recipes R1 to R8 are equal to or higher than the reference value. Thus, when the quality parameter QP corresponding to all candidate recipes R1 to R8 is equal to or higher than the reference value (Yes in step S9), the substrate processing system 1 obtains the candidate recipe (in FIG. 10) having the highest quality parameter QP. In the example, the candidate recipe R2) is designated as the best recipe Rb. Then, the best recipe Rb is transmitted to the substrate processing apparatus 10, and the recipe optimization is completed.

  Thereafter, the substrate processing apparatus 10 processes the substrate W in accordance with the best recipe Rb. However, when the processing quality of the substrate W has deteriorated due to the passage of time or a change in atmospheric pressure, the optimization of the recipe is performed again. For example, when the inspection result by the substrate inspection apparatus and the surrounding atmospheric pressure are constantly monitored and the inspection result becomes worse than a predetermined standard, or when the surrounding atmospheric pressure changes to a predetermined standard or more, the above-mentioned Recipe optimization may be automatically resumed.

  As described above, in the substrate processing system 1 of the present embodiment, a plurality of candidate recipes R1, R2,... Are stored in the database unit 31, and a plurality of candidate recipes R1, R2,. The substrates W are processed sequentially. Then, the recipe optimization device 30 selects the best recipe Rb (or provisional best recipe Ra) from the plurality of candidate recipes R1, R2,... Based on the quality parameter QP transmitted from the substrate inspection device 20. For this reason, the recipe can be automatically optimized without increasing the work burden on the user, and the deterioration or variation in the processing quality of the substrate can be prevented.

  Moreover, the substrate processing system 1 of this embodiment newly creates a plurality of candidate recipes R1 to R8 based on the provisional best recipe Ra. Then, using the plurality of newly created candidate recipes R1 to R8, processing of the substrate W, inspection of the substrate W, and selection of the best recipe Rb (or provisional best recipe Ra) are further executed. For this reason, the best recipe Rb (or provisional best recipe Ra) can be selected from better candidate recipes.

  Further, the substrate processing system 1 according to the present embodiment creates a new candidate recipe, creates a substrate W until the quality parameters QP corresponding to all candidate recipes R1, R2,... The process, the inspection of the substrate W, and the selection of the provisional best recipe Ra are repeated. For this reason, the recipe can be automatically improved until a predetermined processing quality is obtained.

  Further, the substrate processing system 1 according to the present embodiment creates new candidate recipes R1 to R8 based on the difference d between the quality parameter QP obtained for the provisional best recipe Ra and 1 that is an ideal value of the quality parameter. To do. For this reason, candidate recipe R1-R8 from which higher processing quality is obtained can be created appropriately.

<3. Modification>
As mentioned above, although main embodiment of this invention was described, this invention is not limited to said embodiment.

  In the above embodiment, the processes in steps S2 to S10 are repeated until the quality parameters QP corresponding to all candidate recipes R1, R2,... Are equal to or higher than a predetermined reference value. When one is obtained, the recipe optimization may be terminated. In this case, one candidate recipe that has obtained the quality parameter QP that is equal to or higher than the reference value may be designated as the final best recipe Rb.

  Further, in the above embodiment, when the quality parameter QP corresponding to all candidate recipes R1, R2,... Exceeds a predetermined reference value, the optimization of the recipe is terminated, but all candidate recipes R1, R2 are finished. ,... May continue to be repeated after the quality parameter QP corresponding to. That is, while the substrate processing apparatus 10 is processing the substrate W, the recipe optimization process may be continuously performed.

  In the above embodiment, the recipe has three condition values t1, t2, and t3. However, the number of condition values that the recipe has may be two or less, or four or more. May be. Further, the recipe may have, as condition values, other than the processing time, for example, the concentration of the processing liquid, the supply amount of the processing liquid, the temperature of the processing liquid, and the like.

  In the above-described embodiment, the substrate processing apparatus 10 and the substrate inspection apparatus 20 are separated from each other. However, the substrate processing apparatus 10 and the substrate inspection apparatus 20 may be an integrated apparatus. The substrate processing apparatus 10 and the substrate inspection apparatus 20 may be configured by combining a plurality of apparatuses.

  In the above embodiment, the substrate processing apparatus 10 includes the chemical solution processing unit 12, the multifunction processing unit 13, and the drying processing unit 14. You may have a process part which performs a process.

  In the above embodiment, the substrate processing apparatus 10 is a batch type substrate processing apparatus that processes a plurality of substrates W while transporting them in a batch. However, the substrate processing apparatus is configured to process the substrates W one by one. It may be a single wafer processing substrate processing apparatus.

  Further, in the above embodiment, the substrate processing apparatus 10 targets the substrate W, which is a semiconductor wafer, but the substrate processing apparatus is a glass substrate for a liquid crystal display device, a glass substrate for a photomask, a substrate for an optical disk, a micro substrate. Other substrates such as device substrates may be processed.

