JP2009099737A - Processing liquid supply unit, liquid processing apparatus, processing liquid supply method, and storage medium - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To continuously process bodies to be processed without causing processing liquid supplied from a processing section to a body to be processed to pulsate nor generating any wait time. <P>SOLUTION: A processing liquid supply unit comprises a first supply section 10, a second supply section 20, and a control section 50 which controls flows of processing liquid in the first supply section 10 and second supply section 20. The control section 50, when changing the supply of the processing liquid to a processing section 60 from the first supply section 10 to the second supply section 20, controls a first pumping means 13 to start supplying the processing liquid from the first supply section 10 to the processing section 60 and then stop supplying the processing liquid from the first supply section to the processing section on condition that the processing liquid in the second supply section 20 is in a pumping state and the processing liquid in the first supply section 10 is in a pumping state. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a processing liquid supply unit that supplies a processing liquid to a processing unit that processes an object to be processed, a liquid processing apparatus that includes the processing liquid supply unit, a processing liquid supply method, and a storage medium that stores the processing liquid supply method. .

  2. Description of the Related Art Conventionally, a processing liquid supply unit for supplying a processing liquid to a processing unit that processes a semiconductor wafer (hereinafter also referred to as a wafer) that is an object to be processed is known. And such a process liquid supply unit has a supply part containing the storage tank which stores the process liquid supplied to a process part.

  However, when the processing liquid supply unit has only one supply section and only one storage tank for storing the processing liquid, the processing liquid stored in the storage tank is completely used. If it does, a process liquid cannot be supplied to a process part until the newly produced | generated process liquid is stored in a storage tank. In addition, the time during which the processing unit can continuously process the wafer is limited to the time until the processing liquid stored in the storage tank is completely used up.

In this regard, there is also known that the processing liquid supply unit has a plurality of supply units including a storage tank (see, for example, Patent Document 1). Since such a processing liquid supply unit has a plurality of storage tanks, the processing liquid can be actually supplied from one storage tank and the processing liquid to be used next time can be stored in another storage tank. it can. For this reason, unlike the processing liquid supply unit having only one storage tank as described above, there is no need to wait until the newly generated processing liquid is stored.
JP 09-260330 A

  However, in the processing liquid supply unit having a plurality of supply units as described above, when the processing liquid is actually supplied from one supply unit, a storage tank for supplying the processing liquid is used as the one supply unit. When the storage tank is switched from one storage tank to another storage tank, the liquid pressure of the processing liquid supplied to the processing section changes. For this reason, pulsation occurs in the processing liquid supplied from the processing unit to the wafer, and the wafer to be processed cannot be processed with high accuracy.

  The present invention has been made in consideration of such points, and the processing liquid supplied from the processing unit to the object to be processed is free from pulsation and is not subject to waiting time. It is an object of the present invention to provide a treatment liquid supply unit capable of continuously treating a body, a liquid treatment apparatus having the treatment liquid supply unit, a treatment liquid supply method, and a storage medium storing the treatment liquid supply method. To do.

The treatment liquid supply unit according to the present invention comprises:
In the processing liquid supply unit for supplying the processing liquid to the processing unit that processes the object to be processed,
A first supply unit for circulating the processing liquid and supplying the processing liquid to the processing unit;
A second supply unit for circulating the processing liquid and supplying the processing liquid to the processing unit;
A control unit for controlling the flow of the processing liquid in the first supply unit and the second supply unit,
The first supply unit has a first pumping means that alternately turns the processing liquid into a pumping state and a non-pumping state, and gives a driving force to the processing liquid,
The second supply unit has a second pumping unit that alternately turns the processing liquid into a pumping state and a non-pumping state, and applies a driving force to the processing liquid;
When the control unit changes the supply of the processing liquid to the processing unit from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pumping state and the processing in the second supply unit Control the second pumping means to start supplying the processing liquid from the second supply unit to the processing unit when the liquid is in the pumping state, and then stop supplying the processing liquid from the first supply unit to the processing unit To do.

  According to such a configuration, the liquid pressure of the processing liquid supplied to the processing unit does not drop sharply, and pulsation does not occur in the processing liquid supplied from the processing unit to the object to be processed. Further, there is no waiting time for switching from the first supply unit to the second supply unit, and the object to be processed can be processed continuously.

In the treatment liquid supply unit according to the present invention,
When the control unit changes the supply of the processing liquid to the processing unit from the first supply unit to the second supply unit, the control unit predicts from the cycle of the pumping state and the non-pumping state of the processing liquid in the first supply unit, When the processing liquid in the first supply unit is in a pressure-feeding state and the processing liquid in the second supply unit is in a pressure-feeding state, the second pumping means is configured to start supplying the processing liquid from the second supply unit to the processing unit. It is preferable to control.

  With such a configuration, it is possible to more reliably prevent pulsation from occurring in the processing liquid supplied from the processing unit to the object to be processed.

In the treatment liquid supply unit according to the present invention,
The first supply unit has a first circulation path for circulating the processing liquid,
The second supply unit has a second circulation path for circulating the processing liquid,
When the control unit changes the supply of the processing liquid to the processing unit from the first supply unit to the second supply unit, the control unit circulates the processing liquid in the second circulation path of the second supply unit, The second pumping means may be controlled to start supplying the processing liquid from the second supply section to the processing section when the processing liquid is in the pumping state and the processing liquid in the second supply section is in the pumping state. preferable.

  With such a configuration, the treatment liquid in the first supply part and the treatment liquid in the second supply part can be made to have a uniform concentration.

