JP2009014421A - High humidification gas analysis method and high humidification gas analyzer - Google Patents

High humidification gas analysis method and high humidification gas analyzer Download PDF

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JP2009014421A
JP2009014421A JP2007174721A JP2007174721A JP2009014421A JP 2009014421 A JP2009014421 A JP 2009014421A JP 2007174721 A JP2007174721 A JP 2007174721A JP 2007174721 A JP2007174721 A JP 2007174721A JP 2009014421 A JP2009014421 A JP 2009014421A
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gas
partial pressure
flow rate
water vapor
analysis
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Atsushi Kimura
篤史 木村
Daisuke Yamazaki
大輔 山崎
Nobuhiro Tomosada
伸浩 友定
Yukihiro Shintani
幸弘 新谷
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Yokogawa Electric Corp
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Yokogawa Electric Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a high humidification gas analysis method and a high humidification gas analyzer capable of suppressing an influence on a product lifetime of an analysis means by high humidification gas, and analyzing even in the case of the analysis means incapable of analysis of the high humidification gas. <P>SOLUTION: In this high humidification gas analysis method, each mass flow rate of the high humidification gas and dry gas is adjusted respectively at each prescribed value and mixed together, and the dew point of mixed gas is measured, and a steam partial pressure is calculated based on a dew point measured value, and the mass flow rate of the dry gas is increased until the steam partial pressure becomes below the steam partial pressure maximum value set beforehand, and the mixed gas with the steam partial pressure becoming below the steam partial pressure maximum value is analyzed. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、燃料電池等に供給される高加湿ガスの分析方法及び分析装置に関し、特に高加湿ガスの分析手段の製品寿命への影響を抑制すると共に高加湿ガスの分析が不可能な分析手段であっても分析が可能な高加湿ガス分析方法及び高加湿ガス分析装置に関する。   The present invention relates to an analysis method and an analysis apparatus for a highly humidified gas supplied to a fuel cell or the like, and particularly an analysis means that suppresses the influence of the highly humidified gas analyzing means on the product life and cannot analyze the highly humidified gas. Even so, the present invention relates to a highly humidified gas analyzing method and a highly humidified gas analyzing apparatus capable of analyzing.

従来の高加湿ガス分析方法及び高加湿ガス分析装置に関連する先行技術文献としては次のようなものがある。   Prior art documents related to conventional highly humidified gas analysis methods and highly humidified gas analyzers include the following.

特開昭61−048761号公報JP-A-61-048761 特開平07−098273号公報JP 07-098273 A 特開平09−089765号公報JP 09-089765 A 特開2003−050203号公報JP 2003-050203 A 特開2005−172472号公報JP 2005-172472 A

図3は従来の高加湿ガス分析装置の一例を示す構成ブロック図である。図3において、1は分析対称ガスを供給するボンベ等の分析対象ガス供給手段、2は水を加熱して水蒸気を発生供給する水蒸気供給手段、3は校正対象ガスを供給するボンベ等の校正対象ガス供給手段、4は希釈ガスを供給するボンベ等の希釈ガス供給手段、5はガスの質量流量を調整する流量調整手段、6及び7はガス流路を切り替える切替バルブ、8はFT−IR(Fourier transform InfraRed spectrophotometer:フーリエ変換赤外分光光度計)等のガス分析手段である。   FIG. 3 is a configuration block diagram showing an example of a conventional highly humidified gas analyzer. In FIG. 3, 1 is an analysis target gas supply means such as a cylinder for supplying an analytically symmetric gas, 2 is a water vapor supply means for supplying water by generating water vapor by heating water, and 3 is a calibration target such as a cylinder for supplying calibration target gas. Gas supply means, 4 is a dilution gas supply means such as a cylinder for supplying dilution gas, 5 is a flow rate adjusting means for adjusting the mass flow rate of gas, 6 and 7 are switching valves for switching the gas flow path, and 8 is an FT-IR ( It is a gas analysis means such as Fourier transform InfraRed spectrophotometer.

分析対象ガス供給手段1から供給される分析対象ガスは、図3中”FL01”に示すように配管(図示せず。)を流れ、水蒸気供給手段2から供給される水蒸気は、図3中”FL02”に示すように配管(図示せず。)を流れて図3中”FL01”に示す分析対象ガスと混合されて図3中”FL03”に示すように配管(図示せず。)を流れる。   The analysis target gas supplied from the analysis target gas supply means 1 flows through a pipe (not shown) as shown by “FL01” in FIG. 3, and the water vapor supplied from the water vapor supply means 2 is “ As shown by FL02 ", it flows through a pipe (not shown) and is mixed with the gas to be analyzed shown by" FL01 "in FIG. 3, and flows through the pipe (not shown) as shown by" FL03 "in FIG. .

さらに、図3中”FL03”に示す混合ガス(高加湿ガス)は、図3中”FL04”に示す切替バルブ6の一方の流出口から流出されるガス(後述の質量流量調整済の校正対象ガス)と混合されて図3中”FL05”に示すように配管(図示せず。)を流れて切替バルブ7の一方の流入口に供給される。   Further, the mixed gas (highly humidified gas) indicated by “FL03” in FIG. 3 is a gas that flows out from one outlet of the switching valve 6 indicated by “FL04” in FIG. Gas) and flows through a pipe (not shown) as indicated by “FL05” in FIG. 3 and is supplied to one inlet of the switching valve 7.

