JP2009262305A - Method and device for cutting single crystal sapphire substrate - Google Patents

Method and device for cutting single crystal sapphire substrate Download PDF

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JP2009262305A
JP2009262305A JP2008116970A JP2008116970A JP2009262305A JP 2009262305 A JP2009262305 A JP 2009262305A JP 2008116970 A JP2008116970 A JP 2008116970A JP 2008116970 A JP2008116970 A JP 2008116970A JP 2009262305 A JP2009262305 A JP 2009262305A
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plane
cutting
wire saw
single crystal
crystal sapphire
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JP5042112B2 (en
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Hideki Ogawa
秀樹 小川
Goji Yamaguchi
剛司 山口
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Allied Material Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and a device for cutting a single crystal sapphire substrate accurately in the direction of from parallel to within 1° relative to a (1-102) surface (r surface) of a single crystal sapphire with a super abrasive grain wire saw. <P>SOLUTION: The direction of cutting of the super abrasive grain wire saw is from parallel to within 5° relative to the (1-102) surface (r surface) of the single crystal sapphire, and the running direction of the super abrasive grain wire saw is from parallel to within 5° relative to the (11-20) surface (a surface) of the single crystal sapphire. An accurate single crystal sapphire substrate having the r surface as a main surface is thereby provided. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、超砥粒ワイヤソーで単結晶サファイヤ基板を(1−102)面(r面)と平行、または平行から1度以内の方向に高精度に切断する方法と、その超砥粒ワイヤソー切断装置に関するものである。 The present invention relates to a method of cutting a single crystal sapphire substrate with a superabrasive wire saw with high accuracy in a direction parallel to (1-102) plane (r-plane) or within 1 degree from the parallel, and the superabrasive wire saw cutting. It relates to the device.

単結晶サファイヤは、α−AL2O3の単結晶であり、優れた物理的特性、熱的特性、電気的特性、光学的特性を有しているので、耐磨耗部品、耐熱部品、光学部品、電気・電子部品、半導体部品などに広く利用されている。
単結晶サファイヤの結晶構造は稠密六方晶系に属し、図2に示す面方位によると、単結晶のc軸に対して直角方向に(0001)面(c面と称する)が存在し、このc軸に平行な(11−20)面(a面と称する)、c軸に対して一定の角度を有する(1−102)面(r面と称する)および(11−23)(n面と称する)が存在する。
Single crystal sapphire is a single crystal of α-AL2O3, and has excellent physical characteristics, thermal characteristics, electrical characteristics, and optical characteristics. Therefore, wear-resistant parts, heat-resistant parts, optical parts, electrical -Widely used for electronic parts, semiconductor parts, etc.
The crystal structure of the single crystal sapphire belongs to the dense hexagonal system, and according to the plane orientation shown in FIG. 2, there is a (0001) plane (referred to as c-plane) in a direction perpendicular to the c-axis of the single crystal. (11-20) plane (referred to as a-plane) parallel to the axis, (1-102) plane (referred to as r-plane) and (11-23) (referred to as n-plane) having a certain angle with respect to the c-axis ) Exists.

