JP2009108349A - Holding tool, thin film deposition apparatus, and thin film deposition method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a holding tool capable of holding a substrate and arbitrarily changing the area of an exposed area of a flat surface of the substrate. <P>SOLUTION: The holding tool 50 has mask members 53A, 53B for making other area than a reflecting area 10a of a lower side of a transparent substrate 10a. The mask members 53A, 53B are attachable/detachable to/from a frame 51, and an adhesive area 10c can be exposed without transferring the transparent substrate 10a on another holding tool or the like by detaching the mask members 53A, 53B from the frame 51 after forming the reflecting film 10b. Thus, the working efficiency can be enhanced, and the man-hour of a thin film forming process on the transparent substrate 10a can be reduced, and the manufacturing cost of a mirror 10 can be reduced. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a holding jig, a thin film forming apparatus, and a thin film forming method, and more specifically, a holding jig for holding a base material on which a thin film is formed, and forming a thin film on the base material held by the holding jig. The present invention relates to a thin film forming apparatus and a thin film forming method for forming a thin film on a base material held by a holding jig.

  As an image forming apparatus that forms an image using the Carlson process, for example, a surface of a rotating photosensitive drum is scanned with a light beam to form a latent image on the surface of the photosensitive drum, and the latent image is visualized. An image forming apparatus that forms an image by fixing the obtained toner image on a sheet as a recording medium is known. This type of image forming apparatus is often used for simple printing as an on-demand printing system. In recent years, an image forming apparatus capable of forming a color image has become widespread.

  An image forming apparatus that forms a color image (hereinafter also referred to as a color image forming apparatus) has, for example, a photosensitive member common to a plurality of colors, and a plurality of toner images corresponding to each color formed on the photosensitive member. And a device that has a plurality of photoconductors corresponding to each color, and that superimposes a toner image formed on each photoconductor and transfers the image to a recording medium. In any apparatus, in these color image forming apparatuses, in order to form a single color image by superimposing a plurality of color toner images, a toner image corresponding to each color is accurately printed on a sheet as a recording medium. It is necessary to fix and superimpose well.

  The toner image overlay accuracy described above is closely related to the relative positional relationship between the shaping optical system that shapes the light beam from the light source and the optical element that is included in the optical system that makes the light beam incident on the photoreceptor. It is related. For this reason, in a color image forming apparatus, it is necessary to arrange optical elements represented by, for example, the mirrors described in Patent Document 1 and Patent Document 2 with high precision in the shaping optical system.

  As a method of arranging the above-described mirror in the color image forming apparatus, from the viewpoint of reduction in the number of parts of the apparatus and ease of assembly, for example, a support portion provided in a housing in which an optical system or the like is accommodated, A method of bonding a part of the mirror is conceivable. In this case, it is necessary to prevent the occurrence of resist misalignment and color misregistration due to fluctuations in the relative positional relationship between the mirror and the shaping optical system. It is necessary to increase the adhesive strength to some extent.

Japanese Patent No. 2637016 JP 2000-155204 A

  In the process of manufacturing a mirror with improved wettability as described above, a reflective film is formed on the flat surface by depositing a metal material while masking a part of the flat surface of the transparent substrate, and then in the flat surface. A treatment for improving the reflectivity and improving the wettability is performed on the region where the reflective film is formed (hereinafter also referred to as a reflective region) and the masked region (hereinafter referred to as an adhesive region). It has been broken. Conventionally, when performing the above-described treatment, a reflective film is formed in a state where the transparent base material is attached to a jig capable of exposing only the reflective region of the flat surface of the transparent base material, and then the transparent base material is formed. The flat surface of the transparent substrate had to be coated with the transparent substrate attached to a jig that could expose both the reflective and adhesive areas of the material. For this reason, in the manufacturing process of a mirror, while preparing two types of jigs, it was necessary to replace the transparent base material between different jigs.

  The present invention has been made under such circumstances, and a first object of the present invention is to hold a base material and to arbitrarily change the area of the exposed region of the flat surface of the base material. Is to provide.

  A second object of the present invention is to provide a thin film forming apparatus capable of forming a thin film in a desired region of a flat surface of a substrate held by the holding jig.

  A third object of the present invention is to provide a thin film forming method capable of reducing the number of steps in the step of forming a thin film on a substrate.

