JP2010058316A - Mold for transferring minute pattern, method for producing the mold and transfer method - Google Patents

Mold for transferring minute pattern, method for producing the mold and transfer method Download PDF

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JP2010058316A
JP2010058316A JP2008224733A JP2008224733A JP2010058316A JP 2010058316 A JP2010058316 A JP 2010058316A JP 2008224733 A JP2008224733 A JP 2008224733A JP 2008224733 A JP2008224733 A JP 2008224733A JP 2010058316 A JP2010058316 A JP 2010058316A
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mold
fine pattern
warp
transfer
molded product
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JP5165504B2 (en
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Shigeru Fujiwara
茂 藤原
Mitsunori Kokubo
光典 小久保
Hiroyoshi Sugiura
裕喜 杉浦
Shinya Itani
慎也 伊谷
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Shibaura Machine Co Ltd
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Toshiba Machine Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a mold for transferring a minute pattern, which can prevent the generation of such a phenomenon that a minute pattern to be formed on one surface of the mold is not transferred to an article to be molded. <P>SOLUTION: The mold 20 for transferring the minute pattern is provided, as one integrated body, with: a mold 21 having one surface 21a, on which the minute pattern P to be transferred to the article 11 to be molded is formed, and the other flat surface 21b on the opposite side of the one surface 21a; and a warp correction plate 22 which is stuck onto the other surface 21b of the mold 21 in heated states and then cooled, shrunken and bent together with the mold 21 in order to beforehand impart the second warp of the direction countervailing against the first warp of the mold 21 to be generated by the reaction force to be received from the article 11 to be molded when the minute pattern P is transferred to the article 11 to be molded. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、被成型品に微細パターンを転写する微細パターン転写用型、微細パターン転写用型の製造方法及び転写方法に関するものである。   The present invention relates to a fine pattern transfer mold for transferring a fine pattern to a molded product, a method for manufacturing a fine pattern transfer mold, and a transfer method.

近年、電子線描画法などで石英基板等に凹凸状の微細パターンを形成して型(モールド)を作製し、被成型品としてこの表面に成膜されたレジスト膜に前記型を所定の圧力で押圧して、当該型に形成された微細パターンを転写するナノインプリント技術が研究開発されている(例えば、非特許文献1参照)。   In recent years, a mold (mold) is produced by forming an uneven fine pattern on a quartz substrate or the like by an electron beam drawing method or the like, and the mold is applied to a resist film formed on the surface as a molded article with a predetermined pressure. Research and development has been conducted on nanoimprint technology that presses and transfers a fine pattern formed on the mold (see, for example, Non-Patent Document 1).

そして、このようなナノインプリント技術は、光ディスクや、光拡散板や、回折格子などの表面に凹凸状の微細パターンを形成する際に適用されており、ナノインプリント技術を活用する方法への関心が高くなってきている。   Such nanoimprint technology is applied when forming concave and convex fine patterns on the surface of optical disks, light diffusion plates, diffraction gratings, etc., and interest in methods that utilize nanoimprint technology has increased. It is coming.

この際、ナノオーダーの微細パターンを低コストで成型する方法としてリソグラフィ技術を用いたインプリント法が考案されている。この成型法は大別して熱インプリント法とUVインプリント法とに分類される。   At this time, an imprint method using a lithography technique has been devised as a method for forming a nano-order fine pattern at a low cost. This molding method is roughly classified into a thermal imprint method and a UV imprint method.

上記した熱インプリント法では、型の一方の面に形成した微細パターンと、被成型品となる基板の表面との間に、熱可塑性ポリマからなる樹脂を流動可能となる温度になるまで加熱してこの樹脂を流入させたのち、型を基板側に押圧して、型と樹脂をガラス転移温度以下になるまで冷却し、基板の表面に固着した樹脂の微細パターンを固化した後に型を引き離している。   In the thermal imprint method described above, a resin made of a thermoplastic polymer is heated to a temperature at which the resin can flow between the fine pattern formed on one surface of the mold and the surface of the substrate to be molded. After letting the resin flow, the mold is pressed to the substrate side, the mold and the resin are cooled to below the glass transition temperature, the fine pattern of the resin fixed on the surface of the substrate is solidified, and then the mold is pulled apart. Yes.

一方、上記したUVインプリント法では、光を透過できる透明な型を使用し、被成型品となる基板の表面に塗布したUV硬化性液に型を押しつけて、UV放射光をUV硬化性液に照射し、このUV硬化性液を硬化させて微細パターンを転写した後に型を引き離している。   On the other hand, in the UV imprint method described above, a transparent mold that can transmit light is used, the mold is pressed against the UV curable liquid applied to the surface of the substrate to be molded, and the UV radiation is applied to the UV curable liquid. The mold is separated after the UV curable liquid is cured and the fine pattern is transferred.

ここで、上記したナノインプリント技術を適用する場合に、型と被加工材(被成型品)との位置ずれを防ぎ、型と被加工材との平行度を維持することができる微小型押成形装置がある(例えば、特許文献1参照)。   Here, when applying the nanoimprint technology described above, a micro-embossing apparatus that can prevent misalignment between the mold and the workpiece (molded product) and maintain the parallelism between the mold and the workpiece. (For example, refer to Patent Document 1).

上記した特許文献1(特開2004−34300号公報)に開示された微小型押成形装置によれば、ここでの図示を省略するものの、型支持部により支持された型と、被加工材支持部により支持された被加工材とを互いに押し付けて、被加工材に型のパターンを転写する際に、型支持部又は被加工材支持部のいずれか一方に磁石を配置し、他方に磁性体又は磁石を配置し、磁気吸引力により型と被加工材との間の押し付け方向と直交する方向への相対移動を防止する旨が開示されている。
Precision Engineering Journal of the International Societies for Precision Engineering and Nanotechnology 25(2001) 192-199 特開2004−34300号公報
According to the micro-embossing apparatus disclosed in the above-mentioned Patent Document 1 (Japanese Patent Laid-Open No. 2004-34300), although not shown here, the mold supported by the mold support portion and the workpiece support When the workpiece material supported by the part is pressed against each other and the pattern of the mold is transferred to the workpiece, a magnet is arranged on either the mold support part or the workpiece support part, and the magnetic material is placed on the other side. Alternatively, it is disclosed that a magnet is arranged to prevent relative movement in a direction orthogonal to the pressing direction between the mold and the workpiece by a magnetic attraction force.
Precision Engineering Journal of the International Societies for Precision Engineering and Nanotechnology 25 (2001) 192-199 JP 2004-34300 A

ところで、上述した特許文献1に開示された微小型押成形装置では、型と被加工材との相対位置関係を調整することについて何等の記載がなく、精密加工の1種となる微細パターンの転写を行なう場合に、一般的に画像処理により型の基準と被加工材の基準との相対差を測定してアライメント調整を行なっている。   By the way, in the micro-embossing apparatus disclosed in Patent Document 1 described above, there is no description about adjusting the relative positional relationship between the mold and the workpiece, and a fine pattern transfer that is a kind of precision machining is performed. In general, the alignment adjustment is performed by measuring the relative difference between the mold reference and the workpiece reference by image processing.