超砥粒ワイヤソーとしては、芯線にダイヤモンド砥粒を固着した、固定砥粒方式のダイヤモンドワイヤソーが提案された。このダイヤモンドワイヤソーは、切れ味が極めて良好で、しかもスラリーが不要、水溶性又は不水溶性の研削液が利用できるため機械とその周辺の汚れが低減され、作業環境を改善することができる特長がある。しかも、数十Km以上の長尺のダイヤモンドワイヤソーを製作できるので、マルチで切断加工が可能であり、スラリーを用いるマルチワイヤソーと比較して数倍以上の切断速度が得られる特長がある。固定砥粒方式のダイヤモンドワイヤソーとしては、ポリエチレン、ナイロン、ポリエステル等からなる素材、若しくはこれら素材をガラス繊維、炭素繊維で補強した材料を芯線とし、この芯線の外周にダイヤモンド砥粒を合成樹脂接着剤又は電着で固着するものが提案されている。
(例えば、特許文献1参照)
また、別のダイヤモンドワイヤソーとしては、炭素繊維、アラミド繊維、アルミナ繊維、ボロン繊維、シリコンカーバイド繊維、若しくはシリコン−チタン−炭素−酸素系無機繊維等のモノフィラメント又はマルチフィラメントを芯線とし、この芯線の外周にダイヤモンド砥粒をメッキ又は合成樹脂バインダーで固着したものが提案されている。
(例えば、特許文献2参照)
As a superabrasive wire saw, a diamond wire saw of a fixed abrasive system in which diamond abrasive grains are fixed to a core wire has been proposed. This diamond wire saw has a very good sharpness, no slurry required, and water-soluble or water-insoluble grinding fluid can be used, so that dirt on the machine and its surroundings is reduced and the working environment can be improved. . Moreover, since a diamond wire saw having a length of several tens of kilometers or more can be manufactured, it can be cut with a multi-piece, and has a feature that a cutting speed several times or more can be obtained as compared with a multi-wire saw using slurry. The fixed abrasive diamond wire saw is made of polyethylene, nylon, polyester, or the like, or a material reinforced with glass fiber or carbon fiber. The core wire has diamond abrasive grains on the outer periphery of the core wire. Or what adheres by electrodeposition is proposed.
(For example, see Patent Document 1)
As another diamond wire saw, a carbon fiber, an aramid fiber, an alumina fiber, a boron fiber, a silicon carbide fiber, or a monofilament or a multifilament such as a silicon-titanium-carbon-oxygen-based inorganic fiber is used as a core wire, and the outer periphery of the core wire A diamond abrasive grain fixed by plating or a synthetic resin binder has been proposed.
(For example, see Patent Document 2)

これらの超砥粒ワイヤソーは、一例として図3に示される切断装置に用いることができる。超砥粒ワイヤソー切断装置は、多数本の超砥粒ワイヤソーを被加工物に押しつけて超砥粒ワイヤソーを往復走行させながら、被加工物を一度に多数枚にスライシングする装置である。単結晶サファイヤのみならず、大直径のシリコンゴットからのシリコンウエハのスライシングや、フェライト、ネオジウム磁石などの磁性材料の切断加工、光学ガラスの切断加工に超砥粒ワイヤソー切断装置を用いることが試みられている。
具体的には図3に示すように、メインローラ5と6の外周面には被加工物の切断寸法に応じて溝が設けられている。超砥粒ワイヤソー1はリール2と9の外周面に巻かれている。一方のリール2からガイドローラ3と4を経由して取り出さた超砥粒ワイヤソー1は、メインローラ5と6の溝に順次巻き付けられ、ガイドローラ7と8を経由して、他方のリール9に巻き取られる。超砥粒ワイヤソー1をリール2と9との間で往復走行させながら、多数本の超砥粒ワイヤソー1を被加工物10に押しつけて被加工物10を一度に多数枚に切断加工する。このとき、メインローラ5と6の溝にはノズル11と12から研削液が供給される。
These superabrasive wire saws can be used in the cutting apparatus shown in FIG. 3 as an example. A superabrasive wire saw cutting device is a device that slices a workpiece into a plurality of pieces at a time while pressing a number of superabrasive wire saws against the workpiece and reciprocating the superabrasive wire saw. Attempts have been made to use superabrasive wire saw cutting equipment not only for single crystal sapphire, but also for slicing silicon wafers from large diameter silicon gots, cutting magnetic materials such as ferrite and neodymium magnets, and cutting optical glass. ing.
Specifically, as shown in FIG. 3, grooves are provided on the outer peripheral surfaces of the main rollers 5 and 6 in accordance with the cut dimensions of the workpiece. The superabrasive wire saw 1 is wound around the outer peripheral surfaces of the reels 2 and 9. The superabrasive wire saw 1 taken out from one reel 2 via the guide rollers 3 and 4 is sequentially wound around the grooves of the main rollers 5 and 6, and is wound around the other reel 9 via the guide rollers 7 and 8. It is wound up. While the superabrasive wire saw 1 is reciprocated between the reels 2 and 9, a large number of superabrasive wire saws 1 are pressed against the work piece 10 to cut the work piece 10 into a large number at a time. At this time, the grinding liquid is supplied from the nozzles 11 and 12 to the grooves of the main rollers 5 and 6.

