JP2009016545A - Electromagnetic wave shielding material, its manufacturing method, filter for display device, and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electromagnetic wave shielding material manufacturable by a simple manufacturing process; its manufacturing method capable of inexpensively manufacturing the electromagnetic wave shielding material; a filter for a display device; and its manufacturing method. <P>SOLUTION: This electromagnetic wave shielding material 20 is provided with a transparent base material 21, mesh-like metal layers 22, and metal plated layers 23. When the electromagnetic wave shielding material 20 is manufactured, first the transparent base material 21 is prepared, and soluble resin layers 26 having a desired patten are formed by printing by leaving exposure parts 21a of the transparent base material 21 formed in gaps thereof. Next the metal layers 22 are vapor deposited and formed on the soluble resin layers 26 and the exposure parts 21a between the soluble resin layers 26. Thereafter the soluble resin 26 is solved by water or a solvent to remove the soluble resin layers 26 and the metal layer 22 on the soluble resin layers 26 by leaving only the metal layers 22 on the exposure parts 21a of the transparent base material 21. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method of manufacturing an electromagnetic wave shielding material that is disposed on the front surface of a display device such as a plasma display panel (PDP) and has a function of shielding electromagnetic waves generated from the display device (electromagnetic wave shielding function), and such The present invention relates to an electromagnetic shielding material produced by a method for producing an electromagnetic shielding material. The present invention also relates to a filter for a display device having such an electromagnetic wave shielding material and a method for manufacturing the same.

In recent years, electromagnetic noise (Electro Magnetic Interference; EMI) to electronic devices and bodies due to electromagnetic waves generated from various video display devices has become a problem. For example, a plasma display panel (PDP) is a combination of a data electrode, a glass plate having a fluorescent layer, and a glass plate having a transparent electrode, and generates a large amount of electromagnetic waves when activated. For this reason, an electromagnetic wave shielding material including a conductor formed in a mesh shape (lattice shape) is disposed on the front surface of the plasma display panel. The electromagnetic wave generated from the video display device is shielded by the electromagnetic wave shielding material.
JP 2003-258485 A JP 2003-258486 A

  A conventional method for manufacturing an electromagnetic shielding material will be described with reference to FIGS. First, as shown in FIG. 6A, by laminating a copper foil on a transparent base 31 made of polyethylene terephthalate (PET), a copper foil laminate base 30 having a transparent base 31 and a copper layer 32 is obtained. create.

  Next, a resist resin is applied on the copper layer 32 of the copper foil laminate substrate 30 and dried to form a resist layer 33 (FIG. 6B). Next, the resist layer 33 is exposed to ultraviolet rays through a photomask for exposure (FIG. 6C), thereby forming a resist layer 33A having a desired pattern on the copper layer 32 (FIG. 6D). ).

  Next, the copper layer 32 is removed by etching using the patterned resist layer 33A as a mask (FIG. 6E). Thereafter, by removing the resist layer 33A, an electromagnetic wave shielding material 34 composed of the transparent base material 31 and the patterned copper layer 32A is created (FIG. 6F).

  However, when the electromagnetic shielding material 34 is manufactured by such a method, a step of mask exposure of the resist layer 33 (FIG. 6C) and a step of etching away the copper layer 32 (FIG. 6D) are required. Therefore, the process is complicated and the manufacturing cost is high. Moreover, since a high manufacturing cost is also required for the step of creating the copper foil laminate base material 30 (FIG. 6A), the price of the copper foil laminate base material 30 itself is also expensive. For this reason, it is desired to reduce the manufacturing cost of the electromagnetic wave shielding material 34.

  The present invention has been made in consideration of the above points, and has a simple manufacturing process, an electromagnetic shielding material manufacturing method capable of manufacturing an electromagnetic shielding material at low cost, and a manufacturing method using such a manufacturing method. An object of the present invention is to provide an electromagnetic wave shielding material, a filter for a display device having such an electromagnetic wave shielding material, and a method for manufacturing the same.

