JP2007184193A - Charged particle beam device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To realize a charged particle beam device with low cost and high precision, capable of removing stage-repulsion force leading to errors of drawing or inspection without enlarging the size of the device, and performing inspection with a high throughput. <P>SOLUTION: An X-table 31 free in movement in an X-direction is arranged on a base 30 of the charged particle beam device, and a Y-table 32 free in movement in a Y-direction is arranged on the X-table. A mass table 33 which can move in a direction reversed to the movement of the X-table 31 is arranged between the base 30 and the X-table. A scanning direction as a sample drawing direction is designated as an X-direction, and a step movement direction is designated as a Y-direction. By the above, By the above, vibration in lateral direction caused by the movement of the X-table is restrained, and the stage-repulsion force leading to error of drawing or inspection is removed without enlarging the size of the device. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a charged particle beam apparatus such as an electron beam drawing apparatus, an electron microscope, and an ion beam processing / observation apparatus, and more particularly to a technique for improving the accuracy of drawing of the charged particle beam apparatus.

  In recent years, the degree of integration of semiconductor products has been improved, and further refinement of the circuit pattern has been demanded. In order to realize high definition, in addition to the pattern resolution of the manufacturing apparatus, the positional accuracy of the circuit pattern is indispensable.

  Examples of the circuit pattern manufacturing apparatus include an electron beam drawing apparatus that forms a circuit pattern on a mask using an electron beam. In order to improve the position accuracy of the circuit pattern as described above, it is indispensable to reduce the main body vibration caused by the reaction force when the stage is moved.

  On the other hand, an inspection apparatus that detects defects in circuit patterns formed on a sample requires high throughput in addition to resolution, so the stage for moving the sample inevitably increases in speed and acceleration. As the stage progresses, the stage reaction force increases.

  Therefore, although the main body vibration due to the stage reaction force is increased, if the main body is shaken during observation, the observation image is also shaken and cannot be observed correctly. In order to avoid this, it is necessary to provide a waiting time until the vibration falls within an allowable range, but an increase in the waiting time leads to a decrease in throughput.

  A conventional electron beam drawing apparatus will be described with reference to FIGS.

FIG. 10 is a diagram showing a main body configuration of a conventional electron beam drawing apparatus. The electron beam drawing apparatus includes a column 1 that generates an electron beam and irradiates the sample 10, a stage 3 that moves the sample 10 fixed by the sample holding means 11 and moves in a horizontal plane, and a stage 3 that is disposed therein. A sample chamber 2 whose inside is evacuated to about 10 ⁻⁴ Pa to 10 ⁻⁶ Pa by a vacuum pump (not shown), a surface plate 4 on which the sample chamber 2 is mounted, an air mount 5 for shielding floor vibration, And a gantry 6 that supports the air mount 5.

  The position of the stage 3 is controlled by laser measurement of the interferometer 20 and the bar mirror 21 attached to the inner wall of the sample chamber 2, and a desired circuit pattern is controlled by deflecting the electron beam based on the position information of the sample 10. 10 is formed.

  11 and 12 show the stage and the drive system viewed from the Y direction and the X direction, and FIG. 13 is a perspective view of the drive system.

  11 to 13, the base 30, the X guide 40 arranged linearly in the X direction arranged on the base 30, the X table 31 movable in the X direction by the X guide 40, and the X table 31 are arranged The stage 3 is formed by a Y guide 41 that can move linearly in the direction perpendicular to the X direction (Y direction) and a Y table 32 that can move in the Y direction by the Y guide 41.

  On the other hand, with respect to the drive system, the X linear drive shaft 50 and the Y linear drive shaft 51 connected to the X table 31 and the Y table 32 and the rotary drive shaft 62 connected to the motor 64 are in contact with each other at right angles. Realizes friction drive that converts rotational motion into linear motion.

  Here, the X drive block 60 holds the rotary drive shaft 62 and the cam follower 63, and applies a preload to the X linear drive shaft 50 and the rotary drive shaft 62 by the cam follower 63, thereby preventing positional deviation (slip) between them. Yes.

  The Y-axis drive system is the same, but a slider 53 and a roller hook 54 are arranged between the Y linear drive shaft 51 and the Y table 32 so as to allow movement in the X direction. 10 horizontal movements are possible.

