JP2009117004A - Developing apparatus of master disk, developing method of optical master disk, and developing method of master disk - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a developing apparatus capable of forming a preformat pattern having high uniformity while hardly generating development unevenness in a recording area. <P>SOLUTION: The developing apparatus includes: a table 31 provided with a horizontal upper surface on which an exposure finished master disk is placed and rotated around an axis O passing through a center of the placed exposure finished master disk 1 and extended in the vertical direction as a rotational center; and a developing solution supplying means 53 for supplying a developing solution to a photoresist layer 2 of the master disk 1 which is placed on the table 31 and rotated so that the developing solution 13 flows on the surface of the master disk 1 as a laminar flow or in a transition state. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a developing device and a developing method for a master that develops an exposed master and forms a fine uneven preformat pattern created on the master, and in particular, devised the arrangement of the developer supply nozzle. About things.

  The prior art will be described with reference to the accompanying drawings. First, an outline of an optical disk manufacturing method will be described. FIG. 11 is a first manufacturing process diagram for explaining one embodiment of the developing device and the developing method of the present invention and an optical disk manufactured by the conventional developing device. FIG. 12 is a second manufacturing process diagram for explaining an optical disk manufactured by an embodiment of the developing device and the developing method of the present invention and a conventional developing device. 11 and 12, 20 is a glass substrate, 21 is a photoresist, 22 is a laser beam, 23 is a condenser lens, 24 is an exposed portion, 25 is nickel, 26 is a polycarbonate resin, 27 Indicates a reflective membrane and an abdominal membrane, respectively.

  First, a photoresist 21 is uniformly applied to the surface of a precisely polished disc-shaped glass substrate 20 by a spin coat method through an adhesive, and then baked by a hot plate or the like (FIG. 11A). reference). A portion where the photoresist 21 is uniformly applied becomes a photoresist layer 2 to be described later (see FIGS. 1 and 2).

  Next, the laser beam 22 modulated by the signal to be recorded is condensed by the lens 23 and irradiated onto the photoresist 21 to expose a predetermined portion (see FIG. 11B). The pattern of the exposure unit 24 is a pit group in the case of a read-only optical disc (CD, LD, CD-ROM, etc.), and a recordable / reproducible optical disc (a magneto-optical disc, a phase change optical disc, a CD write once, etc.) ) Is a group of grooves. The exposed portion 24 is formed, for example, in part of the portion where the photoresist 21 is uniformly applied (the photoresist layer 2), and the portion where the exposed portion 24 is formed is the exposure described later. It becomes the pattern area A (see FIG. 2 etc.).

  Next, the photoresist 21 is developed using an alkaline solution, the exposed portion 24 is dissolved, and a fine concavo-convex pattern of the photoresist 21 composed of a pit group or a groove group is obtained (see FIG. 11C).

  Next, a conductive film made of nickel or the like is formed on the photoresist 21 by sputtering or the like, and nickel 25 is plated to a predetermined thickness using the conductive film as an electrode (see FIG. 11D). ). Thereby, the reverse pattern of the fine uneven pattern of the photoresist 21 is copied on the nickel 25.

  Next, the nickel 25 is peeled from the glass substrate 20 to form a stamper (see FIG. 12A). Subsequently, using this stamper as a mold for injection molding, polycarbonate resin 26 and the like are injection molded (see FIG. 12B). A predetermined fine uneven pattern is formed on the polycarbonate resin 26. Finally, a reflective film, a protective film 27, and the like are formed on the surface on which the fine uneven pattern of the polycarbonate resin 26 removed from the stamper is formed by sputtering or the like, so that an optical disk is completed (FIG. 12C). reference).

  By the way, in recent years, in the optical disc, not only the information optical disc that can be recorded / reproduced but also the read-only optical disc has been increased in recording density. Means for achieving this higher recording density include narrowing the track pitch and increasing the linear recording density. That is, it is necessary to reduce the size of pits or groups in which information is recorded.

  However, when an optical disc is manufactured by a conventional manufacturing method and the size of a pit or group is reduced, minute distortions and variations in these physical dimensions that are unavoidable in the manufacturing process will have a relatively large effect. The performance of the optical disk will be deteriorated, the manufacturing yield will be lowered, and the productivity will be deteriorated.

  Small distortions and variations in the physical dimensions of the pits or groups can occur in all processes related to the formation of pits or groups in the optical disk manufacturing process, but in particular, a pattern of pits or grooves is formed in the photoresist. The effects of minute distortions and parallax of physical dimensions that occur sometimes are the greatest. Small distortions and variations in physical dimensions generated here affect all subsequent processes.

  The optical disk substrate is duplicated by using a mold called a stamper produced from the developed optical disk master 1 as a master.

  Conventionally, as shown in FIGS. 14 and 15, a developing device for an exposed optical disc master 1 is known. The conventional developing device includes a rotating portion 11 of the optical disc master 1, a developer / pure water supply nozzle 14, a solenoid valve 17, a bounce prevention ring 18, and a drain receiver 16.

  The developer / pure water supply nozzle 14 is formed in a cylindrical shape, and the developer 13 from a plurality of arranged nozzle holes (developer / pure water discharge ports) 12a, 12b, 12c, 12d, 12e, 12f. Alternatively, pure water 15 is discharged toward the photoresist layer 2 of the optical disc master 1. Further, the developer / pure water supply nozzle 14 is pivotable about the axis CL1.

  The electromagnetic valve 17 is an electromagnetic valve for switching the liquid discharged from each nozzle hole 12 a, 12 b, 12 c, 12 d, 12 e, 12 f to the developer 13 or pure water 15. The bounce prevention ring 18 is formed of a metal net or the like and is provided around the rotating portion 11 to prevent the developer 13 and the pure water 15 from bounce. The drain receiver 16 is formed in the shape of a ring container and is provided to receive the developer 13 and the pure water 15 outside the splash-back preventing ring 18.

  The rotating unit 11 includes a turntable 31 on which the exposed optical disc master 1 is placed, a motor 32 that rotationally drives the turntable 31, and a vacuum suction device 33 that attracts the exposed optical disc master 1 to the turntable 31. Become. As shown in FIG. 14, the developer / pure water supply nozzle 14 is arranged in parallel with the exposed optical disc master 1 attached to the rotating unit 11, and each nozzle is disposed at a portion facing the exposed optical disc master 1. Holes 12a, 12b, 12c, 12d, 12e, and 12f are opened.

  When developing the exposed optical disc master 1, first, the developer / pure water supply nozzle 14 is retracted (the nozzle 14 is turned around the axis CL1 and retracted from above the turntable 31). Then, the exposed optical disc master 1 is mounted on the turntable 31 with the photoresist layer 2 facing upward. Next, the developer / pure water supply nozzle 14 is turned from the retracted position so that the axial direction of the developer / pure water supply nozzle 14 is as shown in FIG. That is, the developer / pure water supply nozzle 14 is turned and moved above the turntable 31.

