JP2009123362A - Organic el light emitting element - Google Patents

Organic el light emitting element Download PDF

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JP2009123362A
JP2009123362A JP2007293051A JP2007293051A JP2009123362A JP 2009123362 A JP2009123362 A JP 2009123362A JP 2007293051 A JP2007293051 A JP 2007293051A JP 2007293051 A JP2007293051 A JP 2007293051A JP 2009123362 A JP2009123362 A JP 2009123362A
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metal film
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JP5130024B2 (en
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Noriyuki Shimoji
規之 下地
Takashi Osako
崇 大迫
Makoto Takamura
誠 高村
Gosuke Sakamoto
豪介 坂元
Masaki Maeda
将規 前田
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Rohm Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic EL light-emitting element with high gas barrier properties or sealing characteristics of metal electrodes (4, 5) covering an organic EL film 3. <P>SOLUTION: The organic EL light-emitting element includes a transparent substrate 1, a transparent first electrode 2 formed on a main surface of the substrate 1, an organic EL film 3 formed on the first electrode 2 emitting light by exciton generated by recombination with a hole and an electron injected into an organic compound, and second electrodes (4, 5) formed so as to cover a surface of the organic EL film 3. The second electrodes (4, 5) are provided with a first metal film 4 formed on the organic EL film 3 and a second metal film 5 formed on the first metal film 4. The second metal film 5 is an amorphous or a microcrystal metal film with less possibility that a grain boundary continues or penetrates on a surface and a rear face of the film as compared with a polycrystalline structure. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、有機化合物のエレクトロルミネッセンス(EL)を利用する有機EL発光素子に関する。   The present invention relates to an organic EL light emitting device utilizing electroluminescence (EL) of an organic compound.

有機EL発光素子はガラス基板上に形成され、有機EL膜を陽極及び陰極で挟んで構成されている。陽極及び陰極により印加された電界により有機化合物中に電子と正孔が注入され、電子と正孔の再結合により生じた励起子によって有機EL膜は発光する。ガラス基板側に位置する陽極或いは陰極は透明電極からなり、有機EL膜の光は透明電極及びガラス基板を透過して外部に放出される。透明電極に対向する側の電極はアルミニウム等の金属電極からなる。   The organic EL light emitting element is formed on a glass substrate and is configured by sandwiching an organic EL film between an anode and a cathode. Electrons and holes are injected into the organic compound by the electric field applied by the anode and the cathode, and the organic EL film emits light by excitons generated by recombination of the electrons and holes. The anode or cathode located on the glass substrate side is made of a transparent electrode, and the light of the organic EL film is transmitted to the outside through the transparent electrode and the glass substrate. The electrode on the side facing the transparent electrode is made of a metal electrode such as aluminum.

有機EL膜は空気中の酸素や水分によって劣化し易い為、従来から有機EL膜を外部環境から遮断する様々な方法が考案されている(例えば、特許文献1参照)。   Since the organic EL film is easily deteriorated by oxygen and moisture in the air, various methods for blocking the organic EL film from the external environment have been conventionally devised (for example, see Patent Document 1).

第1の方法では、ガラスや金属管をUV硬化樹脂で接着して形成された筐体内に、有機EL発光素子及び乾燥剤を封入する。第2の方法では、特許文献1に開示されているように、ガラス基板上に形成された有機EL発光素子の上に、金属酸化膜や金属フッ化膜、或いはSi酸化膜、Si窒化膜やSi酸窒化膜などの無機絶縁膜を覆い被せて封止する。第3の方法では、ガラス基板上に形成された有機EL発光素子の上に、交互に積層した無機膜及び有機膜からなる多層膜を覆い被せて封止する。
特開平6−96858号公報
In the first method, an organic EL light emitting element and a desiccant are enclosed in a housing formed by bonding glass or a metal tube with a UV curable resin. In the second method, as disclosed in Patent Document 1, a metal oxide film, a metal fluoride film, a Si oxide film, a Si nitride film, or the like is formed on an organic EL light emitting element formed on a glass substrate. An inorganic insulating film such as a Si oxynitride film is covered and sealed. In the third method, the organic EL light-emitting element formed on the glass substrate is covered and sealed with a multilayer film composed of alternately laminated inorganic films and organic films.
JP-A-6-96858

これらの封止方法は、有機EL発光素子の素子特性を確実に維持させるために、構造が複雑で多数の工程を要するため、製造に時間とコストがかかる。   Since these sealing methods have a complicated structure and require a large number of steps in order to reliably maintain the element characteristics of the organic EL light emitting element, it takes time and cost to manufacture.

有機EL膜はガラス基板上に形成されているため、透明電極に対向する側の金属電極が、有機EL膜を外部環境から遮断する特性(ガスバリア性や封止特性)を備えていれば、上記のような方法をとる必要がない。ところが、金属電極を構成する結晶の粒界が膜厚方向に連続して金属電極の表裏面を貫通しているため、結晶の粒界を通じて酸素や水分が浸入しやすく有機EL膜を劣化させてしまう。   Since the organic EL film is formed on the glass substrate, if the metal electrode on the side facing the transparent electrode has characteristics (gas barrier properties and sealing characteristics) for shielding the organic EL film from the external environment, the above There is no need to take a method like However, since the crystal grain boundaries composing the metal electrode continuously penetrate the front and back surfaces of the metal electrode in the film thickness direction, oxygen and moisture can easily enter through the crystal grain boundaries, thereby deteriorating the organic EL film. End up.

そこで、本発明は、有機EL膜を被覆する金属電極のガスバリア性や封止特性が高い有機EL発光素子を提供することを目的とする。   Accordingly, an object of the present invention is to provide an organic EL light-emitting device in which the gas barrier property and sealing property of a metal electrode covering an organic EL film are high.

本発明の第1の特徴は、基板と、この基板の主表面上に形成された第1の電極と、この第1の電極上に形成された有機EL膜と、この有機EL膜の表面を覆うように形成された第2の電極とを有する有機EL発光素子であって、第2の電極は、有機EL膜上に形成された第1の金属膜と、第1の金属膜上に形成された非晶質の第2の金属膜とを備えることである。   The first feature of the present invention is that a substrate, a first electrode formed on the main surface of the substrate, an organic EL film formed on the first electrode, and a surface of the organic EL film are provided. An organic EL light emitting device having a second electrode formed to cover the second electrode, wherein the second electrode is formed on the first metal film and the first metal film formed on the organic EL film. And an amorphous second metal film formed.

