JP2009288476A - Method of manufacturing color conversion substrate, method of manufacturing color conversion filter substrate, and method of manufacturing organic electroluminescent device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a high-definition color conversion substrate having a predetermined film thickness to be patterned preferably and to be produced efficiently without deteriorating the organic molecules or generating an incomplete transfer. <P>SOLUTION: The method comprises a step (1) of forming a photothermal conversion layer (12) on a supporting substrate (11) transmitting a laser beam of a predetermined wavelength, a step (2) of providing a transfer donor substrate (10) by forming a color conversion layer (13) containing a material having a color conversion function on the supporting substrate (11) with the photothermal conversion layer (12) formed thereon, a step (3) of disposing a transparent supporter (20) on the color conversion layer (13) side of the transfer donor substrate (10) in parallel with the transfer donor substrate (10) and away therefrom, and a step (4) of forming a color conversion layer (13A) pattern by transferring the material having the color conversion function to a predetermined position of the transparent supporter (20) by radiating a laser beam from the supporting substrate (11) side of the transfer donor substrate (10). <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a color conversion substrate, a method for manufacturing a color conversion filter substrate, and a method for manufacturing an organic electroluminescent element.

  In recent years, light and highly efficient flat panel displays have been actively researched and developed, for example, as screen displays for computers and televisions. In addition, liquid crystal displays such as active matrix driving have been commercialized as lightweight and highly efficient flat panel displays. However, the liquid crystal display has a narrow viewing angle, and since it is not self-luminous, the backlight consumes a lot of power in an environment where the surroundings are dark, and the high-definition high-speed video signal expected to be put to practical use in the future. There are problems such as insufficient response performance. Furthermore, the liquid crystal display has a problem that it is difficult to produce a large screen size display and its cost is high.

  Thus, recently, an organic electroluminescent element (so-called organic EL element) using an organic light-emitting material has attracted attention as a flat panel display that can solve these problems. That is, by using an organic compound as a light-emitting material, it is expected to realize a flat panel display that is self-luminous, has a high response speed, and has no viewing angle dependency.

  As a method for making an organic EL display using an organic electroluminescent element multi-colored or full-colored, there are a method of forming a light emitting layer with RGB and a method of using a color filter. In recent years, a color conversion method using color conversion has been newly proposed. The principle of this color conversion method is a method of converting color by absorbing light from a light source and re-emitting light from a material that emits light in the visible light region. It is known as a color conversion layer (for example, Patent Documents 1 and 2).

  In this method, for example, in an organic EL element, blue light emission having the highest energy is used as a light source, and for green and red, by converting the blue light emission into respective colors, RGB can be made full color. . In this case, since the organic EL only needs to have a blue color structure, the manufacturing process can be simplified and it is also suitable for manufacturing a large panel.

  Several methods are known for patterning the color conversion layer. For example, there is a method in which a fluorescent dye is dispersed in a liquid resist (photoreactive polymer), formed into a film by a spin coating method, and then patterned by a photolithography method (for example, Patent Documents 2 and 3). Further, there is a method of dispersing a fluorescent dye or fluorescent pigment in a basic binder and etching it with an acidic aqueous solution (for example, Patent Document 4).

  However, the molding by the so-called wet method as described above uses a solvent or the like in the manufacturing process, and thus causes problems such as deterioration due to the solvent. In particular, the manufacture of elements and panels that are vulnerable to solvents such as organic EL elements not only cause deterioration of the elements but also require many complicated processes such as providing a protective layer as a countermeasure against solvents. Molding by a method has been desired.

  For this reason, an evaporation method using a metal mask (for example, Patent Document 5) is disclosed as a method for forming a color conversion layer as a dry process. However, in the vapor deposition method using a metal mask, the alignment (alignment) of the metal mask becomes more difficult as the definition becomes higher. In particular, when the substrate is large, it is difficult to control the alignment of the metal mask.

  Therefore, a method for transferring an organic layer using a laser is disclosed as a method for producing a large substrate. Examples of the method for transferring an organic layer using a laser include a contact transfer method for a color control layer (for example, Patent Documents 6, 7, 8, and 9), and vapor deposition of a material using a laser, particularly a material for forming an organic layer. Methods (for example, Patent Documents 10 and 11) are disclosed. However, in any case, the organic electroluminescence element is formed and transferred by lamination, which may increase the size of the process.

  For this reason, the manufacturing method of the color conversion layer board | substrate which bonds the board | substrate which has a color conversion layer is proposed as a method which does not cause the enlargement of a process. In this method for producing a color conversion layer substrate, there is a method in which a transparent support is used for forming the color conversion layer substrate and transferred using a laser wavelength corresponding to the absorption wavelength of the organic layer laminated thereon (for example, a patent) Reference 12).

Japanese Patent Laid-Open No. 3-152897 JP-A-5-258860 Japanese Patent Laid-Open No. 5-198921 Japanese Patent Laid-Open No. 9-208944 JP 2002-75643 A Japanese Patent Laid-Open No. 2005-100939 JP 2002-75636 A JP 2006-244729 A Special table 2007-511890 JP 2005-5192 A JP 2006-309995 A JP 2008-16295 A

  However, in the transfer method using a transparent support, for example, a glass substrate, although laser light passes through the glass substrate, light absorption occurs predominantly in the organic layer to be transferred. For this reason, the above transfer method has a problem that energy for sublimation is insufficient and a large amount of organic layer remains on the transparent support on the transfer substrate side. In the above transfer method, laser light with high energy intensity is directly absorbed by organic molecules, so the damage to organic molecules is very large depending on the production environment, the laser decomposes, and the color conversion function is lost. There was a problem to say.

The present invention has been made to solve the above-described problems, and can be efficiently produced without deteriorating organic molecules and without residual transfer, and has a predetermined film thickness with high definition. It is an object of the present invention to provide a method of manufacturing a color conversion substrate having a color conversion layer having a good patterning capability.
In addition, the present invention provides a color conversion filter substrate having a color conversion layer that can be efficiently produced without deteriorating organic molecules, having no transfer residue, having a high-definition predetermined film thickness, and capable of good patterning. It aims at providing the manufacturing method of.
A further object of the present invention is to provide a method for producing an organic electroluminescent element using the color conversion filter substrate.

  The method for producing a color conversion substrate of the present invention includes a step (1) of forming a photothermal conversion layer on a support substrate that transmits laser light of a predetermined wavelength, and a color conversion function on the support substrate on which the photothermal conversion layer is formed. Forming a color conversion layer containing a material having a transfer donor substrate (2), and a transparent support on the color conversion layer side of the transfer donor substrate in parallel with and spaced from the transfer donor substrate Step (3) of laying and irradiating laser light from the support substrate side of the transfer donor substrate to transfer the material having the color conversion function to a predetermined position of the transparent support to form a pattern of the color conversion layer Step (4).

  The method for producing a color conversion filter substrate of the present invention includes a step (1) of forming a photothermal conversion layer on a support substrate that transmits laser light of a predetermined wavelength, and a color on the support substrate on which the photothermal conversion layer is formed. Step (2) of forming a color conversion layer containing a material having a conversion function to form a transfer donor substrate, a transfer donor substrate having the color conversion layer formed thereon, and a color filter substrate having a color filter layer formed on the substrate Are arranged in parallel and spaced apart so that the color filter layer and the color conversion layer face each other, and laser light is irradiated from the support substrate side of the transfer donor substrate, And (4) forming a color conversion layer pattern by transferring a material having a color conversion function to a predetermined position of the color filter substrate.

  Furthermore, the manufacturing method of the organic electroluminescent element of this invention consists of bonding the color conversion filter board | substrate manufactured by said method to the organic electroluminescent element board | substrate with which the organic layer was pinched | interposed between a pair of electrodes.

According to the method for manufacturing a color conversion substrate of the present invention, it is possible to manufacture a color conversion substrate including a color conversion layer having a high-definition and uniform film thickness without deteriorating the color conversion function.
Further, according to the method for manufacturing a color conversion filter substrate of the present invention, a color conversion filter substrate having a color conversion layer having a high definition and a uniform film thickness can be manufactured without deteriorating the color conversion function.
Furthermore, according to the manufacturing method of the organic electroluminescent element of this invention, the organic electroluminescent element using the said color conversion filter substrate can be manufactured.