  Subsequently, when the motor 32 is started and the rotational speed is stabilized, the developing solution 13 is discharged from the nozzle holes 12a, 12b, 12c, 12d, 12e, and 12f toward the photoresist layer 2, and the photoresist layer 2 Then, the developer 13 is spread over the entire surface to develop the photoresist layer 2 (exposure pattern area A).

  After the development is completed, the discharge liquid from the developer / pure water supply nozzle 14 is switched by the electromagnetic valve 17 to make the pure water 15, and the nozzle holes 12a, 12b, 12c, 12d, 12e, and 12f are directed to the photoresist layer 2. Then, the pure water 15 is discharged, the pure water 15 is spread over the entire surface of the photoresist layer 2, and the photoresist layer 2 is washed with water.

  After the washing with water, the rotational speed of the motor 32 is increased and the pure water 15 adhering to the photoresist layer 2 is shaken off to obtain the desired developed optical disc master 1.

  In the above description, the water is washed with pure water 15 after completion of development by switching with the electromagnetic valve 17 so that the same nozzle holes 12a, 12b, 12c, 12d, 12e, and 12f as the developer discharge ports are used. 15 may be used, but a nozzle dedicated to pure water (not shown) may be used. In the developing process, the developing solution 13 is suddenly developed. However, pre-washing may be performed for removing dust with the pure water 15 before discharging the developing solution.

The following can be listed as patent documents related to the above-described technology.
JP-A-8-315431 JP-A-61-8751 JP-A-4-362548 JP-A-60-179957 JP-A-6-243514 JP-A-6-60437 JP-A-1-220158

  When the development processing of the exposed optical disc master 1 is performed with the conventional development method and developing apparatus, the exposure optical disc master 1 in FIG. 15 is exposed to the optical disc master 1 in the portion of the exposure range (ring-shaped exposure range) A. There are a large number of developing liquid droplet lower nozzle holes 12a, 12b, 12c, 12d, 12e, and 12f, and the intervals (distances) between the nozzle holes 12a, 12b, 12c, 12d, 12e, and 12f are close. When the water flow of the developer 13 flowing out from each nozzle hole 12a, 12b, 12c, 12d, 12e, 12f spreads in a circular shape on the exposed optical disc master 1, the adjacent circular shape The spread contact portion violently interferes and the water flow (flow of the developer 13) is disturbed (see the hatched area DM15 shown in FIG. 15).

  In such a state where the water flow is disturbed, the development progresses extremely. For this reason, this region in the exposed portion (region where the water flow of the developer 13 is disturbed) is likely to be over-developed, and as a result, an over-developed state may occur in a ring shape that can be visually observed.

  Further, as a trend, in the spin development, the developer 13 flows out from the inner periphery of the optical disc master 1 toward the outer periphery, and at this time, the developer 13 supplied to the inner periphery is reduced in activity to the outer periphery. It flows and mixes with the developer 13 supplied to the outer peripheral portion, resulting in a decrease in the activity of the developer 13, and the progress of development becomes slow toward the outer peripheral portion. Such ring-shaped overdevelopment and slow development toward the outer circumference make it difficult to uniformly develop the exposed optical disc master 1.

  For this reason, when the supply of the developer 13 is stopped on the basis of a certain time, an appropriate development area and an underdeveloped area or an overdeveloped area are formed on the optical disc master 1, and the dimensions (size and depth) are larger than the design values. A small preformat pattern or a preformat pattern having a dimension larger than the design value may be formed.

  The playback signal level from the optical disk varies depending on the size of the preformat pattern when the intensity of the playback light and the size of the light spot are constant, so a highly uniform preformat pattern is formed on the inner and outer circumferences due to uneven development. Otherwise, the reproduction signal level fluctuates greatly and a reproduction error is likely to occur, which may cause inconveniences such as requiring a recording / reproducing apparatus with a complicated circuit configuration.

  Further, as shown in the data shown in Patent Document 6, in the spin development method, the relationship between the development droplet lower position and the development progress is the development droplet lower position as indicated by a line (solid line) indicating normal development in FIG. The degree of progress of development is high and the degree of progress tends to decrease with time. That is, in order to fully develop the developing activity of the developer 13, it is necessary to bring the dropping position close to the recording area of the optical disc master 1 so that the developer 13 immediately after dropping is supplied as soon as possible. However, if the height under the developing droplet is high or the amount under the developing droplet is excessive, drop energy is added or the flow becomes turbulent, the activity increases and the development progresses abnormally (the broken line indicating abnormal development in FIG. 16). As a result, abnormal development may result in an over-developed state in a ring shape so that the position under the developing droplet can be visually observed.

  From the above abnormal phenomenon, it should be avoided to bring the position below the developing droplet into the recording range of the optical disc master 1 in the radial direction. However, if it is separated from the recording range in the radial direction, the developing activity performance of the developer 13 will be described. It is difficult to fully exhibit the above, which leads to a large amount of use of the expensive developer 13 and is uneconomical.

  An optical disc has a lead-in area (lead-in area) and a lead-out area (lead-out area) at the start and end of the recording range, and the signal quality of each area is in the main signal area. Compared to about. From this, it is understood that the vicinity of the lead-in area and the lead-out area of the recording area is good as the position under the developing droplet.

  Further, a developing method as in Patent Document 7 has been proposed (see FIG. 13). Although this method uses two developing droplet lower nozzles 3A and 3B, the outer nozzle 3A is provided in the middle of the signal recording area, and the portion immediately below the developing droplet lower nozzle tends to be over-developed. In addition, when the development is insufficient on the outer peripheral side as monitored by the two sensors 7A and 7B on the inner and outer circumferences, it is a proposal to increase the amount of developer droplets dropped from the outer nozzle 3A provided in this signal recording area. However, as the flow rate increases at this time, the flow of the developer 13 changes from a laminar flow to a turbulent flow, and the over-development state immediately below the nozzle below the developing droplet further advances, and the over-developing portion is formed in a ring shape that can be visually observed. The risk of occurrence increases.

  Further, this is a method in which the development progress is corrected by monitoring with the two sensors 7A and 7B on the inner and outer circumferences, but it is only necessary that the area where the actual development progress is excessive and insufficient matches the position of the sensors 7A and 7B. The laser exposure power fluctuation at the time of recording and the resist sensitivity fluctuation are not uniform and cannot be simply corrected at two points.

  SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and an object of the present invention is to provide a master developing device and a developing method capable of forming a highly uniform preformat pattern that hardly causes uneven development in a recording area. The purpose is to do.

  In the invention of (1), while rotating the exposed master, the developer is supplied to the photoresist layer of the master, the photoresist layer of the master is developed, and the exposure pattern is applied to the surface of the master In the master developing method including a recording pattern forming step for forming a fine uneven recording pattern, the developing is performed by flowing the supplied developer in a steady flow on the surface of the master. Is the method.

