JP2009530866A5 - - Google Patents
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- Publication number
- JP2009530866A5 JP2009530866A5 JP2009501587A JP2009501587A JP2009530866A5 JP 2009530866 A5 JP2009530866 A5 JP 2009530866A5 JP 2009501587 A JP2009501587 A JP 2009501587A JP 2009501587 A JP2009501587 A JP 2009501587A JP 2009530866 A5 JP2009530866 A5 JP 2009530866A5
- Authority
- JP
- Japan
- Prior art keywords
- diffraction
- profile
- wavelengths
- diffraction order
- selecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 42
- 238000004088 simulation Methods 0.000 claims 16
- 238000005259 measurement Methods 0.000 claims 13
- 230000003287 optical effect Effects 0.000 claims 13
- 238000005457 optimization Methods 0.000 claims 4
- 230000002547 anomalous effect Effects 0.000 claims 2
- 230000035945 sensitivity Effects 0.000 claims 2
- 239000002023 wood Substances 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/388,265 US7428060B2 (en) | 2006-03-24 | 2006-03-24 | Optimization of diffraction order selection for two-dimensional structures |
| US11/388,265 | 2006-03-24 | ||
| PCT/US2007/007292 WO2007112022A2 (en) | 2006-03-24 | 2007-03-20 | Optimization of diffraction order selection for two-dimensional structures |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009530866A JP2009530866A (ja) | 2009-08-27 |
| JP2009530866A5 true JP2009530866A5 (https=) | 2010-04-22 |
| JP5096452B2 JP5096452B2 (ja) | 2012-12-12 |
Family
ID=38533032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009501587A Active JP5096452B2 (ja) | 2006-03-24 | 2007-03-20 | ２次元構造についての回折次数選択の最適化 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7428060B2 (https=) |
| JP (1) | JP5096452B2 (https=) |
| KR (1) | KR101342847B1 (https=) |
| CN (1) | CN101410692B (https=) |
| TW (1) | TWI365284B (https=) |
| WO (1) | WO2007112022A2 (https=) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7515283B2 (en) * | 2006-07-11 | 2009-04-07 | Tokyo Electron, Ltd. | Parallel profile determination in optical metrology |
| US7469192B2 (en) * | 2006-07-11 | 2008-12-23 | Tokyo Electron Ltd. | Parallel profile determination for an optical metrology system |
| US20080013107A1 (en) * | 2006-07-11 | 2008-01-17 | Tokyo Electron Limited | Generating a profile model to characterize a structure to be examined using optical metrology |
| US8040511B1 (en) * | 2008-01-29 | 2011-10-18 | Kla-Tencor Corporation | Azimuth angle measurement |
| US9625937B2 (en) * | 2008-08-18 | 2017-04-18 | Kla-Tencor Corporation | Computation efficiency by diffraction order truncation |
| US8560270B2 (en) * | 2008-12-09 | 2013-10-15 | Tokyo Electron Limited | Rational approximation and continued-fraction approximation approaches for computation efficiency of diffraction signals |
| US20110276319A1 (en) * | 2010-05-06 | 2011-11-10 | Jonathan Michael Madsen | Determination of material optical properties for optical metrology of structures |
| US9523800B2 (en) * | 2010-05-21 | 2016-12-20 | Kla-Tencor Corporation | Computation efficiency by iterative spatial harmonics order truncation |
| US9239522B2 (en) | 2010-10-08 | 2016-01-19 | Kla-Tencor Corporation | Method of determining an asymmetric property of a structure |
| TWI603070B (zh) * | 2011-01-03 | 2017-10-21 | 諾發測量儀器股份有限公司 | 使用於複雜之圖案化結構的量測之方法及系統 |
| US8577820B2 (en) * | 2011-03-04 | 2013-11-05 | Tokyo Electron Limited | Accurate and fast neural network training for library-based critical dimension (CD) metrology |
| US9127927B2 (en) | 2011-12-16 | 2015-09-08 | Kla-Tencor Corporation | Techniques for optimized scatterometry |