  A method for manufacturing a color conversion substrate, a method for manufacturing a color conversion filter substrate, and a method for manufacturing an organic electroluminescent element according to the present invention will be specifically described with reference to the drawings.

[Color Conversion Substrate Manufacturing Method: First Embodiment]
The method for producing a color conversion substrate of the present invention includes a step (1) of forming a photothermal conversion layer (12) on a support substrate (11) that transmits laser light of a predetermined wavelength, and the photothermal conversion layer (12) is formed. A step (2) of forming a color conversion layer (13) containing a material having a color conversion function on the support substrate (11) thus obtained to form a transfer donor substrate (10); and a color of the transfer donor substrate (10) A step (3) of disposing a transparent support (20) on the conversion layer (13) side in parallel with and away from the transfer donor substrate (10); and the support substrate (10) of the transfer donor substrate (10) 11) irradiating a laser beam from the side and transferring the material having the color conversion function to a predetermined position of the transparent support (20) to form a pattern of the color conversion layer (13A). It becomes.

  FIG. 1 is a schematic process diagram of a color conversion substrate manufacturing method according to a first embodiment of the present invention. The manufacturing method of the color conversion board | substrate which is the 1st Embodiment of this invention is equipped with process (1) thru | or (4) explained in full detail below. Hereafter, each process is demonstrated with the structure of each layer.

(Process 1)
First, in step (1), as shown in FIG. 1 (1), a photothermal conversion layer 12 is formed on a support substrate 11 that transmits laser light having a predetermined wavelength.

《Support substrate》
The support substrate 11 is made of a material that transmits a laser beam hr having a predetermined wavelength that is irradiated in transfer performed using the transfer donor substrate 10 described later. For example, when a laser beam having a wavelength of about 800 nm from a solid laser source is used as the laser beam hr, a glass substrate may be used as the support substrate 11. At this time, the configuration of the support substrate 11 may be any configuration as long as it can sufficiently transmit the laser beam hr and can support the layer stacked on the support substrate 11. Examples of the support substrate 11 include a quartz plate and an acrylic plate in addition to a glass substrate.

《Photothermal conversion layer》
The photothermal conversion layer 12 is configured using a material having a high photothermal conversion efficiency for converting the laser beam hr into heat and a high melting point. For example, when the laser beam having the wavelength of about 800 nm shown above is used as the laser beam hr, the photothermal conversion layer 12 made of a metal having a low reflectance and a high melting point such as chromium (Cr) or molybdenum (Mo) is preferable. Used. In addition, the photothermal conversion layer 12 is preferably adjusted to have a film thickness that provides necessary and sufficient photothermal conversion efficiency, and is usually set to 50 to 1000 nm. Here, for example, when a molybdenum (Mo) film is used as the photothermal conversion layer 12, it is preferable to have a uniform structure with a film thickness of about 200 nm. Such a photothermal conversion layer 12 is formed by, for example, a sputtering film forming method, but the present invention is not limited to this, and any known film forming method may be used. The light-to-heat conversion layer 12 is not limited to the above-described metal materials, and the light-absorbing material is a film containing a pigment such as metal phthalocyanine or a film made of carbon such as fullerene or carbon nanotube. Also good. Examples of the metal include tungsten and tantalum in addition to chromium and molybdenum. By providing the photothermal conversion layer 12, the transfer of the color conversion layer 13 in the step (4) can be performed satisfactorily without causing a transfer residue and without impairing the color conversion function.

(Process 2)
Next, as shown in FIG. 1 (2), a color conversion layer 13 further including a material having a color conversion function is formed on the support substrate 11 provided with the photothermal conversion layer 12 manufactured in the step (1). A transfer donor substrate 10 is formed on the photothermal conversion layer 12 side.

《Color conversion layer》
The color conversion layer 13 is an organic material layer containing a material having a color conversion function, which is transferred by being patterned during thermal transfer using the transfer donor substrate 10. The color conversion layer 13 can be formed by a known method. For example, a method of depositing a material having a color conversion function on the photothermal conversion layer 12 can be mentioned.
The film thickness of the color conversion layer 13 is preferably 50 nm to 5 μm, more preferably 100 nm to 2 μm. A film thickness of less than 50 nm is not preferable because it cannot absorb light. On the other hand, if the film thickness is larger than 5 μm, laser transfer becomes difficult, which is not preferable.

  The color conversion layer 13 is composed of, for example, a luminescent guest material and a host material for each color. Among these, the luminescent guest material may be fluorescent or phosphorescent. The host material is preferably at least one of a hole transporting host material, an electron transporting host material, and a charge transporting host material.

  The concentration of the host material in the color conversion layer 13 is desirably 70% by weight or more, preferably 80 to 99.99% by weight. By existing in such a concentration range, it is possible to sufficiently absorb the incident light of the color conversion layer 13 and transfer the absorbed light energy to the light-emitting guest material. A luminescent guest material is a dye that receives energy transferred from a host material and emits light.

  The concentration of the luminescent guest material in the color conversion layer 13 can vary depending on the intended application, provided that sufficient converted light intensity is obtained. In a general application range, the concentration of the luminescent guest material is preferably 0.01 to 30% by weight, more preferably 0.01 to 20% by weight, and still more preferably 0.1 to 10% by weight. %. When the concentration of the luminescent guest material is less than 0.01% by weight or higher than 30% by weight, sufficient converted light intensity cannot be obtained.

Further, the color conversion layer 13 of the present invention is not limited to the configuration of the mixed layer of the luminescent guest material and the host material, and is a laminated configuration of a layer including the luminescent guest material and a layer including the host material. Also good.
The host material absorbs light incident on the color conversion layer 13, preferably blue to blue-green light emitted from an organic electroluminescent element (hereinafter also referred to as organic EL element) substrate, and moves the absorbed energy to the guest material. It is a pigment. Therefore, it is desirable that the absorption spectrum of the host material overlaps with the emission spectrum of the organic EL element substrate, and the absorption maximum of the host material overlaps with the maximum of the emission spectrum of the organic EL element substrate. Is more desirable. In addition, it is desirable that the emission spectrum of the host material overlaps with the absorption spectrum of the guest material, and it is more desirable that the maximum of the emission spectrum of the host material and the absorption maximum of the guest material overlap (match). Therefore, the light emitted by the guest material has a longer wavelength than the light absorbed by the host material.

  Dyes that can be suitably used as the host material include tris (8-quinolinolato) aluminum, bis (8-quinolinolato) magnesium, bis (benzo {f} -8-quinolinolato) zinc, bis (2-methyl-8-quinolinolato). ) Aluminum oxide, tris (8-quinolinolato) indium, tris (5-methyl-8-quinolinolato) aluminum, tris (5-chloro-8-quinolinolato) gallium, 5,7-dichloro-8-quinolinolato aluminum, tris Aluminum complexes such as (5,7-dibromo-8-hydroxyquinolinolato) aluminum, gallium complexes, zinc complexes, and indium complexes are exemplified. An aromatic hydrocarbon compound composed of a phenylene nucleus, a naphthalene nucleus, an anthracene nucleus, a pyrene nucleus, a naphthacene nucleus, a chrysene nucleus or a perylene nucleus can also be suitably used as a host material. Diphenylanthracene, 9,10-di (1-naphthyl) anthracene, 9,10-di (2-naphthyl) anthracene, 1,6-diphenylpyrene, 1,6-di (1-naphthyl) pyrene, 1,6- Di (2-naphthyl), 1,8-diphenylpyrene, 1,8-di (1-naphthyl) pyrene, 1,8-di (2-naphthyl) pyrene, rubrene, 6,12-diphenylchrysene, 6,12 -Di (1-naphthyl) chrysene, 6,12-di (2-naphthyl) chrysene and the like. Further, coumarin dyes such as 3- (2-benzothiazolyl) -7-diethylaminocoumarin (coumarin 6), 3- (2-benzimidazolyl) -7-diethylaminocoumarin (coumarin 7), coumarin 135 and the like are also preferably used as the host material. be able to. Alternatively, naphthalimide dyes such as Solvent Yellow 43 and Solvent Yellow 44 may be used as the host material.