  According to a first aspect of the present invention, there is provided a holding jig for holding a base material having a flat surface on which a thin film is formed, and is a first jig that can be locked to one end portion in the first axial direction of the base material. A frame having a locking portion and a second locking portion that can be locked to the other end portion of the base in the first axial direction; a first plane inclined with respect to the flat surface, A first portion capable of moving from one end side of the base material to a position contacting the first position on the center side of the flat surface and masking a region on the one end side of the base material from the first position of the flat surface. A mask member; moves in a second plane different from the first plane inclined with respect to the flat surface from the other end side of the base material to a position where it abuts on a second position on the center side of the flat surface A second mask member which is provided so as to be capable of masking a region on the other end side of the base material from the second position of the flat surface; A holding jig with.

  According to this, the first mask member and the second mask member are attached to the base material that is locked at both ends in the first axial direction by the first locking portion and the second locking portion of the frame. It is possible to arbitrarily change the area of the exposed region of the flat surface of the base material by moving along the first plane and the second plane inclined to the flat surface.

  According to a second aspect of the present invention, there is provided a thin film forming apparatus for forming a thin film on a substrate held by a holding jig of the present invention, wherein a predetermined number of openings into which a plurality of holding jigs are respectively attached. A deposition member that deposits a deposition material on a flat surface of a substrate mounted on the holding member via a holding jig.

  According to this, when performing vapor deposition of vapor deposition material with respect to the base material hold | maintained at the holding jig with which the several opening part provided in the holding member was attached, the 1st mask member of a holding jig and By moving the second mask member and changing the area of the exposed region of the flat surface of the base material, it is possible to form a thin film made of a vapor deposition material in a desired region of the flat surface of the base material Become.

  According to a third aspect of the present invention, there is provided a thin film forming method for forming a plurality of thin films on the substrate held by the holding jig of the present invention, wherein the first mask member and the second mask member are used. A masking step of masking a first region on one side of the base material from the first position and a second region on one side of the base material from the second position on the flat surface of the base material; A reflective film forming step of forming a reflective film by depositing a reflective material on the flat surface masked in the first area and the second area; and moving the mask member relative to a frame to An exposure step of exposing at least a part of each of the first region and the second region of a surface; a region of the flat surface on which the reflective film is formed; the first region and the second region; Including a protective film forming step for forming a protective film. A thin film forming method.

  According to this, the reflective film is formed on the flat surface of the base material in a state where the first and second regions of the flat surface of the base material are masked. A protective film is formed in the region where the first and second mask members are moved to form the reflective film on the flat surface of the substrate, and in the first and second regions masked by the first and second mask members. It is formed. This eliminates the need to transfer the base material to a different holding jig between the step of forming the reflective film on the flat surface of the base material and the step of forming the protective film, and the number of man-hours for forming the thin film on the base material Can be reduced.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a perspective view showing a mirror 10 according to the present embodiment. The mirror 10 is one of optical elements used in an image forming apparatus having an optical scanning device such as a copying machine. For example, the mirror 10 deflects a light beam emitted from a light source, thereby moving the light beam in the traveling direction. It is a reflection mirror that deflects.

  As shown in FIG. 1, the mirror 10 is a rectangular parallelepiped mirror, and includes a transparent base material 10 a having, for example, glass or transparent resin as a material and having a longitudinal direction as a Y-axis direction. 1 and FIG. 2 which is a plan view of the mirror 10, a reflective film 10b and a protective film 10c are sequentially formed on the upper surface (+ Z side surface) of the transparent substrate 10a. Has been.

  The reflective film 10b is a film having reflectivity with respect to a light beam, which is formed in a region excluding regions on both ends of the upper surface of the transparent substrate 10a. Here, for convenience of explanation, as shown in FIG. 1, the regions at both ends of the upper surface of the transparent substrate 10a are defined as adhesion regions a2, and the regions excluding the regions at both ends of the upper surface of the transparent substrate 10a are reflective regions. It is defined as a1.

  As an example, the reflective film 10b described above is sufficiently dried after sufficiently cleaning the transparent substrate 10a. For example, aluminum or an alloy containing aluminum is deposited on the reflective region a1 of the transparent substrate 10a in a vacuum environment. Is formed.

The protective film 10c is a transparent film formed continuously over the reflective area a1 and the adhesive area a2 on the upper surface of the transparent substrate 10a, as can be seen from a comprehensive view of FIGS. . FIG. 3 is a cross-sectional view taken along line AA in FIG. As shown in FIG. 3, this protective film 10c is a film having a three-layer structure, and SiO ₂ having high hydrophilicity is deposited on the uppermost layer (+ Z side layer) and the lowermost layer (−Z side layer). The intermediate layer sandwiched between the uppermost layer and the lowermost layer is formed by depositing TiO ₂ .

