JP2009260279A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP2009260279A JP2009260279A JP2009044672A JP2009044672A JP2009260279A JP 2009260279 A JP2009260279 A JP 2009260279A JP 2009044672 A JP2009044672 A JP 2009044672A JP 2009044672 A JP2009044672 A JP 2009044672A JP 2009260279 A JP2009260279 A JP 2009260279A
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
Landscapes
- Wire Bonding (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
【解決手段】ステージ4及び圧着ヘッド5を有する圧着装置10によって半導体チップ3と基板1との接合を行う半導体装置の製造方法において、半導体チップと、基板と、これらの間に配置された半導体封止用の接着剤層2とを有する積層体に対し、圧着ヘッド及びステージによって当該積層体の厚さ方向に押圧力を加えるとともに、当該積層体を加熱する熱圧着工程を備え、熱圧着工程において、圧着ヘッドの温度とステージの温度の差が300℃未満となるように設定し、半導体チップと基板との接合を行う、半導体装置の製造方法。
【選択図】図1
Description
図1は、ステージ及び圧着ヘッドを有する圧着装置を示す模式断面図である。同図に示す圧着装置10は、基板等を載置するステージ4と、鉛直方向に移動可能な圧着ヘッド5とを備える。ステージ4及び圧着ヘッド5は、いずれもヒータが内蔵されており、表面の温度を所望の温度にそれぞれ設定できるようになっている。
接着剤層2をなす接着剤組成物について説明する。この半導体封止用の接着剤組成物は、耐熱性及び熱硬化性を有するものが好ましい。かかる観点から、当該接着剤組成物は、分子量10000以上の高分子成分と、熱硬化成分とを含有することが好ましい。以下、接着剤組成物に含有せしめる成分について説明する。
一般式(I)中、nは2〜20の整数を示す。
一般式(III)中、Q1、Q2及びQ3は各々独立に炭素数1〜10のアルキレン基を示しmは2〜80の整数を示す。
一般式(IV)中、nは5〜20の整数を示す。
一般式(V)中、Q4及びQ9は各々独立に炭素数1〜5のアルキレン基又は置換基を有してもよいフェニレン基を示し、Q5、Q6、Q7、及びQ8は各々独立に炭素数1〜5のアルキル基、フェニル基又はフェノキシ基を示し、pは1〜5の整数を示す。
一般式(VI)中、mは2〜80の整数を示す
(pが1のとき)
1,1,3,3−テトラメチル−1,3−ビス(4−アミノフェニル)ジシロキサン、1,1,3,3−テトラフェノキシ−1,3−ビス(4−アミノエチル)ジシロキサン、1,1,3,3−テトラフェニル−1,3−ビス(2−アミノエチル)ジシロキサン、1,1,3,3−テトラフェニル−1,3−ビス(3−アミノプロピル)ジシロキサン、1,1,3,3−テトラメチル−1,3−ビス(2−アミノエチル)ジシロキサン、1,1,3,3−テトラメチル−1,3−ビス(3−アミノプロピル)ジシロキサン、1,1,3,3−テトラメチル−1,3−ビス(3−アミノブチル)ジシロキサン、1,3−ジメチル−1,3−ジメトキシ−1,3−ビス(4−アミノブチル)ジシロキサン等。
(pが2のとき)