  The present invention provides a transparent base material in a method for producing an electromagnetic wave shielding material for producing an electromagnetic wave shielding material for a display device filter having a transparent base material and a mesh-like metal layer provided on the transparent base material. A step of forming a soluble resin layer having a desired pattern on the transparent substrate by printing, leaving an exposed portion of the transparent substrate formed in the gap, and the transparent on the soluble resin layer and between the soluble resin layers A process of depositing a metal layer on the exposed portion of the base material, and melting the soluble resin with water or a solvent, leaving only the metal layer on the exposed portion of the transparent base material, and the metal on the soluble resin layer and the soluble resin layer And a step of removing the layer. An electromagnetic wave shielding material manufacturing method comprising:

  The present invention is characterized by further comprising a step of forming a metal plating layer by plating on the metal layer on the exposed portion of the transparent substrate after removing the soluble resin layer and the metal layer on the soluble resin layer. It is the manufacturing method of the electromagnetic wave shielding material to do.

  The present invention is the method for producing an electromagnetic wave shielding material, wherein the soluble resin layer having a desired pattern is formed by gravure printing.

  The present invention is the method for producing an electromagnetic wave shielding material, wherein the soluble resin is made of polyvinyl alcohol or polyvinyl butyral.

  The present invention is a method for manufacturing an electromagnetic wave shielding material, wherein the thickness of the metal layer deposited on the exposed portion of the transparent substrate is thinner than the thickness of the soluble resin layer formed on the transparent substrate. .

  The present invention comprises a step of obtaining an electromagnetic shielding material by a method for producing an electromagnetic shielding material, a step of providing a near infrared cut layer on the electromagnetic shielding material, and a step of providing an antireflection film on the near infrared cut layer. This is a method for manufacturing a filter for a display device.

  The present invention is an electromagnetic shielding material produced by a method for producing an electromagnetic shielding material.

  The present invention is a display device filter manufactured by a display device filter manufacturing method.

  As described above, according to the present invention, when manufacturing an electromagnetic wave shielding material, there is no need for a mask exposure process or a copper layer etching process. Moreover, it is not necessary to prepare a copper foil laminate base material in advance. For this reason, the process which manufactures an electromagnetic wave shielding material can be simplified, and the manufacturing cost of the filter for display apparatuses which has an electromagnetic wave shielding material and such an electromagnetic wave shielding material can be reduced.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a configuration diagram illustrating an electromagnetic wave shielding material according to an embodiment of the present invention, and FIG. 2 is a configuration diagram illustrating a filter for a display device according to an embodiment of the present invention. FIG. 3 is a configuration diagram illustrating a method of manufacturing an electromagnetic shielding material according to an embodiment of the present invention, and FIG. 4 is a plan view illustrating a soluble resin layer printed on a transparent substrate in the manufacturing process of the electromagnetic shielding material. FIG. FIG. 5 is a configuration diagram showing a method for manufacturing a filter for a display device according to an embodiment of the present invention.

Configuration of Electromagnetic Shielding Material First, the electromagnetic shielding material according to the present embodiment will be described with reference to FIG.

  As shown in FIG. 1, the electromagnetic shielding material 20 effectively shields electromagnetic waves that are emitted from a display device such as a plasma display panel (PDP) and are harmful to the human body. The electromagnetic wave shielding material 20 includes a transparent base material 21, a mesh-like metal layer 22 provided on the transparent base material 21, and a metal plating layer 23 provided on the metal layer 22.

  Among these, as the transparent substrate 21, in addition to a PET film, a plastic film such as an acrylic film, a glass plate, or the like can be used. The plastic film constituting the transparent substrate 21 desirably has high transparency and heat resistance, and a polymer molded product and a laminate of the polymer molded product can be used. In terms of transparency, it is advantageous that the visible light transmittance is 80% or more, and in terms of heat resistance, the glass transition temperature is preferably 50 ° C. or more. Among them, polyethylene terephthalate (PET), polysulfone (PS), polyethersulfone (PES), polystyrene, polyethylene naphthalate, polyallylate, polyetheretherketone (PEEK), polycarbonate (PC), polypropylene (PP), polyimide, Examples thereof include triacetyl cellulose (TAC) and polymethyl methacrylate (PMMA). Among these, it is desirable to use a film made of polyethylene terephthalate (PET).

  On the other hand, the metal material constituting the mesh-like metal layer 22 may be any metal that has excellent electrical conductivity and high workability, such as copper, aluminum, tin, nickel, chromium, silver, molybdenum, and tungsten. Can also be used.

