JP2006295068A - Irradiator - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an irradiator which can prevent an uneven irradiation without making complicated a structure at a high irradiation intensity density when a light irradiation is made with linear beams. <P>SOLUTION: The irradiator sets a broad band area direction (x-axis direction) of a laser light source 11 to a long axial direction, and also, generates the linear beams that only the long axial direction is made uniform. Further, after the uniformly made linear beams are reduced and projected, the linear beams are irradiated on an irradiation object 3. When the light irradiation is made with the linear beams, the uneven irradiation can be prevented at the high irradiation intensity density. Further, a condenser lens 14 and a projection optical system 16 (lens systems 161A, 161B) closer to an irradiation side than a cylindrical lens array 13B constituting a secondary light source are constituted by a spherical optical system. Accordingly, a degree of freedom of an optical design is enhanced and a fabrication is made easy. Thus, an overall arrangement of the device is simplified and the arrangement is not complicated. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an irradiation apparatus for irradiating an irradiation target with a broadband area type semiconductor laser as a light source.

  2. Description of the Related Art Conventionally, a method of annealing a silicon thin film using a continuously oscillating laser is known in order to form circuit elements or the like with polycrystalline silicon in a manufacturing process of a liquid crystal display device or an organic EL (ElectroLuminescence) display device, for example. . In this way, the method of annealing with laser light partially irradiates the silicon thin film, so that the entire substrate can be prevented from becoming high temperature, and a glass substrate can be used as the substrate. .

  In addition, in such a laser annealing method, it is known that the output laser light from the irradiation optical system of the annealing apparatus is preferably a linear beam in order to realize a high throughput of the annealing process. . In addition, in order to generate uniform polycrystalline silicon by such laser annealing treatment, the major axis direction of the linear beam is configured by a so-called uniform optical system, and uneven irradiation in the major axis direction on the silicon thin film is suppressed. It is known to be desirable.

  For example, Patent Document 1 discloses an irradiation optical system that uses such a uniformizing optical system to generate a linear beam having a uniform major axis direction. Specifically, for example, as shown in FIGS. 7 and 8 in an end view and a cross-sectional view taken along the line CC in FIG. 7, the light beam emitted from the light source 101 is intensity distribution shaping means. The x-axis direction component is divided by the cylindrical lens array 103A, and is overlapped and made uniform on the irradiation target surface of the irradiation target 301 mounted on the stage 201 by the cylindrical lens 103B which is a part of the beam shaping unit. . The y-axis direction component is condensed to the diffraction limit of the light source 101 by the cylindrical lens 104 which is a part of the beam shaping means. In this way, the irradiation target 301 is irradiated with a linear beam having the major axis in the x-axis direction and the minor axis in the y-axis direction.

  Further, Patent Document 2 discloses an irradiation optical system in which a fly-eye lens arranged one-dimensionally along the long axis direction of a linear beam is used as the intensity distribution shaping means instead of a cylindrical lens array. Has been.

JP 2001-7045 A JP 2002-252182 A

  However, since the irradiation optical system disclosed in Patent Document 1 has a configuration in which many cylindrical lenses are used as described above, optical design becomes difficult due to low manufacturing freedom of the cylindrical lenses. There is a problem that it ends up. This complicates the apparatus configuration and makes optical adjustment difficult.

  On the other hand, in the irradiation optical system disclosed in Patent Document 2, since the fly-eye lens is used instead of the cylindrical lens array as the intensity distribution shaping unit as described above, the configuration of the cylindrical lens occupying the entire optical system. The ratio is reduced as compared with Patent Document 1.

  However, it is known that when annealing is performed using such a linear beam, it is necessary to increase the energy density per unit area of the linear beam. When the energy density of the linear beam decreases, it becomes difficult to heat the silicon thin film to the temperature required for the annealing process, or it becomes necessary to heat for a long time. This is because a decrease occurs. Here, in order to increase the energy density (irradiation intensity density) of the linear beam in this way, it is necessary to increase the aperture ratio (NA) on the image side. Therefore, in Patent Document 2, a cylindrical lens must still be used as the beam shaping means, and the above-described problems such as the difficulty of optical design have not been completely solved.

  Moreover, the irradiation optical system disclosed in Patent Document 2 has a poor compatibility with a light source having a so-called M2 value close to 1, that is, a light source close to a point light source. Specifically, in this irradiation optical system, since the linear beam is made uniform in the major axis direction, there is a problem that interference fringes with high contrast are generated along the major axis direction. there were. Therefore, in this irradiation optical system, it is actually difficult to make the linear beam uniform, and it is also difficult to prevent uneven irradiation.