In the treatment liquid supply unit according to the present invention,
The first supply unit has a first pressure member for increasing the liquid pressure of the processing liquid flowing in the first supply unit,
The second supply unit has a second pressure member for increasing the liquid pressure of the processing liquid flowing in the second supply unit,
When the first supply unit supplies the processing liquid to the processing unit, the control unit increases the liquid pressure of the processing liquid in the second supply unit by the second pressurizing member, and then transfers the processing liquid from the second supply unit to the processing unit. It is preferable to start supplying the processing liquid and then stop the supply of the processing liquid from the first supply unit to the processing unit.

  According to such a structure, it can prevent more reliably that a pulsation arises in the process liquid supplied with respect to a to-be-processed object from a process part.

The liquid processing apparatus according to the present invention comprises:
A processing unit for processing an object;
A processing liquid supply unit for supplying a processing liquid to the processing unit,
The treatment liquid supply unit is
A first supply unit for circulating the processing liquid and supplying the processing liquid to the processing unit;
A second supply unit for circulating the processing liquid and supplying the processing liquid to the processing unit;
A control unit for controlling the flow of the processing liquid in the first supply unit and the second supply unit,
The first supply unit has a first pumping means that alternately turns the processing liquid into a pumping state and a non-pumping state, and gives a driving force to the processing liquid,
The second supply unit has a second pumping unit that alternately turns the processing liquid into a pumping state and a non-pumping state, and applies a driving force to the processing liquid;
When the control unit changes the supply of the processing liquid to the processing unit from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pumping state and the processing in the second supply unit Control the second pumping means to start supplying the processing liquid from the second supply unit to the processing unit when the liquid is in the pumping state, and then stop supplying the processing liquid from the first supply unit to the processing unit To do.

  According to such a configuration, the liquid pressure of the processing liquid supplied to the processing unit does not drop sharply, and pulsation does not occur in the processing liquid supplied from the processing unit to the object to be processed. Further, there is no waiting time for switching from the first supply unit to the second supply unit, and the object to be processed can be processed continuously.

The processing liquid supply method according to the present invention comprises:
A first supply unit that circulates the processing liquid and supplies the processing liquid to the processing unit; and a second supply unit that circulates the processing liquid and supplies the processing liquid to the processing unit. The unit has a first pumping unit that alternately turns the processing liquid into a pressure-feed state and a non-pump-feed state, and applies a driving force to the processing liquid. In the processing liquid supply method for supplying the processing liquid to the processing unit for processing the object to be processed, using the processing liquid supply unit having the second pumping means for applying a driving force to the processing liquid,
A first processing liquid supply step of supplying a processing liquid to the processing section by the first supply section;
A second treatment liquid supply step of supplying a treatment liquid to the treatment section by the second supply section;
When the supply of the processing liquid to the processing unit is changed from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pressure feeding state, and the processing liquid in the second supply unit is in a pressure feeding state. A second pumping means control step for controlling the second pumping means to start supplying the processing liquid from the second supply section to the processing section at a certain time,
After the second pumping means control step, a first treatment liquid supply stop step for stopping the supply of the treatment liquid from the first supply portion to the treatment portion,
It has.

  According to such a method, the liquid pressure of the processing liquid supplied to the processing unit does not drop sharply, and pulsation does not occur in the processing liquid supplied from the processing unit to the object to be processed. Further, there is no waiting time for switching from the first supply unit to the second supply unit, and the object to be processed can be processed continuously.

In the processing liquid supply method according to the present invention,
In the second pumping means control step, the processing liquid in the first supply unit is in the pumping state and the processing in the second supply unit is predicted from the cycle of the pumping state and non-pumping state of the processing liquid in the first supply unit. It is preferable to control the second pumping means so that the processing liquid is started to be supplied from the second supply unit to the processing unit when the liquid is in a pumping state.

  According to such a method, it is possible to more reliably prevent pulsation from occurring in the processing liquid supplied from the processing unit to the object to be processed.

In the processing liquid supply method according to the present invention,
A second treatment liquid circulation step for circulating the treatment liquid in the second supply unit during the first treatment liquid supply step;
A first treatment liquid circulation step of circulating the treatment liquid in the first supply unit during the second treatment liquid supply step;
The second pressure feeding means control step is performed when the processing liquid in the first supply unit is in a pressure feeding state and the processing liquid in the second supply unit is in a pressure feeding state during the second processing liquid circulation step. It is preferable to control the second pumping means so as to start supplying the processing liquid from the supply unit to the processing unit.

  By such a method, the treatment liquid in the first supply part and the treatment liquid in the second supply part can be made to have a uniform concentration.

In the processing liquid supply method according to the present invention,
During the first treatment liquid supply step, a second pressurization step for increasing the liquid pressure of the treatment liquid in the second supply unit,
During the second treatment liquid supply step, a first pressurization step for increasing the liquid pressure of the treatment liquid in the first supply unit,
A second treatment liquid supply stop step for stopping the supply of the treatment liquid from the second supply section to the treatment section, and
The second treatment liquid supply step is started after the second pressurization step,
The first treatment liquid supply stop step is started after the second treatment liquid supply step,
The first treatment liquid supply step is started after the first pressurization step,
The second treatment liquid supply stopping step is preferably started after the first treatment liquid supply step.

  According to such a method, it is possible to more reliably prevent pulsation from occurring in the processing liquid supplied from the processing unit to the object to be processed.

