JP2009033058A - Reaction force processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a reaction force processing apparatus whose upsizing can be suppressed. <P>SOLUTION: The reaction force processing apparatus 1 is provided on a moving stage apparatus 10 on which a stage 12 moves on a platen 11 installed on a floor 25 via vibration removing springs 16, and processes reaction forces F<SB>1</SB>, F<SB>2</SB>to be generated on the platen 11 caused by the movement of the stage 12. The reaction force processing apparatus 1 is provided with a reaction force processing actuator 2 for applying a counter thrust force R to the platen 11, and a rotating plate 7 provided on a first platen portion 20 of the platen 11 and rotating around a rotary shaft 8 provided along a horizontal direction. The reaction forces F<SB>1</SB>, F<SB>2</SB>are reduced and canceled by the counter thrust force R generated in the reaction processing actuator 2, and a moment generated on the platen 11 is reduced and canceled by a canceling moment T generated by the rotation of the rotary plate 7. Accordingly, the reaction forces F<SB>1</SB>, F<SB>2</SB>and the moment generated on the platen 11 by the effects of the forces are independently canceled. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a reaction force processing apparatus for improving the settling of a stage in a moving stage apparatus.

  2. Description of the Related Art Conventionally, as a semiconductor or liquid crystal exposure apparatus, for example, a moving stage apparatus in which a stage moves on a surface plate installed on a foundation via vibration isolation means has been used. In such a moving stage device, for example, a high acceleration / deceleration of the stage is required in order to improve the processing amount per unit time. However, when the stage is accelerated / decelerated at high speed, the reaction force generated on the surface plate by the movement of the stage increases, and the settling of the stage may be deteriorated.

Thus, in recent years, for example, a reaction force processing apparatus described in Patent Document 1 has been developed. In this reaction force processing apparatus, a force (variable thrust) for reducing the reaction force by the first application means (force actuator) and the second application means (horizontal force actuator) is provided on a surface plate (lens barrel surface plate and reticle stage). By applying to the surface plate, a plurality of reaction forces generated on the surface plate due to movement of the plurality of stages (reticle stage and wafer stage) are offset.
JP 2000-40650 A

  By the way, in order to suppress the moment from being generated on the surface plate due to the reaction force, it is common to make the reaction point height of the reaction force and the force action point height to reduce the reaction force coincide with each other. Is. Therefore, in the reaction force processing apparatus as described above, the application means is provided in the moving stage device so that the reaction point height of the reaction force and the action point height of the applied force coincide. However, when the reaction force acting point height is high, it is necessary to provide the application means at a high position, which may increase the size of the reaction force processing apparatus.

  Then, this invention makes it a subject to provide the reaction force processing apparatus which can suppress an enlargement.

  In order to solve the above problems, a reaction force processing apparatus according to the present invention is provided in a moving stage device in which a stage moves on a surface plate installed on a foundation via vibration isolation means. A reaction force processing apparatus for processing a reaction force generated, an application means for applying a force for reducing the reaction force to the surface plate, and a rotation provided on the surface plate and rotating about an axis parallel to the surface of the surface And a body.

  In this reaction force processing apparatus, a force for reducing the reaction force is applied to the surface plate by the applying means, and the reaction force is reduced and offset by the applied force. Further, when the rotating body rotates, a moment is generated on the surface plate, and the moment acting on the surface plate due to the reaction force is reduced and canceled by the moment generated by the rotating body. That is, the reaction force and the moment generated by the reaction force are canceled out independently. Therefore, in order not to generate a moment on the surface plate, it is not necessary to provide an applying means so that the height of the reaction point of the reaction force coincides with the height of the point of application of the applied force. Therefore, the reaction force processing apparatus can be prevented from being increased in size, and consequently the moving stage apparatus can be prevented from being increased in size.

  Here, it is preferable that a concave portion is formed on a side surface of the surface plate, and the rotating body is accommodated in the concave portion. In this case, it is possible to prevent the operator of the apparatus from coming into contact with the rotating body, and it is possible to further suppress an increase in the size of the moving stage apparatus.

  Moreover, it is preferable that it is provided in the moving stage apparatus provided with the surface plate which has several board surfaces from which height differs mutually, and the several stage each arrange | positioned on several board surfaces. In this case, since a plurality of stages move on each of a plurality of board surfaces having different heights, a plurality of reaction forces corresponding to the movement are generated in the surface plate, but as described above, by the application means and the rotating body, Since the reaction force and the moment generated by the reaction force cancel each other independently, it is not necessary to match the height of the application point of the force applied to the height of the application point of the plurality of reaction forces.