  As described above, in the conventional technique, it is difficult to prevent uneven irradiation without complicating the configuration with high irradiation intensity density when performing light irradiation with a linear beam.

  The present invention has been made in view of such problems, and its purpose is to prevent uneven irradiation without complicating the configuration with a high irradiation intensity density when performing light irradiation with a linear beam. Is to provide a simple irradiation apparatus.

  The first irradiation apparatus according to the present invention includes a broad area type semiconductor laser having a first direction as a longitudinal direction, a laser light source that emits laser light, and a first laser light emitted from the laser light source. A collimator optical system in which a component in a second direction orthogonal to the direction of 1 is a parallel light beam, and a first light source that generates a secondary light source by dividing the component in the first direction of the emitted laser light into a plurality of light beams Consists of a homogenizing optical system and a spherical optical system, condensing components in the second direction in a plurality of light beams from a secondary light source generated by the first uniformizing optical system, and from the secondary light source Secondary light generated by the first condenser optical system, which is composed of a first condenser optical system that generates an image by superimposing components in the first direction in the plurality of light beams, and a spherical optical system. It is obtained by a projection optical system for irradiating the irradiation object by reduction projection images of a plurality of light beams from.

  The second irradiation apparatus of the present invention is composed of a broad area type semiconductor laser having a first direction as a longitudinal direction, a laser light source for emitting laser light, and a first laser light emitted from the laser light source. A collimator optical system in which a component in a second direction orthogonal to the direction of 1 is a parallel light beam, and a first light source that generates a secondary light source by dividing the component in the first direction of the emitted laser light into a plurality of light beams Consists of a homogenizing optical system and a spherical optical system, condensing components in the second direction in a plurality of light beams from a secondary light source generated by the first uniformizing optical system, and from the secondary light source Secondary light generated by the first condenser optical system, which is composed of a first condenser optical system that generates an image by superimposing components in the first direction in the plurality of light beams, and a spherical optical system. A plurality of irradiation means each having a projection optical system for projecting a reduced image of a plurality of light beams from the projection and irradiating the irradiation target, a stage on which the irradiation target is mounted, and an irradiation target mounted on the stage And an irradiation position control means for relatively moving the irradiation positions of the light beams from the plurality of secondary light sources respectively irradiated from the plurality of irradiation means.

  In the irradiation apparatus of the present invention, laser light is emitted from a broadband area type laser light source having a first direction as a long direction (long axis direction), and the second direction (short axis direction) is emitted by a collimator optical system. The component becomes a parallel light flux. On the other hand, the component in the first direction (major axis direction) of the emitted laser light is divided into a plurality of light beams by the first uniformizing optical system, and a secondary light source is generated. In addition, the plurality of light beams from the secondary light source are collected by the first condenser optical system for the component in the second direction, respectively, while being superimposed in the first direction. In this way, the broadband area direction of the laser light source is the major axis direction, and a linear beam that is uniform only in the major axis direction is generated. Then, this uniformed linear beam is reduced and projected by the projection optical system, and is irradiated onto the irradiation object under a high irradiation intensity density. Furthermore, since the first condenser optical system and the projection optical system are not spherical lenses, which are aspherical optical systems, but are constituted by spherical optical systems, the overall configuration of the apparatus is simplified.

  According to the irradiation apparatus of the present invention, the broadband area direction of the laser light source is set as the major axis direction, and a linear beam that is uniform only in the major axis direction is generated, and the uniformed linear beam is reduced and projected. Then, since the irradiation object is irradiated, when the light irradiation with the linear beam is performed, the irradiation unevenness can be prevented by the high irradiation intensity density. Further, since the first condenser optical system and the projection optical system are configured by spherical optical systems, the configuration of the entire apparatus is simplified, and the irradiation apparatus can be configured without complicating the configuration. .

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

[First Embodiment]
FIG. 1 shows the overall configuration of an irradiation apparatus according to the first embodiment of the present invention. This irradiating apparatus applies laser light emitted from a plurality of irradiation optical systems 1A, 1B, and 1C to an irradiation object 3 mounted on a stage 2 (as indicated by an arrow X, in the x-axis direction). A linear beam having a major axis direction), and a plurality of irradiation optical systems 1A, 1B, and 1C, a stage 2, operation control of the irradiation optical systems 1A, 1B, and 1C, and a Y direction of the stage 2 And a control unit 4 that performs scanning control. Here, this irradiation apparatus corresponds to a specific example of the “second irradiation apparatus” in the present invention, and the irradiation optical systems 1A, 1B, and 1C are respectively “first irradiation apparatus” and “irradiation means” in the present invention. To a specific example.

