JP2009514774A5 - - Google Patents

Download PDF

Info

Publication number
JP2009514774A5
JP2009514774A5 JP2008540074A JP2008540074A JP2009514774A5 JP 2009514774 A5 JP2009514774 A5 JP 2009514774A5 JP 2008540074 A JP2008540074 A JP 2008540074A JP 2008540074 A JP2008540074 A JP 2008540074A JP 2009514774 A5 JP2009514774 A5 JP 2009514774A5
Authority
JP
Japan
Prior art keywords
molecules
mixtures
total
range
material according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008540074A
Other languages
English (en)
Japanese (ja)
Other versions
JP5224286B2 (ja
JP2009514774A (ja
Filing date
Publication date
Priority claimed from US11/348,956 external-priority patent/US20070105703A1/en
Priority claimed from US11/583,619 external-priority patent/US7635658B2/en
Application filed filed Critical
Publication of JP2009514774A publication Critical patent/JP2009514774A/ja
Publication of JP2009514774A5 publication Critical patent/JP2009514774A5/ja
Application granted granted Critical
Publication of JP5224286B2 publication Critical patent/JP5224286B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008540074A 2005-11-07 2006-11-01 デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法 Active JP5224286B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US73452705P 2005-11-07 2005-11-07
US60/734,527 2005-11-07
US11/348,956 US20070105703A1 (en) 2005-11-07 2006-02-06 Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same
US11/348,956 2006-02-06
US11/583,619 2006-10-19
US11/583,619 US7635658B2 (en) 2005-11-07 2006-10-19 Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
PCT/US2006/042768 WO2007053733A1 (en) 2005-11-07 2006-11-01 Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012287644A Division JP2013075827A (ja) 2005-11-07 2012-12-28 デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法

Publications (3)

Publication Number Publication Date
JP2009514774A JP2009514774A (ja) 2009-04-09
JP2009514774A5 true JP2009514774A5 (https=) 2010-07-01
JP5224286B2 JP5224286B2 (ja) 2013-07-03

Family

ID=37745897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008540074A Active JP5224286B2 (ja) 2005-11-07 2006-11-01 デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法

Country Status (5)

Country Link
US (2) US7635658B2 (https=)
EP (1) EP1963234B1 (https=)
JP (1) JP5224286B2 (https=)
KR (1) KR101363182B1 (https=)
WO (1) WO2007053733A1 (https=)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7928026B2 (en) * 2005-06-30 2011-04-19 Corning Incorporated Synthetic silica material with low fluence-dependent-transmission and method of making the same
KR101306150B1 (ko) * 2005-10-24 2013-09-10 삼성전자주식회사 탑 코팅 막용 고분자, 탑 코팅 용액 조성물 및 이를 이용한 이머젼 리소그라피 공정
JP2013075827A (ja) * 2005-11-07 2013-04-25 Corning Inc デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法
US7964522B2 (en) * 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
US20080268201A1 (en) * 2007-04-27 2008-10-30 Richard Michael Fiacco Low OH glass for infrared applications
EP2158170A2 (en) * 2007-05-09 2010-03-03 Corning Incorporated Glasses having low oh, od levels
US8062986B2 (en) * 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
US20090056381A1 (en) 2007-08-30 2009-03-05 Mueller Michael A Fused silica article loaded with deuterium and method of making
US8268740B2 (en) * 2008-02-07 2012-09-18 Corning Incorporated Halide free glasses having low OH, OD concentrations
US8218593B2 (en) * 2008-07-24 2012-07-10 Alliant Techsystems Inc. Optical devices comprising doped glass materials, laser systems including such optical devices, and methods of forming such optical devices and laser systems
US8263511B2 (en) * 2008-12-31 2012-09-11 Corning Incorporated High purity fused silica with low absolute refractive index
US8176752B2 (en) * 2009-07-23 2012-05-15 Corning Incorporated Silica glass with saturated induced absorption and method of making
EP2468692A1 (en) * 2009-08-19 2012-06-27 Asahi Glass Company, Limited Tio2-containing silicia glass, and optical member for euv lithography
US8596094B2 (en) * 2009-10-21 2013-12-03 Corning Incorporated Synthetic silica glass with uniform fictive temperature
JP5765050B2 (ja) * 2011-05-11 2015-08-19 富士通セミコンダクター株式会社 フォトマスク及びその製造方法
WO2014073389A1 (ja) * 2012-11-08 2014-05-15 Hoya株式会社 マスクブランクの製造方法および転写用マスクの製造方法
CN109314165B (zh) * 2016-06-01 2022-01-07 信越石英株式会社 紫外线smd型led元件的气密密封用石英玻璃构件及紫外线led用石英玻璃构件的制造方法
JP6789011B2 (ja) * 2016-07-01 2020-11-25 信越石英株式会社 紫外線ｌｅｄ用石英ガラス部材の製造方法
JP2017216389A (ja) * 2016-06-01 2017-12-07 信越石英株式会社 紫外線ｓｍｄ型ｌｅｄ素子の気密封止用シリカガラス部材
JP7103292B2 (ja) * 2019-03-29 2022-07-20 三菱ケミカル株式会社 合成シリカガラス粉

