JP2009031212A - 表面検査装置および表面検査方法 - Google Patents

表面検査装置および表面検査方法 Download PDF

Info

Publication number
JP2009031212A
JP2009031212A JP2007197731A JP2007197731A JP2009031212A JP 2009031212 A JP2009031212 A JP 2009031212A JP 2007197731 A JP2007197731 A JP 2007197731A JP 2007197731 A JP2007197731 A JP 2007197731A JP 2009031212 A JP2009031212 A JP 2009031212A
Authority
JP
Japan
Prior art keywords
analyzer
substrate
phaser
image
polarized light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007197731A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009031212A5 (enExample
Inventor
Kazumasa Endo
一正 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2007197731A priority Critical patent/JP2009031212A/ja
Publication of JP2009031212A publication Critical patent/JP2009031212A/ja
Publication of JP2009031212A5 publication Critical patent/JP2009031212A5/ja
Pending legal-status Critical Current

Links

Images

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2007197731A 2007-07-30 2007-07-30 表面検査装置および表面検査方法 Pending JP2009031212A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007197731A JP2009031212A (ja) 2007-07-30 2007-07-30 表面検査装置および表面検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007197731A JP2009031212A (ja) 2007-07-30 2007-07-30 表面検査装置および表面検査方法

Publications (2)

Publication Number Publication Date
JP2009031212A true JP2009031212A (ja) 2009-02-12
JP2009031212A5 JP2009031212A5 (enExample) 2011-06-16

Family

ID=40401860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007197731A Pending JP2009031212A (ja) 2007-07-30 2007-07-30 表面検査装置および表面検査方法

Country Status (1)

Country Link
JP (1) JP2009031212A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012173409A (ja) * 2011-02-18 2012-09-10 Ricoh Co Ltd 光学特性評価方法及び光学素子の検査方法
JP2016186642A (ja) * 2012-01-12 2016-10-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 特にマイクロリソグラフィ投影露光装置における偏光影響光学配置
US9970885B2 (en) 2013-11-26 2018-05-15 Lasertec Corporation Inspection apparatus and inspection method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09237812A (ja) * 1995-12-28 1997-09-09 Fujitsu Ltd 加工寸法測定方法、半導体装置の製造方法および品質管理方法
JPH11281585A (ja) * 1998-03-26 1999-10-15 Nikon Corp 検査方法及び装置
JP2004294194A (ja) * 2003-03-26 2004-10-21 Nikon Corp 欠陥検査装置、欠陥検査方法及びホールパターンの検査方法
JP2004294358A (ja) * 2003-03-28 2004-10-21 Hitachi High-Technologies Corp 欠陥検査方法および装置
JP2006135211A (ja) * 2004-11-09 2006-05-25 Nikon Corp 表面検査装置および表面検査方法および露光システム
JP2007071728A (ja) * 2005-09-07 2007-03-22 Hitachi High-Technologies Corp 観察／検査作業支援システム及び観察／検査条件設定方法
JP2007086720A (ja) * 2005-08-23 2007-04-05 Photonic Lattice Inc 偏光イメージング装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09237812A (ja) * 1995-12-28 1997-09-09 Fujitsu Ltd 加工寸法測定方法、半導体装置の製造方法および品質管理方法
JPH11281585A (ja) * 1998-03-26 1999-10-15 Nikon Corp 検査方法及び装置
JP2004294194A (ja) * 2003-03-26 2004-10-21 Nikon Corp 欠陥検査装置、欠陥検査方法及びホールパターンの検査方法
JP2004294358A (ja) * 2003-03-28 2004-10-21 Hitachi High-Technologies Corp 欠陥検査方法および装置
JP2006135211A (ja) * 2004-11-09 2006-05-25 Nikon Corp 表面検査装置および表面検査方法および露光システム
JP2007086720A (ja) * 2005-08-23 2007-04-05 Photonic Lattice Inc 偏光イメージング装置
JP2007071728A (ja) * 2005-09-07 2007-03-22 Hitachi High-Technologies Corp 観察／検査作業支援システム及び観察／検査条件設定方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012173409A (ja) * 2011-02-18 2012-09-10 Ricoh Co Ltd 光学特性評価方法及び光学素子の検査方法
JP2016186642A (ja) * 2012-01-12 2016-10-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 特にマイクロリソグラフィ投影露光装置における偏光影響光学配置
US9970885B2 (en) 2013-11-26 2018-05-15 Lasertec Corporation Inspection apparatus and inspection method

Similar Documents

Publication Publication Date Title
US7834993B2 (en) Surface inspection apparatus and surface inspection method
JP4529366B2 (ja) 欠陥検査装置、欠陥検査方法及びホールパターンの検査方法
US7692780B2 (en) Surface inspecting apparatus
TWI443327B (zh) Defect detection device and defect detection method
JP3610837B2 (ja) 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
US7643137B2 (en) Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
US7072040B2 (en) Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus
US20080246966A1 (en) Surface-Inspecting Apparatus and Surface-Inspecting Method
JP6036680B2 (ja) 検査装置および半導体装置の製造方法
JP5434353B2 (ja) 表面検査装置および表面検査方法
KR101527619B1 (ko) 표면 검사 방법 및 표면 검사 장치
JP4548385B2 (ja) 表面検査装置
JP3956942B2 (ja) 欠陥検査方法及びその装置
JP5434352B2 (ja) 表面検査装置および表面検査方法
JP2009031212A (ja) 表面検査装置および表面検査方法
JP3918840B2 (ja) 欠陥検査方法及びその装置
JP4853758B2 (ja) 表面検査装置および表面検査方法
JP4605089B2 (ja) 表面検査装置
JP5257759B2 (ja) 検査装置および検査方法
JP4696607B2 (ja) 表面検査装置
JP2006258472A (ja) 欠陥検査装置
JP4462222B2 (ja) 表面検査装置
JP5201443B2 (ja) 表面検査装置および表面検査方法
JP2011149951A (ja) 表面検査装置および表面検査方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100409

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100608

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110518

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120203

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120214

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120710