  As described above, the protective film 10c is formed in the reflective region a1 and the adhesive region a2 of the transparent substrate 10a, and in the reflective region a1, the light beam is caused by the interaction between the reflective film 10b and the protective film 10c. The reflection film 10b is electrically insulated by the protective film 10c. And in the adhesion | attachment area | region a2, the wettability (hydrophilicity) with respect to the adhesive agent mentioned later becomes large. Here, the wettability is equivalent to the contact angle between the adhesive surface and the surface of the protective film 10c when the adhesive adheres to the surface of the protective film 10c, and the wettability increases as the contact angle increases (good). Is considered).

  FIG. 4 is a diagram illustrating a part of the optical housing 100a of the image forming apparatus. As shown in FIG. 4, the optical housing 100 a is formed with a plurality of sets of ribs 101 </ b> A and 101 </ b> B on which support surfaces 101 a that support the bonding regions a <b> 2 formed at both ends of the mirror 10 are formed. Further, unlike the rib 101B, the support surface 101a of the rib 101A is formed with a semi-cylindrical protruding portion having a generatrix direction as the Y-axis direction, as shown in FIG. The mirror 10 configured as described above is mounted on the optical housing 100a by supporting both ends of the mirror 10 with the ribs 101A and 101B.

  Hereinafter, a method for mounting the mirror 10 will be described. When the mirror 10 is mounted via the ribs 101A and 101B, as shown in FIG. 6, first, the mirror 10 is bonded to the support areas 101a of the ribs 101A and 101B. Arranged to face each other. 6 and 7, the screw 80 is provided on the holding member 103 in a state where the holding member 103 made of an elastic material is in contact with the + Y side end of the mirror 10. The boss 102 is screwed through the round hole. As a result, the + Y side adhesion region a <b> 2 of the mirror 10 is pressed against the support surface 101 a of the rib 101 </ b> A by the elastic force of the holding member 103. As described above, since the support surface 101a of the rib 101A is formed with a semi-cylindrical protruding portion that protrudes with respect to the bonding surface of the mirror 10, in this state, the mirror 10 has an end on the + Y side. The end portion on the −Y side can be moved to the center.

  Next, as illustrated in FIG. 8, an ultraviolet curable adhesive is injected as an example between the bonding region a <b> 2 at the −Y side end of the mirror 10 and the support surface 101 a of the rib 101 </ b> B, and is not illustrated. Using the jig, the mirror 10 is moved around the + Y side end, and the posture is finely adjusted.

  Then, as shown by the arrow in FIG. 8, the adhesive is cured by irradiating the adhesive with ultraviolet rays through the transparent base material 10 a of the mirror 10. Thereby, the mirror 10 is attached to the optical housing 100a in a state where the posture is adjusted.

  Next, a method for forming the reflective film 10b and the protective film 10c of the mirror 10 will be described.

  FIG. 9 is a diagram showing a holding jig 50 for holding the mirror 10 when the reflective film 10b and the protective film 10c are formed on the mirror 10 using the vapor deposition apparatus.

  As shown in FIG. 9, the holding jig 50 includes a rectangular frame 51, a pair of guide members 52 </ b> A and 52 </ b> B fixed to the frame 51, and a pair arranged so as to be slidable with respect to the frame 51. Mask members 53A and 53B.

  FIG. 10 is a developed perspective view of the holding jig 50. As shown in FIG. 10, the frame 51 is a rectangular frame-shaped member, and includes a support portion 51b whose longitudinal direction is the X-axis direction and a pair of frame portions 51a whose longitudinal direction is the Y-axis direction. Have. Each of the support portions 51b is formed in a rectangular plate shape, and the upper surfaces thereof are provided in a state of being inclined so as to become lower from the opposite side toward the outside, and both end portions thereof are connected by the frame portion 51a. Yes. In the present embodiment, as an example, the upper surface of the support portion 51b is in a state inclined by 3 degrees with respect to the XY plane.

  The guide member 52A is a plate-like member whose longitudinal direction is the X-axis direction. The guide member 52A is formed with a notch 52a from the −Y side end portion to the center portion, and a set of notches 52b on the + X side and the −X side of the notch 52a so as to be parallel to the notch 52a. Is formed. Further, round holes 52c penetrating in the Z-axis direction are formed in the vicinity of the two corner portions on the −Y side of the guide member 52A.

