JP2008311551A - Semiconductor device - Google Patents

Semiconductor device Download PDF

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JP2008311551A
JP2008311551A JP2007159815A JP2007159815A JP2008311551A JP 2008311551 A JP2008311551 A JP 2008311551A JP 2007159815 A JP2007159815 A JP 2007159815A JP 2007159815 A JP2007159815 A JP 2007159815A JP 2008311551 A JP2008311551 A JP 2008311551A
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semiconductor chip
semiconductor
pads
chips
wiring board
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Kiyomine Tsukada
清峰 塚田
Takashi Miyamoto
隆 宮本
Masato Umehara
正人 梅原
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Shinko Electric Industries Co Ltd
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Shinko Electric Industries Co Ltd
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Priority to JP2007159815A priority Critical patent/JP2008311551A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06555Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
    • H01L2225/06562Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking at least one device in the stack being rotated or offset
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor device having a plurality of stacked semiconductor chips wherein the distributed arrangement of pads on a wiring substrate is made possible, and large and small semiconductor chips can be stacked without the use of relay chips. <P>SOLUTION: The semiconductor device includes a wiring substrate 38 where a plurality of external connection terminals 46 are provided at one side and pads 38a, 38b in electrical connection with each of the external connection terminals 46 are provided at the other side, at least a pair of semiconductor chips 34, 36 arranged to be stacked up and down on the wiring substrate 38, and wires 42b, 42c for electrical connection between electrodes 34a, 36a on each of the semiconductor chips 34, 36 and the pads 38a, 38b on the wiring substrate 38. At least a pad 38b on the wiring substrate 38 corresponding to an electrode 36a on a lower semiconductor chip 36 of a pair of semiconductor chips 34, 36 is positioned immediately below an upper semiconductor chip 34. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、一面に複数の外部接続端子が設けられ、他面に各外部接続端子と電気的に連通するパッドが設けられた配線基板と、配線基板上に、上下に重なるよう配設された少なくとも一組の半導体チップと、各半導体チップの電極と配線基板のパッドとを電気的に接続するワイヤとを備えた半導体装置に関する。   In the present invention, a plurality of external connection terminals are provided on one side, and a wiring board provided with pads that are in electrical communication with each external connection terminal on the other side, and disposed on the wiring board so as to overlap vertically. The present invention relates to a semiconductor device including at least one set of semiconductor chips and wires that electrically connect electrodes of each semiconductor chip and pads of a wiring board.

各特許文献1〜3には、配線基板上に複数の半導体チップが重ねられて(スタックされて)配設された、ボール・グリッド・アレイ(BGA)型の半導体装置が開示されている。   Each of Patent Documents 1 to 3 discloses a ball grid array (BGA) type semiconductor device in which a plurality of semiconductor chips are stacked (stacked) on a wiring board.

図3は、特許文献1に記載された半導体装置(スタックト・ダイ・パッケージ)の構成を示す図である。図3(a)は、半導体装置の上面からの概略透視図であり、図3(b)は、4B−4B線に沿った概略断面図である。
特許文献1に記載された半導体装置では、図3(a),(b)に示すように、キャリア(配線基板)202の一面(下面)203に複数の半田ボール(外部接続端子)212が設けられ、他面(上面)201には各半田ボール212と電気的に連通するパッド(図示せず)が設けられる。キャリア202上には、複数のダイ(半導体チップ)206,208が積み重ねられている。第1ダイ206と第2ダイ208との間にはスペーサ220が設けられ、両者間に間隙が形成されている。第1ダイ206と第2ダイ208の大きさは、ほぼ同じかあるいは全く同じである。各ダイ206,208のボンディング・パッド(電極)222は、第1ダイ206および第2ダイ208のそれぞれの周辺に設けられる。各ダイ206,208のボンディング・パッド222とキャリア202のパッド(図示せず)とは、導線(ワイヤ)210で電気的に接続される。モールド・コンパウンド(樹脂材)214は、キャリヤ202の上面201を覆うように形成され、スペーサ220、第1ダイ206、および第2ダイ208をカプセル収納する(特許文献1 段落0012,0014参照)。
FIG. 3 is a diagram showing a configuration of the semiconductor device (stacked die package) described in Patent Document 1. In FIG. FIG. 3A is a schematic perspective view from the upper surface of the semiconductor device, and FIG. 3B is a schematic cross-sectional view taken along line 4B-4B.
In the semiconductor device described in Patent Document 1, a plurality of solder balls (external connection terminals) 212 are provided on one surface (lower surface) 203 of a carrier (wiring substrate) 202 as shown in FIGS. The other surface (upper surface) 201 is provided with a pad (not shown) in electrical communication with each solder ball 212. A plurality of dies (semiconductor chips) 206 and 208 are stacked on the carrier 202. A spacer 220 is provided between the first die 206 and the second die 208, and a gap is formed between them. The sizes of the first die 206 and the second die 208 are substantially the same or exactly the same. The bonding pads (electrodes) 222 of the dies 206 and 208 are provided around the first die 206 and the second die 208, respectively. The bonding pad 222 of each die 206 and 208 and the pad (not shown) of the carrier 202 are electrically connected by a conductive wire (wire) 210. The mold compound (resin material) 214 is formed so as to cover the upper surface 201 of the carrier 202, and encapsulates the spacer 220, the first die 206, and the second die 208 (see Patent Document 1, paragraphs 0012 and 0014).

