JP2009186519A - Method for manufacturing color filter - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter with satisfactory productivity by performing exposure without requiring high alignment accuracy of a pixel with a mask, and without using a large sized mask. <P>SOLUTION: A light-shielding part 4 is formed on a surface in the same direction as the thickness direction of a transparent substrate 2, and a photosensitive resin layer 5 including a photosensitive resin composition of a negative type is formed on the surface in the same direction as the thickness direction of the transparent substrate 2. A drawing machine 6 capable of selectively irradiating at least one pixel part 3 with light among a plurality of the pixel parts 3 formed with the same hue is scanned, and thereby the pixel parts 3 formed with the same hue are irradiated with light from the other surface in the thickness direction of the transparent substrate 2. The photosensitive resin layer 5 is then developed and the pixel parts 3 are formed. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a color filter. In particular, the present invention relates to a method for manufacturing a color filter for a display device such as an electrolytic emission display device, a fluorescent display device, a plasma display, and a liquid crystal display device.

  The color filter includes a transparent substrate and a color filter layer formed on the transparent substrate. In the color filter layer, a plurality of pixel portions that are respectively colored with different hues are formed side by side in a predetermined parallel direction, and a light shielding portion having a light shielding property is formed between the pixel portions. As a conventional technique for forming each pixel portion of the color filter, a photolithography method is used.

  The photolithographic method is employed when it is required to form a precise pattern of several μm to 100 μm, for example, in the production of flat displays such as liquid crystal displays and plasma displays, and electronic circuits. The photolithographic manufacturing procedure includes resist coating, exposure, and development processes, and the formation of the light-shielding portion (black matrix) may include an etching process as necessary, so that the patterning accuracy is good. However, there are many processes and there is a problem in productivity. Furthermore, the photolithography method has a problem that the equipment cost increases because a large exposure machine is required as the color filter becomes larger. Further, it is necessary to change the mask every time the color filter specification is changed. The mask is made of, for example, artificial quartz, and there is a limit in reducing manufacturing costs such as running costs. In addition, since most of the expensive photoresist is removed in the coating and developing processes, there is much room for improvement in terms of the utilization efficiency of raw materials.

  On the other hand, a method of directly drawing CAD data on a photosensitive resin film without using an expensive photomask, a so-called direct exposure (direct drawing) method has been proposed (see, for example, Patent Documents 1 and 2). The direct drawing method not only eliminates the need for an exposure machine, but also does not use an expensive photomask, so it can be expected not only to reduce manufacturing costs, but also to shorten line switching time and new product development time. Many benefits are expected.

  Since the pixel portion of the color filter is relatively low in accuracy as compared with the light shielding portion, the conventional technique has proposed a laser direct drawing method that scans and exposes a laser beam, but is required as a color filter. In order to realize the resolution, there is a problem that the drawing speed is slow.

  In addition, the pixel portion of the color filter has the same arrangement, and most of the color filters are arranged in a striped pattern, so a stepper method that uses a small mask instead of batch exposure to repeat exposure Was also considered. However, since high alignment accuracy and productivity between the small mask and the pixel portion are in a trade-off relationship, it is difficult to satisfy sufficient accuracy and productivity.

Japanese Patent Laid-Open No. 9-73171 JP-A-9-318809

  Accordingly, an object of the present invention is to provide a method for manufacturing a color filter with high productivity by performing exposure without using a large mask so that high alignment accuracy between a pixel and a mask is not required.

The present invention provides a color filter layer in which a plurality of pixel portions that are colored with different hues are formed side by side in a predetermined parallel direction, and a light shielding portion having a light shielding property is formed between the pixel portions. A method for producing a color filter on a transparent substrate,
A light shielding part forming step of forming a light shielding part on one surface in the thickness direction of the transparent substrate;
A photosensitive resin layer forming step of forming a photosensitive resin layer containing a negative photosensitive resin composition on one surface in the thickness direction of the transparent substrate;
The same hue is formed from the other surface in the thickness direction of the transparent substrate by scanning an irradiating means capable of selectively irradiating at least one pixel portion among a plurality of pixel portions in which the same hue is formed. An irradiation step of irradiating the pixel portion with light;
And a pixel part forming step of forming a pixel part by developing a photosensitive resin layer.

