JP2009073090A - Functional film, manufacturing method of functional film, laminated body, and electronic device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a functional film which can be easily manufactured in a few manufacturing step, has an optical function, a barrier function to vapor, and an excellent electroconductive function. <P>SOLUTION: In the functional film, at least the optical film 12 and the transparent electroconductive film 15 are arranged at least in one face of the transparent resin substrate 11, the vapor permeating rate under the atmosphere of temperature of 40°C and relative humidity of 90% is 0.1 g/m<SP>2</SP>day or less, the optical film 12 has a refraction index different from that of the resin substrate 11 and has the optical function and the barrier function to vapor, and the transparent electroconductive film 15 has a surface resistance of 10 Ω/square to 500 Ω/square. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a functional film, a method for producing a functional film, a laminate, and an electronic device, and in particular, an optical film having both an optical function and a barrier function against water vapor, and a transparent conductive film having an excellent conductive function. It relates to a functional film provided.

  Examples of functions required for functional films used in electronic devices include barrier functions, optical functions, and conductive functions. Conventionally, such functional films include those having two or three functions among a barrier function, an optical function, and a conductive function.

Specifically, a functional film (for example, refer to Patent Document 1) in which an antireflection layer and a barrier layer are formed on a substrate, or a moisture-proof film, an etching-resistant film, and a conductive film on one surface of a polymer film. There exists a moisture-proof transparent conductive film laminated | stacked in order (for example, refer patent document 2).
Further, as a functional film, a transparent film in which a gas barrier layer is formed on a first substrate and a second substrate is disposed on the gas barrier layer via a transparent adhesive layer (for example, Patent Documents) 3) and a gas barrier antireflection film in which at least one of the high refractive index layer and the low refractive index layer has both a gas barrier property and an antireflection performance made of a gas barrier sputtered film (see, for example, Patent Document 4). ).
JP-A-2005-70616 JP 2006-4633 A JP 2006-327098 A JP 2004-291464 A

However, the above-described conventional functional film has an optical function and an excellent barrier function against water vapor, and does not have a sufficient conductive function.
Moreover, since the conventional functional film is manufactured through many manufacturing processes, it has been required to improve the productivity by reducing the manufacturing processes.

The present invention has been made in view of such circumstances, and a functional film that can be easily manufactured with few manufacturing steps, has an optical function and a barrier function against water vapor, and has an excellent conductive function. The purpose is to provide.
Moreover, it aims at providing the manufacturing method of the functional film which can manufacture the functional film of this invention easily.
Furthermore, it aims at providing the laminated body and electronic device using the functional film of this invention.

The present invention relates to the following.
The functional film of the present invention is a functional film in which at least an optical film and a transparent conductive film are provided on at least one surface of a transparent resin substrate, and is in an environment of a temperature of 40 ° C. and a relative humidity of 90%. The water vapor permeability is 0.1 g / m ² · day or less, the optical film has a refractive index different from that of the resin substrate, and has an optical function and a barrier function against water vapor. The film has a surface resistance value of 10Ω / □ to 500Ω / □.

In the functional film of the present invention, the optical film may be formed by laminating a plurality of high refractive index layers and low refractive index layers.
In the functional film of the present invention, the optical film may be composed of a plurality of layers, and the transparent conductive film may be a part of the optical film.
Moreover, in the functional film of this invention, the said transparent conductive film shall be an indium tin oxide.

Moreover, in the functional film of this invention, the said optical film shall be formed using sputtering method.
Moreover, in the functional film of this invention, the said transparent conductive film shall be formed using sputtering method.

  In the functional film of the present invention, at least one layer selected from a hard coat layer, a surface smooth layer, an adhesion layer, a protective layer, and an antifouling layer is formed on one or both surfaces of the transparent resin substrate. It can be made to be laminated.

  The functional film manufacturing method of the present invention includes a chamber, a plurality of rolls for transporting a transparent resin substrate from upstream to downstream of the transport path in the chamber, and a predetermined partway along the transport path. A method of manufacturing the functional film according to any one of the above, using a film forming apparatus including a plurality of targets arranged at intervals, wherein the resin substrate is moved along a transport path. An optical film forming step of forming an optical film having a refractive index different from that of the resin substrate and having an optical function and a barrier function against water vapor, while transporting the resin substrate along a transport path A transparent conductive film forming step of forming a transparent conductive film having a surface resistance value of 10Ω / □ to 500Ω / □, and the optical film forming step and the transparent conductive film forming step are continuously performed in the chamber. thing It is characterized by.

  The laminate of the present invention is a laminate in which a first functional film and a transparent substrate or a second functional film are bonded to each other, and the first functional film and the second functional film. Among the functional films, at least the first functional film is any one of the functional films described above.

  Moreover, the electronic device of the present invention is characterized by using any of the functional films described above or the above laminate.

The functional film of the present invention is a functional film in which at least an optical film and a transparent conductive film are provided on at least one surface of a transparent resin substrate, and is in an environment of a temperature of 40 ° C. and a relative humidity of 90%. The water vapor permeability is 0.1 g / m ² · day or less, the optical film has a refractive index different from that of the resin substrate, and has an optical function and a barrier function against water vapor. The film has a surface resistance value of 10Ω / □ to 500Ω / □, the optical function provides an optical function and a sufficiently high barrier function against water vapor, and the transparent conductive film provides a sufficiently high conductive function.
For this reason, the functional film of this invention can be preferably used as a transparent substrate for electronic devices as represented by electronic paper.
Furthermore, since the transparent conductive film of the functional film of the present invention has a surface resistance value of 10Ω / □ to 500Ω / □, the electrode for a solar cell (approximately 10Ω / □) or the electrode of a display device (approximately 35). To 100Ω / □), electrodes for touch panel (approximately 200 to 500Ω / □), electromagnetic wave shield (approximately 10Ω / □), antistatic film (several kΩ / □ or less), and the like.