図4は、特許文献2に記載された半導体装置の構成を示す断面図である。図4(a)は、半導体装置100の断面模式図であり、図4(b)は、半導体装置100の上面からの透視図である。
特許文献2に記載された半導体装置100では、図4(a),(b)に示すように、基板(配線基板)2の一面(背面)には、半田ボール(外部接続端子)16が形成され、基板2背面の半田ボール16と接している部分には、それぞれ、基板2の表面に貫通するリード18が設けられている。基板2上には、下段半導体チップ4及びダミーチップ8が搭載され、両者の上部には、両者にまたがるように、上段半導体チップ6が搭載されている。上段半導体チップ6は、下段半導体チップ4のボンディングパッド(電極)28に重ならないように、下段半導体チップ4に対してずらして配置されている。各半導体チップ4,6のボンディングパッド28,30と基板2のリード18とは、ワイヤ10,12で電気的に接続される。この状態で、各半導体チップ4,6は合成樹脂(樹脂材)14で封止されている(特許文献2 段落0013−0022参照)。
FIG. 4 is a cross-sectional view showing a configuration of the semiconductor device described in Patent Document 2. 4A is a schematic cross-sectional view of the semiconductor device 100, and FIG. 4B is a perspective view from the top surface of the semiconductor device 100.
In the semiconductor device 100 described in Patent Document 2, solder balls (external connection terminals) 16 are formed on one surface (back surface) of the substrate (wiring substrate) 2 as shown in FIGS. In addition, leads 18 penetrating the surface of the substrate 2 are provided at portions of the back surface of the substrate 2 that are in contact with the solder balls 16. A lower semiconductor chip 4 and a dummy chip 8 are mounted on the substrate 2, and an upper semiconductor chip 6 is mounted on the upper part of both so as to straddle both. The upper semiconductor chip 6 is shifted from the lower semiconductor chip 4 so as not to overlap the bonding pads (electrodes) 28 of the lower semiconductor chip 4. The bonding pads 28 and 30 of each semiconductor chip 4 and 6 and the leads 18 of the substrate 2 are electrically connected by wires 10 and 12. In this state, the semiconductor chips 4 and 6 are sealed with a synthetic resin (resin material) 14 (see paragraphs 0013-0022 of Patent Document 2).

