JP2009210264A - Gas monitoring system of treatment facility - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas monitoring system of a treatment facility capable of improving reliability of an analyzer of a facility for treating a hazardous material such as PCB. <P>SOLUTION: This gas monitoring system of a treatment facility for monitoring a gas environment of an organic hydrogenation treatment facility 100 is equipped with a gas monitoring device 110 for measuring the gas environment inside/outside the facility for treating the hazardous material. The gas monitoring device 110, which is a laser ionization time-of-flight mass spectrometer for introducing continuously sample gas into a vacuum chamber, subjecting the gas to laser ionization by laser light, and performing ion detection, detects presence of an oil portion in the sample gas, and executes at least one of analysis stop, gas monitoring by switching to a backup device, and gas cleaning of a pipe of a gas measuring line, when the oil portion quantity exceeds a threshold. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a gas monitoring system for a processing facility intended for a gas environment of a facility for processing an organic halide such as PCB.

Conventionally, in equipment for processing organic halides, exhaust management is strictly controlled. In particular, a PCB processing facility processes 100% PCB oil and removes PCB from a member containing or adhering PCB. There are work of extraction and cleaning, and gas regulations in the environment are made.
For example, the exhaust PCB control target value is 0.01 mg / m ³ N (corresponding to 10 ppbV or less, equivalent to one billionth).
For this reason, an on-line monitoring device is required for exhaust management in real time.
For this reason, the present inventors previously proposed a “laser ionization time-of-flight mass spectrometer” as one solution (see Patent Document 1).
According to this apparatus, by setting the laser wavelength or the like, ionization called resonance two-photon ionization occurs, and the PCB can be ionized with high efficiency. PCB can be continuously analyzed below the control target value in 1 minute measurement time.

The outline of the organic halide detection apparatus will be described below.
As shown in FIG. 11, the gas monitoring device 50 that detects organic halides is a detection device that detects the concentration of PCB, which is an organic halide in the gas, and continuously collects the sample 51 into the vacuum chamber 52. A capillary column 54 as a sample introduction means for introducing as a leaking molecular beam 53, a laser irradiation device 56 for irradiating the leaking molecular beam 53 with a laser beam 55 for laser ionization, and converging the laser ionized molecules. A converging unit 61 composed of a plurality of ion electrodes, an ion trap 57 for selectively concentrating the converged molecules, and an ion detector for detecting the reflected ions by reflecting the ions emitted at a constant period by the reflectron 58. And a time-of-flight mass spectrometer (TOFMAS) 60 provided with 59. Then, the PCB concentration to be measured can be obtained from the comparison of the signal intensity detected by the detector 59. The measured PCB concentration may be sent to the monitoring command room and announced to the outside by a monitor device (not shown), for example.

  The tip of the capillary column 54 preferably faces the ion converging portion 56. Specifically, the capillary column 54 is flush with the electrode on the most capillary column side among the electrodes constituting the ion converging portion 56 or more than the electrode. It should be protruding toward the ion trap side.

  The pulse wavelength of the laser beam 55 emitted from the laser irradiation device 56 is 300 nm or less, preferably about 300 to 250 nm. This is because when the thickness exceeds 300 nm, ionization of the organic halide to be measured is not satisfactorily performed.

  Here, when the organic halide to be analyzed is PCB with low chlorine (the number of chlorine is 1 to 3), the pulse wavelength is particularly preferably 250 to 280 nm. On the other hand, when the organic halide to be analyzed is, for example, PCB with high chlorine (having 4 or more chlorine atoms), the pulse wavelength is particularly preferably 270 to 300 nm. This is because the wavelength shifts to the 300 nm side as the number of chlorine molecules increases.

The pulse time width (laser pulse width) of the laser light 55 emitted from the laser irradiation device 56 is preferably 500 pico (10 ⁻¹² ) seconds (ps) or less. This is because a laser having a pulse time width of nanosecond (10 @ -9) is not preferable because of low detection sensitivity.