本発明の第1の特徴によれば、第2の金属膜は非晶質からなるため、従来の多結晶構造に比べて結晶粒界が連続したり、結晶粒界が膜の表裏面を貫通することが抑制され、空気中の水分子や酸素分子が結晶粒界を通じて第2の金属膜を透過して有機EL膜に到達しにくくなる。このように、ガスバリア性や封止特性が高い第2の金属膜を有する第2の電極で有機EL膜を覆うことにより、有機EL膜の劣化が起きにくくなる。また、有機EL膜は第2の電極によって封止されるので、無機絶縁膜や無機膜と有機膜の積層膜によって金属電極を封止する従来例に比べて放熱性が高まり、電気抵抗が低減し、耐久性が向上する。   According to the first feature of the present invention, since the second metal film is made of amorphous material, the crystal grain boundaries are continuous as compared with the conventional polycrystalline structure, or the crystal grain boundaries penetrate the front and back surfaces of the film. This prevents water molecules and oxygen molecules in the air from passing through the second metal film through the crystal grain boundary and hardly reaching the organic EL film. As described above, the organic EL film is hardly deteriorated by covering the organic EL film with the second electrode having the second metal film having high gas barrier properties and sealing properties. In addition, since the organic EL film is sealed by the second electrode, the heat dissipation is increased and the electric resistance is reduced as compared with the conventional example in which the metal electrode is sealed by the inorganic insulating film or the laminated film of the inorganic film and the organic film. And durability is improved.

本発明の第1の特徴において、第2の金属膜は、化学量論的に金属酸化物、金属窒化物或いは金属酸窒化物にならない分量の酸素及び窒素の少なくとも一方を含む金属化合物で形成すればよい。これにより、第2の金属膜は非晶質の金属膜となり、結晶粒界が連続したり、結晶粒界が膜の表裏面を貫通することが抑制される。   In the first feature of the present invention, the second metal film is formed of a metal compound containing at least one of oxygen and nitrogen in an amount that does not stoichiometrically become a metal oxide, metal nitride, or metal oxynitride. That's fine. As a result, the second metal film becomes an amorphous metal film, and crystal grain boundaries are prevented from being continuous, or the crystal grain boundaries are prevented from penetrating the front and back surfaces of the film.

例えば、非晶質の第2の金属膜は、酸素を含むアルミニウム化合物からなることが望ましい。   For example, the amorphous second metal film is preferably made of an aluminum compound containing oxygen.

本発明の第2の特徴は、透明な基板と、この基板の主表面上に形成された透明な第1の電極と、この第1の電極上に形成された、電子と正孔の再結合によって発光する有機EL膜と、この有機EL膜の表面を覆うように形成された金属からなる第2の電極とを有する有機EL発光素子であって、第2の電極は、有機EL膜上に形成された第1の金属膜と、第1の金属膜上に形成された微結晶の第2の金属膜とを備えることである。   The second feature of the present invention is a transparent substrate, a transparent first electrode formed on the main surface of the substrate, and recombination of electrons and holes formed on the first electrode. An organic EL light emitting element having an organic EL film that emits light by a metal and a second electrode made of a metal formed so as to cover the surface of the organic EL film, wherein the second electrode is formed on the organic EL film A first metal film formed; and a microcrystalline second metal film formed on the first metal film.

本発明の第2の特徴によれば、第2の金属膜は微結晶からなるため、従来の多結晶構造に比べて結晶粒界が連続したり、結晶粒界が膜の表裏面を貫通することが抑制され、空気中の水分子や酸素分子が結晶粒界を通じて第2の金属膜を透過して有機EL膜に到達しにくくなる。このように、ガスバリア性や封止特性が高い第2の金属膜を有する第2の電極で有機EL膜を覆うことにより、有機EL膜の劣化が起きにくくなる。また、有機EL膜は第2の電極によって封止されるので、無機絶縁膜や無機膜と有機膜の積層膜によって金属電極を封止する従来例に比べて放熱性が高まり、電気抵抗が低減し、耐久性が向上する。   According to the second feature of the present invention, since the second metal film is made of microcrystals, the crystal grain boundaries are continuous as compared with the conventional polycrystalline structure, or the crystal grain boundaries penetrate the front and back surfaces of the film. This suppresses water molecules and oxygen molecules in the air from passing through the second metal film through the crystal grain boundary and hardly reaching the organic EL film. As described above, the organic EL film is hardly deteriorated by covering the organic EL film with the second electrode having the second metal film having high gas barrier properties and sealing properties. In addition, since the organic EL film is sealed by the second electrode, the heat dissipation is increased and the electric resistance is reduced as compared with the conventional example in which the metal electrode is sealed by the inorganic insulating film or the laminated film of the inorganic film and the organic film. And durability is improved.

本発明の第2の特徴において、第2の金属膜を二以上の金属の合金で形成することにより、第2の金属膜は微結晶の金属膜となり、結晶粒界が連続したり、結晶粒界が膜の表裏面を貫通することが抑制される。   In the second feature of the present invention, by forming the second metal film from an alloy of two or more metals, the second metal film becomes a microcrystalline metal film, and crystal grain boundaries are continuous, The boundary is prevented from penetrating the front and back surfaces of the film.

例えば、二以上の金属の合金は、Al−Ta、Al−Ti、Al−Mg、Al−Nd或いはIr−Taである。   For example, the alloy of two or more metals is Al—Ta, Al—Ti, Al—Mg, Al—Nd, or Ir—Ta.

