JP2010016283A - Drawing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a drawing device capable of performing a cut-off operation efficiently and reducing cost while satisfying the SEMI standard. <P>SOLUTION: The drawing device 100 according to one embodiment is characterized in that the device includes a plurality of control computer units 132, 134, 136 received at individual racks 122, 124, 126, respectively; a distribution switchboard 110 for supplying electricity to a plurality of control computer units 132, 134, 136; a drawing part 150 so controlled by the plurality of control computer units 132, 134, 136 as to draw patterns on a specimen 101 by an electron beam 200, and an emergency blocking switch 10 for cutting off electricity to the plurality of control computer units 132, 134, 136 at a time on an operation surface of a distribution switchboard 110. By this, cut-off operations are performed efficiently and cost is reduced while satisfying the SEMI standard. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a drawing apparatus, and more particularly, to a power supply system for a drawing apparatus that conforms to the SEMI standard in a semiconductor manufacturing apparatus.

  SEMI is an international industry association of semiconductor manufacturing equipment manufacturers, flat panel display equipment manufacturers, and semiconductor material manufacturers, and its global market expansion and smooth collaboration with manufacturers, customers, governments and supervisors in the industry. The purpose is to promote effective communication. SEMI has established a number of guidelines. Among them, SEMI S2, S8, and S14 are devised mainly by the semiconductor industry in North America, as manufacturers' responsibilities and safety awareness about products are increasing. Guidelines. Such SEMI S2, S8 and S14 are currently supported by semiconductor manufacturers not only in North America but around the world as a de facto safety standard, and SEMI S2, S8 and S14 are one of the conditions at the time of purchase contract of semiconductor manufacturing equipment. The conformity of is mandatory.

  In addition, the lithography technology responsible for the progress of miniaturization of semiconductor devices is an extremely important process for generating a pattern in the semiconductor manufacturing process. In recent years, with the high integration of LSI, circuit line widths required for semiconductor devices have been reduced year by year. In order to form a desired circuit pattern on these semiconductor devices, a highly accurate original pattern (also referred to as a reticle or a mask) is required. Here, the electron beam (electron beam) drawing technique has an essentially excellent resolution, and is used for producing a high-precision original pattern.

FIG. 5 is a conceptual diagram for explaining the operation of a conventional variable shaping type electron beam drawing apparatus.
The variable shaped electron beam (EB) drawing apparatus operates as follows. In the first aperture 410, a rectangular opening for forming the electron beam 330, for example, a rectangular opening 411 is formed. Further, the second aperture 420 is formed with a variable shaping opening 421 for shaping the electron beam 330 having passed through the opening 411 of the first aperture 410 into a desired rectangular shape. The electron beam 330 irradiated from the charged particle source 430 and passed through the opening 411 of the first aperture 410 is deflected by the deflector, passes through a part of the variable shaping opening 421 of the second aperture 420, and passes through a predetermined range. The sample 340 mounted on a stage that continuously moves in one direction (for example, the X direction) is irradiated. That is, the drawing area of the sample 340 mounted on the stage in which the rectangular shape that can pass through both the opening 411 of the first aperture 410 and the variable shaping opening 421 of the second aperture 420 is continuously moved in the X direction. (See, for example, Patent Document 1). A method of creating an arbitrary shape by passing both the opening 411 of the first aperture 410 and the variable shaping opening 421 of the second aperture 420 is referred to as a variable shaping method.

  The SEMI S2, S8, and S14 described above are also required to be applied to such a variable shaping type drawing apparatus. In the drawing apparatus, a plurality of control computer units are used to control the internal mechanism, and the plurality of control computer units are stored in individual racks. The above-described SEMI S2, S8, and S14 are also required to be adapted to the plurality of control computer units. However, it is difficult to construct a system of these multiple control computer units with only commercially available products that conform to SEMI S2, S8, and S14. For this reason, it is generally necessary to undergo a conformity assessment (safety review) by a third party. In order to adapt the system of these multiple control computer units to SEMI S2, S8 and S14, an emergency shutdown (EMO) circuit is installed in the device, or the same effect as the operation of the EMO circuit is applied to the main power off. A mechanism to demonstrate it is necessary.

  FIG. 6 is a diagram showing an example of a drawing apparatus when a system of a plurality of control computer units is adapted to SEMI S2, S8, and S14. In FIG. 6, the drawing apparatus 300 includes an electronic lens barrel 302 and a drawing chamber 304. In the drawing apparatus 300, the electron beam 312 emitted from the electron gun 306 in the electron column 302 is irradiated onto the sample 310 on the stage 308 disposed in the drawing chamber 304. The drawing apparatus 300 is connected to a plurality of racks 322, 324, and 326 in which control computer units are respectively stored, and is controlled by the control computer units stored in the racks 322, 324, and 326. The control computer units stored in the racks 322, 324, 326 are individually supplied with power from the power supply source 320 on the user facility side. In order to conform to SEMI S2, S8 and S14, it is necessary to install an emergency shutoff (EMO) circuit in the apparatus. Therefore, an emergency shutoff switch 332 is provided on the operation surface of the rack 322 and an emergency operation is provided on the operation surface of the rack 324. The cut-off switch 334 and the emergency cut-off switch 336 are arranged on the operation surface of the rack 326.

