JP2009099358A - Surface processing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To restrain reduction in a throughput in the vicinity of an end of a processed object caused by an inflow gas from the outside; and to improve uniformity of surface treatment. <P>SOLUTION: A nozzle section 20 capable of relatively moving in the primary direction is arranged on an arrangement section 10 of the object to be processed W. A jetting port 24 and a suction port 25 extending in the secondary direction crossed with the primary direction are formed on the nozzle section 20 by mutually separating in the primary direction. An end of the suction port 25 in the secondary direction is extended in the secondary direction rather than the jetting port 24. Processing fluid is jetted from the jetting port 24, and is sucked from the suction port 25. A circulation resistance section 30 for making circulation resistance of the fluid enlarge rather than the fluid circulation space 50 is arranged on the outside in the secondary direction of a fluid circulation space 50 which is located between the nozzle section 20 and the arrangement section 10 and is partitioned between the jetting port 24 and the suction port 25. A suction port side portion 33 of the circulation resistance section 30 is withdrawn at the outside of the secondary direction than a jetting port side portion 32. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an apparatus for performing a surface treatment by spraying a processing fluid onto an object to be processed, and particularly suitable for relatively moving both of the processing fluid so as not to leak from between the nozzle portion and the object to be processed. The present invention relates to a surface treatment apparatus.

For example, Patent Document 1 describes a so-called remote atmospheric pressure plasma processing apparatus as an example of a surface processing apparatus. A workpiece is disposed on the upper surface of the stage of the atmospheric pressure plasma processing apparatus, and a processing head is provided above the workpiece. The processing head is movable in one direction with respect to the stage and thus the object to be processed. On the bottom surface of the processing head, a jet port and a suction port respectively extending in a direction orthogonal to the moving direction are provided in parallel and separated in the moving direction. The plasma-ized processing gas is ejected from the ejection port. Thereby, the surface treatment of the workpiece is performed. The treated gas is sucked into the suction port and discharged.
A flow resistance member made of a labyrinth seal or the like is provided at the end of the processing head and the stage in the direction orthogonal to the moving direction. Accordingly, it is possible to suppress the external atmospheric gas from entering between the processing head and the object to be processed and the processing gas from leaking out.
JP 2003-173899 A

  In Patent Document 1, a slight gap is provided between the flow resistance member on the head side and the flow resistance member on the stage side. This is because if there is no gap, particles may be generated by rubbing during relative movement. Therefore, it is not easy to completely prevent the gas from entering and exiting, and the processing of the end portion of the processing target tends to be uneven.

The present invention has been proposed in order to solve the above-described problems, and is an apparatus for performing surface treatment by spraying a treatment fluid onto a workpiece,
A disposition portion of the workpiece, and a nozzle portion that is opposed to the disposition portion and is relatively movable in a first direction that intersects the facing direction with respect to the disposition portion,
In the nozzle portion, a jet port for ejecting the processing fluid and a suction port for sucking the fluid extend in a second direction intersecting the first direction and are separated from each other in the first direction. An end of the suction port in the second direction extends from the jet port in the second direction;
A flow resistance between the nozzle portion and the arrangement portion and outside the second direction of the fluid flow space defined between the jet port and the suction port is larger than the fluid flow space. A portion (first flow resistance portion) is provided, and the portion on the suction port side in the flow resistance portion is retracted to the outside in the second direction from the portion on the jet port side.
Thereby, it is possible to suppress or prevent the processing fluid from leaking to the outside from between the end portions in the second direction of the fluid circulation space, and when the external atmospheric gas flows in, the inflowing gas mainly flows into the suction port. It can be made to be sucked into the extension part. As a result, it is possible to suppress or prevent the processing amount near the end of the object to be processed from decreasing from the central portion, and as a result, it is possible to improve the uniformity of the surface treatment.

