JP2008520082A - 表面上にパターン化層を有する物品 - Google Patents
表面上にパターン化層を有する物品 Download PDFInfo
- Publication number
- JP2008520082A JP2008520082A JP2007541264A JP2007541264A JP2008520082A JP 2008520082 A JP2008520082 A JP 2008520082A JP 2007541264 A JP2007541264 A JP 2007541264A JP 2007541264 A JP2007541264 A JP 2007541264A JP 2008520082 A JP2008520082 A JP 2008520082A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- region
- article
- microstructured surface
- relatively
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 54
- 239000000463 material Substances 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 26
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 239000011248 coating agent Substances 0.000 claims abstract description 20
- 238000009736 wetting Methods 0.000 claims abstract description 10
- 229920001940 conductive polymer Polymers 0.000 claims description 8
- 238000002347 injection Methods 0.000 claims description 5
- 239000007924 injection Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 238000005498 polishing Methods 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 229920000123 polythiophene Polymers 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 2
- 238000000465 moulding Methods 0.000 claims description 2
- 238000001723 curing Methods 0.000 claims 4
- 239000011236 particulate material Substances 0.000 claims 1
- 238000001029 thermal curing Methods 0.000 claims 1
- 229920000642 polymer Polymers 0.000 description 9
- 239000010410 layer Substances 0.000 description 8
- -1 polysulfonamide Polymers 0.000 description 7
- 230000010076 replication Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 229920000098 polyolefin Polymers 0.000 description 5
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920000128 polypyrrole Polymers 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000003082 abrasive agent Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 229920000554 ionomer Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000003362 replicative effect Effects 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 239000007779 soft material Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- BGAWZPQKJPTIEA-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine;2-phenylethenesulfonic acid Chemical compound O1CCOC2=CSC=C21.OS(=O)(=O)C=CC1=CC=CC=C1 BGAWZPQKJPTIEA-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005606 polypropylene copolymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000007767 slide coating Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000007666 vacuum forming Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1208—Pretreatment of the circuit board, e.g. modifying wetting properties; Patterning by using affinity patterns
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2465/00—Characterised by the use of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Derivatives of such polymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1173—Differences in wettability, e.g. hydrophilic or hydrophobic areas
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/987,992 US20060105148A1 (en) | 2004-11-12 | 2004-11-12 | Article with patterned layer on surface |
| PCT/US2005/040275 WO2006055310A2 (en) | 2004-11-12 | 2005-11-07 | Article with patterned layer on surface |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008520082A true JP2008520082A (ja) | 2008-06-12 |
| JP2008520082A5 JP2008520082A5 (enExample) | 2008-11-27 |
Family
ID=35892430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007541264A Pending JP2008520082A (ja) | 2004-11-12 | 2005-11-07 | 表面上にパターン化層を有する物品 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20060105148A1 (enExample) |
| EP (1) | EP1810080A2 (enExample) |
| JP (1) | JP2008520082A (enExample) |
| WO (1) | WO2006055310A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010219006A (ja) * | 2009-03-19 | 2010-09-30 | Toppan Printing Co Ltd | El素子、バックライト装置、照明装置、電子看板装置並びにディスプレイ装置 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060105152A1 (en) * | 2004-11-12 | 2006-05-18 | Eastman Kodak Company | Flexible sheet for resistive touch screen |