  Here, for example, when the transfer donor substrate 10 is a transfer donor substrate 10b for forming a blue light emitting layer, a blue conversion layer 13b containing a blue light emitting material is provided as the color conversion layer 13. This blue conversion layer 13b is formed, for example, on ADN (anthracene dinaphtyl) which is an electron transporting host material and 4,4′-bis [2- {4- (N, N-diphenylamino) which is a blue light emitting guest material. ) Phenyl} vinyl] biphenyl (DPAVBi) mixed at 2.5% by weight, and deposited by evaporation with a film thickness of about 300 nm.

  When the transfer donor substrate 10 is a transfer donor substrate 10g for forming a green light emitting layer, a green conversion layer 13g containing a green light emitting material is provided as the color conversion layer 13. The green conversion layer 13g is made of, for example, a material obtained by mixing 5% by weight of 3- (2-benzothiazolyl) -7-diethylaminocoumarin (coumarin 6), which is a green light emitting guest material, with the above ADN, and has a thickness of about 300 nm. The film is formed by vapor deposition.

  Similarly, when the transfer donor substrate 10 is a transfer donor substrate 10 r for forming a red light emitting layer, a red conversion layer 13 r containing a red light emitting material is provided as the color conversion layer 13. The red conversion layer 13r is formed by adding 30% by weight of 2,6-bis [(4′-methoxydiphenylamino) styryl] -1,5-dicyanonaphthalene (BSN), which is a red light emitting guest material, to the ADN, for example. And is formed by vapor deposition with a film thickness of about 300 nm.

  In addition to BSN, red-light emitting guest materials include 4-dicyanomethylene-2-methyl-6- (p-dimethylaminostyryl) -4H-pyran (DCM-1, (I)), DCM -2 (II), and cyanine dyes such as DCJTB (III); 4,4-difluoro-1,3,5,7-tetraphenyl-4-bora-3a, 4a-diaza-s-indacene (IV), Lumogen F red, Nile red (V), etc. may be used. Alternatively, xanthene dyes such as rhodamine B and rhodamine 6G, or pyridine dyes such as pyridine 1 may be used.

<Diffusion prevention layer>
In step 2, a diffusion preventing layer 14 as shown in FIG. 2 may be laminated on the photothermal conversion layer 12 before the color conversion layer 13 is formed, and then the color conversion layer 13 may be formed. By forming the diffusion preventing layer 14, there is an advantage that the diffusion of the material constituting the photothermal conversion layer 12 can be prevented.

FIG. 2 is a modified example of the configuration of the transfer donor substrate in the first embodiment of the method for manufacturing a color conversion substrate according to the present invention, and describes the configuration of the transfer donor substrate 10 provided with the diffusion prevention layer 14. FIG.
The diffusion prevention layer 14 can be formed by a known formation method, for example, a plasma CVD method or a sputtering method. The film thickness is preferably 50 nm to 5 μm.

The diffusion prevention layer 14 is provided as a layer for preventing diffusion of the material constituting the photothermal conversion layer 12. Such a diffusion preventing layer 14 is preferably made of a material that is excellent in thermal conductivity and stable to light and heat. For example, it is made of silicon nitride or silicon oxide. Specifically, a silicon oxide film (SiO ₂ ), a silicon nitride film (SiNx), a silicon oxynitride film (SiONx), and the like can be given. In particular, a silicon nitride film (SiNx) is preferable because it can be formed in a dense film configuration and can also prevent oxidation of the color conversion layer 13 and the photothermal conversion layer 12 due to the influence of the diffusion prevention layer 14. The diffusion preventing layer 14 may be made of a metal oxide film or nitride film such as titanium nitride (TiN) or titanium oxynitride (TiON), and may be made of an organic material. In the case of using an organic material, it is preferable to use a material having good heat resistance such as polyimide having sufficiently advanced crosslinking. The diffusion preventing layer 14 may be a laminate of the material films described above.

(Process 3)
Further, as shown in FIG. 1 (3), a transparent support 20 is arranged in parallel to and spaced from the transfer donor substrate 10 on the color conversion layer 13 side of the transfer donor substrate 10 produced in the step (2). To do.
It is preferable that the transfer donor substrate 10 on which the color conversion layer 13 is laminated is disposed at a distance of 100 nm to 5 μm from the transparent support 20 on the color conversion layer 13 side.

(Process 4)
After the step (3), as shown in FIG. 1 (4), a laser beam hr is irradiated from the support substrate 11 side of the transfer donor substrate 10, and a material having a color conversion function is placed at a predetermined position on the transparent support 20. A color conversion substrate is produced by forming a color conversion layer 13A that is patterned by transfer.
Here, the predetermined position refers to a position on the transparent support 20 where the patterned color conversion layer 13A is to be formed when the desired color conversion layer 13A is formed on the transparent support 20. Point to.

《Transparent support》
The transparent support 20 supports a patterned color conversion layer 13A formed by transferring a color conversion layer 13 described later. The configuration of the transparent support 20 may be any configuration that can sufficiently transmit the light incident from the patterned color conversion layer 13 </ b> A and can support the layer laminated on the transparent support 20. Usually, a plate-like member made of a glass plate, a quartz plate, an acrylic plate, or the like is used as the transparent support 20, and the thickness thereof is 0.1 to 10 mm.

The wavelength of the laser beam hr of the present invention is preferably 800 to 1000 nm. The intensity of the laser beam hr is, for example, energy density is 0.1E ⁻³ mJ / μm ^{2 to} 10E ⁻³ mJ / μm ² , and the irradiation time is 1 μs to 10 s, for example. The intensity and irradiation time of the laser beam hr are not particularly limited as long as they can form a good transfer, and are determined according to the material having the color conversion function used for the color conversion layer 13, the material of the support substrate 11, and the like.

The film thickness of the patterned color conversion layer 13A formed in the step (4) is preferably 100 nm to 10 μm.
In the present invention, the color conversion layer 13A patterned by one transfer may be formed, or the color conversion layer 13A patterned by a plurality of transfers may be formed.
When the patterned color conversion layer 13A having a desired film thickness cannot be obtained by performing only one transfer, the patterned color conversion layer 13A is formed by performing the transfer in the step (4) a plurality of times. It is preferable.

  When the transfer is performed a plurality of times by repeating the step (4), the transfer donor substrate 10 is moved and the transfer is performed a plurality of times without changing the position of the transparent support 20, and a patterned color conversion layer is formed. 13A is formed. At this time, it is preferable to perform alignment at the first transfer (first transfer in each color). This alignment is preferably performed using alignment marks (not shown) formed on the transfer donor substrate 10 and the transparent support 20 for position adjustment.

  In the method for producing a color conversion substrate of the present invention, the steps (1) to (4) (including the case where the step (4) is performed a plurality of times) are repeatedly performed using different types of materials having color conversion functions. Thus, a plurality of patterned color conversion layers 13A having different colors can be transferred and formed. In particular, the steps (1) to (4) are repeated for each of the green transfer donor substrate 10g and the red transfer donor substrate 10r to form a two-color patterned color conversion layer 13A on one transparent support 20. It is preferable to perform transfer formation. In addition to this, the steps (1) to (4) are further performed on the blue transfer donor substrate 10b to transfer and form the three-color patterned color conversion layer 13A on one transparent support 20. preferable. That is, the green conversion layer 13Ag patterned by using the green transfer donor substrate 10b and the red conversion layer 13Ar patterned by using the red transfer donor substrate 10b are transferred and formed on the transparent support 20, respectively. Is done. Alternatively, in addition to this, a blue conversion layer 13Ab patterned by using the blue transfer donor substrate 10b is transferred and formed on the transparent support 20.

  The obtained color conversion substrate may be used as it is, or may be used as a laminate of protective layers as described later.