図5はUVインプリント法を適用した一般的な転写装置の概略構成を示した縦断面図、図6は図5に示した転写装置において、バックアップガラスを設けないで転写を行うときの型の変形状態を模式的に示した図である。   FIG. 5 is a longitudinal sectional view showing a schematic configuration of a general transfer apparatus to which the UV imprint method is applied. FIG. 6 is a diagram of a mold when transferring without providing a backup glass in the transfer apparatus shown in FIG. It is the figure which showed the deformation | transformation state typically.

図5に示した如く、微細パターンの転写を行うための一般的な転写装置100では、被成型品101の一方の面(上面)101a上に紫外線硬化性樹脂102が成膜されおり、この被成型品101の他方の面(下面)101bが被成型品保持体103上に保持されている。   As shown in FIG. 5, in a general transfer apparatus 100 for transferring a fine pattern, an ultraviolet curable resin 102 is formed on one surface (upper surface) 101a of a molded product 101. The other surface (lower surface) 101 b of the molded product 101 is held on the molded product holder 103.

一方、型111は紫外線を透過する石英基板などを用いて一方の面(下面)111aに凹凸状の微細パターンPが形成されて、この型111が型固定板112を介して型保持体113の下面113aに保持されており、且つ、この型111は転写前に被成型品101と間隔を離して対向していると共に、不図示の上下動駆動機構により型111及び型固定板112と一体に型保持体113が上下動自在になっている。   On the other hand, the mold 111 has a concave / convex fine pattern P formed on one surface (lower surface) 111a using a quartz substrate or the like that transmits ultraviolet rays, and the mold 111 is attached to the mold holder 113 via the mold fixing plate 112. The mold 111 is held on the lower surface 113a and is opposed to the molded product 101 with a gap before transfer, and is integrated with the mold 111 and the mold fixing plate 112 by a vertical movement drive mechanism (not shown). The mold holder 113 is movable up and down.

尚、型保持体113側を上下動させずに、被成型品保持体103側を上下動させる構成でもよい。   In addition, the structure which vertically moves the to-be-molded product holding body 103 side without moving the mold holding body 113 side up and down may be sufficient.

また、この転写装置100では、例えば、UVインプリント法で転写を行うために、型保持体113内に貫通孔113b,113c,113dが穿設され、且つ、型保持体113の上方に不図示の紫外線発生器が設置されており、この紫外線発生器から出射された紫外線が貫通孔113b,113c,113d及び型111を通過して、この型111で押圧される被成型品101の上面101aに成膜した紫外線硬化性樹脂102上に照射され、この紫外線により紫外線硬化性樹脂102上に転写された微細パターンPが硬化されるようになっている。   Further, in the transfer apparatus 100, for example, in order to perform transfer by the UV imprint method, through holes 113b, 113c, and 113d are formed in the mold holder 113, and are not shown above the mold holder 113. The ultraviolet ray emitted from the ultraviolet ray generator passes through the through holes 113b, 113c, 113d and the mold 111 and is applied to the upper surface 101a of the article 101 to be pressed by the mold 111. The fine pattern P that is irradiated onto the ultraviolet curable resin 102 that has been formed and transferred onto the ultraviolet curable resin 102 is cured by the ultraviolet light.

また、この転写装置100では、型保持体113の貫通孔113d内に紫外線を透過させるバックアップガラス114を配置して、このバックアップガラス114を型111の他方の面(上面)111bに当接させて、転写の際に被成型品101から受ける力によって型111が変形することを防ぎ、均一な転写をするようにしている。   Further, in the transfer apparatus 100, a backup glass 114 that transmits ultraviolet rays is disposed in the through hole 113d of the mold holder 113, and the backup glass 114 is brought into contact with the other surface (upper surface) 111b of the mold 111. The mold 111 is prevented from being deformed by the force received from the molded product 101 during the transfer, so that a uniform transfer can be performed.

また、この転写装置100において、被成型品101と型111とのアライメントを例えば自動的に調整する場合がある。この場合、例えば、被成型品101に形成されているアライメントマーク(図示せず)と、型111に形成されているアライメントマーク(図示せず)とを、型保持体113の貫通孔113b内に設けられている2台の撮像手段(以下、カメラと記す)115を用いて撮影し、この撮影した映像を画像処理して、型111に対する被成型品101の相対的な位置を、被成型品保持体103に取り付けた不図示のX軸・Y軸テーブルを介して図示左右方向や紙面に直角な方向に移動させてアライメント調整可能になっている。   In the transfer device 100, the alignment between the product 101 and the mold 111 may be automatically adjusted, for example. In this case, for example, an alignment mark (not shown) formed on the product 101 and an alignment mark (not shown) formed on the mold 111 are placed in the through hole 113b of the mold holding body 113. Photographing is performed using two provided imaging means (hereinafter referred to as cameras) 115, and the captured image is subjected to image processing to determine the relative position of the molded article 101 with respect to the mold 111. The alignment can be adjusted by moving in the horizontal direction shown in the figure or in a direction perpendicular to the paper surface via an X-axis / Y-axis table (not shown) attached to the holding body 103.

尚、2台のカメラ115は、上記した紫外線を照射するときに型保持体113の貫通孔113b内から外部に退避するようになっている。   Note that the two cameras 115 are configured to be retracted from the inside of the through hole 113b of the mold holding body 113 when the above-described ultraviolet rays are irradiated.

そして、型111及び型固定板112と一体に型保持体113を被成型品保持体103に対して相対的に移動して型111を被成型品101に近づけ、型111で被成型品101を押圧して、型111の一方の面101aに形成されている微細パターンPを被成型品101の上面101aに成膜した紫外線硬化性樹脂102上に転写している。   Then, the mold holder 113 is moved relative to the molded article holder 103 integrally with the mold 111 and the mold fixing plate 112 to bring the mold 111 closer to the molded article 101, and the mold 111 holds the molded article 101 with the mold 111. The fine pattern P formed on the one surface 101a of the mold 111 is transferred onto the ultraviolet curable resin 102 formed on the upper surface 101a of the molded product 101 by pressing.

ところで、被成型品101と型111とのアライメントを自動的に調整する場合に、カメラ115内の撮影レンズ116と型111や被成型品101との間の焦点距離(被写界深度)等の関係から、型111にカメラ115をできるだけ近づけることが望ましいのであるが、バックアップガラス114が設けられているので、カメラ115が型111から離れてしまうと言う問題点が生じる。   By the way, when the alignment of the molded product 101 and the mold 111 is automatically adjusted, the focal distance (depth of field) between the photographing lens 116 in the camera 115 and the mold 111 or the molded product 101 is determined. From the relationship, it is desirable to make the camera 115 as close as possible to the mold 111, but since the backup glass 114 is provided, there arises a problem that the camera 115 is separated from the mold 111.