また、本発明は、透明な基板と、この基板の主表面上に形成された透明な第1の電極と、この第1の電極上に形成された、電子と正孔の再結合によって発光する有機EL膜と、この有機EL膜の表面を覆うように形成された第2の電極とを有する有機EL発光素子であって、第2の電極は、有機EL膜上に形成された第1の金属膜と、第1の金属膜上に形成された、ダイレクトトンネルが生じる膜厚の中間膜と、この中間膜上に形成された第2の金属膜とを備える構成としてもよい。   Further, the present invention emits light by a transparent substrate, a transparent first electrode formed on the main surface of the substrate, and recombination of electrons and holes formed on the first electrode. An organic EL light emitting device having an organic EL film and a second electrode formed so as to cover the surface of the organic EL film, wherein the second electrode is a first electrode formed on the organic EL film. It is good also as a structure provided with the metal film, the intermediate film of the film thickness which produces | generates the direct tunnel formed on the 1st metal film, and the 2nd metal film formed on this intermediate film.

この場合、中間膜を第1の金属膜及び第2の金属膜で挟む積層構造を有するため、中間膜により金属膜の結晶粒界は連続することがなくなり、結晶粒界が第2の電極の表裏面を貫通することもなくなる。よって、空気中の水分子や酸素分子が結晶粒界を通じて第2の電極を透過して有機EL膜に到達しにくくなる。このように、ガスバリア性や封止特性が高い第2の電極で有機EL膜を覆うことにより、有機EL膜の劣化が起きにくくなる。また、有機EL膜は第2の電極によって封止されるので、無機絶縁膜や無機膜と有機膜の積層膜によって金属電極を封止する従来例に比べて放熱性が高まり、電気抵抗が低減し、耐久性が向上する。   In this case, since the intermediate film has a laminated structure in which the first metal film and the second metal film are sandwiched, the crystal film boundary of the metal film is not continuous by the intermediate film, and the crystal grain boundary is not in the second electrode. It does not penetrate the front and back surfaces. Therefore, water molecules and oxygen molecules in the air hardly pass through the second electrode through the crystal grain boundaries and reach the organic EL film. As described above, the organic EL film is hardly deteriorated by covering the organic EL film with the second electrode having a high gas barrier property and sealing property. In addition, since the organic EL film is sealed by the second electrode, the heat dissipation is increased and the electric resistance is reduced as compared with the conventional example in which the metal electrode is sealed by the inorganic insulating film or the laminated film of the inorganic film and the organic film. And durability is improved.

例えば、中間膜は酸化アルミニウムからなり、金属膜はアルミニウムからなる。第2の電極は、第2の金属膜上に交互に積層された中間膜及び金属膜を更に備えていてもよい。これにより、第2の電極のガスバリア性や封止特性が更に向上する。   For example, the intermediate film is made of aluminum oxide, and the metal film is made of aluminum. The second electrode may further include intermediate films and metal films alternately stacked on the second metal film. This further improves the gas barrier properties and sealing properties of the second electrode.

本発明において、第1の金属膜は銀又は銀の合金であっても構わない。また、第1の金属膜は、多結晶の金属膜であってもよい。また、基板の主表面に対して垂直な方向から見た有機EL膜の平面形状と第1の金属膜の平面形状は等しいことが望ましい。この同一の平面形状は、有機EL膜及び第1の金属膜を続けて成膜し、同時にパターンニングする製造手順によって得られる。したがって、有機EL膜及び第1の金属膜の間に、ダストの付着を抑制することができる。   In the present invention, the first metal film may be silver or a silver alloy. Further, the first metal film may be a polycrystalline metal film. Further, it is desirable that the planar shape of the organic EL film and the planar shape of the first metal film are the same as viewed from a direction perpendicular to the main surface of the substrate. This same planar shape is obtained by a manufacturing procedure in which an organic EL film and a first metal film are successively formed and simultaneously patterned. Therefore, adhesion of dust can be suppressed between the organic EL film and the first metal film.

本発明の有機EL発光素子によれば、ガスバリア性や封止特性が高い金属電極で有機EL膜を覆うことができる。   According to the organic EL light emitting device of the present invention, the organic EL film can be covered with a metal electrode having high gas barrier properties and sealing properties.

以下図面を参照して、本発明の実施の形態を説明する。図面の記載において同一部分には同一符号を付している。   Embodiments of the present invention will be described below with reference to the drawings. In the description of the drawings, the same parts are denoted by the same reference numerals.

(第1の実施の形態)
図1を参照して、本発明の第1の実施の形態に係わる有機EL発光素子の構成を説明する。有機EL発光素子は、透明な基板1と、基板1の主表面上に形成された透明な第1の電極2と、第1の電極2上に形成された有機EL膜3と、有機EL膜の表面を覆うように形成された第2の電極(4、5)と、第2の電極(4、5)と第1の電極2の間を電気的に絶縁する絶縁膜6とを有する。
(First embodiment)
With reference to FIG. 1, the structure of the organic electroluminescent light emitting element concerning the 1st Embodiment of this invention is demonstrated. The organic EL light emitting device includes a transparent substrate 1, a transparent first electrode 2 formed on the main surface of the substrate 1, an organic EL film 3 formed on the first electrode 2, and an organic EL film. And a second electrode (4, 5) formed so as to cover the surface, and an insulating film 6 that electrically insulates between the second electrode (4, 5) and the first electrode 2.

第2の電極(4、5)は、有機EL膜3上に形成された第1の金属膜4と、第1の金属膜4上に形成された非晶質の第2の金属膜5とを備える。ここで、「非晶質」とは、一般に、結晶質でなく、固体の原子・分子などの配列に規則性が認められないものを示すが、ここでは特に、第2の金属膜5の膜厚方向に結晶の粒界が貫通していないものを示す。巨視的に見て第2の金属膜5の表裏面に結晶の粒界が連続していなければ、微視的に見て第2の金属膜が複数の結晶の集合体であってもよい。   The second electrode (4, 5) includes a first metal film 4 formed on the organic EL film 3 and an amorphous second metal film 5 formed on the first metal film 4. Is provided. Here, the term “amorphous” generally refers to a material that is not crystalline and has no regularity in the arrangement of solid atoms / molecules. In particular, the film of the second metal film 5 is here. The crystal grain boundaries are not penetrated in the thickness direction. If the crystal grain boundaries are not continuous on the front and back surfaces of the second metal film 5 when viewed macroscopically, the second metal film may be an aggregate of a plurality of crystals when viewed microscopically.