  Each of the irradiation optical systems 1A, 1B, and 1C irradiates the irradiation target 3 with a linear beam whose major axis is the x-axis direction in accordance with the control from the control unit 4 as described above. A plurality of processes 30 (30A, 30B, 30C) as shown in FIG. 1 are formed.

  2 and 3 illustrate the configuration of the irradiation optical system 1 (1A, 1B, 1C), FIG. 2 is an end view from the y-axis direction, and FIG. 3 is an arrow at the AA portion in FIG. The cross-sectional views are respectively shown. The irradiation optical system 1 includes a semiconductor laser 11, a collimator lens 12, a cylindrical lens array pair 13, a condenser lens 14, a diaphragm 15, and a projection optical system 16.

  The semiconductor laser 11 is composed of a broadband type semiconductor laser whose longitudinal direction is the x-axis direction. As this semiconductor laser 11, a laser beam having a wavelength of 700 to 1000 nm can be used. For example, a high-power semiconductor laser having a wavelength of about 800 nm or a wavelength of about 940 nm is used. It is preferable to use those. By configuring the light source of the irradiation device in this way, the light source can be downsized and the laser beam emitted can be easily formed into a linear beam as will be described later. The semiconductor laser 11 corresponds to a specific example of “laser light source” in the present invention.

  The collimator lens 12 is a lens having positive power, and makes the y-axis direction component of the light beam a parallel light beam (see FIG. 3). The collimator lens 12 corresponds to a specific example of “collimator optical system” in the present invention.

  The cylindrical lens array pair 13 includes a pair of cylindrical lens arrays 13A and 13B, and these cylindrical lens arrays 13A and 13B are arranged in an array along the x-axis direction (see FIG. 2). The cylindrical lens array 13 </ b> A is disposed at the back focal position of the collimator lens 12. With such a configuration, in the cylindrical lens array pair 13, the x-axis direction component of the light beam is divided into a plurality of light beams by the cylindrical lens array 13A, and a secondary light source is formed on the cylindrical lens array 13B (see FIG. 2). It has become. The cylindrical lens array pair 13 corresponds to a specific example of “first uniforming optical system” and “first cylindrical lens array pair” in the present invention.

  The condenser lens 14 is a spherical optical system lens that condenses the y-axis direction components of a plurality of light beams from the secondary light source (see FIG. 3) and superimposes the x-axis direction components, respectively. Is uniformly irradiated (see FIG. 2). In this way, as will be described later, a linear beam image is formed at the position of the stop 15 with the x-axis direction being the long-axis direction and being uniform in the x-axis direction. The condenser lens 14 corresponds to a specific example of “first condenser optical system” in the invention.

  The diaphragm 15 controls the opening thereof to adjust the irradiation area in the x-axis direction of the light beam from the secondary light source that irradiates the irradiation object 3 (see FIG. 2), and to control the linear beam described later. The long axis direction region is formed (see FIG. 4).

  The projection optical system 16 projects the image of the linear beam formed at the position of the stop 15 in a reduced scale and irradiates the irradiation target 3 with a pair of lens systems 161A and 161B and these lens systems 161A. , 161B, and a polarizing beam splitter 162 and a 1 / 4λ plate (¼ wavelength plate) 163.

  The lens systems 161 </ b> A and 161 </ b> B perform the reduction projection as described above, and play a central role of the projection optical system 16. Further, these lens systems 161A and 161B are arranged so as to constitute a both-side telecentric optical system.

  The polarization beam splitter 162 selectively transmits only a specific polarization component of incident light from the lens system 161A or the ¼λ plate 163. Specifically, by transmitting a P-polarized component perpendicular to the x-axis direction and reflecting an S-polarized component perpendicular to the y-axis direction in the incident light, the incident light is converted into an S-polarized component and a P-polarized component. Are separated from each other. The quarter-λ plate 163 changes the phase of incident light from the polarization beam splitter 162 or the lens system 161B by 90 degrees. With such a configuration, the polarization beam splitter 162 and the ¼λ plate 163 function as so-called isolators, preventing the reflected light from the irradiation target surface 31 from returning to the semiconductor laser 11 and preventing the semiconductor laser 11 from being destroyed. It has become. Specifically, the P-polarized light component selectively transmitted through the polarizing beam splitter 162 is transmitted through the ¼λ plate 163, the phase thereof is changed by 90 degrees as described above, and further reflected by the irradiation target surface 31. When the phase is again changed by 90 degrees by transmitting through the / 4λ plate 163, it becomes an S-polarized component, so that it is reflected by the polarization beam splitter 162 and cannot return to the semiconductor laser 11.