  In the invention of (2), while rotating the exposed master, the developer is supplied to the photoresist layer of the master, the photoresist layer of the master is developed, and the exposure pattern is applied to the surface of the master In the developing method including a recording pattern forming step of forming a fine uneven recording pattern to be developed, the supplied developing solution is flowed as a laminar flow or a transitional flow on the surface of the master to develop the master. Is the method.

In the invention of (3), while rotating the exposed master, the developer is supplied to the photoresist layer of the master, the photoresist layer of the master is developed, and the surface of the master corresponds to the exposure pattern. In a developing method for a master including a recording pattern forming step for forming a fine uneven recording pattern as an exposure pattern region, when the developer is supplied to the photoresist layer, the developer is dropped onto the photoresist layer There are one or more dripping positions,
When the dropping position is singular, the dropping position is located at or near the boundary of the exposure pattern area or in the exposure pattern area, and when there are a plurality of dropping positions, the exposure pattern area Each dropping position is located in any one of the boundary, the vicinity of the boundary, and the exposure pattern area, and the developer dropped at each dropping position spreads over the surface of the master and interferes with each other. This is a master development method in which each of the dropping positions is located such that when the interference region is formed, no turbulent flow is generated in the developer in the interference region.

  In the invention of (4), a developer is supplied to the photoresist layer of the optical disk master while rotating the exposed optical disk master formed in a flat disk shape, and the photoresist layer of the optical disk master is In the developing method of an optical disc master, which includes a recording pattern forming step of developing and forming a fine uneven recording pattern corresponding to an exposure pattern on the surface of the optical disc master, the surface on which the recording pattern is formed is a ring When the developer is supplied to the photoresist layer, the first dropping position where the developer is dropped onto the photoresist layer is located on the inner side of the ring-shaped recording pattern forming surface. A second dropping position that is located at the boundary and drops the developer onto the photoresist layer when supplying the developer to the photoresist layer A developing process of the master optical disc is located outside the boundaries of the ring-shaped recording pattern forming surface.

  The invention of (5) includes a table that has a horizontal upper surface on which the exposed master is placed, rotates around an axis extending in the vertical direction through the center of the exposed master that has been placed, and development A developer supply means for supplying a developer to the photoresist layer of the master that is mounted on the table and rotates so that the liquid flows as a laminar flow or a transition flow on the surface of the master; It is a developing device.

  According to the present invention, while rotating the exposed master, the developer is supplied to the photoresist layer of the master, the photoresist layer of the master is developed, and the surface of the master corresponds to the exposure pattern. In a master development method and development apparatus including a recording pattern forming process for forming a fine uneven recording pattern, it is possible to form a highly uniform preformat pattern that hardly causes uneven development in a recording area of the master. Play.

  FIG. 1 is a diagram showing a schematic configuration of a developing device 51 used for developing the optical disc master 1 according to the embodiment of the present invention, and FIG. 2 is a plan view of the developing device 51 used for developing the optical disc master 1. In particular, the flow of the developer / pure water supply nozzle 14, the optical disc master 1, and the developer 13 is shown.

  The developing device 51 used for developing the optical disc master 1 is substantially the same as the conventional developing device except that the developing solution / pure water supply nozzle 14a is different from the conventional developing device shown in FIG. Has been. Accordingly, the same components as those of the conventional developing device shown in FIG.

  The developing device 51 includes a base member (not shown), a table (turn table) 31, and a developer supply means 53.

  The table 31 has a horizontal upper surface 55 on which the exposed optical disc master 1 formed in a flat disk shape is placed with the photoresist layer 2 of the optical disc master 1 on top. Then, by an actuator such as a motor 32, the center member O is passed through the center of the exposed exposed optical disc master 1 and the center axis O extending in the vertical direction is the center of rotation. For example, the arrow AR1 shown in FIG. It is designed to rotate in the direction of. Note that the center of the table 31 and the center of the optical disc master 1 placed on the table 31 coincide with each other.

  The optical disc master 1 placed on the table 31 is integrally held on the table 31 by holding means using a vacuum suction device 33, for example.

  The developer supply means 53 is configured to supply the developer 13 to the photoresist layer 2 of the optical disc master 1 that is mounted on the table 31 and is rotating. The developer 13 supplied by the developer supply means 53 flows on the surface of the optical disc master 1 (on the optical disc master 1) as a laminar flow or in a transition state (flows as a transition flow). It has become. Then, the supplied developing solution 13 develops the photoresist layer 2 (more precisely, the exposure pattern) of the optical disc master 1, and the surface of the optical disc master 1 has a fine uneven recording pattern (corresponding to the exposure pattern). The recording pattern in the exposure pattern area A) is formed.

  When the developer 13 supplied by the developer supply means 53 flows on the surface of the optical disc master 1, a laminar flow and a transition state may be mixed. That is, a part of the flow may be laminar and the other part may be in a transition state, so long as turbulence does not occur.

  By the way, the transition state is a state in which a low viscosity layer remains in the developer 13. The viscosity low layer (viscous sublayer) is a layer in which the turbulence of the flow of the developer 13 is small in the vicinity of the wall surface (the surface of the optical disc master 1) because the influence of the viscosity of the fluid molecules (molecules of the developer 13) is significant. It is. In the transition state, the low-viscosity layer has a predetermined thickness, and the effect of the surface of the optical disc master 1 (development) is almost the same as in the case of laminar flow. That is, overdevelopment of the optical disc master 1 can be avoided. On the other hand, when the developer 13 becomes a turbulent flow in the optical disc master 1, only a very low viscosity low layer remains, and there is a possibility that overdevelopment may occur in the optical disc master 1.

  The developer supply means 53 includes a developer / pure water supply nozzle 14a. A switching valve such as the electromagnetic valve 17 is provided on the upstream side of the developer / pure water supply nozzle 14a. By switching the electromagnetic valve 17, the developer 13 or pure water 15 is changed to the developer / pure water. The optical disc master 1 placed on the table 31 can be supplied via the supply nozzle 14a.

  The developer / pure water supply nozzle 14a includes a nozzle body 57 formed in an elongated cylindrical shape, and two projecting portions 59A and 59B provided integrally with the nozzle body 57 so as to project downward in the circumferential direction of the nozzle body 57. And is configured. The base end portion side of the nozzle body 57 is connected to the electromagnetic valve 17 through a pipe, and the tip portion (left end in FIG. 1) of the nozzle body 57 is covered.

  The nozzle body 57 is provided so as to be separated from the optical disc master 1 on the upper side of the optical disc master 1 placed on the table 31 and extend in the horizontal direction so that the protruding portions 59A and 59B face downward. Further, the nozzle body 57 (developer / pure water supply nozzle 14a) is centered on the turning axis CL1 extending in the vertical direction through the base end side portion of the nozzle body 57 located outside the table 31. ) Will turn.