単結晶サファイヤ基板の切断方法についての先行文献としては、(0001)面(c面)を主面とする、単結晶サファイヤ基板の切断方法が知られている。
(例えば、特許文献1参照)
As a prior document on a method for cutting a single crystal sapphire substrate, a method for cutting a single crystal sapphire substrate having a (0001) plane (c-plane) as a main surface is known.
(For example, see Patent Document 1)

特開平8−126953号公報Japanese Patent Laid-Open No. 8-126953 特開平9−155631号公報JP-A-9-155631 特開2003−320521号公報JP 2003-320521 A

超砥粒ワイヤソーを用いて単結晶サファイヤ基板を切断する場合、遊離砥粒方式のワイヤソーに比べて、被削性の良好な結晶面に沿って切断が進み、切断精度に大きく影響する傾向が見られる。例えば、超砥粒ワイヤソーを用いて単結晶サファイヤを(1−102)面(r面)に対して平行から1度以内に切断する場合、超砥粒ワイヤソーの走行方向を結晶面に対して任意な方向に設定すると平行に切断できない問題が発生した。
そこで、この発明の目的は、単結晶サファイヤ基板の超砥粒ワイヤソーによる切断加工において、(1−102)面(r面)に対して平行から1度以内の方向に高精度な切断加工を可能にする切断加工法と、その切断装置を提供するものである。
When cutting a single crystal sapphire substrate using a superabrasive wire saw, the cutting progresses along a crystal surface with good machinability compared to a loose-abrasive wire saw, and there is a tendency to greatly affect the cutting accuracy. It is done. For example, when cutting a single crystal sapphire within 1 degree from parallel to the (1-102) plane (r-plane) using a superabrasive wire saw, the traveling direction of the superabrasive wire saw is arbitrary with respect to the crystal plane When set in a different direction, there was a problem that cutting was not possible in parallel.
Accordingly, an object of the present invention is to enable high-accuracy cutting in a direction within 1 degree from parallel to the (1-102) plane (r-plane) in cutting with a superabrasive wire saw on a single crystal sapphire substrate. The present invention provides a cutting method and a cutting device for the same.

この発明に従った単結晶サファイヤ基板の切断方法は、超砥粒ワイヤソーによる、(1−102)面(r面)を主面とする単結晶サファイヤ基板の切断方法であって、超砥粒ワイヤソーの切り込み方向が(1−102)面(r面)に対して平行から1度以内で、超砥粒ワイヤソーの走行方向が(11−20)面(a面)に対して平行から5度以内であることを特徴とする超砥粒ワイヤソーによる単結晶サファイヤ基板の切断方法である。
ここで、(1−102)面(r面)を主面とするとは、r面と平行、またはr面と平行から1度以内の角度を有する単結晶サファイヤ基板をいう。
A method for cutting a single crystal sapphire substrate according to the present invention is a method for cutting a single crystal sapphire substrate having a (1-102) plane (r-plane) as a main surface by using a superabrasive wire saw. Cutting direction is within 1 degree from parallel to the (1-102) plane (r-plane), and the traveling direction of the superabrasive wire saw is within 5 degrees from parallel to the (11-20) plane (a-plane). A method for cutting a single crystal sapphire substrate with a superabrasive wire saw.
Here, the (1-102) plane (r-plane) being a main plane refers to a single crystal sapphire substrate having an angle parallel to the r-plane or having an angle within 1 degree from the parallel to the r-plane.