[Manufacturing Method of Color Conversion Filter Substrate: Second Embodiment]
The method for producing a color conversion filter substrate of the present invention includes a step (1) of forming a photothermal conversion layer (12) on a support substrate (11) that transmits laser light of a predetermined wavelength, and the photothermal conversion layer (12) A step (2) of forming a color conversion layer (13) containing a material having a color conversion function on the formed support substrate (11) to form a transfer donor substrate (10), and the color conversion layer (13) The formed transfer donor substrate (10) and the color filter substrate (22) on which the color filter layer (21) is formed are opposed to the color filter layer (21) and the color conversion layer (13). The step (3) of arranging the color conversion function in parallel and spaced apart from each other, and irradiating a laser beam from the side of the support substrate (11) of the transfer donor substrate (10) to form the color conversion material as the color A predetermined position of the filter substrate (22) By transferring comprising a step (4) of forming a pattern of color conversion layer (13A).

FIG. 3 is a schematic process diagram of the method for manufacturing the color conversion filter substrate 25 according to the second embodiment of the present invention.
In the present embodiment, the description overlapping with that of the first embodiment described above is omitted. That is, since the steps (1) and (2) in the present embodiment are the same as the steps (1) and (2) in the first embodiment, the first implementation described above in the present embodiment is performed. Steps (3) and (4) that are different from the above embodiment will be described below together with the structure of each layer. The relationship between FIGS. 1 (1) and (2) and FIGS. 3 (1) and (2) is also the same, and the description thereof is omitted.

(Process 3)
As shown in FIG. 3 (3), after the step (2) whose description is omitted, on the color conversion layer 13 side of the transfer donor substrate 10 produced in this step (2), in parallel with the transfer donor substrate 10, The color filter substrate 22 having the color filter layer 21 formed on the substrate is disposed so that the color filter layer 21 and the color conversion layer 13 face each other.
It is preferable that the transfer donor substrate 10 is disposed so as to be separated from the color filter layer 21 by 100 nm to 5 μm.

<Color filter substrate>
The color filter substrate 22 of the present invention has a color filter layer 21 described later formed thereon. The configuration of the color filter substrate 22 may be any configuration as long as it can sufficiently transmit light emitted from an organic electroluminescent element substrate or the like and can support the color filter layer 21 on the color filter substrate 22. Usually, a plate-shaped substrate made of a glass plate, a quartz plate, an acrylic plate or the like is used as the color filter substrate 22.

<Color filter layer>
In the present invention, the color filter layer 21 is formed on the color filter substrate 22. The color filter layer 21 is preferably formed with a color filter layer 21 having a plurality of color filter portions having different colors. In particular, it is preferable that the color filter layer 21 composed of three colors of the green color filter portion 21g, the red color filter portion 21r, and the blue color filter portion 21b is formed on the color filter substrate 22. By using the color filter substrate 22 having the color filter layer 21 in which the color filter portions 21g, r, and b of green, red, and blue are formed, a configuration capable of full color display is obtained.

  The color filter layer 21 of the present invention preferably has a layer thickness of 0.1 to 5 μm.

  Further, for the color filter layer 21 of the present invention, any material commercially available as a flat panel display material can be used. Further, the color filter layer 21 of the present invention can be formed by coating and patterning by a known method corresponding to these materials.

(Process 4)
After the step (3), as shown in FIG. 3 (4), a laser beam hr is irradiated from the side of the support donor 11 of the transfer donor substrate 10 to place a material having a color conversion function on a predetermined position of the color filter substrate 22. A color conversion filter substrate is produced by forming a color conversion layer 13A that is patterned by transfer.
Here, the predetermined position refers to a position on the color filter substrate 22 where the patterned color conversion layer 13A is to be formed when the desired color conversion layer 13A is formed on the color filter substrate 22. .

Here, the wavelength of the laser beam hr of the present invention is preferably 800 to 1000 nm. The intensity of the laser beam hr is, for example, energy density is 0.1E ⁻³ mJ / μm ^{2 to} 10E ⁻³ mJ / μm ² , and the irradiation time is 1 μs to 10 s, for example. The intensity and irradiation time of the laser beam hr are not particularly limited as long as they can form a good transfer, and are determined according to the material having the color conversion function used for the color conversion layer 13, the material of the support substrate 11, and the like.

The film thickness of the patterned color conversion layer 13A formed in the step (4) is preferably 100 nm to 10 μm.
In the present invention, the color conversion layer 13A patterned by one transfer may be formed, or the color conversion layer 13A patterned by a plurality of transfers may be formed.
When the patterned color conversion layer 13A having a desired film thickness cannot be obtained by performing only one transfer, the patterned color conversion layer 13A is formed by performing the transfer in the step (4) a plurality of times. It is preferable.

  When the transfer is performed a plurality of times by repeating step (4), the transfer donor substrate 10 is moved and the transfer is performed a plurality of times without changing the predetermined position of the color filter substrate 22, and a patterned color conversion is performed. Layer 13A is formed. At this time, it is preferable to perform alignment at the first transfer (first transfer in each color). This alignment is preferably performed using alignment marks (not shown) formed on the transfer donor substrate 10 and the color filter substrate 22 for position adjustment.

  In the method for manufacturing a color conversion filter substrate of the present invention, the steps (1) to (4) (including the case where the step (4) is performed a plurality of times) are repeatedly performed using different types of materials having color conversion functions. Thus, a plurality of patterned color conversion layers 13A having different colors can be transferred and formed. In particular, the steps (1) to (4) are repeated for each of the green transfer donor substrate 10g and the red transfer donor substrate 10r to form a two-color patterned color conversion layer 13A on one color filter substrate 22. It is preferable to perform transfer formation. Alternatively, in addition, the steps (1) to (4) are further performed on the blue transfer donor substrate 10b to transfer and form a three-color patterned color conversion layer 13A on one color filter substrate 22. preferable. That is, the green conversion layer 13Ag patterned by using the green transfer donor substrate 10b and the red conversion layer 13Ar patterned by using the red transfer donor substrate 10b are formed on the color filter layer 21, respectively. Is done. Alternatively, in addition to this, a blue conversion layer 13Ab patterned by using the blue transfer donor substrate 10b is transferred and formed on the color filter layer 21. In each color, the patterned color conversion layer 13A is formed on the color filter portion (predetermined color filter portion) of the same color as the patterned color conversion layer 13A.

  In the present invention, the green color filter portion 21g is formed with a patterned green conversion layer 13Ag that is converted into green, and the red color filter portion 21r is formed with a patterned red conversion layer 13Ar that is converted into red. A configuration in which the color conversion layer is not formed in the blue color filter portion 21b is preferable. By using the blue light emitting source, the light emitted through the blue color filter portion 21b becomes blue light, so that the color conversion function becomes unnecessary, and no color conversion layer is formed on the blue color filter portion 21b. Even blue light can be obtained. That is, with such a configuration, it is possible to emit blue light from the blue color filter portion 21b even with an inexpensive and simple configuration that does not have a blue conversion layer.

<Other configuration>
In addition, in the manufacturing method of the color conversion filter board | substrate of this invention, it is good also as the color conversion filter board | substrate 25 of the structure provided with layers other than the said color filter layer 21 in the range which does not impair the effect of this invention.
For example, the color conversion filter substrate 25 of the present invention is a protection made of a polymer material that has transparency in the visible range, electrical insulation, and barrier properties against moisture, oxygen, and low molecular components over the entire color conversion layer 13 side. The layer 24 (see FIG. 5) may be further stacked for protection. The protective layer 24 also has an effect of flattening the upper surface of the color conversion filter substrate 25 (the surface opposite to the color filter substrate 22).
Examples of the polymer material forming the protective layer 24 include thermosetting epoxy resins and urethane resins.
The protective layer 24 preferably has a thickness of 1 to 100 μm.