  Returning to the description of FIG. 1, the irradiation object 3 is one in which the irradiation target surface 31 is irradiated with irradiation light (a linear beam having the major axis direction in the x-axis direction as described above). Examples include TFT (Thin Film Transistor) panels in liquid crystal display devices and organic EL display devices. Moreover, the stage 2 mounts the irradiation object 3 as mentioned above. The control unit 4 performs operation control of the irradiation optical system 1 and scanning control of the stage 2 in the Y direction as described above. In this way, the control unit 4 performs scanning control of the stage 2 in the Y direction and scans the irradiation target 3 with the mounting surface, thereby moving the irradiation position of the irradiation light in the y-axis direction relative to each other. ing. Since the stage 2 scans in the Y direction in this way, as shown in FIG. 1, all of the processes 30A, 30B, and 30C are formed along the y-axis direction. The controller 4 corresponds to a specific example of “irradiation position control means” in the present invention.

  Next, the operation of the irradiation apparatus having such a configuration will be described separately in the x-axis direction (FIG. 2) and the y-axis direction (FIG. 3).

  First, in the x-axis direction, laser light emitted from the semiconductor laser 11 whose broadband area direction is the x-axis direction in the irradiation optical system 1 is divided into a plurality of light beams by the collimator lens 12 and the cylindrical lens array 13A. . Here, as described above, since the plurality of light beams thus divided irradiate the cylindrical lens array 13B, a secondary light source is formed on the cylindrical lens array 13B. . The plurality of light beams from the secondary light source are superimposed on the position of the stop 15 by the condenser lens 14 and irradiated with the luminance in the x-axis direction made uniform.

  On the other hand, in the y-axis direction, in the irradiation optical system 1, the laser light emitted from the semiconductor laser 11 becomes a parallel light beam by the collimator lens 12, passes through the cylindrical lens array pair 13, and then is stopped by the condenser lens 14. Irradiated in a focused state.

  Thus, for example, as shown in FIGS. 4 (A) and 4 (B), the position of the diaphragm 15 has the x-axis direction as the major axis direction and the y-axis direction corresponding to the broadband area direction. Linear beam images G1 and G2 are formed which have a short axis direction and are uniform only in the long axis direction x-axis direction (y-axis direction is Gaussian).

  Then, the light beam of the uniform linear beam is reduced and projected by the lens systems 161A and 161B of the projection optical system 16, so that the light beam from the secondary light source is irradiated with a high irradiation intensity density. Is irradiated. In this way, each irradiation optical system 1A, 1B, 1C irradiates the irradiation object 3 with light. Under such a state, the stage 2 on which the irradiation object 3 is mounted is controlled by the control unit 4. By scanning in the Y direction, the irradiation object 3 is irradiated two-dimensionally within the mounting surface. At this time, as described above, the irradiation area in the x-axis direction of the light beam from the secondary light source is adjusted by the stop 15, and the area in the x-axis direction of the linear beam is formed. Further, the polarization beam splitter 162 and the ¼λ plate 163 prevent the return light from the irradiation target surface 31 from reaching the semiconductor laser 11.

  Here, as indicated by an arrow L1 in FIGS. 2 and 3, the condenser lens 14 which is an optical system on the irradiation side of the cylindrical lens array 13B constituting the secondary light source, and the projection optical system 16 (the lens system 161A, 161B) is not a cylindrical lens which is an aspherical optical system, but is constituted by a spherical optical system. Therefore, the configuration of the irradiation optical systems 1A, 1B, 1C and the entire irradiation apparatus is simplified.

  As described above, according to the present embodiment, the broadband area direction (x-axis direction) of the laser light source 11 is set as the major axis direction, and a linear beam that is made uniform only in the major axis direction is generated. Since the uniformed linear beam is reduced and projected and then irradiated onto the irradiation object 3, the generation of interference fringes in the major axis direction is suppressed, and light irradiation with the linear beam is performed. Irradiation unevenness can be prevented by high irradiation intensity density.

