JP2009144186A - Target member for sputtering, and manufacturing method therefor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a target member that facilitates its swelled part to be easily and accurately positioned, and does not make a portion at which the target member is positioned roughened even when a hole is formed in a member to be sputtered. <P>SOLUTION: The target member 1 for sputtering includes a target 2 to be sputtered having a projecting part 2A formed on the rear surface, and a retaining member 3 for the target 2 having a recessed part 3A which is engaged with the projecting part 2A. The method for manufacturing the target member 1 for sputtering includes the steps of: making the projecting part 2A of the target 2 to be sputtered having the projecting part 2A engage with the recessed part of the retaining member 3 for the target 2 having the recessed part 3A; and making the target 2 pressure-contact the retaining member. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a sputtering target member and a manufacturing method thereof.

  2. Description of the Related Art Conventionally, there has been proposed a technique for effectively using a target and reducing the number of replacements of the target by increasing the thickness of a heavily consumed part among magnetron sputtering targets (see Patent Document 1). This Patent Document 1 discloses a target in which a sputtered side or a portion on the opposite side is expanded.

Japanese Patent Laid-Open No. 9-111445

  Among the targets described in Patent Document 1, a target in which a portion to be sputtered is inflated may be difficult to accurately position the inflated portion to a position where the exhaustion is severe when installed in a sputtering apparatus. . In particular, the target inflated on the side opposite to the side to be sputtered becomes difficult because the swelled portion cannot normally be visually observed during installation. In addition, in the case of a target in which the sputtered side and the opposite side part are inflated, there is a problem that if the control of the amount to be inflated and the time to sputter are mistaken, the target will be perforated and the installation part where the target will be placed will be roughened. Arise.

  Therefore, the problem of the present invention is that it is easy to accurately position the inflated part, and even if a hole is formed in the sputtered member, the part where the target member of the sputtering apparatus is installed is not damaged. It is possible to provide a sputtering target member that can be provided.

  In order to solve the above problems, the sputtering target member of the present invention includes a sputtering target having a convex portion on the back surface, and a target holding member having a concave portion into which the convex portion is fitted.

  According to the sputtering target member of the present invention, it is possible to effectively utilize the target and reduce the number of times of target replacement by positioning the convex portion (the inflated portion) at the site where the target is heavily consumed. A holding member called a backing plate or the like has a concave portion and is fitted with the convex portion of the target, and the holding member is fixed at a specific position of the sputtering apparatus, so that the target installation position is accurately aligned. . Further, even if a hole is formed in the target due to excessive sputtering, only the holding member is damaged, and the installation portion on which the target is placed is not roughened.

  In the sputtering target member according to another invention, in addition to the above-described invention, the surface opposite to the surface on which the convex portion of the target is formed has a planar shape. By adopting this configuration, when a target is installed in an existing sputtering apparatus, the target surface that is normally sputtered is a flat surface, so that the sputtering apparatus remains in the conventional sputtering condition without considering the presence of convex portions. Can be used.

  In the sputtering target member according to another invention, in addition to the above-described invention, a second convex portion is formed at a position corresponding to the convex portion on the surface opposite to the surface on which the convex portion of the target is formed. Has been. By adopting this configuration, the thickness of the convex portion can be increased, so that the life of the target can be further extended.

  In addition to the above-described invention, the sputtering target member according to another invention has a trapezoidal cross-sectional shape. By adopting this configuration, the convex portion can be easily processed.

  In the sputtering target member according to another invention, in addition to the above-described invention, the back surface of the holding member opposite to the surface on which the recess is formed has a planar shape. By adopting this configuration, when the sputtering target member is installed in the sputtering apparatus, the installation becomes easy.

  In order to solve the above problems, a method for producing a sputtering target member of the present invention includes a step of fitting a convex portion of a sputtering target having a convex portion into a concave portion of a holding member having a concave portion, and a target. And a step of press-contacting with the holding member.