  The metal layer 22 has a thickness of 0.5 μm to 2 μm. If the thickness of the metal layer 22 is too thin, the conductivity of the metal layer 22 is insufficient, and the electromagnetic wave shielding effect of the electromagnetic wave shielding material 20 is lowered, which is not preferable. On the other hand, since the metal layer 22 is formed by vapor deposition, it is difficult to make the thickness approximately 2 μm or more. The shape of the metal layer 22 may be a stripe shape or other geometric pattern shape in addition to the mesh shape (lattice shape).

  Examples of the metal material composing the metal plating layer 23 include copper, aluminum, nickel, tin, chromium, silver, molybdenum, tungsten, and the like, and a metal that can be formed on the metal layer 22 by electrolytic plating. I just need it.

  The metal plating layer 23 has a thickness of 1 μm to 100 μm. The metal plating layer 23 is provided when the conductivity of the metal layer 22 is insufficient because the metal layer 22 is thin. Therefore, what is necessary is just to set the thickness according to the electromagnetic wave shielding effect of the electromagnetic wave shielding material 20 required. When the electromagnetic wave shielding effect of the electromagnetic wave shielding material 20 can be sufficiently obtained with only the metal layer 22, the metal plating layer 23 may not be provided.

Configuration of Display Device Filter Next, the display device filter according to the present embodiment will be described with reference to FIG.

  As shown in FIG. 2, the display device filter 10 according to the present embodiment is installed in front of a video display device such as a plasma display panel (PDP) 25.

  Such a display device filter 10 includes an electromagnetic wave shielding material 20, an adhesive material layer 13 provided on the electromagnetic wave shielding material 20, a near-infrared cut layer 15 provided on the adhesive material layer 13, and a near-infrared cut. And an antireflection film 17 provided on the layer 15.

  Among these, the adhesive layer 13 has a function of cutting neon light emitted from the PDP 25 (neon cut function). This adhesive material layer 13 has an acrylic resin having adhesiveness and a neon absorbing dye contained in the acrylic resin. Of these, the neon absorbing dye cuts light having a wavelength of 570 to 600 nm. Examples of such neon absorbing dyes include cyanine dyes, subphthalocyanine dyes, porphyrins, tetraazaporphyrin dyes, and the like.

  In addition to the acrylic resin, the resin constituting the adhesive layer 13 is an acrylic, ester, urethane, fluorine, polyimide, epoxy, or polyurethane ester adhesive, or methyl as a main component. Examples thereof include a resin formed by an acrylic pressure-sensitive adhesive containing (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, or the like. “(Meth) acrylate” means both acrylate and methacrylate. In forming the bonding agent layer, an isocyanate-based, polythiol-based, or imide-based curing agent can be included in the raw material as necessary.

  Further, a color tone correction dye or a color tone correction pigment may be further added to the adhesive layer 13. Thereby, the color reproduction range of image light from the PDP 25 can be increased, and the sharpness of the screen can be improved. In addition, as such a color tone correction pigment | dye or a color tone correction pigment, what contains organic pigment | dyes, such as an anthraquinone type | system | group, a cyanine type | system | group, an azo type | system | group, a stryl type | system | group, a phthalocyanine type | system | group, can be used, for example.

  The near-infrared cut layer 15 has a function of cutting near infrared (NIR) emitted from the PDP 25 (near infrared cut function). This near-infrared cut layer 15 has an acrylic resin and a near-infrared absorbing dye contained in the acrylic resin. Among these, the near-infrared absorbing dye cuts light having a wavelength of 800 to 1100 nm. Examples of such near infrared absorbing dyes include imonium compounds, diimmonium compounds, phthalocyanine compounds, aluminum salt compounds, and metal complex compounds.

  In addition to acrylic resin, the resin constituting the near infrared cut layer 15 is polymethyl methacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinyl pyrrolidone, hydroxyethyl cellulose, carboxymethyl cellulose, polyvinyl chloride resin, melamine resin, phenol resin, Transparent (visible light transmittance of 50% or more) resin such as alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, and polyamide resin can be used.

  On the other hand, the antireflection film 17 has an ultraviolet cut base material 16 that absorbs ultraviolet rays from the outside to protect the near infrared cut layer 15, and an antireflection layer 14 provided on the ultraviolet cut base material 16. Yes.