  According to the present invention, an increase in the size of the reaction force processing apparatus can be suppressed, and as a result, an increase in the size of the moving stage apparatus can be suppressed.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the description of the drawings, the same or equivalent elements will be denoted by the same reference numerals, and redundant description will be omitted.

  FIG. 1 is a schematic configuration diagram showing a cross section of a moving stage apparatus including a reaction force processing apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic perspective view seen from the lower side of the moving stage apparatus of FIG. As shown in FIG. 1, the moving stage device 10 is employed as a semiconductor exposure device, for example, and includes a reaction plate 11, a stage 12, a reaction force processing actuator 2, and a rotating plate 7. 1 is provided.

  The surface plate 11 is supported and installed on a floor (foundation) 25 via a vibration isolation spring (vibration isolation means) 16, and is thereby insulated from vibration (particularly high frequency vibration) from the floor 25. . The surface plate 11 has a hierarchical structure so as to have a plurality of (two in this case) plate surfaces 18 and 19 having different heights. Specifically, the surface plate 11 includes a first surface plate portion 20 provided on the floor 25 and including the surface 18, and a second surface plate portion 22 provided on the first surface plate portion 20 and including the surface 19. ,have.

  The first surface plate portion 20 is formed of, for example, a stone material in order to prevent deformation due to heat. The first surface plate portion 20 has a side surface 20a and a lower surface 20b. The side surface 20a is formed with a recess 17 that opens to the side surface 20a and the lower surface 20b. The reaction force processing actuator 2 of the reaction force processing apparatus 1 is provided in the recess 17. Further, on the side surface 20d orthogonal to the side surface 20a in the first surface plate portion 20, a notch (concave portion) 27 is formed such that a part of the side surface 20d is cut out in a rectangular shape. The notch 27 is open to the side surface 20d and the lower surface 20b, and the rotating plate 7 of the reaction force processing device 1 is accommodated in the notch 27 (details will be described later). For example, ceramic is used for the second surface plate portion 22.

Stage 12 includes a first stage 12 ₁ which is disposed on board 18, and the second stage 12 ₂ disposed on the board 19, the. The first stage 12 _1, for example, a semiconductor wafer W1 is placed, in the second stage 12 _2, for example, a semiconductor mask W2 is placed. These stages 12 ₁ and 12 ₂ are movable in the horizontal direction (left and right directions in the figure) on the board surfaces 18 and 19 by guide means (not shown) such as air bearings. The stages 12 ₁ and 12 ₂ are driven by stage actuators 21 and 23, respectively, and move on the board surfaces 18 and 19 in the horizontal direction.

The stage actuator 21 includes a stator 13 and a mover 14. The stator 13 is provided on a stay 15 on the board surface 18 and is made of, for example, a permanent magnet. Mover 14 is provided on the first stage 12 _1, for example, an electromagnetic coil. The stator 13 and the movable element 14 are arranged in a non-contact manner. The stage actuator 23 includes a stator 24 and a mover 28. The stator 24 is provided on a stay 26 on the board surface 19 and is made of, for example, a permanent magnet. Armature 28 is provided in the second stage 12 _2, for example, an electromagnetic coil. The stator 24 and the movable element 28 are arranged in a non-contact manner.

A control unit 31 is connected to the stage actuators 21 and 23. By supplying a drive current from the control unit 31 to the movers 14 and 28, magnetic forces are generated between the stator 13 and the mover 14 and between the stator 24 and the mover 28. By this generated magnetic force, a thrust (force) is applied to each of the movers 14 and 28, and the stages 12 ₁ and 12 ₂ are driven.

  The control unit 31 is constituted by, for example, a CPU, a ROM, a RAM, and the like. The control unit 31 has a controller 32. The controller 32 controls the movement of the stage 12 by controlling each of the drive currents supplied to the stage actuators 21 and 23.

  Here, in the present embodiment, as described above, the reaction force processing actuator 2 of the reaction force processing device 1 is provided in the concave portion 17 of the first surface plate portion 20. Specifically, two recesses 17 are formed on each of the four side surfaces of the first surface plate portion 20 (a total of eight locations are formed), and the reaction force processing actuator 2 is provided in each of these recesses 17. It has been. In the drawing, for convenience of explanation, only the concave portion 17 formed on the side surface 20a of the first surface plate portion 20 and the reaction force processing device 1 provided in the concave portion 17 are shown.

Reaction force cancel system 1 includes a reaction force F ₁ acting on the platen 11 by the movement of the stage 12 ₁ is intended for processing reaction force F ₂ acting on the platen 11 by the movement of the stage 12 ₂ As described above, the reaction force processing actuator 2 and the rotating plate 7 are provided.