  In addition, since the functional film of the present invention can obtain two functions of the optical function and the barrier function by the optical film, for example, the optical functional film and the barrier functional film are separately formed on the resin substrate. Compared with the case where it did, it can manufacture easily with few manufacturing processes.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
“First Embodiment”
FIG. 1 is a cross-sectional view showing an example of the functional film of the present invention. The functional film 10 shown in FIG. 1 has an optical film 12 and a transparent conductive film 15 formed on one surface of a transparent resin substrate 11. As shown in FIG. 1, in this embodiment, the optical film 12 is composed of four layers of a high refractive index layer 13, a low refractive index layer 14, a transparent conductive film 15, and a low refractive index layer 16. The transparent conductive film 15 constitutes a part of the optical film 12.

The functional film 10 shown in FIG. 1 has a water vapor transmission rate (WVTR) of 0.1 g / m ² · day or less in an environment of a temperature of 40 ° C. and a relative humidity of 90%. If the water vapor permeability of the functional film 10 exceeds the above range, the barrier function against water vapor becomes insufficient, and the functional film 10 may not be used as a transparent substrate for electronic devices.

  As the transparent resin substrate 11 constituting the functional film 10, a transparent resin substrate 11 having sufficient strength to withstand the film forming step and the subsequent step of the optical film 12 and having good surface smoothness is used. Although it does not specifically limit as a material used for the transparent resin substrate 11, For example, a polyethylene terephthalate film, a polybutylene terephthalate film, a polyethylene naphthalate film, a polycarbonate film, a polyether sulfone film, a polysulfone film, a polyarylate film, cyclic polyolefin A film, polyimide, or the like can be used. In addition, when the functional film 10 is applied as a front plate of a display device, polycarbonate or polyethersulfone (PES) excellent in transparency and heat resistance is used as a material for the transparent resin substrate 11. preferable.

  The thickness of the transparent resin substrate 11 is preferably about 10 to 200 μm in consideration of the thinness and flexibility of the functional film 10. Further, the transparent resin substrate 11 may contain various known additives and stabilizers, specifically, an antistatic agent, an ultraviolet ray preventing agent, a plasticizer, a lubricant, an easy-adhesive agent, and the like. The surface of the transparent resin substrate 11 may be subjected to corona treatment, low temperature plasma treatment, ion bombardment treatment, chemical treatment, or the like as pretreatment in order to improve adhesion with the optical film 12.

  The optical film 12 has a refractive index different from that of the resin substrate 11, has an optical function of adjusting the optical characteristics of the functional film 10, and has a barrier function against water vapor. The optical film 12 of this embodiment is obtained by laminating four thin films having different refractive indexes with a specific film thickness. As a thin film constituting the optical film 12, a thin film made of a material such as oxide, sulfide, fluoride, or nitride can be used. The refractive index of the thin film varies depending on the material used. Therefore, the optical function of the optical film 12 can be adjusted by adjusting the material, the film thickness, and the number of layers of the thin film. For example, the optical film 12 can be formed as an antireflection film in the visible light region, the ultraviolet region, or the infrared region, It can function as a membrane, a semipermeable membrane, a decorative membrane, or the like.

As the high refractive index layer 13 constituting the optical film 12, titanium dioxide (2.4), zirconium dioxide (2.0), zinc sulfide (2.3), tantalum oxide (2.1), zinc oxide (2 .1), a material having a high refractive index such as indium oxide (2.0) is used (the numerical value in the parenthesis represents a refractive index).
Moreover, as the low refractive index layers 14 and 16 constituting the optical film 12, magnesium oxide (1.6), silicon dioxide (1.5), magnesium fluoride (1.4), calcium fluoride (1.3 To 1.4), a material having a low refractive index such as cerium fluoride (1.6), aluminum fluoride (1.3), or the like is used (the numerical value in the parenthesis represents the refractive index).

The optical film 12 can be formed using a physical vapor deposition method such as a vacuum deposition method or a sputtering method, or a chemical vapor deposition method such as a CVD method, but is formed using a sputtering method. It is preferable. The optical film 12 formed using the sputtering method is a dense thin film. By forming the optical film 12 having a film thickness of 20 nm or more by using a sputtering method, a functional film having an excellent barrier function with a water vapor transmission rate (WVTR) of 0.1 g / m ² · day or less is obtained. it can.

Moreover, in this embodiment, the transparent conductive film 15 which comprises the optical film 12 should just have a function as a high refractive index layer, and a surface resistance value is 10 ohms / square-500 ohms / square, Various materials can be used according to the purpose and application of the conductive film 10, and are not particularly limited. Specifically, the material of the transparent conductive film 15 is any one selected from indium tin oxide (ITO), zinc oxide (ZnO), and tin oxide (SnO ₂ ), or two or three mixed oxides. Is preferably used. The transparent conductive film 15 made of indium tin oxide, zinc oxide, or tin oxide formed by vacuum film formation is classified as a material having an optically high refractive index. In addition, an additive may be added to the material constituting the transparent conductive film 15 described above. Note that the transparent conductive film 15 is patterned in accordance with the electrode structure as necessary when used as an electrode for a display device such as a solar cell or electronic paper, or a touch panel. As the patterning process, an etching method or a mask method is used.