| US8762100B1 (en) | 2012-02-10 | 2014-06-24 | Tokyo Electron Limited | Numerical aperture integration for optical critical dimension (OCD) metrology |
| US10255385B2 (en) | 2012-03-28 | 2019-04-09 | Kla-Tencor Corporation | Model optimization approach based on spectral sensitivity |
| US11175589B2 (en) | 2013-06-03 | 2021-11-16 | Kla Corporation | Automatic wavelength or angle pruning for optical metrology |
| US10386729B2 (en) | 2013-06-03 | 2019-08-20 | Kla-Tencor Corporation | Dynamic removal of correlation of highly correlated parameters for optical metrology |
| US10481088B2 (en) | 2013-06-04 | 2019-11-19 | Kla-Tencor Corporation | Automatic determination of fourier harmonic order for computation of spectral information for diffraction structures |
| US10895810B2 (en) | 2013-11-15 | 2021-01-19 | Kla Corporation | Automatic selection of sample values for optical metrology |
| US9588066B2 (en) * | 2014-01-23 | 2017-03-07 | Revera, Incorporated | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) |
| US10185303B2 (en) * | 2015-02-21 | 2019-01-22 | Kla-Tencor Corporation | Optimizing computational efficiency by multiple truncation of spatial harmonics |
| JP6377582B2 (ja) * | 2015-08-06 | 2018-08-22 | 株式会社リガク | Ｘ線分析の操作ガイドシステム、操作ガイド方法、及び操作ガイドプログラム |
| CN105674909B (zh) * | 2015-12-31 | 2018-06-26 | 天津市兆瑞测控技术有限公司 | 一种高精度二维轮廓测量方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5671050A (en) * | 1994-11-07 | 1997-09-23 | Zygo Corporation | Method and apparatus for profiling surfaces using diffracative optics |
| IL130874A (en) * | 1999-07-09 | 2002-12-01 | Nova Measuring Instr Ltd | System and method for measuring pattern structures |
| KR100513574B1 (ko) | 2000-01-26 | 2005-09-09 | 팀버 테크놀로지스, 인코포레이티드 | 신속 정밀한 결합-파 분석을 위한 층 내부의 계산들의 캐싱 |
| US6943900B2 (en) * | 2000-09-15 | 2005-09-13 | Timbre Technologies, Inc. | Generation of a library of periodic grating diffraction signals |
| US6913900B2 (en) | 2001-08-29 | 2005-07-05 | Nippon Zoki Pharmaceutical Co., Ltd. | Plasma prekallikrein activation and kallikrein production assay |
| US7330279B2 (en) | 2002-07-25 | 2008-02-12 | Timbre Technologies, Inc. | Model and parameter selection for optical metrology |
| US7427521B2 (en) | 2002-10-17 | 2008-09-23 | Timbre Technologies, Inc. | Generating simulated diffraction signals for two-dimensional structures |
| US20040090629A1 (en) | 2002-11-08 | 2004-05-13 | Emmanuel Drege | Diffraction order selection for optical metrology simulation |
| US7630873B2 (en) | 2003-02-26 | 2009-12-08 | Tokyo Electron Limited | Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer |
| US7064829B2 (en) * | 2003-03-20 | 2006-06-20 | Timbre Technologies, Inc. | Generic interface for an optical metrology system |
| US7388677B2 (en) | 2004-03-22 | 2008-06-17 | Timbre Technologies, Inc. | Optical metrology optimization for repetitive structures |
| US7321426B1 (en) * | 2004-06-02 | 2008-01-22 | Kla-Tencor Technologies Corporation | Optical metrology on patterned samples |
-
2006
- 2006-03-24 US US11/388,265 patent/US7428060B2/en active Active
-
2007
- 2007-03-20 CN CN2007800105181A patent/CN101410692B/zh active Active
- 2007-03-20 WO PCT/US2007/007292 patent/WO2007112022A2/en not_active Ceased
- 2007-03-20 JP JP2009501587A patent/JP5096452B2/ja active Active
- 2007-03-23 TW TW096110094A patent/TWI365284B/zh active
-
2008
- 2008-10-21 KR KR1020087025738A patent/KR101342847B1/ko active Active
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