  The guide member 52B has the same structure as the guide member 52A, and a notch 52a is formed from the + Y side end portion to the center portion, and the notch 52b is provided on the + X side and the −X side of the notch 52a, respectively. Is formed. A round hole 52c penetrating in the Z-axis direction is formed in the vicinity of the two corners on the + Y side of the guide member 52A.

  The mask member 53A is a plate-like member having a longitudinal direction that is wider in width (dimension in the Y-axis direction) than the above-described guide members 52A and 52B in the X-axis direction. The mask member 53A is formed with a columnar convex portion 53a protruding upward at the center of the upper surface, and round holes 53b are formed on the + X side and the −X side of the convex portion 53a, respectively. In addition, round holes 53c are formed at positions corresponding to the round holes 52c of the guide member 52A at the corner portion on the -Y side of the mask member 53A.

  The mask member 53B has the same configuration as the mask member 53A, and a convex portion 53a is formed at the center of the upper surface, and round holes 53b are formed on the + X side and the -X side of the convex portion 53a. Yes. In addition, round holes 53c are formed at positions corresponding to the round holes 52c of the guide member 52B at the corner portion on the -Y side of the mask member 53B.

  As can be seen with reference to FIGS. 9 and 10, the guide member 52 </ b> A is disposed in a state where the lower surface thereof is parallel to the opposing support portion 51 b of the frame 51, and a set of frame portions 51 a provided on the frame 51. A + Y side portion from the center of the outer edge of the + X side and the −X side of the guide member 52A is fixed to each end portion on the −Y side. The guide member 52B is disposed in a state where the lower surface thereof is parallel to the support portion 51b of the opposing frame 51, and a guide member 52B is provided at the + Y side end of each of the pair of frame portions 51a provided on the frame 51. A portion on the −Y side from the center of the outer edge on the + X side and the −X side of the member 52A is fixed.

  Then, as can be seen from FIG. 9 and FIG. 10, the mask member 53 </ b> A has the support portion 51 b and the guide member 52 </ b> A of the frame 51 such that the convex portion 53 a is inserted into the notch 52 a formed in the guide member 52 </ b> A. Is inserted from the −Y side between the frame and the frame 51 so as to be movable along the upper surface of the support portion 51 b of the frame 51. Further, the mask member 53B is inserted from the + Y side between the support portion 51b of the frame 51 and the guide member 52B so that the convex portion 53a is inserted into the notch 52a formed in the guide member 52B. The frame 51 is movably attached along the upper surface of the support portion 51b.

  Each of the mask members 53A and 53B attached as described above is movable within a range in which the convex portion 53a slides inside the notch 52a of the guide members 52A and 52B, and is formed on the guide members 52A and 52B. The screw 60 is screwed into the circular holes 53b provided in the mask members 53A and 53B through the cutouts 52b, thereby being fixed to the frame 51. Further, by matching the round holes 53c provided in the mask members 53A and 53B with the round holes 52c provided in the guide members 52A and 52B, the mask members 53A and 53B are placed at predetermined positions with respect to the frame 51. Positioning is also possible.

  In the holding jig 50 configured as described above, as shown in FIG. 11, a plurality (14 pieces) of transparent base materials 10 a whose longitudinal direction is the Y-axis direction are arranged adjacent to each other in the X-axis direction. It is held in the state. In this state, as shown in FIG. 12A and FIG. 12B, which is an enlarged view of the transparent base material 10a and the mask member 53A, each transparent base material 10a is attached to the guide member 52A and the guide member 52B. In a sandwiched state, the lower surfaces of both ends are corner portions formed by the upper surface of the mask member 53A and the side surface on the + Y side, and the corner portions formed by the upper surface of the mask member 53B and the side surface on the −Y side. It is in a state supported by. Thereby, the transparent base material 10a is in a state in which, for example, only the reflection region a1 shown in FIG.

  In order to form the reflective film 10b and the protective film 10c on the transparent base material 10a held by the holding jig 50, a coating apparatus 200 shown in FIG. 13 is used. As shown in FIG. 13, the coating apparatus 200 has a rotating disk 202 that rotates about a vertical axis whose inner surface is spherical, and a transparent base material 10 a that is mounted on the rotating disk 202 via a holding jig 50. On the other hand, a vapor deposition apparatus 203 for vapor deposition of the vapor deposition material, a chamber 201 for housing each of the above parts, and the like are provided.