また、この発明に従った単結晶サファイヤ基板の切断装置は、単結晶サファイヤの切断に用いる超砥粒ワイヤソー切断装置であって、上記単結晶サファイヤを保持する手段と、上記単結晶サファイヤの(1−102)面(r面)を超砥粒ワイヤソーの切り込み方向に対して平行から1度以内にセッティングする手段と、上記単結晶サファイヤの(11−20)(a面)を超砥粒ワイヤソーの走行方向に対して平行から5度以内にセッティングする手段とを有することを特徴とする超砥粒ワイヤソー切断装置である。 A single crystal sapphire substrate cutting device according to the present invention is a superabrasive wire saw cutting device used for cutting a single crystal sapphire, the means for holding the single crystal sapphire, and (1 -102) means for setting the plane (r-plane) within 1 degree from parallel to the cutting direction of the superabrasive wire saw, and (11-20) (a-plane) of the single crystal sapphire It has a means for setting within 5 degrees from parallel to the running direction.

超砥粒ワイヤソーの切り込み方向が(1−102)面(r面)に対して平行から1度以内で、超砥粒ワイヤソーの走行方向が(11−20)面(a面)に対して平行から5度以内に設定することによって、(1−102)面(r面)を主面とする単結晶サファイヤ基板を高精度に切断加工することができる。 The cutting direction of the superabrasive wire saw is within 1 degree from parallel to the (1-102) plane (r-plane), and the traveling direction of the superabrasive wire saw is parallel to the (11-20) plane (a-plane). Is set within 5 degrees, the single crystal sapphire substrate having the (1-102) plane (r-plane) as the main surface can be cut with high accuracy.

この発明の単結晶サファイヤ基板の切断方法の特徴は、超砥粒ワイヤソーによる、(1−102)面(r面)を主面とする単結晶サファイヤ基板の切断方法であって、超砥粒ワイヤソーの切り込み方向が(1−102)面(r面)に対して平行から1度以内で、超砥粒ワイヤソーの走行方向が(11−20)面(a面)に対して平行から5度以内であることである。
その切断方法の概略図が図1である。この場合において、事前に方位測定器で測定された(11−20)(a面)と直交する軸方向(a軸)を測定しておき、この軸と超砥粒ワイヤソーの走行方向が直角に設定されている。超砥粒ワイヤソーがa軸に対して直角とは、この基準軸と超砥粒ワイヤソーが完全に直交する方向から5度以内であることが望ましく、2度以内であることがより好ましい。さらに、超砥粒ワイヤソーの切り込み方向が(1−102)面(r面)に対して平行に設定されて切断加工が行われる。
超砥粒ワイヤソーの走行方向を結晶面に対して任意な方向に設定すると(1−102)面(r面)に対して平行に切断できない原因としては以下のことが考えられる。例えば、(11−20)面(a面)以外の任意の面を超砥粒ワイヤソーの走行方向と平行な面になるようにして切り込むと、(11−23)面(n面)や(0001)面(c面)に沿って超砥粒ワイヤソーが切り込まれるため切断精度が低下するものと考えられる 。
A feature of the method for cutting a single crystal sapphire substrate according to the present invention is a method for cutting a single crystal sapphire substrate having a (1-102) plane (r-plane) as a main surface using a superabrasive wire saw. The cutting direction is within 1 degree from parallel to the (1-102) plane (r-plane), and the traveling direction of the superabrasive wire saw is within 5 degrees from parallel to the (11-20) plane (a-plane). It is to be.
A schematic diagram of the cutting method is shown in FIG. In this case, an axial direction (a-axis) orthogonal to (11-20) (a-plane) measured in advance by an orientation measuring device is measured, and the traveling direction of this axis and the superabrasive wire saw is perpendicular to each other. Is set. The superabrasive wire saw being perpendicular to the a-axis is preferably within 5 degrees from the direction in which the reference axis and the superabrasive wire saw are completely orthogonal, and more preferably within 2 degrees. Further, the cutting direction of the superabrasive wire saw is set parallel to the (1-102) plane (r-plane), and cutting is performed.
If the traveling direction of the superabrasive wire saw is set to an arbitrary direction with respect to the crystal plane, the following may be considered as reasons why the superabrasive wire saw cannot be cut parallel to the (1-102) plane (r-plane). For example, when any surface other than the (11-20) plane (a-plane) is cut so as to be a plane parallel to the traveling direction of the superabrasive wire saw, the (11-23) plane (n-plane) and (0001 ) Since the superabrasive wire saw is cut along the plane (c-plane), the cutting accuracy is considered to be lowered.