  According to the sputtering target member manufactured according to the present invention, it is possible to effectively use the target and reduce the number of times the target is replaced by positioning the convex portion at a site where the target is consumed rapidly. A holding member called a backing plate or the like has a step in which the holding member has a concave portion and is fitted to the convex portion of the target, and the holding member is fixed at a specific position of the sputtering apparatus. Alignment is made. And a target and a holding member are press-contacted by the process made to press-contact, and both are joined and integrated. In addition, bubbles in the target are pushed out by this pressure contact process. Further, since the holding member is disposed below the target, even if a hole is formed in the target due to excessive sputtering, only the holding member is damaged, and the installation portion on which the target is placed is not roughened.

  In the sputtering target member manufacturing method according to another invention, in addition to the above-described invention, the step of fitting and the step of pressing are performed simultaneously or continuously. By adopting this method, the sputtering target member can be manufactured quickly or easily.

  In the present invention, it is easy to accurately position the swollen portion, and the sputtering target that can prevent the portion where the target member is installed from being sputtered even if a hole is formed in the sputtered member. A member can be provided.

  Hereinafter, a sputtering target member 1 according to an embodiment of the present invention will be described with reference to the drawings.

(Configuration of sputtering target member 1)
FIG. 1A is a longitudinal sectional view showing an outline of a main part of the sputtering target member 1. FIG. 1B shows a plan view of the sputtering target member 1. Note that FIG. 1A is a cross-sectional view taken along the line AA in FIG. As shown in FIG. 1A, a target 2 made of a gold (Au) disk-like plate is arranged on the upper side of the sputtering target member 1, and a holding made of a copper disk-like plate on the lower side. A member 3 is disposed, and a fixing member 4 made of an aluminum foil is disposed between the target 2 and the holding member 3. Note that the diameters of the disk-shaped plates of the target 2 and the holding member 3 are equal.

  The target 2 has an annular convex portion 2A that protrudes from the lower surface thereof toward the holding member 3. The convex portion 2A has a trapezoidal cross-sectional shape. The holding member 3 has a concave portion 3 </ b> A having a shape that fits in close contact with the entire convex portion 2 </ b> A via the fixing member 4. Further, the entire area of the lower surface of the target 2 (including a part other than the convex part 2 </ b> A) and the entire area of the upper surface of the holding member 3 (including a part other than the concave part 3 </ b> A) are firmly fixed via the fixing member 4. As a result, the fixing member 4 has a shape along the entire area of the lower surface of the target 2 and the entire area of the upper surface of the holding member 3. Further, the entire area of the upper surface of the target 2 and the entire area of the lower surface (back surface) of the holding member 3 are both flat.

(State after use of sputtering target member 1)
FIG. 2 shows a state after the sputtering target member 1 is used for magnetron sputtering. FIG. 2A is a longitudinal sectional view showing an outline of a main part of the sputtering target member 1 after use. FIG. 2B shows a plan view of the sputtering target member 1 after use. Note that FIG. 2A is a cross-sectional view taken along line BB in FIG.

  In the magnetron sputtering method, since the material of the target 2 is ionized by the magnetic force, the location of the target 2 where the magnetic field is generated is consumed intensively, and the other locations are hardly consumed. Therefore, the convex portion 2A is positioned in a place where it is easily consumed in advance. That is, the magnetic field generator is arranged in a circular shape similar to the convex portion 2A below the portion where the sputtering target member 1 is installed. In the embodiment of the present invention, the target 2 is consumed from the upper surface of the target 2 toward the convex portion 2A, and the consumption portion 5 is formed in an annular shape. The consumption unit 5 has a trapezoidal shape with a rounded cross section.

