JP2009092723A - Double-sided exposure apparatus - Google Patents

Double-sided exposure apparatus Download PDF

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Publication number
JP2009092723A
JP2009092723A JP2007260580A JP2007260580A JP2009092723A JP 2009092723 A JP2009092723 A JP 2009092723A JP 2007260580 A JP2007260580 A JP 2007260580A JP 2007260580 A JP2007260580 A JP 2007260580A JP 2009092723 A JP2009092723 A JP 2009092723A
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Japan
Prior art keywords
light
light source
mirror
double
substrate
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JP2007260580A
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Japanese (ja)
Inventor
Masatoshi Asami
見 正 利 浅
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Adtec Engineering Co Ltd
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Adtec Engineering Co Ltd
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Priority to JP2007260580A priority Critical patent/JP2009092723A/en
Priority to TW097132643A priority patent/TW200921290A/en
Priority to KR1020080089214A priority patent/KR20090034724A/en
Priority to CNA2008101680242A priority patent/CN101403863A/en
Publication of JP2009092723A publication Critical patent/JP2009092723A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a double-sided exposure apparatus capable of exposing both of top and back faces of a substrate under the same exposure conditions without requiring complicated adjustment or control. <P>SOLUTION: The light from a light source lamp 10 is condensed by an elliptical mirror 11, made to return by a reflection mirror 12, focused at a fly-eye lens 13, split into reflected light and transmitted light by a spectral mirror 20, controlled for the luminous energy by a light source shutter 21, reflected by a collimation mirror 3 to produce parallel beams, and transmitted through a photomask 51 and a photomask 52 to irradiate top and back sides of a substrate 50. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

この発明は、プリント配線基板の両面を露光する両面露光装置に関する。   The present invention relates to a double-sided exposure apparatus that exposes both sides of a printed wiring board.

プリント配線基板の表面と裏面を同時に露光する平行光両面同時露光装置においては、従来は表面と裏面それぞれを露光するために光源を表面用と裏面用の二灯設けていた。   In a parallel light double-sided simultaneous exposure apparatus that simultaneously exposes the front and back surfaces of a printed wiring board, conventionally, two light sources for the front and back surfaces are provided to expose the front and back surfaces, respectively.

しかし、従来の装置では、光源装置が２台あるため、それぞれの装置やランプの個体差により、表面と裏面の露光条件が変わる場合があり、表裏で同一の露光を行うための調整や制御が難しく、手間がかかる問題があった。   However, since there are two light source devices in the conventional device, the exposure conditions on the front and back surfaces may change due to individual differences between the devices and lamps, and adjustment and control for performing the same exposure on both sides There was a difficult and time-consuming problem.

また、１台の露光装置に対して、光源装置を２台分搭載することになるため、コストが高くまた装置が大型化する問題があった。
本発明は上記従来技術の問題を解決することを目的とする。 Further, since two light source devices are mounted on one exposure apparatus, there is a problem that the cost is high and the apparatus is enlarged.
The object of the present invention is to solve the problems of the prior art.

上記目的を達成するために、本発明の両面露光装置は、１つの光源と、該光源の光の半分を反射し他の半分を透過する分光体と、該分光体が反射した光を露光対象であるプリント配線基板の一面側に照射する第１のコリメーションミラーと、該分光体を透過した光を露光対象であるプリント配線基板の一面側に照射する第２のコリメーションミラーと、前記分光体と第１のコリメーションミラーとの間に設けられ分光体からの光量を調節する第１の光源シャッターと、前記分光体と第２のコリメーションミラーとの間に設けられ分光体からの光量を調節する第２の光源シャッターと、を有することを特徴とする。
以上の構成において、 単一の光源を用い、この光源から入射した光の半分を反射し.もう半分を透過する分光体により、２つの光束に分光することにより両面同時露光を実現できる。 In order to achieve the above object, a double-sided exposure apparatus of the present invention exposes one light source, a spectroscopic body that reflects half of the light from the light source and transmits the other half, and light reflected by the spectroscopic body. A first collimation mirror that irradiates one side of the printed wiring board that is, a second collimation mirror that irradiates one side of the printed wiring board that is an exposure target, and the spectral body. A first light source shutter that is provided between the first collimation mirror and adjusts the amount of light from the spectroscopic body, and a first light source shutter that is provided between the spectroscopic body and the second collimation mirror and that adjusts the amount of light from the spectroscopic body. 2 light source shutters.
In the above configuration, a single light source is used, and double-sided simultaneous exposure can be realized by splitting the light into two light beams by using a spectroscopic material that reflects half of the light incident from the light source and transmits the other half.

本発明の両面露光装置によれば、光源が単一であるため、保守管理しやすい。また交換作業時間が短縮され、ランプ個体差等による表面と裏面の露光条件の変化などが無い。また装置が小型化、設置スペースが小さくて良く、メンテナンススペースなどを広くとれる効果がある。更に装置の構造の簡単化、装置コストやランニングコストの低下などを実現出来る効果がある。   According to the double-sided exposure apparatus of the present invention, since the light source is single, maintenance management is easy. Further, the replacement work time is shortened, and there is no change in the exposure conditions on the front and back surfaces due to individual lamp differences. Further, the apparatus can be downsized, the installation space can be small, and there is an effect that a large maintenance space can be obtained. Further, there are effects that the structure of the apparatus can be simplified and the apparatus cost and running cost can be reduced.