  Further, in the present invention, the material of the transparent conductive film 15 has a function as a high refractive index layer, can easily have a surface resistance value in the above range, has high reliability, and has been used in many cases. It is particularly preferred to use some indium tin oxide. When the transparent conductive film 15 is made of indium tin oxide (ITO), the content ratio of tin oxide doped in indium oxide is arbitrary depending on the performance such as the conductive function required for the functional film 10. Although the ratio can be selected, in order to make the ITO thin film have a low resistance of 10Ω / □ to 500Ω / □, the content ratio of tin oxide is preferably in the range of 3% by weight to 20% by weight. In order to increase the mechanical strength of the transparent conductive film 15, it is desirable that the content ratio of tin oxide is less than 10% by weight and the ITO thin film is crystallized. In order to give the transparent conductive film 15 flexibility, it is desirable that the tin oxide content is 10 wt% or more and the ITO thin film is made amorphous.

Indium tin oxide is classified as a high refractive index material having a high refractive index as compared with general glass and plastic substrates. Therefore, when ITO is formed on the substrate, the transmittance of the obtained functional film is reduced (the reflectance is increased). Therefore, conventionally, in addition to the ITO film, in addition to the ITO film, an optical film formed by forming a plurality of high refractive index materials and low refractive index materials with appropriate film thicknesses is used to transmit the functional film. The rate was increased (the reflectivity was reduced). However, when the transmittance of the functional film is increased in this way, there is a problem that the number of steps increases.
On the other hand, in the present embodiment, the transparent conductive film 15 functions as a high refractive index layer, and the transparent conductive film 15 constitutes a part of the optical film 12, so that the optical film 12 is constituted. The transparent conductive film 15 to be performed does not have a conductive function, and the number of steps can be reduced as compared with the case where the transparent conductive film is provided separately from the optical film 12.

  The transparent conductive film 15 can be formed using a physical vapor deposition method such as a vacuum deposition method or a sputtering method, or a chemical vapor deposition method such as a CVD method, but is formed using a sputtering method. It is preferable that In particular, the sputtering method is preferable because the energy of the deposited particles is high and a dense thin film can be formed, so that the transparent conductive film 15 having an excellent barrier function can be formed.

The functional film 10 of this embodiment shown in FIG. 1 has a water vapor permeability of 0.1 g / m ² · day or less in an environment of a temperature of 40 ° C. and a relative humidity of 90%, and the optical film 12 is a resin substrate 11. The transparent conductive film 15 has a surface resistance value of 10Ω / □ to 500Ω / □, and has an optical function depending on the optical film 12. And a sufficiently high barrier function against water vapor are obtained, and a sufficiently high conductive function is obtained by the transparent conductive film 15.
Therefore, the functional film 10 shown in FIG. 1 can be preferably used as a transparent substrate for electronic devices such as electronic paper.

  In addition, since the functional film 10 shown in FIG. 1 can obtain two functions of an optical function and a barrier function by the optical film 12, for example, the optical functional film and the barrier functional film are separately provided on a resin substrate. Compared with the case where it forms, it can manufacture easily with few manufacturing processes.

  In the functional film 10 shown in FIG. 1, the optical film 12 includes a high refractive index layer 13, a low refractive index layer 14, a transparent conductive film 15 that functions as a high refractive index layer, and a low refractive index layer 16. Therefore, the optical film 12 can provide a high degree of optical performance as compared with the case where the optical film 12 is a single layer.

  In the functional film 10 shown in FIG. 1, the optical film 12 is composed of a plurality of layers, and the transparent conductive film 15 is a part of the optical film 12 that functions as a high refractive index layer. When 10 is used as a transparent substrate of a display device, the visibility of the display device can be improved. Further, since the transparent conductive film 15 is a part of the optical film 12 functioning as a high refractive index layer, the transparent conductive film 15 can adjust transmission / reflection color or impart design properties.

“Second Embodiment”
FIG. 2 is a cross-sectional view showing another example of the functional film of the present invention. The functional film 20 shown in FIG. 2 has an optical film 23 and a transparent conductive film 24 formed on one surface of a transparent resin substrate 21 via a surface smoothing layer 22, and a hard coat 25 on the other surface. The antifouling layer 26 is formed.

As the transparent resin substrate 21, the same thing as the transparent resin substrate 11 which comprises the functional film 10 shown in FIG. 1 is used.
Moreover, as the transparent conductive film 24, the thing similar to the transparent conductive film 15 which comprises the functional film 10 shown in FIG. 1 is used.

  The optical film 23 has a refractive index different from that of the resin substrate 21, has an optical function of adjusting the optical characteristics of the functional film 20, and has a barrier function against water vapor. The optical film 23 is obtained by laminating a single thin film having a refractive index different from that of the resin substrate 21 with a specific film thickness. As a thin film constituting the optical film 12, a thin film made of a material such as oxide, sulfide, fluoride, or nitride can be used. The refractive index of the thin film varies depending on the material used. Therefore, the optical function of the optical film 23 can be adjusted by adjusting the material and film thickness of the thin film. For example, the optical film 23 can be made of an antireflection film, a reflective film, a half film in the visible light region, the ultraviolet region, or the infrared region. It can function as a permeable membrane, a decorative membrane, or the like.

