JP2008541481A5 - - Google Patents

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Publication number
JP2008541481A5
JP2008541481A5 JP2008512331A JP2008512331A JP2008541481A5 JP 2008541481 A5 JP2008541481 A5 JP 2008541481A5 JP 2008512331 A JP2008512331 A JP 2008512331A JP 2008512331 A JP2008512331 A JP 2008512331A JP 2008541481 A5 JP2008541481 A5 JP 2008541481A5
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JP
Japan
Prior art keywords
forming
light absorbing
layer
metal nanoparticles
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008512331A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008541481A (ja
Filing date
Publication date
Priority claimed from US11/130,772 external-priority patent/US7648741B2/en
Application filed filed Critical
Publication of JP2008541481A publication Critical patent/JP2008541481A/ja
Publication of JP2008541481A5 publication Critical patent/JP2008541481A5/ja
Withdrawn legal-status Critical Current

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JP2008512331A 2005-05-17 2006-05-02 熱転写を使用して形成するパターン化金属層 Withdrawn JP2008541481A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/130,772 US7648741B2 (en) 2005-05-17 2005-05-17 Forming a patterned metal layer using laser induced thermal transfer method
PCT/US2006/017288 WO2006124320A1 (en) 2005-05-17 2006-05-02 A patterned metal layer using thermal transfer

Publications (2)

Publication Number Publication Date
JP2008541481A JP2008541481A (ja) 2008-11-20
JP2008541481A5 true JP2008541481A5 (https=) 2009-02-12

Family

ID=36938060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008512331A Withdrawn JP2008541481A (ja) 2005-05-17 2006-05-02 熱転写を使用して形成するパターン化金属層

Country Status (6)

Country Link
US (1) US7648741B2 (https=)
EP (1) EP1884146A1 (https=)
JP (1) JP2008541481A (https=)
KR (1) KR20080007465A (https=)
CN (1) CN100576970C (https=)
WO (1) WO2006124320A1 (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007035742A (ja) * 2005-07-25 2007-02-08 Seiko Epson Corp 薄膜トランジスタの形成方法
US8084101B2 (en) * 2006-08-01 2011-12-27 The Board of Regents of the Nevada Systems of Higher Education on behalf of the University of Nevada, Las Vegas Fabrication of patterned and ordered nanoparticles
CA2674702A1 (en) * 2007-01-05 2008-07-10 Basf Se Method for producing electrically conductive surfaces
US7666567B2 (en) * 2007-10-23 2010-02-23 E. I. Du Pont De Nemours And Company Negative imaging method for providing a patterned metal layer having high conductivity
TW201001624A (en) * 2008-01-24 2010-01-01 Soligie Inc Silicon thin film transistors, systems, and methods of making same
CN101519184B (zh) * 2008-02-29 2012-05-23 财团法人工业技术研究院 利用光热效应制作应用基板的方法
WO2009154156A1 (ja) * 2008-06-16 2009-12-23 東レ株式会社 パターニング方法およびこれを用いたデバイスの製造方法ならびにデバイス
FR2946639B1 (fr) * 2009-06-12 2011-07-15 Saint Gobain Procede de depot de couche mince et produit obtenu.
US20110027499A1 (en) * 2009-07-30 2011-02-03 International Business Machines Corporation Radiation-assisted nanoparticle printing
DE102009050199A1 (de) * 2009-10-21 2011-04-28 Giesecke & Devrient Gmbh Herstellung von Leiterstrukturen auf Kunststoff-Folien mittels Nanotinten
DE102010015659A1 (de) 2010-04-20 2011-10-20 Giesecke & Devrient Gmbh Transferverfahren zur Herstellung von Leiterstrukturen mittels Nanotinten
FR2980279B1 (fr) * 2011-09-20 2013-10-11 Soitec Silicon On Insulator Procede de fabrication d'une structure composite a separer par exfoliation
KR20140140188A (ko) * 2013-05-28 2014-12-09 삼성디스플레이 주식회사 도너기판 및 이의 제조방법 및 이를 이용한 전사패턴 형성방법
WO2015181822A1 (en) * 2014-05-27 2015-12-03 Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd. Method of fabricating metallic patterns and objects
CA2982419C (en) * 2015-04-13 2021-03-30 Jan Franck Device and method for manufacturing printed circuit boards for electrical and/or electronic circuits
FR3035540B1 (fr) * 2015-04-27 2017-04-28 Centre Nat Rech Scient Procede d'impression au moyen de deux lasers
US9776442B2 (en) 2015-12-30 2017-10-03 Palo Alto Research Center Incorporated Single pass imaging using rapidly addressable laser lamination
EP3663090A1 (en) * 2018-12-04 2020-06-10 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO High resolution laser induced forward transfer
CN117465081A (zh) * 2023-10-12 2024-01-30 广东工业大学 一种高吸光率复合膜片及其在激光诱导转移中的应用