基板1の主表面に対して垂直な方向から見た有機EL膜3の平面形状と第1の金属膜4の平面形状は等しい。有機EL膜3の外周部分は絶縁膜6の上に形成されている。第2の金属膜5の外周部分は、第1の金属膜4よりも外側に位置し、絶縁膜6の上に形成されている。よって、第2の金属膜5は、第1の金属膜4及び有機EL膜3を被覆するように形成されている。   The planar shape of the organic EL film 3 and the planar shape of the first metal film 4 as viewed from the direction perpendicular to the main surface of the substrate 1 are the same. The outer peripheral portion of the organic EL film 3 is formed on the insulating film 6. The outer peripheral portion of the second metal film 5 is located outside the first metal film 4 and is formed on the insulating film 6. Therefore, the second metal film 5 is formed so as to cover the first metal film 4 and the organic EL film 3.

非晶質の第2の金属膜5は、化学量論的に金属酸化物、金属窒化物或いは金属酸窒化物にならない分量の酸素及び窒素の少なくとも一方を含む金属化合物、例えば、酸素を含むアルミニウム化合物からなる。このように金属に酸素及び窒素の少なくとも一方を極微量に含ませることにより、金属化合物は結晶の粒界が乱れ、結晶粒界が連続したり結晶粒界が膜の表裏面を貫通することが抑制され、酸素や水分に対するガスバリア性や封止特性が高まる。第2の金属膜5を構成する金属は、アルミニウム(Al)の他に銀(Ag)であってもよい。   The amorphous second metal film 5 is formed of a metal compound containing at least one of oxygen and nitrogen in an amount that does not stoichiometrically become a metal oxide, metal nitride, or metal oxynitride, for example, aluminum containing oxygen. Consists of compounds. As described above, when the metal contains at least one of oxygen and nitrogen in a trace amount, the crystal grain boundary of the metal compound may be disturbed, and the crystal grain boundary may be continuous or the crystal grain boundary may penetrate the front and back surfaces of the film. It is suppressed, and the gas barrier property and sealing property against oxygen and moisture are enhanced. The metal constituting the second metal film 5 may be silver (Ag) in addition to aluminum (Al).

第1の金属膜4は、AlやAgなどの金属或いはAlの合金やAgの合金からなる膜であり、真空蒸着法により形成された多結晶の金属膜である。   The first metal film 4 is a film made of a metal such as Al or Ag, an alloy of Al, or an alloy of Ag, and is a polycrystalline metal film formed by vacuum deposition.

透明な第1の電極2は、例えば、透光性を有する、錫がドープされた酸化インジウム膜(ITO膜:Indium−tin−oxide)で形成されている。また、透明な基板1は、ガラス基板やプラスチック板で形成されている。或いは、可撓性を有するシート又はフィルムを用いても構わない。   The transparent first electrode 2 is formed of, for example, a translucent indium oxide film doped with tin (ITO film: Indium-tin-oxide). The transparent substrate 1 is formed of a glass substrate or a plastic plate. Alternatively, a flexible sheet or film may be used.

有機EL膜3は、図示は省略するが、電子注入層/電子輸送層/発光層/正孔輸送層/正孔注入層の積層構造を有する。なお、有機EL膜3は、発光層だけからなる構成であっても構わない。電子注入層及び電子輸送層側に位置する電極が陰極を形成し、正孔輸送層及び正孔注入層側に位置する電極が陽極を形成する。   Although not shown, the organic EL film 3 has a laminated structure of an electron injection layer / electron transport layer / light emitting layer / hole transport layer / hole injection layer. Note that the organic EL film 3 may be configured only by the light emitting layer. The electrode located on the electron injection layer and electron transport layer side forms a cathode, and the electrode located on the hole transport layer and hole injection layer side forms an anode.

第1の電極2と第2の電極(4、5)の間に電圧を印加すると、各電極から有機EL膜3へ電子と正孔が注入される。注入された電子と正孔がそれぞれの電子輸送層・正孔輸送層を通過し、発光層で結合する。結合によるエネルギーで、発光層の発光材料が励起される。その励起状態から再び基底状態に戻る際に光を発生する。第1の電極2はITOなどの透明な物質で形成されているため、発光層の光は第1の電極2及び透明な基板1を透過するため、有機EL発光素子から光が放出される。なお、第2の電極(4、5)は金属で形成されているため反射鏡として機能する。   When a voltage is applied between the first electrode 2 and the second electrode (4, 5), electrons and holes are injected from each electrode into the organic EL film 3. The injected electrons and holes pass through the respective electron transport layer / hole transport layer and are combined in the light emitting layer. The light-emitting material of the light-emitting layer is excited by the energy of the bond. Light is generated when returning from the excited state to the ground state again. Since the first electrode 2 is made of a transparent material such as ITO, the light of the light emitting layer is transmitted through the first electrode 2 and the transparent substrate 1, so that light is emitted from the organic EL light emitting element. Since the second electrodes (4, 5) are made of metal, they function as a reflecting mirror.

発光効率を高めるため、陰極は電子の注入性を良好にすべく仕事関数が小さい材質で形成することが望ましく、陽極は正孔の注入性を良好にすべく仕事関数が大きい材質で形成することが望ましい。反射鏡として機能する第2の電極(4、5)が陰極である場合、仕事関数が小さく且つ光反射率が高い例えばAlやAgなどが望ましく、反射鏡として機能する第2の電極(4、5)が陽極である場合、仕事関数が大きく且つ光反射率が高い例えばモリブデンやクロムなどが望ましい。本発明の実施の形態では、第1の電極2が陽極であり、第2の電極(4、5)が陰極である場合について説明を続ける。   In order to increase luminous efficiency, it is desirable to form the cathode with a material having a low work function in order to improve the electron injection property, and to form the anode with a material with a high work function in order to improve the hole injection property. Is desirable. When the second electrodes (4, 5) functioning as a reflecting mirror are cathodes, for example, Al or Ag having a small work function and high light reflectance is desirable, and the second electrodes (4, 4) functioning as reflecting mirrors are desirable. When 5) is an anode, for example, molybdenum or chromium having a high work function and high light reflectance is desirable. In the embodiment of the present invention, the case where the first electrode 2 is an anode and the second electrodes (4, 5) are cathodes will be described.