The optical film 23 is formed by a physical vapor deposition method such as a vacuum deposition method or a sputtering method, or a chemical vapor deposition method such as a CVD method, like the optical film 12 constituting the functional film 10 shown in FIG. However, it is preferably formed using a sputtering method. The optical film 23 formed by using the sputtering method is a dense thin film. By forming the optical film 23 having a film thickness of 20 nm or more by using a sputtering method, a functional film having an excellent barrier function with a water vapor transmission rate (WVTR) of 0.1 g / m ² · day or less is obtained. it can.

The surface smoothing layer 22 is formed before the optical film 23 is formed on one surface of the resin substrate 21, thereby enhancing the barrier function of the functional film 20 and improving the smoothness of the surface of the transparent conductive film 24. It is something to enhance.
As the material for forming the surface smooth layer 22, a material having transparency, appropriate hardness, and mechanical strength is used, and it is preferable to use a resin material such as an acrylic resin, an organic silicone resin, or polysiloxane.

The surface smooth layer 22 can be formed by coating using various coating methods such as microgravure and screen. In addition, when forming the surface smooth layer 22 by application | coating, you may make high hardness and smoothness by mixing a resin filler and an inorganic filler with a coating liquid.
Further, the surface smooth layer 22 may be formed by an organic vapor deposition method. The method of forming the surface smooth layer 22 by the organic vapor deposition method is not particularly limited. For example, the resin substrate 21 disposed on the coating drum by evaporating an acrylate or methacrylate or a mixed resin solution thereof with an organic vapor deposition apparatus. It can be formed by performing the hardening process which irradiates an electron beam with an electron beam irradiation apparatus, after making it condense on. In the curing process here, ultraviolet rays may be irradiated instead of the electron beam.

The hard coat 25 increases the scratch resistance and impact resistance and improves the durability of the surface of the functional film 20.
The hard coat 25 is not particularly limited as long as it has transparency, appropriate hardness, and mechanical strength. As a material for forming the hard coat 25, for example, a resin cured by irradiating with ionizing radiation or ultraviolet rays, a thermosetting resin, or the like can be used. In particular, an ultraviolet curable acrylic resin, an organic silicon resin, A thermosetting polysiloxane resin or the like is preferable. Further, it is more preferable that the resin forming the hard coat 25 has the same or approximate refractive index as that of the transparent resin substrate 21.
The film thickness of the hard coat 25 is preferably 3 μm or more in order to have sufficient strength, and more preferably in the range of 5 to 7 μm in consideration of transparency, coating accuracy, and ease of handling. preferable.

The antifouling layer 26 prevents the surface of the functional film 20 from being stained.
The antifouling layer 26 is not particularly limited as long as it enhances the antifouling property of the surface, and has water repellency and / or oil repellency to enhance the antifouling property of the surface. It is preferable that the surface can be protected. As a material for forming the antifouling layer 26, for example, an organic compound, preferably a fluorine-containing organic compound is suitable. Moreover, when using the material which shows water repellency as a material which forms the pollution protection layer 26, it is preferable to use the compound which has a hydrophobic group, Specifically, fluorocarbon, perfluorosilane, etc., these high molecular compounds, etc. Is preferred.

When the functional film 20 is used for an optical device, the film thickness of the antifouling layer 26 is preferably 50 nm or less, and more preferably 10 nm or less so as not to impair the optical function.
The antifouling layer 26 can be formed using various coating methods such as a vacuum film forming process such as a vacuum vapor deposition method and a plasma CVD method, and a wet process such as microgravure and screen printing depending on the material.

The functional film 20 of the present embodiment shown in FIG. 2 has a water vapor permeability of 0.1 g / m ² · day in an environment of a temperature of 40 ° C. and a relative humidity of 90%, similarly to the functional film 10 shown in FIG. The optical film 23 has a refractive index different from that of the resin substrate 21 and has an optical function and a barrier function against water vapor. The transparent conductive film 24 has a surface resistance value of 10Ω / □ to 500Ω / The optical film 23 provides an optical function and a sufficiently high barrier function against water vapor, and the transparent conductive film 24 provides a sufficiently high conductive function. Therefore, the functional film 20 shown in FIG. 2 can be preferably used as a transparent substrate for electronic devices such as electronic paper.
Moreover, since the functional film 20 shown in FIG. 2 can obtain two functions of an optical function and a barrier function by the optical film 23, it can be easily manufactured with few manufacturing processes.

  In the functional film 20 shown in FIG. 2, the surface smooth layer 22 is formed on one surface of the transparent resin substrate 21, and the hard coat 25 and the antifouling layer 26 are formed on the other surface of the transparent resin substrate 21. Therefore, the functional film 20 is excellent in that the functions of the surface smooth layer 22, the hard coat 25, and the antifouling layer 26 are further provided.

“Third Embodiment”
FIG. 3 is a cross-sectional view showing an example of the laminate of the present invention. The laminated body 30 shown in FIG. 3 is formed by bonding a first functional film 32 that is a functional film of the present invention and a second functional film 39 with an adhesive layer 36 interposed therebetween.
The first functional film 32 is formed by forming an adhesion layer 33, an optical film 34, and a transparent conductive film 35 on one surface of a transparent resin substrate 31. The second functional film 39 is formed by forming a hard coat 38 on a transparent resin substrate 37.