以下本発明の実施の形態を図面に基づいて説明する。
図１において、露光対象である基板５０はフォトマスク５２の上に載置され、基板５０の上方に位置するフォトマスク５１とフォトマスク５２に描かれたパターンが基板５０の表裏に露光される構成になっている。 Embodiments of the present invention will be described below with reference to the drawings.
In FIG. 1, a substrate 50 to be exposed is placed on a photomask 52, and a photomask 51 positioned above the substrate 50 and a pattern drawn on the photomask 52 are exposed on the front and back of the substrate 50. It has become.

この両面露光装置の光源装置は単一の光源部１と分光ユニット２及び基板５０の表側と裏側それぞれ設けられたコリメーションミラー３、３を有する。
光源部１は光源ランプ１０と楕円ミラー１１と反射ミラー１２及びフライアイレンズ１３を有し、光源ランプ１０から出た光は楕円ミラー１１によって集光され、反射ミラー１２で折り返された後、フライアイレンズ(fly eye lens)１３部分で焦点を結ぶように構成されている。 The light source device of the double-sided exposure apparatus includes a single light source unit 1, a spectroscopic unit 2, and collimation mirrors 3 and 3 provided on the front side and the back side of the substrate 50, respectively.
The light source unit 1 includes a light source lamp 10, an elliptical mirror 11, a reflection mirror 12, and a fly-eye lens 13. Light emitted from the light source lamp 10 is collected by the elliptical mirror 11, folded by the reflection mirror 12, and then fly. An eye lens (fly eye lens) 13 is configured to focus.

分光ユニット２は、分光ミラー２０と光源シャッター２１、２１を有しており、フライアイレンズ１３から出た光が分光ミラー２０により反射光と透過光に分光され、それぞれ基板５０の表面及び裏面の露光用の光となるようになっている。
分光ミラー２０の両側にはそれぞれ光源シャッター２１、２１が設けられており、この光源シャッター２１により光量を制御するように構成されている。
分光ミラー２０には種々のものがあり、例えばガラスにＳｉＯ２(二酸化ケイ素)やＴａ２Ｏ２(五酸化タンタル)などの多層膜を形成したもの、或いは市松状にアルミ蒸着したもの等が一般的であるが、これらの構成を採用可能である。 The spectroscopic unit 2 includes a spectroscopic mirror 20 and light source shutters 21 and 21, and light emitted from the fly-eye lens 13 is split into reflected light and transmitted light by the spectroscopic mirror 20. It becomes light for exposure.
Light source shutters 21 and 21 are provided on both sides of the spectroscopic mirror 20, respectively, and the light amount is controlled by the light source shutter 21.
There are various types of the spectroscopic mirror 20, for example, a glass formed with a multilayer film such as SiO2 (silicon dioxide) or Ta2O2 (tantalum pentoxide) or a metal-deposited aluminum in a checkered pattern. These configurations can be employed.

コリメーションミラー３（collimation mirror) は基板５０の表側と裏側の両方にそれぞれ配設されている。分光ミラー２０を反射した光は基板５０の表側（上側）のコリメーションミラー３で反射され、平行光となり、フォトマスク５１を透過して基板５０の表側上へ照射される。
一方分光ミラー２０を透過した光は基板５０の裏側（下側）のコリメーションミラー３で反射され、同様に平行光となり、フォトマスク５２を透過して基板５０の裏側上へ照射される。
なおコリメーションミラー３、３には積算光量計（図示せず）が設けられており、この積算光量計の光量測定に基づいて光源シャッター２１、２１の制御を行い、光量の調整を行うように構成されている。 Collimation mirrors 3 are provided on both the front side and the back side of the substrate 50, respectively. The light reflected by the spectroscopic mirror 20 is reflected by the collimation mirror 3 on the front side (upper side) of the substrate 50, becomes parallel light, passes through the photomask 51, and is irradiated on the front side of the substrate 50.
On the other hand, the light transmitted through the spectroscopic mirror 20 is reflected by the collimation mirror 3 on the back side (lower side) of the substrate 50, becomes parallel light in the same manner, passes through the photomask 52, and is irradiated onto the back side of the substrate 50.
The collimation mirrors 3 and 3 are provided with an integrated light meter (not shown), and the light source shutters 21 and 21 are controlled based on the light amount measurement of the integrated light meter to adjust the light amount. Has been.