また、この発明の単結晶サファイヤ基板の切断装置の特徴は、単結晶サファイヤの切断に用いる超砥粒ワイヤソー切断装置であって、上記単結晶サファイヤを保持する手段と、上記単結晶サファイヤの(1−102)面(r面)を超砥粒ワイヤソーの切り込み方向に対して平行から1度以内にセッティングする手段と、上記単結晶サファイヤの(11−20)(a面)を超砥粒ワイヤソーの走行方向に対して平行から5度以内にセッティングする手段とを有することである。
切断装置としては、例えば、図3に示される切断装置に用いることができる。この超砥粒ワイヤソー切断装置は、多数本の超砥粒ワイヤソーを被加工物に押しつけて超砥粒ワイヤソーを往復走行させながら、被加工物を一度に多数枚に切断加工が可能な装置であり、特に、高能率な切断加工が要求される場合には最も適切である。
また、超砥粒ワイヤソーで単結晶サファイヤ基板を切断するには、不水溶性加工液よりも、水溶性加工液を用いるほうが高い切断速度が得られるので適当である。不水溶性加工液を用いると切断速度が低下する原因としては、不水溶性加工液の優れた潤滑性により、ダイヤモンド砥粒が被加工物(単結晶サファイヤ)の表面を上滑りするためと考えられる。
Also, the single crystal sapphire substrate cutting device according to the present invention is characterized by a superabrasive wire saw cutting device used for cutting a single crystal sapphire, the means for holding the single crystal sapphire, and (1 -102) means for setting the plane (r-plane) within 1 degree from parallel to the cutting direction of the superabrasive wire saw, and (11-20) (a-plane) of the single crystal sapphire And means for setting within 5 degrees from parallel to the traveling direction.
As the cutting device, for example, the cutting device shown in FIG. 3 can be used. This superabrasive wire saw cutting device is a device that can cut multiple workpieces at a time while pressing the superabrasive wire saw against the workpiece and reciprocating the superabrasive wire saw. In particular, it is most suitable when a highly efficient cutting process is required.
Also, for cutting a single crystal sapphire substrate with a superabrasive wire saw, it is appropriate to use a water-soluble processing liquid rather than a water-insoluble processing liquid because a higher cutting speed can be obtained. The reason why the cutting speed decreases when using a water-insoluble processing liquid is considered to be because the diamond abrasive grains slide on the surface of the workpiece (single crystal sapphire) due to the excellent lubricity of the water-insoluble processing liquid. .

