JP2010034566A - 塗布、現像装置 - Google Patents

塗布、現像装置 Download PDF

Info

Publication number
JP2010034566A
JP2010034566A JP2009211737A JP2009211737A JP2010034566A JP 2010034566 A JP2010034566 A JP 2010034566A JP 2009211737 A JP2009211737 A JP 2009211737A JP 2009211737 A JP2009211737 A JP 2009211737A JP 2010034566 A JP2010034566 A JP 2010034566A
Authority
JP
Japan
Prior art keywords
unit
block
processing
substrate
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009211737A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010034566A5 (enExample
Inventor
Masami Akumoto
正巳 飽本
Shinichi Hayashi
伸一 林
Yasushi Hayashida
林田　　安
Nobuaki Matsuoka
伸明 松岡
Yoshio Kimura
義雄 木村
Kazunari Ueda
一成 上田
Akira Ito
晃 伊東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2009211737A priority Critical patent/JP2010034566A/ja
Publication of JP2010034566A publication Critical patent/JP2010034566A/ja
Publication of JP2010034566A5 publication Critical patent/JP2010034566A5/ja
Pending legal-status Critical Current

Links

Images

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009211737A 2009-09-14 2009-09-14 塗布、現像装置 Pending JP2010034566A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009211737A JP2010034566A (ja) 2009-09-14 2009-09-14 塗布、現像装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009211737A JP2010034566A (ja) 2009-09-14 2009-09-14 塗布、現像装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2005025509A Division JP4459831B2 (ja) 2005-02-01 2005-02-01 塗布、現像装置

Publications (2)

Publication Number Publication Date
JP2010034566A true JP2010034566A (ja) 2010-02-12
JP2010034566A5 JP2010034566A5 (enExample) 2010-11-18

Family

ID=41738610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009211737A Pending JP2010034566A (ja) 2009-09-14 2009-09-14 塗布、現像装置

Country Status (1)

Country Link
JP (1) JP2010034566A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021057546A (ja) * 2019-10-02 2021-04-08 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP2021086909A (ja) * 2019-11-27 2021-06-03 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板搬送方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05178416A (ja) * 1991-11-05 1993-07-20 Tokyo Electron Ltd 板状体の処理装置及び搬送装置
JP2002252156A (ja) * 2001-02-22 2002-09-06 Tokyo Electron Ltd 処理装置
JP2004266283A (ja) * 2004-03-15 2004-09-24 Tokyo Electron Ltd 基板処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05178416A (ja) * 1991-11-05 1993-07-20 Tokyo Electron Ltd 板状体の処理装置及び搬送装置
JP2002252156A (ja) * 2001-02-22 2002-09-06 Tokyo Electron Ltd 処理装置
JP2004266283A (ja) * 2004-03-15 2004-09-24 Tokyo Electron Ltd 基板処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021057546A (ja) * 2019-10-02 2021-04-08 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP6994489B2 (ja) 2019-10-02 2022-01-14 東京エレクトロン株式会社 塗布、現像装置及び塗布、現像方法
JP2021086909A (ja) * 2019-11-27 2021-06-03 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板搬送方法
US12035576B2 (en) 2019-11-27 2024-07-09 SCREEN Holdings Co., Ltd. Substrate treating apparatus and substrate transporting method

Similar Documents

Publication Publication Date Title
JP4459831B2 (ja) 塗布、現像装置
JP5378449B2 (ja) 塗布、現像装置
JP4566035B2 (ja) 塗布、現像装置及びその方法
JP4955976B2 (ja) 塗布、現像装置及びその方法
JP4955977B2 (ja) 塗布、現像装置及びその方法
KR101100503B1 (ko) 도포· 현상장치
JP4985728B2 (ja) 塗布、現像装置及びその方法
CN104966686B (zh) 涂覆、显影装置
CN100570484C (zh) 涂敷、显影装置及其方法
CN102338984A (zh) 涂敷显影装置、涂敷显影方法和存储介质
CN1854898B (zh) 涂敷、显影装置
CN113363193B (zh) 基板处理装置和基板处理方法
JP2010041059A (ja) 塗布、現像装置
JP2006344658A (ja) 基板処理システム及び基板処理方法
JP2010034566A (ja) 塗布、現像装置
TW202324580A (zh) 基板處理裝置及基板處理方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091120

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101001

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20101130

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101207

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110207

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20110906