JP2010016176A5 - - Google Patents

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Publication number
JP2010016176A5
JP2010016176A5 JP2008174695A JP2008174695A JP2010016176A5 JP 2010016176 A5 JP2010016176 A5 JP 2010016176A5 JP 2008174695 A JP2008174695 A JP 2008174695A JP 2008174695 A JP2008174695 A JP 2008174695A JP 2010016176 A5 JP2010016176 A5 JP 2010016176A5
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JP
Japan
Prior art keywords
sample holder
base
main surface
protruding end
protrusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008174695A
Other languages
Japanese (ja)
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JP2010016176A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2008174695A priority Critical patent/JP2010016176A/en
Priority claimed from JP2008174695A external-priority patent/JP2010016176A/en
Publication of JP2010016176A publication Critical patent/JP2010016176A/en
Publication of JP2010016176A5 publication Critical patent/JP2010016176A5/ja
Pending legal-status Critical Current

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Claims (5)

基体と、前記基体の一主面上に設けられた突起部と、を有する試料保持具であって、
前記突起部は、前記一主面と略平行な突出端面を有し、
前記突出端面から前記一主面に連なる側面が、
前記突出端面の周縁に連ねる凸曲面部と、前記凸曲面部から前記一主面にかけて連なる凹曲面部と、を備え、
前記頂面から、前記凸曲面部と前記凹曲面部との境界までの距離に対し、前記境界から前記一主面までの距離が、より大きくされていることを特徴とする試料保持具。 A sample holder having a base and a protrusion provided on one main surface of the base,
The protrusion has a protruding end surface substantially parallel to the one main surface,
A side surface that continues from the protruding end surface to the one main surface,
A convex curved surface portion that continues to the periphery of the protruding end surface, and a concave curved surface portion that continues from the convex curved surface portion to the one main surface,
The sample holder, wherein a distance from the boundary to the one principal surface is made larger than a distance from the top surface to a boundary between the convex curved surface portion and the concave curved surface portion. 前記境界を通って前記一主面に垂直な第１平面と、前記側面の前記一主面との接合端を通る前記第１平面に平行な第２平面とで囲まれた領域において、前記突出部に対応する部分の面積が、前記突出部以外の空間に対応する部分の面積に比べて小さくされていることを特徴とする請求項１に記載の試料保持具。 In the region surrounded by the first plane perpendicular to the one principal surface through the boundary and the second plane parallel to the first plane passing through the junction end of the side surface with the one principal surface, the protrusion 2. The sample holder according to claim 1 , wherein an area of a portion corresponding to the portion is smaller than an area of a portion corresponding to a space other than the protruding portion . 前記基体の前記一主面が、単結晶層の表面からなることを特徴とする請求項１または２に記載の試料保持具。 The sample holder according to claim 1, wherein the one main surface of the base body is formed of a surface of a single crystal layer. 前記単結晶層は、炭化珪素質焼結体からなる土台部の表面に設けられていることを特徴とする請求項３記載の試料保持具。 The sample holder according to claim 3, wherein the single crystal layer is provided on a surface of a base portion made of a silicon carbide sintered body. 基体と、前記基体の一主面上に設けられた突起部と、を有する試料保持具であって、
前記突起部は、前記一主面と略平行な突出端面を有し、
前記突出端面から前記一主面に連なる側面に、凸曲面と凹曲面とが交互に連続して配置された複数の段差領域を備えることを特徴とする試料保持具。 A sample holder having a base and a protrusion provided on one main surface of the base,
The protrusion has a protruding end surface substantially parallel to the one main surface,
A sample holder comprising a plurality of step regions in which convex curved surfaces and concave curved surfaces are alternately and continuously arranged on a side surface continuous from the protruding end surface to the one main surface.
JP2008174695A 2008-07-03 2008-07-03 Test piece holder Pending JP2010016176A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008174695A JP2010016176A (en) 2008-07-03 2008-07-03 Test piece holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008174695A JP2010016176A (en) 2008-07-03 2008-07-03 Test piece holder