次に、図1に示す有機EL発光素子の製造方法を説明する。   Next, a method for manufacturing the organic EL light emitting device shown in FIG. 1 will be described.

(イ)先ず、透明な基板1の主表面上に、第1の電極2としてITO等の透明導電性物質を真空蒸着法やスパッタリング法で成膜し、フォトリソグラフィ法及び異方性エッチング法を用いて、ITO膜を所定の形状にパターニングする。   (A) First, a transparent conductive material such as ITO is formed as a first electrode 2 on the main surface of the transparent substrate 1 by vacuum deposition or sputtering, and photolithography and anisotropic etching are performed. Then, the ITO film is patterned into a predetermined shape.

(ロ)絶縁膜6を第1の電極2の上に形成し、第1の電極2の領域に所定の開口を形成する。そして、開口から表出する第1の電極2及び絶縁膜6の上に真空蒸着法を用いて有機EL膜3を形成する。続けて、真空蒸着法を用いて有機EL膜3の上に第1の金属膜4としてAl膜を成膜する。有機EL膜3の上に直接形成する金属電極は、スパッタリング法よりも真空蒸着法で形成することが望ましい。真空蒸着法を用いることにより有機EL膜3へ与えるダメージを小さくすることができる。   (B) The insulating film 6 is formed on the first electrode 2, and a predetermined opening is formed in the region of the first electrode 2. Then, the organic EL film 3 is formed on the first electrode 2 and the insulating film 6 exposed from the opening by using a vacuum evaporation method. Subsequently, an Al film is formed as the first metal film 4 on the organic EL film 3 by using a vacuum deposition method. The metal electrode formed directly on the organic EL film 3 is preferably formed by a vacuum deposition method rather than a sputtering method. Damage to the organic EL film 3 can be reduced by using the vacuum deposition method.

(ハ)そして、フォトリソグラフィ法及び異方性エッチング法を用いて、有機EL膜3及び第1の金属膜4をその外周部分が絶縁膜6上に配置されるように同時にパターンニングする。具体的には、有機EL膜3及び第1の金属膜4を、同じエッチングマスクを用いて選択的に除去する。   (C) The organic EL film 3 and the first metal film 4 are simultaneously patterned using the photolithography method and the anisotropic etching method so that the outer peripheral portion thereof is disposed on the insulating film 6. Specifically, the organic EL film 3 and the first metal film 4 are selectively removed using the same etching mask.

(ニ)スパッタリング法を用いて第1の金属膜4の上に第2の金属膜5を成膜する。このとき、第2の金属膜5が金属酸化物、金属窒化物或いは金属酸窒化物にならない程度の極微量の酸素又は窒素をスパッタ装置内に導入する。これにより、非晶質の第2の金属膜5を成膜することができる。フォトリソグラフィ法及び異方性エッチング法を用いて、第2の金属膜5をその外周部分が絶縁膜6上に配置されるように所定の形状にパターンニングする。以上の手順によって、図1に示した有機EL発光素子を製造することができる。   (D) A second metal film 5 is formed on the first metal film 4 by sputtering. At this time, a very small amount of oxygen or nitrogen is introduced into the sputtering apparatus so that the second metal film 5 does not become a metal oxide, metal nitride, or metal oxynitride. Thereby, the amorphous second metal film 5 can be formed. Using a photolithography method and an anisotropic etching method, the second metal film 5 is patterned into a predetermined shape so that the outer peripheral portion thereof is disposed on the insulating film 6. The organic EL light emitting device shown in FIG. 1 can be manufactured by the above procedure.

以上説明したように本発明の第1の実施の形態によれば、以下の作用効果が得られる。   As described above, according to the first embodiment of the present invention, the following operational effects can be obtained.

第2の金属膜5は非晶質からなるため、従来の多結晶構造に比べて結晶粒界が連続したり、結晶粒界が第2の金属膜5の表裏面を貫通することが抑制され、空気中の水分子や酸素分子が結晶粒界を通じて第2の金属膜5を透過して有機EL膜3に到達しにくくなる。このように、ガスバリア性や封止特性が高い第2の金属膜5で有機EL膜3を覆うことにより、有機EL膜3の劣化が起きにくくなる。また、有機EL膜3は第2の電極(4、5)によって封止されるので、無機絶縁膜や無機膜と有機膜の積層膜によって金属電極を封止する従来例に比べて放熱性が高まり、電気抵抗が低減し、耐久性が向上する。   Since the second metal film 5 is made of an amorphous material, it is possible to prevent the grain boundaries from being continuous or penetrating the front and back surfaces of the second metal film 5 as compared with the conventional polycrystalline structure. Water molecules and oxygen molecules in the air are difficult to reach the organic EL film 3 through the second metal film 5 through the crystal grain boundaries. Thus, by covering the organic EL film 3 with the second metal film 5 having high gas barrier properties and sealing properties, the organic EL film 3 is unlikely to deteriorate. In addition, since the organic EL film 3 is sealed by the second electrode (4, 5), it has a higher heat dissipation than the conventional example in which the metal electrode is sealed by an inorganic insulating film or a laminated film of an inorganic film and an organic film. Increases, reduces electrical resistance and improves durability.

第2の金属膜5を化学量論的に金属酸化物、金属窒化物或いは金属酸窒化物にならない分量の酸素及び窒素の少なくとも一方を含む金属化合物で形成することにより、第2の金属膜5は非晶質の金属膜となり、結晶粒界が連続したり、結晶粒界が膜の表裏面を貫通することが抑制される。   The second metal film 5 is formed of a metal compound containing at least one of oxygen and nitrogen in an amount that does not stoichiometrically become a metal oxide, metal nitride, or metal oxynitride. Becomes an amorphous metal film, and crystal grain boundaries are prevented from being continuous or penetrating through the front and back surfaces of the film.