A storage medium according to the present invention comprises:
In a storage medium storing a computer program for causing a computer to execute a processing liquid supply method,
The treatment liquid supply method is as follows:
A first supply unit that circulates the processing liquid and supplies the processing liquid to the processing unit; and a second supply unit that circulates the processing liquid and supplies the processing liquid to the processing unit. The unit includes a first pumping unit that alternately turns the processing liquid into a pumping state and a non-pumping state and applies a driving force to the processing liquid, and the second supply unit alternately puts the processing liquid into a pumping state and a non-pumping state. , Using a processing liquid supply unit having a second pumping means for applying a driving force to the processing liquid, a method for supplying the processing liquid to a processing unit that processes the object to be processed,
A first processing liquid supply step of supplying a processing liquid to the processing section by the first supply section;
A second treatment liquid supply step of supplying a treatment liquid to the treatment section by the second supply section;
When the supply of the processing liquid to the processing unit is changed from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pressure feeding state, and the processing liquid in the second supply unit is in a pressure feeding state. At a time, a second pumping means control step for controlling the second pumping means to start supplying the processing liquid from the second supply section to the processing section,
After the second pumping means control step, a first treatment liquid supply stop step for stopping the supply of the treatment liquid from the first supply portion to the treatment portion,
It consists of a method with

  According to such a configuration, the liquid pressure of the processing liquid supplied to the processing unit does not drop sharply, and pulsation does not occur in the processing liquid supplied from the processing unit to the object to be processed. Further, there is no waiting time for switching from the first supply unit to the second supply unit, and the object to be processed can be processed continuously.

  According to the present invention, when the supply of the processing liquid to the processing unit is changed from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pumping state and the second supply unit When the processing liquid is in a pumping state, the second pumping unit is controlled to start supplying the processing liquid from the second supply unit to the processing unit, and then the processing liquid is supplied from the first supply unit to the processing unit. Therefore, the object to be processed can be processed continuously without causing pulsation in the processing liquid supplied from the processing unit to the object to be processed and without waiting time.

BEST MODE FOR CARRYING OUT THE INVENTION

Embodiments Hereinafter, embodiments of a processing liquid supply unit, a liquid processing apparatus, a processing liquid supply method, and a storage medium storing the processing liquid supply method according to the present invention will be described with reference to the drawings. Here, FIG. 1 to FIG. 3 are diagrams showing an embodiment of the present invention.

  The processing liquid supply unit according to the present embodiment supplies a processing liquid generated by mixing a chemical solution and a solvent to a processing unit 60 that processes a semiconductor wafer (hereinafter also referred to as a wafer) that is an object to be processed. belongs to.

  As shown in FIG. 1, the processing liquid supply unit circulates the processing liquid and circulates the first supplying part 10 that supplies the processing liquid to the processing part 60 and the processing liquid having the same components as the first supplying part 10. And a second supply unit 20 that supplies the processing liquid to the processing unit 60 and a control unit 50 that controls the flow of the processing liquid in the first supply unit 10 and the second supply unit 20.

  Moreover, as shown in FIG. 1, the 1st supply part 10 is the 1st storage tank 11 which accommodates the produced | generated process liquid, and the 1st which guides a process liquid toward the process part 60 from the 1st storage tank 11. As shown in FIG. A supply pipe 36, a main supply pipe 55 that branches a part of the processing liquid guided from the first supply pipe 36 and supplies the branched processing liquid to the processing section 60, and the remaining processing liquid that has not been supplied to the processing section 60 And a first return pipe 37 that leads to the storage tank 11. A first continuous pipe 39 that communicates the first supply pipe 36 and the first return pipe 37 is provided between the first supply pipe 36 and the first return pipe 37. Further, a region on the upstream side of the connection portion with the first series pipe 39 in the first supply pipe 36, a region on the downstream side with respect to the connection portion with the first series pipe 39 in the first return pipe 37, The first circulation path 15 is constituted by a first communication pipe 39 provided between the first supply pipe 36 and the first return pipe 37.

  As shown in FIG. 1, a plurality of processing units 60 (four in FIG. 1) are provided, and an openable / closable valve 61 is provided on the upstream side of each processing unit 60. Each processing unit 60 is connected to a recovery unit 65 that recovers the processing liquid used in the substrate processing unit 60 via a recovery pipe 63, and the recovered processing liquid is first returned to the recovery unit 65. A recovery pipe 68 leading to the pipe 37 or a second return pipe 47 described later is connected. The recovery pipe 68 is provided with a pump 66 that applies driving force to the processing liquid recovered by the recovery unit 65.

  As shown in FIG. 1, the first storage tank 11 is connected to a chemical solution supply unit 31 that supplies a chemical solution to the first storage tank 11 and a solvent supply unit 32 that supplies a solvent to the first storage tank 11. Has been. The first storage tank 11 is provided with detection sensors 71a, 71b, 71c for detecting the volume of the processing liquid (or chemical liquid and solvent).

  Further, as shown in FIG. 1, the first supply pipe 36 is provided with a first supply valve 16 that can be opened and closed, and the first return pipe 37 is provided with a first collection valve 17 that can be opened and closed. The communication pipe 39 is provided with a first series of communication valves 19 that can be opened and closed. The first supply pipe 36 is provided with a first pressurization valve (first pressurization member) 12 that is closed to increase the liquid pressure of the processing liquid flowing in the first supply unit 10.