  Conventionally, the drawing method on the sample draws the deflectable width of the beam while moving the stage in one direction (for example, the Y direction) (scan movement), and when the row is drawn, the orthogonal direction (here X direction) ) Is moved by the deflection width (step movement), and the stage is moved by the step-and-scan method for drawing the next column. Since this moving method performs drawing while continuously moving, higher throughput can be obtained as compared with drawing using only step movement.

  Here, as described at the beginning, the shaking of the main body of the electronic drawing device accompanying the stage movement changes the distance between the interferometer and the column that should be kept at a constant distance due to the acceleration, and drawing caused by the measurement error. Cause an error. Conventionally, various proposals have been proposed as methods for solving such problems.

  In the apparatus described in Patent Document 1, by applying a compensation force equivalent to the reaction force accompanying the drive of the stage to the machine frame that supports the stage and the projection lens by a force actuator generated in the horizontal direction, This system reduces the shaking of the device due to reaction force.

  Further, in Patent Document 2 and Patent Document 3, a linear motor composed of a mover and a stator is adopted as an actuator for the stage, and the amount of momentum in the stage is preserved by moving the stator by a driving reaction force. A counter-mass method has been proposed that removes the influence on the other.

  In Patent Document 4, in a charged particle beam drawing apparatus or the like, a first ball screw shaft that moves the stage in the left-right direction on one side surface of the stage, and a first motor that rotationally drives the first ball screw shaft And a second ball screw shaft that moves the weight and a second motor that rotationally drives the second ball screw shaft, and suppresses vibration associated with the movement of the stage.

  In addition, a mechanism similar to the above mechanism is provided on the other side surface of the stage to suppress vibration accompanying the movement of the stage.

JP-A-5-121294 JP 2002-8971 A JP 2002-208562 A JP-A-5-304081

  However, in the conventional method described above, if the stage reaction force escapes to the gantry or the floor, the floor will be shaken, which not only adversely affects the surrounding devices but also causes vibrations that cannot be damped by the air mount of the device. It can be shaken.

  In addition, when a counter mass by a linear motor is mounted, a strong magnetic field variation peculiar to the linear motor affects the charged particle beam and deteriorates the drawing accuracy. Even if the linear motor is placed away from the beam and the effect on charged particles can be reduced by mounting a magnetic field shield with a ferromagnetic material, the space inside the sample chamber is increased instead. It is necessary to increase the size and cost of the apparatus.

  In addition, a linear motor is more expensive than a rotary motor that is a general actuator, and the cost is inevitably increased. Furthermore, since the linear motor generates a large amount of heat, there are problems such as fluctuations in the distance between the bar mirror and the sample, which should be essentially constant, and deterioration in the straightness of the guide.

  Moreover, in the technique described in Patent Document 4, the configuration becomes complicated and the apparatus becomes large.

  An object of the present invention is to remove a stage error that leads to a drawing error or an inspection error without increasing the size of the apparatus, and enables a low-cost, high-precision drawing and a high-throughput inspection to be performed. Is to realize.

  The charged particle beam apparatus of the present invention includes a column for generating a charged particle beam, a stage on which a sample is arranged and movable in at least one direction, and irradiates the sample with the charged particle beam.

  The charged particle beam device is connected to the stage, and rotates so that the first linear drive shaft that transmits thrust in the moving direction of the stage contacts the first linear drive shaft and moves in the linear direction. A drive shaft, a motor for driving the rotary drive shaft, a second linear drive shaft disposed substantially parallel to the first linear drive shaft across the rotary drive shaft, and the second linear drive A moving body connected to the shaft and moving in a direction opposite to the moving direction of the stage.

  According to the present invention, a charged particle beam apparatus capable of removing drawing errors or stage reaction force that leads to inspection errors without increasing the size of the apparatus, enabling inexpensive and highly accurate drawing, and inspection with high throughput. Can be realized.

  Embodiments of the present invention will be described below with reference to the accompanying drawings. Note that the present invention will be described as an example when applied to an electron beam drawing apparatus.

  FIG. 1 is a plan view showing a stage and a drive system of an electron beam lithography apparatus according to a first embodiment of the present invention, FIG. 2 is a side view, and FIG. 3 is a cross section taken along line AA in FIG. FIG.

  The basic stage is composed of a base 30, an X guide 40 arranged linearly in the X direction arranged on the base 30, an X table 31 movable in the X direction by the X guide 40, and an X table 31. The stage 3 is formed by a Y guide 41 that can move linearly in the direction perpendicular to the X direction (Y direction) and a Y table 32 that can move in the Y direction by the Y guide 41.