(第2の実施の形態)
本発明の第2の実施の形態では、微結晶の第2の金属膜5で有機EL膜3を覆う場合について説明する。有機EL発光素子の断面構造は第1の実施の形態と同じである。すなわち、図1に示したように、本発明の第2の実施の形態に関わる有機EL発光素子は、透明な基板1と、基板1の主表面上に形成された透明な第1の電極2と、第1の電極2上に形成された有機EL膜3と、有機EL膜3の表面を覆うように形成された金属からなる第2の電極(4、5)と、第1の電極2と第2の電極(4、5)の間を電気的に絶縁する絶縁膜6を有する。
(Second Embodiment)
In the second embodiment of the present invention, a case where the organic EL film 3 is covered with a microcrystalline second metal film 5 will be described. The cross-sectional structure of the organic EL light emitting device is the same as that in the first embodiment. That is, as shown in FIG. 1, the organic EL light emitting device according to the second embodiment of the present invention includes a transparent substrate 1 and a transparent first electrode 2 formed on the main surface of the substrate 1. An organic EL film 3 formed on the first electrode 2, a second electrode (4, 5) made of metal so as to cover the surface of the organic EL film 3, and the first electrode 2 And the second electrode (4, 5).

第2の電極(4、5)は、有機EL膜3上に形成された第1の金属膜4と、第1の金属膜4上に形成された微結晶の第2の金属膜5とを備える。ここで「微結晶」とは、結晶粒径が非晶質よりも大きく、多結晶よりも小さい結晶状態を示し、例えば、第2の金属膜5の膜厚の1/3程度の粒径を持つ結晶状態を示し、微結晶の第2の金属膜5はこのような結晶の集合体からなる。   The second electrode (4, 5) includes a first metal film 4 formed on the organic EL film 3 and a microcrystalline second metal film 5 formed on the first metal film 4. Prepare. Here, “microcrystal” indicates a crystal state in which the crystal grain size is larger than that of amorphous and smaller than that of polycrystal. For example, the grain size is about 1/3 of the thickness of the second metal film 5. The microcrystalline second metal film 5 is composed of such an aggregate of crystals.

このような微結晶の第2の金属膜5は、二以上の金属の合金によって形成される。例えば、Alとタンタル(Ta)の合金、Alとチタン(Ti)の合金、Alとマグネシウム(Mg)の合金、Alとネオジム(Nd)の合金、或いはイリジウム(Ir)とTaの合金によって形成される。このような合金によって形成される微結晶の第2の金属膜5は、結晶粒界が乱れ、結晶粒界が連続したり、結晶粒界が第2の金属膜5の表裏面を貫通することが抑制され、酸素や水分に対するガスバリア性や封止特性が高まる。   The microcrystalline second metal film 5 is formed of an alloy of two or more metals. For example, an alloy of Al and tantalum (Ta), an alloy of Al and titanium (Ti), an alloy of Al and magnesium (Mg), an alloy of Al and neodymium (Nd), or an alloy of iridium (Ir) and Ta The In the microcrystalline second metal film 5 formed of such an alloy, the crystal grain boundaries are disturbed, the crystal grain boundaries are continuous, or the crystal grain boundaries penetrate the front and back surfaces of the second metal film 5. Is suppressed, and gas barrier properties and sealing properties against oxygen and moisture are enhanced.

有機EL発光素子のその他の構成は、第1の実施の形態に係わる有機EL発光素子と同じであり、説明を省略する。   The other configuration of the organic EL light emitting device is the same as that of the organic EL light emitting device according to the first embodiment, and a description thereof will be omitted.

第2の金属膜5は、合金を形成する複数の金属をターゲットとして同時にスパッタリングを行うことによって第1の金属膜4の上に成膜される。なお、その他の製造手順は第1の実施の形態と同じである。   The second metal film 5 is formed on the first metal film 4 by simultaneously performing sputtering using a plurality of metals forming an alloy as a target. Other manufacturing procedures are the same as those in the first embodiment.

以上説明したように、本発明の第2の実施の形態によれば、第2の金属膜5は微結晶からなるため、従来の多結晶構造に比べて結晶粒界が連続したり、結晶粒界が膜の表裏面を貫通することが抑制され、空気中の水分子や酸素分子が結晶粒界を通じて第2の金属膜5を透過して有機EL膜3に到達しにくくなる。このように、ガスバリア性や封止特性が高い第2の金属膜5で有機EL膜3を覆うことにより、有機EL膜3の劣化が起きにくくなる。また、有機EL膜3は第2の電極(4、5)によって封止されるので、無機絶縁膜や無機膜と有機膜の積層膜によって金属電極を封止する従来例に比べて放熱性が高まり、電気抵抗が低減し、耐久性が向上する。   As described above, according to the second embodiment of the present invention, since the second metal film 5 is made of microcrystals, the crystal grain boundaries are continuous as compared with the conventional polycrystalline structure. The boundary is prevented from penetrating the front and back surfaces of the film, so that water molecules and oxygen molecules in the air hardly pass through the second metal film 5 through the crystal grain boundary and reach the organic EL film 3. Thus, by covering the organic EL film 3 with the second metal film 5 having high gas barrier properties and sealing properties, the organic EL film 3 is unlikely to deteriorate. In addition, since the organic EL film 3 is sealed by the second electrode (4, 5), it has a higher heat dissipation than the conventional example in which the metal electrode is sealed by an inorganic insulating film or a laminated film of an inorganic film and an organic film. Increases, reduces electrical resistance and improves durability.

(第3の実施の形態)
本発明の第3の実施の形態では、第1の金属膜4と第2の金属膜5との間にダイレクトトンネルが生じる程度の極薄の中間膜が形成されている場合について説明する。
(Third embodiment)
In the third embodiment of the present invention, a case will be described in which an extremely thin intermediate film is formed between the first metal film 4 and the second metal film 5 so as to cause a direct tunnel.