The laser energy density of the laser beam 55 emitted from the laser irradiation apparatus 56 (GW / cm ²⁾ is that 1~0.01GW / cm ^2, more preferably a laser 05~0.01GW / cm ² preferable. This is because when the laser energy density (GW / cm ² ) exceeds 1 GW / cm ² , PCB decomposition products increase, which is not preferable.

As described above, the laser light conditions are that the wavelength is 300 nm or less, the laser pulse time width is 500 picoseconds or less, and the laser energy density is 1 GW / cm ² or less, so that Decomposition can be suppressed and detection sensitivity can be greatly improved.

JP 2004-14726 A

By the way, waste disposal facilities contain many coexisting substances such as oil components such as tar components and suspended matters such as dust contained in insulating oil. These coexisting substances are contaminated substances from the viewpoint of ensuring the performance of the mass spectrometer, which is a major obstacle to precise analysis.
In addition, the performance of the laser device is easily deteriorated when oil components such as tar components and dust are attached to the optical component.

  Therefore, in facilities for processing harmful substances, the appearance of a technique that avoids deterioration of analytical performance in advance and continuously and stably measures gas is eagerly desired.

  In view of the above problems, an object of the present invention is to provide a gas monitoring system for a processing facility that can improve the reliability (durability) of an analyzer for a facility that processes harmful substances such as PCB.

  A first aspect of the present invention for solving the above-described problem is a gas monitoring system for a processing facility that monitors a gas environment of a processing facility that processes a hazardous substance, and the gas environment inside and outside the facility that processes the harmful substance. A laser ionization time-of-flight mass spectrometer for detecting ions by continuously introducing a sample gas into a vacuum chamber, laser ionizing with a laser beam, and detecting ions In addition, if the oil content in the sample gas is detected and the oil content exceeds the threshold, the analysis is stopped, the gas is monitored by switching to a backup device, or the piping of the gas measurement line is installed. A gas monitoring system for a processing facility is characterized by performing at least one of gas cleaning.

  According to a second invention, in the first invention, the presence or absence of oil in the sample gas is detected by a laser ionization time-of-flight mass spectrometer. In the gas monitoring system of the processing facility, the presence or absence of oil in the sample gas is determined from the peak of the above.

According to a third invention, in the second invention, the internal standard gas is dichlorotoluene, and from the peak area (S ₁ ) derived from dichlorotoluene and the peak area (S ₂ ) derived from oil, the following formula (1 ), The ratio is determined as 50, and when the threshold is exceeded, it is determined that there is a large amount of oil in the sample gas.
S ₁ / (S ₁ + S ₂ ) × 100 (1)

  According to a fourth aspect of the present invention, in the first aspect, the presence or absence of oil in the sample gas is detected by detecting the presence of CH bonds derived from the oil in the sample gas introduced into the laser ionization time-of-flight mass spectrometer. A gas monitoring system for a processing facility is characterized by detecting the presence or absence of an absorption spectrum.

  According to a fifth aspect of the invention, there is provided a gas for a processing facility according to the fourth aspect of the invention, wherein the presence or absence of oil in the sample gas is detected by detecting an infrared absorption spectrum with either infrared light or infrared laser light In the surveillance system.

  A sixth invention is a gas monitoring system for a processing facility for monitoring a gas environment of a processing facility for processing harmful substances, comprising an exhaust gas monitoring device for measuring a gas environment inside and outside the facility for processing harmful substances. The exhaust gas monitoring device is a laser ionization time-of-flight mass spectrometer that continuously introduces a sample gas into a vacuum chamber, laser ionizes it with a laser beam, and detects ions. Detect the presence or absence of dust in the device, and if the dust amount exceeds the threshold, stop the analysis, switch to the backup device and monitor the gas, or clean the gas measurement line piping or pipe It is in the gas monitoring system of the processing facility characterized by performing at least one of exchanging the activated carbon.

  A seventh invention is the gas monitoring system for a processing facility according to the sixth invention, wherein the presence / absence of dust is detected by detecting an infrared absorption spectrum with either infrared light or infrared laser light. .

  An eighth invention is the gas monitoring system for a processing facility according to the seventh invention, wherein the presence / absence of dust in the sample gas detects Mie scattered light caused by dust.