  The second supply unit 20 has the same configuration as the first supply unit 10. That is, as illustrated in FIG. 1, the second supply unit 20 includes a second storage tank 21 that stores the generated processing liquid, and a second guide that guides the processing liquid from the second storage tank 21 toward the processing unit 60. A supply pipe 46, a main supply pipe 55 that branches a part of the processing liquid guided from the second supply pipe 46 and supplies it to the processing unit 60, and the remaining processing liquid that has not been supplied to the processing unit 60 And a second return pipe 47 that leads to the storage tank 21. A second communication pipe 49 that connects the second supply pipe 46 and the second return pipe 47 is provided between the second supply pipe 46 and the second return pipe 47. A region of the second supply pipe 46 on the upstream side of the connection point with the second communication pipe 49, a region of the second return pipe 47 on the downstream side of the connection point with the second communication pipe 49, and the second A second circulation path 25 is constituted by a second communication pipe 49 provided between the supply pipe 46 and the second return pipe 47.

  Further, as shown in FIG. 1, the second storage tank 21 is connected to a chemical solution supply unit 31 that supplies a chemical solution to the second storage tank 21 and a solvent supply unit 32 that supplies a solvent to the second storage tank 21. Has been. Further, in the second storage tank 21, detection sensors 72a, 72b, and 72c for detecting the volume of the processing liquid (or chemical liquid and solvent) are provided.

  1, the second supply pipe 46 is provided with a second supply valve 26 that can be opened and closed, and the second return pipe 47 is provided with a second collection valve 27 that can be opened and closed. The tube 49 is provided with a second communication valve 29 that can be opened and closed. The second supply pipe 46 is provided with a second pressurization valve (second pressurization member) 22 that is closed to increase the liquid pressure of the processing liquid flowing in the second supply unit 20.

  Further, as shown in FIG. 1, the first supply pipe 36 has a first pump (first pump) that alternately puts the processing liquid in the first supply unit 10 into a pressure-feeding state and a non-pressure-feeding state and applies a driving force to the processing liquid. The second pump (first pumping means) 13 is provided in the second supply pipe 46, and the second pump (second pump) alternately puts the processing liquid in the second supply section 20 into a pressure-feeding state and a non-pressure-feeding state and applies driving force to the processing liquid. Two pumping means) 23 is provided. In addition, as the 1st pump 13 and the 2nd pump 23, a bellows pump etc. can be used, for example.

  By the way, in the present application, to put the processing liquid in a pumping state means to apply a driving force to the processing liquid in the supply units 10 and 20 by the pumps 13 and 23 to bring the processing liquid into a high pressure state. When the processing liquid is brought into the non-pressure feeding state, the driving force is not applied to the processing liquid in the supply units 10 and 20 by the pumps 13 and 23, and the liquid pressure of the processing liquid is in a low pressure state. Means.

  As shown in FIG. 1, the first supply valve 16, the first recovery valve 17, the first series valve 19, the first pressurization valve 12, the second supply valve 26, the second recovery valve 27, the second communication valve Connected to the valve 29 and the second pressurizing valve 22 is a control unit 50 that controls the flow of the processing liquid in the first supply unit 10 and the second supply unit 20.

  In addition, when changing supply of the process liquid to the process part 60 from the 1st supply part 10 to the 2nd supply part 20, this control part 50 is a pumping state of the process liquid in the 1st supply part 10, and non- As predicted from the cycle of the pumping state, when the processing liquid in the first supply unit 10 is in the pumping state and the processing liquid in the second supply unit 20 is in the pumping state, the processing is performed from the second supply unit 20. When the second pump 23 is controlled to start supplying the processing liquid to the unit 60 and the supply of the processing liquid to the processing unit 60 is changed from the second supply unit 20 to the first supply unit 10, The processing liquid in the second supply unit 20 is in a pressure-feeding state and the processing liquid in the first supply unit 10 is in a pressure-feeding state as predicted from the cycle of the processing liquid in the supply unit 20 and the non-pumping state. The first pump so as to start supplying the processing liquid from the first supply unit 10 to the processing unit 60. 3 so as to control the.

  Further, when the first supply unit 10 is supplying the processing liquid to the processing unit 60, the control unit 50 applies a driving force from the second pump 23 and performs processing in the second circulation path 25 of the second supply unit 20. When the liquid is circulated and the second supply unit 20 supplies the processing liquid to the processing unit 60, the processing liquid is supplied from the first pump 13 to the first circulation path 15 of the first supply unit 10. Is supposed to circulate.

  As shown in FIG. 1, the control unit 50 is also connected to the first pump 13, the second pump 23, the chemical solution supply unit 31, and the second solvent supply unit 32.

  Next, the operation of the present embodiment having such a configuration will be described. 2A to 2C and FIGS. 5A to 5C, for the sake of simplification, the processing unit 60, the valve 61, the recovery pipe 63, the recovery part 65, the pump 66, and the recovery pipe 68. Is not shown.

  First, the first supply unit 10 supplies the processing liquid to the processing unit 60 (first processing liquid supply step 84) (see FIG. 2A and FIG. 3). At this time, the first supply valve 16, the first recovery valve 17, and the first pressurization valve 12 are opened, and the first series valve 19 is closed (see FIG. 2A).

  Moreover, in this 1st process liquid supply process 84, the driving force is applied to the process liquid in the 1st supply part 10 from the 1st pump 13, and the process liquid in the 1st supply part 10 is a pumping state by turns. And it is in the non-pumping state (refer Fig.2 (a), FIG.3 and FIG.4 (a) (b)).

  As described above, while the processing liquid is supplied to the processing unit 60 by the first supply unit 10, the processing liquid that is a mixture of the chemical solution and the solvent is circulated by the second supply unit 20 (second processing liquid circulation). Step 91) (see FIG. 2A and FIG. 3). At this time, the second communication valve 29 and the second pressurization valve 22 are opened, and the second supply valve 26 and the second recovery valve 27 are closed. Further, a driving force is applied to the processing liquid in the second supply unit 20 from the second pump 23, and the processing liquid in the second supply unit 20 is alternately in a pressure-feeding state and a non-pressure-feeding state (see FIG. 2 (a), FIG. 3 and FIGS. 4 (a) and (b)).