この問題点を解決するために、型111にカメラ115を近づけ、また、転写装置100の構成を簡素化する際に、型反り防止用として型111を押さえ付けるためのバックアップガラス114を設けることなく、型111による被成型品101への転写を行うと、本来、平板状であるべき型111が、転写によって被成型品101から受ける反力等により、図6に二点差線で示すように、微細パターンPが形成されている一方の面(下面)111a側が凹曲面となり、この一方の面(下面)111aと反対の他方の面(上面)111b側が凸曲面となるような反りが発生してごく僅かに変形してしまう。   In order to solve this problem, the camera 115 is brought close to the mold 111, and when the configuration of the transfer apparatus 100 is simplified, the backup glass 114 for pressing the mold 111 is not provided for preventing the mold warpage. When the mold 111 is transferred to the molded article 101, the mold 111, which should originally be flat, is caused by the reaction force received from the molded article 101 by the transfer, as shown by the two-dot chain line in FIG. Warping occurs such that one surface (lower surface) 111a side on which the fine pattern P is formed becomes a concave curved surface, and the other surface (upper surface) 111b side opposite to this one surface (lower surface) 111a becomes a convex curved surface. Deforms very slightly.

そして、型111の中央部では転写の押圧力が不十分になり、型111の中央部に設けられている微細パターンPが被成型品101に転写されない現象(いわゆる中抜け現象)が発生してしまうという問題がある。   Then, the transfer pressing force is insufficient at the central portion of the mold 111, and a phenomenon (so-called hollowing out phenomenon) occurs in which the fine pattern P provided at the central portion of the mold 111 is not transferred to the molded product 101. There is a problem of end.

そこで、型の一方の面に形成されている微細パターンを被成型品に転写する際に、型が薄い場合であっても、型反り防止用として型を押さえ付けるためのバックアップガラスを設けることなく、型の一方の面に形成されている微細パターンが被成型品に転写されない現象が発生することを防止できる微細パターン転写用型、微細パターン転写用型の製造方法及び転写装置を提供することを目的とする。   Therefore, when transferring the fine pattern formed on one surface of the mold to the molded product, even if the mold is thin, without providing a backup glass for pressing the mold to prevent mold warpage To provide a fine pattern transfer mold, a method for manufacturing a fine pattern transfer mold, and a transfer device that can prevent the occurrence of a phenomenon in which a fine pattern formed on one surface of a mold is not transferred to a molded product. Objective.

請求項1に記載の発明は、被成型品に転写するための微細パターンを一方の面に形成した型と、前記微細パターンを前記被成型品に転写するときに前記被成型品から受ける反力によって前記型に生じる第1の反りに対して相殺する方向の第2の反りを前記型に予め付与するために、前記型の他方の面上に加熱した状態で接着した後に冷却して収縮することにより前記型を湾曲させる反り補正板と一体的に備えた微細パターン転写用型である。   The invention according to claim 1 is a mold in which a fine pattern to be transferred to a molded product is formed on one surface, and a reaction force received from the molded product when the fine pattern is transferred to the molded product. In order to preliminarily give the mold a second warp in a direction that counteracts the first warp generated in the mold, the mold is cooled and contracted after being bonded on the other surface of the mold in a heated state. This is a fine pattern transfer mold provided integrally with a warp correction plate for bending the mold.

請求項2に記載の発明は、前記微細パターンを転写するときに前記型の他方の面側が凸曲面となるような前記第1の反りが生じるのに伴って、前記型の他方の面及び前記反り補正板の接着面側が凹曲面となるような前記第2の反りを予め付与する請求項1記載の微細パターン転写用型である。   According to a second aspect of the present invention, when the first warp occurs such that the other surface side of the mold becomes a convex curved surface when the fine pattern is transferred, the other surface of the mold and the 2. The fine pattern transfer mold according to claim 1, wherein the second warp is applied in advance so that the bonding surface side of the warp correction plate becomes a concave curved surface.

請求項3に記載の発明は、被成型品に転写するための微細パターンを型の一方の面に形成する工程と、前記微細パターンを前記被成型品に転写するときに前記被成型品から受ける反力によって前記型に生じる第1の反りに対して相殺する方向の第2の反りを前記型に予め付与するために、反り補正板を前記型の他方の面上に加熱した状態で接着した後に冷却して収縮させることにより前記型を湾曲させる工程とを含む微細パターン転写用型の製造方法である。   According to a third aspect of the present invention, there is provided a step of forming a fine pattern to be transferred to the molded product on one surface of the mold, and receiving from the molded product when the fine pattern is transferred to the molded product. In order to preliminarily give the mold a second warp in a direction that counteracts the first warp generated in the mold by a reaction force, a warp correction plate was bonded to the other surface of the mold in a heated state. And a step of bending the mold by cooling and contracting it later.

請求項4に記載の発明は、前記微細パターンを転写するときに前記型の他方の面側が凸曲面となるような前記第1の反りが生じるのに伴って、前記型の他方の面及び前記反り補正板の接着面側が凹曲面となるような前記第2の反りを予め付与する請求項3記載の微細パターン転写用型の製造方法である。   According to a fourth aspect of the present invention, when the first warp occurs such that the other surface side of the mold becomes a convex curved surface when the fine pattern is transferred, the other surface of the mold and the 4. The method for producing a fine pattern transfer mold according to claim 3, wherein the second warp is applied in advance so that the adhesive surface side of the warp correction plate becomes a concave curved surface.

請求項5に記載の発明は、被成型品を保持した被成型品保持体と、請求項1又は請求項2記載の微細パターン転写用型を保持した型保持体と、を備え、前記微細パターン転写用型と一体に前記型保持体を前記被成型品保持体に対して相対的に移動して前記微細パターン転写用型で前記被成型品を押圧して前記微細パターンを該被成型品上に転写する転写方法である。   The invention according to claim 5 comprises: a molded product holder that holds the molded product; and a mold holder that holds the fine pattern transfer mold according to claim 1 or 2, wherein the fine pattern is provided. The mold holder is moved relative to the molded product holder integrally with the transfer mold, and the molded product is pressed by the fine pattern transfer mold to place the fine pattern on the molded product. This is a transfer method for transferring to a film.