  Further, since the condenser lens 14 and the projection optical system 16 (lens systems 161A and 161B), which are optical systems on the irradiation side of the cylindrical lens array 13B constituting the secondary light source, are configured by a spherical optical system, optical design is performed. Therefore, it is possible to configure the irradiation optical system and the irradiation apparatus without complicating the configuration. As a result, no complicated optical adjustment is required in each of the irradiation optical systems 1A, 1B, and 1C, and the individual performance difference due to variations in mass production is reduced. For example, as shown in FIG. Even if the irradiation apparatus is configured using 1B and 1C, uneven irradiation can be prevented, and the irradiation apparatus can be configured using a plurality of irradiation optical systems. Therefore, the throughput of the annealing process can be improved using a plurality of irradiation optical systems, and the annealing process can be performed efficiently, so that an irradiation apparatus suitable for laser annealing can be configured.

  Further, since the broadband area type semiconductor laser 11 is used as the light source, the light source is stabilized and stable annealing can be performed. Therefore, it is possible to configure an irradiation apparatus suitable for laser annealing.

[Second Embodiment]
Next, a second embodiment of the present invention will be described. Since the configuration of the irradiation apparatus of the present embodiment is basically the same as that of the first embodiment, description of the entire configuration of the irradiation apparatus (corresponding to FIG. 1 in the first embodiment) is omitted. . The present embodiment is different from the first embodiment in the configuration of the irradiation optical system.

  5 and 6 illustrate the configuration of the irradiation optical system 5 according to the present embodiment. FIG. 5 is an end view from the y-axis direction, and FIG. 6 is a view taken along the line BB in FIG. Cross-sectional views are respectively shown. That is, FIG. 5 and FIG. 6 correspond to FIG. 2 and FIG. 3 in the first embodiment, respectively. In these drawings, the same components as those in the first embodiment are denoted by the same reference numerals, and description thereof will be omitted as appropriate.

  The irradiation optical system 5 of the present embodiment is further provided with a cylindrical lens array pair 53 and a condenser lens 54 between the collimator lens 12 and the cylindrical lens array pair 13 in the irradiation optical system 1 of the first embodiment. It is a thing. Here, the cylindrical lens array pair 53 corresponds to a specific example of “second uniformizing optical system” and “second cylindrical lens array pair” in the present invention, and the condenser lens 54 corresponds to “second second optical system in the present invention”. This corresponds to a specific example of “condenser optical system”.

  The cylindrical lens array pair 53 includes a pair of cylindrical lens arrays 53A and 53B, and these cylindrical lens arrays 53A and 53B are arranged in an array along the x-axis direction (see FIG. 5). The cylindrical lens array 53 </ b> A is disposed at the rear focal position of the collimator lens 12. With such a configuration, in the cylindrical lens array pair 53, the x-axis direction component of the light beam is divided into a plurality of light beams by the cylindrical lens array 53A (see FIG. 5).

  The condenser lens 54 is a lens having a positive power, and superimposes the x-axis direction components of a plurality of light beams from the cylindrical lens array pair 53 (see FIG. 5), and irradiates the cylindrical lens array 13A. In the example shown in FIGS. 5 and 6, the condenser lens 54 is constituted by a cylindrical lens.

  With this configuration, in the irradiation apparatus according to the present embodiment, the laser light emitted from the semiconductor laser 11 is divided into a plurality of light beams by the cylindrical lens array pair 53 and is superimposed by the condenser lens 54, and then the cylindrical light is overlapped. The light is further divided into a plurality of light beams by the lens array pair 13. Then, by forming the secondary light source on the cylindrical lens array 13B, the light flux from the secondary light source is made more uniform in the x-axis direction than in the case of the first embodiment.

  As described above, according to the present embodiment, since the cylindrical lens array pair 53 and the condenser lens 54 are further provided between the collimator lens 12 and the cylindrical lens array pair 13, the first embodiment. In addition to the effect of, the light beam from the secondary light source can be made uniform in the x-axis direction (long axis direction), and uneven irradiation can be further prevented.

  Although the present invention has been described with reference to the first and second embodiments, the present invention is not limited to these embodiments, and various modifications can be made.

  For example, in the above-described embodiment, the example in which the projection optical system 16 is configured by the lens systems 161A and 161B, the polarization beam splitter 162, and the ¼λ plate 163 has been described, but the return light from the irradiation target surface 31 is When it is not necessary to prevent reaching the semiconductor laser 11, the projection optical system may be configured by only the lens systems 161A and 161B.