  As shown in FIG. 14A, the turntable 202 is provided with a circular opening 202a at the center of rotation, and two kinds of rectangular openings 202b and 202c are formed around the circular opening 202a. Has been. In the coating apparatus 200, as shown in FIG. 14B as an example, the frame 51 of the holding jig 50 is fitted into the openings 202b and 202c formed in the rotating disk 202 from above, so that the transparent substrate 10a is attached to the turntable 202 via the holding jig 50. And a thin film is formed in the lower surface of the transparent base material 10a hold | maintained at the holding jig 50 by operating the vapor deposition apparatus 203, rotating the rotary disk 202 around a vertical axis.

  In the present embodiment, the coating film 200 is used to form the reflective film 10b in the reflective region a1 of the transparent substrate 10a held by the holding jig 50. Next, by removing the mask members 53A and 53B of the holding jig 50 from the frame 51, the reflective region a1 and the adhesive region a2 of the transparent base material 10a are exposed from below the frame 51, and the reflective region a1 and the adhesive region a2 are exposed. A continuous protective film 10c is formed simultaneously. Hereinafter, the thin film forming method will be described with reference to FIGS. 15 (A) to 16 (B).

  In FIG. 15A, the transparent base material 10a in which the reflective film 10b is formed in the reflective region a1 on the lower surface is held by the holding jig 50 by the coating apparatus 200. When the reflective film 10b is formed in the reflective region a1 of the transparent base material 10a by the coating apparatus 200, the transparent base material 10a is once taken out from the chamber of the coating apparatus 200 while being held by the holding jig 50.

  Then, as shown in FIG. 15B, the holding jig 50 includes a square plate-like base placed on the floor surface, and a contact portion 70a provided on the upper surface of the base with the longitudinal direction as the X-axis direction. Is placed on a pulling jig 70. Thereby, the transparent base material 10 a held by the holding jig 50 is once supported by the contact portion 70 a of the drawing jig 70. Note that the upper end portion of the contact portion 70a is formed in a wedge shape, and the contact area between the contact portion 70a and the transparent substrate 10a is minimized.

  Next, the screws 60 of the holding jig 50 are removed to release the restriction of the mask members 53A and 53B, and the mask members 53A and 53B are extracted from the frame 51 as shown in FIG. By lifting the holding jig 50 placed on the extraction jig 70 from this state, as shown in FIG. 16 (B), the transparent base material 10a has both end portions on the lower surface at the support portions 51b of the frame 51. Is locked by. Since the upper surface of the support portion 51b is inclined with respect to the XY plane as described above, both end portions of the transparent base material 10a are supported by corner portions formed by the upper surface and side surfaces of the support portion 51b. The And both the reflective area | region a1 of the transparent base material 10a lower surface and the adhesion | attachment area | region a2 will be in the state exposed from the downward direction of the flame | frame 51 of the holding jig 50. FIG.

  Next, the transparent base material 10a held by the holding jig 50 from which the mask members 53A and 53B are removed is mounted on the turntable 202 of the coating apparatus 200, and the coating apparatus 200 causes the reflective region a1 of the transparent base material 10a to be reflected. And the protective film 10c is formed in the adhesion | attachment area | region a2.

  As described above, the holding jig 50 according to the present embodiment has the mask members 53A and 53B that mask regions other than the reflective region 10a on the lower surface of the transparent substrate 10a. Since the mask members 53A and 53B can be attached to and detached from the frame 51, the transparent base material 10a can be used as another holding jig or the like by removing the mask members 53A and 53B from the frame 51 after forming the reflective film 10b. The adhesive region 10c can be exposed without being replaced. Thereby, while improving work efficiency, the man-hour of the thin film formation process to the transparent base material 10a can be reduced, and it becomes possible to reduce the manufacturing cost of the mirror 10. FIG.

  Further, the removal of the mask members 53A and 53B from the frame 51 is a simple operation as compared with the case of removing the mask using, for example, a masking tape. Can be suppressed.

  In addition, since both the reflective film 10b and the protective film 10c can be formed on the transparent substrate 10a using the single holding jig 50, it is not necessary to prepare another holding jig separately. Thus, it is possible to reduce the cost of the manufacturing apparatus.