  As the transparent resin substrates 31 and 37, those similar to the transparent resin substrate 11 constituting the functional film 10 shown in FIG. 1 are used. In the present embodiment, a glass substrate may be used instead of the transparent resin substrate 37 constituting the second functional film 39. In the present embodiment, the second functional film 36 is bonded to the first functional film 32 via the adhesive layer 36. However, instead of the second functional film 39, glass or resin is used. A transparent substrate may be attached.

Moreover, as the optical film 34, the thing similar to the optical film 23 which comprises the functional film 20 shown in FIG. 2 is used.
Moreover, as the transparent conductive film 35, the thing similar to the transparent conductive film 15 which comprises the functional film 10 shown in FIG. 1 is used.
As the hard coat 38, the thing similar to the hard coat 25 which comprises the functional film 20 shown in FIG. 2 is used.

The adhesion layer 33 improves the adhesion between the optical film 34 and the transparent resin substrate 31.
The adhesion layer 33 is not particularly limited as long as it can improve the adhesion, and for example, as a material for forming the adhesion layer 33, a resin in which colloidal silica or the like is dispersed, And metal suboxides such as chromium and silicon. For example, when the adhesion layer 33 is made of a resin in which colloidal silica is dispersed, the adhesion layer 33 can be formed using a wet process for coating the resin. Further, when the adhesion layer 33 is made of a metal suboxide such as chromium or silicon, the adhesion layer 33 can be formed by vacuum film formation such as sputtering.
The film thickness of the adhesion layer 33 is preferably 10 nm or less so as not to disturb the transparency.

  As the adhesive layer 36, for example, an acrylic, rubber-based, or polyester-based transparent adhesive can be used, and an acrylic transparent adhesive is preferably used. The transparent adhesive used as the adhesive layer 36 may be adhesive without being crosslinked by heat or light, or may be of a thermal crosslinking type or a light (ultraviolet ray, electron beam) crosslinking type. May be.

In the laminate 30 of the present embodiment shown in FIG. 3, the first functional film 32 is the functional film of the present invention. Therefore, the first functional film 32 is in an environment where the temperature is 40 ° C. and the relative humidity is 90%. The optical film 34 constituting the first functional film 32 has a refractive index different from that of the resin substrate 31, and has an optical function and a water vapor resistance of 0.1 g / m ² · day or less. The transparent conductive film 35 has a surface resistance value of 10Ω / □ to 500Ω / □, and the optical film 34 provides an optical function and a sufficiently high barrier function against water vapor. The transparent conductive film 35 provides a sufficiently high conductive function. Therefore, the laminate 30 shown in FIG. 3 can be preferably used as a transparent substrate for electronic devices such as electronic paper.
3 can obtain two functions of the optical function and the barrier function by the optical film 34, and can be easily manufactured with few manufacturing steps.

  Further, in the laminate 30 shown in FIG. 3, an adhesion layer 33 is formed between the optical film 34 of the first functional film 32 and the transparent resin substrate 31, and the second functional film 36. Since the hard coat 38 is formed on the laminated body 30, the laminate 30 is excellent in that the functions of the adhesion layer 33 and the hard coat 38 are provided.

  Moreover, since the laminated body 30 shown in FIG. 3 is a laminated body in which the first functional film 32 and the second functional film 39 are bonded together, the handling in the process is improved and the productivity is increased. Or improve product specifications and functionality.

In addition, the functional film and laminated body of this invention are not limited to embodiment mentioned above. For example, in addition to the optical film and the transparent conductive film constituting the functional film of the present invention, a protective film may be provided on one surface or both surfaces of a transparent resin substrate.
A protective film is for protecting the thin film which comprises the functional film or laminated body of this invention, and what kind of thing may be used as long as it can protect a thin film, and it is not specifically limited. The material for forming the protective film is preferably a material having transparency and appropriate hardness and mechanical strength. Specifically, for example, a resin such as an acrylic resin, an organic silicone resin, or polysiloxane is used. Materials can be mentioned.

The protective film can be formed by coating using various coating methods such as microgravure and screen. In addition, when forming a protective film by application | coating, you may make high hardness and smoothness by mixing a resin filler and an inorganic filler with a coating liquid.
The protective film may be formed by an organic vapor deposition method. The method for forming the protective film by the organic vapor deposition method is not particularly limited. For example, acrylate or methacrylate or a mixed resin solution thereof is evaporated by an organic vapor deposition apparatus and condensed on a resin substrate disposed on the coating drum. Then, it can be formed by performing a curing process of irradiating an electron beam with an electron beam irradiation apparatus. In the curing process here, ultraviolet rays may be irradiated instead of the electron beam.

  By making such a protective layer a functional film formed by laminating on one or both surfaces of a transparent resin substrate, the function of the protective layer can be further imparted to the functional film.

“Fourth Embodiment”
FIG. 4 is a view for explaining the method for producing the functional film of the present invention, and FIG. 4 (a) shows a sputtering apparatus (film forming apparatus) used when the functional film of the present invention is produced. FIG. 4B is a cross-sectional view showing a functional film of the present invention manufactured using the sputtering apparatus shown in FIG.