  On the other hand, with respect to the drive system, the X linear drive shaft 50 and the Y linear drive shaft 51 connected to the X table 31 and the Y table 32 and the rotary drive shaft 62 connected to the motor 64 are in contact with each other in a perpendicular direction. Friction drive that converts rotational motion into linear motion is realized.

  Here, the X drive block 60 holds the rotary drive shaft 62 and the cam follower 63, and preload is applied to the X linear drive shaft 50 and the rotary drive shaft 62 by the cam follower 63, thereby preventing positional displacement (slip) between them. Yes.

  The Y-axis drive system is the same, but a slider 53 and a roller hook 54 are arranged between the Y linear drive shaft 51 and the Y table 32 so as to allow movement in the X direction. 10 horizontal movements are possible.

  Here, in addition to the X guide 40, an M guide 42 is attached to the center of the base 30, and the mass table 33, which is a moving body, can move in the X direction.

  Further, an M linear drive shaft 52 is connected to the mass table 33, and is arranged so as to be symmetrical with the X linear drive shaft 50 in the vertical direction with respect to the rotational drive shaft 62. Similar to the X linear drive shaft 50, the M linear drive shaft 52 is preloaded by a cam follower 63 to prevent displacement (slip). The mass table 33 is designed to have approximately the same mass as the moving mass when moving in the X direction, which is the sum of the X table 31, the Y guide 41, the Y table 32, the sample 10, the sample holding means 11, the bar mirror 21, and the like. Yes.

  Next, details of the drive system will be described with reference to FIG.

  The rotation shaft 62 of the motor 64 and the rotation drive shaft 62 connected by the coupling 65 are supported by a bearing 66 in the X drive block 60 and fixed so that there is no backlash other than rotation.

  The X linear drive shaft 50 is pressed against the rotational drive shaft 62 by the preload F of the cam follower 63, and the M linear drive shaft 52 is symmetric with the X linear drive shaft 50 in the vertical direction. Is pressed against the rotary drive shaft 62.

  With the above configuration, when the motor 64 rotates in the direction of the arrow in FIG. 4, the X linear drive shaft 50 and the M linear drive shaft 52 move in opposite directions as indicated by the arrows. The X linear drive shaft 50 and the M linear drive shaft 52 are driven by a rotary drive shaft 62 having the same diameter. For this reason, the amount of movement per unit rotation angle of the motor 64 is the same distance in both directions and in the opposite direction, and the mass of the stage and the mass table when moving in the X direction are almost the same. Thus, the stage reaction force in the translation direction is canceled out.

  However, as shown in FIG. 3, the stage center of gravity 90 and the mass table center of gravity 91 when moving in the X direction are vertically different in position by ΔZ, and a couple MY is generated. The couple MY may cause a swing (pitching) around the Y axis with respect to the apparatus main body. Therefore, in order to keep the couple MY small, it is desirable to arrange the mass table 33 at a high position so that ΔZ is as small as possible.

  Alternatively, if the air mount that supports the stage and removes floor vibration is controlled by a servo valve that can control the air flow rate, it controls a control signal that cancels the couple MY against the servo valve. It is also effective to give by a part (not shown).

  In addition, since the air mount generally has a slow response speed, the feedforward control that transmits a control signal that anticipates the stage movement pattern in advance is more effective because the delay is reduced.

  Furthermore, by adding a linear motor, which is a highly responsive actuator, to the mount, it is possible to achieve excellent vibration isolation with a smaller response delay. For linear motors, in addition to the feed-forward control described above, if a displacement sensor or acceleration sensor is attached to the device in advance, feedback control based on the signal from each sensor is sufficient. You can expect.

  On the other hand, as shown in FIG. 2, when the Y table 32 is moved from Y0 to Y1, the stage center of gravity 90 after movement and the mass table center of gravity 91 are different by ΔY in the Y direction. If it moves to, the couple MZ will generate | occur | produce. The couple MZ may cause a swing (yawing) around the Z axis with respect to the apparatus main body.

  Therefore, in order to hold down the couple MZ as small as possible, it is better to reduce the stage mass when moving in the Y direction as much as possible and to suppress the position fluctuation of the stage center of gravity 90 when moving in the X direction.

  Further, increasing the masses of the X table 31 and the mass table 33 to relatively reduce the ratio of the stage mass when moving in the Y direction is also one of the improvement measures.