  A ninth invention is the gas monitoring system for a processing facility according to any one of the first to eighth inventions, wherein the harmful substance is an organic halide.

  ADVANTAGE OF THE INVENTION According to this invention, the reliability of the analyzer of the facility which processes harmful substances, such as PCB, can be improved, for example.

  Hereinafter, the present invention will be described in detail with reference to the drawings. Note that the present invention is not limited to the embodiments. In addition, constituent elements in the following embodiments include those that can be easily assumed by those skilled in the art or those that are substantially the same.

A gas monitoring system for a processing facility according to an embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a configuration diagram of an organic halogenation treatment facility applied to a gas monitoring system for a treatment facility according to the present embodiment.
In this embodiment, a PCB that is an organic halide is used as a harmful substance, and a transformer is used as an example of a member that contains or is attached to the PCB. However, the present invention is not limited to this.

  As shown in FIG. 1, the organic halogenation processing facility 100 according to the present embodiment includes a PCB extraction unit 103 that extracts PCB from a PCB-containing or attached material 102 that is carried from the outside and is provided in the processing facility 101. A member cleaning unit 105 for cleaning the subsequent PCB removal member 104, a PCB hydrothermal oxidative decomposition apparatus 106 for hydrothermally oxidizing and decomposing PCB, a detoxifying gas 109 after passing through activated carbon 108 discharged to the outside, and the atmosphere And a gas monitoring device 110 for monitoring the PCB concentration in each gas. In the figure, reference numeral 107 denotes detoxified waste water.

  Here, in this embodiment, examples of contaminants include oils such as PCB and other insulating oils, dusts in the atmosphere (dust components), phthalic acids, moisture, suspended matters such as sodium carbonate and iron rust. it can.

The gas monitoring apparatus according to the present embodiment includes a laser ionization time-of-flight mass spectrometer (TOFMAS) that continuously introduces a sample gas into a vacuum chamber, causes laser ionization with laser light, and detects ions. In addition, the presence or absence of oil in the sample gas is detected, and if the amount of oil exceeds the threshold, at least one of stopping the analysis, switching to a backup device, or cleaning the gas measurement line piping It is something to execute.
The laser ionization time-of-flight mass spectrometer (TOFMAS) is the same as that shown in FIG.

In this embodiment, the presence or absence of oil in the sample gas is detected by detecting the peak area (S ₁ ) derived from the internal standard gas detected by the detector of the laser ionization time-of-flight mass spectrometer (TOFMAS), and the oil content. From the peak area derived from (S ₂ ), the presence or absence of oil in the sample gas is detected. In laser ionization, by setting the laser wavelength to 350 nm or less, ionization called resonance two-photon ionization occurs, and the PCB can be ionized with high efficiency. Further, by applying the laser wavelength, in addition to PCB, internal standard gases (benzenes, halogenated benzenes, etc.) are ionized and peaks (S ₁ ) are formed, and insulating oil is ionized and peaks (S). ₂ ) is formed.

Here, when impurities (mainly oily gas) are generated in the gas to be measured, the peak area (S ₂ ) derived from the oily component of the mass spectrometry spectrum by TOFMAS increases.
FIG. 2 shows measurement examples when there is no oil gas in the PCB sample gas (the upper graph in FIG. 2) and when there is an oil gas (the lower graph in FIG. 2).
In this embodiment, the ratio obtained from the following equation (1) is calculated to determine whether or not the threshold value is exceeded.
[Peak area derived from internal standard gas (S ₁ ) / (Peak area derived from internal standard gas (S ₁ ) + Peak area derived from oil (S ₂ ))] × 100 (1)
Then, for example, when the threshold value is 50 and it is determined that the threshold value 50 is exceeded, it is determined that there is a large amount of oil in the sample gas.

As shown in the lower part of FIG. 2, the peak area (S ₂ ) intensity derived from the oil is derived from a coexisting substance component such as an insulating oil component containing PCB in the measurement chart.