[Color Conversion Filter Substrate Manufacturing Method: Third Embodiment]
FIG. 4 is a schematic process diagram of the method for manufacturing the color conversion filter substrate 25 according to the third embodiment of the present invention.
The manufacturing method of the color conversion filter substrate 25 of the present embodiment is the same as the manufacturing method of the color conversion filter substrate 25 of the second embodiment, in which the color filter portions 21r, g, b of the color filter layer 21 have their respective colors. The filter parts 21 r, g, b are delimited by the black matrix 23. Further, in the present embodiment, the partition walls of the black matrix 23 are used as a support base for separating the transfer donor substrate 10 and the color filter substrate 22 in the step (3).

FIG. 4 is a schematic process diagram of the method for manufacturing the color conversion filter substrate 25 according to the third embodiment of the present invention.
In the present embodiment, descriptions overlapping with those of the second embodiment described above are omitted. That is, the steps (1), (2) and (4) in the present embodiment are the same as the steps (1), (2) and (4) in the second embodiment. The step (3) different from the first embodiment described above in the form will be described below. The relationship between FIGS. 3 (1) and 3 (2) and FIGS. 4 (1) and 4 (2) is also the same, and the description thereof is omitted.

(Process 3)
As shown in FIG. 4 (3), after the step (2) whose description is omitted, the transfer donor substrate 10 and the substrate are formed on the side of the color conversion layer 13 of the transfer donor substrate 10 produced in this step (2). The color filter substrate 22 having the color filter layer 21 formed thereon is arranged in parallel and spaced apart so that the color filter layer 21 and the color conversion layer 13 face each other.

  At this time, the color filter portions 21r, 21g, and 21b of the color filter layer 21 are configured such that the respective color filter portions 21r, 21g, and 21b are separated by the black matrix 23. By adopting such a configuration, the black matrix 23 functions as the partition walls of the color filter portions 21r, 21g, and 21b, so that the problem of color mixing does not occur. Further, with this configuration, the black matrix 23 supports the transfer donor substrate 10 and the color filter substrate 22 in a separated state when the transfer donor substrate 10 and the color filter substrate 22 are spaced apart in parallel. It also functions as a support base for. Therefore, the step (4) described below can be performed in a stable state without providing a new member for supporting the transfer donor substrate 10 and the color filter substrate 22 in a separated state.

  Except for the operation and configuration in the step (3) described above, the description is omitted because it is the same as the step (3) in the second embodiment described above.

《Black Matrix》
The height of the partition walls of the black matrix 23 is preferably larger than the total thickness of the color conversion layer 13 and the color filter layer 21. When the height of the partition walls of the black matrix 23 is larger than the total thickness of the color conversion layer 13 and the color filter layer 21, the function as a support for supporting the transfer donor substrate 10 and the color filter substrate 22 in a separated state is exhibited. To do.
Specifically, the height of the black matrix 23 is preferably 0.2 μm to 10 μm, and more preferably 0.4 μm to 4 μm.
Moreover, it is preferable that the partition of the black matrix 23 is a taper shape. This is because the taper shape improves adhesion with the substrate.

  Further, the black matrix 23 is preferably arranged on the color filter substrate 22 in a matrix having rectangular or square openings. The length in the long side direction of the opening is preferably 50 μm to 500 μm, and the length in the short side direction of the opening is preferably 50 μm to 300 μm. The black matrix 23 (adjacent color filter portions 21r, 21g, and 21b) is preferably arranged at a pitch of 50 μm to 500 μm in the long side direction and at a pitch of 50 μm to 500 μm in the short side direction.

  The black matrix 23 has an effect of increasing the contrast of an image and a video by partitioning a light emitting area for each pixel and preventing reflection of external light at the boundary between the light emitting areas.

  The black matrix 23 used in the present invention may be insulating or non-insulating, but preferably has insulating properties. If the black matrix 23 has an insulating property, even when the black matrix 23 and the transparent electrode layer are in contact with each other when the organic light emitting display device is formed using the color filter substrate 22, the black matrix 23 is used. This is because conduction between the transparent electrode layer and the transparent electrode layer can be avoided.

  Examples of a material for forming the black matrix 23 having an insulating property include a resin composition containing a black colorant such as carbon black. Examples of the resin used in this resin composition include ionizing radiation curable resins having reactive vinyl groups such as acrylate-based, methacrylate-based, polyvinyl cinnamate, and cyclized rubber, and particularly electron beam curing. An curable resin and an ultraviolet curable resin can be preferably used. Also, for example, polymethyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin Polyester resin, maleic acid resin, polyamide resin and the like can also be exemplified.

  Moreover, as a forming material of the black matrix 23 which does not have insulation, metals, such as chromium, and these metal oxides are mentioned, for example. At this time, the black matrix 23 having no insulating property may be formed by laminating two layers of a CrOx film (x is an arbitrary number) and a Cr film, and a CrOx film (with reduced reflectance) ( x may be an arbitrary number), a CrNy film (y is an arbitrary number), and a Cr film may be laminated in three layers.

  As a method for forming the insulating black matrix 23, for example, a method of applying the above resin composition on a substrate and patterning it by a photolithography method can be used. In addition, a known method such as a printing method can also be used.

  In addition, as a method for forming the black matrix 23 having no insulating property, for example, a method of forming a thin film by an evaporation method, an ion plating method, a sputtering method, or the like, and patterning using a photolithography method can be used. . In addition, a known method such as an electroless plating method can also be used.

(Process 4)
After the step (3), as shown in FIG. 4 (4), a laser beam hr is irradiated from the transfer donor substrate 10 side to the support substrate 11 side, and a material having a color conversion function is placed at a predetermined position on the color filter substrate 22. The color conversion filter substrate 25 is produced by forming the color conversion layer 13A that is transferred and patterned.
Here, the predetermined position refers to a position on the color filter substrate 22 where the patterned color conversion layer 13A is to be formed when the desired color conversion layer 13A is formed on the color filter substrate 22. .

  This embodiment is different from the step (4) in the second embodiment described above in that the black matrix 23 is provided, but the other configuration and operation are the same as those in the third embodiment described above. Since it is the same as process (4), description is abbreviate | omitted.

[Method for Manufacturing Organic Electroluminescent Element: Fourth Embodiment]
The organic electroluminescent element manufacturing method of the present invention is manufactured by the method for manufacturing a color conversion filter substrate of the present invention on an organic electroluminescent element substrate 101 in which an organic layer 104 is sandwiched between a pair of electrodes (103, 105). The obtained color conversion filter substrate 25 is bonded.

FIG. 5 is a schematic process diagram showing a method for manufacturing the organic electroluminescent element 100 according to the fourth embodiment of the present invention. As shown in FIG. 5, in the organic electroluminescent element 100 of the present embodiment, the color conversion filter substrate 25 obtained in the second embodiment or the third embodiment described above on the organic electroluminescent element substrate 101. Are laminated.
FIG. 6 is a structural cross-sectional view schematically showing the structure of an organic electroluminescent element substrate 101 applied to the fourth embodiment of the present invention. An organic electroluminescent element substrate 101 shown in FIG. 6 is formed by laminating an anode 103, an organic layer 104, and a cathode 105 in this order on a substrate 102. Among these, the organic layer 104 is formed by laminating, for example, a hole injection layer 104a, a hole transport layer 104b, a light emitting layer 104c, and an electron transport layer 104d in this order from the anode 103 side.

In the manufacturing method of the organic electroluminescent element 100 of the present embodiment, first, as shown in FIG. 5A, the patterned color conversion layer 13A prepared in the second or third embodiment is laminated. A protective layer 24 is further laminated on the color conversion filter substrate 25 to protect it. Next, the obtained laminate (corresponding to the color conversion filter substrate 25) is placed on the organic electroluminescent element substrate 101 and the protective layer 24 is in contact with the organic electroluminescent element substrate 101 as shown in FIG. Thus, the organic electroluminescent element 100 is obtained.
The organic electroluminescent element of the present invention is not limited to the top emission type active organic electroluminescent element. For example, the color organic electroluminescent element 100 can also be manufactured by bonding the color conversion filter substrate 25 obtained in the second or third embodiment described above and the bottom organic electroluminescent element substrate 101. Can do.