上記した第1,第2の発明(請求項1、2の発明)の微細パターン転写用型によれば、微細パターンを一方の面に形成した型の他方の面に反り補正板を接着して微細パターン転写用型を一体的に構成した際に、微細パターンを被成型品に転写するときに被成型品から受ける反力によって型に生じる第1の反りに対して相殺する方向の第2の反りを型に予め付与するために、反り補正板を型の他方の面上に加熱した状態で接着した後に冷却して収縮により型と共に湾曲させているので、この微細パターン転写用型を用いて微細パターンを被成型品に転写するときに、被成型品から受ける反力によって型に生じる第1の反りと、型及び反り補正板に予め付与された第2の反りとが互いに逆に反ることから相殺されて、微細パターン転写用型に反りがなく平坦になった状態で型に形成した微細パターンを被成型品上に転写すると、型の中央部に設けられている微細パターンが被成型品に転写されない現象(いわゆる中抜け現象)が発生することがなくなるために良好な転写ができると共に、転写後に微細パターン転写用型を被成型品から引き離したときに型及び反り補正板に対して第2の反りが戻るので被成型品を容易に離型することができる。   According to the fine pattern transfer mold of the first and second inventions (inventions 1 and 2), the warp correction plate is adhered to the other surface of the mold on which the fine pattern is formed on one surface. When the fine pattern transfer mold is integrally configured, the second in a direction to cancel the first warp generated in the mold by the reaction force received from the molded product when the fine pattern is transferred to the molded product. In order to preliminarily give the warp to the mold, the warp correction plate is bonded to the other surface of the mold in a heated state and then cooled and bent together with the mold by shrinkage. When the fine pattern is transferred to the molded product, the first warp generated in the mold due to the reaction force received from the molded product and the second warp previously applied to the mold and the warp correction plate are warped in reverse. This offsets and warps the mold for fine pattern transfer. If the fine pattern formed on the mold is transferred onto the molded product in a flat state, the phenomenon that the fine pattern provided at the center of the mold is not transferred to the molded product (so-called hollowing out phenomenon) occurs. Therefore, when the fine pattern transfer mold is pulled away from the molded product after the transfer, the second warp returns to the mold and the warp correction plate so that the molded product can be easily separated. Can be typed.

また、上記した第3,第4の発明(請求項3、4の発明)の微細パターン転写用型の製造方法によれば、とくに、型の一方の面に形成されている微細パターンを被成型品に転写するときに被成型品から受ける反力によって型に生じる第1の反りに対して相殺する方向の第2の反りを型に予め付与するために、反り補正板を型の他方の面上に加熱した状態で接着した後に冷却して収縮により型と共に湾曲させているので、上記した第1,第2の発明と同様の効果を得ることができる。   According to the method for manufacturing a fine pattern transfer mold of the third and fourth inventions (inventions of claims 3 and 4), in particular, a fine pattern formed on one surface of the mold is molded. In order to pre-apply a second warp to the mold in a direction that cancels the first warp generated in the mold due to the reaction force received from the molded product when transferred to the product, the warp correction plate is placed on the other surface Since it is bonded after being heated and then cooled and curved together with the mold by shrinkage, the same effects as those of the first and second inventions described above can be obtained.

更に、上記した第5の発明(請求項5の発明)の転写装置によれば、上記した第1又は第2の発明の微細パターン転写用型を用いているので、上記した第1,第2の発明と同様の効果が得られる。   Further, according to the transfer device of the fifth invention (the invention of claim 5), since the fine pattern transfer mold of the first or second invention is used, the first and second described above. The same effect as that of the present invention can be obtained.

以下に本発明に係る微細パターン転写用型、微細パターン転写用型の製造方法及び転写装置について図1〜図4を参照して詳細に説明する。   A fine pattern transfer mold, a method for manufacturing a fine pattern transfer mold, and a transfer apparatus according to the present invention will be described below in detail with reference to FIGS.

本発明に係る微細パターン転写用型、微細パターン転写用型の製造方法及び転写装置では、ナノオーダーの微細パターンを転写する際に、先に従来技術で説明したUVインプリント法を適用した場合について説明するが、これに限ることなく、熱インプリント法でも適用可能である。   In the fine pattern transfer mold, the fine pattern transfer mold manufacturing method, and the transfer apparatus according to the present invention, when the UV imprint method described in the prior art is applied when transferring a nano-order fine pattern. Although described, the present invention is not limited to this, and the thermal imprint method can also be applied.

図1は本発明に係る微細パターン転写用型を模式的に示した図、
図2(a)〜(e)は本発明に係る微細パターン転写用型の製造方法を説明するために示した工程図、
図3は本発明に係る微細パターン転写用型を取り付けた転写装置の構成を示した縦断面図であり、(a)は転写前の状態を示し、(b)は転写するときの状態を示した図、
図4(a)〜(d)は本発明に係る微細パターン転写用型を取り付けた転写装置において、微細パターン転写用型で被成型品を転写する工程を示した工程図である。
FIG. 1 is a diagram schematically showing a fine pattern transfer mold according to the present invention.
FIGS. 2A to 2E are process diagrams shown for explaining a method for manufacturing a fine pattern transfer mold according to the present invention.
FIG. 3 is a longitudinal sectional view showing a configuration of a transfer apparatus to which a fine pattern transfer mold according to the present invention is attached. (A) shows a state before transfer, and (b) shows a state when transferring. Figure,
FIGS. 4A to 4D are process diagrams showing a process of transferring a product to be molded with the fine pattern transfer mold in the transfer apparatus to which the fine pattern transfer mold according to the present invention is attached.

図1に示した如く、転写対象品となる被成型品11が被成型品保持体13上に二点鎖線で示したように搭載されており、この被成型品11と対向して本発明に係る微細パターン転写用型20が実線で示したように設けられている。   As shown in FIG. 1, a molded product 11 to be transferred is mounted on a molded product holder 13 as shown by a two-dot chain line, and this molded product 11 is opposed to the molded product 11 in the present invention. Such a fine pattern transfer mold 20 is provided as shown by a solid line.

上記した本発明に係る微細パターン転写用型20は、被成型品11に転写するための凹凸状の微細パターンPを一方の面(下面)21aに形成し、且つ、一方の面(下面)21aと反対側の他方の面(上面)21bを平坦に形成した型21と、型21に形成した微細パターンPを被成型品11に転写したときに被成型品11から受ける反力によって型21に生じる第1の反りに対して相殺する方向の第2の反りを型21に予め付与するために、型21の他方の面21b上に反り補正板22と、を一体的に備えたものである。   In the fine pattern transfer mold 20 according to the present invention described above, the concave and convex fine pattern P for transferring to the product 11 is formed on one surface (lower surface) 21a, and one surface (lower surface) 21a. The mold 21 having the other surface (upper surface) 21b on the opposite side to the mold 21 and the reaction force received from the molded article 11 when the fine pattern P formed on the mold 21 is transferred to the molded article 11 are applied to the mold 21. A warp correction plate 22 is integrally provided on the other surface 21b of the mold 21 in order to preliminarily impart to the mold 21 a second warp in a direction that cancels out the generated first warp. .

反り補正板22は、加熱された状態で紫外線硬化樹脂接着剤23を用いて、他方の面21b上に接着されたものであり、この接着後に反り補正板22が冷却されて収縮し、型21を湾曲させている。なお、反り補正板22も型21と共に湾曲している。   The warpage correction plate 22 is bonded to the other surface 21b using the UV curable resin adhesive 23 in a heated state. After the bonding, the warpage correction plate 22 is cooled and contracted, and the mold 21 Is curved. The warp correction plate 22 is also curved together with the mold 21.