It is preferable that an inner end edge of the flow resistance portion facing inward in the second direction is smoothly continuous from the jet port side portion to the suction port side portion.
Thereby, the external inflow gas that has entered the end portion in the second direction of the fluid circulation space can be smoothly directed toward the suction port side in the first direction, and can be reliably sucked into the extended portion of the suction port.
The smoothly continuous inner end edge may be linear as viewed from the facing direction or may be curved. The curved inner end edge may be a convex curve inward in the second direction or a concave curve outward in the second direction, and includes one or a plurality of convex curve portions and concave curve portions, respectively. It may be.

  The inner end edge of the flow resistance portion may be linearly inclined outward in the second direction toward the suction port side portion, and outer in the second direction toward the suction port side portion. It may be a gentle curve inclined to Thereby, the production of the inner end edge can be facilitated. In addition, the inflow gas from the outside can be surely and smoothly directed toward the suction port side in the first direction.

It is preferable that an outer end edge of the flow resistance portion that faces the outside in the second direction is smoothly continuous from the jet outlet side portion to the suction port side portion substantially in parallel with the inner end edge.
Accordingly, the flow resistance in the second direction in the flow resistance portion can be made uniform in the direction from the jet port portion toward the suction port portion.

An end portion in the second direction of the jet port may be defined by the jet side portion of the flow resistance portion, and an end portion of the suction port in the second direction may be defined by the suction port side portion.
The suction port side portion of the flow resistance portion may be relatively displaceable in the second direction with respect to the jet port side portion.
As a result, the length of the extended portion of the suction port can be adjusted according to the change in the amount of gas flowing from the outside due to the pressure fluctuation between the nozzle part and the object to be processed, and the surface treatment The uniformity of the can be further secured.
The flow resistance portion may be adjustable in angle around an axis line along the facing direction.
Accordingly, the suction port side portion can be easily displaced in the second direction with respect to the jet port side portion.
An end portion in the second direction of the jet port is defined by the jet side portion of the flow resistance portion, an end portion in the second direction of the suction port is defined by the suction port side portion, and The suction port side portion of the flow resistance portion may be relatively displaceable in the second direction with respect to the jet port side portion.
Thereby, the end portion of the suction port can be relatively displaced in the second direction with respect to the end portion of the jet port by the relative displacement of the flow resistance portion.

A substantially total amount of the processing fluid is sucked into a portion of the suction port that overlaps the jet outlet in the first direction, and a substantially total amount of gas flowing from the outside to the end portion in the second direction of the fluid circulation space through the flow resistance portion It is preferable that the flow resistance of the flow resistance portion and the length of the extended portion of the suction port are set so as to be sucked by the extended portion of the suction port.
As a result, not only the processing fluid ejected from the center portion in the second direction of the ejection port, but also the processing fluid ejected from the end portion in the second direction of the ejection port toward the suction port substantially along the first direction. The end portion of the workpiece to be processed in the second direction can be surface-treated to the same extent as the central portion, and the uniformity of the surface treatment can be ensured more reliably.

Between the suction port of the nozzle portion and the side opposite to the jet port side in the first direction, and the arrangement portion, another flow resistance portion (the first flow resistance portion that increases the flow resistance of the fluid than the flow resistance portion) 2 flow resistance portions) are preferably provided.
This can prevent external atmospheric gas from entering from the opposite side of the suction port.

  According to the present invention, it is possible to suppress or prevent the processing fluid from leaking to the outside from the end portion between the nozzle portion and the arrangement portion, and when the external atmospheric gas flows from the end portion, the inflow gas is It can mainly be sucked into the extended part of the suction port. As a result, it is possible to suppress or prevent the processing amount near the end of the object to be processed from decreasing from the central portion, and as a result, it is possible to improve the uniformity of the surface treatment.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
1 to 5 show a first embodiment of the present invention. As shown in FIGS. 1 to 3, the surface treatment apparatus 1 includes a stage 10 (arrangement unit) and a nozzle head 20 (nozzle unit) disposed above the stage 10. The stage 10 is moved in a first direction perpendicular to (crossing) the opposing direction (vertical direction) with respect to the nozzle head 20 by a moving means (not shown) (the direction perpendicular to the paper surface in FIGS. 1 and 2 and the horizontal direction in FIG. 3). To be moved to.
The moving means may be connected to the nozzle head 20 instead of the stage 10 so that the position of the stage 10 is fixed and the nozzle head 20 is moved in the first direction.