  Here, in the first embodiment of the present invention, the X linear drive shaft and the M linear drive shaft are arranged so as to be opposed to the horizontally mounted rotational drive shaft in the vertical direction. When the rotational drive shaft is mounted, the same effect can be obtained by arranging the X linear drive shaft and the M linear drive shaft so as to face the rotational drive shaft in the horizontal direction.

  In the configuration of the first embodiment, since the stage reaction force during movement in the X direction is removed, the scanning direction, which is the drawing direction of the sample, is set as the X direction, and the step movement direction is set as the Y direction. As a result, the reaction force accompanying the stage movement during drawing can be removed, and an accurate circuit pattern can be obtained.

  Conventionally, the use of a magnetic material that affects an electron beam (charged particle beam) for the movable part of the stage has a risk of degrading drawing accuracy, and has been limited in use. Similarly, it is desirable to apply nonmagnetic materials such as ceramics, aluminum, and nonmagnetic super steel to the mass table 33 and the M guide 42. Since the specific gravity of copper or copper alloy is larger than that of ceramics or aluminum, the size of the mass table 33 can be designed to be small.

  Here, preload is applied by the cam follower 63 in order to prevent displacement between the rotational drive shaft and the linear drive shaft. However, if minute frictional displacement is accumulated, the amount of displacement cannot be ignored. The position of the stage is controlled and driven by a laser, but the mass table 33 does not manage the position information. Therefore, if the amount of positional deviation increases, the mass table 33 hits the stopper and cannot function as a counter mass. The impact causes deterioration of drawing, and the stage itself to be controlled cannot be moved.

  FIG. 5 is a diagram showing a stage operation for correcting the positional deviation of the mass table 33. In FIG. 5, when the X table 31 is positioned in front of the X stopper 70 (P1, P2 position), the mass table 33 is designed to be in a position (P3, P4 position) that just contacts the M stopper 72. .

  In the configuration shown in FIG. 5, even if the relative relationship between the M linear drive shaft 52 and the X linear drive shaft 50 is deviated, the X table 31 is moved to the positions of P1 and P2 at least once. During the operation, the mass table 33 hits the M stopper 72 in a shifted direction. Further, the rotary drive shaft 62 is rotated to move the X table 31 with respect to the target position, so that the rotary drive shaft 62 and the M linear drive shaft 52 are forcibly slipped, and the mass table 33 is moved to the original design position. Can be corrected.

  At this time, if the preload by the cam follower 63 is too strong, a drive overcurrent of the motor 64 is caused or the drive rotary shaft 62 and the M linear drive shaft 52 are damaged. 'Need to be adjusted appropriately.

  Various mechanisms such as leaf springs, coil springs, and push screws are conceivable for the mechanism that applies the preload, but it is important to use a mechanism that does not change the amount of preload due to vibration associated with stage drive or temperature changes. It is. As for the stage movement during the mass table position correction operation as described above, in normal feedback control, problems such as oscillation may be caused by the impact of the mass stage 33 against the M stopper 72. If stage operation is performed by open control in which a constant drive current is supplied to the motor 64 until a limit sensor 73 using a photo interrupter or the like is installed at the P1 and P2 positions and the limit sensor 73 is operated, oscillation of the stage, etc. The problem can be avoided.

  If such a position correction operation is performed as a sequence operation at regular intervals, such as every time a sample is changed or every predetermined stage travel distance, problems due to mass table misalignment can be solved.

  In the first embodiment described above, the configuration for removing the reaction force accompanying the stage movement in the X direction has been described, but a configuration for removing the reaction force accompanying the stage movement in the Y direction can be realized. However, in order to attach the guide of the mass table 33 to the X table, it is necessary to attach a slider and a roller hook between the linear drive shaft and the mass table 33 so as to allow movement in the X direction as in the case of the Y table 32.

  If the stage reaction force in the X direction and the Y direction can be removed by the above method, the reaction force during the step movement is removed in addition to the scanning movement during drawing, so the waiting time until the main body vibration during the step movement is settled. And throughput can be further improved.

  Next, a second embodiment of the present invention will be described with reference to FIGS.

  6 is a side view of an electron beam lithography apparatus according to a second embodiment of the present invention, FIG. 7 is a cross-sectional view taken along line BB in FIG. 6, and FIG. 8 is a perspective view showing a drive system. 9 is a side view of the drive system.