特許文献1,2においては、ほぼ同じ大きさの半導体チップを重ねて設ける技術が記載されているが、一般的には、図5に示すように、より大きい面積の半導体チップ32,34の上に、より小さい半導体チップ36を重ねて設けるケースも多い。このような場合、図5(b)に示すように、上側の半導体チップ36の電極36aと配線基板38上のパッド38aとの間の距離が長くなることがある。これに合わせてワイヤを長くし過ぎると、樹脂封止の際にモールド樹脂によるワイヤの変形(いわゆるワイヤフロー)が発生してワイヤ同士が接触するなどの不具合が発生する恐れがあるため、図5(b)に示すように、下側の半導体チップ32上に中継チップ40を設けて、上側の半導体チップ36の電極36aと配線基板38上のパッド38aとの間の各ワイヤを、中継チップ40で中継することでそれぞれ2本のワイヤ42d,44に分断して、一本一本のワイヤの長さを短くするといった処置が必要となることがある。   Patent Documents 1 and 2 describe a technique in which semiconductor chips having substantially the same size are provided in an overlapping manner. Generally, as shown in FIG. In many cases, smaller semiconductor chips 36 are provided in an overlapping manner. In such a case, as shown in FIG. 5B, the distance between the electrode 36a of the upper semiconductor chip 36 and the pad 38a on the wiring board 38 may become long. If the length of the wire is too long in accordance with this, there is a risk that a deformation (so-called wire flow) of the wire due to the mold resin will occur during resin sealing, which may cause problems such as contact between the wires. As shown in (b), the relay chip 40 is provided on the lower semiconductor chip 32, and each wire between the electrode 36 a of the upper semiconductor chip 36 and the pad 38 a on the wiring substrate 38 is connected to the relay chip 40. In some cases, it is necessary to divide the wire into two wires 42d and 44 by relaying to shorten the length of each wire.

特開2002−57272号公報JP 2002-57272 A 特開2004−71947号公報JP 2004-71947 A 実用新案登録第3096721号公報Utility Model Registration No. 3096721

上記従来の半導体装置においては、重ねられた全ての半導体チップの各電極に対応する配線基板側のパッドを、全て配線基板上の半導体チップ搭載領域の外周部に配設する必要がある。そのため、電極数が多いと、例えば図5(b)の領域X(破線の囲いで示す)のように、配線基板上の一部にパッドが集中してパッドの密度が高くなり、さらにそれに接続するワイヤも高密度に設ける必要があるため、ショート等を起こさないようにワイヤボンディングを行うことが技術的に困難であるという課題がある。また、このことが高集積化の妨げになっている。   In the conventional semiconductor device described above, it is necessary to dispose all pads on the wiring board side corresponding to the electrodes of all the stacked semiconductor chips on the outer peripheral portion of the semiconductor chip mounting region on the wiring board. For this reason, when the number of electrodes is large, for example, as shown in the region X of FIG. 5 (b) (indicated by a broken line), the pads are concentrated on a part of the wiring board, and the density of the pads is increased. Since it is also necessary to provide the wires to be densely arranged, there is a problem that it is technically difficult to perform wire bonding so as not to cause a short circuit or the like. This also hinders high integration.

また、大きい半導体チップの上に、より小さい半導体チップを搭載する場合に、前述のように中継チップを用いる必要が生じることがあり、設計および製造コストが増大することがあるという課題がある。   In addition, when a smaller semiconductor chip is mounted on a larger semiconductor chip, it may be necessary to use a relay chip as described above, and there is a problem that design and manufacturing costs may increase.

本願発明は、上記課題を解決すべく成され、その主たる目的は、重ねられた複数の半導体チップを有する半導体装置において、配線基板上のパッドの配置の分散化を可能とすることにあり、またその副たる目的は、中継チップを用いることなく大小の半導体チップを重ねて設けることを可能とすることにある。   The present invention has been made to solve the above-mentioned problems, and its main purpose is to make it possible to disperse the arrangement of pads on a wiring board in a semiconductor device having a plurality of stacked semiconductor chips. A secondary purpose thereof is to make it possible to stack large and small semiconductor chips without using relay chips.