  A workpiece W is disposed on the upper surface of the stage 10. The workpiece W is, for example, a glass substrate for FPD (flat panel display). The dimension of the second direction (left and right direction in FIGS. 1 and 2) orthogonal to the moving direction (first direction) of the workpiece W is, for example, about 2 m.

  A dummy plate 11 having the same thickness as the workpiece W is provided at the peripheral edge of the stage 10 (both ends in the first direction and both sides in the second direction), and its end surface projects against the end surface of the workpiece W. It has been applied. The upper surfaces of the workpiece W and the dummy plate 11 are flush with each other. Hereinafter, when the dummy plates 11 on both ends in the first direction of the stage 10 and the dummy plates 11 on both sides in the second direction are distinguished from each other, the former code is “11B” and the latter code is “11A”. And

The nozzle head 20 includes a nozzle body 21 and first and second flow resistance plates 30 and 40.
The nozzle body 21 has a long rectangular parallelepiped shape extending in the second direction. A fluid circulation gap 50 (fluid circulation space) is defined between the bottom surface of the nozzle body 21 (the surface facing the arrangement portion), the workpiece W, and the dummy plate 11. The thickness of the fluid circulation gap 50 is, for example, about 2 mm.

  As shown in FIG. 3, three tubes 22, 23, and 23 are provided inside the nozzle body 21. The tubes 22, 23, 23 are made of, for example, Teflon (registered trademark). As shown in FIGS. 1 to 3, the three tubes 22, 23, and 23 extend in the second direction and are arranged in the first direction. The inner diameter of the tubes 22, 23, 23 is, for example, 20 mm, and the wall thickness is, for example, 1. It is several mm.

  The inside of the central tube 22 constitutes a supply header path 22a. At both ends of the header path 22a, a processing gas (a gaseous processing fluid) containing a component corresponding to the processing purpose is introduced from the processing fluid supply path 2A. An atmospheric pressure plasma generation unit (not shown) may be prepared, and the processing gas may be converted into plasma by the atmospheric pressure plasma generation unit and then introduced into the header path 22a. The processing gas may be turned into plasma in the nozzle head 20.

  A large number of small holes 22b penetrating in the thickness direction are formed in the circumferential wall on the bottom side of the tube 22 at equal intervals in the longitudinal direction (second direction). The diameter of each small hole 22b is about 1 mm, for example, and the arrangement interval of the small holes 22b is about 10 mm, for example.

  As shown in FIG.1 and FIG.3, the ejection slit 21a is provided in the part below the tube 22 in the center part of the 1st direction of the nozzle body 21. As shown in FIG. The ejection slit 21a extends long in the second direction with the internal flow path direction facing up and down. The upper end of the ejection slit 21 a is continuous with each small hole 22 b, and the lower end reaches the bottom surface of the nozzle body 21 and is opened. The lower end opening of the ejection slit 21 a constitutes the ejection port 24 of the nozzle head 20. The spout 24 extends continuously in the second direction. The thickness (the dimension in the first direction) of the ejection slit 21a is, for example, about 1 mm, and the dimension in the vertical direction is, for example, about 30 mm. The length L0 (FIG. 1) in the second direction of the ejection slit 21a and the ejection port 24 is substantially the same as or slightly larger than the length (for example, about 2 m) of the workpiece W in the second direction.