一方、校正対象ガス供給手段3から供給される校正対象ガスは、図3中”FL06”に示すように配管(図示せず。)を流れて流量調整手段5の第1の流入口に供給され、希釈ガス供給手段4から供給される希釈ガスは、図3中”FL07”に示すように配管(図示せず。)を流れて流量調整手段5の第2の流入口に供給される。   On the other hand, the calibration target gas supplied from the calibration target gas supply means 3 flows through a pipe (not shown) as indicated by “FL06” in FIG. 3 and is supplied to the first inlet of the flow rate adjustment means 5. The dilution gas supplied from the dilution gas supply means 4 flows through a pipe (not shown) as indicated by “FL07” in FIG. 3 and is supplied to the second inlet of the flow rate adjustment means 5.

流量調整手段5の第1の流出口から流出される質量流量調整済の校正対象ガスは、図3中”FL08”に示すように配管(図示せず。)を流れて切替バルブ6の流入口に供給される。また、流量調整手段5の第2の流出口から流出される質量流量調整済の希釈ガスは、図3中”FL09”に示すように配管(図示せず。)を流れる。   The mass flow adjusted gas to be calibrated flowing out from the first outlet of the flow rate adjusting means 5 flows through a pipe (not shown) as indicated by “FL08” in FIG. To be supplied. Further, the diluted gas whose mass flow rate has been adjusted flowing out from the second outlet of the flow rate adjusting means 5 flows through a pipe (not shown) as indicated by “FL09” in FIG.

また、図3中”FL09”に示す質量流量調整済の希釈ガスは、図3中”FL10”に示す切替バルブ6の他方の流出口から流出される質量流量調整済の校正対象ガスと混合され、図3中”FL11”に示すように配管(図示せず。)を流れて切替バルブ7の他方の流入口に供給される。   In addition, the diluted gas whose mass flow rate has been adjusted indicated by “FL09” in FIG. 3 is mixed with the calibration target gas whose mass flow rate has been adjusted flowing out from the other outlet of the switching valve 6 indicated by “FL10” in FIG. 3 flows through a pipe (not shown) as indicated by “FL11” in FIG. 3 and is supplied to the other inlet of the switching valve 7.

最後に、切替バルブ7の流出口から流出される混合ガス(分析対象ガス、水蒸気及び校正対象ガスの混合ガス、或いは、校正対象ガスと希釈ガスの混合ガス)は、図3中”FL12”に示すように配管(図示せず。)を流れてガス分析手段8の流入口に供給される。   Finally, the mixed gas flowing out of the outlet of the switching valve 7 (analysis target gas, mixed gas of water vapor and calibration target gas, or mixed gas of calibration target gas and dilution gas) is indicated by “FL12” in FIG. As shown, it flows through a pipe (not shown) and is supplied to the inlet of the gas analyzing means 8.

ここで、図3に示す従来例の動作を説明する。先ず第1に、切替バルブ6で他方の流出口(図3中”FL08”に示す質量流量調整済の校正対象ガスを図3中”FL10”に示すように流すために)に切り替え、切替バルブ7で他方の流入口(図3中”FL11”に示す校正対象ガスと希釈ガスの混合ガスを図3中”FL12”に示すように流すために)に切り替える。   Here, the operation of the conventional example shown in FIG. 3 will be described. First, the switching valve 6 is switched to the other outlet (in order to flow the calibration target gas whose mass flow rate is adjusted as indicated by “FL08” in FIG. 3 as indicated by “FL10” in FIG. 3). 7 is switched to the other inlet (in order to flow the mixed gas of the gas to be calibrated and the dilution gas indicated by “FL11” in FIG. 3 as indicated by “FL12” in FIG. 3).

流量調整手段5は校正対象ガス供給手段3から供給される校正対象ガスと、希釈ガス供給手段4から供給される希釈ガスの流量をそれぞれ所定の値に調整し、これらのガスが混合(所定の比率で混合されて)されて図3中”FL11”及び図3中”FL12”に示すようにガス分析手段8に導入される。   The flow rate adjusting unit 5 adjusts the flow rates of the calibration target gas supplied from the calibration target gas supply unit 3 and the dilution gas supplied from the dilution gas supply unit 4 to predetermined values, and these gases are mixed (predetermined) 3) and mixed and introduced into the gas analyzing means 8 as indicated by "FL11" in FIG. 3 and "FL12" in FIG.

ガス分析手段8では、質量流量調整済の校正対象ガスと質量流量調整済の希釈ガスの混合ガスを分析することにより、校正対象ガス及び希釈ガスの校正を行なう。   The gas analyzing means 8 calibrates the calibration target gas and the dilution gas by analyzing the mixed gas of the calibration target gas whose mass flow rate has been adjusted and the dilution gas whose mass flow rate has been adjusted.

第2に、切替バルブ6で一方の流出口(図3中”FL08”に示す質量流量調整済の校正対象ガスを図3中”FL04”に示すように流すために)に切り替え、切替バルブ7で一方の流入口(図3中”FL05”に示す分析対象ガス、水蒸気及び質量流量調整済の校正対象ガスの混合ガスを図3中”FL12”に示すように流すために)に切り替える。   Second, the switching valve 6 switches to one outlet (in order to flow the calibration target gas whose mass flow rate is adjusted as indicated by “FL08” in FIG. 3 as indicated by “FL04” in FIG. 3). To switch to one inlet (in order to flow the mixed gas of the analysis target gas indicated by “FL05” in FIG. 3, the water vapor, and the calibration target gas whose mass flow rate has been adjusted as indicated by “FL12” in FIG. 3).