  In addition, a driving force is applied from the second pump 23 to the processing liquid in the second supply unit 20 during the second pressurizing step 93, the second pressure feeding means control step 92, and the second processing liquid supply step 94 described later. Thus, the processing liquid in the second supply unit 20 is alternately in a pressure-feeding state and a non-pressure-feeding state (see FIGS. 3 and 4A and 4B). In addition, as described above, since the treatment liquid that is a mixed liquid of the chemical liquid and the solvent is circulated by the second supply section 20, the chemical liquid and the solvent can be sufficiently mixed in the second supply section 20, and the treatment liquid Can be made to a uniform concentration.

  Next, the control unit 50 predicts from the cycle of the processing liquid in the first supply unit 10 and the non-pumping state, and the processing liquid in the first supply unit 10 is in the pumping state, and the second When the processing liquid in the supply unit 20 is in the pressure feeding state, the second pump 23 is controlled so as to start supplying the processing liquid from the second supply unit 20 to the processing unit 60 (second pumping means control step 92) ( (See FIG. 4 (a)).

More specifically, in the present embodiment, the control unit 50 determines the time length t of the processing solution in the first supply unit 10 from the time length t ₀ of the previous pumping state. ₁ is adjusted, the cycle of the treatment liquid in the first supply unit 10 is adjusted with respect to the cycle of the treatment liquid in the second supply unit 20 (in the pumping state and the non-pumping state), and the first supply unit 10 When the processing liquid in the second supply unit 20 is in the pressure-feeding state and the processing liquid in the second supply unit 20 is in the pressure-feeding state, the second supply unit 20 starts to supply the processing liquid to the processing unit 60 (see FIG. 4 (a)).

  At this time, the second pressurization valve 22 is slightly closed (not completely closed) based on a signal from the control unit 50, and the liquid pressure of the processing liquid in the second supply unit 20 is increased (second). Pressurization process 93) (refer to Drawing 2 (a), Drawing 3, and Drawing 4 (a) (b)). In FIG. 4A, the cycle in which the hydraulic pressure in the second supply unit 20 changes is changed by slightly closing the second pressurizing valve 22, which is driven in the second pump 23. This is because the driving cycle of the second pump 23 (for example, comprising a bellows pump) is delayed when the hydraulic pressure is increased.

  4A shows the driving state of the pumps 13 and 23. The driving state of the pumps 13 and 23 is closely related to the pressure of the processing liquid in the supply units 10 and 20. When the pumps 13 and 23 apply driving force to the processing liquid, the processing liquid in the supply units 10 and 20 is in a pressure-feed state, and when the pumps 13 and 23 do not apply driving force to the processing liquid, the supply unit 10 , 20 is in a non-pumping state.

  Next, the second supply valve 26 and the second recovery valve 27 are opened based on a signal from the control unit 50, and the processing liquid is supplied from the second supply unit 20 to the processing unit 60 (second processing liquid supply step). 94) (see FIG. 2 (b), FIG. 3 and FIG. 4 (a) (b)). At this time, when the processing liquid in the first supply unit 10 is in a pressure-feeding state and the processing liquid in the second supply unit 20 is in a pressure-feeding state, the control unit 50 performs processing from the second supply unit 20 to the processing unit. 60 starts supplying the treatment liquid (see FIGS. 4A and 4B).

  As described above, according to the present embodiment, when the processing liquid in the first supply unit 10 is in a pressure-feeding state and the processing liquid in the second supply unit 20 is in a pressure-feeding state, the second supply unit 20 Since the processing liquid is started to be supplied to the processing unit 60 from the start, the liquid pressure of the processing liquid supplied to the processing unit 60 is abruptly lowered, and the processing liquid supplied from the processing unit 60 to the wafer does not pulsate. .

  That is, when the processing liquid in the first supply unit 10 is in a pressure-feeding state and the processing liquid in the second supply unit 20 is in a non-pressure-feeding state, the processing liquid is supplied from the second supply unit 20 to the processing unit 60. When the supply is started, the liquid pressure of the processing liquid supplied to the processing unit 60 rapidly decreases, and pulsation occurs in the processing liquid supplied from the processing unit 60 to the wafer.

  On the other hand, when the liquid pressure of the processing liquid in the first supply unit 10 is in a non-pumping state and the liquid pressure of the processing liquid in the second supply unit 20 is in a pumping state, the processing is performed from the second supply unit 20. When the processing liquid is started to be supplied to the unit 60, the liquid pressure of the processing liquid supplied from the processing unit 60 to the wafer rapidly increases, and the processing liquid supplied from the processing unit 60 to the wafer pulsates.

  Therefore, when the processing liquid in the first supply unit 10 is in a pressure-feed state and the processing liquid in the second supply unit 20 is in a pressure-feed state as in the present embodiment, the second supply unit 20 By starting to supply the processing liquid to the processing unit 60, it is possible to prevent pulsation from occurring in the processing liquid supplied from the processing unit 60 to the wafer.

  In addition, since the supply of the processing liquid from the second supply unit 20 is started while the processing liquid is being supplied to the processing unit 60 by the first supply unit 10 in this way, There is no waiting time for switching to the supply unit 20, and the wafer can be processed continuously.