  The insides of the tubes 23 and 23 on both sides of the nozzle body 21 constitute suction header paths 23a and 23a. Suction means (not shown) such as a suction pump is connected to both ends of each header path 23a through a suction path 2B. At the bottom of the tube 23, a large number of small holes 23b penetrating in the thickness direction are formed at equal intervals in the longitudinal direction (second direction). The diameter of each small hole 23b is, for example, about 1 mm, and the arrangement interval of the small holes 23b is, for example, about 10 mm.

  A suction slit 21 b is provided in a portion of the nozzle body 21 below each tube 23. The suction slit 21b extends long in the second direction with the internal channel direction facing up and down. The upper end of the suction slit 21b is connected to each small hole 23b, and the lower end reaches the bottom surface of the nozzle body 21 and is opened. The lower end opening of the suction slit 21 b constitutes the suction port 25 of the nozzle head 20. The suction port 25 extends continuously in the second direction. The thickness (the dimension in the first direction) of the suction slit 21b is, for example, about 1 mm, and the dimension in the vertical direction is, for example, about 30 mm.

  The jet port 24 and the suction port 25 are separated from each other in the first direction and are parallel to each other. The distance between the ejection port 24 and the suction port 25 in the first direction is, for example, about 50 mm.

As shown in FIG. 4, the length L1 (FIG. 2) of the suction port 25 is larger than the length L0 (FIG. 1) of the ejection slit 21a and the ejection port 24. Therefore, both ends of the suction slit 21b and the suction port 25 extend outward in the second direction from the ejection slit 21a and the ejection port 24, respectively. As shown in FIG. 5, hereinafter, in the suction port 25, a portion overlapping with the jet port 24 in the first direction is referred to as a main suction portion 25a, and a portion extending in the second direction from the jet port 24 is defined as an extension portion 25b. Call it. The length L2 of each extending portion 25b is, for example, about L2 = 20 mm.
Further, in the fluid circulation gap 50, a region that overlaps the ejection port 24 in the first direction is referred to as a processing gap 51, and a region outside the ejection port 24 in the second direction is referred to as an end circulation gap 52.

  As shown in FIG.1 and FIG.2, the 1st flow resistance board 30 (flow resistance part) is provided in the both ends of the 2nd direction of the bottom face of the nozzle body 21, respectively. The first flow resistance plate 30 protrudes downward (on the stage 10 side) from the bottom surface of the nozzle body 21. As shown in FIG. 4, the first flow resistance plate 30 has a shape in which a pair of parallelogram-shaped plate portions 31 are connected in a V shape. A central portion (portion 32 side portion 32) of the flow resistance plate 30 protrudes inward in the second direction, is substantially flush with the end portion of the ejection slit 21a in the second direction, and the second portion of the ejection port 24. Defines the end of the direction. Both end portions (portion 33 on the suction port 25 side) in the first direction of the flow resistance plate 30 are retracted to the outside in the second direction, and are substantially flush with the end portion in the second direction of the suction slit 21b. The end of the second direction is defined.

  As shown in FIG. 4, the inner end edge 34 facing the inner side in the second direction of the flow resistance plate 30 is smoothly continuous from the jet port side portion 32 to the suction port side portion 33 in the bottom view, and also the suction port side portion 33. It is in a straight line shape that inclines outward in the second direction as it goes to. The inner end edge 34 of the plate portion 31 defines an end portion of the end flow gap 52 outside in the second direction, and the end flow gap 52 has a triangular shape.

The outer edge 35 that faces the outside in the second direction of the plate portion 31 is smoothly continuous from the jet port side portion 32 to the suction port side portion 33, and in the second direction toward the suction port side portion 33 in a bottom view. It extends in parallel with the inner end edge 34 and has a straight line shape inclined outward.
The width of the plate portion 31 (the distance between these edges along the orthogonal direction of the outer edge 35 and the inner edge 34) is, for example, about 100 mm.