| US7199322B2 (en) * | 2004-11-12 | 2007-04-03 | Eastman Kodak Company | Variable spacer dots for touch screen |
| US7397466B2 (en) * | 2004-11-12 | 2008-07-08 | Eastman Kodak Company | Integral spacer dots for touch screen |
| US7208691B2 (en) * | 2004-11-12 | 2007-04-24 | Eastman Kodak Company | Touch screen having undercut spacer dots |
| US7230198B2 (en) * | 2004-11-12 | 2007-06-12 | Eastman Kodak Company | Flexible sheet for resistive touch screen |
| US7163733B2 (en) * | 2004-11-12 | 2007-01-16 | Eastman Kodak Company | Touch screen having spacer dots with channels |
| US7196281B2 (en) * | 2004-11-12 | 2007-03-27 | Eastman Kodak Company | Resistive touch screen having conductive mesh |
| JP4380713B2 (ja) * | 2007-03-01 | 2009-12-09 | セイコーエプソン株式会社 | 液体噴射ヘッドユニットの製造方法 |
| KR101927848B1 (ko) * | 2012-09-17 | 2018-12-12 | 삼성디스플레이 주식회사 | 유기전계발광 표시장치 및 이의 제조 방법 |
| KR20150022560A (ko) * | 2013-08-23 | 2015-03-04 | 삼성전기주식회사 | 인쇄회로기판 및 인쇄회로기판 제조 방법 |
| CN120456795B (zh) * | 2025-07-11 | 2025-10-24 | 昆山协鑫光电材料有限公司 | 一种图案化钙钛矿电池组件及其制备方法与装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004294878A (ja) * | 2003-03-27 | 2004-10-21 | Seiko Epson Corp | 微細構造物の製造方法、デバイス、光学素子、集積回路及び電子機器 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6776094B1 (en) * | 1993-10-04 | 2004-08-17 | President & Fellows Of Harvard College | Kit For Microcontact Printing |
| US6180239B1 (en) * | 1993-10-04 | 2001-01-30 | President And Fellows Of Harvard College | Microcontact printing on surfaces and derivative articles |
| US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
| WO1997007429A1 (en) * | 1995-08-18 | 1997-02-27 | President And Fellows Of Harvard College | Self-assembled monolayer directed patterning of surfaces |
| US5725788A (en) * | 1996-03-04 | 1998-03-10 | Motorola | Apparatus and method for patterning a surface |
| US6413587B1 (en) * | 1999-03-02 | 2002-07-02 | International Business Machines Corporation | Method for forming polymer brush pattern on a substrate surface |
| DE10001135A1 (de) * | 2000-01-13 | 2001-07-19 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung eines mikrostrukturierten Oberflächenreliefs durch Prägen thixotroper Schichten |
| US6641767B2 (en) * | 2000-03-10 | 2003-11-04 | 3M Innovative Properties Company | Methods for replication, replicated articles, and replication tools |
| US20020084290A1 (en) * | 2000-11-10 | 2002-07-04 | Therics, Inc. | Method and apparatus for dispensing small volume of liquid, such as with a weting-resistant nozzle |
| DE10229118A1 (de) * | 2002-06-28 | 2004-01-29 | Infineon Technologies Ag | Verfahren zur kostengünstigen Strukturierung von leitfähigen Polymeren mittels Definition von hydrophilen und hydrophoben Bereichen |
| US20040156988A1 (en) * | 2002-08-26 | 2004-08-12 | Mehenti Neville Z. | Selective and alignment-free molecular patterning of surfaces |
| US20060105152A1 (en) * | 2004-11-12 | 2006-05-18 | Eastman Kodak Company | Flexible sheet for resistive touch screen |
-
2004
- 2004-11-12 US US10/987,992 patent/US20060105148A1/en not_active Abandoned
-
2005
- 2005-11-07 WO PCT/US2005/040275 patent/WO2006055310A2/en not_active Ceased
- 2005-11-07 JP JP2007541264A patent/JP2008520082A/ja active Pending
- 2005-11-07 EP EP05851399A patent/EP1810080A2/en not_active Withdrawn
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004294878A (ja) * | 2003-03-27 | 2004-10-21 | Seiko Epson Corp | 微細構造物の製造方法、デバイス、光学素子、集積回路及び電子機器 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010219006A (ja) * | 2009-03-19 | 2010-09-30 | Toppan Printing Co Ltd | El素子、バックライト装置、照明装置、電子看板装置並びにディスプレイ装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1810080A2 (en) | 2007-07-25 |
| US20060105148A1 (en) | 2006-05-18 |
| WO2006055310A2 (en) | 2006-05-26 |
| WO2006055310A3 (en) | 2006-08-10 |
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