JP2008518406A5 - - Google Patents

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Publication number
JP2008518406A5
JP2008518406A5 JP2007538179A JP2007538179A JP2008518406A5 JP 2008518406 A5 JP2008518406 A5 JP 2008518406A5 JP 2007538179 A JP2007538179 A JP 2007538179A JP 2007538179 A JP2007538179 A JP 2007538179A JP 2008518406 A5 JP2008518406 A5 JP 2008518406A5
Authority
JP
Japan
Prior art keywords
circuit
arc suppression
connection
power
terminal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007538179A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008518406A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2005/038493 external-priority patent/WO2006047564A2/en
Publication of JP2008518406A publication Critical patent/JP2008518406A/ja
Publication of JP2008518406A5 publication Critical patent/JP2008518406A5/ja
Pending legal-status Critical Current

Links

JP2007538179A 2004-10-25 2005-10-25 イオンビーム処理装置のスキャン中にアークを抑制する方法および機構 Pending JP2008518406A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US62191704P 2004-10-25 2004-10-25
PCT/US2005/038493 WO2006047564A2 (en) 2004-10-25 2005-10-25 Method and apparatus for arc suppression in scanned ion beam processing equipment

Publications (2)

Publication Number Publication Date
JP2008518406A JP2008518406A (ja) 2008-05-29
JP2008518406A5 true JP2008518406A5 (enExample) 2012-02-16

Family

ID=36228406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007538179A Pending JP2008518406A (ja) 2004-10-25 2005-10-25 イオンビーム処理装置のスキャン中にアークを抑制する方法および機構

Country Status (3)

Country Link
US (1) US7345856B2 (enExample)
JP (1) JP2008518406A (enExample)
WO (1) WO2006047564A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405394B2 (en) * 2004-08-24 2008-07-29 Hitachi, Ltd. Gas cluster-ion irradiation apparatus
JP4597886B2 (ja) * 2005-02-24 2010-12-15 イーエヌ テクノロジー インコーポレイテッド プラズマ電源装置用アークエネルギー制御回路
WO2007106395A2 (en) * 2006-03-14 2007-09-20 Axcelis Technologies, Inc. Arc quenching circuit to mitigate ion beam disruption
US7507977B2 (en) 2006-03-14 2009-03-24 Axcelis Technologies, Inc. System and method of ion beam control in response to a beam glitch
US7834327B2 (en) * 2008-09-23 2010-11-16 Tel Epion Inc. Self-biasing active load circuit and related power supply for use in a charged particle beam processing system
US8619395B2 (en) 2010-03-12 2013-12-31 Arc Suppression Technologies, Llc Two terminal arc suppressor
US8604449B2 (en) * 2010-07-01 2013-12-10 Varian Semiconductor Equipment Associates, Inc. Glitch control during implantation
US8766209B2 (en) 2011-07-21 2014-07-01 Varian Semiconductor Equipment Associates, Inc. Current limiter for high voltage power supply used with ion implantation system
DE102015119455B3 (de) 2015-11-11 2016-11-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Unterdrücken von Arcs in einem Elektronenstrahlerzeuger
US11019711B2 (en) 2018-01-27 2021-05-25 Static Clean International, Inc. Static-neutralization system and high-voltage power supply for use in conjunction therewith
CN112152452B (zh) 2019-06-26 2022-02-08 台达电子工业股份有限公司 电源供应电路与操作方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4152744A (en) * 1977-06-17 1979-05-01 Gould Inc. Solid state tripping circuit
JPS6366900A (ja) * 1986-09-08 1988-03-25 石川島播磨重工業株式会社 プラズマ放電用電源装置
DE3630775A1 (de) 1986-09-10 1988-03-24 Frank Behlke Mosfet-hochspannungsschalter mit extrem kurzer schaltzeit
US5162965A (en) * 1991-06-28 1992-11-10 The United States Of America As Represented By The Secretary Of The Air Force Anti crow bar current interrupter for microwave tube transmitters
JPH0864166A (ja) * 1994-08-19 1996-03-08 Tel Varian Ltd イオン注入装置
US6900592B2 (en) * 1997-03-18 2005-05-31 The Trustees Of The Stevens Institute Of Technology Method and apparatus for stabilizing of the glow plasma discharges
GB9714576D0 (en) * 1997-07-10 1997-09-17 Applied Materials Inc Method and apparatus for neutralising space charge in an ion beam
US6559454B1 (en) * 1999-06-23 2003-05-06 Applied Materials, Inc. Ion beam generation apparatus
JP2001102196A (ja) * 1999-09-29 2001-04-13 Hitachi Kokusai Electric Inc プラズマ処理装置
US6577479B1 (en) * 2000-08-28 2003-06-10 The Regents Of The University Of California Arc suppression circuit
JP2002302767A (ja) * 2001-04-06 2002-10-18 Toshiba Corp スパッタリング装置とその方法

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