  As shown in FIGS. 1 and 2, a flow resistance gap 30a is formed between the flow resistance plate 30 and the dummy plate 11A. The thickness of the flow resistance gap 30a is sufficiently smaller than the thickness of the fluid flow gap 50, for example, about 0.5 mm. Therefore, the flow resistance in the flow resistance gap 30 a is larger than the flow resistance in the fluid flow gap 50.

  As shown in FIGS. 3 and 4, flow resistance plates 40 that respectively constitute second flow resistance portions are provided on both sides of the nozzle body 21 in the first direction. The second flow resistance plate 40 protrudes downward from the bottom surface of the nozzle body 21. The bottom surface of the second flow resistance plate 40 is flush with the bottom surface of the first flow resistance plate 30, but may be non-planar. A flow resistance gap 40 a is formed between the second flow resistance plate 40, the dummy plate 11, and the workpiece W. The thickness of the distribution resistance gap 40a is, for example, about 0.5 mm.

  The second flow resistance plate 40 extends greatly from the nozzle body 21 to the outside in the first direction. The length of the second flow resistance plate 40 in the first direction is sufficiently larger than the width of the first flow resistance plate 30 (the distance between the outer end edge 35 and the inner end edge 34), for example, about 500 mm. Yes. Therefore, the flow resistance of the fluid in the flow resistance gap 40a is sufficiently larger than the flow resistance of the fluid in the flow resistance gap 30a.

  In the above configuration, the processing gas is introduced from the supply path 2A to both ends of the header path 22a. The supply flow rate Q0 of the processing gas is, for example, about Q0 = 120 L / min as a whole, and half (for example, 60 L / min) is introduced into each end of the header path 22a. This processing gas is sequentially led to the ejection slit 21a through the small holes 22b while proceeding in the header path 22a, and is ejected into the processing gap 51 from the ejection port 24 at the lower end of the ejection slit 21a. Due to the uniformizing action of the header passage 22a and the small hole 22b, the jet flow rate per unit length of the jet port 24 in the second direction can be made substantially uniform. The processing gas comes into contact with the surface of the workpiece W and the surface treatment is performed.

The processing gas is divided into approximately half portions immediately below the jet nozzle 24 and flows in the processing gap 51 toward one end side and the other end side in the first direction, respectively. Then, the processed fluid is sucked into the suction port 25, enters the header path 23a from the suction slit 21b through the small hole 23b, is discharged from both ends of the header path 23a, and is sent to the suction means. By the uniforming action of the header path 23a and the small hole 23b, the suction flow rate per unit length along the second direction of the suction port 25 can be made substantially uniform.
At the same time, the stage 10 is relatively moved in the first direction. Thereby, the whole surface of the workpiece W can be processed. Since the nozzle head 20 and the stage 10 are not in contact with each other, no sliding is caused by the movement of the stage 10. Thereby, the generation of particles can be prevented.

The suction flow rates q1 from the suction ports 25 on both sides of the jet port 24 are set to be equal to each other and larger than half q0 (= Q0 / 2) of the processing gas jet flow rate Q0 from the jet port 24. . Therefore, the inside of the fluid circulation gap 50 is at a lower pressure than the external atmosphere. Thereby, it is possible to reliably prevent the processing gas from leaking outside through the flow resistance gaps 30a and 40a.
The pressure difference with respect to the external atmosphere (atmospheric pressure) in the fluid circulation gap 50 is preferably about −10 Pa, for example.