本発明に係る半導体装置は、上記課題を解決するために、以下の構成を備える。すなわち、一面に複数の外部接続端子が設けられ、他面に各外部接続端子と電気的に連通するパッドが設けられた配線基板と、該配線基板上に、上下に重なるよう配設された少なくとも一組の半導体チップと、該各半導体チップの電極と前記配線基板のパッドとを電気的に接続するワイヤとを備え、前記一組の半導体チップのうちの下側の半導体チップの電極に対応する、前記配線基板の少なくとも一部のパッドが、上側の半導体チップの直下に位置するよう設けられていることを特徴とする。
これによれば、配線基板の一部のパッドを、上側の半導体チップの搭載箇所に重なる位置に設けるため、配線基板上のパッドの配置を分散化することができる。また、半導体チップの直下にパッドを設けるから、大きい半導体チップの下側により小さい半導体チップを配置して、下側の小さい半導体チップの電極と、大きい半導体チップの直下のパッドとを近い距離でワイヤボンディングすることも可能となり、中継チップを用いない設計が可能となる。
In order to solve the above problems, a semiconductor device according to the present invention has the following configuration. That is, a wiring board provided with a plurality of external connection terminals on one surface and a pad electrically connected to each external connection terminal on the other surface, and at least disposed on the wiring board so as to overlap vertically A pair of semiconductor chips, and wires that electrically connect the electrodes of the semiconductor chips and the pads of the wiring board, and correspond to the electrodes of the lower semiconductor chip of the set of semiconductor chips Further, at least a part of the pads of the wiring board is provided so as to be located immediately below the upper semiconductor chip.
According to this, a part of the pads on the wiring board is provided at a position overlapping the mounting position of the upper semiconductor chip, so that the arrangement of the pads on the wiring board can be dispersed. In addition, since a pad is provided directly under the semiconductor chip, a smaller semiconductor chip is disposed below the large semiconductor chip, and the electrode of the small semiconductor chip on the lower side and the pad directly below the large semiconductor chip are connected at a short distance. Bonding is also possible, and a design without a relay chip is possible.

さらに、前記上側の半導体チップの直下に位置する前記パッドに対応する、前記下側の半導体チップの少なくとも一部の電極が、上側の半導体チップの直下に位置するよう設けられていることを特徴とする。   Furthermore, at least a part of the electrodes of the lower semiconductor chip corresponding to the pads positioned immediately below the upper semiconductor chip are provided so as to be positioned immediately below the upper semiconductor chip. To do.

また、上端面が前記下側の半導体チップの上面よりも高くなるよう設けられたスペーサ材または他の半導体チップ上に、前記上側の半導体チップが配置されることで、該一組の半導体チップの間には上下方向に間隙が形成され、前記上側の半導体チップの直下に位置するパッドに接続するワイヤは、前記間隙を通って設けられていることを特徴とする。
これによれば、前記間隙を通してワイヤを設けることができる。
Further, the upper semiconductor chip is disposed on a spacer material or another semiconductor chip provided so that the upper end surface is higher than the upper surface of the lower semiconductor chip, so that the pair of semiconductor chips A gap is formed in the vertical direction between the wires, and a wire connected to a pad located immediately below the upper semiconductor chip is provided through the gap.
According to this, a wire can be provided through the gap.

さらに、前記上側の半導体チップは、複数の前記スペーサ材または前記他の半導体チップの間にまたがって配置されていることを特徴とする。
これによれば、上側の半導体チップを安定的に配設できる。
Furthermore, the upper semiconductor chip is arranged between a plurality of the spacer materials or the other semiconductor chips.
According to this, the upper semiconductor chip can be stably disposed.

さらに、前記上側の半導体チップの直下に位置するパッドのうちの少なくとも一部は、前記複数のスペーサ材または他の半導体チップの間に配設されていることを特徴とする。   Furthermore, at least a part of the pads located immediately below the upper semiconductor chip is disposed between the plurality of spacer materials or other semiconductor chips.

また、前記下側の半導体チップは、前記複数のスペーサ材または他の半導体チップの間に配設されていることを特徴とする。   Further, the lower semiconductor chip is disposed between the plurality of spacer materials or other semiconductor chips.

また、前記スペーサ材および前記他の半導体チップの少なくとも一つが、前記下側の半導体チップ上に配置されていることを特徴とする。   Further, at least one of the spacer material and the other semiconductor chip is arranged on the lower semiconductor chip.

本発明に係る半導体装置によれば、配線基板上のパッドの配置の分散化が可能となり、また、中継チップを用いることなく大小の半導体チップを重ねて設けることが可能となる。   According to the semiconductor device of the present invention, it is possible to disperse the arrangement of the pads on the wiring board, and it is possible to provide a large and small semiconductor chip in an overlapping manner without using a relay chip.

