JP2009099782A5 - - Google Patents

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JP2009099782A5
JP2009099782A5 JP2007270165A JP2007270165A JP2009099782A5 JP 2009099782 A5 JP2009099782 A5 JP 2009099782A5 JP 2007270165 A JP2007270165 A JP 2007270165A JP 2007270165 A JP2007270165 A JP 2007270165A JP 2009099782 A5 JP2009099782 A5 JP 2009099782A5
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semiconductor chip
wiring pattern
stacked
semiconductor
sealing resin
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JP2007270165A
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JP2009099782A (en
JP5068133B2 (en
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Claims (15)

第1の半導体チップと、
前記第1の半導体チップと電気的に接続された配線パターンと、
前記第1の半導体チップと対向する前記配線パターンの第1の面の反対側に位置する前記配線パターンの第2の面を露出するように、前記第1の半導体チップを封止する第1の封止樹脂と、
前記配線パターンの第2の面と対向するように配置され、前記配線パターンと電気的に接続された第2の半導体チップと、を備えたことを特徴とする半導体チップ積層構造体。
A first semiconductor chip;
A wiring pattern electrically connected to the first semiconductor chip;
The first semiconductor chip is sealed so as to expose the second surface of the wiring pattern located on the opposite side of the first surface of the wiring pattern facing the first semiconductor chip. Sealing resin;
A semiconductor chip laminated structure comprising: a second semiconductor chip disposed to face the second surface of the wiring pattern and electrically connected to the wiring pattern.
前記第2の半導体チップは、前記配線パターンに対してフリップチップ接続されており、
前記第2の半導体チップと前記配線パターン及び前記第1の封止樹脂との間に、前記第2の半導体チップと前記配線パターン及び前記第1の封止樹脂とを接着する樹脂を設けたことを特徴とする請求項1記載の半導体チップ積層構造体。
The second semiconductor chip is flip-chip connected to the wiring pattern,
A resin for bonding the second semiconductor chip, the wiring pattern, and the first sealing resin is provided between the second semiconductor chip, the wiring pattern, and the first sealing resin. The semiconductor chip laminated structure according to claim 1.
前記第1の半導体チップは、前記配線パターンに対してフリップチップ接続されていることを特徴とする請求項1又は2記載の半導体チップ積層構造体。   3. The semiconductor chip stacked structure according to claim 1, wherein the first semiconductor chip is flip-chip connected to the wiring pattern. 前記配線パターンの第1の面に設けられた部分の前記第1の封止樹脂を貫通すると共に、前記配線パターンと接続された貫通電極を設けたことを特徴とする請求項1ないし3のうち、いずれか一項記載の半導体チップ積層構造体。   The through electrode connected to the wiring pattern is provided while penetrating the first sealing resin in a portion provided on the first surface of the wiring pattern. The semiconductor chip laminated structure according to any one of the above. 前記配線パターンと接続された側とは反対側の前記貫通電極の端部に、外部接続端子を設けたことを特徴とする請求項1ないし4のうち、いずれか一項記載の半導体チップ積層構造体。   5. The semiconductor chip stacked structure according to claim 1, wherein an external connection terminal is provided at an end portion of the through electrode on the side opposite to the side connected to the wiring pattern. 6. body. 前記配線パターンの第1の面に設けられた部分の前記第1の封止樹脂に、前記配線パターンの第1の面を露出する開口部を設けたことを特徴とする請求項1ないし3のうち、いずれか一項記載の半導体チップ積層構造体。   The opening part which exposes the 1st surface of the said wiring pattern was provided in the said 1st sealing resin of the part provided in the 1st surface of the said wiring pattern, The Claim 1 thru | or 3 characterized by the above-mentioned. Among them, the semiconductor chip laminated structure according to any one of the above. 請求項1ないし6のうち、いずれか一項記載の半導体チップ積層構造体を複数有し、
複数の前記半導体チップ積層構造体を積み重ねて配置すると共に、前記複数の半導体チップ積層構造体に設けられた前記配線パターンを電気的に接続する導電部材を設けたことを特徴とする半導体装置。
A plurality of semiconductor chip laminated structures according to any one of claims 1 to 6,
A semiconductor device comprising: a plurality of the semiconductor chip laminated structures stacked and arranged, and a conductive member that electrically connects the wiring patterns provided in the plurality of semiconductor chip laminated structures.
前記導電部材は、対向する2つの前記半導体チップ積層構造体に設けられた前記配線パターンと接触するように、前記対向する2つの半導体チップ積層構造体に設けられた前記配線パターンの間に配置したことを特徴とする請求項7記載の半導体装置。   The conductive member is disposed between the wiring patterns provided in the two opposing semiconductor chip stacked structures so as to be in contact with the wiring patterns provided in the two opposing semiconductor chip stacked structures. The semiconductor device according to claim 7. 対向する2つの前記半導体チップ積層構造体は、  Two opposing semiconductor chip stacked structures are as follows:
それぞれの前記半導体チップ積層構造体に設けられた前記第2の半導体チップ同士が対向するように配置され、かつ、それぞれの前記半導体チップ積層構造体に設けられた前記配線パターンの前記第2の面同士が、前記導電部材により電気的に接続されていることを特徴とする請求項8記載の半導体装置。  The second surface of the wiring pattern provided in each of the semiconductor chip stacked structures is arranged so that the second semiconductor chips provided in the respective semiconductor chip stacked structures are opposed to each other. 9. The semiconductor device according to claim 8, wherein each other is electrically connected by the conductive member.
対向する2つの前記半導体チップ積層構造体は、
一の前記半導体チップ積層構造体に設けられた前記第1の半導体チップと、他の前記半導体チップ積層構造体に設けられた前記第2の半導体チップとが対向するように配置され、かつ、前記一の半導体チップ積層構造体に設けられた前記配線パターンの前記第1の面と、前記他の半導体チップ積層構造体に設けられた前記配線パターンの前記第2の面とが、前記導電部材により電気的に接続されていることを特徴とする請求項8記載の半導体装置
Two opposing semiconductor chip stacked structures are as follows:
The first semiconductor chip provided in one of the semiconductor chip laminated structures and the second semiconductor chip provided in another semiconductor chip laminated structure are arranged to face each other; and The first surface of the wiring pattern provided in one semiconductor chip stacked structure and the second surface of the wiring pattern provided in the other semiconductor chip stacked structure are formed by the conductive member. 9. The semiconductor device according to claim 8, wherein the semiconductor device is electrically connected .
積み重ねられた前記複数の半導体チップ積層構造体のうち、最下層に配置された前記半導体チップ積層構造体は、前記貫通電極を有することを特徴とする請求項7ないし10のうち、一項記載の半導体装置。 11. The semiconductor chip stacked structure disposed in a lowermost layer among the stacked semiconductor chip stacked structures has the through electrode. 11 . Semiconductor device. 前記第1の封止樹脂から露出された前記貫通電極の端部を露出するように、前記積み重ねられた複数の半導体チップ積層構造体を封止する第2の封止樹脂を設けたことを特徴とする請求項11記載の半導体装置。 A second sealing resin for sealing the stacked semiconductor chip stacked structures is provided so as to expose an end portion of the through electrode exposed from the first sealing resin. The semiconductor device according to claim 11 . 第1半導体チップ及び第2半導体チップを有する半導体チップ積層構造体の製造方法において、  In the manufacturing method of the semiconductor chip laminated structure having the first semiconductor chip and the second semiconductor chip,
導電性を有する支持体の上面に配線パターンを形成する工程と、  Forming a wiring pattern on the upper surface of the conductive support;
前記第1の半導体チップと前記配線パターンとを接続する工程と、  Connecting the first semiconductor chip and the wiring pattern;
前記配線パターンの一部を露出する開口部を有した封止樹脂により、前記配線パターンと、前記第1の半導体チップとを封止する工程と、  Sealing the wiring pattern and the first semiconductor chip with a sealing resin having an opening exposing a part of the wiring pattern;
前記支持体を除去する工程と、  Removing the support;
前記支持体を除去した面の前記配線パターンと前記第2の半導体チップとを接続する第2の半導体チップ接続工程と、を有する半導体チップ積層構造体の製造方法。  A method of manufacturing a semiconductor chip laminated structure, comprising: a second semiconductor chip connecting step of connecting the wiring pattern on the surface from which the support is removed and the second semiconductor chip.
前記開口部に貫通電極を形成する工程を有することを特徴とする請求項13記載の半導体チップ積層構造体の製造方法。  14. The method of manufacturing a semiconductor chip laminated structure according to claim 13, further comprising a step of forming a through electrode in the opening. 前記第2の半導体チップ接続工程の前に、前記封止樹脂から露出したパッドに検査装置の端子を接触させて前記第1の半導体チップの電気的検査を行う工程を有することを特徴とする請求項13又は14記載の半導体チップ積層構造体の製造方法。  A step of performing an electrical inspection of the first semiconductor chip by bringing a terminal of an inspection device into contact with a pad exposed from the sealing resin before the second semiconductor chip connection step. Item 15. A method for producing a semiconductor chip laminated structure according to Item 13 or 14.
JP2007270165A 2007-10-17 2007-10-17 Semiconductor chip laminated structure and semiconductor device Active JP5068133B2 (en)