  Further, while the processing liquid is being supplied to the processing unit 60 by the first supply unit 10, the second pressure valve 22 is slightly closed to increase the liquid pressure of the processing liquid in the second supply unit 20, The second supply valve 26 and the second recovery valve 27 are opened, and the processing liquid is supplied from the second supply unit 20 to the processing unit 60. For this reason, it can prevent more reliably that a pulsation arises in the process liquid supplied with respect to a wafer from the process part 60. FIG.

  As described above, after starting to supply the processing liquid from the second supply unit 20 to the processing unit 60, the first supply valve 16 and the first recovery valve 17 are closed based on the signal from the control unit 50, and the first The supply of the processing liquid from the supply unit 10 to the processing unit 60 is stopped (first processing liquid supply stop process 89). At this time, the first series valve 19 is opened and the second communication valve 29 is closed based on the signal from the control unit 50 (see FIGS. 2C, 3 and 4A and 4B). ).

  Next, after the driving of the first pump 13 is stopped (see FIG. 4A), the chemical solution is supplied from the chemical solution supply unit 31 into the first storage tank 11, and the first storage from the solvent supply unit 32 is performed. A solvent is supplied into the tank 11.

  Next, a treatment liquid that is a mixture of a chemical and a solvent is circulated in the first supply unit 10 by the first pump 13 (first treatment liquid circulation step 81). Thereafter, the first supply unit 10 performs the same function as the second supply unit 20 described above, while the second supply unit 20 performs the same function as the first supply unit 10 described above (FIG. 3). reference).

  That is, the control unit 50 causes the first supply unit 10 to circulate a treatment liquid that is a mixture of a chemical solution and a solvent for a predetermined time (first treatment liquid circulation step 81), and then performs processing in the second supply unit 20. As predicted from the cycle of the liquid pressure-feeding state and the non-pressure-feeding state, when the processing liquid in the second supply unit 20 is in the pressure-feeding state and the processing liquid in the first supply unit 10 is in the pressure-feeding state, The first pump 13 is controlled so as to start supplying the processing liquid from the one supply unit 10 to the processing unit 60 (first pumping means control step 82). At this time, the first pressure valve 12 is slightly closed (not completely closed) based on the signal from the control unit 50, and the liquid pressure of the processing liquid in the first supply unit 10 is increased (first). Pressurization process 83) (refer FIG. 3, FIG. 5 (a) and FIG. 6 (a) (b)).

  Next, the first supply valve 16 and the first recovery valve 17 are opened based on a signal from the control unit 50, and the processing liquid is supplied from the first supply unit 10 to the processing unit 60 (first processing liquid supply step). 84) (refer to FIG. 3, FIG. 5 (b) and FIG. 6 (a) (b)). At this time, when the processing liquid in the second supply unit 20 is in a pressure-feeding state and the processing liquid in the first supply unit 10 is in a pressure-feeding state, the control unit 50 performs processing from the first supply unit 10 to the processing unit. 60 starts supplying the processing liquid (see FIGS. 6A and 6B).

  As described above, when the processing liquid in the second supply unit 20 is in the pressure-feeding state and the processing liquid in the first supply unit 10 is in the pressure-feeding state, the processing liquid is transferred from the first supply unit 10 to the processing unit 60. Therefore, the liquid pressure of the processing liquid supplied to the processing unit 60 is abruptly reduced, and the processing liquid supplied from the processing unit 60 to the wafer does not pulsate.

  Further, since the supply of the processing liquid from the first supply unit 10 is started while the processing liquid is being supplied to the processing unit 60 by the second supply unit 20 in this way, There is no waiting time for switching to the supply unit 10, and the wafer can be processed continuously.

  Furthermore, while the processing liquid is being supplied to the processing unit 60 by the second supply unit 20, the processing liquid is processed from the first supply unit 10 to the processing unit 60 after increasing the liquid pressure of the processing liquid in the first supply unit 10. Supply liquid. For this reason, it can prevent more reliably that a pulsation arises in the process liquid supplied with respect to a wafer from the process part 60. FIG.

  As described above, after starting to supply the processing liquid from the first supply unit 10 to the processing unit 60, the second supply valve 26 and the second recovery valve 27 are closed based on the signal from the control unit 50, and the second supply valve 26 is closed. The supply of the processing liquid from the supply unit 20 to the processing unit 60 is stopped (second processing liquid supply stop step 99). At this time, based on a signal from the control unit 50, the second communication valve 29 is opened and the first series valve 19 is closed (see FIGS. 3, 5C, 6A, and 6B). ).

  Next, after the driving of the second pump 23 is stopped (see FIG. 6A), the chemical solution is supplied from the chemical solution supply unit 31 into the second storage tank 21, and the second storage is performed from the solvent supply unit 32. A solvent is supplied into the tank 21.

  Next, a treatment liquid that is a mixture of a chemical solution and a solvent is circulated in the second supply unit 20 by the second pump 23 (second treatment liquid circulation step 91).

  Incidentally, in the second treatment liquid supply step 94, the second supply valve 26 and the second recovery valve 27 are opened based on a signal from the control unit 50 while the second communication valve 29 remains open. In the above description, the processing liquid is supplied from the second supply unit 20 to the processing unit 60. However, the present invention is not limited to this, and the second recovery valve 27 remains closed and a signal from the control unit 50 is output. Based on this, the second communication valve 29 is closed and the second supply valve 26 is opened, so that the processing liquid may be supplied from the second supply unit 20 to the processing unit 60 (FIG. 2A-( c)).