Due to this pressure difference, the external atmospheric gas tends to flow into the fluid circulation gap 50 through the circulation resistance gaps 30a and 40a. On the other hand, in the distribution resistance gap 40a, since the distribution resistance is sufficiently larger than the distribution resistance gap 30a, most of the inflow gas flows from the distribution resistance gap 30a, and the inflow gas from the distribution resistance gap 40a is almost negligible. .
Here, the length L1 of each suction port 25 (and thus the length L2 of the extended portion 25b) is set so that the following relational expression is substantially satisfied.
L1 = (q1 / q0) × L0 Formula (1)
As a result, the suction flow rate at the main suction portion 25a of each suction port 25 becomes substantially equal to the magnitude q0 that is a half of the ejection flow rate. Therefore, as shown by the white arrow in FIG. 5, the processing gas g0 flows almost straight along the first direction not only at the center side in the processing gap 51 but also at the end side in the second direction, and the suction port 25 Can be sucked into the main suction portion 25a.
On the other hand, as shown by the thick arrow in FIG. 5, the inflow gas g1 from the outside flows in the flow resistance gap 30a so as to be substantially along the width direction of each plate portion 31. And if it enters in the end distribution gap 52 from the inner end edge 34 of the distribution resistance plate 30, the direction is changed to the outside in the first direction. Since the inner edge 34 has a smooth line shape when viewed from the bottom, it is possible to prevent the gas g1 from being disturbed and to flow almost straight along the first direction. Thereby, almost the entire amount of the inflowing gas g1 from the outside can be sucked into the extended portion 25b of the suction port 25.

  Accordingly, it is possible to prevent the processing gas g0 from spreading outward in the second direction and being sucked into the extended portion 25b, and the external inflow gas g1 enters inside in the second direction and is sucked into the main suction portion 25a. Can be prevented. Therefore, the edge part of the to-be-processed object W in the 2nd direction can be processed to the same extent as a center part. As a result, the entire workpiece W can be uniformly surface treated.

Next, another embodiment of the present invention will be described. In the following embodiments, the same reference numerals are given to the drawings for the same configurations as those already described, and the description thereof is omitted.
6 and 7 show a second embodiment of the present invention. In this embodiment, a flow resistance device 60 with an angle adjusting function is provided as a first flow resistance portion at both ends (only one end is shown) of the bottom surface of the nozzle body 21 in the second direction. The flow resistance device 60 includes a circular rotating disk 61 and a pair of arcuate movable plates 62.

  The turntable 61 is disposed outside the ejection port 24 in the second direction so as to substantially contact the end of the ejection port 24.

Movable plates 62 are attached to both sides of the turntable 61 in the first direction. In FIG. 6, as indicated by a solid line, a two-dot chain line, and a three-dot chain line, the movable plate 62 is angle-adjusted around the turntable 61 while maintaining a symmetrical relationship with respect to the central axis along the ejection slit 21 a of the nozzle body 21. It is possible.
Although illustration is omitted, a flow resistance gap 30a is formed between the turntable 61 and the movable plate 62 and the dummy plate 11A.

  The lower end on the end side of the suction slit 21b is closed by the tip side portion of the movable plate 62 (the portion far from the rotating disk 61, the suction side portion 62a). An end portion of the suction port 25 is defined by the inner end edge 62 b of the movable plate 62.

  By adjusting the angle of the movable plate 62, the inner edge 62b of the movable plate 62 is advanced and retracted in the second direction. Thereby, the edge part of the suction port 25 is displaced to a 2nd direction, and the length of the extension part 25b is expanded-contracted.

  As shown in FIG. 7, a flat end closing member 63 is attached to the upper surface of the movable plate 62. The end closing member 63 is inserted into the end of the suction slit 21b in the second direction. An end surface of the end closing member 63 facing inward in the second direction is substantially flush with the inner end edge 62 b of the movable plate 62. The end face of the end closing member 63 defines an end portion in the second direction of the gas suckable portion in the internal space of the suction slit 21b. The end closing member 63 is advanced and retracted in the second direction with the rotation of the movable plate 62, and is rotatable about an axis perpendicular to the movable plate 62 so as to always face the second direction.