以下、本発明に係る半導体装置を実施するための最良の形態を、添付図面に基づいて詳細に説明する。   The best mode for carrying out a semiconductor device according to the present invention will be described below in detail with reference to the accompanying drawings.

図1は、本発明の実施例1に係る半導体装置Aの構成を示す説明図であり、(a)は断面図、(b)は上方から見た平面図である。
図1に示すように、実施例1に係る半導体装置Aは、配線基板38と、複数の半導体チップ32,34,36とを備える。
1A and 1B are explanatory views showing a configuration of a semiconductor device A according to Embodiment 1 of the present invention, in which FIG. 1A is a cross-sectional view and FIG. 1B is a plan view seen from above.
As illustrated in FIG. 1, the semiconductor device A according to the first embodiment includes a wiring board 38 and a plurality of semiconductor chips 32, 34, and 36.

配線基板38の一面(下面)には、複数の外部接続端子としての複数の半田ボール46が設けられる(図1(a)参照)。また、配線基板38の他面(上面)には、配線基板38内の図示しない配線パターンにより各半田ボール46と電気的に連通するパッド38a,38bが設けられる(図1(b)参照)。   A plurality of solder balls 46 as a plurality of external connection terminals are provided on one surface (lower surface) of the wiring board 38 (see FIG. 1A). On the other surface (upper surface) of the wiring board 38, pads 38a and 38b that are in electrical communication with the solder balls 46 by a wiring pattern (not shown) in the wiring board 38 are provided (see FIG. 1B).

複数(三つ)の半導体チップ32,34,36は、配線基板38の前記他面(上面)上に、上下に重なるよう積み上げられて配設される。本実施例1においては、一番上に第1半導体チップ32を配置し、その下側に平面面積が第1半導体チップ32よりも大きい第2半導体チップ34を配置し、さらにその下側に平面面積が最も小さい第3半導体チップ36を配置している。
なお、図1(b)において、破線部は、第1および第2半導体チップ32,34を透視して、その下側にある構成要素を表示したものである。
A plurality (three) of semiconductor chips 32, 34, and 36 are stacked and disposed on the other surface (upper surface) of the wiring substrate 38 so as to overlap vertically. In the first embodiment, the first semiconductor chip 32 is disposed on the top, the second semiconductor chip 34 having a planar area larger than that of the first semiconductor chip 32 is disposed on the lower side, and further the plane is disposed on the lower side. A third semiconductor chip 36 having the smallest area is arranged.
In FIG. 1 (b), the broken line portion is a perspective view of the first and second semiconductor chips 32 and 34, and the components on the lower side thereof are displayed.

なお、本発明は上下に重なるよう配設された少なくとも一組(すなわち二つ以上)の半導体チップを備える半導体装置に関するものであり、上下の積層関係にある任意の半導体チップの組み合わせのうち少なくとも一組において、本発明でいう「下側の半導体チップ」および「上側の半導体チップ」の構成に適合すれば、本発明の技術範囲に含まれる。
以下、本実施例1における第2半導体チップ34を、本発明でいう「上側の半導体チップ」とし、第3半導体チップ36を、本発明でいう「下側の半導体チップ」として、それぞれの構成について説明を行う。
The present invention relates to a semiconductor device including at least one set (that is, two or more) of semiconductor chips arranged so as to overlap each other, and at least one of a combination of arbitrary semiconductor chips in an upper and lower stacked relationship. A set that falls within the configuration of the “lower semiconductor chip” and the “upper semiconductor chip” in the present invention is included in the technical scope of the present invention.
Hereinafter, the second semiconductor chip 34 in Example 1 is referred to as an “upper semiconductor chip” according to the present invention, and the third semiconductor chip 36 is referred to as a “lower semiconductor chip” according to the present invention. Give an explanation.