  The basic configuration of the second embodiment is the same as that of the first embodiment, and a mass stage 33 movable in the X direction is mounted in order to remove the reaction force accompanying the stage movement in the X direction. Yes.

  The difference between the second embodiment and the first embodiment is that the diameter of the rotary drive shaft 62 in contact with the X linear drive shaft 50 and the M linear drive shaft 52 is different at each position. Thus, the movement amount per rotation of the motor is different between the X table 31 and the mass table 33.

  In order to make the momentum of the stage 3 equal to the momentum of the mass table 33, it is necessary to satisfy the condition of the following formula (1).

φDX: φDM = MM: MX (1)
In the above formula (1), φDX is the diameter of the rotary drive shaft that is in contact with the X linear drive shaft, φDM is the diameter of the rotary drive shaft that is in contact with the M linear drive shaft, and MM is the mass table , MX is the stage moving mass in the X direction.

  In the case of the above configuration, since the diameter DM of the rotary drive shaft 62 in contact with the M linear drive shaft 52 is small, it is necessary to make the mass of the mass table 33 larger than the stage moving mass in the X direction. If a material having a large specific gravity is used, the material can be made relatively small.

  The feature of the second embodiment is that the moving distance of the mass table 33 is significantly shorter than the moving distance of the stage 3 in the X direction and can be mounted compactly.

  Further, by covering the movable range of the mass table 33 with the magnetic shield 80 using a ferromagnetic material (for example, permalloy), the material of the M guide 42 and the mass table 33 can be selected regardless of the presence or absence of magnetism. .

  In the second embodiment of the present invention, the M guide 42 is described assuming an LM guide that is a general linear guide. Most non-magnetic guides are custom-made products, so the cost is higher than ordinary iron guides and the delivery time is longer. If the general guide can be used by mounting the magnetic shield 80, the function of the counter mass can be realized at low cost.

  Similarly, the material of the mass table 33 can be selected widely, and can be manufactured using the most common structural rolled steel material (SS material) or the like, so that the cost can be reduced and the delivery time can be shortened.

  Here, since a ferromagnetic material is used as a magnetic shield, it cannot be mounted on the moving X table 31 in consideration of the influence on the beam. Therefore, it is necessary to configure the M guide 42 on the fixed base 30, and the apparatus is configured to perform drawing with the X direction as the scan direction.

  In addition, a flow path 81 is formed in the base 30 so that the temperature adjustment medium can flow, and the temperature of the base 30 can be kept constant by flowing the temperature adjustment medium. Reference numeral 82 denotes a joint.

  In the configuration according to the second embodiment of the present invention, since the scanning direction is the X direction, the moving distance in the X direction of the stage is longer than the moving distance in the Y direction when compared in the processing steps per sample. . For this reason, compared with the Y guide 41, the calorific value by friction of the X guide 40 and the M guide 42 becomes large.

  Therefore, by flowing the temperature adjusting fluid through the base 30, the amount of heat generated when the stage is moved can be absorbed efficiently, and the stage temperature can be kept constant.

  Conversely, when the mass table 33 is mounted on the X table 31 such that the Y direction is the stage scanning direction and the mass table 33 is movable in the Y direction, the heat generation amount of the Y guide 41 and the M guide 42 is the heat generation amount of the X guide 40. Since the distance is larger when the heat is absorbed from the base 30, the efficiency is poor and it is difficult to keep the stage temperature constant.

  As described above, in the stage 3 configured in a state where the base 30, the X table 31, and the Y table 32 are sequentially stacked, the moving direction of the moving table (X table) having a guide on the fixed table (base) ( The arrangement of the mass table with the X direction as the scanning direction is advantageous in terms of the selection range of materials used, cost, ease of configuration, and temperature control efficiency.

  The first embodiment and the second embodiment of the present invention described above have been described as application examples to an electron beam drawing apparatus. However, an electron microscope that irradiates a sample with the same charged particle beam, or ion beam processing. / The same effect can be obtained even if the invention is applied to the observation apparatus.

  That is, it is possible to realize an electron beam lithography apparatus capable of performing inspection with high throughput by reducing stage reaction force that leads to inspection errors without increasing the size of the apparatus while suppressing the apparatus cost.