  Now, it is assumed that the pressure difference of the processing gap 51 with respect to the atmospheric pressure is increased to the negative pressure side. The inflow amount of the external atmospheric gas into the flow resistance gap 11f increases by the increase in the negative pressure degree. In this case, the movable plate 62 is rotationally displaced toward the outside in the second direction. Accordingly, the end portion of the suction port 25 is shifted to the outside in the second direction, and the length of the extended portion 25b is increased. Thereby, even if the inflow gas from the outside increases, the entire amount can be reliably sucked from the extended portion 25b of the suction port 25, and the inflow gas flows into the processing gap 51 on the workpiece W. Can be prevented.

Conversely, assume that the pressure difference (negative pressure) of the processing gap 51 with respect to the atmospheric pressure is reduced. As a result, the amount of external atmospheric gas flowing into the flow resistance gap 30a decreases. In this case, the movable plate 62 is rotationally displaced inward in the second direction. Accordingly, the end of the suction port 25 is displaced inward in the second direction, and the length of the extended portion 25b is reduced. As a result, the processing gas can be prevented from spreading from the processing gap 51 to the outside in the second direction by the amount of decrease of the inflow gas from the outside.
Therefore, only the processing gas can be reliably sucked into the main suction portion 25a of the suction port 25, and only the inflow gas can be reliably sucked into the extension portion 25b. As a result, the uniformity of the surface treatment of the workpiece W can be more reliably ensured.

  Further, following the rotation of the movable plate 62, the end closing member 63 is slid in the second direction. As a result, the end in the second direction of the internal space of the suction slit 21b is displaced in the second direction while maintaining a substantially flush state with the end of the suction port 25. Therefore, it is possible to prevent the gas that has entered from the suction port 25 from spreading in the second direction inside the suction slit 21b.

The present invention is not limited to the above-described embodiment, and can be appropriately modified within a range obvious to those skilled in the art.
For example, the spout 24 may be composed of a row of small holes arranged in the second direction, and may extend intermittently. Similarly, the suction port 25 may be configured by a row of small holes arranged in the second direction, and may extend intermittently in the second direction.
The flow resistance plate 30 may be provided on the stage 10 (dummy plate 11A) instead of the nozzle head 20, or may be provided on both the nozzle head 20 and the stage 10 (dummy plate 11A) so as to be paired with each other.
The flow resistance portion is not limited to the rectangular convex plate 30 in a bottom view or a plan view, and has a comb-teeth shape in which ridges and recesses extending in the first direction are alternately arranged in the second direction. Also good. The comb-like flow resistance portions may be provided on both the nozzle body 21 and the stage 10 (dummy plate 11A) and may be engaged with each other to constitute a labyrinth seal.
The inner end edges 34 and 62b of the plate portions 31 and 62 are not necessarily linear when viewed from the bottom, and may be gently convex or concave. Further, the inner end edge 34 of the plate portion 31 is not limited as long as the jet outlet side portion 32 protrudes inward in the second direction and the suction port side portion 33 retracts outward in the second direction. It is not limited to a smooth line shape such as a curved line, but may be a stepped shape.
In the first embodiment, the first flow resistance plate 30 and the second flow resistance plate 40 are made of separate plate materials, but may be made of a common plate material and integrated.
In the second embodiment, the pressure in the processing gap 51 (or a pressure difference with the outside) may be detected by a sensor, and the angle of the plate portion 31 may be feedback controlled according to the detected pressure.
While the position of the end of the suction port 25 is fixed, the position of the end of the jet port 24 may be adjustable in the second direction. Both the end of the suction port 25 and the end of the jet port 24 may be adjustable in the second direction.
The present invention is applicable to various surface treatments such as surface modification, etching, and film formation.
The processing fluid is not limited to a gaseous state, and may be a liquid (including a mist).

  The present invention is applicable to surface treatment of a glass substrate for flat panel display (FPD), for example.