  A functional film 50 shown in FIG. 4B is obtained by forming an adhesion layer 51, an optical film 52, and a transparent conductive film 55 on one surface of a transparent resin substrate 46. As shown in FIG. 4, in the present embodiment, like the functional film 10 shown in FIG. 1, the optical film 52 includes a high refractive index layer 53, a low refractive index layer 54, a transparent conductive film 55, and a low refractive index. The layer 56 is composed of four layers, and the transparent conductive film 55 constitutes a part of the optical film 52.

In addition, the thing similar to the functional film 10 shown in FIG. 1 is used as the transparent resin substrate 46 and the optical film 52 which comprise the functional film 50 shown in FIG.4 (b).
Further, as the adhesion layer 33, the same layer as that of the laminate 30 of this embodiment shown in FIG. 3 is used.

A sputtering apparatus 40 shown in FIG. 4A includes a chamber 47, a plurality of rolls 48, a plurality of sputtering targets 45, and a cooling drum 44.
The chamber 47 is evacuated. The chamber 47 includes pressure adjusting means (not shown) including a pump for controlling the pressure in the chamber 47, means for applying power to the sputtering target (not shown), Gas supply means (not shown) for supplying gas into the chamber 47 is provided.

  The roll 48 is for transporting from the upstream to the downstream of the transport path while supporting the transparent resin substrate 46 in the chamber 47. The roll 48 includes an unwinding roll 41, a winding roll 42, and a free roll 43. The unwinding roll 41 sends out the resin substrate 46 before film formation at a predetermined speed. The take-up roll 42 takes up the resin substrate 46 after film formation. The free roll 43 is disposed between the unwinding roll 41 and the winding roll 42 in order to transport the resin substrate 46 along a predetermined path. The sputter device 40 shown in FIG. 4 is provided with these rolls 48 so as to carry out so-called roll-to-roll conveyance from the unwinding roll 41 to the winding roll 42.

  The sputter target 45 is made of a material corresponding to the material of the thin film to be formed, and a plurality of sputter targets 45 are arranged at a predetermined interval in the middle of the transport path of the resin substrate 46. In the sputtering apparatus 40 shown in FIG. 4, five sputter targets 45 are provided as indicated by reference numerals 45a, 45b, 45c, 45d, and 45e. Note that the spacing between adjacent sputter targets 45 may be constant or different, based on the material and thickness of the thin film to be deposited, the deposition rate, the ease with which impurities are mixed, and the like. It can be determined as appropriate. The number of sputter targets 45 is not particularly limited, and can be determined as appropriate based on the number, material, thickness, deposition rate, ease of mixing impurities, and the like of the thin films to be formed.

  The cooling drum 44 cools the transparent resin substrate 46 that moves along the transport path in the chamber 47.

In order to manufacture the functional film 50 shown in FIG. 4B using such a sputtering apparatus 40, first, the sputtering target 45 is arranged in the chamber 47 and the inside of the chamber 47 is evacuated.
Thereafter, as shown in FIG. 4A, while the resin substrate 46 unwound from the unwinding roll 41 is transported along the transport path by the free roll 43, the sputter target 45a corresponding to the material of the adhesion layer 33 is formed. The adhesion layer 33 is formed on the resin substrate 46 by sputtering.
Next, the sputter targets 45b, 45c, 45d, and 45e corresponding to the material of the optical film 52 are sputtered while the resin substrate 46 is further transported along the transport path, whereby the high refractive index layer 53 is formed on the adhesion layer 33. The low refractive index layer 54, the transparent conductive film 55, and the low refractive index layer 56. The transparent conductive film 55 has a surface resistance of 10Ω / □ to 500Ω / □ and has a refractive index different from that of the resin substrate 46. Then, by forming an optical film 52 having an optical function and a barrier function against water vapor (an optical film forming process, a transparent conductive film forming process), water vapor permeability in an environment of a temperature of 40 ° C. and a relative humidity of 90% The functional film 50 shown in FIG. 4B having a thickness of 0.1 g / m ² · day or less is formed and wound around the winding roll 42.

  In addition, in the sputtering apparatus 40 shown in FIG. 4A, the film formation on each thin film is performed by a method of controlling the number and interval of the sputtering targets 45 so that the conveyance speed of the resin substrate 46 can be made substantially constant. It is preferable to adjust the speed. Specifically, for example, for a thin film that is preferably formed at a low film formation rate, two or more sputter targets 45 made of the same material are arranged, and the resin substrate 46 is conveyed along the conveyance path. Increases the time during which the substrate is conveyed facing the sputter target 45. For a thin film that can be deposited at a high deposition rate, one sputter target 45 is arranged, and the resin substrate 46 transported along the transport path is transported opposite the sputter target 45. The time during which the film is formed is reduced as compared with a thin film that is preferably formed at a low film formation rate. In this way, by adjusting the time during which the resin substrate 46 is conveyed facing the sputter target 45, the film formation time in each thin film can be adjusted, and the film formation speed in each thin film can be adjusted.

  By adjusting the film forming speed of each thin film using the above method or the like, the functional film 50 shown in FIG. It can be manufactured easily and efficiently in one chamber 47 with the speed kept substantially constant.