  The range in which the turning is performed is a range between the position shown in FIG. 2 and a position where the turning is performed by a predetermined angle such as 90 ° about the turning axis CL1. By turning a predetermined angle from the position shown in FIG. 2, the nozzle body 57 (developer / pure water supply nozzle 14a) does not get in the way when the optical disc master 1 is attached to or detached from the table 31.

  The nozzle body 57 (developer / pure water supply nozzle 14 a) position shown in FIG. 2 is a position when the developer 13 or pure water 15 is supplied to the optical disc master 1 placed on the table 31. In the state shown in FIG. 2 in a plan view, the nozzle body 57 extends through the center (rotation center axis O) of the optical disc master 1 placed on the table 31. Further, the base end portion of the nozzle body 57 is located outside the table 31, and the tip end side of the nozzle body 57 extends to the opposite side to the base end portion of the nozzle body 57 with respect to the rotation center axis O. ing. The tip of the nozzle body 57 extends to the middle of the exposure pattern area A, for example.

  By the way, the recording area (exposure pattern area; surface on which the recording pattern is formed) A is a surface (see FIG. 11B) on which the exposure pattern is formed. As shown in FIG. It is formed as a surface. That is, the first circle drawn on one plane in the thickness direction of the optical disc master 1 has a diameter smaller than the diameter of the optical disc master 1 and the center coincides with the center (rotation center axis) O of the optical disc master 1. A second circle drawn on the one plane, the second circle having a diameter smaller than the first circle and having a center coincident with the first circle. A recording area A is formed in the removed area. When developing, the optical disc master 1 is rotated so that the recording area A is a horizontal upper surface.

  The protruding portion 59A provided integrally with the nozzle body 57 is located when the nozzle body 57 (developer / pure water supply nozzle 14a) is positioned as shown in FIG. 2 (the photoresist layer 2 including the recording area A). When the developing solution 13 is supplied), it is located at the inner boundary of the ring-shaped exposure pattern (recording pattern) forming surface A in plan view.

  Further, the projecting portion 59B provided integrally with the nozzle body 57 has a ring shape in plan view when the nozzle body 57 (developer / pure water supply nozzle 14a) is located at the position shown in FIG. It is an outer boundary of the exposure pattern forming surface A and is located on the opposite side to the protruding portion 59A with respect to the rotation center axis O of the optical disc master 1.

  The protruding portion 59A is provided with a circular nozzle hole (developer discharge port) 12i, and the protruding portion 59B is provided with a circular nozzle hole (developer discharge port) 12o. Therefore, in plan view, when developing the ring-shaped exposure pattern forming surface A, the nozzle hole 12i is positioned at the inner boundary of the ring-shaped exposure pattern forming surface A, and the nozzle hole 12o is formed in the ring shape. It is located at the outer boundary of the exposure pattern forming surface A. The developer 13 is dropped on each boundary.

  The dropping position of the developer 13 will be described in more detail.

  As described above, the developing solution 13 is discharged from the circular discharge port (developing solution discharge port) 12i positioned above the optical disc master 1 in the downward direction. The discharged and dropped developer 13 is laminar and has a circular cross section due to a horizontal plane. Further, in the vicinity of the discharge port 12i, the diameter of the circular cross section (the cross section of the discharged developer 13) is substantially equal to the diameter of the discharge port 12i, but as it approaches the optical disc master 1 from the discharge port 12i (goes downward). The diameter of the circular cross section is reduced. However, since the change in the diameter of the circular cross section is slight, the developer 13 discharged from the circular discharge port 12i in the following description of the dropping position has the circular cross section for easy understanding. It is assumed that the diameter is substantially constant and equal to the inner diameter of the discharge port 12i. The same applies to the discharge port 12o.

  Therefore, when the dropping position of the developer 13 is located at the boundary of the exposure pattern area A, the boundary line between the exposure pattern area A and the non-exposure pattern area of the optical disc master 1 in plan view is the ejection port 12i. This refers to the case of passing through the circle (12o) (see FIG. 2) or contacting the circle of the discharge port 12i (12o).

  In addition, the case where the dropping position of the developer 13 is located near the boundary of the exposure pattern area A means that the boundary line between the exposure pattern area A and the non-exposure pattern area of the optical disc master 1 is seen in plan view. When located very close to the circle of the outlet 12i (12o) (for example, the distance between the boundary line and the outer periphery of the circle of the outlet 12i (12o) is larger than the diameter of the circle of the outlet 12i (12o)) Is also small). In this case, the circle of the discharge port 12i (12o) may exist in the exposure pattern area A or may exist in the non-exposure pattern area. Since the circle of the discharge port 12i (12o) exists in the non-exposure pattern area, overdevelopment on the exposure pattern forming surface A (overdevelopment as indicated by a broken line in FIG. 16) can be suppressed.

  The case where the dropping position of the developer 13 is located in the exposure pattern area A refers to the case where the discharge port 12i (12o) circle is located in the exposure pattern area A of the optical disc master 1 in plan view. Further, the case where the dropping position of the developer 13 is located in the non-exposed pattern area means, for example, the case where the dropping position is located at each position PSi, PSo as indicated by a broken line in FIG. Even in this case, the dropping position exists in the photoresist layer 2 (the upper surface of the optical disc master 1).

  The discharge port 12i corresponding to the dropping position of the developer 13 may be located in the lead-in area of the exposure pattern forming surface A. As a result, overdevelopment on the exposure pattern forming surface A excluding the lead-in area (overdevelopment as indicated by a broken line in FIG. 16) can be suppressed. Similarly, the discharge port 12o corresponding to the dropping position of the developer 13 may be located in the lead-out area of the exposure pattern forming surface A.

  Further, as already understood, the case where the pure water 15 is dropped is the same as the case where the developer 13 is dropped, but in addition to the developer / pure water supply nozzle 14a shown in FIGS. 1 and 2, A nozzle dedicated to pure water (for example, a conventional nozzle 14 having a large number of discharge ports) is provided, and after developing by dropping the developer 13 from the nozzle 14a, a large number of discharge ports are provided. Alternatively, pure water 15 may be dropped from the nozzle 14 to rinse the optical disc master 1.

  Next, a developing method for the optical disc master 1 will be described. The developing method described below is performed by, for example, the developing device (the developing device of the optical disc master 1) 51 described above.

  The developing method of the optical disc master 1 is that a developer is applied to the photoresist layer 2 of the optical disc master 1 while the exposed optical disc master 1 formed in a flat disk shape is rotated about the central axis O. 13, the photoresist layer 2 of the optical disc master 1 is developed, and a recording pattern forming step for forming a fine uneven recording pattern corresponding to the exposure pattern on the surface of the optical disc master 1 is included.