  Among these, as the ultraviolet cut substrate 16, a transparent substrate containing an ultraviolet absorber is used. As a transparent base material, the thing similar to what was enumerated as a material of the transparent base material 21 mentioned above can be used. Examples of UV absorbers include organic UV absorbers such as benzotriazole, benzophenone, salicylate, and benzoate, and inorganic UV absorbers such as titanium oxide, zinc oxide, cerium oxide, iron oxide, and barium sulfate. Agents. Or the ultraviolet cut base material 16 contains the ultraviolet absorber mentioned above in binder resins, such as acrylic resin, polycarbonate-type resin, ethylene-vinyl alcohol-type copolymer resin, ethylene-vinyl acetate type copolymer resin, for example. May be formed by coating on a transparent substrate.

  The antireflection layer 14 prevents reflection due to a difference in refractive index between the air and the display device filter 10 and also prevents reflection on the surface of the PDP 25. This antireflection layer 14 is formed by laminating optical thin films. Instead of the antireflection layer 14, an antiglare layer that scatters external light by providing irregularities on the surface may be provided.

  The display device filter 10 may optionally include an optical function layer (CRF layer) that effectively absorbs external light and increases the contrast of the image from the PDP 25.

  In FIG. 1, an adhesive layer 24 made of an acrylic resin having adhesiveness is provided on the electromagnetic shielding material 20. The pressure-sensitive adhesive layer 24 adheres the display device filter 10 to the front surface of the PDP 25. Then, by attaching the display device filter 10 to the front surface of the PDP 25, a PDP with a filter (display device with a filter) composed of the display device filter 10 and the PDP 25 is obtained.

  In addition, as a method of attaching the display device filter 10 to the front surface of the PDP 25, the display device filter 10 is made of glass, film, or the like in addition to the method of adhering the display device filter 10 to the front surface of the PDP 25 through the adhesive layer 24 as described above. The display device filter 10 having a support base material may be prepared, and the support base material and the PDP 25 may be bonded to each other. Further, the display device filter 10 having the support base material is disposed so that the support base material faces the PDP 25 side, and a space is provided between the display device filter 10 and the PDP 25. The periphery may be fixed to the PDP 25. Furthermore, a display device filter 10 having no supporting base material may be prepared, and the periphery of the display device filter 10 may be fixed to the PDP 25 so as to leave a space between the display device filter 10 and the PDP 25. .

Manufacturing Method of Electromagnetic Shielding Material Next, a manufacturing method of the electromagnetic shielding material 20 shown in FIG. 1 will be described with reference to FIGS. 3 (a) to 3 (e) and FIG.

  First, as shown to Fig.3 (a), the transparent base material 21 is prepared. Next, a soluble resin layer 26 having a desired pattern is formed on the transparent substrate 21 by printing, leaving the exposed portion 21a of the transparent substrate 21 formed in the gap (FIG. 3B).

  At this time, the pattern of the soluble resin layer 26 formed by printing becomes a shape opposite to the shape of the metal layer 22 provided on the transparent substrate 21. For example, when the metal layer 22 is formed in an oblique mesh shape, the pattern of the soluble resin layer 26 printed on the transparent substrate 21 has a shape in which a large number of rhombuses are arranged at equal intervals (see FIG. 4).

  The soluble resin layer 26 is preferably formed on the transparent substrate 21 by gravure printing (intaglio printing). By using gravure printing, the soluble resin layer 26 spreads and the exposed portion 21a having a narrow width is crushed. As a result, the formed metal layer 22 is less likely to be disconnected. In addition to gravure printing, flexographic printing, silk screen printing, offset printing, and the like can also be used.

  In addition, the soluble resin (lift-off material) which comprises the soluble resin layer 26 is selected from the material which melt | dissolves in the liquid (water or organic solvent) used by the melting process (FIG.3 (d)) mentioned later. For example, when water is used in the melting process, the soluble resin is water soluble. Examples of such a soluble resin include polyvinyl alcohol (PVA), polyvinyl butyral (PVB), polyethylene oxide (PEO), water-soluble polymers such as sodium polyacrylate, other polyallylamine, polyacrylamide, methylcellulose, sodium caseinate, and the like. Water-soluble resins in general can be mentioned. On the other hand, when an organic solvent is used in the melting step, the soluble resin is soluble in an organic solvent. Examples of such soluble resins include acrylic, polyester, urethane, epoxy, melamine, isocyanate, and solvent soluble types. A fluororesin or the like can be used.

