JP2009501949A5 - - Google Patents
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- Publication number
- JP2009501949A5 JP2009501949A5 JP2008521829A JP2008521829A JP2009501949A5 JP 2009501949 A5 JP2009501949 A5 JP 2009501949A5 JP 2008521829 A JP2008521829 A JP 2008521829A JP 2008521829 A JP2008521829 A JP 2008521829A JP 2009501949 A5 JP2009501949 A5 JP 2009501949A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- sensitive
- composition according
- group
- sensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 claims 17
- 239000000203 mixture Substances 0.000 claims 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 claims 1
- 239000002202 Polyethylene glycol Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- OHJMTUPIZMNBFR-UHFFFAOYSA-N biuret Chemical compound NC(=O)NC(N)=O OHJMTUPIZMNBFR-UHFFFAOYSA-N 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 125000001072 heteroaryl group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 claims 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229920001223 polyethylene glycol Polymers 0.000 claims 1
- 229920001451 polypropylene glycol Polymers 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000011877 solvent mixture Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005033971.9 | 2005-07-20 | ||
| DE102005033971 | 2005-07-20 | ||
| PCT/EP2006/006462 WO2007009580A2 (en) | 2005-07-20 | 2006-07-03 | Photopolymer composition suitable for lithographic printing plates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009501949A JP2009501949A (ja) | 2009-01-22 |
| JP2009501949A5 true JP2009501949A5 (enExample) | 2009-08-13 |
| JP4806019B2 JP4806019B2 (ja) | 2011-11-02 |
Family
ID=37669157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008521829A Expired - Fee Related JP4806019B2 (ja) | 2005-07-20 | 2006-07-03 | 平版印刷版に適したフォトポリマー組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7955776B2 (enExample) |
| EP (1) | EP1910896B1 (enExample) |
| JP (1) | JP4806019B2 (enExample) |
| CN (1) | CN101228479B (enExample) |
| DE (1) | DE602006008960D1 (enExample) |
| WO (1) | WO2007009580A2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006000783B3 (de) * | 2006-01-04 | 2007-04-26 | Kodak Polychrome Graphics Gmbh | Für lithographische Druckplatten geeignete Photopolymerzusammensetzungen |
| CN101849312B (zh) | 2007-09-25 | 2014-05-07 | 法商Bic公司 | 包括空间节约型流体增压室的燃料电池系统以及相关方法 |
| JP5443737B2 (ja) * | 2008-11-26 | 2014-03-19 | 富士フイルム株式会社 | 平版印刷版原版 |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| BR112015014898B1 (pt) * | 2012-12-19 | 2021-12-07 | Ibf Industria Brasileira De Filmes S/A. | Chapas para impressão sensível à radiação no espectro eletromagnético e gráfica e processo de revelação de imagem |
| CN104449478B (zh) * | 2014-11-24 | 2016-05-11 | 中国科学院长春应用化学研究所 | 车用聚氯乙烯焊缝密封胶 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2361041C3 (de) * | 1973-12-07 | 1980-08-14 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
| US4229658A (en) * | 1978-08-18 | 1980-10-21 | Dentsply Research & Development Corp. | Xenon light apparatus for supplying ultraviolet and visible spectra |
| JPH04170546A (ja) * | 1990-11-01 | 1992-06-18 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| DE4129284A1 (de) * | 1991-09-03 | 1993-03-04 | Agfa Gevaert Ag | Bilderzeugungselement mit einem fotopolymerisierbaren monomer |
| JP2001117217A (ja) * | 1999-10-19 | 2001-04-27 | Fuji Photo Film Co Ltd | 光重合性平版印刷版 |
| DE10255663B4 (de) * | 2002-11-28 | 2006-05-04 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente |
| DE10255664B4 (de) | 2002-11-28 | 2006-05-04 | Kodak Polychrome Graphics Gmbh | Für lithographische Druckplatten geeignete Photopolymerzusammensetzung |
| WO2005114331A1 (ja) * | 2004-05-21 | 2005-12-01 | Mitsubishi Gas Chemical Company, Inc. | レジスト化合物およびレジスト組成物 |
-
2006
- 2006-07-03 CN CN200680026706.9A patent/CN101228479B/zh active Active
- 2006-07-03 JP JP2008521829A patent/JP4806019B2/ja not_active Expired - Fee Related
- 2006-07-03 US US11/995,213 patent/US7955776B2/en active Active
- 2006-07-03 WO PCT/EP2006/006462 patent/WO2007009580A2/en not_active Ceased
- 2006-07-03 DE DE602006008960T patent/DE602006008960D1/de active Active
- 2006-07-03 EP EP06762358A patent/EP1910896B1/en not_active Not-in-force
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