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4541830A (en) 1982-11-11 1985-09-17 Matsushita Electric Industrial Co., Ltd. Dye transfer sheets for heat-sensitive recording
US4701439A (en) 1985-12-24 1987-10-20 Eastman Kodak Company Yellow dye-donor element used in thermal dye transfer
US4698651A (en) 1985-12-24 1987-10-06 Eastman Kodak Company Magenta dye-donor element used in thermal dye transfer
US4695287A (en) 1985-12-24 1987-09-22 Eastman Kodak Company Cyan dye-donor element used in thermal dye transfer
US4743582A (en) 1986-10-06 1988-05-10 Eastman Kodak Company N-alkyl-or n-aryl-aminopyrazolone merocyanine dye-donor element used in thermal dye transfer
US4757046A (en) 1986-10-06 1988-07-12 Eastman Kodak Company Merocyanine dye-donor element used in thermal dye transfer
US4769360A (en) 1987-09-14 1988-09-06 Eastman Kodak Company Cyan dye-donor element for thermal dye transfer
US4753922A (en) 1987-11-20 1988-06-28 Eastman Kodak Company Neutral-black dye-donor element for thermal dye transfer
US4973572A (en) 1987-12-21 1990-11-27 Eastman Kodak Company Infrared absorbing cyanine dyes for dye-donor element used in laser-induced thermal dye transfer
US4900130A (en) 1988-10-07 1990-02-13 Eastman Kodak Company Method of scanning
US5256506A (en) 1990-10-04 1993-10-26 Graphics Technology International Inc. Ablation-transfer imaging/recording
US5171650A (en) 1990-10-04 1992-12-15 Graphics Technology International, Inc. Ablation-transfer imaging/recording
US4950639A (en) 1989-06-16 1990-08-21 Eastman Kodak Company Infrared absorbing bis(aminoaryl)polymethine dyes for dye-donor element used in laser-induced thermal dye transfer
US4948777A (en) 1989-06-16 1990-08-14 Eastman Kodak Company Infrared absorbing bis(chalcogenopyrylo)polymethine dyes for dye-donor element used in laser-induced thermal dye transfer
US4950640A (en) 1989-06-16 1990-08-21 Eastman Kodak Company Infrared absorbing merocyanine dyes for dye-donor element used in laser-induced thermal dye transfer
US4942141A (en) 1989-06-16 1990-07-17 Eastman Kodak Company Infrared absorbing squarylium dyes for dye-donor element used in laser-induced thermal dye transfer
US4948776A (en) 1989-06-16 1990-08-14 Eastman Kodak Company Infrared absorbing chalcogenopyrylo-arylidene dyes for dye-donor element used in laser-induced thermal dye transfer
US4952552A (en) 1989-06-20 1990-08-28 Eastman Kodak Company Infrared absorbing quinoid dyes for dye-donor element used in laser-induced thermal dye transfer
US5036040A (en) 1989-06-20 1991-07-30 Eastman Kodak Company Infrared absorbing nickel-dithiolene dye complexes for dye-donor element used in laser-induced thermal dye transfer
US4948778A (en) 1989-06-20 1990-08-14 Eastman Kodak Company Infrared absorbing oxyindolizine dyes for dye-donor element used in laser-induced thermal dye transfer
US4912083A (en) 1989-06-20 1990-03-27 Eastman Kodak Company Infrared absorbing ferrous complexes for dye-donor element used in laser-induced thermal dye transfer
US5244770A (en) 1991-10-23 1993-09-14 Eastman Kodak Company Donor element for laser color transfer
US5292559A (en) 1992-01-10 1994-03-08 Amp Incorporated Laser transfer process
US5691098A (en) 1996-04-03 1997-11-25 Minnesota Mining And Manufacturing Company Laser-Induced mass transfer imaging materials utilizing diazo compounds
US5725989A (en) 1996-04-15 1998-03-10 Chang; Jeffrey C. Laser addressable thermal transfer imaging element with an interlayer
US5800960A (en) 1996-10-24 1998-09-01 Eastman Kodak Company Uniform background for color transfer
US6143451A (en) * 1996-11-26 2000-11-07 E. I. Du Pont De Nemours And Company Imaged laserable assemblages and associated processes with high speed and durable image-transfer characteristics for laser-induced thermal transfer
US6031561A (en) * 1997-04-22 2000-02-29 Eastman Kodak Company Printer system having a plurality of light sources of different wavelengths
US6097416A (en) 1997-11-10 2000-08-01 Eastman Kodak Company Method for reducing donor utilization for radiation-induced colorant transfer
US6252621B1 (en) 1998-08-03 2001-06-26 Eastman Kodak Company Printing lenticular images
US6169565B1 (en) * 1999-03-31 2001-01-02 Eastman Kodak Company Laser printer utilizing a spatial light modulator
US6165671A (en) * 1999-12-30 2000-12-26 Eastman Kodak Company Laser donor element
JP5008216B2 (ja) * 2000-10-13 2012-08-22 株式会社アルバック インクジェット用インクの製法
JP4463473B2 (ja) * 2000-12-15 2010-05-19 ジ・アリゾナ・ボード・オブ・リージェンツ 前駆体を含有するナノ粒子を用いた金属のパターニング方法
JP4066621B2 (ja) 2001-07-19 2008-03-26 富士通株式会社 全文検索システム及び全文検索プログラム
US6703111B2 (en) 2001-10-25 2004-03-09 Eastman Kodak Company Laser thermal imaging process, dye, and element
US6770549B2 (en) 2002-05-08 2004-08-03 Lucent Technologies Inc. Forming patterned thin film metal layers
US6890627B2 (en) 2002-08-02 2005-05-10 Eastman Kodak Company Laser thermal transfer from a donor element containing a hole-transporting layer
US6939660B2 (en) * 2002-08-02 2005-09-06 Eastman Kodak Company Laser thermal transfer donor including a separate dopant layer
TWI265762B (en) * 2003-01-14 2006-11-01 Sharp Kk Wiring material, wiring substrate and manufacturing method thereof, display panel, fine particle thin film material, substrate including thin film layer and manufacturing method thereof
US6790594B1 (en) * 2003-03-20 2004-09-14 Eastman Kodak Company High absorption donor substrate coatable with organic layer(s) transferrable in response to incident laser light
US20060003262A1 (en) 2004-06-30 2006-01-05 Eastman Kodak Company Forming electrical conductors on a substrate

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