  According to the present invention, the light shielding portion and the photosensitive resin layer are formed on one surface in the thickness direction of the transparent substrate, and the photosensitive resin layer surrounded by the light shielding portion is formed by irradiating light from the other surface in the thickness direction. Can be exposed. In the irradiation step of irradiating the photosensitive resin layer with light, an irradiation unit capable of selectively irradiating at least one pixel portion among a plurality of pixel portions having the same hue is used. By scanning with such an irradiating means, it is possible to irradiate the region where the pixel portion is to be formed. This makes it possible to irradiate the pixel portion with light without requiring high alignment accuracy between the pixel and the mask as in the prior art and without using a large mask. Therefore, the manufacturing cost can be reduced.

  FIG. 1 is a flowchart showing a manufacturing procedure of a color filter 1 according to an embodiment of the present invention. The color filter 1 (see FIG. 6) includes a transparent substrate 2 that is a base material, and a color filter layer (not shown) formed on one surface in the thickness direction of the transparent substrate 2. The color filter 1 constitutes a part of a liquid crystal display device, for example.

  A plurality of pixel portions 3 and a light shielding portion 4 are formed in the color filter layer. A plurality of types of pixel units 3 are set. The pixel portions 3 for each type are colored with different hues. For example, the pixel unit 3 is divided into three groups having different hues. The pixel units 3 belonging to the first group are colored red (red: R). The pixel portions 3 belonging to the second group are colored green (green: G). The pixel portions 3 belonging to the third group are colored blue (blue: B). Each pixel unit 3 is arranged in a stripe shape, for example, along a predetermined parallel direction T.

  The light shielding unit 4 is a so-called black matrix and has a light shielding property. The light shielding portion (hereinafter also referred to as “black matrix”) 4 is formed between the pixel portions 3 and is formed in a lattice shape, for example. The transparent substrate 2 is light transmissive and is realized, for example, by a glass substrate. In the transparent substrate 2, a pixel formation region 11 (see FIG. 5) and a light shielding region are set. The pixel formation region 11 is a region where each pixel unit 3 is arranged in the color filter layer. Further, the light shielding region is a region in the filter layer where the light shielding portion 4 is disposed.

  At the same time as the light-shielding portion 4, marks for superimposing and pasting the pixel portions 3 and quality control may be formed. Further, a liquid crystal shutter (not shown) constituting the liquid crystal display device is formed at a predetermined position of each pixel unit 3 and is driven according to an electrical signal based on color information. Further, a transparent protective film (planarization film) layer (not shown) and a transparent conductive film layer (not shown) serving as a common electrode for driving liquid crystal are formed on the pixel portion 3 as necessary. Further, columnar spacers (not shown) for defining the liquid crystal cell gap and liquid crystal alignment regulating structures (not shown) for increasing the viewing angle of the liquid crystal panel are formed.

  The transparent protective film (flattening film) is applied over the black matrix 4 and the pixel portion 3 to fill the step in the thickness direction between the pixel portion 3 and the light-shielding portion 4 and provide smoothness suitable for the liquid crystal cell. At the same time, the elution of contaminants from the color filter 1 is prevented. The transparent protective film may be subjected to fine patterning according to the necessity of designing the liquid crystal cell.

  Below, the manufacturing method of the color filter 1 containing such a transparent substrate 2 and a color filter layer is demonstrated.

  First, in step a1, the light shielding part 4 having light shielding properties is formed on the transparent substrate 2 such as glass, and the process proceeds to step a2. As a method for forming the light-shielding portion 4, a method of applying a photosensitive black resin and then exposing and developing a predetermined pattern through a photomask and developing, and a photoresist pattern on the light-shielding resin film After forming by a known method, it is possible to adopt a method of etching the light-shielding resin film. A light blocking agent is added to the material forming the light blocking portion 4. Examples of the light-shielding agent include organic pigments such as carbon, aniline black, and perylene compounds, and inorganic pigments such as titanium black and magnetite. The black matrix 4 may be obtained by patterning a thin film in which a light-shielding thin film of metal such as chromium, molybdenum, and nickel and an antireflection film are combined. In addition to exposure using a photomask, a direct drawing machine that directly draws an exposure pattern may be used, or a light shielding resin may be formed by processing with a laser processing machine.