As described above, when power is supplied to the plurality of control computer units from the user facility of the drawing apparatus, it is necessary to install an EMO circuit adapted to SEMI S2, S8, and S14 for each rack in which each is stored. There was a problem that the cost increased. Furthermore, there has been a problem that when performing an emergency shutdown, it is necessary to perform a shutdown operation for all racks.
JP 2007-043083 A

  As described above, it is necessary to install an EMO circuit adapted to SEMI S2, S8, and S14 for each rack for a plurality of racks. Furthermore, there has been a problem that when performing an emergency shutdown, it is necessary to perform a shutdown operation for all racks. A method for solving these problems has not been established.

  Therefore, an object of the present invention is to provide a drawing apparatus that can overcome the above-described problems and can improve the efficiency of the shut-off operation and reduce the cost while conforming to the SEMI standard.

The drawing device of one embodiment of the present invention includes:
Multiple control computer units each stored in a separate rack;
A distribution board that supplies power to each of the control computer units;
A drawing unit that is controlled by a plurality of control computer units and draws a pattern on a sample using a charged particle beam;
With
An emergency cut-off switch for shutting off power supplied to a plurality of control computer units at a time is arranged on the operation surface of the distribution board.

  Furthermore, the emergency cut-off switch also serves as a breaker for the primary power supply supplied to the distribution board.

  According to the present invention, it is possible to improve the efficiency of cut-off work and reduce costs while conforming to the SEMI standard.

  Hereinafter, in each embodiment, a configuration using an electron beam will be described as an example of a charged particle beam. However, the charged particle beam is not limited to an electron beam, and a beam using charged particles such as an ion beam may be used. As an example of the charged particle beam drawing apparatus, a variable shaping type electron beam drawing apparatus will be described.

Embodiment 1 FIG.
FIG. 1 is a conceptual diagram illustrating a configuration of a drawing apparatus according to the first embodiment. In FIG. 1, the drawing apparatus 100 includes a drawing unit 150 and a control unit 160. The drawing apparatus 100 is an example of a charged particle beam drawing apparatus. The drawing apparatus 100 draws a predetermined pattern on the sample 101. The drawing unit 150 includes a drawing chamber 103 and an electronic lens barrel 102 disposed on the upper portion of the drawing chamber 103. In the electron column 102, an electron gun 201 and an electron optical system (not shown) are arranged. An XY stage 105 is arranged in the drawing chamber 103, and a sample 101 to be drawn is arranged on the XY stage 105. As the sample 101, for example, an exposure mask for transferring a pattern to a wafer on which a semiconductor device is formed is included. Further, this mask includes, for example, mask blanks on which no pattern is formed. The control unit 160 has a plurality of control computer units 132, 134, 136 and a distribution board 110. Each control computer unit 132, 134, 136 is stored in an individual rack 122, 124, 126, respectively. In the example of FIG. 1, the control computer unit 132 is stored in the rack 122. The control computer unit 134 is stored in the rack 124. The control computer unit 136 is stored in the rack 126. Each rack is composed of a metal casing that can be opened and closed. The distribution board 110 supplies power to the plurality of control computer units 132, 134, and 136, respectively. The distribution board 110 is supplied with power (electric power) by the primary power cable 20 from the power supply source 400 of the user facility of the drawing apparatus 100. Then, the distribution board 110 divides the power line inside, and the power cable 32 leads to the control computer unit 132 in the rack 122, the power cable 34 leads to the control computer unit 134 in the rack 124, and the power cable 36 racks the rack. The power (electric power) is supplied to the control computer unit 136 in 126. The distribution board 110 is composed of a metal casing that can be opened and closed, and an emergency cut-off switch 10 (on the operation surface of the entire door that cuts off power supplied to the plurality of control computer units 132, 134, and 136 at one time ( EMO) is arranged. The drawing unit 150 is controlled by a plurality of control computer units 132, 134, and 136. In FIG. 1, description of components other than those necessary for describing the first embodiment is omitted. The drawing apparatus 100 may normally include other necessary configurations.

  When drawing a pattern on the sample 101, the operation is as follows. The electron beam 200 emitted from the electron gun 201 is shaped into a desired shape by changing the beam shape and dimensions by an electron optical system (not shown), and the sample on the XY stage 105 arranged so as to be focused and movable. 101 is irradiated to a desired position.