直径0.18mmのピアノ線からなる芯線に、平均砥粒径42μmのダイヤモンド砥粒をレジンボンドで固着したダイヤモンドワイヤソーを用いて単結晶サファイヤの切断実験を行った。以下の切断条件において、超砥粒ワイヤソーの切り込み方向が(1−102)面に平行で、超砥粒ワイヤソーの走行方向が(11−20)面に平行の場合(本発明)と、垂直の場合(従来例)を比較して本発明の効果を確認した。
(切断条件)
被加工物:単結晶サファイヤ
被加工物サイズ:φ50mm−L30mm
超砥粒ワイヤソー切断機:タカトリ製
メインローラ間隔:570mm
超砥粒ワイヤソー線速度:400m/min
超砥粒ワイヤソー走行方向:往復走行
ワーク切り込み速度:ave0.1mm/min
超砥粒ワイヤソーのテンション:35N
加工液:水溶性加工液
単結晶サファイヤを切断して基板とし、その基板の切断方向のうねりを測定した。測定片は手前側、中央、奥側から各3枚(計9枚)をサンプルとした。そのテスト結果を表1に示す。
A single crystal sapphire cutting experiment was conducted using a diamond wire saw in which diamond abrasive grains having an average abrasive grain size of 42 μm were fixed to a core wire made of a piano wire having a diameter of 0.18 mm with a resin bond. In the following cutting conditions, when the cutting direction of the superabrasive wire saw is parallel to the (1-102) plane and the traveling direction of the superabrasive wire saw is parallel to the (11-20) plane (invention), it is perpendicular to The effect of the present invention was confirmed by comparing cases (conventional examples).
(Cut condition)
Workpiece: Single crystal sapphire Workpiece size: φ50mm-L30mm
Super-abrasive wire saw cutting machine: made by Takatori
Main roller spacing: 570mm
Super-abrasive wire saw wire speed: 400 m / min
Superabrasive wire saw traveling direction: Reciprocating workpiece cutting speed: ave 0.1 mm / min
Tension of superabrasive wire saw: 35N
Processing liquid: A water-soluble processing liquid single crystal sapphire was cut into a substrate, and the waviness in the cutting direction of the substrate was measured. Three test pieces (nine in total) from the front side, center, and back side were used as samples. The test results are shown in Table 1.

Figure 2009262305
Figure 2009262305

表1から明らかなように、超砥粒ワイヤソーの走行方向を(11−20)面(a面)に平行方向にすることにより、切断精度が向上することが判明した。a面と10度の方向では明らかに切断面のうねりが大きくなっている。しかしながら、1〜5度の方向では、平行の場合との差異が認められなかったので、高精度に切断するには5度以内が好ましいと考えられる。 As is clear from Table 1, it was found that the cutting accuracy is improved by making the traveling direction of the superabrasive wire saw parallel to the (11-20) plane (a-plane). The waviness of the cut surface is clearly large in the direction of 10 degrees with the a-plane. However, in the direction of 1 to 5 degrees, a difference from the parallel case was not recognized, and therefore it is considered that 5 degrees or less is preferable for cutting with high accuracy.

単結晶サファイヤの切断方法を示す概略図である。It is the schematic which shows the cutting method of a single crystal sapphire. 単結晶サファイヤの結晶面を示す概略図である。It is the schematic which shows the crystal plane of a single crystal sapphire. 超砥粒ワイヤソー切断装置を示す概略図である。It is the schematic which shows a superabrasive wire saw cutting device.

符号の説明Explanation of symbols

1 超砥粒ワイヤソー
2,9 リール
3,4,7,8, ガイドローラ
5,6 メインローラ
10 被加工物
11,12 ノズル
1 Super Abrasive Wire Saw 2, 9 Reel 3, 4, 7, 8, Guide Roller 5, 6 Main Roller 10 Workpiece 11, 12 Nozzle

Claims (2)