1,1,3,3,5,5−ヘキサメチル−1,5−ビス(4−アミノフェニル)トリシロキサン、1,1,5,5−テトラフェニル−3,3−ジメチル−1,5−ビス(3−アミノプロピル)トリシロキサン、1,1,5,5−テトラフェニル−3,3−ジメトキシ−1,5−ビス(4−アミノブチル)トリシロキサン、1,1,5,5−テトラフェニル−3,3−ジメトキシ−1,5−ビス(5−アミノペンチル)トリシロキサン、1,1,5,5−テトラメチル−3,3−ジメトキシ−1,5−ビス(2−アミノエチル)トリシロキサン、1,1,5,5−テトラメチル−3,3−ジメトキシ−1,5−ビス(4−アミノブチル)トリシロキサン、1,1,5,5−テトラメチル−3,3−ジメトキシ−1,5−ビス(5−アミノペンチル)トリシロキサン、1,1,3,3,5,5−ヘキサメチル−1,5−ビス(3−アミノプロピル)トリシロキサン、1,1,3,3,5,5−ヘキサエチル−1,5−ビス(3−アミノプロピル)トリシロキサン、1,1,3,3,5,5−ヘキサプロピル−1,5−ビス(3−アミノプロピル)トリシロキサン等。
μ=8πFtZ4Z0 4/[3V2(Z0 4−Z4)]
μ:溶融粘度(Pa・s)
F:荷重(N)
t:加熱加圧時間(秒)
Z0:初期厚み(m)
Z:加圧後厚み(m)
V:樹脂体積(m3)
ポリイミド樹脂、エポキシ樹脂、フェノール樹脂、添加剤(硬化促進剤やフィラーなど)を有機溶媒中に添加し、攪拌混合、混錬などにより、溶解又は分散させて、樹脂ワニスを調製する。その後、離型処理を施した基材フィルム上に、樹脂ワニスをナイフコーター、ロールコーターやアプリケーターを用いて塗布した後、加熱により有機溶媒を除去して、基材フィルム上にフィルム状接着剤を形成する。また、ポリイミド樹脂は、合成後に単離することなく、ワニスの状態で使用し、このワニス中に各成分を加えて樹脂ワニスを調製してもよい。
接着剤組成物の調製に使用するポリイミド樹脂を以下のようにして合成した。すなわち、温度計、攪拌機及び塩化カルシウム管を備えた300mlフラスコに、1,12−ジアミノドデカン2.10g(0.035モル)、ポリエーテルジアミン(BASF製、ED2000、分子量:1923)17.31g(0.03モル)、1,3−ビス(3−アミノプロピル)テトラメチルジシロキサン(信越化学工業株式会社製、LP−7100)2.61g(0.035モル)及びN−メチル−2−ピロリドン(関東化学株式会社製)150gを仕込み攪拌した。ジアミンの溶解後、フラスコを氷浴中で冷却しながら、無水酢酸で再結晶精製した4,4’−(4,4’−イソプロピリデンジフェノキシ)ビス(フタル酸二無水物)(ALDRICH製、BPADA)15.62g(0.10モル)を少量ずつ添加した。室温(25℃)で8時間反応させた後、キシレン100gを加え、窒素ガスを吹き込みながら180℃で加熱し、水と共にキシレンを共沸除去し、ポリイミド溶液を得た。得られたポリイミド樹脂は、ガラス転移温度Tgが22℃であり、重量平均分子量が47000であり、SP値が10.2であった。
まず、上記のようにして合成したポリイミド樹脂及び以下の化合物を使用し、半導体封止用の接着剤組成物を調製した。
(a)エポキシ樹脂
・クレゾールノボラック型エポキシ(東都化成株式会社製、YDCN−702)、
・多官能特殊エポキシ樹脂(株式会社プリンテック、VG3101L)、
(b)フェノール樹脂
・クレゾールナフトールホルムアルデヒド重縮合物(日本化薬株式会社製、カヤハードNHN)、
(c)硬化促進剤
・2,4−ジアミノ−6−[2’−メチルイミダゾリル−(1’)]−エチル−s−トリアジンイソシアヌル酸付加体(四国化成工業株式会社製、2MAOK−PW)。
(実施例1〜7及び比較例1,2)
上記のようにして作製した接着フィルムを所定のサイズ(2.5mm×15.5mm)に切り、ポリイミド基板上に貼り付けた。実装装置(フリップチップボンダーFCB3、松下電器産業株式会社製)を使用し、金バンプを有する半導体チップをポリイミド基板に実装した。実装装置のステージ及び圧着ヘッドは表1,2に示す温度に設定し、圧着時間1秒、圧着力50Nに設定した。
ポリイミド基板:厚さ38μm、銅配線の厚さ8μm、銅配線を被覆するスズめっきの厚さ0.2μm、株式会社日立超LSIシステムズ製、JKIT COF TEG_30−B(商品名)。