It is sectional drawing which shows the surface treatment apparatus which concerns on 1st Embodiment of this invention, and follows the II line | wire of FIG. It is sectional drawing which shows the said surface treatment apparatus along the II-II line | wire of FIG. It is sectional drawing which shows the said surface treatment apparatus along the III-III line of FIG. It is a bottom view of the nozzle head of the said surface treatment apparatus which follows the IV-IV line of FIG. It is a bottom view explaining the gas flow in the edge part of the 2nd direction of the said nozzle head. It is a bottom view which shows the nozzle head of the surface treatment apparatus which concerns on 2nd Embodiment of this invention. It is a perspective view of the nozzle head of the second embodiment.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Surface treatment apparatus 2A Processing fluid supply path 2B Suction path 10 Stage (arrangement | positioning part)
20 Nozzle head (nozzle part)
21 Nozzle body 21a Ejection slit 21b Suction slit 22 Central tube 22a Header path 22b Small hole 23 End tube 23a Header path 23b Small hole 24 Spout 25 Suction port 25a Main suction part 25b Extension part 30 First flow resistance plate (flow resistance) Part)
30a Flow resistance gap 31 Plate portion 32 Jet port side portion 33 Suction port side portion 34 Inner edge 35 Outer edge 40 Second flow resistance plate (other flow resistance portion)
40a Flow resistance gap 50 Fluid flow gap (fluid flow space)
51 processing gap 52 end distribution gap 60 distribution resistance device with angle adjustment function (distribution resistance section)
61 Rotary plate 62 Movable plate 62a Suction side portion 62b Inner edge 63 End closing member g0 Flow of processing gas (processing fluid) g1 Flow of inflowing gas from outside W Workpiece

Claims (8)

An apparatus for performing surface treatment by spraying a treatment fluid onto an object to be treated,
A disposition portion of the workpiece, and a nozzle portion that is opposed to the disposition portion and is relatively movable in a first direction that intersects the facing direction with respect to the disposition portion,
In the nozzle portion, a jet port for ejecting the processing fluid and a suction port for sucking the fluid extend in a second direction intersecting the first direction and are separated from each other in the first direction. An end of the suction port in the second direction extends from the jet port in the second direction;
A flow resistance between the nozzle portion and the arrangement portion and outside the second direction of the fluid flow space defined between the jet port and the suction port is larger than the fluid flow space. A surface treatment apparatus, wherein a portion on the suction port side of the flow resistance portion is retracted to the outside in the second direction from the portion on the jet outlet side.   2. The surface treatment apparatus according to claim 1, wherein an inner end edge of the flow resistance portion that faces inward in the second direction is smoothly continuous from the jet port side portion to the suction port side portion. .   3. The surface according to claim 2, wherein the inner edge of the flow resistance portion has a linear shape or a gentle curved shape that is inclined outward in the second direction toward the suction port side portion. 4. Processing equipment.   The outer end edge facing the outside in the second direction in the flow resistance portion is smoothly continuous from the jet port side portion to the suction port side portion substantially parallel to the inner end edge. Item 4. The surface treatment apparatus according to Item 2 or 3.   An end portion in the second direction of the jet port is defined by the jet side portion of the flow resistance portion, and an end portion in the second direction of the suction port is defined by the suction port side portion. The surface treatment apparatus according to any one of claims 1 to 4.   The surface treatment apparatus according to claim 1, wherein the suction port side portion of the flow resistance portion is relatively displaceable in the second direction with respect to the jet port side portion.   Substantially all of the processing fluid is sucked into a portion of the suction port that overlaps with the jet outlet in the first direction, and the gas flowing from the outside to the end in the second direction of the fluid circulation space through the flow resistance portion. The flow resistance of the flow resistance portion and the length of the extended portion of the suction port are set so that the entire amount is sucked by the extended portion of the suction port. The surface treatment apparatus in any one of.   Between the suction port of the nozzle portion, the side opposite to the jet port side in the first direction, and the arrangement portion, another flow resistance portion that increases the flow resistance of the fluid than the flow resistance portion is provided. The surface treatment apparatus according to claim 1, wherein the surface treatment apparatus is provided.

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