超砥粒ワイヤソーによる、(1−102)面(r面)を主面とする単結晶サファイヤ基板の切断方法であって、
超砥粒ワイヤソーの切り込み方向が(1−102)面(r面)に対して平行から1度以内で、
超砥粒ワイヤソーの走行方向が(11−20)面(a面)に対して平行から5度以内であることを特徴とする、超砥粒ワイヤソーによる単結晶サファイヤ基板の切断方法。
A method for cutting a single crystal sapphire substrate having a (1-102) plane (r-plane) as a main surface by a superabrasive wire saw,
The cutting direction of the superabrasive wire saw is within 1 degree from parallel to the (1-102) plane (r-plane),
A method of cutting a single crystal sapphire substrate with a superabrasive wire saw, wherein the traveling direction of the superabrasive wire saw is within 5 degrees from parallel to the (11-20) plane (a-plane).
単結晶サファイヤ基板の切断に用いる超砥粒ワイヤソー切断装置であって、
上記単結晶サファイヤを保持する手段と、
上記単結晶サファイヤの(1−102)面(r面)を超砥粒ワイヤソーの切り込み方向に対して平行から1度以内にセッティングする手段と、
上記単結晶サファイヤの(11−20)(a面)を超砥粒ワイヤソーの走行方向に対して平行から5度以内にセッティングする手段とを有することを特徴とする、超砥粒ワイヤソー切断装置。
A superabrasive wire saw cutting device used for cutting a single crystal sapphire substrate,
Means for holding the single crystal sapphire;
Means for setting the (1-102) plane (r-plane) of the single crystal sapphire within 1 degree from parallel to the cutting direction of the superabrasive wire saw;
A superabrasive wire saw cutting device comprising means for setting (11-20) (a-plane) of the single crystal sapphire within 5 degrees from parallel to the running direction of the superabrasive wire saw.
JP2008116970A 2008-04-28 2008-04-28 Method and apparatus for cutting single crystal sapphire substrate Expired - Fee Related JP5042112B2 (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102225592A (en) * 2011-04-27 2011-10-26 无锡斯达新能源科技有限公司 Method for improving sapphire crystal ingot bar taking yield
KR101139481B1 (en) 2010-03-25 2012-04-30 주식회사 크리스탈온 Method of slicing artificial single crystal corundum ingot
CN104786376A (en) * 2014-01-17 2015-07-22 日立金属株式会社 Method of cutting high-hardness material with multi-wire saw
KR20170013237A (en) * 2014-05-28 2017-02-06 신에쯔 한도타이 가부시키가이샤 Abrasive grain-fixed wire, wire saw, and method for cutting workpiece
JP2020113584A (en) * 2019-01-08 2020-07-27 豊田合成株式会社 Manufacturing method for light-emitting device

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Publication number Priority date Publication date Assignee Title
JP2002184845A (en) * 2000-12-15 2002-06-28 Kyocera Corp Wafer support substrate
JP2003320521A (en) * 2002-05-01 2003-11-11 Allied Material Corp Method and device for cutting single crystal sapphire substrate

Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
JP2002184845A (en) * 2000-12-15 2002-06-28 Kyocera Corp Wafer support substrate
JP2003320521A (en) * 2002-05-01 2003-11-11 Allied Material Corp Method and device for cutting single crystal sapphire substrate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101139481B1 (en) 2010-03-25 2012-04-30 주식회사 크리스탈온 Method of slicing artificial single crystal corundum ingot
CN102225592A (en) * 2011-04-27 2011-10-26 无锡斯达新能源科技有限公司 Method for improving sapphire crystal ingot bar taking yield
CN104786376A (en) * 2014-01-17 2015-07-22 日立金属株式会社 Method of cutting high-hardness material with multi-wire saw
JP2015134390A (en) * 2014-01-17 2015-07-27 日立金属株式会社 Cutting method with multi-wire saw of high-harness material
KR20170013237A (en) * 2014-05-28 2017-02-06 신에쯔 한도타이 가부시키가이샤 Abrasive grain-fixed wire, wire saw, and method for cutting workpiece
KR102150407B1 (en) 2014-05-28 2020-09-01 신에쯔 한도타이 가부시키가이샤 Abrasive grain-fixed wire, wire saw, and method for cutting workpiece
JP2020113584A (en) * 2019-01-08 2020-07-27 豊田合成株式会社 Manufacturing method for light-emitting device

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