  As an apparatus for forming a light-shielding photosensitive resin film (photoresist) on the transparent substrate 2, for example, a resist film forming apparatus such as a spin coat apparatus, a spinless coat apparatus, a roll coat apparatus, a dry film resist laminating apparatus, or the like. Available. For example, in a spin coater, a solution of a photosensitive resin film is spin-coated on the transparent substrate 2 and dried. In the spinless coating apparatus, the photosensitive resin film solution may be applied onto the transparent substrate 2 from a nozzle precisely processed into a slit shape, dried, and heat-treated as necessary. The spinless coater is also called a slit coater.

  A predetermined pattern is printed on the dried light-sensitive photosensitive resin film using an exposure machine or various drawing apparatuses, and then development and thermosetting treatment are performed to form the light-shielding portion 4.

  The black matrix 4 demarcates the boundary between adjacent pixel portions 3 to prevent color mixing, and requires extremely high accuracy and uniformity. The shape of the black matrix 4 is generally a lattice or stripe.

  In step a2, a photosensitive resin layer 5 (see FIG. 3 and FIG. 4) containing a negative photosensitive resin that is a negative photosensitive resin composition is formed on one surface in the thickness direction of the transparent substrate 2. Move to a3. The negative photosensitive resin is one in which the irradiated portion of light is insolubilized in the developer and remains, and in general, a photopolymerizable compound, a binder polymer, a dispersant, a photopolymerization initiator, a colorant, a solvent, Are mixed with other additives as required. The specific composition of such a negative photosensitive resin will be described later.

  In step a3, the other surface in the thickness direction of the transparent substrate 2 is scanned by scanning a drawing machine 6 capable of selectively irradiating at least one pixel unit 3 among the plurality of pixel units 3 in which the same hue is formed. Then, light is irradiated to the pixel formation region 11 in which the same hue is formed, and the process proceeds to step a4. As a result, light is applied to the pixel formation region 11 in which the periphery of the photosensitive resin layer 5 formed in step a2 is covered with the light shielding portion 4. Therefore, the photosensitive resin layer 5 in the pixel formation region 11 is cured. A specific configuration of the drawing machine 6 will be described later.

  In step a4, the photosensitive resin layer 5 is developed to form the pixel portion 3. By developing, only the exposed portion of the negative colored photosensitive resin layer 5 remains as the pixel portion 3. Thus, the pixel portion 3 is formed so as to cover a predetermined opening formed in the black matrix 4. For example, when one pixel is formed by three-color stripes, the line width is about 1/3 of the pitch of one pixel.

  After forming the pixel portion belonging to the first group in this way, the type (color) of the photosensitive resin is changed, and the pixel portion belonging to the second group and the pixel portion belonging to the third group are sequentially formed.

  The color filter 1 formed in this way is formed by laminating a transparent flattening film and / or a transparent conductive film as a common electrode as necessary. Furthermore, as processing for improving the viewing angle characteristics, processing such as forming a bank for dividing the alignment direction of the liquid crystal on the transparent conductive film or forming a slit in the transparent conductive film itself is performed. .

  Further, columnar spacers for adjusting the cell gap of the liquid crystal are formed. The columnar spacer can be formed by overlapping the pattern of the light-shielding portion 4, the pixel portion 3, and the transparent flattening film. However, since it is necessary to manage the height accuracy and deformation characteristics very strictly, In general, a photosensitive resin layer is repeatedly applied and finished by photolithography.

  Next, the specific composition of the negative photosensitive resin composition used in step a2 will be described. As described above, the negative photosensitive resin generally contains a photopolymerizable compound, a binder polymer, a dispersant, a photopolymerization initiator, a colorant, a solvent, and other additives as necessary. Things are used.

  First, the photopolymerizable compound will be described. The photopolymerizable compound that can be used for forming the negative photosensitive resin of the present invention is a compound that can be polymerized by an active radical, an acid, or the like generated from a photopolymerization initiator by light irradiation, and includes a binder polymer described later. It can also be a crosslinking agent. For example, the compound which has a polymerizable carbon-carbon unsaturated bond is mentioned. The photopolymerizable compound may be a monofunctional compound having one polymerizable carbon-carbon unsaturated bond in the molecule, or a bifunctional compound having two or more polymerizable carbon-carbon unsaturated bonds or A trifunctional or higher polyfunctional compound may be used. Examples of the monofunctional photopolymerizable compound include nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acrylate, and N-vinyl pyrrolidone. Examples of the bifunctional photopolymerizable compound include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, and bisphenol A. Bis (acryloyloxyethyl) ether, and 3-methylpentanediol di (meth) acrylate. Examples of the tri- or higher functional photopolymerizable compound include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, and dipentaerythritol. Examples include hexa (meth) acrylate.