  Further, in the sputtering apparatus 40 shown in FIG. 4A, each region used for forming each thin film in the chamber 47 is controlled so as to be a preferable film forming condition when forming each thin film. . When a plurality of thin films made of a plurality of materials are formed in one chamber 47 without opening the chamber 47 using the sputtering apparatus 40 shown in FIG. In order not to mix, it is preferable to make the conductance between the regions used for forming each thin film as small as possible. If necessary, an intermediate chamber is provided between the regions used for forming each thin film so that the differential pressure between the regions where different thin films are formed is 1: 100 or more. It is preferable to prevent the impurities from being mixed with each other in the thin film.

  A sputtering apparatus 40 shown in FIG. 4A includes a plurality of sputtering targets 45 and rolls 48, thereby allowing the resin substrate 46 unwound from the unwinding roll 41 to be transported along the transport path while the resin substrate 46 is transported. An adhesive layer 33 and an optical film 52 (transparent conductive film 55) are formed on 46 to form a functional film 50, and then wound around a winding roll 42. Therefore, in the sputtering apparatus 40 shown in FIG. 4A, the adhesion layer 33 and the optical film 52 (transparent conductive film 55) are continuously formed in the chamber 47 without opening the chamber 47. Therefore, when the functional film 50 shown in FIG. 4B is manufactured, it is not necessary to perform the steps of air release and evacuation a plurality of times, and it can be manufactured easily and efficiently.

"Electronic devices"
The functional film and laminate of the present invention described above can obtain an optical function and a sufficiently high barrier function against water vapor by the optical film, and a sufficiently high conductive function by the transparent conductive film. It can be preferably used for various electronic devices.
Moreover, since the functional film and laminated body of this invention have few manufacturing processes, a high quality electronic device can be easily produced by applying the functional film and laminated body of this invention to an electronic device. .

  EXAMPLES Next, although an Example is shown and this invention is demonstrated further in detail, this invention is not limited only to these Examples.

[Example 1]
By forming the layer structure shown in Table 1 on the transparent resin substrate made of polyethersulfone (PES) using the film formation method shown in Table 1 with the materials and film thicknesses shown in Table 1, the electronic paper A functional film for the front substrate was produced. At this time, the transparent conductive film (ITO) is subjected to a patterning process in accordance with the electrode structure of the electronic paper.

[Comparative Example 1]
By forming the layer structure shown in Table 2 on the same resin substrate as in Example 1 using the material and film thickness shown in Table 2 and the film forming method shown in Table 2, the function for the front substrate of electronic paper is provided. A conductive film was prepared. At this time, the transparent conductive film (ITO) is subjected to a patterning process in accordance with the electrode structure of the electronic paper, as in Example 1.

[Comparative Example 2]
By forming the layer structure shown in Table 3 on the same resin substrate as in Example 1 using the material and film thickness shown in Table 3 and the film forming method shown in Table 3, the function for the front substrate of electronic paper is provided. A conductive film was prepared. At this time, the transparent conductive film (ITO) is subjected to a patterning process in accordance with the electrode structure of the electronic paper, as in Example 1.

  With respect to the functional films of Example 1, Comparative Example 1 and Comparative Example 2 thus obtained, the water vapor transmission rate (WVTR) of the resin substrate, the water vapor transmission rate (WVTR) of the functional film, and the transparent conductive film The surface resistance value, the numerical value of b * in the CIELAB color space at the illumination light source D65, the incident angle of 5 °, and the visual field of 2 °, and the color were examined. The results are shown in Table 4.

  In addition, an electronic device using the functional film of Example 1, Comparative Example 1 and Comparative Example 2 as a front substrate of electronic paper was manufactured, and was exposed to an environment of 60 ° C. and 90% relative humidity for 1000 hours. A test was conducted. The results are shown in Table 4.

As shown in Table 4, in the functional film of Example 1, the absolute value of the value of b * in the CIELAB color space is small, and the transmitted light is neutral and exhibits good color reproducibility due to the optical function of the optical film. Was confirmed.
Moreover, in the functional film of Example 1, the surface resistance value was favorable and a sufficiently high conductive function was obtained.
In addition, the functional film of Example 1 had a water vapor permeability of 0.1 g / m ² · day or less and a good barrier function. Furthermore, in the electronic device using the functional film of Example 1, deterioration due to the durability test was not observed, and it was confirmed that the electronic device had good durability.

  On the other hand, in the functional film of Comparative Example 1, it was confirmed that the transmitted light was neutral and showed good color reproducibility by the optical function of the optical film as in Example 1. In addition, in the functional film of Comparative Example 1, a sufficiently high conductive function was obtained with a good surface resistance value. However, the functional film of Comparative Example 1 had a large water vapor permeability and an insufficient barrier function. Moreover, in the electronic device using the functional film of the comparative example 1, the deterioration by a durability test was seen and it turned out that durability is inferior compared with the electronic device of Example 1. FIG.

Moreover, in the functional film of the comparative example 2, the surface resistance value was favorable and a sufficiently high conductive function was obtained. However, in the functional film of Comparative Example 2, since there was no optical film, the optical function by the optical film was not obtained, and the value of b * in the CIELAB color space was large, and it was found that the transmitted light was yellowish. . For this reason, in the functional film of the comparative example 2, it was necessary to provide the filter for color adjustment.
Moreover, in the functional film of the comparative example 2, water vapor permeability was large and the barrier function was insufficient. Moreover, in the electronic device using the functional film of the comparative example 2, deterioration by a durability test was seen and it turned out that durability is inferior compared with the electronic device of Example 1. FIG.