流量調整手段5は校正対象ガス供給手段3から供給される校正対象ガスの流量を所定の値に調整し、分析対象ガスと水蒸気との混合ガス(高加湿ガス)に更に混合させる。このような混合ガスが図3中”FL05”及び図3中”FL12”に示すようにガス分析手段8に導入される。   The flow rate adjusting unit 5 adjusts the flow rate of the calibration target gas supplied from the calibration target gas supply unit 3 to a predetermined value, and further mixes it with the mixed gas (highly humidified gas) of the analysis target gas and water vapor. Such a mixed gas is introduced into the gas analyzing means 8 as indicated by “FL05” in FIG. 3 and “FL12” in FIG.

そして、ガス分析手段8では、分析対象ガス、水蒸気及び質量流量調整済の校正対象ガスの混合ガスを分析することにより、得られた校正対象ガスの質量濃度から分析対象ガスの質量流量を算出し、算出された質量流量で分析結果を補正して分析対象ガスの構成成分の量を求める。   The gas analysis means 8 calculates the mass flow rate of the analysis target gas from the mass concentration of the calibration target gas obtained by analyzing the mixed gas of the analysis target gas, water vapor, and the calibration target gas whose mass flow rate has been adjusted. Then, the analysis result is corrected with the calculated mass flow rate to determine the amount of the constituent component of the analysis target gas.

この結果、分析対象ガスと水蒸気との混合ガス(高加湿ガス)に質量流量調整済の校正対象ガスを混合し、校正対象ガスの質量濃度から分析対象ガスの質量流量を算出し、算出された質量流量で分析結果を補正して分析対象ガスの構成成分の量を求めることにより、高加湿ガスの分析を行なうことが可能になる。   As a result, the calibration target gas whose mass flow rate was adjusted was mixed with the mixed gas (highly humidified gas) of the analysis target gas and water vapor, and the mass flow rate of the analysis target gas was calculated from the mass concentration of the calibration target gas. It is possible to analyze the highly humidified gas by correcting the analysis result with the mass flow rate to obtain the amount of the constituent component of the analysis target gas.

しかし、図3に示す従来例では、ガス分析手段8に導入されるガスの露点(或いは、湿度)を管理していないため、ガス分析手段の製品寿命が高加湿ガスの導入によって短くなってしまうと言った問題点があった。   However, in the conventional example shown in FIG. 3, since the dew point (or humidity) of the gas introduced into the gas analyzing means 8 is not managed, the product life of the gas analyzing means is shortened by the introduction of the highly humidified gas. There was a problem that said.

また、ガス分析手段8の種類によっては、高加湿ガスの分析誤差が大きくなるものや、もともと、高加湿ガスの分析が不可能なガス分析手段もあり、高加湿ガスの正確な分析が難しいと言った問題点があった。
従って本発明が解決しようとする課題は、高加湿ガスによる分析手段の製品寿命への影響を抑制すると共に高加湿ガスの分析が不可能な分析手段であっても分析が可能な高加湿ガス分析方法及び高加湿ガス分析装置を実現することにある。
In addition, depending on the type of the gas analysis means 8, there is a gas analysis means in which the analysis error of the highly humidified gas becomes large, or a gas analysis means that cannot originally analyze the highly humidified gas, and it is difficult to accurately analyze the highly humidified gas. There was a problem I said.
Therefore, the problem to be solved by the present invention is that a highly humidified gas analysis that can analyze even an analysis means that suppresses the influence of the highly humidified gas on the product life of the analyzing means and cannot analyze the highly humidified gas. The object is to realize a method and a highly humidified gas analyzer.

このような課題を達成するために、本発明のうち請求項1記載の発明は、
高加湿ガス分析方法であって、
高加湿ガス及びドライガスの質量流量をそれぞれ所定の値に調整して混合して当該混合ガスの露点を測定し、露点測定値に基づき水蒸気分圧を算出し、前記水蒸気分圧が予め設定された水蒸気分圧最大値以下になるまで前記ドライガスの質量流量を増加させ、前記水蒸気分圧が前記水蒸気分圧最大値以下になった前記混合ガスの分析を行うことにより、高加湿ガスによる分析手段の製品寿命への影響を抑制し、高加湿ガスの分析が不可能な分析手段であっても分析が可能になる。
In order to achieve such a problem, the invention according to claim 1 of the present invention is:
A highly humidified gas analysis method,
The mass flow rate of the highly humidified gas and the dry gas is adjusted to a predetermined value and mixed to measure the dew point of the mixed gas, the water vapor partial pressure is calculated based on the dew point measured value, and the water vapor partial pressure is preset. By increasing the mass flow rate of the dry gas until the water vapor partial pressure is below the maximum value, and analyzing the mixed gas in which the water vapor partial pressure is below the water vapor partial pressure maximum value, analysis with a highly humidified gas The influence of the means on the product life is suppressed, and even analysis means incapable of analyzing highly humidified gas becomes possible.