  A preferable photopolymerizable compound is dipentaerythritol hexa (meth) acrylate. The photopolymerizable compounds are used alone or in combination of two or more, but bifunctional or higher photopolymerizable compounds are preferably used. When two or more photopolymerizable compounds are used, at least one of them is used. It is preferable to use a bifunctional or higher photopolymerizable compound. The amount of the photopolymerizable compound used is usually 0.1 parts by mass or more and 70 parts by mass or less, preferably 1 part by mass or more and 60 parts by mass or less per 100 parts by mass of the total amount of the binder polymer and the photopolymerizable compound. .

  Next, the binder polymer will be described. A transparent resin is suitably used as the binder polymer. As the transparent resin, a colorant can be dispersed, and a resin that imparts a crosslinkable function to the colored pixel layer by light irradiation together with other components is used. As such a binder polymer, for example, in addition to resins obtained by polymerizing the monomers listed below alone or in combination of two or more, melamine acrylate resins, polyester resins, and the like can be used.

  Examples of the monomer constituting the binder polymer include aromatic vinyl compounds such as styrene, α-methylstyrene and vinyltoluene; methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxy Unsaturated carboxylic acid ester compounds such as ethyl (meth) acrylate and benzyl (meth) acrylate; Unsaturated carboxylic acid aminoalkyl ester compounds such as aminoethyl acrylate; Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth) acrylate; Acetic acid Carboxylic acid vinyl ester compounds such as vinyl and vinyl propionate; vinyl cyanide compounds such as (meth) acrylonitrile and α-chloroacrylonitrile; 3-methyl-3- (meth) acryloyloxymethyloxy Such as cetane, 3-ethyl-3- (meth) acryloyloxymethyl oxetane, 3-methyl-3- (meth) acryloyloxyethyl oxetane, 3-methyl-3- (meth) acryloyloxyethyl oxetane And saturated carboxylic acid oxetane ester compounds. Moreover, when combining 2 or more types of monomers into a copolymer, unsaturated carboxylic acid, such as acrylic acid and methacrylic acid, can also become a monomer which comprises binder resin.

  When a copolymer obtained by combining two or more kinds of monomers is used as a binder polymer, examples of such a copolymer include benzyl methacrylate / methacrylic acid copolymer, styrene / methacrylic acid copolymer, and 3-ethyl-3. -Methacryloyloxymethyl oxetane / benzyl methacrylate / methacrylic acid copolymer, 3-ethyl-3-methacryloyloxymethyl oxetane / methyl methacrylate / methacrylic acid copolymer, and 3-ethyl-3-methacryloyloxymethyl oxetane / Examples thereof include methyl methacrylate / methacrylic acid / styrene copolymer. In particular, those obtained by copolymerizing monomers having a carboxyl group such as acrylic acid and methacrylic acid are preferred, and benzyl methacrylate / methacrylic acid copolymers are particularly preferred. Content of the monomer unit which has a carboxyl group in the copolymer which comprises a binder polymer is 5 to 50% by mass fraction, Preferably it is 10 to 40%.

  The binder polymer preferably has a weight average molecular weight in the range of 5,000 to 400,000, more preferably in the range of 10,000 to 300,000 as determined by gel permeation chromatography (GPC) using polystyrene as a standard. . The binder polymer is generally used in a mass fraction of 5 to 90%, preferably 20 to 70%, based on the total solid content of the photosensitive resin composition.

  Next, the dispersant will be described. For example, surfactants such as a cationic dispersant, an anionic dispersant, a nonionic dispersant, an amphoteric dispersant, a silicone dispersant, and a fluorine dispersant can be used. Examples of the cationic dispersant include cationic resins having primary, secondary or tertiary amino groups. Examples of the anionic dispersant include a resin or a compound having a group such as carboxylate, sulfonate, and phosphate. Examples of the resin having a carboxylate group include polyacrylate and polystyrene-acrylate. The compound having polyoxyalkylene sulfonate, sodium salt of N-methyl-N-oleyl taurine, dodecylbenzene sulfonate, etc. are included, and the compound having a phosphate group includes polyoxyalkylene alkyl ether phosphorus. Acid salts and the like are included. Furthermore, examples of the nonionic dispersant include polyoxyethylene type and amide type, and polyoxyethylene type dispersants include polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, acetylene glycol, Polyoxyethylene glycol ester copolymers and the like are included, and amide type dispersants include polyoxyethylene fatty acid amides and the like. These dispersants may be used alone or in combination of two or more.