It is the figure which showed the structure of the substrate processing system. It is the figure which showed schematic structure of the substrate processing apparatus. It is the flowchart which showed the procedure which optimizes a recipe, performing the process and test | inspection of a board | substrate. It is the figure which showed the example of the some candidate recipe. It is the figure which showed the example of the table which acquisition of the quality parameter was completed. It is the flowchart which showed the preparation procedure of a new candidate recipe. It is the figure which showed the example of eight newly created recipes. It is the figure which showed the example which changed a part of condition value in eight newly created candidate recipes slightly. It is the figure which showed the example of the table which acquisition of the quality parameter was completed. It is the figure which showed the example of the table when the quality parameter corresponding to all the candidate recipes becomes more than a reference value.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate processing system 10 Substrate processing apparatus 11 Carrying in / out part 12 Chemical solution processing part 13 Multifunctional processing part 14 Drying process part 15 Transfer robot 16 Control part 20 Substrate inspection apparatus 30 Recipe optimization apparatus 31 Database part QP Quality parameter R1-R8, Rn Candidate recipe Ra Temporary best recipe Rb Best recipe TB table W Substrate d Difference t1, t2, t3 Condition value Δt1, Δt2, Δt3 Adjustment value

Claims (10)

A recipe optimizing method for optimizing a recipe indicating processing conditions of a substrate while performing processing and inspection of the substrate,
A recipe storing step of storing a plurality of candidate recipes in a predetermined storage unit;
A substrate processing step of sequentially processing a plurality of substrates using the plurality of candidate recipes sequentially,
A substrate inspection step of sequentially inspecting the substrates processed in the substrate processing step;
A predetermined information processing apparatus selects a best recipe from the plurality of candidate recipes based on an inspection result acquired in the substrate inspection process; and
A recipe optimization method characterized by comprising: The recipe optimization method according to claim 1,
The information processing apparatus further includes a recipe creation step for creating a plurality of new candidate recipes based on the best recipe selected in the selection step,
A recipe optimization method characterized by further executing the substrate processing step, the substrate inspection step, and the selection step using a candidate recipe created in the recipe creation step. The recipe optimization method according to claim 2,
Recipe optimization characterized by repeating the recipe creation step, the substrate processing step, the substrate inspection step, and the selection step until an inspection result acquired in the substrate inspection step satisfies a predetermined standard. Method. A recipe optimization method according to claim 2 or claim 3,
In the recipe creation step, a new candidate recipe is created based on the difference between the inspection result obtained for the best recipe and the ideal inspection result. A recipe optimization method according to any one of claims 2 to 4,
In the recipe creation step, a recipe optimization method characterized by partially increasing or decreasing condition values included in a plurality of newly created candidate recipes. A substrate processing system that optimizes a recipe indicating processing conditions of a substrate while processing and inspecting the substrate,
A substrate processing apparatus for performing predetermined processing on the substrate;
A substrate inspection apparatus for performing a predetermined inspection on the processed substrate;
A recipe optimizing apparatus communicably connected to the substrate processing apparatus and the substrate inspection apparatus;
With
The recipe optimization device is:
Recipe storage means for storing a plurality of candidate recipes;
Transmitting means for sequentially transmitting the plurality of candidate recipes to the substrate processing apparatus;
Have
The substrate processing apparatus sequentially processes a plurality of substrates using candidate recipes sequentially received from the recipe optimization device,
The substrate inspection apparatus sequentially inspects the substrates processed by the substrate processing apparatus, and transmits inspection results to the recipe optimization apparatus,
The recipe optimization device is:
The substrate processing system further comprising selection means for selecting a best recipe from the plurality of candidate recipes based on an inspection result received from the substrate inspection apparatus. The substrate processing system according to claim 6,
The recipe optimization device is:
Based on the best recipe selected by the selection means, further comprising a recipe creation means for newly creating a plurality of candidate recipes,
Using a plurality of candidate recipes created by the recipe creation means, transmission of candidate recipes by the transmission means, processing of substrates by the substrate processing apparatus, inspection of substrates by the substrate inspection apparatus, and the selection means And further selecting the best recipe according to the substrate processing system. The substrate processing system according to claim 7, comprising:
Until the inspection result acquired by the substrate inspection apparatus satisfies a predetermined standard, creation of a new candidate recipe by the recipe creation means, transmission of the candidate recipe by the transmission means, and processing of the substrate by the substrate processing apparatus, A substrate processing system characterized by repeating inspection of a substrate by the substrate inspection apparatus and selection of a best recipe by the selection means. A substrate processing system according to claim 7 or claim 8, wherein
The said board | substrate process system characterized by the said recipe preparation means creating a new candidate recipe based on the difference of the test result obtained about the best recipe, and an ideal test result. A substrate processing system according to any one of claims 7 to 9, wherein
The substrate processing system, wherein the recipe creating means partially increases or decreases a condition value included in a plurality of newly created candidate recipes.

Images