半導体チップ:サイズ1.6mm×15.1mm、厚さ0.4mm、バンプサイズ20μm×100μm×高さ15μm、バンプ数726、株式会社日立超LSIシステムズ製、JTEG PHASE6_30(商品名)。
A:ボイド部分の占める割合が5%以下。
B:ボイド部分の占める割合が5%より高い。
ここで、ボイド部分の占める割合は、金属顕微鏡BX60(OLMPUS)、カメラPDMC Ie i(Polaroid)を用いて画像(8bit)を取り込み、画像処理ソフトAdobe Photoshopを用いて、色調補正、二階調化によりボイド部分を識別し、ヒストグラムにより算出した。
比較例1,2で作製した半導体装置の接続部に生じたボイドが熱収縮に起因するものであるか、樹脂発泡に起因するものであるかを確認する試験を行った。接着剤組成物の硬化物を観察しやすいように、ポリイミド基板の代わりにガラスチップ(サイズ15mm×15mm、厚さ0.7mm)を使用した。なお、半導体チップとして、サイズ4.26mm×4.26mm、厚さ0.27mm、金バンプの高さ0.02mmのものを使用した。
上記接着剤組成物からなる接着フィルム(厚さ30μm)を所定のサイズ(5mm×5mm)に切り、ガラスチップ上に貼り付けた。実装装置(フリップチップボンダーFCB3、松下電器産業株式会社製)を使用し、金バンプを有する半導体チップをガラスチップ上に固定した。実装装置のステージ及び圧着ヘッドは表3に示す温度に設定し、圧着時間1秒、圧着圧力1MPaとした。
圧着時間を1秒とする代わりに、30秒としたことの他は、参考例1,2と同様にして積層体を作製し、接着フィルムの硬化物におけるボイドの有無を観察した。その結果、参考例3,4によって得られた積層体は、接着フィルムの硬化物にボイドは認められなかった。
Claims (7)
- ステージ及び圧着ヘッドを有する圧着装置によって半導体チップと基板との接合を行う半導体装置の製造方法において、
前記半導体チップと、前記基板と、これらの間に配置された半導体封止用の接着剤層とを有する積層体に対し、前記圧着ヘッド及び前記ステージによって当該積層体の厚さ方向に押圧力を加えるとともに、当該積層体を加熱する熱圧着工程を備え、
前記熱圧着工程において、前記圧着ヘッドの温度と前記ステージの温度の差が300℃未満となるように設定し、前記半導体チップと前記基板との接合を行う、半導体装置の製造方法。 - 半導体封止用の接着剤組成物からなるフィルムを前記半導体チップと前記基板との間に配置することによって、前記半導体封止用の接着剤層を形成する、請求項1に記載の半導体装置の製造方法。
- 前記半導体チップは少なくとも表面が金からなるバンプを有するとともに、前記基板は前記バンプと接続される金属配線を有し、前記熱圧着工程における処理によって前記バンプと前記金属配線とを金属結合によって接合する、請求項1又は2に記載の半導体装置の製造方法。
- 前記半導体封止用の接着剤層は、分子量10000以上の高分子成分と、熱硬化成分とを含有する、請求項1〜3のいずれか一項に記載の半導体装置の製造方法。
- 前記半導体封止用の接着剤層は、ポリイミド樹脂と、熱硬化成分とを含有する、請求項1〜3のいずれか一項に記載の半導体装置の製造方法。
- 前記ポリイミド樹脂は、重量平均分子量が30000以上であり且つガラス転移温度が100℃以下である、請求項5に記載の半導体装置の製造方法。
- 前記接着剤層をなす接着剤組成物は、350℃における溶融粘度が350Pa・s以下であり、請求項1〜6のいずれか一項に記載の半導体装置の製造方法。
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JPS6451642A (en) * | 1987-08-22 | 1989-02-27 | Matsushita Electric Works Ltd | Sealing structure of semiconductor |
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