Here, if the ratio is 50 or more, for example, the following measures are taken.
(1) Switch the measurement line currently measured, move to a backup measuring instrument, and continue measurement.
(2) Stop the introduction of the measurement sample gas.
(3) Apply fragment ion signal of internal standard gas.
Here, as the internal standard gas to be changed, from the parent ion (dichlorotoluene ion) of the internal standard gas used in the measurement of PCB, its fragment ion (toluene ion (mass number: about 90), chloro Change to toluene ion (mass number: about 120).

FIG. 3 illustrates each fragment of the internal standard gas.
Here, the horizontal axis of FIG. 3 is the time of flight (corresponding to the mass number), and the vertical axis is the signal intensity.
In the case of this spectrum, the PCB measurement area (mass number: 200 to 400) corresponds to 25 to 35 μsec.

Here, the peaks (1) to (3) correspond to the spectra of the internal standard gas and its fragments.
Usually, calibration is carried out by measuring dichlorotoluene at peak (3), but this dichlorotoluene corresponds to a mass region (mass number: 150 to 300) with a large amount of insulating oil components. Susceptible to oil and other gas components.

  Therefore, by applying a fragment component ((1) toluene, (2) chlorotoluene) that is not affected by this as an internal standard gas, calibration that is not affected by oil gas such as insulating oil becomes possible.

  Although this measure cannot prevent the contamination of the mass spectrometer from progressing, it is effective when performing measurement while performing calibration in such a case.

Next, a gas monitoring system for a processing facility according to the second embodiment will be described.
FIG. 4 is a schematic diagram of the gas monitoring system according to the second embodiment.
As shown in FIG. 4, the gas monitoring system (hereinafter referred to as “gas monitoring system”) 10-1 of the processing facility according to the present embodiment is introduced into the chamber of a laser ionization time-of-flight mass spectrometer (TOFMAS) 60. The presence or absence of an infrared absorption spectrum due to CH bonds derived from oil in the sample gas 11 is detected.
As shown in FIG. 4, the gas monitoring system 10-1 according to the present embodiment includes an infrared ray 20 from the infrared generator 21 at the introduction portion of the sample gas 11 in the chamber of a laser ionization time-of-flight mass spectrometer (TOFMAS) 60. The amount of absorption is detected by the detectors of the infrared absorption analyzer (the first detector 21-1 and the second detector 21-2), and the oil in the sample gas 11 (contaminant contaminants) ). In FIG. 4, reference numerals 12-1, 12-2, 12-3, 12-4 are windows, 15-1 is a first mirror, 15-2 is a second mirror, and 15-3 is a third mirror. A mirror, 16-1 is a first optical damper, and 16-2 is a second optical damper.

Here, the laser light 13 of the laser irradiation device 14 has a light wavelength of 350 nm or less, a laser pulse time width of 1000 picoseconds or less, and a laser energy density of 1 GW / cm ² or less. preferable.
Further, it is preferable that the first mirror 15-1 reflects the laser beam (wavelength: 350 nm or less) 13 with a reflectance of 99% or more.
In addition, when the wavelength is 200 nm or less (vacuum ultraviolet region), there is an influence of light absorption of oxygen molecules. In this case, the ambient environment of the laser light path is filled with an inert gas (N ₂ gas or the like). do it.

  The first window 12-1 and the second window 12-2 provided in the chamber transmit laser light (having a wavelength of 350 nm or less) (the material is synthetic quartz in the ultraviolet region). Good).

  The infrared generator 21 is preferably an infrared lamp, FT-IR (Fourier transform infrared spectrophotometer), or the like.

  It is preferable that the second mirror 15-2 and the third mirror 15-3 transmit infrared rays 20. The material is preferably calcium fluoride, for example.

  Further, it is preferable that the third window 12-3 and the fourth window 12-4 transmit infrared rays 20. For example, the material is preferably calcium fluoride.

  In the present embodiment, the first detector 21-1 measures the intensity (X) of the reference light reflected by the second mirror 15-2 of the infrared ray 20 generated from the infrared ray generator 21. Here, a semiconductor MCT (HgCdTe) detector (MCT) or the like may be used as the detection element of the first detector 21-1.

