JP2009264421A - Gate valve and vacuum device using this gate valve - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a structure which prevents a particle or dust from directly falling on a seal surface of a valve element provided with a seal member, and enables the amount of the particle or dust falling on the seal surface of a valve box main body to be reduced and to be collected even when having fallen. <P>SOLUTION: A gate valve 1 comprises: a valve box 2 provided with gate openings 9a, 9b for allowing an object to be conveyed to pass therethrough; and a valve body 5 which opens and closes the gate opening sections 9a, 9b by reciprocatingly sliding from the lateral direction. When the gate opening sections 9a, 9b of the valve box 2 are closed by slidingly moving the valve element 5, the seal surfaces 53a, 56a formed on the valve element 5 make contact with the seal seat surfaces 11, 16 of the valve box 2 to close the gate opening sections 9a, 9b. The lower part of the right seal seat surface 11 of the valve box 2 is formed on a tilted surface 11a, and a storing recess 31 for storing the dust is installed in the lower end of the tilted surface 11a of the right seal seat surface 11. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a gate valve used in a vacuum apparatus or the like.

  An example of the conventional structure of the gate valve is shown in FIGS. FIG. 7 is an exploded perspective view showing an example of the structure of the gate valve, and FIG. 8 is a longitudinal sectional view of the gate valve. This gate valve is a gate valve (vacuum gate valve) disclosed in Japanese Patent Application Laid-Open No. 2004-36762.

  The gate valve 101 includes a substantially box-shaped valve body 102, a side plate 103, a bonnet flange member 104 that covers the lower end opening of the valve body 102, and a long valve body 105 supported by a shaft 106. It is configured.

  A substantially rectangular gate opening 109 a is formed between one long side wall 108 to which the side plate 103 of the valve box main body 102 is attached and the other long side wall 108, and is formed in the side plate 103. Also, a substantially rectangular gate opening 109b is formed to penetrate therethrough.

  In the valve box main body 102, an upper seal seat surface 111 is formed on the upper side of the figure and a lower seal seat surface 116 is formed on the lower side of the figure, with the gate openings 109a and 109b being vertically sandwiched. The seal seat surfaces 111 and 116 are continuously formed so as to have a deformed ring shape even if they are different in level. Thus, a continuous seal seat surface from the upper seal seat surface 111 to the lower seal seat surface 116 is formed in the valve box body 102.

  On the other hand, a seal member 113 is attached to the end surface of the distal end portion 105a and the end surface of the proximal end portion 105b of the valve body 105. As shown in FIG. 9, the seal member 113 is formed in a long and thin annular shape, and includes substantially U-shaped portions 113 a and 113 a corresponding to the continuous steps between the upper seal seat surface 111 and the lower seal seat surface 116. The valve body 105 is mounted on the outer peripheral surface of the valve body 105 (that is, the end surface of the distal end portion 105a and the end surface of the proximal end portion 105b) in a posture that is pushed open both vertically.

  When the valve body 105 moves in a direction (upward in the drawing) for closing the gate openings 109a and 109b, the seal member 113 mounted on the distal end portion 105a and the proximal end portion 105b is used as the valve box main body. The upper seal seat surface 111 and the lower seal seat surface 116 are pressed against each other, whereby the flow between the gate openings 109a and 109b of the valve box body 102 is blocked.

In the above configuration, the valve body 105 is moved by a driving means using an air cylinder (not shown), and the seal member 113 and the upper seal when the valve body 105 is moved in the direction of closing the gate openings 109a and 109b. The pressure contact force between the seat surface 111 and the lower seal seat surface 116 (that is, the amount of crushing of the seal member 113) is controlled by changing the air pressure by the air cylinder.
JP 2004-36762 A

  The conventional gate valve 101 has a structure in which the gate openings 109a and 109b are opened and closed in a vertical direction by moving the valve body 105 up and down, and the end surface and the base end part 105b of the distal end portion 105a of the valve body 105 are configured. The end face of the is a horizontal surface that is almost entirely up except for its both ends.

  When the gate valve 101 having such a structure is used as a gate valve for partitioning each chamber of a vacuum apparatus such as a plasma CVD apparatus, for example, the valve body 105 of the gate valve 101 is opened and a substrate as a transfer object is placed in an adjacent chamber. When transported, particles and the like generated in the manufacturing process fall on the end face of the tip end portion 105a of the valve body 105.