  Next, the detailed structure of each part which comprises the organic electroluminescent element board | substrate 101 of this Embodiment is demonstrated in order from the board | substrate 102 side.

<< Organic electroluminescent element substrate: Substrate >>
The substrate 102 is a support on which the organic electroluminescence element substrate 101 (excluding the substrate 102) is formed and formed on one main surface side, and may be a well-known one, for example, quartz, glass, metal foil, A resin film or sheet is used. Of these, quartz and glass are preferable, and in the case of resin, methacrylic resins represented by polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene naphthalate ( Polyesters such as PBN), polycarbonate resins, and the like can be mentioned, but those having a laminated structure that suppresses water permeability and gas permeability and those subjected to surface treatment may be used.

<Organic electroluminescent element substrate: anode>
For the anode 103, a material having a large work function from the vacuum level of the electrode material is used in order to inject holes efficiently. For example, aluminum (Al), chromium (Cr), molybdenum (Mo), tungsten (W), copper (Cu), silver (Ag), gold (Au) metal or alloys thereof, or oxidation of these metals or alloys Such as alloys of tin oxide (SnO ₂ ) and antimony (Sb), ITO (indium tin oxide), InZnO (indium zinc oxide), alloys of zinc oxide (ZnO) and aluminum (Al), and these One selected from metal or alloy oxides, or a mixture of two or more is used.

Further, the anode 103 may have a laminated structure of a first layer having excellent light reflectivity and a second layer having a light transmittance and a large work function provided thereon.
The first layer is made of an alloy containing aluminum as a main component. The subcomponent may include at least one element having a work function relatively smaller than that of aluminum as a main component. As such a subcomponent, a lanthanoid series element is preferable. Although the work function of the lanthanoid series elements is not large, the inclusion of these elements improves the stability of the anode and also satisfies the hole injection property of the anode. In addition to lanthanoid series elements, elements such as silicon (Si) and copper (Cu) may be included as subcomponents.

  The content of subcomponents in the aluminum alloy layer constituting the first layer is preferably about 10% by weight or less in total if it is Nd, Ni, Ti, or the like that stabilizes aluminum. Thereby, while maintaining the reflectance in the aluminum alloy layer, the aluminum alloy layer can be stably maintained in the manufacturing process of the organic electroluminescent element substrate 101, and further, processing accuracy and chemical stability can be obtained. In addition, the conductivity of the anode 103 and the adhesion to the substrate 102 can be improved.

  Examples of the second layer include a layer made of at least one of an oxide of aluminum alloy, an oxide of molybdenum, an oxide of zirconium, an oxide of chromium, and an oxide of tantalum. Here, for example, when the second layer is an oxide layer of an aluminum alloy containing a lanthanoid element as a subcomponent (including a natural oxide film), the oxide of the lanthanoid element has a high transmittance, so that this is included. The transmittance of the second layer is improved. For this reason, it is possible to maintain a high reflectance on the surface of the first layer. Further, the second layer may be a transparent conductive layer such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide). These conductive layers can improve the electron injection characteristics of the anode 13.

  Further, the anode 103 may be provided with a conductive layer for improving adhesion between the anode 103 and the substrate 102 on the side in contact with the substrate 101. Examples of such a conductive layer include transparent conductive layers such as ITO and IZO.

  When the driving method of the display device configured using the organic electroluminescence element substrate 101 is an active matrix method, the anode 103 is patterned for each pixel, and the driving thin film transistor provided on the substrate 102 is formed. It is provided in a connected state. In this case, an insulating film (not shown) is provided on the anode 103, and the surface of the anode 103 of each pixel is exposed from the opening of the insulating film. And

<< Organic electroluminescent element substrate: hole injection layer / hole transport layer >>
The hole injection layer 104a and the hole transport layer 104b are for increasing the efficiency of hole injection into the light emitting layer 104c. Examples of the material of the hole injection layer 104a or the hole transport layer 104b include benzine, styrylamine, triphenylamine, porphyrin, triphenylene, azatriphenylene, tetracyanoquinodimethane, triazole, imidazole, and oxadiazole. , Polyarylalkanes, phenylenediamines, arylamines, oxazoles, anthracenes, fluorenones, hydrazones, stilbenes or their derivatives, or heterocyclic conjugated systems such as polysilane compounds, vinylcarbazole compounds, thiophene compounds or aniline compounds Monomers, oligomers or polymers of can be used.

  As more specific materials for the hole injection layer 104a or the hole transport layer 104b, α-naphthylphenylphenylenediamine, porphyrin, metal tetraphenylporphyrin, metal naphthalocyanine, hexacyanoazatriphenylene, 7, 7, 8 , 8-Tetracyanoquinodimethane (TCNQ), 7,7,8,8-tetracyano-2,3,5,6-tetrafluoroquinodimethane (F4-TCNQ), tetracyano 4,4,4-tris (3-methylphenylphenylamino) triphenylamine, N, N, N ′, N′-tetrakis (p-tolyl) p-phenylenediamine, N, N, N ′, N′-tetraphenyl-4,4 ′ -Diaminobiphenyl, N-phenylcarbazole, 4-di-p-tolylaminostilbene, poly (paraphenyl) Lembinylene), poly (thiophene vinylene), poly (2,2'-thienylpyrrole) and the like are exemplified, but not limited thereto.

<< Organic electroluminescent element substrate: luminescent layer >>
The light emitting layer 104c is a region in which holes and electrons are injected from each of the anode 103 and the cathode 105 when a voltage is applied by the anode 103 and the cathode 105, and these are recombined. An organic light emitting material such as a molecular fluorescent dye, a fluorescent polymer, or a metal complex is used.

  The light emitting layer material is an aromatic hydrocarbon compound composed of a phenylene nucleus, a naphthalene nucleus, an anthracene nucleus, a pyrene nucleus, a naphthacene nucleus, a chrysene nucleus or a perylene nucleus, specifically 9,10-diphenylanthracene, 9 , 10-di (1-naphthyl) anthracene, 9,10-di (2-naphthyl) anthracene, 1,6-diphenylpyrene, 1,6-di (1-naphthyl) pyrene, 1,6-di (2- Naphthyl), 1,8-diphenylpyrene, 1,8-di (1-naphthyl) pyrene, 1,8-di (2-naphthyl) pyrene, rubrene, 6,12-diphenylchrysene, 6,12-di (1 -Naphtyl) chrysene, 6,12-di (2-naphthyl) chrysene and the like can be preferably used.

  Further, a small amount of other guest material may be added to the light emitting layer 104c for the purpose of controlling the emission spectrum of the light emitting layer 104c. As such other guest materials, organic substances such as naphthalene derivatives, amine compounds, pyrene derivatives, naphthacene derivatives, berylene derivatives, coumarin derivatives, and pyran dyes are used, and among these aromatic tertiary amine compounds. Are preferably used.

Although the amine compound of the present invention is a hole transporting material, it can be a good luminescent dye depending on the choice of substituent. In the case where the light emitting layer 104c is formed using the amine compound defined in the present invention, the light emitting layer 104c made of the amine compound alone may be formed. Moreover, you may use the amine compound prescribed | regulated by this invention as a guest material. In this case, the host material is preferably an aromatic hydrocarbon compound composed of a phenylene nucleus, a naphthalene nucleus, an anthracene nucleus, a pyrene nucleus, a naphthacene nucleus, a chrysene nucleus or a perylene nucleus.
Moreover, you may use the amine compound prescribed | regulated by this invention as a host material. In this case, the guest material is configured using a material having high emission efficiency, for example, an organic light emitting material such as a low molecular fluorescent dye, a fluorescent polymer, or a metal complex.

  Examples of the luminescent guest material in the case where the amine compound defined in the present invention is used as a host material include anthracene, naphthalene, indene, phenanthrene, pyrene, naphthacene, triphenylene, anthracene, perylene, picene, fluoranthene, acephenanthrylene. , Pentaphen, pentacene, coronene, butadiene, coumarin, acridine, stilbene, or derivatives thereof, tris (8-quinolinolato) aluminum complex, bis (benzoquinolinolato) beryllium complex, tri (dibenzoylmethyl) phenanthroline europium complex ditoluyl Vinyl biphenyl can be used.