  In the above embodiment, the configuration of the irradiation device and the irradiation optical system has been specifically described. However, the configuration of the irradiation device and the irradiation optical system is not limited to these cases. In addition to (or in place of) each of the constituent lenses, another lens or the like may be arranged.

It is a perspective view showing the whole structure of the irradiation apparatus which concerns on the 1st Embodiment of this invention. FIG. 2 is an end view illustrating a configuration of an irradiation optical system illustrated in FIG. 1. It is sectional drawing showing the structure of the irradiation optical system shown in FIG. It is a characteristic view for demonstrating the shape of a linear beam. It is an end elevation showing the composition of the irradiation optical system concerning a 2nd embodiment of the present invention. It is sectional drawing showing the structure of the irradiation optical system shown in FIG. It is an end elevation showing an example of the composition of the conventional irradiation optical system. It is sectional drawing showing an example of a structure of the conventional irradiation optical system.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1A, 1B, 1C, 5 ... Irradiation optical system, 11 ... Semiconductor laser, 12 ... Collimator lens, 13 ... Cylindrical lens array pair, 14 ... Condenser lens, 15 ... Aperture, 16 ... Projection optical system, 161A, 161B ... Lens system , 162... Polarizing beam splitter, 163... 1/4 λ plate, 53... Cylindrical lens array pair, 54... Condenser lens, 2... Stage 3, irradiation object, 30, 30 A, 30 B, 30 C. 4, control unit, x, x axis, y, y axis, X, long axis direction of linear beam, Y, scanning direction of stage.

Claims (8)

A laser light source configured to emit a laser beam, which is composed of a broad area type semiconductor laser having a first direction as a longitudinal direction;
A collimator optical system in which a component in a second direction orthogonal to the first direction in the emitted laser light emitted from the laser light source is a parallel light flux;
A first uniformizing optical system for generating a secondary light source by dividing a component in the first direction of the emitted laser light into a plurality of light beams;
Consists of a spherical optical system and condenses the components in the second direction in a plurality of light beams from the secondary light source generated by the first uniformizing optical system, and a plurality of light beams from the secondary light source A first condenser optical system for generating an image by superimposing the components in the first direction of
A projection optical system that is configured by a spherical optical system and that projects a reduced image of a plurality of light beams from the secondary light source generated by the first condenser optical system to irradiate the irradiation object. Irradiation device to do. 2. The first uniforming optical system includes a first cylindrical lens array pair arranged in an array along the first direction, respectively. 3. Irradiation device. The projection optical system is
First and second lens systems constituting a double-sided telecentric optical system;
The irradiation apparatus according to claim 1, further comprising: a polarization beam splitter and a ¼λ plate disposed between the first and second lens systems. Between the collimator optical system and the first homogenizing optical system,
A second homogenizing optical system that divides the component in the first direction of the emitted laser light into a plurality of light beams;
A second condenser optical system that irradiates the first uniformizing optical system with the components in the first direction of the plurality of light fluxes from the second uniformizing optical system superimposed on each other. The irradiation apparatus according to claim 1. The said 2nd uniformization optical system is comprised including the 2nd cylindrical lens array pair respectively arranged in the array form along the said 1st direction. Irradiation device. The irradiation apparatus according to claim 4, wherein the second condenser optical system is configured by a cylindrical lens. A laser source that emits laser light, and a second orthogonal to the first direction in the emitted laser light emitted from the laser light source. A collimator optical system having a directional component as a parallel light beam, a first uniformizing optical system for generating a secondary light source by dividing the component in the first direction of the emitted laser light into a plurality of light beams, and spherical optics Each of the components in the second direction in the plurality of light beams from the secondary light source generated by the first uniformizing optical system and condensing the components in the plurality of light beams from the secondary light source. A secondary light source configured by a first condenser optical system that generates an image by superimposing components in the first direction and a spherical optical system, and that is generated by the first condenser optical system A plurality of illumination means having al of the plurality of light beams by a projection optical system for irradiating the irradiation object by reduction projection images respectively,
A stage on which the irradiation object is mounted;
Irradiation position control means for relatively moving the irradiation positions of the light beams from the plurality of secondary light sources respectively irradiated from the plurality of irradiation means by scanning the irradiation object mounted on the stage within the mounting surface. An irradiation apparatus comprising: and. The laser annealing apparatus configured to perform annealing treatment of the irradiation object by irradiating the irradiation object with light beams from the plurality of secondary light sources, respectively. Irradiation device.

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