  In addition, the shape of the gate valve itself has recently increased, and the valve body 105 tends to increase in size accordingly. Therefore, the driving force of the air cylinder that drives the valve body 105 has also increased. Therefore, if the seal member 113 is pressed against the seal seat surfaces 111 and 116 by the driving force, the seal member 113 is excessively pressed and an extra force is applied. In this case, at the design stage, the seal member 113 is designed so as to contact the seal seat surfaces 111 and 116 evenly. However, the seal member 113 and the seal seat surfaces 111 and 116 are biased due to secular change due to use. , The end surface of the front end portion 105a of the valve body 105 and the end surface of the base end portion 105b directly contact the seal seat surfaces 111 and 116 of the valve body 102, and the front end portion 105a and the base end portion of the valve body 105 There was a problem that 105b was scraped off. Accordingly, dust due to such shavings also falls on the end face of the front end portion 105 a of the valve body 105. In addition, dust caused by shaving falls down on the end face of the base end portion 106 a of the valve body 105.

  In this case, as described above, in the conventional gate valve 101, the end face of the distal end portion 105a and the end face of the base end portion 105b of the valve body 105 are substantially horizontal surfaces except for both end portions. For this reason, there has been a problem in that the fallen particles and dust accumulate on the end face as they are, which causes the gate valve shut-off performance to deteriorate.

  The present invention was devised to solve such problems, and its purpose is to prevent particles and dust from falling directly on the sealing surface of the valve body on which the sealing member is mounted, A gate valve that reduces the amount of particles and dust that fall on the seal seat surface and that can be recovered even if dropped, thereby preventing the shut-off performance from being degraded by particles and dust, and the gate valve The present invention is to provide a vacuum apparatus using the above.

  In order to solve the above-mentioned problems, a gate valve of the present invention includes a valve box provided with a gate opening for passing an object to be conveyed, and a plate that opens and closes by reciprocating the gate opening from one direction. When the valve body is slid to close the gate opening of the valve box, a seal surface formed on the valve body is provided so as to surround the gate opening of the valve box. In the gate valve in which the gate opening is shut off by abutting against the seal seat surface, the valve body is provided to be able to slide and reciprocate in a lateral direction with respect to the valve box, and the seal surface of the valve body and the The lower part of the seal seat surface of the valve box is formed in an inclined surface. Further, the gate valve of the present invention is characterized in that in the above configuration, a storage recess for storing dust is provided at a lower end portion of the inclined surface of the seal seat surface.

  Thus, in this invention, it is set as the structure which opens and closes a gate opening part by slidingly moving a valve body to a horizontal direction. That is, when the gate is open, the valve body is located beside the gate opening, so even if, for example, particles such as particles are dropped when the conveyed object passes through the gate opening, the valve body There is no direct fall on the sealing surface. On the other hand, dust that has dropped when passing through the gate opening falls on the seal seat surface of the valve box, but in the present invention, the seal seat surface where the dust falls is formed on an inclined surface. The fallen dust falls so as to slide down the inclined surface, and does not remain on the seal seat surface. Thereby, the fall of the interruption | blocking performance of a gate valve by the influence of dust can be prevented. In addition, dust that has fallen so as to slide down the inclined surface is stored in the storage recess provided at the lower end of the inclined surface, so that the falling dust rises again by opening and closing the gate and adheres to the seal seat surface. There is no worry of doing. Thereby, the fall of the shut-off performance of the gate valve due to the influence of dust can be prevented more reliably. Furthermore, since the dust is stored in the storage recess, the dust removal operation during the maintenance of the gate valve is facilitated.

  More specifically, the lower portion of the seal seat surface is formed into a V-shaped inclined surface, and the storage recess is provided at an intersecting portion of the inclined surface. Here, among the V-shaped inclined surfaces, one inclined surface is a downward seal seat surface, and the other inclined surface is an upward seal seat surface. That is, the fall of the dust affects the blocking performance only on the other seal seat surface with the inclined surface facing upward. That is, the seal seat surface facing upward is about half of the conventional gate valve.

  As described above, the gate valve of the present invention has a structure in which the valve body is slid in the lateral direction, and the lower part of the seal seat surface is formed in a V-shaped inclined surface. In comparison, the structure can be made extremely resistant to the influence of falling dust.

  In addition, the gate valve of this invention can be used as a gate valve which opens and closes between the 1st process chamber and 2nd process chamber of a vacuum apparatus. Thereby, the durability of the vacuum apparatus itself and the blocking performance between the first processing chamber and the second processing chamber can be improved.