Further, the second detector 21-2 measures the intensity (Y) of the reference light reflected by the third mirror 15-3 after passing the infrared ray 20 irradiated from the infrared generator 21 through the sample gas 11. . Here, a semiconductor MCT (HgCdTe) detector or the like may be used as the detection element of the second detector 21-2.
Then, Y / X is calculated from the measurement result. Y / X is called transmittance, and when this is set to T, the absorbance (−log T) is proportional to the oil concentration. By determining the absorbance, the concentration of oil can be measured.

Here, as shown in FIG. 5, when the oil component gas is measured, the spectrum as described above is obtained (measured by FT-IR). This absorption spectrum due to the CH bond of oil gas (aliphatic hydrocarbon insulating oil C ₁₈ -C _20, such as the atmosphere volatile oils) have been observed. The horizontal axis in FIG. 5 is the wave number (cm ⁻¹ ), and the vertical axis is the absorbance.

  If it is determined from the spectrum that there is oil component gas, a transition is made to backup or measures such as cleaning the inside of the gas measurement line with N2 gas (reverse cleaning) are taken.

Here, FIG. 6 shows a chart of the total reflection IR spectrum of a deposit actually attached to a mirror, a lens, or the like. The horizontal axis in FIG. 6 is the wave number (cm ⁻¹ ), and the vertical axis is the transmittance. As shown in FIG. 6, absorption due to CH bonds due to the oil gas is detected.

Next, a gas monitoring system for a processing facility according to the third embodiment will be described.
FIG. 7 is a schematic diagram of a gas monitoring system according to the third embodiment.
As shown in FIG. 7, the gas monitoring system 10-2 according to the present embodiment uses CH bonds derived from oil in the sample gas 11 introduced into the chamber of the laser ionization time-of-flight mass spectrometer (TOFMAS) 60. The presence or absence of the resulting infrared absorption spectrum is detected.
As shown in FIG. 4, the gas monitoring system 10-2 according to the present embodiment is the same as the gas monitoring system 10-1 according to the second embodiment, except that the laser beam from the laser irradiation device 14 (for example, 1064 nm light for a YAG laser). Is transmitted through the first mirror 15-1, and the laser beam after the transmission is introduced into the nonlinear optical crystal 18 to obtain the second laser beam (infrared laser beam) 13-2.

Here, as the nonlinear optical crystal 18, the fundamental wave of the laser irradiation device 14 (light of 1064 nm in the case of a YAG laser) is passed through the crystal to generate a nonlinear optical phenomenon (such as optical parametric oscillation), thereby generating a wave number of 3000 cm ^−. An infrared laser of about ¹ is obtained. Examples of the nonlinear optical crystal include lithium niobate.
The calculation of soot is the same as in the second embodiment, and will be omitted.

  In the present embodiment, unlike the second embodiment, the infrared generator 21 is not required separately, so that the gas monitoring system can be made compact and the cost can be reduced.

Next, a gas monitoring system for a processing facility according to the fourth embodiment will be described.
FIG. 8 is a schematic diagram of a gas monitoring system according to the fourth embodiment.
As shown in FIG. 8, the gas monitoring system 10-3 according to the present embodiment detects the presence or absence of soot in the sample gas 11 introduced into the chamber of the laser ionization time-of-flight mass spectrometer (TOFMAS) 60, If the amount of dust exceeds the threshold, stop the analysis, switch to a backup device and monitor the gas, clean the gas measurement line piping, or replace the activated carbon (dust filter) in the piping At least one of these is executed.

In the present embodiment, similarly to the third embodiment, the second laser beam (visible or infrared laser beam) 13-2 is obtained using the nonlinear optical crystal 18. Visible light is preferably used. When a YAG laser device is used, the second harmonic (532 nm) is preferably used.
Then, the amount of dust is detected by the light detector 30 at the inlet of the sample gas 11 in the chamber with the second laser beam 13-2, and the dust in the sample gas is measured.
The light detector 30 detects Mie scattered light (light scattering phenomenon caused by particles having the same wavelength as the light wavelength) caused by the dust in the sample gas 11, and the light detector 30 increases the photoelectron. A double tube (PMT: Photomultiplier) can be mentioned.