<< Organic electroluminescent element substrate: electron transport layer >>
The electron transport layer 104d is for transporting electrons injected from the cathode 105 to the light emitting layer 104c. Examples of the material of the electron transport layer 104d include quinoline, perylene, bisstyryl, pyrazine, triazole, oxazole, oxadiazole, fluorenone, and derivatives thereof. Specifically, tris (8-hydroxyquinoline) aluminum (abbreviation Alq3), anthracene, naphthalene, phenanthrene, pyrene, anthracene, perylene, butadiene, coumarin, acridine, stilbene, and derivatives thereof can be given.

  As described above, each of the layers 104a to 104d constituting the organic layer 104 can be formed by a method such as a vacuum deposition method or a spin coating method. However, in particular, when a small amount of a guest material is added to the light emitting layer 104c in addition to the amine compound specified in the present invention for the purpose of controlling the emission spectrum of the light emitting layer 104c, the formation of the light emitting layer 104c is performed. The other guest materials are co-deposited in

  Note that the organic layer 104 is not limited to such a layer structure, and has at least the light emitting layer 104c and the hole transport layer 104a or the hole injection layer 104b between the anode 103 and the light emitting layer 104c. Any configuration is acceptable. Alternatively, the light emitting layer 104c may be provided on the organic electroluminescent element substrate 101 as a hole transporting light emitting layer, an electron transporting light emitting layer, or a charge transporting light emitting layer.

  Furthermore, each layer constituting the organic layer 104, for example, the hole injection layer 104a, the hole transport layer 104b, the light emitting layer 104c, and the electron transport layer 104d may have a laminated structure including a plurality of layers.

<< Organic electroluminescent element substrate: cathode >>
The cathode 105 has, for example, a two-layer structure in which a first layer 105a and a second layer 105b are stacked in this order from the organic layer 104 side.
The first layer 105a is formed using a material having a small work function and good light transmittance. As such a material, for example, lithium oxide (Li ₂ O) which is an oxide of lithium (Li), cesium oxide (Cs ₂ O) which is an oxide of cesium (Cs), and further these oxides Mixtures can be used. Further, the first layer 15a is not limited to such a material. For example, alkaline earth metals such as calcium (Ca) and barium (Ba), alkali metals such as lithium and cesium, and indium ( In), magnesium (Mg), or other low work function metals, or oxides of these metals may be used alone or as a mixture or alloy of these metals and oxides with increased stability. .

  The second layer 105b is constituted by a thin film using a light-transmitting layer such as MgAg. The second layer 15b may be a mixed layer containing an organic light emitting material such as an aluminum quinoline complex, a styrylamine derivative, or a phthalocyanine derivative. In this case, a layer having optical transparency such as MgAg may be additionally provided as the third layer.

  Each layer constituting the cathode 105 can be formed by a technique such as vacuum deposition, sputtering, or plasma CVD. Further, when the driving method of the display device configured using the organic electroluminescent element 100 is an active matrix method, the cathode 105 includes an organic layer 104 and the above-described insulating film, which is not illustrated here, and is an anode. A solid film is formed on the substrate 102 in a state of being insulated from the substrate 103 and used as a common electrode of each pixel.

  Needless to say, the cathode 105 is not limited to the laminated structure as described above, and an optimum combination and laminated structure may be adopted according to the structure of the device to be manufactured. For example, the configuration of the cathode 105 of the above embodiment includes an inorganic layer (first layer 105a) that promotes functional separation of each layer of the electrode, that is, electron injection into the organic layer 104, and an inorganic layer (second layer 105b) that controls the electrode. Is a laminated structure in which and are separated. However, the inorganic layer that promotes electron injection into the organic layer 104 may also serve as the inorganic layer that controls the electrode, and these layers may be configured as a single layer structure. Moreover, it is good also as a laminated structure which formed transparent electrodes, such as ITO, on this single layer structure.

  The current applied to the organic electroluminescent element 100 having the above configuration is usually a direct current, but a pulse current or an alternating current may be used. The current value and the voltage value are not particularly limited as long as the element is not destroyed. However, considering the power consumption and life of the organic electroluminescent element, it is desirable to emit light efficiently with as little electrical energy as possible.

  When the organic electroluminescent element 100 has a cavity structure, the total film thickness of the organic layer 104 and the electrode layer (cathode 105 in this embodiment) made of a transparent material or a semi-transparent material is light emission. It is defined by the wavelength and will be set to a value derived from multiple interference calculations. When the display device using the organic electroluminescent element 100 has a so-called TAC (Top Emitting Adoptive Current drive) structure in which the top emission organic electroluminescent element 100 is provided on the substrate on which the TFT is formed, By positively using this cavity structure, it is possible to improve the light extraction efficiency to the outside and control the emission spectrum.

  Further, the organic electroluminescent device of the present invention is not limited to the top emission type, and is not limited to the application to the TAC structure using the same, and the organic layer having at least a light emitting layer is sandwiched between the anode and the cathode. The present invention can be widely applied to the configuration. Therefore, the present invention can be applied to a structure in which a cathode, an organic layer, and an anode are sequentially laminated in order from the substrate side, or a so-called bottom emission type organic electroluminescence element in which light is extracted only from the lower electrode side. A bottom emission type organic electroluminescent element is an electrode located on the substrate side (lower electrode as cathode or anode) made of a transparent material, and an electrode located on the opposite side of the substrate (upper electrode as cathode or anode) Is made of a reflective material to extract light only from the lower electrode side.

  Furthermore, the organic electroluminescent element of the present invention may be an element formed by a pair of electrodes (anode 103 and cathode 105) and an organic layer 104 sandwiched between the electrodes. For this reason, the present invention is not limited to the one composed only of the pair of electrodes (the anode 103 and the cathode 105) and the organic layer 104, and other components (for example, It does not exclude the presence of inorganic compound layers and inorganic components).

  Moreover, the organic electroluminescent element which concerns on this invention demonstrated above is applicable to various electronic devices. For example, all fields for displaying video signals input to electronic devices and video signals generated in electronic devices as images and / or videos, such as digital cameras, notebook personal computers, portable terminal devices such as mobile phones, and video cameras. The present invention can be applied to display devices for electronic devices.

The following examples illustrate the present invention in more detail.
<Example 1>
The transfer donor substrate 10 for forming the patterned color conversion layer 13A on the transparent support 20 was produced as follows.
First, a photothermal conversion layer 12 made of molybdenum having a thickness of 200 nm was formed on a glass transparent support 20 by a normal sputtering method. Next, a diffusion prevention layer 14 having an oxidation protection function made of silicon nitride SiNx having a thickness of 100 nm was formed on the photothermal conversion layer 12 by a CVD method.
Then, a color conversion layer 13 having a film thickness of 300 nm was deposited on the diffusion preventing layer 14. Here, the color conversion layer 13 was 95% by weight of TYR-301H manufactured by Toyo Ink and 5% by weight of TYR-303D.

Next, in a state where the transparent support (glass substrate) 20 and the color conversion layer 13 face each other, the transfer donor substrate 10 was placed opposite to the transfer device and was brought into close contact in a vacuum. A small gap of about 2 μm was maintained between the transparent support 20 and the transfer donor substrate 10 in a parallel state by the rib of the transfer apparatus. In this state, a laser beam having a wavelength of 800 nm was irradiated from the back side of the transfer donor substrate 10 (the support substrate 11 side) in an arrangement facing the pixel region of the transparent support 20. The color conversion layer 13 on the transfer donor substrate 10 was sublimated by irradiation and transferred to the glass transparent support 20 to form a red-patterned red conversion layer 13Ar to obtain a color conversion substrate.
The spot size of the laser beam was 300 μm × 10 μm. The laser beam was scanned in a direction perpendicular to the longitudinal dimension of the beam. The energy density was 2.6E ⁻³ mJ / μm ² and the irradiation time was 100 ms.