It is a top view of the electron beam drawing apparatus which is the 1st Embodiment of this invention. It is the side view which looked at the 1st Embodiment of this invention from the X direction. It is sectional drawing along the AA line of FIG. 2 which looked at the 1st Example of this invention from the Y direction. It is a perspective view which shows the drive system in the 1st Embodiment of this invention. It is sectional drawing along the AA line of FIG. 2 which shows the position correction operation | movement of the stage in the 1st Embodiment of this invention. It is the side view which looked at the 2nd Embodiment of this invention from the X direction. It is sectional drawing along the BB line of FIG. 6 which looked at the 2nd Embodiment of this invention from the Y direction. It is a perspective view which shows the drive system in the 2nd Embodiment of this invention. It is a side view which shows the drive system in the 2nd Embodiment of this invention. It is a side view which shows the structural example of the conventional electron beam drawing apparatus. It is the side view which looked at the structural example of the conventional electron beam drawing apparatus from the X direction. It is sectional drawing along CC line of FIG. 11 which looked at the structural example of the conventional electron beam drawing apparatus from the Y direction. It is a perspective view which shows the drive system in the structure of the conventional electron beam drawing apparatus.

Explanation of symbols

1 column 2 sample room 3 stage 4 surface plate 5 air mount 6 mount 10 sample 11 sample holding means 20 interferometer 21 bar mirror 30 base 31 X table 32 Y table 33 mass table 40 X guide 41 Y guide 42 M guide 50 X linear drive Shaft 51 Y linear drive shaft 52 M linear drive shaft 53 Slider 54 Roller hook 60 X drive block 61 Y drive block 62 Rotation drive shaft 63 Cam follower 64 Motor 65 Coupling 66 Bearing 70 X stopper 71 Y stopper 72 M stopper 73 Limit sensor 74 Shutter 80 Magnetic shield 81 Flow path 82 Joint 90 Stage center of gravity when moving in X direction 91 Mass table center of gravity

Claims (13)

In a charged particle beam apparatus that includes a column that generates a charged particle beam and a stage in which the sample is arranged and is movable in at least one direction, and irradiates the sample with the charged particle beam.
A first linear drive shaft coupled to the stage for transmitting thrust in the direction of movement of the stage;
A rotary drive shaft that contacts the first linear drive shaft and moves the first linear drive shaft in a linear direction;
A motor for driving the rotary drive shaft;
A second linear drive shaft disposed substantially parallel to the first linear drive shaft across the rotational drive shaft;
A moving body connected to the second linear drive shaft and moving in a direction opposite to the moving direction of the stage;
A charged particle beam apparatus comprising: The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus, wherein the moving body moves along a guide attached to the stage. The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus, wherein the moving body is made of a nonmagnetic material. The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus, wherein the moving body includes a magnetic material and is magnetically shielded by a magnetic body that covers a moving range of the moving body. The charged particle beam apparatus according to claim 1,
A charged particle beam apparatus comprising: a positional deviation correcting means for correcting a positional deviation between a first linear drive shaft for driving the stage and a second linear drive shaft for driving a moving body. The charged particle beam device according to claim 5, wherein
The charged particle beam apparatus, wherein the positional deviation correction between the first linear driving shaft and the second linear driving shaft is performed every time the sample is replaced by the positional deviation correction means. The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus characterized in that the movable range of the movable body is limited by a mechanical restraining means and is narrower than the movable range of the stage. The charged particle beam apparatus according to claim 1,
The stage includes a base, an X guide arranged linearly in one direction above the base, an X table movable in the X direction by the X guide, and orthogonal to the X direction arranged on the table. And a Y table movable in the Y direction by the Y guide, and the movable body is disposed in a space between the base and the X table, A charged particle beam device characterized by being movable to The charged particle beam device according to claim 8.
A charged particle beam apparatus comprising a temperature control unit capable of flowing a temperature control medium through the base. The charged particle beam apparatus according to claim 1,
The rotary drive shaft has portions having different diameters, the first linear drive shaft is in contact with the rotary drive shaft, and the second linear drive shaft is in contact with the rotary drive shaft. Are portions having different diameters, and the amount of movement per rotation of the rotary drive shaft differs between the first linear drive shaft and the second linear drive shaft. The charged particle beam apparatus according to claim 1,
A charged particle beam apparatus characterized in that a mass of the movable body is larger than a mass of the stage. The charged particle beam apparatus according to claim 1,
A charged particle beam apparatus comprising an actuator that suppresses the rotation of the stage about the moving direction of the stage. The charged particle beam device according to claim 12,
The charged particle beam device according to claim 1, wherein the actuator is driven in accordance with the movement prediction of the stage.

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