この際、型21に生じる第1の反りは、先に図6を用いて説明したと同様に、たとえば、型21に形成した微細パターンPを被成型品11に転写したときに発生するものであり、微細パターンPが形成されている一方の面21a側が凹曲面となり、この一方の面21aと反対の他方の面21b側が凸曲面となるような反りである。   At this time, the first warp generated in the mold 21 occurs when, for example, the fine pattern P formed on the mold 21 is transferred to the molded product 11 as described above with reference to FIG. There is a warp such that one surface 21a side on which the fine pattern P is formed becomes a concave curved surface, and the other surface 21b side opposite to the one surface 21a becomes a convex curved surface.

上記に伴って、型21及び反り補正板22に予め付与された第2の反りは、型21の他方の面(上面)21b及びこの面21bに接着される接着面となる一方の面(下面)22a側が凸曲面となるような反りであり、この際、反り補正板22は先に図5を用いて説明したバックアップガラス114の厚みよりも十分薄い厚みに設定されている。   Along with the above, the second warpage preliminarily applied to the mold 21 and the warp correction plate 22 is the other surface (upper surface) 21b of the mold 21 and one surface (lower surface) to be bonded to the surface 21b. ) The warpage is such that the 22a side becomes a convex curved surface. At this time, the warpage correction plate 22 is set to a thickness sufficiently thinner than the thickness of the backup glass 114 described above with reference to FIG.

従って、型21の他方の面21b上に反り補正板22の一方の面22aを接着した場合に型21は反り補正板22に予め付与された第2の反りに沿って変形してこの型21に第2の反りが予め付与されるが、転写するときに被成型品11から受ける反力によって型21に生じる第1の反りと、型21及び反り補正板22に予め付与された第2の反りとが互いに逆に反ることから相殺されて、微細パターン転写用型20に反りがなく平坦になった状態で型21に形成した微細パターンPを被成型品11上に転写すると、型21の中央部に設けられている微細パターンPが被成型品11に転写されない現象(いわゆる中抜け現象)が発生することがなくなるために良好な転写ができると共に、転写後に微細パターン転写用型20を被成型品11から引き離したときに型21及び反り補正板22に対して第2の反りが戻るので被成型品11を容易に離型することができるようなっている。   Therefore, when one surface 22a of the warp correction plate 22 is bonded onto the other surface 21b of the die 21, the die 21 is deformed along the second warp previously given to the warp correction plate 22 and this die 21. The second warp is applied in advance to the mold 21 due to the reaction force received from the molded article 11 during transfer, and the second warp applied to the mold 21 and the warp correction plate 22 in advance. When the fine pattern P formed on the mold 21 is transferred onto the molded product 11 in a state in which the warp and the warp are offset from each other and offset and the fine pattern transfer mold 20 is flat without warping, the mold 21 Since the phenomenon that the fine pattern P provided in the central portion of the sheet is not transferred to the molded product 11 (so-called hollowing out phenomenon) does not occur, good transfer can be performed and the fine pattern transfer mold 20 can be transferred after the transfer. 11 molded products Has to be able to easily release the object to be molded article 11 since the second warp back against the mold 21 and the warp correction plate 22 when pulled apart.

更に、微細パターン転写用型20に対してUVインプリント法を適用する場合には、型21及び反り補正板22が共に紫外線を透過する石英基板などを用いており、一方、熱インプリント法を適用する場合には、型21及び反り補正板22に対して紫外線を透過させる必要がないので適宜な材料を用いればよいものである。   Further, when the UV imprint method is applied to the fine pattern transfer mold 20, both the mold 21 and the warp correction plate 22 use a quartz substrate that transmits ultraviolet rays, while the thermal imprint method is used. In the case of application, since it is not necessary to transmit ultraviolet rays to the mold 21 and the warp correction plate 22, an appropriate material may be used.

尚、型21の左右は、型押さえの必要があるので一方の面21aから他方の面21bに向かって左右間の間隔が徐々に広がるような傾斜面21c,21dに形成するか、もしくは、一方の面21よりも一段凹ませて不図示のフランジを形成すればよいものである。   Note that the left and right sides of the mold 21 need to be pressed, so that they are formed on inclined surfaces 21c and 21d so that the distance between the left and right gradually increases from one surface 21a to the other surface 21b. It is only necessary to form a flange (not shown) that is recessed by one step from the surface 21.

ここで、本発明に係る微細パターン転写用型20の製造方法について図2(a)〜(e)を用いて説明する。   Here, the manufacturing method of the fine pattern transfer mold 20 according to the present invention will be described with reference to FIGS.

まず、図2(a)に示した第1工程では、型21と反り補正板22とを用意する。   First, in the first step shown in FIG. 2A, a mold 21 and a warp correction plate 22 are prepared.

上記した型21は、たとえば、紫外線を透過する石英ガラスなどを用いて一方の面(下面)21aに凹凸状の微細パターンPを周知の電子線描画法などにより形成し、且つ、他方の面(上面)21bを平坦に形成していると共に、左右間の長さをL1に設定している。   The above-described mold 21 is formed, for example, by using quartz glass or the like that transmits ultraviolet rays to form a concave / convex fine pattern P on one surface (lower surface) 21a by a well-known electron beam drawing method, and the other surface ( The upper surface 21b is formed flat and the length between the left and right is set to L1.

一方、上記した反り補正板22は、型21と同一の材料となる石英ガラスなどを用いて一方の面(下面)22a及び他方の面(上面)22bを共に平坦な平板に形成していると共に、左右間の長さは型21の左右間の長さL1と同じに設定している。   On the other hand, the above-described warpage correction plate 22 uses quartz glass or the like made of the same material as the mold 21 to form one surface (lower surface) 22a and the other surface (upper surface) 22b as flat flat plates. The left-right length is set to be the same as the left-right length L1 of the mold 21.

次に、図2(b)に示した第2工程では、型21の他方の面21b上に紫外線硬化樹脂接着剤23を均一な膜厚で塗布すると共に、反り補正板22を加熱して熱膨張させると、反り補正板22の左右間の長さL2が型21の左右間の長さL1より僅かに長くなる。   Next, in the second step shown in FIG. 2B, the UV curable resin adhesive 23 is applied to the other surface 21b of the mold 21 with a uniform film thickness, and the warp correction plate 22 is heated and heated. When inflated, the length L2 between the left and right sides of the warp correction plate 22 is slightly longer than the length L1 between the left and right sides of the mold 21.

次に、図2(c)に示した第3工程では、型21の他方の面21b上に塗布した紫外線硬化樹脂接着剤23上に反り補正板22を搭載し、反り補正板22の上方から紫外線Vを照射する。この際、型21の左右間の寸法L1と、反り補正板22の左右間の寸法L2とが左右対称となるように型21上に反り補正板22を搭載する。   Next, in the third step shown in FIG. 2C, the warpage correction plate 22 is mounted on the ultraviolet curable resin adhesive 23 applied on the other surface 21 b of the mold 21, and from above the warpage correction plate 22. Irradiate ultraviolet rays V. At this time, the warp correction plate 22 is mounted on the die 21 so that the left-right dimension L1 of the die 21 and the left-right dimension L2 of the warp correction plate 22 are symmetrical.