請求項2記載の発明は、
高加湿ガス分析装置において、
高加湿ガスを供給する分析対象ガス供給手段と、ドライガスを供給する希釈ガス供給手段と、前記高加湿ガス及び前記ドライガスの質量流量をそれぞれ調整する流量調整手段と、この流量調整手段からの質量流量調整済の前記高加湿ガス及び前記ドライガスの混合ガスの通過/遮断を行なう第1及び第2の電磁弁と、前記第1の電磁弁を通過する前記混合ガスの露点を測定する露点測定手段と、前記第2の電磁弁を通過する前記混合ガスの分析を行うガス分析手段と、装置全体を制御すると共に測定された前記混合ガスの露点に基づき算出された水蒸気分圧が予め設定された水蒸気分圧最大値以下になるように前記ドライガスの質量流量を調整した後にガス分析を行なわせる制御手段とを備えたことにより、高加湿ガスによる分析手段の製品寿命への影響を抑制し、高加湿ガスの分析が不可能な分析手段であっても分析が可能になる。
The invention according to claim 2
In the highly humidified gas analyzer,
Analytical gas supply means for supplying highly humidified gas, dilution gas supply means for supplying dry gas, flow rate adjusting means for adjusting mass flow rates of the highly humidified gas and the dry gas, and flow rate adjusting means The first and second solenoid valves for passing / blocking the mixed gas of the highly humidified gas and the dry gas adjusted for mass flow, and the dew point for measuring the dew point of the mixed gas passing through the first solenoid valve A measuring means, a gas analyzing means for analyzing the mixed gas passing through the second electromagnetic valve, and a water vapor partial pressure calculated based on the measured dew point of the mixed gas while controlling the entire apparatus are preset. And a control means for performing gas analysis after adjusting the mass flow rate of the dry gas so as to be equal to or lower than the maximum value of the water vapor partial pressure. The effect on the life suppressed, enabling even analysis of analytical means which can not be analyzed in the high humidity gas.

請求項3記載の発明は、
請求項2記載の発明である高加湿ガス分析装置において、
前記制御手段が、
前記流量調整手段を制御して前記高加湿ガス及び前記ドライガスの質量流量をそれぞれ所定の値に調整して混合した前記混合ガスを生成させ、前記第1及び第2の電磁弁を制御して前記混合ガスを前記露点測定手段に供給して前記混合ガスの露点が測定させ、露点測定値に基づき水蒸気分圧を算出し、前記流量調整手段を制御して前記水蒸気分圧が予め設定された水蒸気分圧最大値以下になるまで前記ドライガスの質量流量を増加させ、前記第1及び第2の電磁弁を制御して前記水蒸気分圧が前記水蒸気分圧最大値以下になった前記混合ガスを前記ガス分析手段に供給してガス分析を行わせることにより、高加湿ガスによる分析手段の製品寿命への影響を抑制し、高加湿ガスの分析が不可能な分析手段であっても分析が可能になる。
The invention described in claim 3
In the highly humidified gas analyzer which is the invention according to claim 2,
The control means is
Controlling the flow rate adjusting means to adjust the mass flow rates of the highly humidified gas and the dry gas to respective predetermined values to generate the mixed gas, and controlling the first and second electromagnetic valves; The mixed gas is supplied to the dew point measuring means, the dew point of the mixed gas is measured, the water vapor partial pressure is calculated based on the dew point measurement value, and the water vapor partial pressure is preset by controlling the flow rate adjusting means. The mixed gas in which the mass flow rate of the dry gas is increased until the water vapor partial pressure is less than the maximum value and the first and second solenoid valves are controlled so that the water vapor partial pressure is less than the water vapor partial pressure maximum value. Is supplied to the gas analyzing means to perform gas analysis, thereby suppressing the influence of the highly humidified gas on the product life of the analyzing means, and even if the analyzing means cannot analyze the highly humidified gas. It becomes possible.

請求項4記載の発明は、
請求項2記載の発明である高加湿ガス分析装置において、
前記混合ガスを直接排気する第3の電磁弁を備えたことにより、高加湿ガスによる分析手段の製品寿命への影響を抑制し、高加湿ガスの分析が不可能な分析手段であっても分析が可能になる。
The invention according to claim 4
In the highly humidified gas analyzer which is the invention according to claim 2,
By providing the third solenoid valve that directly exhausts the mixed gas, the influence of the highly humidified gas on the product life of the analyzing means is suppressed, and analysis is possible even if the highly humidified gas cannot be analyzed. Is possible.

請求項5記載の発明は、
請求項2乃至請求項4のいずれかに記載の発明である高加湿ガス分析装置において、
前記ガス分析手段が、
高加湿ガスの分析により製品寿命への影響が生じる分析手段であることにより、高加湿ガスによる分析手段の製品寿命への影響を抑制し、高加湿ガスの分析が不可能な分析手段であっても分析が可能になる。
The invention according to claim 5
In the highly humidified gas analyzer which is the invention according to any one of claims 2 to 4,
The gas analyzing means comprises:
The analysis means that the product life is affected by the analysis of the highly humidified gas, so that the influence of the highly humidified gas on the product life of the analysis means is suppressed and the analysis of the highly humidified gas is impossible. Can also be analyzed.

請求項6記載の発明は、
請求項2乃至請求項4のいずれかに記載の発明である高加湿ガス分析装置において、
前記ガス分析手段が、
高加湿ガスの分析が不可能な分析手段であることにより、高加湿ガスによる分析手段の製品寿命への影響を抑制し、高加湿ガスの分析が不可能な分析手段であっても分析が可能になる。
The invention described in claim 6
In the highly humidified gas analyzer which is the invention according to any one of claims 2 to 4,
The gas analyzing means comprises:
Because it is an analysis means that cannot analyze highly humidified gas, the influence of the highly humidified gas on the product life of the analyzed means is suppressed, and analysis is possible even if it is impossible to analyze highly humidified gas. become.

本発明によれば次のような効果がある。
請求項1,2,3,4,5及び請求項6の発明によれば、高加湿ガスとドライガスとを混合して混合ガスを生成すると共に生成された混合ガスの露点に基づき算出された水蒸気分圧が、予め設定された水蒸気分圧最大値以下になるようにドライガスの質量流量を調整した後にガス分析を行なうことにより、高加湿ガスによる分析手段の製品寿命への影響を抑制し、高加湿ガスの分析が不可能な分析手段であっても分析が可能になる。
The present invention has the following effects.
According to the first, second, third, fourth, and fifth aspects of the invention, the high humidified gas and the dry gas are mixed to generate a mixed gas, and calculated based on the dew point of the generated mixed gas. The gas analysis is performed after adjusting the mass flow rate of the dry gas so that the water vapor partial pressure is less than the preset water vapor partial pressure maximum value, thereby suppressing the influence of the highly humidified gas on the product life of the analysis means. Even analysis means incapable of analyzing highly humidified gas can be analyzed.