  According to the present invention, when the gate is opened by sliding the valve body in the lateral direction, the valve body is positioned beside the gate opening, so that the object to be conveyed passes through the gate opening. Even if dust such as particles is sometimes dropped, the dust does not fall directly on the sealing surface of the valve body. In addition, the dust that has fallen when passing through the gate opening falls on the seal seat surface of the valve box, but since the seal seat surface where the dust falls is formed on the inclined surface, the fallen dust Falls to slide down the inclined surface. Thereby, since dust does not remain on the seal seat surface, it is possible to prevent the gate valve shut-off performance from being deteriorated due to the influence of dust. Further, since the dust that has fallen so as to slide down the inclined surface is stored in a storage recess provided at the lower end of the inclined surface, there is no concern that the dropped dust will rise again by opening and closing the gate. Thereby, the fall of the shut-off performance of the gate valve due to the influence of dust can be prevented more reliably. Furthermore, since the structure is such that particles do not easily accumulate on the seal seat surface, a structure in which leakage does not easily occur can be achieved.

  Embodiments of the present invention will be described below with reference to the drawings.

  1 to 3 show a structure of a gate valve 1 according to an embodiment of the present invention. FIG. 1 is an exploded perspective view, FIG. 2 is a longitudinal sectional view, and FIG. 3 is a cutaway view of a valve box. FIG.

  The gate valve 1 includes a substantially box-shaped valve box 2 formed inside a slide space 2a (see FIG. 3) of a valve plate 5 which will be described later, a side plate 3, and one side surface of the valve box 2 (in FIG. 3). The cover member 4 is formed on the left side surface and covers the opening 2b of the slide space 2a, and a substantially plate-shaped valve body 5 supported by a drive shaft (cylinder rod) 6 of an air cylinder (not shown). ing. However, the side plate 3 is shown in a state where it is already attached to the valve box 2 in FIG.

  Between one side wall 8a to which the side plate 3 of the valve box 2 is mounted and the other side wall 8b, a gate opening 9a formed in a substantially rectangular shape is formed so as to penetrate the side plate 3. Also, a gate opening 9b formed in a substantially rectangular shape is formed so as to penetrate therethrough. That is, the gate openings 9a and 9b are formed so as to penetrate the slide space 2a.

  The right seal seat surface 11 and the left seal seat surface 16 are formed on the left and right inner wall surfaces of the slide space 2a of the valve box 2 in such a positional relationship that the gate openings 9a and 9b are sandwiched from the left and right. Yes. When viewed from the front side shown in FIG. 1, each seal seat surface 11, 16 is formed in a symmetrical trapezoidal shape, and is formed in a hexagonal shape as a whole. These seal seat surfaces 11 and 16 are formed in steps at the upper position and the lower position, which are connecting portions, and the entire hexagonal ring including steps 15 and 15 has a step in the thickness direction. It forms continuously so that it may become a shape. Thereby, a continuous hexagonal seal seat surface from the right seal seat surface 11 to the left seal seat surface 16 through the stepped portion 15 is formed on the inner wall surface of the valve box 2.

  On the other hand, the valve body 5 has a trapezoidal right-side valve body portion 53 so as to extend in the sliding direction (the arrow X1 direction in FIGS. 1 and 3) on the right end surface 52 of the substantially square body portion 51. Is formed. The right valve body 53 is formed to be half as thick as the main body 51. That is, it is formed in the front half of the right end face 52. On the other hand, a trapezoidal notch 55 symmetrical to the right valve body 53 is formed in the back half of the right end surface 52, and the notch of the main body 51 surrounded by the notch 55 is The left valve body 56 has a hexagonal shape. That is, the right valve body portion 53 and the left valve body portion 56 are formed in a symmetrical trapezoidal shape when viewed from the front side shown in FIG. 1, and match the seal seat surfaces 11 and 16 as a whole. It is formed in a hexagonal shape. That is, the peripheral end surface (hereinafter referred to as “right seal surface”) 53a of the right valve body portion 53 and the peripheral end surface (hereinafter referred to as “left seal surface”) 56a of the left valve body portion 56 are upper portions that are connection portions. Although it is formed in steps at the position and the lower position, it is continuously formed so as to form a hexagonal ring shape having steps in the thickness direction, including the steps 57 and 57.