Next, a metal layer 22 made of, for example, copper, aluminum, tin, nickel, or the like is formed by vapor deposition on the soluble resin layer 26 and on the exposed portion 21a of the transparent substrate 21 between the soluble resin layers 26 (FIG. 3C). ). In addition, in order to be able to melt | dissolve the soluble resin layer 26 and the metal layer 22 on the soluble resin layer 26 in the melting | dissolving process (FIG.3 (d)) mentioned later, the metal vapor-deposited on the exposed part 21a of the transparent base material 21. The thickness t ₁ of the layer 22 is preferably made thinner than the thickness t ₂ of the soluble resin layer 26 formed on the transparent substrate 21 so that the soluble resin layer 26 is exposed in the lateral direction.

  Next, the soluble resin layer 26 is melted with water or an organic solvent, and the soluble resin layer 26 and the metal layer 22 on the soluble resin layer 26 are removed leaving only the metal layer 22 on the exposed portion 21 a of the transparent substrate 21. (FIG. 3 (d)). That is, water or an organic solvent is supplied from above the metal layer 22 on the exposed portion 21a, and the soluble resin layer 26 exposed in the lateral direction on the exposed portion 21a is melted. As the soluble resin layer 26 is melted in this manner, the metal layer 22 on the soluble resin layer 26 is also removed. On the other hand, the metal layer 22 on the exposed portion 21a remains. As such an organic solvent, for example, toluene, MEK (methyl ethyl ketone), acetone, IPA (isopropyl alcohol), MIBK (methyl isobutyl ketone) and the like can be used.

  Thereafter, a metal plating layer 23 made of, for example, copper, aluminum, tin, nickel, or the like is formed on the metal layer 22 on the exposed portion 21a of the transparent base material 21 by electrolytic plating (FIG. 3E). Note that the step of forming the metal plating layer 23 in this way may be performed when the conductivity of the metal layer 22 becomes insufficient because the thickness of the metal layer 22 is thin as described above.

Method for Manufacturing Display Device Filter Next, a method for manufacturing a display device filter will be described with reference to FIGS. 3 (a) to 3 (e) and FIGS. 5 (a) to 5 (c).

  First, according to the steps shown in FIGS. 3A to 3E, the transparent base material 21, the mesh-like metal layer 22 provided on the transparent base material 21, and the metal plating layer 23 provided on the metal layer 22. An electromagnetic shielding material 20 having the following is created (FIG. 5A).

  Next, the near-infrared cut layer 15 is provided on the electromagnetic wave shielding material 20 via the adhesive material layer 13 (FIG. 5B). In this case, the near-infrared cut layer 15 is provided by a wet method such as spin coating, dip coating, or die coating, or a dry method such as vapor deposition.

  Next, an antireflection film 17 having an ultraviolet cut base material 16 and an antireflection layer 14 is provided on the near infrared cut layer 15, and an adhesive material layer 24 is provided on the electromagnetic wave shielding material 20, as shown in FIG. A filter 10 for a display device can be obtained (FIG. 5C).

  Thereafter, the display device filter 10 is bonded to the front surface of the PDP 25 via the adhesive layer 24.

  An optical functional layer that increases the contrast of the image from the PDP 25 may be further provided between any of the layers.

  Thus, according to this Embodiment, when manufacturing the electromagnetic wave shielding material 20, the process of mask exposure and the process of etching away a copper layer are unnecessary. Moreover, it is not necessary to prepare a copper foil laminate base material in advance. For this reason, the process which manufactures the electromagnetic wave shielding material 20 can be simplified, and the manufacturing cost of the filter 10 for display apparatuses which has the electromagnetic wave shielding material 20 and such an electromagnetic wave shielding material 20 can be reduced.

(Example)
Next, specific examples of the present invention will be described with reference to FIGS.

  First, a water-soluble primer layer (soluble resin layer 26) was applied by gravure printing to a 100 μm-thick PET film (transparent substrate 21) that had been subjected to easy adhesion treatment in advance (FIG. 3A). To (b)).