  In the developing method of the optical disc master 1, the surface A on which the exposure pattern is formed is formed in a ring shape as described above. Further, when supplying the developer 13 to the photoresist layer 2 (dropping), the first dropping position where the developer 13 is discharged and the developer 13 is dropped onto the photoresist layer 2 is the ring-shaped exposure pattern forming surface. A second position in which the developing solution 13 is discharged to drop the developing solution 13 onto the photoresist layer 2 when the developing solution 13 is supplied (dropped) to the photoresist layer 2. The dropping position is an outer boundary of the ring-shaped exposure pattern forming surface A, and is located on the opposite side to the first dropping position with respect to the rotation center axis O of the optical disc master 1.

  In the developing method of the optical disc master 1, the position at which the developer 13 is discharged and dropped onto the photoresist layer 2 when supplying the developer 13 to the photoresist layer 2 of the optical disc master 1 is set on the inner peripheral side of the exposure pattern area A. Since the boundary position and the boundary position of the exposure pattern area A on the outer peripheral side are two places, this is different from the conventional method using a multi-nozzle hole (method for discharging the developer 13 from a number of developer discharge holes). That is, the water flow of the developer 13 that has flowed out in a laminar flow from the nozzle holes 12i and 12o on the inner peripheral side and the outer peripheral side of the boundary position of the exposure pattern area A has changed the range of the recording area A on the exposed optical disc master 1. It spreads smoothly in a circular shape, and the water flow of the developer 13 does not collide violently, but flows out toward the outer periphery in a fan shape by the rotation of the optical disc master 1.

  That is, in each of the circular regions shown in FIG. 2 (regions on the optical disc master 1 located immediately below the respective ejection ports 12i and 12o) DM21 and DM22, the developer 13 is a thick laminar flow toward the outer periphery of the circle. Flowing. Further, in each of the regions DM23 and DM24, the developer 13 becomes a thin laminar flow and flows on the outer periphery of the optical disc master 1 as indicated by arrows AR23 and AR24, for example. Further, in a region where the developer 13 dropped from the nozzle holes 12i and 12o collides with each other (region on the optical disc master 1), the flow of the developer 13 in a slightly disturbed transition state as indicated by the arrows AR21 and AR22. Occurs.

  A line L1 shown in FIG. 2 is the center line (center line extending in the horizontal direction) of the developer / pure water supply nozzle 14a and passes through the center axis O of the table 31 in plan view. 2 is a line that is perpendicular to the center line L1, passes through the center axis O of the table 31 in plan view, and extends in the horizontal direction (hereinafter the same in FIGS. 4 to 10). ). The reason why the center lines L1 and L2 are drawn is to make it easy to see the state of the flow of the developer 13 with reference to the center lines L1 and L2.

  By forming the flow of the developer 13 as shown in FIG. 2, the entire region of the photoresist layer 2 can be developed almost uniformly. Therefore, it is possible to avoid the inconvenience caused by uneven development, that is, the inconvenience that the fluctuation of the reproduction signal level becomes large and the reproduction error is likely to occur, and the inconvenience that the recording / reproducing apparatus having a complicated circuit configuration is required. be able to.

  Further, it is possible to suppress the tendency that the outer peripheral portion peculiar to the spin development is insufficiently developed as indicated by a line (solid line) indicating normal development in FIG. That is, since the fresh developer 13 spreads in a circular shape from the nozzle hole 12o on the outer peripheral side of the boundary position of the exposure pattern area A, the problem of insufficient development at the outer peripheral portion of the optical disc master 1 is overcome as shown in FIG. be able to. FIG. 3 shows the degree of development progress of the developer 13 dropped from the respective nozzle holes 12i and 12o on the inner and outer circumferences of the optical disc master 1. This shows that the outer peripheral side nozzle 12o corrects the delay in the development progress on the outer peripheral side by the inner peripheral side nozzle 12i.

By the way, in the developing device 51 of the optical disc master 1, for example, a stainless pipe having an outer diameter of 6 mm and an inner diameter of 4 mm is adopted as the nozzle body 57 of the developer / pure water supply nozzle 14a. The inner diameters of the discharge ports 12i and 12o are 4 mm. The flow rate of the developer 13 dropped from the discharge port 12i and the flow rate of the developer 13 dropped from the discharge port 12o are substantially equal to each other, for example, and the total flow rate of the developer 13 dropped from the discharge ports 12i and 12o is , depending on the type of optical disc master 1 ^but are to 500cm ³ / min~1000cm 3 / min. The rotation speed of the turntable 31 on which the exposed optical disc master 1 is placed when the developer 13 is discharged toward the photoresist layer 2 of the optical disc master 1 is 100 rev / min to 300 rev / min.

  Further, as an example, a case will be described in which various types of format discs of DVD or BD (Blu-ray Disc) having a diameter of 120 mm are developed using the optical disc master 1 having an outer diameter of 200 mm. The exposure range (exposure pattern area) A has a radius of 23 mm to 59 mm, the position of the discharge port 12i in plan view is 23 mm (the distance from the central axis O is 23 mm), and the position of the discharge port 12o in plan view is the radius. 59 mm (the distance from the central axis O is 59 mm).

The inner diameter of each discharge port 12i (12o) is 4 mm, the flow rate of the developer 13 dropped from the discharge port 12i is 250 cm ³ / min, and the flow rate of the developer 13 dropped from the discharge port 12o is 250 cm ^3. / Min. In this case, the flow rate of the developer 13 flowing out from the discharge port 12i (12o) is 32 cm / sec. The flow rate of the developer 13 flowing out from the discharge port 12i (12o) is the same in the case shown in FIGS. 8, 9, and 10 (two discharge ports are provided), and flows out from the discharge port 12. The flow rate of the developing solution 13 is 500 cm ³ / min in the case shown in FIGS. 5, 6, and 7 (one provided with one discharge port).

  With the above setting, development is performed for 30 seconds, and the exposure power is determined so as to form an appropriate groove (groove between the photoresists 21 shown in FIG. 11C) by development. Under these conditions, the positions of the developing droplet lower position at the radius of 23 mm and the radius of 59 mm are not over-developed, but the developing droplet lower position is shifted by about 4 mm, which is the size of the nozzle hole 12 i (12 o), and the position of the nozzle hole 12 i is reached. If the radius is 19 mm and the position of the nozzle hole 12 o is 63 mm, the safety is further increased. That is, overdevelopment in the exposure range A can be prevented more reliably.

  The gap between the surface (upper surface) of the exposed optical disc master 1 and the nozzle holes 12i and 12o (lower ends of the protruding portions 59A and 59B) (the falling distance of the developer 13) was 15 mm. The developer dropping distance is appropriate to be about 15 mm from the viewpoint of operability when attached to the optical disc master 1 and prevention of contamination of the developer / pure water supply nozzle 14a due to rebound of the developer 13.

  When the rotational speed of the turntable 31 is 100 rev / min, the flow of the laminar and circular developer 13 that has fallen onto the optical disc master 1 from the nozzle holes 12i and 12o spreads to a diameter of about 30 mm, and then the rotational force and The spread in the opposite direction eventually loses the rotational force, reverses the direction along the circular shape, and spreads in a fan shape in the outer peripheral direction. On the other hand, the spread in the same direction as the rotational force smoothly spreads in the outer peripheral direction in a fan shape by the rotational force while maintaining a laminar flow.