  As described above, the pressure of the processing liquid supplied from the second supply unit 20 is kept high by opening only the second supply valve 26 with the second recovery valve 27 and the second communication valve 29 closed. Can do. For this reason, when the supply of the processing liquid is switched from the first supply unit 10 to the second supply unit 20 based on the size of the processing tanks 11, 21 and the size of the first supply pipe 36 and the second supply pipe 46. When the liquid pressure of the processing liquid in the second supply unit 20 needs to be increased, only the second supply valve 26 is opened with the second recovery valve 27 and the second communication valve 29 closed. Is preferred.

  Similarly, in the first treatment liquid supply step 84, the first series valve 19 is closed based on a signal from the control unit 50 with the first recovery valve 17 being closed, and the first supply valve is also closed. 16 may be opened so that the processing liquid is supplied from the first supply unit 10 to the processing unit 60 (see FIGS. 5A to 5C).

  In the above description, the first supply unit 10 and the second supply unit 20 are used. However, the present invention is not limited to this, and there may be three or more supply units for supplying the processing liquid.

  Further, in the above, the supply unit 10 that circulates the treatment liquid in the circulation paths 15 and 25 and supplies the treatment liquid to the treatment unit 60 while supplying the treatment liquid from the supply units 10 and 20 to the treatment unit 60. When changing 20, the pumps 13 and 23 are controlled so that the processing liquid in the first supply unit 10 is in a pressure-feeding state and the processing liquid in the second supply unit 20 is in a pressure-feeding state. Although it demonstrated using the aspect, it is not restricted to this. For example, when the processing liquid is being supplied from the first supply unit 10 to the processing unit 60 and the remaining amount of the processing liquid in the first storage tank 11 has decreased, the second supply unit 20 When the two pumps 23 are started to be driven and the supply of the processing liquid to the processing unit 60 is changed from the first supply unit 10 to the second supply unit 20, the processing liquid in the first supply unit 10 is in a pressure-feed state. And you may adjust the drive of the 2nd pump 23 so that the process liquid in the 2nd supply part 20 may be in a pressure feeding state.

  In addition, according to this Embodiment, the computer program for making a computer perform the processing liquid supply method as mentioned above, and the storage medium which stored such a computer program can also be provided.

The schematic block diagram which shows the process liquid supply unit by embodiment of this invention. The schematic block diagram explaining the one part process of the processing liquid supply method using the processing liquid supply unit by embodiment of this invention. The flowchart which shows the flow of the processing liquid supply method by embodiment of this invention. The graph figure which shows the relationship between the drive state of each pump and control of a valve | bulb by embodiment of this invention in a predetermined time axis | shaft. The schematic block diagram explaining another one part process of the processing liquid supply method using the processing liquid supply unit by embodiment of this invention. The graph which shows the relationship between the hydraulic pressure in each supply part by another embodiment of this invention, and control of a valve | bulb on another predetermined time axis | shaft.

Explanation of symbols

10 1st supply part 11 1st storage tank 12 1st pressurization valve (1st pressurization member)
13 First pump (first pumping means)
16 1st supply valve 17 1st collection | recovery valve 19 1st continuous valve 20 2nd supply part 21 2nd storage tank 22 2nd pressurization valve (2nd pressurization member)
23 Second pump (second pumping means)
26 second supply valve 27 second recovery valve 29 second communication valve 50 control unit 60 processing unit 81 first process liquid circulation process 83 first pressurization process 84 first process liquid supply process 89 first process liquid supply stop process 91 Second treatment liquid circulation step 93 Second pressurization step 94 Second treatment liquid supply step 99 Second treatment liquid supply stop step

Claims (10)