(Manufacturing method of sputtering target member 1)
In FIG. 3, the figure which shows the outline of the manufacturing method of the target member 1 for sputtering is shown. First, the target 2 having the convex portion 2A is manufactured from a gold plate by cutting, and the holding member 3 having the concave portion 3A is manufactured from a copper plate. Then, as shown to FIG. 3 (A), the surface where the convex part 2A of the target 2 exists, and the surface where the concave part 3A of the holding member 3 exists are made to oppose, and the aluminum foil which is the adhering member 4 is arrange | positioned among them. . Thereafter, the target 2 and the holding member 3 are moved in the direction of the arrow shown in FIG. 3A so that the convex portion 2A is fitted into the concave portion 3A. During the movement, the fixing member 4 is deformed along the shapes of the convex portions A2 and the concave portions 3A. As the movement proceeds, the convex portion 2A is fitted into the concave portion 3A. The above is the fitting process for fitting.

  Then, even after the convex portion 2A is completely fitted into the concave portion 3A via the fixing member 4 and the fitting step is finished, the target 2 and the holding member 3 are further moved in the direction of the arrow shown in FIG. The process of press-contacting is continued. Then, the target 2 and the fixing member 4, and the holding member 3 and the fixing member 4 are joined together. As a result, the sputtering target member 1 shown in FIG. In this manufacturing method, the fitting process and the press-contacting process for press-contacting are performed simultaneously.

(Main effects obtained by the embodiment of the present invention)
Since the target 2 according to the embodiment of the present invention has the convex portion 2A downward, the thickness of the target 2 in the portion of the convex portion 2A is increased, and the position of the consumption portion 5 is set to the position of the convex portion 2A. By matching, the life of the target 2 can be extended. Further, since the convex portion 2A is fitted in the concave portion 3A, the work of adjusting the positional relationship between the target 2 and the holding member 3 becomes easy.

  Further, since the entire area of the lower surface of the target 2 and the entire area of the upper surface of the holding member 3 are fixed, even if the target 2 is excessively consumed and a hole is formed in the target 2, the target 2 is damaged. Can remain in the holding member 3 and suppress damage to other members constituting the sputtering apparatus.

  Moreover, since the target 2 has the convex part 2A, the part of the target 2 other than the convex part 2A can be thinned. Therefore, the portion of the target 2 that has not been consumed can be reduced, the amount of the material of the target 2 that is normally subjected to recycling can be reduced, and the recycling effort can be reduced. As shown in FIG. 1 (B), the recycling effort can be achieved by making the outer shape of the target 2 a shape along the outer diameter of the convex portion 2A, thereby reducing the proportion occupied by the portion that has not been consumed. Can be reduced. Even if the portion of the target 2 other than the convex portion 2A is thinned, the holding member 3 can support the target 2, and thus problems such as a decrease in strength of the target 2 can be solved.

  Furthermore, when replacing the target 2, the target 2 can be removed from the holding member 3, and the holding member 3 can be reused and effectively used. In addition, since the upper surface of the target 2 has a planar shape, when the sputtering target member 1 is installed in an existing sputtering apparatus, the sputtering apparatus can be used under the same or approximate conditions as the conventional sputtering conditions. Become.

  In addition, by making the cross-sectional shape of the convex portion 2A of the target 2 trapezoidal, the cutting process becomes easier as compared with a shape having a round cross-sectional shape. Further, since the section of the consumption unit 5 is consumed in a trapezoidal shape, the amount of the material of the target 2 to be recycled as described above can be reduced by making the sectional shape of the convex portion 2A of the target 2 trapezoidal. Can be reduced.

  In addition, since there is a convex portion 2A on the lower surface of the target 2, there is a possibility that the installation of the target 2 to the sputtering apparatus may be difficult, and the lower surface (back surface) of the holding member 3 is a planar shape. The sputtering target member 1 can be easily installed in the sputtering apparatus.

  Since the manufacturing method of the sputtering target member 1 according to the embodiment of the present invention includes a pressure contact process, the adhesion between the target 2 and the holding member 3 can be improved. Moreover, by having a press-contact process, the bubble which the fixing member 4, the target 2, or the holding member 3 may contain can be removed, and the ejection of the gas (impurity) from the bubble resulting from the heating at the time of sputtering Can be suppressed. Furthermore, since the fitting process and the press-contacting process are performed simultaneously, the sputtering target member 1 can be manufactured quickly.