  Further, in the holding jig 50 according to the present embodiment, the transparent base material 10a is supported by the corner portions of the mask members 53A and 53B or the corner portions of the support portions 51b formed on the frame 51. The holding area of the holding jig 50 is minimized. Thereby, generation | occurrence | production of the abrasion etc. on the transparent base material 10a surface can be avoided.

  When holding the transparent substrate 10a with the holding jig 50, when holding fewer than 14 transparent substrates 10a, as shown in FIG. 17 as an example, the dummy substrate 10a ′ Is preferably disposed adjacent to the transparent substrate 10a. Thereby, it becomes possible to avoid that the vapor deposition material from below passes around the frame 51 and adheres to the upper surface of the transparent substrate 10a. Further, instead of the dummy base material 10a ', a cover member corresponding to the insufficient amount of the transparent base material 10a may be held.

  Further, in the coating apparatus 200 according to the present embodiment, the transparent base material 10 a is attached to the opening formed in the turntable 202 via the holding jig 50. Therefore, the reflective film 10b and the protective film 10c can be accurately formed on the transparent substrate 10a held by the holding jig 50.

  In addition, in the thin film formation process by the coating apparatus 200, when there are openings 202b and 202c of the turntable 202 where the holding jig 50 is not mounted, it is preferable to close the openings with a lid member or the like. Thereby, it can avoid that vapor deposition material wraps around from the opening of the turntable 202, and adheres to the upper surface of the transparent base material 10a.

  Further, when the two holding jigs 50 are mounted in the opening 202c of the turntable 202, the holding jigs 50 may be connected to each other using a fixing member 80 as shown in FIG. By connecting the holding jigs 50 in this way, it is possible to suppress the looseness of the holding jig 50 that occurs with the rotation of the turntable 202. Thereby, it can avoid that the thickness of the film | membrane formed in the transparent base material 10a becomes non-uniform | heterogenous. The fixing member 80 may be provided on the turntable 202.

  Moreover, in this embodiment, the protective film 10c is formed in the same process in the reflective area | region a1 of the transparent base material 10a, and the adhesion area | region a2 of the both sides. As a result, it is possible to realize the improvement of the reflectance of the reflection region a1 of the transparent substrate 10a and the improvement of the adhesive strength by improving the wettability of the adhesion region a2 in the same process.

  In the present embodiment, the case where two types of films of the reflective film 10b and the protective film 10c are formed on the transparent base material 10a has been described. However, the present invention is not limited to this, and the transparent base material held by the holding jig 50 is used. It is also possible to form three or more types of films on 10a. In this case, by adjusting the positions of the mask members 53A and 53B with respect to the frame 51, the area of the region where the film on the transparent substrate 10a is formed can be arbitrarily changed.

It is a perspective view showing mirror 10 concerning one embodiment of the present invention. 3 is a side view of the mirror 10. FIG. 2 is a cross-sectional view of the mirror 10. FIG. It is a figure which shows the ribs 101A and 101B provided in the optical housing 100a. It is a perspective view which shows the rib 101A. FIG. 6 is a diagram (part 1) for explaining a mounting method of the mirror 10; FIG. 6 is a second diagram for explaining the mounting method of the mirror 10; FIG. 6 is a third diagram for explaining the mounting method of the mirror 10; It is a perspective view which shows the holding jig 50 concerning one Embodiment of this invention. 3 is a developed perspective view of a holding jig 50. FIG. It is a perspective view which shows the holding jig 50 of the state holding the transparent base material 10a. 12 (A) and 12 (B) are side views showing the holding jig 50 in a state where the transparent base material 10a is held. 1 is a diagram showing a schematic configuration of a coating apparatus 200. FIG. FIGS. 14A and 14B are views (No. 1 and No. 2) for explaining a method of attaching the holding jig 50 to the coating apparatus 200. FIG. FIGS. 15A and 15B are views (No. 1 and No. 2) for explaining a method of forming the reflective film 10b and the protective film 10c on the transparent substrate 10a. FIGS. 16A and 16B are views (No. 3 and No. 4) for explaining a method of forming the reflective film 10b and the protective film 10c on the transparent substrate 10a. It is a perspective view which shows the holding jig 50 of the state which hold | maintained the transparent base material 10a and dummy base material 10a '. 4 is a perspective view showing a holding jig 50 connected by a fixing member 80. FIG.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 ... Mirror, 10a ... Transparent base material, 10a '... Dummy base material, 10b ... Reflective film, 10c ... Protective film, 50 ... Holding jig, 51 ... Frame, 51a ... Frame part, 51b ... Support part, 52A, 52B ... guide member, 52a, 52b ... notch, 52c ... round hole, 53A, 53B ... mask member, 53a ... convex part, 53b, 53c ... round hole, 70 ... drawing jig, 70a ... contact part, 80 ... fixed Member, 100a ... Optical housing, 101A, 101B ... Rib, 101a ... Support surface, 102 ... Boss, 103 ... Holding member, 200 ... Coating device, 202 ... Rotary disc, 202a ... Circular opening, 202b, 202c ... Opening, 203 ... Vapor deposition apparatus, a1 ... reflection region, a2 ... adhesion region.