  When doing so, the flow of the developer 13 supplied onto the photoresist layer 2 from each nozzle hole 12i, 12o becomes a fan-like flow of the developer 13 without being disturbed and disturbed violently, The developer 13 does not cause film breakage, and the exposed pattern area (recording range) A of the exposed optical disc master 1 is always developed with the fresh and highly active developer 13. Therefore, the entire recording range A of the exposure pattern area of the photoresist layer 2 is developed almost uniformly, and inconvenience due to uneven development can be avoided.

  Incidentally, as shown in FIG. 4, the dropping position of the developer 13 may be changed.

  The developing device of the optical disc master 1 shown in FIG. 4 (developing method of the optical disc master 1) is shown in FIGS. 1 and 2 except that the dropping position of the developer 13 is different from that shown in FIGS. It is almost the same as the thing.

  That is, in the developing device of the optical disc master 1 shown in FIG. 4 (developing method of the optical disc master 1), when developing the ring-shaped exposure pattern forming surface A, the nozzle holes 12i are formed in a ring-shaped exposure pattern in plan view. The nozzle hole 12o is located at the inner boundary of the surface A, and is the outer boundary of the ring-shaped exposure pattern forming surface A and on the same side as the nozzle hole 12i with respect to the rotation center axis O of the optical disc master 1. positioned. That is, the nozzle holes 12i and 12o are closer to each other than that shown in FIG.

  Even in the case shown in FIG. 4, the flows of the developer 13 supplied onto the photoresist layer 2 from the nozzle holes 12i and 12o do not interfere with each other and are not disturbed. And since it becomes the fan-shaped flow of the developing solution 13, the effect similar to the apparatus shown in FIG.1 and FIG.2 can be acquired.

  That is, in each of the circular regions shown in FIG. 4 (regions on the optical disc master 1 located immediately below the respective ejection ports 12i and 12o) DM41 and DM42, the developer 13 is a thick laminar flow on the outer circumference side of the circle. Flowing. Further, in each of the regions DM43 and DM44, the developer 13 becomes a thin laminar flow and flows to the outer periphery of the optical disc master 1 as indicated by arrows AR43 and AR44, for example. Furthermore, in the region where the developer 13 dropped from the nozzle holes 12i and 12o collides with each other (region on the optical disc master 1), the flow of the developer 13 in the transition state slightly disturbed as indicated by the arrows AR41 and AR42. Occurs.

  The developing device of the optical disc master 1 shown in FIG. 5 (developing method of the optical disc master 1) is also shown in FIG. 1 and FIG. 2 except that the dropping position of the developer 13 is different from that shown in FIG. The effect is almost the same as that shown in FIG. 1, and substantially the same effect as that shown in FIGS. 1 and 2 can be obtained.

  That is, in the developing device for the optical disc master 1 shown in FIG. 5 (developing method of the optical disc master 1), when developing the ring-shaped exposure pattern forming surface A, the nozzle hole 12 is seen in plan view with one nozzle hole 12. Is the inner boundary of the ring-shaped exposure pattern forming surface A.

In the circular area shown in FIG. 5 (area on the optical disc master 1 located immediately below the discharge port 12) DM52, the developer 13 flows in a thick laminar flow toward the outer periphery of the circle. Since the discharge amount (500 cm ³ / min) of the developer 13 flowing out from the discharge port 12 is larger than that shown in FIG. 2 (250 cm ³ / min), the region DM52 flows out from the region DM51 (discharge port 12). This is an area formed when the discharge amount of the developer 13 is 250 cm ³ / min and is listed as a reference).

  Further, in each of the regions DM53 and DM54 on both sides of the boundary line L3, the developer 13 becomes a thin laminar flow and flows to the outer periphery of the optical disc master 1 as indicated by arrows AR53 and AR54, for example. The film thickness of the developer 13 in the region DM54 is thicker than the film thickness of the developer 13 in the region DM53. Further, in a region where the developer 13 dropped from the nozzle hole 12 collides with each other (region on the optical disc master 1), the flow of the developer 13 in a slightly disturbed transition state is generated as indicated by an arrow AR51.

  The developing device for the optical disc master 1 shown in FIG. 6 (developing method for the optical disc master 1) is substantially the same as that shown in FIG. 5 except that the dropping position of the developer 13 is different from that shown in FIG. The effect similar to that shown in FIG. 5 (FIGS. 1 and 2) can be obtained.

  That is, in the developing device of the optical disc master 1 shown in FIG. 6 (developing method of the optical disc master 1), when developing the ring-shaped exposure pattern forming surface A, the nozzle hole 12 is shown in plan view with one nozzle hole 12. Is the outer boundary of the ring-shaped exposure pattern forming surface A.

  In the circular area shown in FIG. 6 (area on the optical disc master 1 positioned immediately below the discharge port 12) DM62, the developer 13 flows in a thick laminar flow toward the outer periphery of the circle. Note that, similarly to the case shown in FIG. 5, the region DM62 is larger than the region DM61.

  Further, in each of the regions DM63 and DM64, the developer 13 becomes a thin laminar flow and flows to the outer periphery of the optical disc master 1 as indicated by arrows AR63 and AR64, for example. The film thickness of the developer 13 in the region DM63 is thicker than the film thickness of the developer 13 in the region DM64. Further, in the developer 13 dripped from the nozzle hole 12, a slightly disturbed transition state flow occurs as indicated by an arrow AR62 and an arrow AR62.

  The developing device for the optical disc master 1 shown in FIG. 7 (developing method for the optical disc master 1) is substantially the same as that shown in FIG. 5 except that the dropping position of the developer 13 is different from that shown in FIG. The effect similar to that shown in FIG. 5 (FIGS. 1 and 2) can be obtained.

  That is, in the developing device of the optical disc master 1 shown in FIG. 7 (developing method of the optical disc master 1), when developing the ring-shaped exposure pattern forming surface A, the nozzle hole 12 is shown in plan view with one nozzle hole 12. Is within the region of the ring-shaped exposure pattern forming surface A (for example, approximately the center of the width of the ring-shaped exposure pattern forming surface A).

  In the circular area shown in FIG. 7 (area on the optical disc master 1 positioned immediately below the ejection port 12) DM72, the developer 13 flows in a thick laminar flow toward the outer periphery of the circle. Similar to the case shown in FIG. 5, the region DM72 is larger than the region DM71.

  Further, in each of the regions DM73 and DM74 on both sides of the boundary line L4, the developer 13 becomes a thin laminar flow and flows to the outer peripheral side of the optical disc master 1 as indicated by arrows AR73 and AR74, for example. The film thickness of the developer 13 in the region DM73 is larger than the film thickness of the developer 13 in the region DM74. Furthermore, in a region where the developer 13 dropped from the nozzle hole 12 collides with each other (region on the optical disc master 1), a slightly disturbed transition of the developer 13 flows as indicated by an arrow AR71.