Thereby, the dust etc. which are contained in sample gas 11 are detectable.
For example, when the sample gas 11 has a large amount of oil, organic matter may be generated on the inner surface of the window 12-1 of the TOFMAS 60, and the laser output may be reduced. If the laser output is reduced, the S / N is reduced. However, since it may become impossible to measure, this can be detected in advance. Further, it is possible to prevent contamination of parts in the mass spectrometer such as the converging unit 56 made up of a plurality of ion electrodes and blockage of the capillary column 54.

Next, a gas monitoring system for a processing facility of Example 5 will be described.
FIG. 9 is a schematic diagram of a gas monitoring system according to the fifth embodiment.
As shown in FIG. 9, the gas monitoring system 10-4 according to this embodiment includes an independent chamber for a laser irradiation device 14 that generates a laser beam 13 to be introduced into a laser ionization time-of-flight mass spectrometer (TOFMAS) 60. 14a, the presence or absence of an oil component in the chamber 14a is determined by measuring the absorbance of the CH group component by the infrared generator 20, and the amount of oil exceeds a threshold (preferably 0.01 mg / m ³ or more). In this case, the first activated carbon 41-1 is switched to the second activated carbon 41-2 to replace the first activated carbon in the pipe.
In FIG. 9, reference numeral 12-5 denotes a window, 43 denotes an air conditioner, and 44 denotes an inert gas control air supply source. In the air conditioner, the inside of the chamber 14a is adjusted so that the temperature is 25 ° C. and the humidity is 30 to 70% (preferably 40 to 50%).

  Thereby, the presence or absence of the organic substance adhering to the mirror or the lens surface in the chamber 14a in which the laser irradiation device 14 is stored can be detected in advance. Further, by replacing the activated carbon, the amount of dust in the chamber 14a can always be kept small.

  Note that infrared laser light obtained from the nonlinear optical crystal 18 from the laser irradiation device 14 may be used as infrared rays as in the third embodiment shown in FIG.

Next, a gas monitoring system for a processing facility of Example 6 will be described.
FIG. 10 is a schematic diagram of a gas monitoring system according to the sixth embodiment.
As shown in FIG. 10, the gas monitoring system 10-5 according to the present embodiment includes an independent chamber for a laser irradiation device 14 that generates a laser beam 13 to be introduced into a laser ionization time-of-flight mass spectrometer (TOFMAS) 60. 14a, the presence or absence of dust in the chamber 14a is detected by, for example, the CCD camera 31, and when the amount of dust exceeds a threshold, the first activated carbon (dust filter) 41-1 to the second activated carbon (dust filter) ) 41-2 to replace the first activated carbon (dust filter) in the pipe.

  In particular, the laser beam 13 generated from the laser irradiation device 14 is provided with a number of mirrors (15-1a to 15-1e) for reflecting the laser beam 13 a plurality of times. By detecting the Mie scattered light, the dust floating around the laser irradiation device 14 can be monitored on a plane.

  Although detection of the dust in the laser irradiation apparatus 14 is important, the chamber 14a cannot be opened easily. Therefore, by detecting the presence or absence of suspended substances or dust in the chamber 14a with the CCD camera 31, it is possible to predict in advance the contamination caused by the dust floating around the laser irradiation device 14.

According to the present invention, it is possible to prevent a decrease in signal-to-noise ratio accompanying an increase in noise components of the mass spectrum of TOFMAS by measuring oil content, dust, etc. in the atmosphere in advance. Thereby, the fall of analysis accuracy can be prevented. Moreover, it is also possible to suppress the deterioration of the performance (durability) due to the contamination of the mass spectrometer due to the large amount of oil and dust in the atmosphere flowing into the mass spectrometer. .
Further, it is possible to prevent a decrease in detection sensitivity due to a decrease in laser output due to contamination / deterioration of optical components. Furthermore, it is possible to prevent a decrease in detection sensitivity due to contamination in the chamber that houses the mass spectrometer.

  Thus, according to the present invention, in precision analysis using a laser ionization time-of-flight mass spectrometer, protection of the laser device and the mass spectrometer against inflow of oil gas, dust, etc. is achieved, and This contributes to improvement in reliability and durability.