  At this time, as a gravure plate, the line of the copper layer (metal layer 22) of EMI (electromagnetic wave shielding material 20) formed is inclined 45 degrees, and the line interval of the copper layer (metal layer 22) is 300 μm pitch, In addition, the one having a line width of 20 μm was used. This dimension is the pattern of the copper layer (metal layer 22) of EMI (electromagnetic wave shielding material 20), and the primer layer (soluble resin layer 26) is negative-positive inversion with the pattern of the copper layer (metal layer 22) to be formed. Relationship. The primer coating thickness was 2 μm.

  Next, copper was vapor-deposited on the exposed part 21a of the PET film (transparent substrate 21) between the primer layer (soluble resin layer 26) and the primer layer (soluble resin layer 26) using a winding vapor deposition apparatus. (FIG. 3C). Thereafter, film formation was further performed until the copper layer (metal layer 22) had a thickness of 1 μm.

  Next, the primer layer (soluble resin layer 26) was melted with water, and the copper layer (metal layer 22) on the primer layer (soluble resin layer 26) was peeled off. Thereby, as described above, a copper layer (metal layer 22) having a line spacing of 300 μm and a line width of 20 μm was formed (FIG. 3D).

  Thereafter, a copper layer (metal plating layer 23) was further formed on the copper layer (metal layer 22) by electrolytic plating, and the final film thickness (total thickness of the metal layer 22 and the metal plating layer 23) was 10 μm. In this way, EMI (electromagnetic wave shielding material 20) capable of obtaining a sufficient electromagnetic shielding effect was completed (FIG. 3 (e)).

The block diagram which shows the electromagnetic wave shielding material by one embodiment of this invention. The block diagram which shows the filter for display apparatuses by one embodiment of this invention. The block diagram which shows the manufacturing method of the electromagnetic wave shielding material by one embodiment of this invention. The top view which shows the soluble resin layer printed on the transparent base material in the manufacturing process of an electromagnetic wave shielding material. The block diagram which shows the manufacturing method of the filter for display apparatuses by one embodiment of this invention. The block diagram which shows the manufacturing method of the conventional electromagnetic wave shielding material.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Display apparatus filter 13 Adhesive material layer 14 Antireflection layer 15 Near-infrared cut layer 16 Ultraviolet cut base material 17 Antireflection film 20 Electromagnetic wave shielding material 21 Transparent base material 21a Exposed part 22 Metal layer 23 Metal plating layer 24 Adhesive material layer 25 PDP
26 Soluble resin layer

Claims (8)

In the method for producing an electromagnetic shielding material for producing an electromagnetic shielding material for a filter for a display device having a transparent substrate and a mesh-like metal layer provided on the transparent substrate,
Preparing a transparent substrate;
Forming a soluble resin layer having a desired pattern on the transparent substrate by printing leaving an exposed portion of the transparent substrate formed in the gap; and
Depositing a metal layer on the soluble resin layer and on the exposed portion of the transparent substrate between the soluble resin layers;
Melting the soluble resin with water or a solvent, and removing the soluble resin layer and the metal layer on the soluble resin layer leaving only the metal layer on the exposed portion of the transparent substrate. A method for manufacturing a shield material.   2. The method according to claim 1, further comprising the step of forming a metal plating layer by plating on the metal layer on the exposed portion of the transparent substrate after removing the soluble resin layer and the metal layer on the soluble resin layer. The manufacturing method of the electromagnetic wave shielding material of description.   The method for producing an electromagnetic wave shielding material according to claim 1, wherein the soluble resin layer having a desired pattern is formed by gravure printing.   The method for producing an electromagnetic wave shielding material according to any one of claims 1 to 3, wherein the soluble resin comprises polyvinyl alcohol or polyvinyl butyral.   The electromagnetic wave according to any one of claims 1 to 4, wherein the thickness of the metal layer deposited on the exposed portion of the transparent substrate is thinner than the thickness of the soluble resin layer formed on the transparent substrate. A method for manufacturing a shield material. A step of obtaining an electromagnetic wave shielding material by the method for producing an electromagnetic wave shielding material according to any one of claims 1 to 5,
Providing a near-infrared cut layer on the electromagnetic shielding material;
A process for providing an antireflection film on the near-infrared cut layer, and a method for producing a filter for a display device.   The electromagnetic wave shielding material manufactured by the manufacturing method of the electromagnetic wave shielding material in any one of Claims 1 thru | or 5.   A display device filter manufactured by the method for manufacturing a display device filter according to claim 6.

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