以上の構成により、単一の光源部１の露光光は分光ミラー２０において分光され、コリメーションミラー３、３により基板５０の表裏に露光されるから、単一の光源部１による両面露光が可能になる。
そのため、光源部１や光源ランプ１０の個体差がなく、面倒な調整や制御を行わずに基板５０の表面と裏面の露光条件を同一にすることができる。また、コストの低減、装置の小型化を実現することが可能である。 With the above configuration, the exposure light of the single light source unit 1 is split by the spectroscopic mirror 20 and is exposed on the front and back surfaces of the substrate 50 by the collimation mirrors 3 and 3, so that double-sided exposure by the single light source unit 1 is possible. Become.
Therefore, there is no individual difference between the light source unit 1 and the light source lamp 10, and the exposure conditions for the front surface and the back surface of the substrate 50 can be made the same without troublesome adjustment and control. Further, it is possible to reduce the cost and downsize the apparatus.

本発明の一実施形態を示す概略図。Schematic which shows one Embodiment of this invention.

符号の説明Explanation of symbols

１：光源部、２：分光ユニット、３：コリメーションミラー、１０：光源ランプ、１１：楕円ミラー、１２：反射ミラー、１３：フライアイレンズ、２０：分光ミラー２０、２１：光源シャッター、５０：基板、５１：フォトマスク、５２：フォトマスク。 1: light source unit, 2: spectral unit, 3: collimation mirror, 10: light source lamp, 11: elliptical mirror, 12: reflection mirror, 13: fly-eye lens, 20: spectral mirror 20, 21: light source shutter, 50: substrate 51: Photomask, 52: Photomask.

Claims (1)

１つの光源と、
該光源の光の半分を反射し、他の半分を透過する分光体と、
該分光体が反射した光を、露光対象であるプリント配線基板の一面側に照射する第１のコリメーションミラーと、
該分光体を透過した光を、露光対象であるプリント配線基板の一面側に照射する第２のコリメーションミラーと、
前記分光体と第１のコリメーションミラーとの間に設けられ、分光体からの光量を調節する第１の光源シャッターと、
前記分光体と第２のコリメーションミラーとの間に設けられ、分光体からの光量を調節する第２の光源シャッターと、
を有することを特徴とする両面露光装置。 One light source,
A spectroscopic material that reflects half of the light from the light source and transmits the other half;
A first collimation mirror that irradiates the light reflected by the spectroscopic material to one surface side of the printed wiring board to be exposed;
A second collimation mirror that irradiates one side of the printed wiring board to be exposed with light transmitted through the spectral body;
A first light source shutter provided between the spectral body and the first collimation mirror, for adjusting the amount of light from the spectral body;
A second light source shutter provided between the spectral body and the second collimation mirror, for adjusting the amount of light from the spectral body;
A double-sided exposure apparatus comprising:
JP2007260580A 2007-10-04 2007-10-04 Double-sided exposure apparatus Pending JP2009092723A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007260580A JP2009092723A (en) 2007-10-04 2007-10-04 Double-sided exposure apparatus
TW097132643A TW200921290A (en) 2007-10-04 2008-08-27 Double-side exposure apparatus
KR1020080089214A KR20090034724A (en) 2007-10-04 2008-09-10 Both side exposing device
CNA2008101680242A CN101403863A (en) 2007-10-04 2008-09-25 Double-side exposal device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007260580A JP2009092723A (en) 2007-10-04 2007-10-04 Double-sided exposure apparatus

Publications (1)

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JP2009092723A true JP2009092723A (en) 2009-04-30

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Application Number Title Priority Date Filing Date
JP2007260580A Pending JP2009092723A (en) 2007-10-04 2007-10-04 Double-sided exposure apparatus

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JP (1) JP2009092723A (en)
KR (1) KR20090034724A (en)
CN (1) CN101403863A (en)
TW (1) TW200921290A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020119863A1 (en) 2018-12-12 2020-06-18 Laser Imaging Systems Gmbh Device for exposing planar workpieces at a high throughput rate

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102968000A (en) * 2012-11-21 2013-03-13 京东方科技集团股份有限公司 Dual-sided processing method and exposure device
CN104423176A (en) * 2013-08-30 2015-03-18 深南电路有限公司 Optical system and exposure machine
CN104483813A (en) * 2014-12-01 2015-04-01 东莞科视自动化科技有限公司 Exposure machine light source transformation method and UVLED light source mechanism
CN113141718B (en) * 2021-04-21 2022-04-05 广东科视光学技术股份有限公司 Method for forming connection line on glass substrate through single photoetching head
CN114114854B (en) * 2021-11-30 2024-03-19 中山市三美高新材料技术有限公司 Screening device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020119863A1 (en) 2018-12-12 2020-06-18 Laser Imaging Systems Gmbh Device for exposing planar workpieces at a high throughput rate
DE102018132001A1 (en) 2018-12-12 2020-06-18 Laser Imaging Systems Gmbh Device for exposing plate-shaped workpieces with high throughput
US11656556B2 (en) 2018-12-12 2023-05-23 Laser Imaging Systems Gmbh Apparatus for the exposure of plate-shaped workpieces with high throughput

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CN101403863A (en) 2009-04-08
TW200921290A (en) 2009-05-16
KR20090034724A (en) 2009-04-08

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