The reaction force processing actuator 2 applies a counter thrust R, which is a force for reducing the reaction forces F ₁ and F ₂ , to the surface plate 11. For example, the mover 3 made of a permanent magnet and a fixed piece made of an electromagnetic coil, for example. And a child 4. The mover 3 is attached to the first surface plate portion 20, and the stator 4 is attached to the upper end portion of the columnar fixed frame 5 installed on the floor 25. And the needle | mover 3 and the stator 4 are comprised so that it may become non-contact with each other.

  In addition, the reaction force processing actuator 2 is connected to the control unit 31, and when a drive current is supplied from the control unit 31 to the stator 4, a magnetic force is generated between the mover 3 and the stator 4. Due to this magnetic force, a counter thrust R is generated in the mover 3. The fixed frame 5 is disposed in the concave portion 17 so as to cover the first surface plate portion 20, and is covered with the concave portion 17 of the first surface plate portion 20. That is, the mover 3 and the stator 4 are arranged between the board surface 18 and the floor 25 of the first platen part 20 so that the first platen part 20 covers the mover 3 and the stator 4.

The rotating plate 7 is accommodated in the notch 27 as described above. The rotating plate 7 generates a canceling moment T for canceling out the moment generated on the surface plate 11 when the acting points of the reaction forces F ₁ and F ₂ and the counter thrust R are different from each other. The rotary plate 7 is formed of, for example, iron and has a disk shape (wheel shape) in which a plurality of hollow holes are formed. Further, the rotating plate 7 has a moment of inertia sufficient to cancel out the moment generated in the surface plate 11.

  The rotating plate 7 is rotatably supported by a rotating shaft (shaft) 8 via a bearing (not shown) and is attached to the first surface plate portion 20. Further, the rotary plate 7 is horizontally centered on the side surface 20d of the first surface plate 20 so that the surface 18 and 19 of the surface plate 19 is kept horizontal without being inclined (the center of gravity of the surface plate 11 is not changed). It is attached (near the position of the center of gravity of the surface plate 11).

  The rotary shaft 8 extends along a horizontal direction (a direction parallel to the board surfaces 18 and 19) and a direction (vertical direction on the paper surface) perpendicular to (crossing) the moving direction of the stage 12, and as shown in FIG. The motor 9 is connected. In addition, a controller 31 is connected to the motor 9. As a result, a drive current is supplied from the control unit 31 to the motor 9, and the rotating plate 7 rotates around the rotating shaft 8. The controller 32 of the control unit 31 controls the rotation (for example, angular acceleration, rotation direction) of the rotating plate 7 by controlling the drive current supplied to the motor 9.

In the moving stage apparatus 10 configured as described above, a drive current is supplied to the stage actuators 21 and 23 by the control unit 31, and thrusts f ₁ and f ₂ corresponding to the supplied drive currents are respectively supplied to the stage actuators 21. , 23 and the stages 12 ₁ , 12 ₂ are driven by these thrusts f ₁ , f ₂ , respectively.

Here, when the thrusts f ₁ and f ₂ act on the stages 12 ₁ and 12 ₂ , the reaction force F ₁ is a force in the opposite direction and the same magnitude as the thrusts f ₁ and f ₂ due to the reaction. , _{F 2} acts on the platen 11. Therefore, in this embodiment, the reaction force canceling actuator 2, the reaction force F _1, the absolute value equal to the magnitude of the sum of F _2, and the reaction force F _1, opposite to the direction counter to the sum of F ₂ The thrust R is applied to the surface plate 11, and the counter thrust R reduces the reaction forces F ₁ and F ₂ to cancel each other.

At this time, since the acting point heights of the reaction forces F ₁ and F ₂ and the counter thrust R are different from each other, a moment acts on the surface plate 11. Therefore, a canceling moment T having a magnitude equal to the absolute value of the moment acting on the surface plate 11 and opposite to the moment acting on the surface plate 11 is applied to the surface plate 11 by rotating the rotating plate 7. generate. As a result, the canceling moment T and the moment acting on the surface plate 11 cancel each other. In other words, the moment caused by the effect of the reaction force _F 1, _{F 2} and the reaction force _F 1, _{F 2} becomes to be canceled independently. Here, the moment caused by the effect of the reaction force F _1, F ₂ and the reaction force F _1, F ₂ is about point is offset independently, will be described in detail below.