  The developing device of the optical disc master 1 shown in FIG. 8 (developing method of the optical disc master 1) is shown in FIGS. 1 and 2 except that the dropping position of the developer 13 is different from that shown in FIGS. It is almost the same as the thing.

  That is, in the developing device of the optical disc master 1 (developing method of the optical disc master 1) shown in FIG. 8, when developing the ring-shaped exposure pattern forming surface A, the nozzle holes 12i are formed in a ring-shaped exposure pattern in plan view. The nozzle hole 12o is located on the inner boundary of the surface A, and is the outer boundary of the ring-shaped exposure pattern forming surface A, and is 90 to the nozzle hole 12i with respect to the rotation center axis O of the optical disc master 1. It is located at a deviated position. That is, the nozzle holes 12i and 12o are closer to each other than the one shown in FIG. 2, but the nozzle holes 12i and 12o are separated from each other as compared to the one shown in FIG.

  Even in the case shown in FIG. 8, the flow of the developer 13 supplied from the nozzle holes 12 i and 12 o onto the photoresist layer 2 is not disturbed by intense interference. And since it becomes the fan-shaped flow of the developing solution 13, the effect similar to the case shown in FIG.1 and FIG.2 can be acquired.

  That is, in each of the circular regions shown in FIG. 8 (regions on the optical disc master 1 located immediately below the ejection ports 12i and 12o) DM81 and DM82, the developer 13 is a thick laminar flow toward the outer periphery of the circle. Flowing. Further, in each of the regions DM83 and DM84, the developer 13 becomes a thin laminar flow and flows to the outer periphery of the optical disc master 1 as indicated by arrows AR83 and AR84, for example. Further, in the region where the developer 13 dropped from the nozzle holes 12i and 12o collides with each other (region on the optical disc master 1), the flow of the developer 13 in the transition state slightly disturbed as indicated by the arrows AR81 and AR82. Occurs.

  The developing device of the optical disc master 1 shown in FIG. 9 (developing method of the optical disc master 1) is the same as that shown in FIG. 8 (FIGS. 1 and 2) except that the dropping position of the developer 13 is different from that shown in FIG. It is almost the same as shown.

  That is, in the developing device of the optical disc master 1 shown in FIG. 9 (developing method of the optical disc master 1), when developing the ring-shaped exposure pattern forming surface A, the nozzle holes 12i are formed in a ring-shaped exposure pattern in plan view. Near the inner boundary of the surface A and located in the ring-shaped exposure pattern forming surface A, the nozzle hole 12o is near the outer boundary of the ring-shaped exposure pattern forming surface A, It is located in the ring-shaped exposure pattern forming surface A. Further, the nozzle hole 12 o is positioned 90 ° away from the nozzle hole 12 i with respect to the rotation center axis O of the optical disc master 1.

  Even in the case shown in FIG. 9, the flows of the developer 13 supplied onto the photoresist layer 2 from the nozzle holes 12i and 12o do not interfere with each other and are not disturbed. And since it becomes the fan-shaped flow of the developing solution 13, the effect similar to the case shown in FIG. 8 (FIG. 1 and FIG. 2) can be acquired.

  That is, in each of the circular regions shown in FIG. 9 (regions on the optical disc master 1 located immediately below the ejection ports 12i and 12o) DM91 and DM92, the developer 13 is a thick laminar flow toward the outer periphery of the circle. Flowing. Further, in each of the regions DM93 and DM94, the developer 13 becomes a thin laminar flow and flows to the outer periphery of the optical disc master 1 as indicated by arrows AR93 and AR94, for example. Further, in the region where the developer 13 dropped from the nozzle holes 12i and 12o collides with each other (the region on the optical disc master 1), the flow of the developer 13 in a slightly disturbed transition state as indicated by the arrows AR91 and AR92. Occurs.

  The developing device of the optical disc master 1 shown in FIG. 10 (developing method of the optical disc master 1) is the same as that shown in FIG. 9 (FIGS. 1 and 2) except that the dropping position of the developer 13 is different from that shown in FIG. It is almost the same as shown.

  That is, in the developing device for the optical disc master (developing method of the optical disc master) shown in FIG. 10, when developing the ring-shaped exposure pattern forming surface A, the nozzle holes 12i are formed in the ring-shaped exposure pattern forming surface A in plan view. Near the inner boundary of the ring, and is located away from the ring-shaped exposure pattern forming surface A (inside the ring-shaped exposure pattern forming surface A), and the nozzle holes 12o are formed in the ring-shaped exposure pattern. It is in the vicinity of the outer boundary of the formation surface A and is located away from the ring-shaped exposure pattern formation surface A (outside the ring-shaped exposure pattern formation surface A). Furthermore, the nozzle hole 12o is positioned at an obtuse angle (for example, 120 °) of 90 ° or more with respect to the nozzle hole 12i with respect to the rotation center axis O of the optical disc master 1.

  Even in the case shown in FIG. 10, the flow of the developer 13 supplied from the nozzle holes 12i and 12o onto the photoresist layer 2 does not interfere with each other and are not disturbed. And since it becomes the fan-shaped flow of the developing solution 13, the effect similar to the apparatus shown in FIG. 9 (FIG. 1 and FIG. 2) can be acquired.

  That is, in each of the circular regions shown in FIG. 10 (regions on the optical disc master 1 located immediately below the ejection ports 12i and 12o) DM101 and DM102, the developer 13 is a thick laminar flow toward the outer periphery of the circle. Flowing. Further, in each of the regions DM103 and DM104, the developer 13 becomes a thin laminar flow and flows to the outer periphery of the optical disc master 1 as indicated by arrows AR103 and AR104, for example. Further, in the region where the developer 13 dropped from the nozzle holes 12i and 12o collides with each other (the region on the optical disc master 1), the flow of the developer 13 in a slightly disturbed transition state as indicated by the arrows AR101 and AR102. Occurs.

  In the development method described above, a developer is supplied to the photoresist layer of the optical disc master while the exposed optical disc master 1 is driven to rotate, the photoresist layer of the optical disc master is developed, and the optical disc master In a developing method of an optical disc master including a recording pattern forming step for forming a fine uneven recording pattern corresponding to an exposure pattern on the surface, when supplying the developer to the photoresist layer, the developer is discharged to When there are one (only one) or plural (two or more) dropping positions where the developer is dropped onto the photoresist layer, and there is a single dropping position, the boundary of the exposure pattern area or the vicinity of the boundary Alternatively, when the dropping position is located in the exposure pattern area, and there are a plurality of dropping positions, the exposure pattern area Each dropping position is located in the boundary, in the vicinity of this boundary, or in the exposure pattern area, and the developer dropped at each dropping position spreads on the surface of the optical disc master (on the master). When the interference area is formed by interference with each other, the turbulent flow is not generated in the developer in the interference area (the laminar flow of the developer or the flow in the transition state is maintained in the interference area). It is an example of the developing method of the optical disc master in which each of the dropping positions (each dropping position that is separated from each other by a predetermined distance) is located.