  Next, the photopolymerization initiator will be described. The photopolymerization initiator can be an active radical generator that generates an active radical when irradiated with light, such as an acetophenone compound, a benzoin compound, a benzophenone compound, a thioxanthone compound, and a triazine compound. Etc.

  Examples of acetophenone compounds include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 2-hydroxy-2-methyl-1- [4- (2-hydroxy Ethoxy) phenyl] propan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-2-morpholino-1- (4-methylthiophenyl) propan-1-one, 2-benzyl-2-dimethylamino-1- And oligomers of (4-morpholinophenyl) butan-1-one and 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propan-1-one. Examples of the benzoin compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether. Examples of the benzophenone compound include benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4′-methyldiphenyl sulfide, 3,3 ′, 4,4′-tetra (tert-butylperoxy). Carbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.

  Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone. Examples of the triazine compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4- Methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxy Styryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4 -Bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino- 2-Methylfe E) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine It is done.

  Examples of the active radical generator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2′- Biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, and titanocene compounds can also be used.

  A commercially available thing can also be used as an active radical generator. Examples of commercially available photopolymerization initiators include trade name “Irgacure-907” (acetophenone photopolymerization initiator, manufactured by Ciba Specialty Chemicals). These photopolymerization initiators can be used alone or in combination of two or more. The usage-amount of a photoinitiator is 1 to 30 mass parts normally with respect to 100 mass parts of total amounts of a binder polymer and a photopolymerizable compound, Preferably they are 3 to 20 mass parts.

  The photosensitive resin composition can also contain a photopolymerization initiation assistant in addition to the photopolymerizable compound and photopolymerization initiator as described above. The photopolymerization initiation assistant is a compound used in combination with the photopolymerization initiator to accelerate the polymerization of the photopolymerizable compound initiated by the photopolymerization initiator. Examples of the photopolymerization initiation assistant include amine compounds and alkoxyanthracene compounds. Examples of amine compounds include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-Ethylhexyl 4-dimethylaminobenzoate, N, N-dimethylparatoluidine, 4,4′-bis (dimethylamino) benzophenone (commonly known as Michler's ketone), 4,4′-bis (diethylamino) benzophenone, and 4,4 ′ -Bis (ethylmethylamino) benzophenone and the like. Examples of the alkoxyanthracene compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 2-ethyl-9,10-diethoxyanthracene. .

  Commercially available photopolymerization initiation assistants can also be used, and examples of commercially available photopolymerization initiation assistants include trade name “EAB-F” (Hodogaya Chemical Co., Ltd.). When the photopolymerization initiation assistant is used, the amount used is usually 10 mol or less, preferably 0.01 mol or more and 5 mol or less, per mol of the photopolymerization initiator. When the photopolymerization initiator and the photopolymerization initiation assistant are used, the total amount is usually 1 part by mass or more and 30 parts by mass or less, preferably 100 parts by mass of the total amount of the binder polymer and the photopolymerizable compound, preferably 3 parts by mass or more and 20 parts by mass or less.

  Next, the colorant will be described. As the colorant, dyes or pigments can be used. Organic and inorganic pigments can be used as the pigment, and specific examples include compounds classified as Pigment according to a color index (published by The Society of Dyers and Colorists).

  Next, the solvent will be described. Examples of the solvent include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether and ethylene glycol monobutyl ether; diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol diethylene ether. Diethylene glycol dialkyl ethers such as butyl ether; ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropylene Alkylene glycol alkyl ether acetates such as ether acetate, methoxybutyl acetate and methoxypentyl acetate; aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene; aromatic aliphatic ethers such as anisole, phenetole and methylanisole; acetone , Ketones such as 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol and glycerin Esters such as ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl lactate and methyl 2-hydroxyisobutyrate; rings such as γ-butyrolactone And the like. These solvents can be used alone or in combination of two or more, and the content of the solvent in the photosensitive resin composition is usually 20% by mass or more and 90% by mass or less, preferably 50% by mass or more. It is used so that it may become 85 mass% or less.