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1145157B (it) * 1981-06-22 1986-11-05 Cselt Centro Studi Lab Telecom Procedimento e dispositivo per la deidrogenazione in linea di preforme per fibre ottiche
US4515612A (en) * 1982-04-19 1985-05-07 At&T Bell Laboratories Method for optical fiber fabrication including deuterium/hydrogen exchange
JPH0678172B2 (ja) * 1983-10-21 1994-10-05 古河電気工業株式会社 光フアイバ−の製造方法
US5325230A (en) 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
GB9210327D0 (en) * 1992-05-14 1992-07-01 Tsl Group Plc Heat treatment facility for synthetic vitreous silica bodies
US5332702A (en) 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process
EP0780707A1 (de) * 1995-12-21 1997-06-25 Heraeus Quarzglas GmbH Bauteil für die Übertragung energiereicher UV-Strahlung und Verfahren zur Herstellung eines solchen Bauteils und seine Verwendung
US6619073B2 (en) * 1996-03-05 2003-09-16 Corning Incorporated Method of increasing the initial transmittance of optical glass
WO1997032821A1 (en) * 1996-03-05 1997-09-12 Corning Incorporated Method of increasing the initial transmittance of optical glass
JPH10218627A (ja) * 1997-02-05 1998-08-18 Showa Electric Wire & Cable Co Ltd ガラスおよび光ファイバの製造方法
US6174509B1 (en) 1997-02-11 2001-01-16 Corning Incorporated Pure fused silica, furnace and method
US6319634B1 (en) * 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
MXPA01010871A (es) 1999-04-26 2002-05-06 Corning Inc Fibra de guia de onda optica de bajo pico de agua y metodo para fabricar la misma.
EP1125897B1 (en) * 1999-06-10 2013-05-22 Asahi Glass Company, Limited Synthetic quartz glass and method for preparing the same
CA2310219A1 (en) 2000-05-29 2001-11-29 Nu-Wave Photonics Inc. Application of deuterium oxide in producing silicon containing and metal containing materials
US6904772B2 (en) 2000-12-22 2005-06-14 Corning Incorporated Method of making a glass preform for low water peak optical fiber
WO2002055445A2 (en) 2001-01-12 2002-07-18 Corning Incorporated Optical fiber and preform, method of manufacturing same, and optical component made therefrom
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
WO2003027033A1 (en) 2001-09-27 2003-04-03 Corning Incorporated Improved methods and furnaces for fused silica production
US6928220B2 (en) * 2002-02-01 2005-08-09 Simax Technologies, Inc. Sol-gel-derived optical fiber preform and method of manufacture
US6799440B2 (en) * 2002-02-22 2004-10-05 General Electric Company Optical fiber deposition tube fused in deuterium atmosphere for attenuation improvement
US20040060327A1 (en) 2002-09-30 2004-04-01 Berkey George E Method for treating an optical fiber preform with deuterium
US8798412B2 (en) 2003-08-29 2014-08-05 Corning Incorporated Optical fiber containing an alkali metal oxide and methods and apparatus for manufacturing same
US7534733B2 (en) * 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage
US7506522B2 (en) 2004-12-29 2009-03-24 Corning Incorporated High refractive index homogeneity fused silica glass and method of making same
TWI312768B (en) * 2004-12-30 2009-08-01 Corning Incorporate Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same

Similar Documents

Publication Publication Date Title
JP2009514774A5 (https=)
JP2011501007A5 (https=)
DE602006015981D1 (de) Schallaussendungsmembran, elektronisches bauteil mit schallaussendungsmembran und prozess zur herstee bauteil angebracht ist
JP2008513566A5 (https=)
JP2008503230A5 (https=)
GB0800803D0 (en) Weldable ultrahard materials and associated methods of manufacture
DE602005016348D1 (de) Material mit hierarchisierter Porosität enthaltend Silizium
JP2008056926A5 (https=)
ATE395393T1 (de) Cholestere monoschichten und monoschichtpigmente mit besonderen eigenschaften, deren herstellung und verwendung
JP2008248152A5 (https=)
JP2007500346A5 (https=)
DE602005004209D1 (de) Legierungspartikel mit kfz Struktur und Herstellungsverfahren
JP2010539123A5 (https=)
JP2010117472A5 (https=)
JP2007525988A5 (https=)
JP2008509068A5 (https=)
JP2006512448A5 (https=)
GB0402018D0 (en) Use of physical media having the same position-identifying pattern in digital documentation production
JP2007051233A5 (https=)
JP2008503629A5 (https=)
JP2008278122A5 (https=)
NO20054895L (no) Fremgangsmate for fremstilling av karbonmaterialer
JP2008517002A5 (https=)
JP2007001822A5 (https=)
DE602006001644D1 (de) Tintenstrahlmedien mit schmelzbaren reaktiven polymerteilchen