次に、図2(d)に示した第4工程では、紫外線の照射を止めると、紫外線硬化樹脂接着剤23が硬化して型21上に紫外線硬化樹脂接着剤23を介して反り補正板22が接着される。尚、この段階でも反り補正板22は熱膨張している。   Next, in the fourth step shown in FIG. 2D, when the irradiation of ultraviolet rays is stopped, the ultraviolet curable resin adhesive 23 is cured and the warp correction plate 22 is placed on the mold 21 via the ultraviolet curable resin adhesive 23. Is glued. Even at this stage, the warp correction plate 22 is thermally expanded.

次に、図2(e)に示した第5工程では、型21上に紫外線硬化樹脂接着剤23を介して反り補正板22が接着された状態で冷却すると、反り補正板22が収縮し、この収縮に伴って反り補正板22が型21と共に湾曲して、型21の他方の面(上面)21b及びこの面21bに接着される反り補正板22の一方の面(下面)22a側が凸曲面となるような反りが付与されて、左右間の長さL1’が初期の長さL1よりも僅かに短くなる。そして、型21の一方の面21aに凹凸状の微細パターンPが形成した型21と反り補正板22とが一体化されて本発明に係る微細パターン転写用型20が得られる。   Next, in the fifth step shown in FIG. 2E, when the warp correction plate 22 is cooled on the mold 21 with the UV curable resin adhesive 23 bonded thereto, the warp correction plate 22 contracts, As the shrinkage occurs, the warp correction plate 22 is curved together with the die 21, and the other surface (upper surface) 21b of the die 21 and one surface (lower surface) 22a side of the warp correction plate 22 bonded to the surface 21b are convex curved surfaces. A warp such that the length L1 ′ between the left and right is slightly shorter than the initial length L1. Then, the mold 21 having the concave and convex fine pattern P formed on the one surface 21a of the mold 21 and the warp correction plate 22 are integrated to obtain the micropattern transfer mold 20 according to the present invention.

ここで、本発明に係る微細パターン転写用型を適用した転写装置について図3(a),(b)を用いて説明する。   Here, a transfer apparatus to which the fine pattern transfer mold according to the present invention is applied will be described with reference to FIGS.

図3(s)に示した如く、本発明に係る微細パターン転写用型20を適用した転写装置10では、被成型品11の一方の面(上面)11aに紫外線硬化性樹脂12が成膜されおり、この被成型品11の他方の面(下面)11bが被成型品保持体13上に保持されている。   As shown in FIG. 3 (s), in the transfer apparatus 10 to which the fine pattern transfer mold 20 according to the present invention is applied, an ultraviolet curable resin 12 is formed on one surface (upper surface) 11a of the article 11 to be molded. The other surface (lower surface) 11 b of the molded product 11 is held on the molded product holding body 13.

一方、本発明に係る微細パターン転写用型20は、型固定板24を介して型保持体25の下面25aに保持されており、且つ、この微細パターン転写用型20は転写前に被成型品11と間隔を離して対向していると共に、不図示の上下動駆動機構により微細パターン転写用型20及び型固定板24と一体に型保持体25が上下動自在になっている。   On the other hand, the fine pattern transfer mold 20 according to the present invention is held on the lower surface 25a of the mold holding body 25 via a mold fixing plate 24, and the fine pattern transfer mold 20 is molded before transfer. The mold holder 25 is vertically movable integrally with the fine pattern transfer mold 20 and the mold fixing plate 24 by a vertical movement drive mechanism (not shown).

尚、型保持体25側を上下動させずに、被成型品保持体13側を上下動させる構成でもよい。   In addition, the structure which moves the to-be-molded product holding body 13 up and down without moving the mold holding body 25 side up and down may be used.

上記した微細パターン転写用型20は、前述したように、一方の面21aに凹凸状の微細パターンPを形成した型21の他方の面21b上に反り補正板22の一方の面22aが接着されて一体化されたものであり、且つ、転写するときに被成型品11から受ける反力によって型21に生じる第1の反りを相殺する方向の第2の反りが型21及び反り補正板22に予め付与されている。   As described above, in the fine pattern transfer mold 20, the one surface 22a of the warp correction plate 22 is bonded to the other surface 21b of the mold 21 in which the concave and convex fine pattern P is formed on the one surface 21a. The second warp in the direction that cancels the first warp that occurs in the mold 21 due to the reaction force received from the molded article 11 during transfer is applied to the mold 21 and the warp correction plate 22. It is given in advance.

即ち、微細パターン転写用型20は、転写するときに型21の他方の面21b側が凸曲面になるような第1の反りが発生することを仮定した上で、型21の他方の面21b及びこの面21bに接着される反り補正板22の一方の面22a側が凹曲面になるような第2の反りが予め付与された状態で型固定板24を介して型保持体25に取り付けられている。   That is, the fine pattern transfer mold 20 assumes that a first warp occurs so that the other surface 21b side of the mold 21 becomes a convex curved surface when transferring, and then the other surface 21b of the mold 21 and The warp correction plate 22 bonded to the surface 21b is attached to the mold holding body 25 via the mold fixing plate 24 in a state in which a second warp such that one surface 22a side becomes a concave curved surface is provided in advance. .

また、この転写装置10では、例えば、UVインプリント法で転写を行うために、型保持体25内に貫通孔25b,25cが穿設され、且つ、型保持体25の上方に不図示の紫外線発生器が設置されており、この紫外線発生器から出射された紫外線が貫通孔25b,25c及び微細パターン転写用型20を通過して、この微細パターン転写用型20で押圧される被成型品11の一方の面11aに成膜した紫外線硬化性樹脂12に照射され上、この紫外線により紫外線硬化性樹脂12上に転写される微細パターン(図示せず)が硬化されるようになっている。   Further, in the transfer device 10, for example, through holes 25 b and 25 c are formed in the mold holding body 25 in order to perform transfer by the UV imprint method, and ultraviolet rays (not shown) are provided above the mold holding body 25. A generator is installed, and ultraviolet rays emitted from the ultraviolet generator pass through the through holes 25b and 25c and the fine pattern transfer mold 20 and are pressed by the fine pattern transfer mold 20. A fine pattern (not shown) transferred onto the ultraviolet curable resin 12 is cured by irradiating the ultraviolet curable resin 12 formed on the one surface 11a of the film.