FIG. 3 is a diagram illustrating an example of a mechanical model of the moving stage apparatus of FIG. As shown in FIG. 3, the moving stage device 10 is modeled as a stage 12 moving on a surface plate 11 installed on a floor 25 via a vibration isolation spring 16. Here, the reaction force F acting on the surface plate 11 by the movement of the stage 12, the mass M of the stage 12, the acceleration A, the distance h from the height of the center of gravity B of the moving stage apparatus 10 to the height of the reaction force F, The distance r from the height of the center of gravity B of the moving stage device 10 to the height of the point of application of the counter thrust R, the moment of inertia J of the rotating plate 7, and the angular acceleration α. The reaction force F when the stage 12 is accelerated is given by the following equation (1).

The cancellation moment T acting on the surface plate 11 by the angular acceleration α of the rotating plate 7 is given by the following equation (2).

When the counter thrust R is applied with the magnitude equal to the absolute value of the reaction force and in the opposite direction to the reaction force, the total force on the surface plate 11 becomes zero as shown in the following equation (3).

When the rotating plate 7 is driven by the angular acceleration given by the following equation (4), the sum of moments generated on the surface plate 11 becomes zero as shown in the following (5).

As described above, according to this embodiment, since the the moment caused by the effect of the reaction force F _1, F ₂ and the reaction force F _1, F ₂ is offset independently, unlike conventional reaction force cancel system It is not necessary to provide the reaction force processing actuator 2 so that the height of the action point of each reaction force F ₁ , F _{2 and} the action point height of the applied force coincide. Therefore, an increase in the size of the reaction force processing apparatus 1 can be suppressed, and as a result, an increase in the size of the moving stage apparatus 10 can be suppressed.

Furthermore, as described above, since it is not necessary to provide the reaction force processing actuator 2 so that the action point heights of the reaction forces F ₁ and F ₂ coincide with the action point height of the applied force, the reaction force processing device is provided. 1 can be placed in any position.

  Moreover, since the enlargement of the reaction force processing apparatus 1 can be suppressed as described above, the need to increase its rigidity to prevent the fixed frame 5 of the reaction force processing apparatus 1 from being bent is reduced. Therefore, it is possible to suppress the mass of the fixed frame 5 from increasing in order to increase the rigidity. That is, the reaction force processing apparatus 1 can be reduced in weight.

  In the present embodiment, as described above, the notch 27 is formed on the side surface 11 d of the surface plate 11, and the rotating plate 7 is accommodated in the notch 27. Thereby, it is possible to prevent the operator of the moving stage device 10 from coming into contact with the rotating plate 7 and to further suppress the enlargement of the moving stage device 10.

In the present embodiment, as described above, since the stages 12 ₁ and 12 ₂ move on the board surfaces 18 and 19 having different heights, a plurality of reaction forces F ₁ , F ₂ is generated on the surface plate 11. Here, in the present embodiment, as described above, the reaction forces F ₁ and F ₂ and the moment generated by the reaction force cancel each other independently. Therefore, even if a plurality of reaction forces occur, each reaction force is generated. It is no longer necessary to match the height of the application point of the force applied to the application point height of the forces F ₁ and F ₂ . That is, in this case, since it is not necessary to provide the reaction force processing actuator 2 at a high position, the above effect of suppressing an increase in the size of the reaction force processing device 1 and suppressing an increase in the size of the moving stage device 10 becomes remarkable. .

  In the present embodiment, as described above, the reaction force processing actuator 2 is disposed between the surface 18 of the first surface plate 20 and the floor 25 so as to cover the first surface plate 20. Further, as described above, the rotating plate 7 is accommodated in the cutout portion 27 of the first surface plate portion 20. Therefore, a sufficient space on the board surfaces 18 and 19 of the surface plate 11 is ensured, and an increase in the installation area (so-called footprint) of the movable stage device 10 is suppressed. Therefore, the space of the moving stage apparatus 10 can be used efficiently, and the enlargement of the moving stage apparatus 10 can be further suppressed.

Furthermore, in the present embodiment, as described above, the reaction force processing apparatus 1 can be arranged at a free position. Therefore, when the reaction force processing apparatus 1 is mounted on an existing moving stage device, the reaction force processing apparatus 1 is not suitable due to a lack of space. Even when the action point heights of the forces F ₁ and F _{2 and} the action point height of the counter thrust cannot be matched, the reaction force processing apparatus 1 can be reliably applied.

  Further, as described above, since the movable element 3 and the stator 4 of the reaction force processing actuator 2 are not in contact with each other, vibration from the floor 25 is applied to the surface plate 11 via the reaction force processing actuator 2. Propagation is suppressed. Further, as described above, since the permanent magnet is attached to the surface plate 11 as the mover 3 and the electromagnetic coil is attached to the fixed frame 5 as the stator 4, a drive current is applied to the electromagnetic coil of the stator 4. It is suppressed that the influence of the heat generated by this reaches the surface plate 11.