  The seal member 13 is mounted on the seal surface 53 a of the right valve body portion 53 and the seal surface 56 a of the left valve body portion 56. As shown in FIG. 4, the seal member 13 is formed in a long and thin annular shape, and is provided at a stepped portion 57 between the right seal surface 53 a of the right valve body portion 53 and the left seal surface 56 a of the left valve body portion 56. It is mounted on the right seal surface 53a of the right valve body portion 53 and the left seal surface 56a of the left valve body portion 56 in such a posture that it is pushed open from the corresponding substantially U-shaped portions 13a and 13a to both the upper and lower sides.

  When the valve body 5 moves in the slide space 2a in a direction (X1 direction in the figure) that closes the gate openings 9a and 9b, the right seal surface 53a of the right valve body portion 53 and the left valve body portion 56 The seal member 13 mounted on the left seal surface 56a is brought into pressure contact with the right seal seat surface 11 and the left seal seat surface 16 of the valve box 2, and thereby the flow between the gate openings 9a and 9b of the valve box 2. Is to be blocked.

  In the valve body 5, a plurality of rollers 58, 58,... Are attached to the upper surface and the lower surface of the main body 51 so as to be freely rotatable, and these rollers 58, 58,. The valve body 5 moves smoothly in the slide space 2a by rolling while being in contact with the upper and lower inner wall surfaces (rail surfaces) 2a2 and 2a2 of the second slide space 2a.

  As described above, the right seal seat surface 11 and the left seal seat surface 16 formed on the inner wall surface of the valve box 2 are formed in a symmetrical trapezoidal shape when viewed from the front side shown in FIG. It is formed in a hexagonal shape as a whole. That is, a V-shaped inclined surface is formed by the lower inclined surface 11 a of the right seal seat surface 11 and the lower inclined surface 16 a of the left seal seat surface 16. Among these, the left inclined surface 16a is a downward inclined surface (seal seat surface), and the right inclined surface 11a is an upward inclined surface (seal seat surface). In other words, the dust fall affects the blocking performance only on the right inclined surface 11a with the inclined surface facing upward, and the region in the width direction of the seal seat surface facing upward is compared with the conventional gate valve. It is about half.

  Therefore, in the present embodiment, a storage recess 31 for storing dust or the like is formed in the lower portion along the stepped portion 15 that is the intersection of the V-shaped right inclined surface 11a and the left inclined surface 16a. ing. As shown in FIG. 5, the storage recess 31 has a pocket shape, and an opening 31a for storing dust or the like is formed in the lower inner wall surface (rail surface) 2a2 of the slide space 2a. In this way, by forming the storage recess 31 at the lower portion along the stepped portion 15, dust or the like that falls on the right inclined surface 11 a and slides down on the right side inclined surface 11 a is naturally along the stepped portion 15. It falls and falls into the storage recess 31 from the opening 31a.

  In addition, a lid 31b that can be opened and closed is provided on the bottom portion of the storage recess 31, and the lid 31b is opened so that dust accumulated in the storage recess 31 can be taken out from the bottom side of the valve box 2. Just keep it. Specifically, the structure of the lid 31b can be a screw structure. That is, if the lid 31b is formed in a columnar shape and a male screw is formed on the outer periphery thereof, a cylindrical hole 31c is formed on the bottom surface of the storage recess 31, and a female screw is formed on the inner peripheral surface of the hole 31c. Good. However, the opening / closing structure of the lid 31b is not limited to such a screw structure.

  In the present embodiment, a spacer member 21 that restricts the amount of crushing of the seal member 13 may be further attached between the right seal surface 53 a of the right valve body 53 and the right seal seat surface 11 of the valve box 2. . In this case, it is possible to attach the spacer member 13 to the right seal seat surface 11, but the temperature rise of the valve body 5 and the valve box 2 due to the influence of heat is slightly different. Therefore, in order to make the positional relationship between the two firm, it is preferable to attach the spacer member 21 to the valve body 5 which is the moving body. That is, the amount of crushing of the seal member 13 may be regulated by the thickness width of the spacer member 21 instead of being controlled by the pressure of the air cylinder as in the prior art. As a result, even if the valve body 5 expands or contracts due to the influence of heat generated in the manufacturing process, and as a result, the contact of the seal member 13 with the seal seat surfaces 11 and 16 is biased, the seal member 13 Since it is not crushed more than the thickness of the spacer member 21, the situation where the part which hits the tip of the seal member 13 is crushed more than necessary does not occur. For this reason, even if shear stress is generated in this biased portion, the magnitude is much smaller than in the conventional case where the pressure is controlled by the pressure of the air cylinder, and the force is not enough to roll the seal member 13. The sealing member 13 is not damaged, and the shut-off performance as a gate valve is not lowered.