  Next, other additives will be described. Examples of other additives include fillers, polymer compounds other than binder polymers, surfactants, adhesion promoters, anti-aggregation agents, organic acids, and curing agents. Examples of the surfactant include nonionic surfactants, cationic surfactants, anionic surfactants, and amphoteric surfactants. Examples of the adhesion promoter include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, and N- (2-amino). Ethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyl Examples include trimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, and 3-mercaptopropyltrimethoxysilane.

  Moreover, in the manufacturing method of the color filter 1 of this Embodiment, it is preferable to form an oxygen barrier film. In order to form the oxygen blocking film, an oxygen blocking film forming apparatus is used. The oxygen blocking film forming apparatus is an apparatus that forms an oxygen blocking film on a substrate coated with a photosensitive resin. For example, known film forming apparatuses such as a spin coater, a spinless coater, a roll coater, and a dry film resist laminator can be used. In the case of a spin coater, the polymer solution of the oxygen barrier film is spin-coated on the substrate and dried. In the spinless coater, the solution of the photosensitive resin film is applied to the substrate from a nozzle precisely processed into a slit shape. May be applied to the substrate, dried, and heat-treated as necessary. Since the oxygen barrier film used here is thin, it is possible to select air drying or hot air drying.

  As the polymer aqueous solution for forming such an oxygen-blocking film, one having a low oxygen permeability and a high transparency with respect to exposure light, and being soluble in water or an aqueous solution can be suitably selected. Examples include alginate, methyl cellulose, hydroxyethyl cellulose, hydroxypropyl methyl cellulose, ethyl hydroxyethyl cellulose, carboxymethyl cellulose, polyvinyl alcohol, acrylate, polyethylene oxide, polyvinyl ether, starch, polyvinyl pyrrolidone and the like. Further, two or more of these water-soluble polymers can be mixed and used. Particularly preferably, polyvinyl alcohol is used alone or mixed with another water-soluble polymer. More preferably, it is good to use 0.2-3 mass% polyvinyl alcohol aqueous solution. It is also effective to add a surfactant to the water-soluble polymer solution for forming the oxygen-blocking film, if necessary, in order to adjust the coating property to the photosensitive resin film.

  In the back exposure, it is difficult to crosslink the vicinity of the surface of the photosensitive transparent colored resin. On the other hand, by forming a transparent resin film having a thickness of 0.01 to 10 μm as an oxygen blocking film, the film characteristics near the surface can be greatly improved. Considering removal of the oxygen barrier film after exposure, a thin film having a thickness of 0.01 μm to 1 μm is preferable.

  Next, the drawing machine 6 will be described. FIG. 2 is a plan view showing the manufacturing procedure of the color filter 1. FIG. 3 is a front view showing the drawing machine 6. FIG. 4 is a side view showing the drawing machine 6. FIG. 5 is a plan view showing the color filter 1 in a state where the pixel portion 3 having one hue is formed. FIG. 6 is a plan view showing the color filter 1 in a state where the pixel portions 3 having three hues are formed. The drawing machine 6 includes a light source 7, a light source photomask (hereinafter also referred to as “mask”) 8, a substrate stage 9, an alignment mechanism (not shown), and a transport mechanism (not shown). .

  In the drawing machine 6, a through-hole 10 having translucency extending in a stripe direction T that is an arrangement direction T of the color filters 1 is formed on the surface side of the transparent substrate 2 where the black matrix 4 is not formed. A light source 7 that has a light shielding property and is smaller than the size of the color filter 1 and a light source 7 that is not larger than the size of the mask 8 and that can irradiate the through hole 10 of the mask 8 with light. Arranged in this order, the mask 8 and the light source 7 and the transparent substrate 2 are exposed over the entire length direction T of the stripe while moving relative to the stripe direction T of the color filter 1.

  The light source 7 is disposed on the other side in the thickness direction of the transparent substrate 2, that is, on the side opposite to the surface portion on which the photosensitive resin layer 5 is formed. The light source 7 may be any light source / optical system that can emit light in a wavelength region that can be exposed to the photosensitive resin and that can be blinked for 10 msec or less. The light source 7 can be preferably used by combining various lasers such as a high-pressure mercury lamp, a xenon lamp, a semiconductor laser and a YAG laser, and a combination of these high harmonic wave light sources and a shutter mechanism. The light source 7 is arranged so that light is incident on the transparent substrate 2 with respect to an irradiation region predetermined by the irradiation region via the mask 8.