図2に示したように、本発明の第3の実施の形態に係る有機EL発光素子は、透明な基板1と、基板1の主表面上に形成された透明な第1の電極2と、第1の電極2上に形成された有機EL膜3と、有機EL膜3の表面を覆うように形成された金属からなる第2の電極(4、5a〜5d)と、第1の電極2と第2の電極(4、5a〜5d)の間を電気的に絶縁する絶縁膜6を有する。   As shown in FIG. 2, the organic EL light emitting device according to the third embodiment of the present invention includes a transparent substrate 1, a transparent first electrode 2 formed on the main surface of the substrate 1, The organic EL film 3 formed on the first electrode 2, the second electrode (4, 5 a to 5 d) made of metal formed so as to cover the surface of the organic EL film 3, and the first electrode 2 And the second electrode (4, 5a to 5d).

第2の電極(4、5a〜5d)は、有機EL膜3上に形成された第1の金属膜4と、第1の金属膜4上に形成された中間膜7と、中間膜7上に形成された第2の金属膜5aとを少なくとも備える。   The second electrodes (4, 5 a to 5 d) are the first metal film 4 formed on the organic EL film 3, the intermediate film 7 formed on the first metal film 4, and the intermediate film 7. And at least a second metal film 5a.

中間膜7は、ダイレクトトンネルが生じる程度の膜厚を有し、例えば酸化アルミニウムなどの絶縁材料からなる。なお「ダイレクトトンネル」とは、絶縁膜が非常に薄くなり、量子効果によって電子があたかもトンネルを抜けるように絶縁膜を突き抜ける現象を示す。例えば、酸化シリコンの場合、3nm以下の膜厚でダイレクトトンネルが生じる。よって、中間膜7が絶縁性を有する材料で形成されていても、第1の金属膜4と第2の金属膜5の間は電気的に導通状態となる。   The intermediate film 7 has such a thickness that a direct tunnel is generated, and is made of an insulating material such as aluminum oxide. “Direct tunnel” refers to a phenomenon in which an insulating film becomes very thin, and electrons penetrate through the insulating film as if passing through the tunnel due to the quantum effect. For example, in the case of silicon oxide, direct tunneling occurs with a film thickness of 3 nm or less. Therefore, even if the intermediate film 7 is formed of an insulating material, the first metal film 4 and the second metal film 5 are electrically connected.

第2の電極(4、5a〜5d)は、更に、第2の金属膜5aの上に交互に積層された中間膜及び第3〜第5の金属膜(5b〜5d)を備える。すなわち、第2の電極(4、5a〜5d)は、第1〜第5の金属膜(4、5a〜5d)の間に中間膜7がそれぞれ挿入された多層構造を備える。   The second electrodes (4, 5a to 5d) further include intermediate films and third to fifth metal films (5b to 5d) alternately stacked on the second metal film 5a. That is, the second electrode (4, 5a to 5d) has a multilayer structure in which the intermediate film 7 is inserted between the first to fifth metal films (4, 5a to 5d).

第2の電極(4、5a〜5d)の製造方法は次の通りである。第1の金属膜4として例えばAl膜を真空蒸着法により成膜し、有機EL膜3と共に所定形状にパターニングを行った後、酸素をスパッタ装置内に導入した状態でAlをスパッタリングすることにより中間膜7として極薄の酸化アルミニウム膜を成膜する。そして、スパッタ装置内への酸素の導入を停止してAlをスパッタリングすることにより第2の金属膜5aを成膜する。その後、再度、スパッタ装置内へ酸素を導入した状態でAlをスパッタリングすることによって酸化アルミニウム膜(中間膜7)を成膜する。スパッタ装置内への酸素導入のオン・オフを繰り返すことにより、中間膜7を間に挿入しながら第3の金属膜5b〜第5の金属膜5dを順番に成膜する。最後に、第2の金属膜5a〜第5の金属膜5dを同時に所定の形状にパターニングする。このようにして第2の電極(4、5a〜5d)を形成することができる。なお、その他の製造手順は第1の実施の形態と同じである。   The manufacturing method of the second electrode (4, 5a to 5d) is as follows. As the first metal film 4, for example, an Al film is formed by a vacuum deposition method, patterned into a predetermined shape together with the organic EL film 3, and then intermediated by sputtering Al with oxygen introduced into the sputtering apparatus. An ultrathin aluminum oxide film is formed as the film 7. Then, the second metal film 5a is formed by stopping the introduction of oxygen into the sputtering apparatus and sputtering Al. Thereafter, an aluminum oxide film (intermediate film 7) is formed again by sputtering Al with oxygen introduced into the sputtering apparatus. By repeating ON / OFF of oxygen introduction into the sputtering apparatus, the third metal film 5b to the fifth metal film 5d are sequentially formed while the intermediate film 7 is inserted therebetween. Finally, the second metal film 5a to the fifth metal film 5d are simultaneously patterned into a predetermined shape. In this way, the second electrodes (4, 5a to 5d) can be formed. Other manufacturing procedures are the same as those in the first embodiment.

以上説明したように、本発明の第3の実施の形態によれば、中間膜7を第1の金属膜4及び第2の金属膜5aで挟む積層構造を有するため、中間膜7を跨いで金属膜の結晶粒界が連続することがなくなり、第2の電極(4、5a)の表裏面を結晶粒界が貫通することもなくなる。よって、空気中の水分子や酸素分子が結晶粒界を通じて第2の電極(4、5a)を透過して有機EL膜3に到達しにくくなる。このように、ガスバリア性や封止特性が高い第2の電極(4、5a)で有機EL膜を覆うことにより、有機EL膜3の劣化が起きにくくなる。また、有機EL膜3は第2の電極(4、5a)によって封止されるので、無機絶縁膜や無機膜と有機膜の積層膜によって金属電極を封止する従来例に比べて放熱性が高まり、電気抵抗が低減し、耐久性が向上する。   As described above, according to the third embodiment of the present invention, since the intermediate film 7 is sandwiched between the first metal film 4 and the second metal film 5a, the intermediate film 7 is straddled. The crystal grain boundaries of the metal film do not continue, and the crystal grain boundaries do not penetrate the front and back surfaces of the second electrode (4, 5a). Therefore, water molecules and oxygen molecules in the air are difficult to reach the organic EL film 3 through the second electrodes (4, 5a) through the crystal grain boundaries. As described above, the organic EL film 3 is hardly deteriorated by covering the organic EL film with the second electrodes (4, 5a) having high gas barrier properties and sealing properties. In addition, since the organic EL film 3 is sealed by the second electrode (4, 5a), the heat dissipation is higher than the conventional example in which the metal electrode is sealed by the inorganic insulating film or the laminated film of the inorganic film and the organic film. Increases, reduces electrical resistance and improves durability.