In the processing liquid supply unit for supplying the processing liquid to the processing unit that processes the object to be processed,
A first supply unit for circulating the processing liquid and supplying the processing liquid to the processing unit;
A second supply unit for circulating the processing liquid and supplying the processing liquid to the processing unit;
A control unit for controlling the flow of the processing liquid in the first supply unit and the second supply unit,
The first supply unit has a first pumping unit that alternately turns the processing liquid into a pumping state and a non-pumping state, and applies a driving force to the processing liquid.
The second supply unit has second pumping means that alternately turns the processing liquid into a pumping state and a non-pumping state, and gives a driving force to the processing liquid,
When the control unit changes the supply of the processing liquid to the processing unit from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pressure-feed state and the processing in the second supply unit Control the second pumping means to start supplying the processing liquid from the second supply unit to the processing unit when the liquid is in the pumping state, and then stop supplying the processing liquid from the first supply unit to the processing unit A processing liquid supply unit.   When the control unit changes the supply of the processing liquid to the processing unit from the first supply unit to the second supply unit, the control unit predicts from the cycle of the pumping state and the non-pumping state of the processing liquid in the first supply unit, When the processing liquid in the first supply unit is in a pressure-feeding state and the processing liquid in the second supply unit is in a pressure-feeding state, the second pumping means is configured to start supplying the processing liquid from the second supply unit to the processing unit. The processing liquid supply unit according to claim 1, wherein the processing liquid supply unit is controlled. The first supply unit has a first circulation path for circulating the processing liquid,
The second supply unit has a second circulation path for circulating the processing liquid,
When the control unit changes the supply of the processing liquid to the processing unit from the first supply unit to the second supply unit, the control unit circulates the processing liquid in the second circulation path of the second supply unit, Controlling the second pumping means to start supplying the processing liquid from the second supply section to the processing section when the processing liquid is in the pumping state and the processing liquid in the second supply section is in the pumping state. The processing liquid supply unit according to claim 1, wherein: The first supply unit has a first pressure member for increasing the liquid pressure of the processing liquid flowing in the first supply unit,
The second supply unit has a second pressure member for increasing the liquid pressure of the processing liquid flowing in the second supply unit,
When the first supply unit supplies the processing liquid to the processing unit, the control unit increases the liquid pressure of the processing liquid in the second supply unit by the second pressurizing member, and then transfers the processing liquid from the second supply unit to the processing unit. 2. The processing liquid supply unit according to claim 1, wherein the processing liquid is started to be supplied, and thereafter, the supply of the processing liquid from the first supply unit to the processing unit is stopped. A processing unit for processing an object;
A processing liquid supply unit for supplying a processing liquid to the processing unit,
The treatment liquid supply unit is
A first supply unit for circulating the processing liquid and supplying the processing liquid to the processing unit;
A second supply unit for circulating the processing liquid and supplying the processing liquid to the processing unit;
A control unit for controlling the flow of the processing liquid in the first supply unit and the second supply unit,
The first supply unit has a first pumping unit that alternately turns the processing liquid into a pumping state and a non-pumping state, and applies a driving force to the processing liquid.
The second supply unit has second pumping means that alternately turns the processing liquid into a pumping state and a non-pumping state, and gives a driving force to the processing liquid,
When the control unit changes the supply of the processing liquid to the processing unit from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pressure-feed state and the processing in the second supply unit Control the second pumping means to start supplying the processing liquid from the second supply unit to the processing unit when the liquid is in the pumping state, and then stop supplying the processing liquid from the first supply unit to the processing unit A liquid processing apparatus. A first supply unit that circulates the processing liquid and supplies the processing liquid to the processing unit; and a second supply unit that circulates the processing liquid and supplies the processing liquid to the processing unit. The unit has a first pumping unit that alternately turns the processing liquid into a pressure-feed state and a non-pump-feed state, and applies a driving force to the processing liquid, and the second supply unit alternately puts the process liquid into a pump-feed state and a non-pump-feed state. In the processing liquid supply method for supplying the processing liquid to the processing unit for processing the object to be processed, using the processing liquid supply unit having the second pumping means for applying a driving force to the processing liquid,
A first processing liquid supply step of supplying a processing liquid to the processing section by the first supply section;
A second treatment liquid supply step of supplying a treatment liquid to the treatment section by the second supply section;
When the supply of the processing liquid to the processing unit is changed from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pressure feeding state, and the processing liquid in the second supply unit is in a pressure feeding state. At a time, a second pumping means control step for controlling the second pumping means to start supplying the processing liquid from the second supply section to the processing section,
After the second pumping means control step, a first treatment liquid supply stop step for stopping the supply of the treatment liquid from the first supply portion to the treatment portion,
A process liquid supply method comprising:   In the second pumping means control step, the processing liquid in the first supply unit is in the pumping state and the processing in the second supply unit is predicted from the cycle of the pumping state and non-pumping state of the processing liquid in the first supply unit. 7. The processing liquid supply method according to claim 6, wherein when the liquid is in a pressure feeding state, the second pressure feeding unit is controlled to start supplying the processing liquid from the second supply unit to the processing unit. A second treatment liquid circulation step for circulating the treatment liquid in the second supply unit during the first treatment liquid supply step;
A first treatment liquid circulation step of circulating the treatment liquid in the first supply unit during the second treatment liquid supply step;
The second pressure feeding means control step is performed when the processing liquid in the first supply unit is in a pressure feeding state and the processing liquid in the second supply unit is in a pressure feeding state during the second processing liquid circulation step. The processing liquid supply method according to claim 6, wherein the second pumping unit is controlled to start supplying the processing liquid from the supply unit to the processing unit. During the first treatment liquid supply step, a second pressurization step for increasing the liquid pressure of the treatment liquid in the second supply unit,
During the second treatment liquid supply step, a first pressurization step for increasing the liquid pressure of the treatment liquid in the first supply unit,
A second treatment liquid supply stop step for stopping the supply of the treatment liquid from the second supply section to the treatment section, and
The second treatment liquid supply step is started after the second pressurization step,
The first treatment liquid supply stop step is started after the second treatment liquid supply step,
The first treatment liquid supply step is started after the first pressurization step,
The process liquid supply method according to claim 6, wherein the second process liquid supply stop process is started after the first process liquid supply process. In a storage medium storing a computer program for causing a computer to execute a processing liquid supply method,
The treatment liquid supply method is as follows:
A first supply unit that circulates the processing liquid and supplies the processing liquid to the processing unit; and a second supply unit that circulates the processing liquid and supplies the processing liquid to the processing unit. The unit includes a first pumping unit that alternately turns the processing liquid into a pumping state and a non-pumping state and applies a driving force to the processing liquid, and the second supply unit alternately puts the processing liquid into a pumping state and a non-pumping state. , Using a processing liquid supply unit having a second pumping means for applying a driving force to the processing liquid, a method for supplying the processing liquid to a processing unit that processes the object to be processed,
A first processing liquid supply step of supplying a processing liquid to the processing section by the first supply section;
A second treatment liquid supply step of supplying a treatment liquid to the treatment section by the second supply section;
When the supply of the processing liquid to the processing unit is changed from the first supply unit to the second supply unit, the processing liquid in the first supply unit is in a pressure feeding state, and the processing liquid in the second supply unit is in a pressure feeding state. At a time, a second pumping means control step for controlling the second pumping means to start supplying the processing liquid from the second supply section to the processing section,
After the second pumping means control step, a first treatment liquid supply stop step for stopping the supply of the treatment liquid from the first supply portion to the treatment portion,
A storage medium characterized by the above.

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