Publications (2)

Publication Number Publication Date
JP2010016176A JP2010016176A (en) 2010-01-21
JP2010016176A5 true JP2010016176A5 (en) 2011-04-28

Family

ID=41702008

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008174695A Pending JP2010016176A (en) 2008-07-03 2008-07-03 Test piece holder

Country Status (1)

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JP (1) JP2010016176A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5877005B2 (en) * 2011-07-29 2016-03-02 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing apparatus, substrate holding apparatus, and substrate holding method
NL2009189A (en) 2011-08-17 2013-02-19 Asml Netherlands Bv Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method.
JP5934542B2 (en) * 2012-03-29 2016-06-15 株式会社Ｓｃｒｅｅｎホールディングス Substrate holding device and substrate processing apparatus
WO2014170929A1 (en) * 2013-04-19 2014-10-23 テクノクオーツ株式会社 Wafer-support pin
JP6236256B2 (en) * 2013-08-30 2017-11-22 日本特殊陶業株式会社 Vacuum adsorption apparatus and vacuum adsorption method
JP6244454B2 (en) 2013-09-27 2017-12-06 エーエスエムエル ネザーランズ ビー．ブイ． Support table for lithographic apparatus, lithographic apparatus and device manufacturing method
CN106663653B (en) 2014-09-30 2019-03-15 住友大阪水泥股份有限公司 Electrostatic chuck apparatus
JP2017129848A (en) * 2016-01-18 2017-07-27 Hoya株式会社 Substrate holding device, drawing device, photomask inspection device, and manufacturing method of photomask
JP6592188B2 (en) * 2016-03-30 2019-10-16 京セラ株式会社 Adsorption member
KR102206687B1 (en) * 2017-06-26 2021-01-22 니뽄 도쿠슈 도교 가부시키가이샤 Substrate holding member
JP7141262B2 (en) * 2018-06-29 2022-09-22 日本特殊陶業株式会社 SUBSTRATE HOLDING MEMBER AND MANUFACTURING METHOD THEREOF
JP2020021922A (en) * 2018-07-24 2020-02-06 住友電気工業株式会社 Substrate heating unit and surface plate
KR102338223B1 (en) * 2019-02-20 2021-12-10 스미토모 오사카 세멘토 가부시키가이샤 electrostatic chuck device
CN111837329B (en) * 2019-02-20 2023-09-22 住友大阪水泥股份有限公司 Electrostatic chuck device
JP7430074B2 (en) * 2020-02-20 2024-02-09 株式会社荏原製作所 Substrate holding device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3582116B2 (en) * 1994-11-11 2004-10-27 住友金属工業株式会社 Manufacturing method of ceramic member for wafer holder
JP2000252352A (en) * 1999-03-03 2000-09-14 Nikon Corp Substrate holder and charged particle beam aligner employing it
JP2000286329A (en) * 1999-03-31 2000-10-13 Hoya Corp Substrate-holding chuck, manufacture thereof, exposure method, manufacture of semiconductor device and aligner
JP3732060B2 (en) * 1999-12-20 2006-01-05 日本特殊陶業株式会社 Suction plate and vacuum suction device
JP2001274227A (en) * 2000-03-27 2001-10-05 Hitachi Chem Co Ltd Method of manufacturing ceramic member for holding wafer
JP2001293650A (en) * 2000-04-12 2001-10-23 Hitachi Chem Co Ltd Manufacturing method of ceramic member for holding wafer
JP2003258069A (en) * 2002-03-05 2003-09-12 Sumitomo Mitsubishi Silicon Corp Retaining tool of semiconductor wafer
JP2006216886A (en) * 2005-02-07 2006-08-17 Dainippon Screen Mfg Co Ltd Chuck, processing unit, substrate processing apparatus and method for cleaning chucking face
JP4722006B2 (en) * 2006-02-23 2011-07-13 京セラ株式会社 Sample holder

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