(Other forms)
The sputtering target member 1 according to the embodiment of the present invention has been described above, but various modifications can be made without departing from the gist of the present invention. For example, as shown in FIG. 4A, the fixing member 4 is not an essential component and can be omitted. In the case of such omission, for example, the target 2 and the holding member 3 can be brought into pressure contact with each other to realize integration of both. Alternatively, the target 2 and the holding member 3 can be integrated on the holding member 3 without integrating the target 2 and the holding member 3.

  FIG. 4 is a vertical cross-sectional view of sputtering target members 1A, 1B, and 1C, which are modifications of the sputtering target member 1 according to the embodiment of the present invention, respectively (A), (B), and (C). It is a figure shown, and the same code | symbol is attached | subjected to the component similar to the component of the target member 1 for sputtering, and the detailed description of the component is abbreviate | omitted.

  Further, even when the fixing member 4 is used, the material is not limited to the aluminum foil. For example, the material can be another metal foil such as copper foil, a metal bonding member using indium or the like (for example, a paste containing indium powder), a resin adhesive, or the like. As the resin-based adhesive, an epoxy-based or polyimide-based adhesive can be used. When a resin adhesive is used as the fixing member, when the target 2 is replaced, the adhesive force is weakened by heating or the like, and the replacement operation can be easily performed. Moreover, since polyimide resin is excellent in heat resistance, it can respond to the case where the target 2 becomes excessively hot during the sputtering operation, and is suitable as a constituent material of the fixing member. In addition, as a fixing method, a method of fixing the target 2 and the holding member 3 through screws from the back side of the holding member 3 to the target 2 can be adopted.

  Further, the target 2 according to the embodiment of the present invention uses a disc-shaped target made of gold, but the material and shape thereof can be appropriately changed according to the structure of the sputtering apparatus, the sputtering conditions, and the like. For example, the material of the target 2 can be silver, nickel, other metals or alloys. Moreover, although the external shape of the target 2 is circular, it can be a ring, an elliptical ring, a square, a rectangle, an ellipse, or the like. Further, the upper surface of the target 2 is not limited to a planar shape, and may be a shape having a second convex portion 2B as shown in FIG. 4B, for example.

  Further, the convex portion 2 </ b> A constituting a part of the target 2 has a trapezoidal cross-sectional shape and is formed in an annular shape on the lower surface of the target 2. The shape of the convex portion 2A can be changed as appropriate. For example, the convex portion may have an elliptical shape instead of an annular continuous shape, or a shape provided with a portion that is not partially continuous. Further, as shown in FIG. 4B, the second convex portion 2B is formed on the surface of the target 2 ′ on the opposite side to the convex portion 2A, at a position corresponding to the convex portion 2A. Further, it may be provided. By providing the second convex portion 2B in this manner, the life of the target 2 'can be extended, which is preferable. The shape of the second convex portion 2B can be changed as appropriate similarly to the convex portion 2.

  Furthermore, as shown in FIG. 4C, the convex portion can be a convex portion 2C having a semicircular cross-sectional shape. By rounding the tip of the convex portion like the convex portion 2C, the labor of recycling can be further reduced. The reason is that each target including the target 2 ″ is consumed such that the bottom surface is rounded as shown in FIG. 2 (A), and the consuming part 5 is formed. Therefore, as shown in FIG. 4 (C). This is because the target 2 ″ having a simple shape can reduce the portion of the target 2 ″ that is recycled and not consumed. Further, the convex portion may be a trapezoid having a round cross-sectional shape. The convex portion may have a semi-elliptical cross section, a parallelogram, a rectangle, a triangle, a rounded parallelogram, a rounded rectangle, a rounded triangle, or the like.

  In addition, it is preferable that convex parts, such as convex part 2A, 2B, 2C, are provided along the external shape of the target like the target 2. FIG. This is because the proportion of the target that is not consumed can be reduced, and the burden of recycling can be further reduced. Further, the convex portion 2A is formed in an annular shape, but the convex portion is provided in a portion where the amount of consumption is large, and the shape thereof may be formed as a circle, an ellipse, an elliptical ring, a rectangle, a track shape, or the like. it can.

