JP2009514176A5 - - Google Patents

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Publication number
JP2009514176A5
JP2009514176A5 JP2008538090A JP2008538090A JP2009514176A5 JP 2009514176 A5 JP2009514176 A5 JP 2009514176A5 JP 2008538090 A JP2008538090 A JP 2008538090A JP 2008538090 A JP2008538090 A JP 2008538090A JP 2009514176 A5 JP2009514176 A5 JP 2009514176A5
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JP
Japan
Prior art keywords
power
load
impedance matching
dynamic load
electrically controllable
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JP2008538090A
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English (en)
Japanese (ja)
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JP5512127B2 (ja
JP2009514176A (ja
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Priority claimed from PCT/US2006/042360 external-priority patent/WO2007053569A1/en
Publication of JP2009514176A publication Critical patent/JP2009514176A/ja
Publication of JP2009514176A5 publication Critical patent/JP2009514176A5/ja
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Publication of JP5512127B2 publication Critical patent/JP5512127B2/ja
Expired - Fee Related legal-status Critical Current
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JP2008538090A 2005-10-31 2006-10-31 無線周波数電力搬送システム及び方法 Expired - Fee Related JP5512127B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US73179705P 2005-10-31 2005-10-31
US60/731,797 2005-10-31
PCT/US2006/042360 WO2007053569A1 (en) 2005-10-31 2006-10-31 Radio frequency power delivery system

Publications (3)

Publication Number Publication Date
JP2009514176A JP2009514176A (ja) 2009-04-02
JP2009514176A5 true JP2009514176A5 (https=) 2009-07-09
JP5512127B2 JP5512127B2 (ja) 2014-06-04

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ID=37808345

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JP2008538090A Expired - Fee Related JP5512127B2 (ja) 2005-10-31 2006-10-31 無線周波数電力搬送システム及び方法

Country Status (5)

Country Link
EP (1) EP1952533A1 (https=)
JP (1) JP5512127B2 (https=)
KR (3) KR20130139377A (https=)
CN (1) CN101297480B (https=)
WO (1) WO2007053569A1 (https=)

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CN102347745A (zh) * 2010-08-04 2012-02-08 国基电子（上海）有限公司 自适应阻抗匹配电路
CN102457090A (zh) * 2010-10-14 2012-05-16 朱斯忠 一种感应充电装置
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KR20130086825A (ko) * 2012-01-26 2013-08-05 세메스 주식회사 가변커패시터, 임피던스매칭장치 및 기판처리장치
CN102801433A (zh) * 2012-04-19 2012-11-28 汤姆逊广播电视技术(北京)有限公司 中波广播发射天线自适应匹配网络的调谐方法
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
JP6113450B2 (ja) * 2012-09-07 2017-04-12 株式会社ダイヘン インピーダンス調整装置
US9294100B2 (en) 2012-12-04 2016-03-22 Advanced Energy Industries, Inc. Frequency tuning system and method for finding a global optimum
US10821542B2 (en) * 2013-03-15 2020-11-03 Mks Instruments, Inc. Pulse synchronization by monitoring power in another frequency band
CN103454489B (zh) * 2013-09-12 2016-09-21 清华大学 匹配网络的损耗功率标定方法及系统
TWI668725B (zh) * 2013-10-01 2019-08-11 Lam Research Corporation 使用模型化、回授及阻抗匹配之蝕刻速率的控制
CN105097397B (zh) * 2014-05-22 2018-05-08 北京北方华创微电子装备有限公司 阻抗匹配装置及半导体加工设备
CN107112972B (zh) * 2014-12-19 2023-02-14 麻省理工学院 具有相位切换元件的可调谐匹配网络
US10790784B2 (en) 2014-12-19 2020-09-29 Massachusetts Institute Of Technology Generation and synchronization of pulse-width modulated (PWM) waveforms for radio-frequency (RF) applications
US9948265B2 (en) * 2015-05-14 2018-04-17 Mediatek Inc. Inductor capacitor tank for resonator
US10229816B2 (en) * 2016-05-24 2019-03-12 Mks Instruments, Inc. Solid-state impedance matching systems including a hybrid tuning network with a switchable coarse tuning network and a varactor fine tuning network
JP2017073770A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
JP2017073772A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
CN109150132A (zh) * 2017-06-19 2019-01-04 展讯通信（上海）有限公司 阻抗调谐方法、装置及移动终端
WO2019010312A1 (en) 2017-07-07 2019-01-10 Advanced Energy Industries, Inc. INTER-PERIODIC CONTROL SYSTEM FOR PLASMA POWER SUPPLY SYSTEM AND METHOD OF OPERATION
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
US11615943B2 (en) 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
US11076477B2 (en) * 2017-10-03 2021-07-27 Mks Instruments, Inc. Cooling and compression clamp for short lead power devices
US12505986B2 (en) 2017-11-17 2025-12-23 Advanced Energy Industries, Inc. Synchronization of plasma processing components
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
WO2019099925A1 (en) 2017-11-17 2019-05-23 Advanced Energy Industries, Inc. Spatial and temporal control of ion bias voltage for plasma processing
US12230476B2 (en) 2017-11-17 2025-02-18 Advanced Energy Industries, Inc. Integrated control of a plasma processing system
CN108152696A (zh) * 2017-12-27 2018-06-12 扬州市神州科技有限公司 匹配器动态测试方法
US10672590B2 (en) * 2018-03-14 2020-06-02 Lam Research Corporation Frequency tuning for a matchless plasma source
KR102348338B1 (ko) 2019-02-07 2022-01-06 엠케이에스코리아 유한회사 펄스형 가변 주파수 rf 발생기의 구동 주파수 제어 방법
KR20260028062A (ko) * 2020-06-17 2026-03-03 램 리써치 코포레이션 기판 프로세싱 시스템들의 직접 구동 회로들의 스위치들을 위한 보호 시스템
KR102906437B1 (ko) * 2021-10-01 2026-01-02 삼성전자주식회사 Rf 유닛의 진단 시스템 및 이를 이용한 rf 유닛의 진단 방법
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