  The mask 8 is a light-shielding plate-like member, and a through hole 10 corresponding to the shape of the pixel portion 3 is formed. In the present embodiment, as shown in FIG. 2, the mask 8 is formed at a position corresponding to two pixel portions 3 in which two through holes 10 are formed and the same hue is formed. The light from the light source 7 is applied to the transparent substrate 2 through the through hole 10. As the mask 8, for example, a quartz glass or soda glass having a predetermined pattern formed by metal etching or the like is used. The size of the mask 8 is selected so as to be smaller than the transparent substrate 2 and larger than one pixel portion 3. The optimum size of the mask 8 can be selected from the number of drawing heads, the exposure area, the processing time, etc. The width dimension of the mask 8 in the scanning direction T, that is, the opening width L1 is the same as that of the pixel unit 3. Although it may be larger than the dimension L2 in the scanning direction T, it is preferable not to make it too large. Specifically, it is preferably 5 mm or less with respect to the relative movement direction T between the transparent substrate 2 and the mask 8 and up to the dimension L2 in the scanning direction T of the pixel unit 3. If the opening width L1 of the mask 8 is 5 mm or more, the photosensitive resin layer 5 outside the black matrix frame is irradiated with leakage light, and as a result, the photosensitive resin layer 5 in unnecessary areas remains. It is not preferable.

  The mask 8 is set so that the light reaching the photosensitive resin layer 5 from the transparent substrate 2 side through the mask 8 always has a positional relationship covering the predetermined black matrix opening. Further, the horizontal width of the mask 8 reflects the layout of the color filter 1 on the glass substrate, and may correspond to the mask layout of the entire glass substrate. The mask 8 divided into a plurality is exchanged for each scan. May be exposed. Further, the pixel pitch may be adjusted, and a mask shutter mechanism may be combined in the horizontal width direction corresponding to the layout and the scanning position.

  The substrate stage 9 is mounted with a mask 8 and a light source 7. The substrate stage 9 is equipped with a tilt correction mechanism for the mask 8, a moving mechanism for scanning the entire transparent substrate 2, and an alignment mechanism.

  The alignment mechanism positions the substrate stage 9 at a desired position. In the present invention, it is not necessary to strictly align the transparent substrate 2 and the mask 8, and for example, a positional accuracy of about 1/4 of the line width of the black matrix 4 is sufficient. Therefore, it is sufficient to adjust the position and inclination between the transparent substrate 2 and the substrate stage 9 when the transparent substrate 2 is mounted.

  The transport mechanism moves the transparent substrate 2 relative to the mask 8. The transport mechanism has a mechanism that allows the substrate stage 9 and the transparent substrate 2 to move smoothly at a constant speed, and preferably has a roller transport mechanism or an air floating mechanism, for example.

  Such a drawing machine 6 is moved in the scanning direction T so as to irradiate the exposure area A shown in FIG. 2, and by repeating this twice, as shown in FIG. 5, only the pixel portion 3 of one hue is obtained. Can be exposed. By repeating such work twice, the pixel portions 3 can be formed in all the pixel formation regions 11 as shown in FIG.

  Hereinafter, examples will be given to specifically describe the color filter 1 manufactured by the method for manufacturing the color filter 1 of the present invention, but the present invention is not limited to the following description.

First, the first embodiment will be described. Black matrix 4 (film thickness: 1.2 μm, line width: 18.3) using photosensitive black resin (V259-BKIS66, manufactured by Nippon Steel Chemical Co., Ltd.) on transparent substrate 2 (Corning 1737, 0.63 mm thickness). 5 μm and a pixel pitch of 237 μm (total of RGB)) were formed. A photosensitive transparent red resin (NF-R655, manufactured by Sumitomo Chemical Co., Ltd.) is applied on the black matrix 4, prebaked at 60 ° C. for 120 seconds, exposed from the back side through a predetermined mask 8, and further developed. A heat treatment was performed. The illuminance of the light source 7 was 60 mJ / cm ² , the opening of the mask 8 was 5 mm × 68.5 μm, and the substrate transfer speed was 1.4 mm / second (integrated exposure was 200 mJ / cm ² ).

