JP2009044125A5 - - Google Patents
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- JP2009044125A5 JP2009044125A5 JP2008103810A JP2008103810A JP2009044125A5 JP 2009044125 A5 JP2009044125 A5 JP 2009044125A5 JP 2008103810 A JP2008103810 A JP 2008103810A JP 2008103810 A JP2008103810 A JP 2008103810A JP 2009044125 A5 JP2009044125 A5 JP 2009044125A5
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- parameter
- vector machine
- support vector
- profile
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- Prior art date
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- 238000004519 manufacturing process Methods 0.000 claims 20
- 238000000034 method Methods 0.000 claims 10
- 230000002999 depolarising Effects 0.000 claims 6
- 230000000694 effects Effects 0.000 claims 6
- 238000004458 analytical method Methods 0.000 claims 3
- 238000010606 normalization Methods 0.000 claims 2
- 238000005457 optimization Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 238000005259 measurement Methods 0.000 claims 1
- 230000003287 optical Effects 0.000 claims 1
- 238000004088 simulation Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/786,869 US7483809B2 (en) | 2007-04-12 | 2007-04-12 | Optical metrology using support vector machine with profile parameter inputs |
| US11/787,025 US7372583B1 (en) | 2007-04-12 | 2007-04-12 | Controlling a fabrication tool using support vector machine |
| US11/786,870 US7511835B2 (en) | 2007-04-12 | 2007-04-12 | Optical metrology using a support vector machine with simulated diffraction signal inputs |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009044125A JP2009044125A (ja) | 2009-02-26 |
| JP2009044125A5 true JP2009044125A5 (ru) | 2011-01-27 |
Family
ID=40444487
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008103810A Pending JP2009044125A (ja) | 2007-04-12 | 2008-04-11 | サポートベクトルマシンを用いて制御ツールを制御する方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009044125A (ru) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5548151B2 (ja) * | 2011-02-17 | 2014-07-16 | 株式会社日立ハイテクノロジーズ | パターン形状検査方法及びその装置 |
| US8577820B2 (en) * | 2011-03-04 | 2013-11-05 | Tokyo Electron Limited | Accurate and fast neural network training for library-based critical dimension (CD) metrology |
| JP6959831B2 (ja) | 2017-08-31 | 2021-11-05 | 株式会社日立製作所 | 計算機、処理の制御パラメータの決定方法、代用試料、計測システム、及び計測方法 |
| KR102132785B1 (ko) | 2017-08-31 | 2020-07-13 | 가부시끼가이샤 히다치 세이사꾸쇼 | 계산기, 처리의 제어 파라미터의 결정 방법, 대용 시료, 계측 시스템, 및 계측 방법 |
| JP6676020B2 (ja) * | 2017-09-20 | 2020-04-08 | 株式会社日立ハイテク | プラズマ処理装置及びプラズマ処理装置状態予測方法 |
| JP7017985B2 (ja) | 2018-06-05 | 2022-02-09 | 株式会社日立製作所 | システム及び処理条件の決定方法 |
| JP7108562B2 (ja) | 2019-02-22 | 2022-07-28 | 株式会社日立製作所 | 処理の制御パラメータの決定方法、及び計測システム |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6650422B2 (en) * | 2001-03-26 | 2003-11-18 | Advanced Micro Devices, Inc. | Scatterometry techniques to ascertain asymmetry profile of features and generate a feedback or feedforward process control data associated therewith |
-
2008
- 2008-04-11 JP JP2008103810A patent/JP2009044125A/ja active Pending
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