The counter thrust R and canceling a moment reaction force F ₁ to the timing of generating the _T, for one corresponding to the timing at which F ₂ is generated, the stage 12 _1, 12 reaction force cancel system based on the timing of accelerating ₂ 1 It is preferable to determine the timing for operating the. Therefore, in the control unit 31 of the present embodiment, the stage actuators 21 and 23, the reaction force processing actuator 2, and the motor 9 are controlled by one controller 32.

  The preferred embodiment of the present invention has been described above, but the present invention is not limited to the above embodiment.

  For example, in the above-described embodiment, the disk-shaped rotating plate 7 is used as the rotating body. However, for example, a polygonal rotating plate may be used even if the outer shape is not circular. For example, a plurality of rotating plates having a lighter weight than the rotating plate 7 may be used.

  Further, the rotating body is not limited to a plate shape, and for example, a rotating body including an arm may be used. Specifically, a weight is provided at the tip of the arm, and the base end of the arm is attached to the rotating shaft so that the longitudinal direction of the arm and the longitudinal direction of the rotating shaft intersect each other. Also good. Further, the rotating body may be rotated or swung.

  Moreover, in the said embodiment, although the notch part 27 which accommodates the rotating plate 7 was formed in the 1st surface plate part 20, it does not need to form a notch part depending on the case. Although the surface plate 11 is installed on the floor 25 via the vibration isolation spring 16, it may be installed via other mechanical springs, an air spring or the like may be used. What is necessary is just to install through what is insulated with respect to the vibration from 25 (vibration isolation means).

In the above embodiment, the reaction force processing apparatus 1 is provided in the movable stage apparatus 10 in which the stages 12 ₁ and 12 ₂ move on the two board surfaces 18 and 19 having different heights. It may be provided in a moving stage apparatus in which the stage moves on one board surface, or may be provided in a moving stage apparatus in which each of three or more stages move on three or more board surfaces having different heights.

  In the above embodiment, the stators 13 and 24 of the stage actuators 21 and 23 are permanent magnets and the movers 14 and 28 are electromagnetic coils. However, the stator may be an electromagnetic coil and the mover may be a permanent magnet. . In this case, the drive current from the control unit 31 is supplied to a stator as an electromagnetic coil. In the above embodiment, the mover 3 of the reaction force processing actuator 2 is a permanent magnet and the stator 4 is an electromagnetic coil. However, the mover may be an electromagnetic coil and the stator may be a permanent magnet. In this case, the drive current from the control unit 31 is supplied to the mover as an electromagnetic coil.

  Moreover, in the said embodiment, although the reaction force processing actuator 2 was provided in two places (a total of eight places) on each of the four side surfaces of the 1st surface plate part 20, reaction force processing apparatus 1 is provided with various arrangement patterns. It may be provided. Moreover, although the moving stage apparatus 10 is employed in the semiconductor exposure apparatus, it may be employed in a liquid crystal exposure apparatus that exposes liquid crystal, a machine tool having a plurality of stages, a manufacturing apparatus, and the like.

It is a schematic block diagram which shows the cross section of the movement stage apparatus containing the reaction force processing apparatus which concerns on one Embodiment of this invention. It is the schematic perspective view seen from the downward side of the movement stage apparatus of FIG. It is a figure which shows an example of the dynamic model of the movement stage apparatus of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Reaction force processing apparatus, 2 ... Reaction force processing actuator (application means), 3 ... Movable element, 4 ... Stator, 7 ... Rotating plate (rotating body), 8 ... Rotating shaft (axis), 10 ... Moving stage apparatus , 11... Surface plate, 12, 12 ₁ , 12 ₂ ... Stage, 16... Vibration isolation spring (vibration isolation means), 18, 19. ... floor (foundation), 27 ... notch (recess), F ₁ , F ₂ ... reaction force, R ... counter thrust (force to reduce reaction force).

Claims (3)

A reaction force processing device for processing a reaction force generated in the surface plate by the movement of the stage, provided in a moving stage device in which a stage moves on a surface plate installed on a foundation via vibration isolation means, ,
Applying means for applying a force for reducing the reaction force to the surface plate;
A reaction force processing apparatus comprising: a rotating body provided on the surface plate and rotating about an axis parallel to the surface of the plate. A concave portion is formed on the side surface of the surface plate,
The reaction force processing apparatus according to claim 1, wherein the rotating body is accommodated in the recess.   2. The movable stage device comprising: the surface plate having a plurality of plate surfaces having different heights; and the plurality of stages respectively disposed on the plurality of plate surfaces. Or the reaction force processing apparatus of 2 description.

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