第2の電極(4、5a〜5d)が第2の金属膜5aの上に交互に積層された中間膜7及び第3〜第5の金属膜(5b〜5d)を更に備えることにより、第2の電極(4、5a〜5d)のガスバリア性や封止特性が更に向上する。   The second electrode (4, 5a to 5d) further includes the intermediate film 7 and the third to fifth metal films (5b to 5d) alternately stacked on the second metal film 5a, thereby The gas barrier properties and sealing properties of the second electrode (4, 5a to 5d) are further improved.

上記のように、本発明は、3つの実施の形態によって記載したが、この開示の一部をなす論述及び図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施の形態、実施例及び運用技術が明らかとなろう。   As described above, the present invention has been described with reference to three embodiments. However, it should not be understood that the description and drawings constituting a part of this disclosure limit the present invention. From this disclosure, various alternative embodiments, examples, and operational techniques will be apparent to those skilled in the art.

本発明の実施の形態では、第1の電極2が陽極であり、第2の電極(4、5)が陰極である場合について説明したが、第1の電極2が陰極であり、第2の電極(4、5)が陽極である場合についても本発明を適用することは可能である。   In the embodiment of the present invention, the case where the first electrode 2 is an anode and the second electrode (4, 5) is a cathode has been described. However, the first electrode 2 is a cathode and the second electrode 2 is a cathode. The present invention can also be applied to the case where the electrodes (4, 5) are anodes.

また、本発明の実施の形態では、有機EL膜3を第1の金属膜4と共にパターニングを行ったが、有機EL膜3を印刷法により予めパターン化された状態で形成しても勿論よい。   In the embodiment of the present invention, the organic EL film 3 is patterned together with the first metal film 4. However, the organic EL film 3 may be formed in a state patterned in advance by a printing method.

本発明の第1及び第2の実施の形態に係わる有機EL発光素子の構成を示す断面図である。It is sectional drawing which shows the structure of the organic electroluminescent light emitting element concerning the 1st and 2nd embodiment of this invention. 本発明の第3の実施の形態に係わる有機EL発光素子の構成を示す断面図である。It is sectional drawing which shows the structure of the organic electroluminescent light emitting element concerning the 3rd Embodiment of this invention.

符号の説明Explanation of symbols

1…基板
2…第1の電極
3…有機EL膜
4…第1の金属膜
5…第2の金属膜
5a…第2の金属膜
5b…第3の金属膜
5c…第4の金属膜
5d…第5の金属膜
6…絶縁膜
7…中間膜
DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... 1st electrode 3 ... Organic EL film 4 ... 1st metal film 5 ... 2nd metal film 5a ... 2nd metal film 5b ... 3rd metal film 5c ... 4th metal film 5d ... Fifth metal film 6 ... Insulating film 7 ... Intermediate film

Claims (5)

基板と、
前記基板の主表面上に形成された第1の電極と、
前記第1の電極上に形成された有機EL膜と、
前記有機EL膜の表面を覆うように形成された第2の電極とを有し、
前記第2の電極は、
前記有機EL膜上に形成された第1の金属膜と、
前記第1の金属膜上に形成された非晶質の第2の金属膜と、
を備えることを特徴とする有機EL発光素子。
A substrate,
A first electrode formed on the main surface of the substrate;
An organic EL film formed on the first electrode;
A second electrode formed so as to cover the surface of the organic EL film,
The second electrode is
A first metal film formed on the organic EL film;
An amorphous second metal film formed on the first metal film;
An organic EL light emitting device comprising:
前記非晶質の第2の金属膜は、酸素及び窒素の少なくとも一方を含む金属化合物からなることを特徴とする請求項1に記載の有機EL発光素子。   The organic EL light emitting device according to claim 1, wherein the amorphous second metal film is made of a metal compound containing at least one of oxygen and nitrogen. 前記非晶質の第2の金属膜は、酸素を含むアルミニウム化合物からなることを特徴とする請求項2に記載の有機EL発光素子。   The organic EL light-emitting element according to claim 2, wherein the amorphous second metal film is made of an aluminum compound containing oxygen. 基板と、
前記基板の主表面上に形成された第1の電極と、
前記第1の電極上に形成された有機EL膜と、
前記有機EL膜の表面を覆うように形成された金属からなる第2の電極とを有し、
前記第2の電極は、
前記有機EL膜上に形成された第1の金属膜と、
前記第1の金属膜上に形成された微結晶の第2の金属膜と、
を備えることを特徴とする有機EL発光素子。
A substrate,
A first electrode formed on the main surface of the substrate;
An organic EL film formed on the first electrode;
A second electrode made of metal formed so as to cover the surface of the organic EL film,
The second electrode is
A first metal film formed on the organic EL film;
A microcrystalline second metal film formed on the first metal film;
An organic EL light emitting device comprising:
前記微結晶の第2の金属膜は二以上の金属の合金からなることを特徴とする請求項4に記載の有機EL発光素子。   The organic EL light-emitting element according to claim 4, wherein the microcrystalline second metal film is made of an alloy of two or more metals.
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JP2013051218A (en) * 2012-12-13 2013-03-14 Nippon Seiki Co Ltd Organic el element

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JPH10149882A (en) * 1996-11-20 1998-06-02 Sanyo Electric Co Ltd Organic electroluminescent element
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JPH07197250A (en) * 1993-11-12 1995-08-01 Ppg Ind Inc Durable sputtered metal oxide coating
JPH10149882A (en) * 1996-11-20 1998-06-02 Sanyo Electric Co Ltd Organic electroluminescent element
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013033035A1 (en) * 2011-08-26 2013-03-07 Sumitomo Chemical Co., Ltd. Permeable electrodes for high performance organic electronic devices
US20140225093A1 (en) * 2011-08-26 2014-08-14 Sumitomo Chemical Co., Ltd Permeable electrodes for high performance organic electronic devices
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