[Example 2]
By forming the layer structure shown in Table 5 on the same resin substrate as in Example 1 using the film formation method shown in Table 5 with the materials and film thicknesses shown in Table 5, an inorganic EL (electro-luminescence) A functional film for the front substrate was produced. In addition, the transparent conductive film which comprises Example 2 has a function as a high refractive index layer of an optical film. At this time, the transparent conductive film (ITO) is subjected to a patterning process in accordance with the inorganic EL electrode structure.

[Comparative Example 3]
By forming the layer structure shown in Table 6 on the same resin substrate as in Example 1 using the material and film thickness shown in Table 6 and the film forming method shown in Table 6, the function for the front substrate of the inorganic EL A conductive film was prepared. At this time, the transparent conductive film (ITO) is subjected to a patterning process in accordance with the inorganic EL electrode structure, as in the second embodiment.

  For the functional films of Example 2 and Comparative Example 3 thus obtained, the water vapor transmission rate (WVTR) of the resin substrate, the water vapor transmission rate (WVTR) of the functional film, and the surface resistance value of the transparent conductive film The total light transmittance (JIS-K7105) was examined. The results are shown in Table 7.

  In addition, an electronic device using the functional film of Example 2 and Comparative Example 3 as an inorganic EL front substrate was prepared, and a durability test was performed by exposing it to an environment of 60 ° C. and 90% relative humidity for 1000 hours. . The results are shown in Table 7.

As shown in Table 7, in the functional film of Example 2, the total light transmittance was larger than that of the functional film of Comparative Example 3, and it was confirmed that the transmittance was improved by the optical function of the optical film.
Moreover, in the functional film of Example 2, the surface resistance value was favorable and a sufficiently high conductive function was obtained.
In the functional film of Example 2, the water vapor permeability was 0.1 g / m ² · day or less, and the barrier function was also good. Furthermore, in the electronic device using the functional film of Example 2, the brightness | luminance fall by a durability test was not seen, but it has confirmed having favorable durability.

  In addition, since the functional film of Comparative Example 3 has an insufficient barrier function, an electronic device using the functional film of Comparative Example 3 shows a decrease in luminance due to a durability test. It was found that the durability was inferior compared to the device.

FIG. 1 is a cross-sectional view showing an example of the functional film of the present invention. FIG. 2 is a cross-sectional view showing another example of the functional film of the present invention. FIG. 3 is a cross-sectional view showing an example of the laminate of the present invention. FIG. 4 is a view for explaining the method for producing the functional film of the present invention.

Explanation of symbols

10, 20, 32, 39 ... functional film, 11, 21, 31, 37, 46 ... resin substrate, 12, 23, 34, 52 ... optical film, 13 ... high refractive index layer, 14, 16 ... low refractive index Layer, 15, 24, 35, 55 ... transparent conductive film, 22 ... surface smooth layer, 25, 38 ... hard coat, 26 ... antifouling layer, 30 ... laminate, 33 ... adhesion layer, 36 ... adhesive layer, 40 ... Sputtering device, 41 ... unwinding roll, 42 ... winding roll, 43 ... free roll, 44 ... cooling drum, 45a, 45b, 45c, 45d, 45e ... sputtering target.

Claims (10)

A functional film having at least an optical film and a transparent conductive film on at least one surface of a transparent resin substrate,
The water vapor permeability in an environment of a temperature of 40 ° C. and a relative humidity of 90% is 0.1 g / m ² · day or less,
The optical film has a refractive index different from that of the resin substrate, and has an optical function and a barrier function against water vapor.
The functional film, wherein the transparent conductive film has a surface resistance of 10Ω / □ to 500Ω / □.   The functional film according to claim 1, wherein the optical film is formed by laminating a plurality of high refractive index layers and low refractive index layers. The optical film is composed of a plurality of layers,
The functional film according to claim 1, wherein the transparent conductive film is a part of the optical film.   The functional film according to any one of claims 1 to 3, wherein the transparent conductive film is indium tin oxide.   The functional film according to claim 1, wherein the optical film is formed using a sputtering method.   The functional film according to claim 1, wherein the transparent conductive film is formed using a sputtering method.   The at least one layer selected from a hard coat layer, a surface smooth layer, an adhesion layer, a protective layer, and an antifouling layer is laminated on one side or both sides of the transparent resin substrate. The functional film of any one of Claims 1-6. A chamber, a plurality of rolls for transporting the transparent resin substrate from upstream to downstream of the transport path in the chamber, and a plurality of targets arranged at predetermined intervals in the middle of the transport path. A method for producing the functional film according to any one of claims 1 to 7, using the film forming apparatus.
An optical film forming step of forming an optical film having a refractive index different from that of the resin substrate and having an optical function and a barrier function against water vapor while transporting the resin substrate along a transport path;
A transparent conductive film forming step of forming a transparent conductive film having a surface resistance of 10Ω / □ to 500Ω / □ while transporting the resin substrate along a transport path;
The method for producing a functional film, wherein the optical film forming step and the transparent conductive film forming step are continuously performed in the chamber. A laminated body in which the first functional film and the transparent substrate or the second functional film are bonded together,
The functional film according to any one of claims 1 to 7, wherein at least the first functional film of the first functional film and the second functional film is at least one of the first functional film and the second functional film. A featured laminate.   An electronic device comprising the functional film according to any one of claims 1 to 7 or the laminate according to claim 9.

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