Claims (16)

A holding jig for holding a substrate having a flat surface on which a thin film is formed,
A frame having a first locking portion that can be locked to one end portion in the first axial direction of the base material, and a second locking portion that can be locked to the other end portion in the first axial direction of the base material. When;
It is provided in a first plane inclined with respect to the flat surface so as to be movable from one end side of the base material to a position where it contacts the first position on the center side of the flat surface, A first mask member capable of masking a region on one end side of the substrate from a position;
Provided in a second plane different from the first plane inclined with respect to the flat surface so as to be movable from the other end side of the base material to a position in contact with the second position on the center side of the flat surface. A second mask member capable of masking a region on the other end side of the base material from the second position of the flat surface.   The first mask member and the second mask member are capable of supporting the base member apart from the frame by contacting the first position and the second position of the flat surface, respectively. The holding jig according to claim 1.   The other end portion of the first mask member and the one end portion of the second mask member are formed with ridgelines that respectively contact the first position and the second position of the flat surface. The holding jig according to claim 2.   The holding jig according to claim 1, wherein the first mask member and the second mask member are provided to be slidable with respect to the frame.   The holding jig according to any one of claims 1 to 4, wherein the first mask member and the second mask member are detachable from the frame.   The holding jig according to claim 1, wherein the base material is a rectangular parallelepiped having the first axial direction as a longitudinal direction. A thin film forming apparatus for forming a thin film on a substrate held by the holding jig according to any one of claims 1 to 6,
A holding member provided with a predetermined number of openings to which a plurality of holding jigs are respectively attached;
A vapor deposition apparatus that deposits a vapor deposition material on a flat surface of the base material mounted on the holding member via the holding jig.   The thin film forming apparatus according to claim 7, further comprising a fixing member that fixes the holding jig to the holding member. A thin film forming method for forming a plurality of thin films on the base material held by the holding jig according to any one of claims 1 to 6,
In the first mask member and the second mask member, a first region of the flat surface of the base material from the first position to the one end side of the base material, and the other end side of the base material from the second position. A masking process for masking the second region of
A reflective film forming step of forming a reflective film by depositing a reflective material on the flat surface masked with the first region and the second region;
An exposure step of moving the mask member relative to the frame to expose at least a portion of each of the first region and the second region of the flat surface;
A thin film forming method comprising: a region of the flat surface where the reflective film is formed; and a protective film forming step of forming a protective film in the first region and the second region.   The thin film forming method according to claim 9, wherein the holding jig is capable of holding a predetermined number of substrates arranged in a direction orthogonal to the first axis.   The thin film forming method according to claim 10, further comprising a step of holding the predetermined number of base materials with the holding jig.   The thin film forming method according to claim 10, further comprising a step of holding the number of base materials insufficient by the predetermined number with the holding jig, and a step of holding the number of dummy base materials insufficient by the predetermined number. .   11. The method of claim 10, further comprising the step of holding the number of substrates insufficient to the predetermined number with the holding jig, and the step of holding lid members having dimensions corresponding to the number of substrates insufficient to the predetermined number. A method for forming a thin film according to 1.   The method according to any one of claims 9 to 13, further comprising a step of attaching the holding jigs to the predetermined number of openings provided in the holding member of the thin film forming apparatus according to claim 7 or 8. The thin film formation method as described in 2.   9. A step of attaching a number of holding jigs insufficient to the predetermined number to the predetermined number of openings provided in the holding member of the thin film forming apparatus according to claim 7 or 8, and the holding jig The method for forming a thin film according to any one of claims 9 to 13, further comprising: a step of closing the opening portion to which no opening is attached.   The thin film forming method according to claim 9, further comprising a step of fixing a holding jig attached to the opening of the holding member to the holding member.

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