  Similarly, a photosensitive transparent green resin (MX-G551, manufactured by Sumitomo Chemical Co., Ltd.) and a photosensitive transparent blue resin (NF-B016M2, manufactured by Sumitomo Chemical Co., Ltd.) are applied, and exposure, development, and heat treatment are performed. A color filter 1 was produced.

  Table 1 shows the specifications of the produced color filter 1. In Table 1, x, y, and Y mean chromaticity in the CIE color system, and Ra means centerline average roughness. X, y, Y and Ra appearing in Table 2 below have the same meaning.

  As shown in Table 1, it was confirmed that the pixel portion 3 having a desired color and surface roughness was filled in the opening portion of the black matrix 4 in a self-aligned state.

Next, the second embodiment will be described. Prior to exposure of the transparent colored resin, an oxygen blocking film was formed on the transparent colored resin layer with a thickness of 0.05 μm, and the substrate transport speed was 15 mm / second (integrated exposure 20 mJ / cm ² ), Exposure was performed in the same manner as in the first embodiment, and a color filter 1 was manufactured as a prototype. The oxygen barrier film was formed by applying and drying a 1% by mass aqueous solution of polyvinyl alcohol (Kuraray Poval 205, manufactured by Kuraray Co., Ltd.). Table 2 shows the specifications of the produced color filter 1.

  As shown in Table 2, it was confirmed that the pixel portion 3 having a desired color and surface roughness was filled in the opening portion of the black matrix 4 in a self-aligned state. In addition, as a result of setting the mask opening width to 5 mm or less, in most color filter designs, the pixel portion 3 could be manufactured without being out of the black matrix frame.

  As described above, as a result of intensive studies on the problems of the prior art, the inventors have made a blinking response to the photosensitive resin layer 5 present in a predetermined opening on the black matrix 4. By exposing the slit-like light source 7 through the black matrix 4 and the mask 8 and moving the light source 7 and the mask 8 relative to the substrate for exposure, there is no unevenness, and the pixel unit 3 It has been found that it is possible to form a pattern with no image remaining in between.

  According to such an exposure method of the present invention, it is possible to manufacture an inexpensive and high-quality color filter 1 without using a large-scale and high-precision exposure apparatus or photomask as in the conventional method.

  In the present embodiment, the drawing machine is configured to limit the irradiation area with a mask. However, the drawing machine is not limited to such a configuration, and the drawing machine is configured to scan a point light source. You may comprise so that it may have a predetermined irradiation area | region. In other words, the drawing machine may be configured to irradiate a predetermined irradiation area.

It is a flowchart which shows the manufacture procedure of the color filter 1 of one Embodiment of this invention. 3 is a plan view showing a manufacturing procedure of the color filter 1. FIG. 2 is a front view showing a drawing machine 6. FIG. 2 is a side view showing a drawing machine 6. FIG. It is a top view which shows the color filter 1 of the state which formed the pixel part 3 of one hue. It is a top view which shows the color filter 1 of the state which formed the pixel part 3 of three hues.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Color filter 2 Transparent substrate 3 Pixel part 4 Light-shielding part 5 Photosensitive resin layer 6 Drawing machine

Claims (3)

A plurality of pixel portions colored with different hues are formed side by side in a predetermined parallel direction, and a light-shielding portion having a light-shielding property is formed between the pixel portions on a transparent substrate. A color filter manufacturing method for forming
A light shielding part forming step of forming a light shielding part on one surface in the thickness direction of the transparent substrate;
A photosensitive resin layer forming step of forming a photosensitive resin layer containing a negative photosensitive resin composition on one surface in the thickness direction of the transparent substrate;
The same hue is formed from the other surface in the thickness direction of the transparent substrate by scanning an irradiating means capable of selectively irradiating at least one pixel portion among a plurality of pixel portions in which the same hue is formed. An irradiation step of irradiating the pixel portion with light;
And a pixel portion forming step of forming a pixel portion by developing a photosensitive resin layer.   The color filter manufacturing method according to claim 1, wherein, in the irradiation step, the irradiation unit irradiates a pixel portion whose periphery is covered with a light shielding portion.   3. The color filter according to claim 1, wherein in the irradiation step, the irradiation unit is scanned in a predetermined scanning direction, and a dimension of the irradiation region in the scanning direction is smaller than a dimension of the pixel portion in the scanning direction. Production method.

Images