  In the above embodiment, the optical disc master is described as an example. However, the above embodiment is also applied to other masters other than the optical disc master (for example, a master for printing used in a manufacturing process of a semiconductor, a printed circuit board, and the like). Forms can be applied.

  Further, in the developing method described above, while rotating the exposed master, the developer is supplied to the photoresist layer of the master to develop the photoresist layer of the master, and an exposure pattern is formed on the surface of the master. In a developing method including a recording pattern forming step for forming a corresponding fine uneven recording pattern, the supplied developer is flowed as a laminar flow or in a transition state on the surface of the master (on the optical disc master), It is an example of the image development method of the original disk which performs the said image development process.

  According to this developing method, the developer supplied to the photoresist layer of the master disc flows as a laminar flow and in a transition state on the master disc surface, so that development unevenness in the recording area of the master disc is less likely to occur. A high preformat pattern can be formed.

  Further, in the developing method described above, while rotating the exposed master, a developing solution is supplied to the photoresist layer of the master to develop the photoresist layer of the master, and an exposure pattern is formed on the surface of the master. In a master development method including a recording pattern forming step for forming a corresponding fine uneven recording pattern, the supplied developer is flowed in a steady flow on the surface of the master (on the optical disc master). This is an example of the developing method of the master for performing the developing process.

  Here, the steady flow refers to the same location (based on the base member of the developing device or the developer / pure water supply nozzle 14a), even though the flow state is different at different locations along the flow path of the developer. In the same location) developer / pure water supply nozzle 14a), the flow state does not change with respect to time (even if the time elapses). Incidentally, the unsteady flow is a flow that is not a steady flow, and is a flow in which the flow state changes with time (with the passage of time) even in the same place.

  Even with this development method, since the developer supplied to the photoresist layer of the master disk flows in a steady flow on the surface of the master disk, uneven development in the recording area of the master disk is unlikely to occur, for example, a highly uniform preformat pattern is formed. can do.

1 is a diagram showing a schematic configuration of a developing device 51 used for developing an optical disc master 1 according to an embodiment of the present invention. FIG. 2 is a plan view of a developing device 51 used for developing the optical disc master 1, and particularly shows the flow of the developer / pure water supply nozzle 14, the optical disc master 1, and the developer 13. 7 is a diagram showing the degree of development progress of the developer 13 dropped from the respective nozzle holes 12i and 12o on the inner and outer circumferences of the optical disc master 1. FIG. FIG. 3 is a diagram in which the dropping position of the developer 13 is changed, and corresponds to FIG. 2. FIG. 3 is a diagram in which the dropping position of the developer 13 is changed, and corresponds to FIG. 2. FIG. 3 is a diagram in which the dropping position of the developer 13 is changed, and corresponds to FIG. 2. FIG. 3 is a diagram in which the dropping position of the developer 13 is changed, and corresponds to FIG. 2. FIG. 3 is a diagram in which the dropping position of the developer 13 is changed, and corresponds to FIG. 2. FIG. 3 is a diagram in which the dropping position of the developer 13 is changed, and corresponds to FIG. 2. FIG. 3 is a diagram in which the dropping position of the developer 13 is changed, and corresponds to FIG. 2. FIG. 7 is a first manufacturing process diagram for explaining an optical disk manufactured by an embodiment of the developing device and the developing method of the present invention and a conventional developing device. FIG. 7 is a second manufacturing process diagram for explaining an optical disk manufactured by an embodiment of the developing device and the developing method of the present invention and a conventional developing device. It is a figure which shows the conventional developing device. It is a figure which shows the conventional developing device. It is a top view which shows the conventional developing device. It is a figure which shows a development state.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Optical disk master 2 Photoresist layer 12, 12i, 12o Nozzle hole 13 Developer 14a Nozzle 15 Pure water 31 Tenn table 51 Developing apparatus 53 Developer supply means

Claims (5)

While rotating the exposed master, a developer is supplied to the photoresist layer of the master, the photoresist layer of the master is developed, and a fine uneven recording corresponding to the exposure pattern on the surface of the master In the developing method of the master including a recording pattern forming step for forming a pattern,
A developing method for a master, wherein the developing is performed by flowing the supplied developer in a steady flow on the surface of the master. While rotating the exposed master, a developer is supplied to the photoresist layer of the master, the photoresist layer of the master is developed, and a fine uneven recording corresponding to the exposure pattern on the surface of the master In a development method including a recording pattern forming step of forming a pattern,
A developing method for a master, wherein the developer is supplied by flowing the supplied developer as a laminar flow or a transition flow on the surface of the master. While rotating the exposed master, a developer is supplied to the photoresist layer of the master, the photoresist layer of the master is developed, and a fine uneven recording corresponding to the exposure pattern on the surface of the master In the method for developing a master including a recording pattern forming step of forming a pattern as an exposure pattern area,
When supplying the developer to the photoresist layer, there are one or more dropping positions for dropping the developer to the photoresist layer,
When the dropping position is singular, the dropping position is located in the boundary of the exposure pattern area or in the vicinity of the boundary or in the exposure pattern area,
When there are a plurality of the dropping positions, each of the dropping positions is located at any one of the boundary of the exposure pattern area, the vicinity of the boundary, and the exposure pattern area, and the development dropped at each of the dropping positions. When the liquid spreads on the surface of the master and interferes with each other to form an interference area, the respective dropping positions are located in such a way that no turbulent flow is generated in the developer in the interference area. A method for developing a master, characterized by While rotating the exposed optical disc master formed in a flat disk shape, a developer is supplied to the photoresist layer of the optical disc master, the photoresist layer of the optical disc master is developed, and the optical disc master is developed. In the developing method of an optical disc master including a recording pattern forming step of forming a fine uneven recording pattern corresponding to the exposure pattern on the surface of
The surface on which the recording pattern is formed is formed as a ring-shaped surface,
When supplying the developer to the photoresist layer, the first dropping position for dropping the developer to the photoresist layer is located at the inner boundary of the ring-shaped recording pattern forming surface,
When supplying the developer to the photoresist layer, a second dropping position for dropping the developer onto the photoresist layer is located at an outer boundary of the ring-shaped recording pattern forming surface. Development method of optical disc master. A table that has a horizontal upper surface on which the exposed master is placed, and that rotates around an axis extending in the vertical direction through the center of the exposed master that has been placed;
Developer supplying means for supplying the developer to the photoresist layer of the master that is mounted on the table and is rotated so that the developer flows as a laminar flow or a transition flow on the surface of the master;
A master developing device comprising:

Images