また、この転写装置10において、被成型品11と微細パターン転写用型20とのアライメントを例えば自動的に調整する場合がある。この場合、例えば、被成型品11に形成されているアライメントマーク(図示せず)と、微細パターン転写用型20に形成されているアライメントマーク(図示せず)とを、型保持体25の貫通孔25b内に設けられている2台の撮像手段(以下、カメラと記す)26を用いて撮影し、この撮影した映像を画像処理して、微細パターン転写用型20に対する被成型品11の相対的な位置を、被成型品保持体13に取り付けた不図示のX軸・Y軸テーブルを介して図示左右方向や紙面に直角な方向に移動させてアライメント調整可能になっている。   Further, in this transfer apparatus 10, the alignment between the molded product 11 and the fine pattern transfer mold 20 may be automatically adjusted, for example. In this case, for example, an alignment mark (not shown) formed on the molded article 11 and an alignment mark (not shown) formed on the fine pattern transfer mold 20 are passed through the mold holder 25. Photographing is performed using two imaging means (hereinafter referred to as cameras) 26 provided in the hole 25b, and the captured image is subjected to image processing, so that the molded product 11 is relatively relative to the fine pattern transfer mold 20 The alignment position can be adjusted by moving the actual position in the horizontal direction in the figure or in a direction perpendicular to the paper surface via an X-axis / Y-axis table (not shown) attached to the molded product holder 13.

尚、2台のカメラ26は、上記した紫外線を照射するときに型保持体25の貫通孔25b内から外部に退避するようになっている。   Note that the two cameras 26 are configured to retreat to the outside from the inside of the through hole 25b of the mold holding body 25 when the above-described ultraviolet rays are irradiated.

この実施例の場合には、先に図5を用いて説明したバックアップガラス114が設けられていないので、カメラ26内の撮影レンズ27を微細パターン転写用型20にできるだけ近づけることができ、アライメント調整を確実に行なうことができる。   In the case of this embodiment, since the backup glass 114 previously described with reference to FIG. 5 is not provided, the photographing lens 27 in the camera 26 can be brought as close as possible to the fine pattern transfer mold 20 and alignment adjustment can be performed. Can be performed reliably.

そして、2台のカメラ26でアライメン調整して、2台のカメラ26を型保持体25の外部に退避させた後に、図3(b)に示した如く、微細パターン転写用型20及び型固定板24と一体に型保持体25を被成型品保持体13に対して相対的に移動して微細パターン転写用型20を被成型品11に近づけ、微細パターン転写用型20で被成型品11を押圧し、微細パターン転写用型20の型21の一方の面21aに形成されている微細パターンPを紫外線硬化性樹脂12上に転写し、更に、微細パターン転写用型20の上方から紫外線Vを紫外線硬化性樹脂12上に照射して、紫外線硬化性樹脂12上に転写された微細パターンPを紫外線Vで硬化させている。   After aligning the two cameras 26 and retracting the two cameras 26 to the outside of the mold holder 25, as shown in FIG. 3B, the fine pattern transfer mold 20 and the mold fixing are performed. The mold holding body 25 is moved relative to the molded article holding body 13 integrally with the plate 24 to bring the fine pattern transfer mold 20 closer to the molded article 11, and the fine pattern transfer mold 20 uses the molded article 11. Is pressed to transfer the fine pattern P formed on one surface 21a of the mold 21 of the fine pattern transfer mold 20 onto the ultraviolet curable resin 12, and from the upper side of the fine pattern transfer mold 20 to the ultraviolet V Is irradiated onto the ultraviolet curable resin 12, and the fine pattern P transferred onto the ultraviolet curable resin 12 is cured with ultraviolet V.

ここで、微細パターン転写用型20の型21を被成型品11に押圧すると、前述したように、転写するときに被成型品11から受ける反力によって型21の他方の面21b側が凸曲面となるような第1の反りが生じるが、型21の他方の面21b及びこの面21bに接着される反り補正板22の一方の面22aには凸曲面となるような第2の反りが予め付与されているために、第1の反りと第2の反りとが相殺し合うので、微細パターン転写用型20は反りがなくなって平板状となり、これにより型21の一方の面21aに形成されている微細パターンPを被成型品11に成膜した紫外線硬化性樹脂12上に良好に転写することができる。   Here, when the mold 21 of the fine pattern transfer mold 20 is pressed against the molded product 11, as described above, the other surface 21 b side of the mold 21 has a convex curved surface due to the reaction force received from the molded product 11 during transfer. However, the second warp that gives a convex curved surface is preliminarily applied to the other surface 21b of the mold 21 and one surface 22a of the warp correction plate 22 bonded to the surface 21b. Therefore, the first warp and the second warp cancel each other, so that the fine pattern transfer mold 20 has no warp and is formed into a flat plate shape, which is formed on one surface 21a of the mold 21. The fine pattern P that is present can be satisfactorily transferred onto the ultraviolet curable resin 12 formed on the molded article 11.

ここで、UVインプリント法による転写動作を図4(a)〜(d)を用いてより具体的に説明する。   Here, the transfer operation by the UV imprint method will be described more specifically with reference to FIGS.

まず、図4(a)に示した如く、微細パターンPを一方の面21aに形成した型21上に反り補正板22を紫外線硬化樹脂接着剤23により接着して一体化した微細パターン転写用型20を、被成型品11上に成膜した紫外線硬化性樹脂12に向かって矢印の方向に移動させる。   First, as shown in FIG. 4 (a), a fine pattern transfer mold in which a warp correction plate 22 is bonded and integrated with an ultraviolet curable resin adhesive 23 on a mold 21 on which a fine pattern P is formed on one surface 21a. 20 is moved in the direction of the arrow toward the ultraviolet curable resin 12 formed on the article 11.

次に、図4(b)に示した如く、微細パターン転写用型20で被成型品11上に成膜した紫外線硬化性樹脂12を押圧して、型21の一方の面21aに形成した微細パターンPを紫外線硬化性樹脂12上に転写し、且つ、微細パターン転写用型20の上方から紫外線Vを照射し、紫外線硬化性樹脂12を硬化させる。   Next, as shown in FIG. 4 (b), the fine pattern formed on one surface 21 a of the mold 21 by pressing the ultraviolet curable resin 12 formed on the molded product 11 with the fine pattern transfer mold 20. The pattern P is transferred onto the ultraviolet curable resin 12, and the ultraviolet curable resin 12 is cured by irradiating the ultraviolet ray V from above the fine pattern transfer mold 20.

この後、図4(c)に示した如く、微細パターン転写用型20を矢印の方向に移動して、微細パターン転写用型20を被成型品11側から引き離すと、被成型品11上に成膜した紫外線硬化性樹脂12上に微細パターンPが転写される。   Thereafter, as shown in FIG. 4 (c), when the fine pattern transfer mold 20 is moved in the direction of the arrow and the fine pattern transfer mold 20 is separated from the molded product 11 side, the fine pattern transfer mold 20 is placed on the molded product 11. The fine pattern P is transferred onto the ultraviolet curable resin 12 that has been formed.

そして、転写後、図4(c)に示す状態において、微細パターンPが転写されて硬化した紫外線硬化性樹脂12をマスキング部材にして、エッチングによって被成型品11上に凹凸状の被微細パターン11aPを形成し、この後、硬化した紫外線硬化性樹脂12を例えば溶剤で取り除けば、図4(d)に示すように、被成型品11の一方の面(上面)11a上に凹凸状の被微細パターン11aPが良好に形成される。   After the transfer, in the state shown in FIG. 4C, the ultraviolet curable resin 12 to which the fine pattern P has been transferred and cured is used as a masking member, and the uneven fine pattern 11aP is formed on the molded article 11 by etching. After that, if the cured ultraviolet curable resin 12 is removed with a solvent, for example, as shown in FIG. 4 (d), an uneven fine object is formed on one surface (upper surface) 11a of the article 11 to be molded. The pattern 11aP is formed satisfactorily.