以下本発明を図面を用いて詳細に説明する。図1は本発明に係る高加湿ガス分析装置の一実施例を示す構成ブロック図である。   Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 is a block diagram showing the configuration of an embodiment of a highly humidified gas analyzer according to the present invention.

図1において、9は高加湿ガスである分析対象ガスを供給するボンベ等の分析対象ガス供給手段、10はドライガスである希釈ガスを供給するボンベ等の希釈ガス供給手段、11及び12はガスの質量流量を調整する流量調整手段、13,14及び15はON/OFF制御によりガスの通過/遮断を行なう電磁弁、16はガスの露点を測定する露点測定手段、17はFT−IR等のガス分析手段、18は高加湿ガス分析装置全体を制御する制御手段である。   In FIG. 1, 9 is an analysis target gas supply means such as a cylinder that supplies an analysis target gas that is a highly humidified gas, 10 is a dilution gas supply means such as a cylinder that supplies a dilution gas that is a dry gas, and 11 and 12 are gases. The flow rate adjusting means for adjusting the mass flow rate of the gas, 13, 14 and 15 are solenoid valves for passing / blocking the gas by ON / OFF control, 16 is the dew point measuring means for measuring the dew point of the gas, 17 is FT-IR, etc. The gas analysis means 18 is a control means for controlling the entire highly humidified gas analyzer.

分析対象ガス供給手段9から供給される高加湿ガスである分析対象ガス(以下、単に高加湿ガスと呼ぶ。)は、図1中”FL21”に示すように配管(図示せず。)を流れて流量調整手段11の流入口に供給される。   An analysis target gas (hereinafter simply referred to as a high humidification gas) that is a highly humidified gas supplied from the analysis target gas supply means 9 flows through a pipe (not shown) as indicated by “FL21” in FIG. To the inlet of the flow rate adjusting means 11.

同様に、希釈ガス供給手段10から供給されるドライガスである希釈ガス(以下、単にドライガスと呼ぶ。)は、図1中”FL22”に示すように配管(図示せず。)を流れて流量調整手段12の流入口に供給される。   Similarly, a dilution gas (hereinafter simply referred to as dry gas) supplied from the dilution gas supply means 10 flows through a pipe (not shown) as indicated by “FL22” in FIG. It is supplied to the inlet of the flow rate adjusting means 12.

流量調整手段11の流出口から流出される質量流量調整済の高加湿ガス及び流量調整手段12の流出口から流出される質量流量調整済のドライガスは、それぞれ図1中”FL23”及び”FL24”に示すように配管(図示せず。)を流れて互いに混合される。   The high humidified gas whose mass flow rate has been adjusted flowing out from the outlet of the flow rate adjusting means 11 and the dry gas whose mass flow rate has been adjusted flowing out from the outlet of the flow rate adjusting means 12 are “FL23” and “FL24” in FIG. As shown in the figure, they flow through piping (not shown) and are mixed with each other.

そして、質量流量調整済の高加湿ガスと質量流量調整済のドライガスとの混合ガスは、図1中”FL25”に示すように配管(図示せず。)を流れて電磁弁13,14及び15の流入口にそれぞれ供給される。   Then, the mixed gas of the highly humidified gas whose mass flow rate has been adjusted and the dry gas whose mass flow rate has been adjusted flows through a pipe (not shown) as indicated by “FL25” in FIG. Fifteen inlets are respectively supplied.

電磁弁13の流出口から流出される混合ガスは、図1中”FL26”に示すように配管(図示せず。)を流れて露点測定手段16の流入口に供給され、図1中”EX21”に示すように露点測定手段16の排気口から排気される。   The mixed gas flowing out from the outlet of the solenoid valve 13 flows through a pipe (not shown) as indicated by “FL26” in FIG. 1 and is supplied to the inlet of the dew point measuring means 16, and “EX21” in FIG. As shown in the figure, the air is exhausted from the exhaust port of the dew point measuring means 16.

また、電磁弁14の流出口から流出される混合ガスは、図1中”FL27”に示すように配管(図示せず。)を流れてガス分析手段17の流入口に供給され、図1中”EX22”に示すようにガス分析手段17の排気口から排気される。   Further, the mixed gas flowing out from the outlet of the solenoid valve 14 flows through a pipe (not shown) as shown by “FL27” in FIG. 1 and is supplied to the inlet of the gas analyzing means 17, and in FIG. As indicated by “EX22”, the gas is exhausted from the exhaust port of the gas analyzing means 17.

さらに、電磁弁15の流出口から流出される混合ガスは、図1中”EX23”に示すように直接排気される。   Further, the mixed gas flowing out from the outlet of the solenoid valve 15 is directly exhausted as indicated by “EX23” in FIG.

最後に、露点測定手段16の測定出力信号が制御手段18に印加されると共に各種制御信号が流量調整手段11及び12、電磁弁13,14及び15、並びに、ガス分析手段17の制御入力端子にそれぞれ接続される。   Finally, the measurement output signal of the dew point measuring means 16 is applied to the control means 18 and various control signals are supplied to the flow rate adjusting means 11 and 12, the solenoid valves 13, 14 and 15, and the control input terminal of the gas analyzing means 17. Each is connected.