  The spacer member 21 is preferably attached to the vertical surface 53a1 on the distal end side in the direction of closing the gate opening, in the right seal surface 53a of the right valve body portion 53. The expansion and contraction of the valve body 5 due to the influence of heat appears more noticeably on the distal end side (right side in FIG. 1) than on the proximal end side (left side in FIG. 1) to which the cylinder rod 6 of the air cylinder is attached. That is, when the base end side of the valve body to which the cylinder rod 6 of the air cylinder is connected is used as a reference, the distal end side farthest from the base end side extends further forward. Therefore, by attaching the spacer member 21 to the most changed front end side, that is, the vertical surface 53a1 of the right seal surface 53a of the right valve body portion 53, it can sufficiently cope with the lateral vibration of the valve body and deformation due to heat. It becomes possible. That is, in other words, the spacer member 21 is attached to the portion of the right seal surface 53a of the right valve body portion 53 and the left seal surface 56a of the left valve body portion 56 where the temperature of the valve body 5 rises most. Since the portion where the temperature rises most is the portion where the most thermal deformation occurs, it is possible to sufficiently cope with the temperature change by attaching the spacer member 13 to this portion.

  Furthermore, the spacer member 21 is preferably provided so as to be in surface contact with the right seal seat surface 11. That is, the spacer member 21 is formed in a rectangular parallelepiped shape, and a plurality (three in this embodiment) of the rectangular parallelepiped spacer members 21 are attached at a predetermined interval. When the contact between the spacer member 21 and the right seal seat surface 11 is a point contact, there is a possibility that the spacer member 21 in that portion is scraped to generate particles. Therefore, the generation of such particles can be prevented (reduced) by keeping the surface contact.

  The spacer member 21 is made of a material having a small thermal expansion. Since the spacer member 21 regulates the amount of crushing of the seal member, it is naturally preferable that the spacer member 21 has little thermal deformation. Here, the material of the spacer member includes a resin material and a metal material. As the resin material, Teflon (registered trademark), Daiflon, peak, or the like can be used. As the metal material, stainless steel, aluminum alloy, titanium alloy or the like can be used.

  The spacer member 21 is attached only to the vertical surface 53a1 on the distal end side in the direction of closing the gate openings 9a and 9b among the right seal surface 53a of the right valve body portion 53. You may attach to the surface (inclined surface) and the suitable place of the left seal surface 56a of the left side valve body part 56 as needed.

  As described above, according to the present embodiment, by providing the spacer member 21, it is possible to prevent the right seal surface 53a of the valve body 5 from directly contacting the right seal seat surface 11 of the valve box 2 and generating shavings. At the same time, even when dust due to shavings is generated, the dust slides down on the right inclined surface 11a and naturally falls along the uneven portion 15 and falls into the storage recess 31 from the opening 31a. That is, a gate valve having a stronger structure against dust can be realized by adopting a two-stage configuration of suppressing dust generation and collecting the generated dust.

  The gate valve 1 having the above configuration can be used as a gate valve that opens and closes between the first processing chamber and the second processing chamber of the vacuum apparatus. Thereby, the durability of the vacuum apparatus itself and the blocking performance between the first processing chamber and the second processing chamber can be improved.

  FIG. 5 is a schematic configuration diagram of a vacuum apparatus equipped with the gate valve of the present invention, and here, a plasma CVD apparatus is illustrated. That is, the plasma CVD apparatus 80 includes a heating chamber 81, a film forming chamber 82, and a take-out chamber 83, and is provided between the heating chamber 81 and the film forming chamber 82 and between the film forming chamber 82 and the take-out chamber 83. The gate valves 1A and 1B of the present invention are arranged respectively. The substrate moves in each room in the direction of arrow Y1.