  The film thickness of the patterned red conversion layer 13Ar was 298 nm. Moreover, when 450 nm excitation light corresponding to blue light emission was made incident on this color conversion substrate with a fluorescence spectrometer, red fluorescence derived from TYR-303D was observed, confirming color conversion.

<Example 2>
In Example 1, the transfer donor substrate 10 was slid, and a mixed layer composed of 95% by weight of TYR-301H manufactured by Toyo Ink and 5% by weight of TYR-303D having a film thickness of 300 nm was transferred five times. As a result, a patterned red conversion layer 13Ar having a thickness of 1492 nm was obtained. The other evaluations were the same as in Example 1. As a result, red fluorescence derived from TYR-303D was observed, confirming color conversion.

<Example 3>
The color conversion substrate prepared in Example 1 was placed in front of an inorganic blue light emitting diode made of gallium nitride having an emission peak wavelength at 460 nm. When the inorganic light-emitting diode was turned on, pink light was confirmed through the color conversion substrate. As a result of measurement using a spectral luminance meter, a red emission peak of TYR-303D having a wavelength converted at a wavelength of 460 nm was observed.

<Example 4>
First, an organic electroluminescence device for top emission, in which an ITO transparent electrode having a thickness of 12.5 nm is laminated on an Ag alloy (reflection layer) having a thickness of 190 nm as an anode 103 on a substrate 102 made of a 30 mm × 30 mm glass plate. A cell for the substrate 101 was produced.
Next, as the hole injection layer 104a, a film made of m-MTDATA represented by the following structural formula (101) was deposited at a film thickness of 15 nm (deposition rate: 0.2 to 0.4 nm / sec).

  Next, as the hole transport layer 104b, a film made of α-NPD represented by the following structural formula (102) was formed to a thickness of 12 nm (deposition rate: 0.2 to 0.4 nm / sec). However, α-NPD is N, N′-bis (1-naphthyl) -N, N′-diphenyl [1,1′-biphenyl] -4,4′-diamine.

  A light emitting layer 104c was formed on the hole transport layer 104b thus formed. As a host material, 9,10-di (2-naphthyl) anthracene (ADN) represented by the following structural formula (103) was deposited to form a film having a thickness of 25 nm. At that time, ADN was doped with BD-052 (manufactured by Idemitsu Kosan Co., Ltd.) as a blue dopant in a relative film thickness ratio of 5% to form a light emitting layer 104c.

  Next, as the electron transporting layer 104d, Alq3 (8-hydroxyquinoline aluminum) represented by the following structural formula (104) was deposited to a thickness of 20 nm.

After the above, as the first layer 105a of the cathode 105, a film made of Li ₂ O was vapor-deposited with a film thickness of about 0.3 nm (deposition rate 0.01 nm / sec). Finally, as the second layer 15b of the cathode 15, a film made of ITO was formed to a thickness of about 10 nm by sputtering. When this element was turned on, blue light emission derived from BD-52 was observed.

  When the red conversion board produced in Example 1 was bonded together here, the light which passed through the red conversion board was confirmed to be pink light. As a result of measurement using a spectral luminance meter, a red emission peak of TYR-303D having a wavelength converted at a wavelength of 460 nm was observed.

It is a schematic process drawing of the manufacturing method of the color conversion board | substrate which is the 1st Embodiment of this invention. It is a cross-sectional schematic diagram for demonstrating the modification of the structure of the transcription | transfer donor board | substrate in 1st Embodiment of the manufacturing method of the color conversion board | substrate which concerns on this invention. It is a schematic process drawing of the manufacturing method of the color conversion filter board | substrate which is the 2nd Embodiment of this invention. It is the schematic of the manufacturing method of the color conversion filter board | substrate which is the 3rd Embodiment of this invention. It is the schematic which shows the manufacturing method of the organic electroluminescent element which is the 4th Embodiment of this invention. It is sectional drawing which shows typically the organic electroluminescent element which is the 4th Embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Transfer donor substrate 11 Support substrate 12 Photothermal conversion layer 13 Color conversion layer 13A Patterned color conversion layer 14 Diffusion prevention layer 20 Transparent support 21 Color filter layer 22 Color filter substrate 23 Black matrix 24 Protection layer 25 Color conversion filter substrate DESCRIPTION OF SYMBOLS 100 Organic electroluminescent element 101 Organic electroluminescent element substrate 102 Substrate 103 Anode 104 Organic layer 104a Hole injection layer 104b Hole transport layer 104c Light emitting layer 104d Electron transport layer 105 Cathode 105a First layer (cathode)
105b Second layer (cathode)

Claims (12)

A step (1) of forming a photothermal conversion layer on a support substrate that transmits laser light of a predetermined wavelength;
A step (2) of forming a color conversion layer containing a material having a color conversion function on the support substrate on which the photothermal conversion layer is formed to form a transfer donor substrate;
A step (3) of arranging a transparent support on the color conversion layer side of the transfer donor substrate in parallel with and spaced from the transfer donor substrate;
(4) forming a color conversion layer pattern by irradiating laser light from the support substrate side of the transfer donor substrate to transfer the material having the color conversion function to a predetermined position of the transparent support. A method for manufacturing a color conversion substrate.   In the step (4), without changing the predetermined position of the transparent support, the transfer donor substrate is moved to perform transfer a plurality of times to form a pattern of a color conversion layer having a film thickness of 100 nm to 10 μm. The manufacturing method of the color conversion board | substrate of Claim 1. A step (1) of forming a photothermal conversion layer on a support substrate that transmits laser light of a predetermined wavelength;
A step (2) of forming a color conversion layer containing a material having a color conversion function on the support substrate on which the photothermal conversion layer is formed to form a transfer donor substrate;
The transfer donor substrate on which the color conversion layer is formed and the color filter substrate on which a color filter layer is formed are parallel and separated so that the color filter layer and the color conversion layer face each other. Arranging (3),
And (4) forming a color conversion layer pattern by irradiating a laser beam from the support substrate side of the transfer donor substrate to transfer the material having the color conversion function to a predetermined position of the color filter substrate. A method for manufacturing a color conversion filter substrate.   The method for producing a color conversion filter substrate according to claim 3, wherein a laser beam having a wavelength of 800 nm to 1000 nm is used as the laser beam.   In the step (4), without changing the predetermined position of the color filter substrate, the transfer donor substrate is moved to perform transfer a plurality of times to form a pattern of a color conversion layer having a thickness of 100 nm to 10 μm. The method for manufacturing a color conversion filter substrate according to claim 3. The color filter layer formed on the color filter substrate has a plurality of color filter portions having different colors,
A material having a different type of color conversion function on the predetermined color filter portion of the color filter substrate by repeatedly performing the steps (1) to (4) using a material having a different type of color conversion function. The method for producing a color conversion filter substrate according to claim 3, wherein a color conversion layer containing a color conversion layer is formed.   The color filter layer of the color filter substrate is composed of three colors of a red color filter portion, a green color filter portion, and a blue color filter portion, and a red color filter portion is formed with a color conversion layer that is converted to red, 4. The method for manufacturing a color conversion filter substrate according to claim 3, wherein a color conversion layer that is converted to green is formed in the green color filter portion, and no color conversion layer is formed in the blue color filter portion. The color filter portion of the color filter layer, each color filter portion is separated by a black matrix,
The method for producing a color conversion filter substrate according to claim 3, wherein the black matrix partition is used as a support for separating the transfer donor substrate and the color filter substrate in the step (3).   The method of manufacturing a color conversion filter substrate according to claim 8, wherein a height of the black matrix partition wall is larger than a total thickness of the color conversion layer and the color filter layer.   The method for manufacturing a color conversion color filter substrate according to claim 3, wherein an alignment mark for position adjustment is formed on the transfer donor substrate and the color filter substrate.   The method of manufacturing a color conversion color filter substrate according to claim 8, wherein the black matrix partition has a tapered shape.   An organic electric field comprising: bonding an organic electroluminescent element substrate having an organic layer sandwiched between a pair of electrodes to a color conversion filter substrate manufactured by the method according to any one of claims 3 to 11. Manufacturing method of light emitting element.

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