ここで、図1に示す実施例の動作を図2を用いて説明する。図2は高加湿ガス分析装置全体を制御する制御手段18の動作を説明するフロー図である。   Here, the operation of the embodiment shown in FIG. 1 will be described with reference to FIG. FIG. 2 is a flowchart for explaining the operation of the control means 18 for controlling the entire highly humidified gas analyzer.

図2中”S001”において制御手段18は、流量調整手段11及び12を制御して高加湿ガス及びドライガスの質量流量をそれぞれ所定の値に調整して混合させることにより、混合ガスを生成させると共に、図2中”S002”において制御手段18は、電磁弁13,14及び15をそれぞれ制御する。   In “S001” in FIG. 2, the control means 18 controls the flow rate adjusting means 11 and 12 to adjust the mass flow rates of the highly humidified gas and the dry gas to respective predetermined values and mix them to generate a mixed gas. At the same time, in “S002” in FIG. 2, the control means 18 controls the solenoid valves 13, 14 and 15, respectively.

例えば、制御手段18は、電磁弁13,14及び15をそれぞれ制御して、電磁弁13を”ON”に制御し、電磁弁14及び15を”OFF”に制御する。   For example, the control means 18 controls the electromagnetic valves 13, 14 and 15, respectively, controls the electromagnetic valve 13 to “ON”, and controls the electromagnetic valves 14 and 15 to “OFF”.

このため、図2中”S001”のステップで生成された混合ガスは、電磁弁13を通過して、図1中”FL26”に示すように配管(図示せず。)を流れて露点測定手段16に供給され、露点測定手段16において当該混合ガスの露点が測定される。   Therefore, the mixed gas generated in the step “S001” in FIG. 2 passes through the solenoid valve 13 and flows through a pipe (not shown) as indicated by “FL26” in FIG. The dew point of the mixed gas is measured by the dew point measuring means 16.

図2中”S003”において制御手段18は、露点測定手段16から露点測定値”DP”を取得し、図2中”S004”において制御手段18は、当該露点測定値”DP”に基づき水蒸気分圧”PDP”を算出する。 In “S003” in FIG. 2, the control means 18 acquires the dew point measurement value “DP” from the dew point measurement means 16, and in “S004” in FIG. 2, the control means 18 determines the water vapor content based on the dew point measurement value “DP”. The pressure “P DP ” is calculated.

そして、図2中”S005”において制御手段18は、予め設定されている水蒸気分圧最大値”Pmax ”と、算出された水蒸気分圧”PDP”とを比較して、もし、水蒸気分圧”PDP”が水蒸気分圧最大値”Pmax ”よりも大きいと判断した場合には、図2中”S006”のステップに移行する。 Then, in “S005” in FIG. 2, the control means 18 compares the water vapor partial pressure maximum value “P max ” set in advance with the calculated water vapor partial pressure “P DP ”. When it is determined that the pressure “P DP ” is larger than the maximum water vapor partial pressure value “P max ”, the process proceeds to the step “S006” in FIG.

一方、もし、水蒸気分圧”PDP”が水蒸気分圧最大値”Pmax ”以下であると判断した場合には、図2中”S005”において制御手段18は、図2中”S008”のステップに移行する。 On the other hand, if it is determined that the water vapor partial pressure “P DP ” is less than or equal to the water vapor partial pressure maximum value “P max ”, the control means 18 in “S005” in FIG. Move to the step.

図2中”S006”において制御手段18は、流量調整手段12を制御してドライガスの質量流量を調整する。具体的には、制御手段18は、流量調整手段12を制御してドライガスの質量流量を増加させる。   In “S006” in FIG. 2, the control unit 18 controls the flow rate adjusting unit 12 to adjust the mass flow rate of the dry gas. Specifically, the control unit 18 controls the flow rate adjusting unit 12 to increase the mass flow rate of the dry gas.

そして、図2中”S007”において制御手段18は設定時間だけ待機した後、図2中”S003”のステップに戻り、露点測定手段16からドライガスの質量流量を増加させた後の露点測定値を再び取得する。   The control means 18 waits for the set time in “S007” in FIG. 2, then returns to the step of “S003” in FIG. 2, and the dew point measurement value after increasing the dry gas mass flow rate from the dew point measurement means 16. To get it again.

すなわち、制御手段18は、水蒸気分圧”PDP”が水蒸気分圧最大値”Pmax ”以下になるまで、流量調整手段12を制御してドライガスの質量流量を順次増加させ、露点測定値を再び取得する制御を繰り返すことになる。 That is, the control means 18 controls the flow rate adjusting means 12 to sequentially increase the mass flow rate of the dry gas until the water vapor partial pressure “P DP ” is equal to or lower than the water vapor partial pressure maximum value “P max ”, and the dew point measurement value is increased. Will repeat the control to acquire again.

一方、図2中”S008”において制御手段18は、電磁弁13,14及び15をそれぞれ制御する。   On the other hand, in “S008” in FIG. 2, the control means 18 controls the electromagnetic valves 13, 14, and 15, respectively.

例えば、制御手段18は、電磁弁13,14及び15をそれぞれ制御して、電磁弁14を”ON”に制御し、電磁弁13及び15を”OFF”に制御する。   For example, the control means 18 controls the electromagnetic valves 13, 14 and 15, respectively, controls the electromagnetic valve 14 to “ON”, and controls the electromagnetic valves 13 and 15 to “OFF”.