  FIG. 2 is a diagram illustrating an example of an appearance of the distribution board and an internal state in which the door is opened in the first embodiment. FIG. 2A shows a front view of the distribution board 110. The front surface of the distribution board 110 serves as an operation surface, and the emergency cut-off switch 10 is disposed on the operation surface. FIG. 2B shows a side view of the distribution board 110. FIG. 2C shows the inside of the distribution board 110 with the door opened. The primary side power cable 20 inserted from the lower part of the distribution board 110 is connected to the primary side terminal of the emergency cut-off switch 10.

  FIG. 3 is a diagram illustrating a main circuit of the distribution board in the first embodiment. In FIG. 3, the emergency cut-off switch 10 also serves as a breaker for the primary power supply supplied to the distribution board 110 from the power supply source 400 by the primary power cable 20. The power supply line is branched from the secondary side terminal of the emergency cutoff switch 10 by a plurality of control computer units 132, 134, and 136, and connected to the primary side terminals of the respective breakers 12, 14, and 16. The secondary side terminals of the respective breakers 12, 14, 16 are connected to the respective terminals of the terminal block 18. Then, power cables 32, 34, and 36 are connected from the terminals of the terminal block 18 to the plurality of control computer units 132, 134, and 136, respectively.

  FIG. 4 is a conceptual diagram for explaining an example of the relationship between the emergency cut-off switch and the cut-off circuit in the first embodiment. When the knob portion 11 of the emergency cut-off switch 10 is positioned vertically, the circuit breaker is ON. In an emergency, the circuit breaker is turned off when the user turns the knob 11 to the right, for example, and the primary power supplied from the power supply source 400 by the primary power cable 20 is cut off. As a result, the power supplied to the plurality of control computer units 132, 134, 136 can be shut off at a time.

  As described above, the distribution panel 110 that supplies power to each rack is provided, and the distribution panel 110 urgently cuts off the power supplied to the plurality of secondary control computer units 132, 134, and 136 at a time. By providing the cut-off switch 10, emergency cut-off can be performed at one place. Furthermore, even if the number of racks increases due to an increase in the function of the drawing apparatus 100 or the like, emergency disconnection can be performed only with the distribution board 110. As a result, it is possible to quickly cope with an emergency, and it is possible to reduce the cost as compared with the case where an emergency cutoff circuit is provided in each rack. Therefore, it is possible to improve the efficiency of cut-off work and reduce costs while conforming to the SEMI standard.

  The embodiments have been described above with reference to specific examples. However, the present invention is not limited to these specific examples. In the above-described example, the case where the control computer units are stored in three racks is shown, but the present invention is not limited to this, and any configuration may be used as long as the control computer units are stored in two or more racks.

  In addition, although descriptions are omitted for parts and the like that are not directly required for the description of the present invention, such as a device configuration and a control method, a required device configuration and a control method can be appropriately selected and used. For example, although the description of the control unit configuration for controlling the drawing apparatus 100 is omitted, it goes without saying that the required control unit configuration is appropriately selected and used.

  In addition, all drawing apparatuses that include the elements of the present invention and whose design can be appropriately changed by those skilled in the art are included in the scope of the present invention.

1 is a conceptual diagram illustrating a configuration of a drawing apparatus according to Embodiment 1. FIG. It is a figure which shows an example of the external appearance of the distribution board in Embodiment 1, and the mode of the inside which opened the door. FIG. 3 is a diagram illustrating a main circuit of the distribution board in the first embodiment. FIG. 3 is a conceptual diagram for explaining an example of a relationship between an emergency cutoff switch and a cutoff circuit in the first embodiment. It is a conceptual diagram for demonstrating operation | movement of the conventional variable shaping type | mold electron beam drawing apparatus. It is a figure which shows an example of the drawing apparatus at the time of adapting the system of a some control computer unit to SEMI S2, S8, and S14.

Explanation of symbols

10, 332, 334, 336 Emergency cut-off switch 11 Knob section 12, 14, 16 Breaker 18 Terminal block 20 Primary power cable 32, 34, 36 Power cable 100, 300 Drawing apparatus 101, 310, 340 Sample 102, 302 Electron Barrel 103,304 Drawing chamber 105,308 XY stage 110 Distribution board 122,124,126,322,324,326 Rack 132,134,136 Control computer unit 150 Drawing unit 160 Control unit 200,312 Electron beam 201,306 Electron gun 308 Stage 320, 400 Power supply source 330 Electron beam 410 First aperture 411 Opening 420 Second aperture 421 Variable shaped opening 430 Charged particle source

Claims (2)

Multiple control computer units each stored in a separate rack;
A distribution board for supplying power to each of the plurality of control computer units;
A drawing unit controlled by the plurality of control computer units and drawing a pattern on a sample using a charged particle beam;
With
A drawing apparatus, wherein an emergency cut-off switch that cuts off power supplied to the plurality of control computer units at a time is disposed on an operation surface of the distribution board.   The drawing apparatus according to claim 1, wherein the emergency cut-off switch also serves as a breaker for a primary power source supplied to the distribution board.

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