  First, a transparent conductive film is formed on a transparent substrate made of glass or the like. Next, this substrate is carried into the plasma CVD apparatus 80. The substrate carried into the plasma CVD apparatus 80 is heated and held at the film formation temperature for a certain time in the heating chamber 81. Thereafter, the gate valve 1A between the heating chamber 81 and the film forming chamber 82 is opened, and the substrate is carried into the film forming chamber 82 from the heating chamber 81, and then the gate valve 1A is closed. Thereafter, pin film formation is performed in the film formation chamber 82 by plasma CVD. After the film formation, the gate valve 1B between the film formation chamber 82 and the take-out chamber 83 is opened. After the substrate is carried out to the take-out chamber 83, the gate valve 1B is closed. Thereafter, the take-out chamber 83 checks whether there is an abnormality such as film peeling.

  According to the plasma CVD apparatus 80 having such a configuration, the gate valves 1A and 1B are heated by heat generated in the manufacturing process. For this reason, the valve body 5 expands and contracts due to the influence of heat, and as a result, there is a possibility that the contact of the seal member 13 with the seal seat surfaces 11 and 16 may be biased. In other words, in addition to the secular change of the gate valve itself, there is a possibility that the contact is biased by deformation due to heat or the like. Therefore, the situation where the portion of the seal member 13 that hits the tip is crushed more than necessary does not occur. Therefore, the sealing member 13 is not damaged, and the shut-off performance of the gate valves 1A and 1B is not lowered, so that the plasma CVD apparatus 80 having excellent durability can be realized. The first processing chamber described in the claims is the heating chamber 81 when viewed from the gate valve 1A, and the second processing chamber is the film forming chamber 82. When viewed from the gate valve 1 </ b> B, the first processing chamber becomes the film forming chamber 82, and the second processing chamber becomes the take-out chamber 83.

  In this embodiment, a plasma CVD apparatus is exemplified as a vacuum apparatus, but the same effect can be obtained when the gate valve of the present invention is applied to a plasma processing apparatus that involves gas introduction such as a dry etching apparatus or a sputtering apparatus. Can be expected.

It is an exploded perspective view of the gate valve concerning the present invention. It is a longitudinal cross-sectional view of the gate valve which concerns on this invention. It is a disassembled perspective view of the state which notched a part of valve box of the gate valve concerning the present invention. It is a perspective view which shows the shape of the sealing member of the gate valve which concerns on this invention. It is sectional drawing which follows the VV line of FIG. It is the schematic which shows one structural example of the vacuum device carrying the gate valve of this invention. It is a disassembled perspective view which shows an example of the structure of the conventional gate valve. It is a longitudinal cross-sectional view of the conventional gate valve. It is a perspective view which shows the shape of the sealing member of the conventional gate valve.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Gate valve 2 Valve box 2a Slide space 2b Opening part 3 Side plate 4 Lid member 5 Valve body 6 Air cylinder drive shaft (cylinder rod)
8a, 8b Side wall 9a, 9b Gate opening 11 Right seal seat surface 11a Right inclined surface 13 Seal member 13a, 13b Substantially U-shaped portion 15 Stepped portion 16 Left seal seat surface 16a Left inclined surface 21 Spacer member 31 Storage recess 31a Opening Part 31b Lid 51 Body part 52 Right end surface 53 Right valve body part 55 Notch part 56 Left valve body part 53a Right seal surface (circumferential end surface)
56a Left seal surface (circumferential end surface)
57 Stepped portion 80 Plasma CVD apparatus 81 Heating chamber 82 Deposition chamber 83 Extraction chamber

Claims (4)

It consists of a valve box provided with a gate opening for passing the object to be conveyed and a plate-shaped valve body that opens and closes by reciprocating the gate opening from one direction. When the gate opening of the valve box is closed, the seal opening formed on the valve body abuts on a seal seat provided so as to surround the gate opening of the valve box. In the gate valve to be shut off,
The valve body is provided so as to be slidable and reciprocally movable in a lateral direction with respect to the valve box, and the seal surface of the valve body and the lower part of the seal seat surface of the valve box are formed on an inclined surface. Gate valve. The gate valve according to claim 1,
A gate valve characterized in that a storage recess for storing dust is provided at a lower end portion of the inclined surface of the seal seat surface. The gate valve according to claim 2,
A gate valve characterized in that a lower portion of the seal seat surface is formed in a V-shaped inclined surface, and the storage recess is provided at an intersecting portion of the inclined surface.   The gate valve according to any one of claims 1 to 3, wherein the gate valve is provided as a gate valve that opens and closes between a first processing chamber and a second processing chamber of an object to be conveyed. Vacuum equipment to do.

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