本発明に係る微細パターン転写用型を模式的に示した図である。It is the figure which showed typically the type | mold for fine pattern transfer which concerns on this invention. (a)〜(e)は本発明に係る微細パターン転写用型の製造方法を説明するために示した工程図である。(A)-(e) is process drawing shown in order to demonstrate the manufacturing method of the type | mold for fine pattern transfer which concerns on this invention. 本発明に係る微細パターン転写用型を取り付けた転写装置の構成を示した縦断面図であり、(a)は転写前の状態を示し、(b)は転写するときの状態を示した図である。It is the longitudinal cross-sectional view which showed the structure of the transfer apparatus which attached the type | mold for fine pattern transfer which concerns on this invention, (a) shows the state before transfer, (b) is the figure which showed the state at the time of transfer. is there. (a)〜(d)は本発明に係る微細パターン転写用型を取り付けた転写装置において、微細パターン転写用型で被成型品を転写する工程を示した工程図である。(A)-(d) is process drawing which showed the process of transcribe | transferring a to-be-molded product with the mold for fine pattern transfer in the transfer apparatus which attached the mold for fine pattern transfer which concerns on this invention. UVインプリント法を適用した一般的な転写装置の概略構成を示した縦断面図である。It is the longitudinal cross-sectional view which showed schematic structure of the general transfer apparatus to which UV imprint method was applied. 図5に示した転写装置において、バックアップガラスを設けないで転写を行うときの型の変形状態を模式的に示した図である。FIG. 6 is a diagram schematically showing a deformed state of a mold when performing transfer without providing a backup glass in the transfer device shown in FIG. 5.

符号の説明Explanation of symbols

10…転写装置、
11…被成型品、
11a…一方の面(上面)、11a1…被微細パターン、11b…他方の面(下面)、
12…紫外線硬化性樹脂、13…被成型品保持体、
20…微細パターン転写用型、
21…型、21a…一方の面(下面)、21b…他方の面(上面)、
21c,21d…傾斜面、
22…反り補正板、22a…一方の面(下面)、22b…他方の面(上面)、
23…紫外線硬化樹脂接着剤、24…型固定板、
25…型保持体、25a…下面、25b,25c…貫通孔、
26…撮像手段(カメラ)、27…撮影レンズ、P…微細パターン。
10: Transfer device,
11 ... Molded product,
11a ... one surface (upper surface), 11a1 ... fine pattern, 11b ... the other surface (lower surface),
12 ... UV curable resin, 13 ... Molded product holder,
20 ... Fine pattern transfer mold,
21 ... Mold, 21a ... One surface (lower surface), 21b ... The other surface (upper surface),
21c, 21d ... inclined surfaces,
22 ... warpage correction plate, 22a ... one surface (lower surface), 22b ... the other surface (upper surface),
23 ... UV curable resin adhesive, 24 ... mold fixing plate,
25 ... Mold holder, 25a ... Lower surface, 25b, 25c ... Through hole,
26: imaging means (camera), 27: photographing lens, P: fine pattern.

Claims (5)

被成型品に転写するための微細パターンを一方の面に形成した型と、
前記微細パターンを前記被成型品に転写するときに前記被成型品から受ける反力によって前記型に生じる第1の反りに対して相殺する方向の第2の反りを前記型に予め付与するために、前記型の他方の面上に加熱した状態で接着した後に冷却して収縮することにより前記型を湾曲させる反り補正板と、
を一体的に備えたことを特徴とする微細パターン転写用型。
A mold having a fine pattern formed on one surface for transfer to a molded product;
In order to preliminarily give the mold a second warp in a direction that cancels the first warp generated in the mold by a reaction force received from the mold product when the fine pattern is transferred to the mold product. A warp correction plate that curves the mold by cooling and shrinking after bonding in a heated state on the other surface of the mold;
A mold for fine pattern transfer characterized by comprising
前記微細パターンを転写するときに前記型の他方の面側が凸曲面となるような前記第1の反りが生じるのに伴って、前記型の他方の面及び前記反り補正板の接着面側が凹曲面となるような前記第2の反りを予め付与することを特徴とする請求項1記載の微細パターン転写用型。   As the first warp occurs such that the other surface side of the mold becomes a convex curved surface when the fine pattern is transferred, the other surface of the mold and the adhesive surface side of the warp correction plate are concave curved surfaces. 2. The mold for fine pattern transfer according to claim 1, wherein the second warp is applied in advance. 被成型品に転写するための微細パターンを型の一方の面に形成する工程と、
前記微細パターンを前記被成型品に転写するときに前記被成型品から受ける反力によって前記型に生じる第1の反りに対して相殺する方向の第2の反りを前記型に予め付与するために、反り補正板を前記型の他方の面上に加熱した状態で接着した後に冷却して収縮させることにより前記型を湾曲させる工程と、
を含むことを特徴とする微細パターン転写用型の製造方法。
Forming a fine pattern on one side of the mold for transfer to the molded product;
In order to preliminarily give the mold a second warp in a direction that cancels the first warp generated in the mold by a reaction force received from the mold product when the fine pattern is transferred to the mold product. A step of bending the mold by cooling and shrinking after bonding the warp correction plate on the other surface of the mold in a heated state;
A method for producing a mold for transferring a fine pattern, comprising:
前記微細パターンを転写するときに前記型の他方の面側が凸曲面となるような前記第1の反りが生じるのに伴って、前記型の他方の面及び前記反り補正板の接着面側が凹曲面となるような前記第2の反りを予め付与することを特徴とする請求項3記載の微細パターン転写用型の製造方法。   As the first warp occurs such that the other surface side of the mold becomes a convex curved surface when the fine pattern is transferred, the other surface of the mold and the adhesive surface side of the warp correction plate are concave curved surfaces. 4. The method for producing a fine pattern transfer mold according to claim 3, wherein the second warp is applied in advance. 被成型品を保持した被成型品保持体と、
請求項1又は請求項2記載の微細パターン転写用型を保持した型保持体と、を備え、
前記微細パターン転写用型と一体に前記型保持体を前記被成型品保持体に対して相対的に移動して前記微細パターン転写用型で前記被成型品を押圧して前記微細パターンを該被成型品上に転写することを特徴とする転写方法。
A molded product holder that holds the molded product;
A mold holder that holds the mold for transferring a fine pattern according to claim 1 or 2,
The mold holder is moved relative to the molded article holder integrally with the fine pattern transfer mold, and the molded article is pressed with the fine pattern transfer mold to apply the fine pattern to the molded pattern holder. A transfer method characterized by transferring onto a molded product.
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