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JP2009099782A5 true JP2009099782A5 (en) 2010-10-14
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JP6290534B2 (en) * 2012-12-20 2018-03-07 新光電気工業株式会社 Semiconductor package and semiconductor package manufacturing method
JP6318084B2 (en) * 2014-12-17 2018-04-25 新光電気工業株式会社 Semiconductor device and manufacturing method thereof
KR102628100B1 (en) * 2021-12-28 2024-01-23 (주)심텍 semiconductor package having an embedded chip and method of fabricating the same

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JP2910731B2 (en) * 1997-06-16 1999-06-23 日本電気株式会社 Semiconductor device
JP2001177049A (en) * 1999-12-20 2001-06-29 Toshiba Corp Semiconductor device and ic card
JP2002057273A (en) * 2000-08-07 2002-02-22 Orient Semiconductor Electronics Ltd Stacked die set for integrated circuit package
JP2003273317A (en) * 2002-03-19 2003-09-26 Nec Electronics Corp Semiconductor device and its manufacturing method
JP4593951B2 (en) * 2004-03-29 2010-12-08 ルネサスエレクトロニクス株式会社 Multi-chip package manufacturing method
JP4865197B2 (en) * 2004-06-30 2012-02-01 ルネサスエレクトロニクス株式会社 Semiconductor device and manufacturing method thereof
JP4819471B2 (en) * 2005-10-12 2011-11-24 日本電気株式会社 Wiring substrate, semiconductor device using the wiring substrate, and manufacturing method thereof

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