  Moreover, although the holding member 3 which concerns on embodiment of this invention uses what consists of a copper disk-shaped board, the material and shape change suitably according to the structure of sputtering apparatus, sputtering conditions, etc. it can. For example, the material of the holding member 3 can be stainless steel, aluminum, other metals, or the like. Moreover, the shape of the holding member 3 can be a square, a rectangle, an ellipse, a track shape, or the like. Further, the lower surface of the holding member 3 is not limited to a planar shape, and may have a different shape.

  Further, the diameters of the disk-shaped plates of the target 2 and the holding member 3 are the same, but may be different. For example, the diameter of the plate of the holding member 3 may be larger than the diameter of the plate of the target 2, and only the end of the holding member 3 may be fixed to the sputtering apparatus. By doing so, the edge part of the target 2 cannot be used for fixation to a sputtering device, and the utilization efficiency of the target 2 can be further increased.

  Furthermore, although the entire surface of the surface where the convex portion 2A of the target 2 is present and the surface where the concave portion 3A of the holding member 3 is present are fixed by the fixing member 4, there may be a portion which is not partially fixed. Further, the target 2 and the holding member 3 are manufactured by cutting, but may be manufactured by casting, forging, or the like.

  In the manufacturing method of the sputtering target member 1 according to the embodiment of the present invention, the step of fitting and the step of pressing are performed at the same time. However, these steps may be performed continuously. For example, after the step of fitting, a step of pressing for a predetermined time may be performed. Since the sputtering target member 1 is manufactured in such a continuous operation, the sputtering target member 1 is easily manufactured by this manufacturing method.

  In the manufacturing method of the sputtering target member 1 according to the embodiment of the present invention, both the target 2 and the holding member 3 are moved in the step of fitting and the step of pressing, but either one is fixed, The other may be moved.

It is a figure which shows the outline | summary of a structure of the sputtering target member which concerns on embodiment of this invention, (A) is AA sectional drawing of (B), (B) is a top view. It is a figure which shows the outline | summary of the state after use of the sputtering target member which concerns on embodiment of this invention, (A) is AA sectional drawing of (B), (B) is a top view. It is a figure which shows the outline | summary of the manufacturing process of the sputtering target member which concerns on embodiment of this invention, (A) is a figure which shows the previous step of a pressurization process, (B) is a figure which shows the state of a pressurization process. . It is a longitudinal cross-sectional view which shows the outline | summary of the modification of the sputtering target member which concerns on embodiment of this invention, (A) abbreviate | omitted the fixing member, (B) is a response | compatibility of the target surface on the opposite side of a convex part. (C) shows a cross-sectional shape of the convex portion and the concave portion formed as a semicircle.

Explanation of symbols

1, 1A, 1B, 1C Sputtering target member 2, 2 ', 2 "Target 2A, 2C Convex part 2B Second convex part 3 Holding member 3A, 3B Concave part

Claims (7)

A sputtering target having a convex portion on the back surface;
A sputtering target member, comprising: a target holding member having a concave portion into which the convex portion is fitted.   The sputtering target member according to claim 1, wherein a surface of the target that is opposite to a surface on which the convex portion is formed has a planar shape.   2. The sputtering method according to claim 1, wherein a second convex portion is formed at a position corresponding to the convex portion on a surface opposite to a surface on which the convex portion is formed of the target. Target material.   4. The sputtering target member according to claim 1, wherein the convex portion has a trapezoidal cross-sectional shape.   5. The sputtering target member according to claim 1, wherein a back surface of the holding member opposite to a surface on which the concave portion is formed has a planar shape. A step of fitting the convex portion of the sputtering target having the convex portion with the concave portion of the holding member of the target having the concave portion;
And a step of bringing the target into pressure contact with the holding member.   The method for producing a sputtering target member according to claim 6, wherein the step of fitting and the step of pressing are performed simultaneously or sequentially.

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