このため、図2中”S008”のステップで生成された混合ガス(或いは、ドライガスの質量流量を増加させた後の混合ガス)は、電磁弁14を通過して、図1中”FL27”に示すように配管(図示せず。)を流れてガス分析手段17に供給される。   For this reason, the mixed gas (or mixed gas after increasing the mass flow rate of the dry gas) generated in the step “S008” in FIG. 2 passes through the electromagnetic valve 14 and is “FL27” in FIG. As shown in FIG. 3, the gas flows through a pipe (not shown) and is supplied to the gas analyzing means 17.

図2中”S009”において制御手段18は、設定時間だけ待機し、図2中”S010”において制御手段18は、ガス分析手段17を制御して当該混合ガスの分析を行わせる。   In “S009” in FIG. 2, the control means 18 waits for a set time, and in “S010” in FIG. 2, the control means 18 controls the gas analysis means 17 to analyze the mixed gas.

この時、ガス分析手段17に供給される混合ガスの水蒸気分圧”PDP”は、予め設定された水蒸気分圧最大値”Pmax ”以下の値となるようにドライガスの質量流量が調整されているので、高加湿ガスによる分析手段の製品寿命への影響を抑制することが可能になる。 At this time, the mass flow rate of the dry gas is adjusted so that the water vapor partial pressure “P DP ” of the mixed gas supplied to the gas analyzing means 17 is equal to or less than a preset water vapor partial pressure “P max ”. Therefore, it is possible to suppress the influence of the analysis means on the product life due to the highly humidified gas.

この結果、高加湿ガスとドライガスとを混合して混合ガスを生成すると共に生成された混合ガスの露点に基づき算出された水蒸気分圧”PDP”が、予め設定された水蒸気分圧最大値”Pmax ”以下になるようにドライガスの質量流量を調整した後にガス分析を行なうことにより、高加湿ガスの分析が不可能な分析手段であっても分析が可能になる。 As a result, the water vapor partial pressure “P DP ” calculated based on the dew point of the generated mixed gas is generated by mixing the highly humidified gas and the dry gas, and the preset water vapor partial pressure maximum value. By performing the gas analysis after adjusting the mass flow rate of the dry gas so as to be equal to or less than “P max ”, even analysis means that cannot analyze the highly humidified gas can be analyzed.

なお、図1に示す実施例においては、混合ガスを直接排気する電磁弁15を設けているが、電磁弁15は必須の構成要素ではない。   In addition, in the Example shown in FIG. 1, although the solenoid valve 15 which exhausts a mixed gas directly is provided, the solenoid valve 15 is not an essential component.

また、図1に示す実施例においては、高加湿ガス及びドライガスの質量流量を2つの流量調整手段でそれぞれ所定の値に調整しているが、勿論、図3に示す従来例のように2種類のガスの質量流量を個々に制御可能な流量調整手段と置換しても構わない。   Further, in the embodiment shown in FIG. 1, the mass flow rates of the highly humidified gas and the dry gas are adjusted to predetermined values by two flow rate adjusting means, respectively. Of course, as in the conventional example shown in FIG. The mass flow rate of the kind of gas may be replaced with a flow rate adjusting means that can be individually controlled.

また、図1に示す実施例の説明に際して、制御手段18が設定時間だけ待機した後に露点測定値の取得や混合ガスの分析を行なっているが、混合ガスの各種状況が即座に安定するものであれば、図2中”S007”や図2中”S009”に示すステップは省略可能である。   In the description of the embodiment shown in FIG. 1, the control means 18 waits for a set time and then acquires the dew point measurement value and analyzes the mixed gas. However, various conditions of the mixed gas are immediately stabilized. If so, the steps indicated by “S007” in FIG. 2 and “S009” in FIG. 2 can be omitted.

また、高加湿ガス分析装置全体は、結露を防ぐために図示しない加熱手段によって所定の温度以上に保持するものであっても構わない。   Further, the entire highly humidified gas analyzer may be held at a predetermined temperature or higher by a heating means (not shown) in order to prevent condensation.

本発明に係る高加湿ガス分析装置の一実施例を示す構成ブロック図である。It is a block diagram showing the configuration of an embodiment of the highly humidified gas analyzer according to the present invention. 高加湿ガス分析装置全体を制御する制御手段の動作を説明するフロー図である。It is a flowchart explaining operation | movement of the control means which controls the whole highly humidified gas analyzer. 従来の高加湿ガス分析装置の一例を示す構成ブロック図である。It is a block diagram showing an example of a conventional highly humidified gas analyzer.

符号の説明Explanation of symbols

1,9 分析対象ガス供給手段
2 水蒸気供給手段
3 校正対象ガス供給手段
4,10 希釈ガス供給手段
5,11,12 流量調整手段
6,7 切替バルブ
8,17 ガス分析手段
13,14,15 電磁弁
16 露点測定手段
18 制御手段
DESCRIPTION OF SYMBOLS 1,9 Analysis object gas supply means 2 Water vapor supply means 3 Calibration object gas supply means 4,10 Dilution gas supply means 5,11,12 Flow rate adjustment means 6,7 Switching valve 8,17 Gas analysis means 13,14,15 Electromagnetic Valve 16 Dew point measuring means 18 Control means

Claims (6)