  As described above, according to the gas monitoring system for a processing facility according to the present invention, it is possible to improve the reliability (durability of device performance) of an analyzer of a facility that processes a hazardous substance such as PCB.

It is a block diagram of the organic halogenation processing equipment applied to the gas monitoring system of the processing equipment concerning Example 1. FIG. It is a measurement chart figure by the difference in the presence or absence of oil component gas. It is a chart figure of each fragment of internal standard gas. 6 is a schematic diagram of a gas monitoring system according to Embodiment 2. FIG. It is IR spectrum figure resulting from a deposit. It is IR spectrum figure of a foreign material. 6 is a schematic diagram of a gas monitoring system according to Embodiment 3. FIG. It is the schematic of the gas monitoring system which concerns on Example 4. FIG. 10 is a schematic diagram of a gas monitoring system according to Embodiment 5. FIG. FIG. 10 is a schematic diagram of a gas monitoring system according to a sixth embodiment. It is the schematic of the gas monitoring apparatus which detects an organic halide.

Explanation of symbols

10-1 to 10-5 Gas monitoring system 11 Sample gas 13 Laser light 14 Laser irradiation device 20 Infrared ray 21-1 First detector 21-2 Second detector

Claims (9)

A gas monitoring system for a processing facility for monitoring a gas environment of a processing facility for processing hazardous substances,
Equipped with an exhaust gas monitoring device that measures the gas environment inside and outside the facility that treats harmful substances,
The exhaust gas monitoring device is a laser ionization time-of-flight mass spectrometer that continuously introduces a sample gas into a vacuum chamber, causes laser ionization with laser light, and detects ions,
Detect the presence or absence of oil in the sample gas,
When the oil content exceeds a threshold value, the analysis is stopped, the gas is monitored by switching to a backup device, or at least one of gas cleaning of the piping of the gas measurement line is executed. Gas monitoring system for processing equipment. In claim 1,
Detection of oil content in sample gas
A processing facility characterized in that the presence or absence of oil in a sample gas is determined from a peak caused by an internal standard gas detected by a laser ionization time-of-flight mass spectrometer and a peak of impurities derived from the oil. Gas monitoring system. In claim 2,
From the peak area (S ₁ ) derived from the internal standard gas and the peak area (S ₂ ) derived from the oil, the ratio is obtained from the following equation (1), and the threshold is set to 50. Gas monitoring system for processing equipment, characterized in that it is judged that there is a lot of oil.
S ₁ / (S ₁ + S ₂ ) × 100 (1) In claim 1,
Detection of oil content in sample gas
A gas monitoring system for a processing facility, which detects the presence or absence of an infrared absorption spectrum caused by a CH bond derived from an oil component in a sample gas introduced into a laser ionization time-of-flight mass spectrometer. In claim 4,
Detection of oil content in sample gas
A gas monitoring system for a processing facility, wherein an infrared absorption spectrum is detected by either infrared light or infrared laser light. A gas monitoring system for a processing facility for monitoring a gas environment of a processing facility for processing hazardous substances,
Equipped with an exhaust gas monitoring device that measures the gas environment inside and outside the facility that treats harmful substances,
The exhaust gas monitoring device is a laser ionization time-of-flight mass spectrometer that continuously introduces a sample gas into a vacuum chamber, causes laser ionization with laser light, and detects ions,
Detects the presence of dust in the sample gas or in the exhaust gas monitoring device,
If the amount of dust exceeds the threshold, at least one of whether to stop the analysis, switch to a backup device to monitor the gas, clean the gas measurement line piping, or replace the activated carbon in the piping Gas processing system for a processing facility, characterized by In claim 6,
Detection of the presence or absence of dust
A gas monitoring system for a processing facility, wherein an infrared absorption spectrum is detected by either infrared light or infrared laser light. In claim 7,
Detection of the presence of dust in the sample gas
A gas monitoring system for a processing facility, which detects Mie scattered light caused by dust. In any one of Claims 1 to 8,
A gas monitoring system for a processing facility, wherein the harmful substance is an organic halide.

Images