高加湿ガス分析方法であって、
高加湿ガス及びドライガスの質量流量をそれぞれ所定の値に調整して混合して当該混合ガスの露点を測定し、
露点測定値に基づき水蒸気分圧を算出し、
前記水蒸気分圧が予め設定された水蒸気分圧最大値以下になるまで前記ドライガスの質量流量を増加させ、
前記水蒸気分圧が前記水蒸気分圧最大値以下になった前記混合ガスの分析を行うことを特徴とする高加湿ガス分析方法。
A highly humidified gas analysis method,
Adjust the mass flow rate of the highly humidified gas and dry gas to a predetermined value and mix to measure the dew point of the mixed gas,
Calculate water vapor partial pressure based on the measured dew point,
Increase the mass flow rate of the dry gas until the water vapor partial pressure is less than or equal to a preset water vapor partial pressure maximum value,
The method for analyzing a highly humidified gas, comprising analyzing the mixed gas in which the water vapor partial pressure is less than or equal to the maximum value of the water vapor partial pressure.
高加湿ガス分析装置において、
高加湿ガスを供給する分析対象ガス供給手段と、
ドライガスを供給する希釈ガス供給手段と、
前記高加湿ガス及び前記ドライガスの質量流量をそれぞれ調整する流量調整手段と、
この流量調整手段からの質量流量調整済の前記高加湿ガス及び前記ドライガスの混合ガスの通過/遮断を行なう第1及び第2の電磁弁と、
前記第1の電磁弁を通過する前記混合ガスの露点を測定する露点測定手段と、
前記第2の電磁弁を通過する前記混合ガスの分析を行うガス分析手段と、
装置全体を制御すると共に測定された前記混合ガスの露点に基づき算出された水蒸気分圧が予め設定された水蒸気分圧最大値以下になるように前記ドライガスの質量流量を調整した後にガス分析を行なわせる制御手段と
を備えたことを特徴とする高加湿ガス分析装置。
In the highly humidified gas analyzer,
An analysis target gas supply means for supplying a highly humidified gas;
Dilution gas supply means for supplying dry gas;
Flow rate adjusting means for adjusting the mass flow rates of the highly humidified gas and the dry gas, respectively;
First and second solenoid valves for passing / blocking the mixed gas of the highly humidified gas and the dry gas whose mass flow rate has been adjusted from the flow rate adjusting means;
Dew point measuring means for measuring a dew point of the mixed gas passing through the first solenoid valve;
Gas analyzing means for analyzing the mixed gas passing through the second electromagnetic valve;
After controlling the entire apparatus and adjusting the mass flow rate of the dry gas so that the water vapor partial pressure calculated based on the measured dew point of the mixed gas is equal to or lower than the preset water vapor partial pressure maximum, gas analysis is performed. And a high-humidified gas analyzer.
前記制御手段が、
前記流量調整手段を制御して前記高加湿ガス及び前記ドライガスの質量流量をそれぞれ所定の値に調整して混合した前記混合ガスを生成させ、
前記第1及び第2の電磁弁を制御して前記混合ガスを前記露点測定手段に供給して前記混合ガスの露点が測定させ、
露点測定値に基づき水蒸気分圧を算出し、
前記流量調整手段を制御して前記水蒸気分圧が予め設定された水蒸気分圧最大値以下になるまで前記ドライガスの質量流量を増加させ、
前記第1及び第2の電磁弁を制御して前記水蒸気分圧が前記水蒸気分圧最大値以下になった前記混合ガスを前記ガス分析手段に供給してガス分析を行わせることを特徴とする
請求項2記載の高加湿ガス分析装置。
The control means is
Controlling the flow rate adjusting means to adjust the mass flow rates of the highly humidified gas and the dry gas to respective predetermined values to generate the mixed gas,
Controlling the first and second solenoid valves to supply the mixed gas to the dew point measuring means to measure the dew point of the mixed gas;
Calculate water vapor partial pressure based on the measured dew point,
Control the flow rate adjusting means to increase the mass flow rate of the dry gas until the water vapor partial pressure is less than or equal to a preset water vapor partial pressure maximum value,
The gas analysis is performed by controlling the first and second solenoid valves to supply the gas analysis means with the mixed gas whose water vapor partial pressure is equal to or lower than the water vapor partial pressure maximum value. The highly humidified gas analyzer according to claim 2.
前記混合ガスを直接排気する第3の電磁弁を備えたことを特徴とする
請求項2記載の高加湿ガス分析装置。
3. The highly humidified gas analyzer according to claim 2, further comprising a third electromagnetic valve that directly exhausts the mixed gas.
前記ガス分析手段が、
高加湿ガスの分析により製品寿命への影響が生じる分析手段であることを特徴とする
請求項2乃至請求項4のいずれかに記載の高加湿ガス分析装置。
The gas analyzing means comprises:
The highly humidified gas analyzer according to any one of claims 2 to 4, wherein the highly humidified gas analyzer is an analysis unit that has an effect on product life due to analysis of a highly humidified gas.
前記ガス分析手段が、
高加湿ガスの分析が不可能な分析手段であることを特徴とする
請求項2乃至請求項4のいずれかに記載の高加湿ガス分析装置。
The gas analyzing means comprises:
The high-humidified gas analyzer according to any one of claims 2 to 4, wherein the high-humidified gas is an analysis means incapable of analyzing high-humidified gas.
JP2007174721A 2007-07-03 2007-07-03 High humidification gas analysis method and high humidification gas analyzer Pending JP2009014421A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011161839A1 (en) * 2010-06-24 2011-12-29 三菱重工業株式会社 Ammonia compound concentration measuring device and ammonia compound concentration measuring method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011161839A1 (en) * 2010-06-24 2011-12-29 三菱重工業株式会社 Ammonia compound concentration measuring device and ammonia compound concentration measuring method
JP2012008008A (en) * 2010-06-24 2012-01-12 Mitsubishi Heavy Ind Ltd Ammonia compound concentration measuring device and ammonia compound concentration measuring method
US8895318B2 (en) 2010-06-24 2014-11-25 Mitsubishi Heavy Industries, Ltd. Ammonia compound concentration measuring device and ammonia compound concentration measuring method

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