図1(a)に示すように、配線基板38の前記他面(上面)上には、上端面が、前記下側の半導体チップ(第3半導体チップ)36の上面よりも高くなるよう形成された第1スペーサ材48が設けられる。すなわち、第1スペーサ材48の厚さは、下側の半導体チップ(第3半導体チップ)36の厚さよりも厚く形成されている。
また、前記下側の半導体チップ(第3半導体チップ)36上には、上端面が、第1スペーサ材48の上面と同じ高さに形成された第2スペーサ材50が設けられる。すなわち、第2スペーサ材50の厚さは、前記下側の半導体チップ(第3半導体チップ)36の厚さとの合計が、第1スペーサ材48の厚さと等しくなるよう形成されている。
前記上側の半導体チップ(第2半導体チップ)34は、二つのスペーサ材48,50にまたがって配置されている。
上記構成により、前記一組の半導体チップ(第2半導体チップ34と第3半導体チップ36)の間には、上下方向に間隙52が形成される。
As shown in FIG. 1A, an upper end surface is formed on the other surface (upper surface) of the wiring substrate 38 so as to be higher than the upper surface of the lower semiconductor chip (third semiconductor chip) 36. A first spacer material 48 is provided. That is, the thickness of the first spacer material 48 is formed to be thicker than the thickness of the lower semiconductor chip (third semiconductor chip) 36.
On the lower semiconductor chip (third semiconductor chip) 36, a second spacer material 50 having an upper end surface formed at the same height as the upper surface of the first spacer material 48 is provided. That is, the thickness of the second spacer material 50 is formed such that the sum of the thickness of the lower semiconductor chip (third semiconductor chip) 36 is equal to the thickness of the first spacer material 48.
The upper semiconductor chip (second semiconductor chip) 34 is disposed across the two spacer members 48 and 50.
With the above configuration, a gap 52 is formed in the vertical direction between the pair of semiconductor chips (the second semiconductor chip 34 and the third semiconductor chip 36).

隣接する各半導体チップ32,34,36、各スペーサ材48,50および配線基板38の間は、それぞれ接着剤で接着されて設けられる。   Adjacent semiconductor chips 32, 34, 36, spacer materials 48, 50 and wiring board 38 are provided by being bonded with an adhesive.

スペーサ材48,50は、特に限定されるものではないが、例えばシリコンから成るダミーチップとして構成される。
なお、スペーサ材(ダミーチップ)に替えて、他の半導体チップを用いることもできる。例えば、スペーサ材48に替えて、第3半導体チップ36よりも厚い他の半導体チップを採用しても良い。この場合、この他の半導体チップの電極がその上の第2半導体チップ34と重ならずに第2半導体チップ34よりも外側(平面視した場合)に露出するようにして、この他の半導体チップの電極に対してもワイヤボンディングが行えるよう設ける。
同様に、第3半導体チップ36上の第2スペーサ材50に替えて他の半導体チップを採用することもできる。この場合、同様に、この他の半導体チップの電極がその上の第2半導体チップ34と重ならずに第2半導体チップ34よりも外側に露出するように設ける。また、必要に応じて、第3半導体チップ36の電極36aがその上の他の半導体チップと重ならないように、例えば、第3半導体チップ36の電極36aがこの他の半導体チップよりも他方のスペーサ材48側(図1では右側)に露出するように配設する(第3半導体チップ36を、図1とは左右逆向きに配置する)と良い。
The spacer materials 48 and 50 are not particularly limited, but are configured as dummy chips made of silicon, for example.
Other semiconductor chips can be used instead of the spacer material (dummy chip). For example, instead of the spacer material 48, another semiconductor chip thicker than the third semiconductor chip 36 may be employed. In this case, the electrodes of the other semiconductor chips are exposed to the outside of the second semiconductor chip 34 (when viewed in plan) without overlapping the second semiconductor chip 34 above the other semiconductor chip. These electrodes are also provided so that wire bonding can be performed.
Similarly, other semiconductor chips may be employed in place of the second spacer material 50 on the third semiconductor chip 36. In this case, similarly, the electrodes of the other semiconductor chips are provided so as to be exposed outside the second semiconductor chip 34 without overlapping the second semiconductor chip 34 thereon. Further, if necessary, for example, the electrode 36a of the third semiconductor chip 36 is placed on the other spacer than the other semiconductor chip so that the electrode 36a of the third semiconductor chip 36 does not overlap with the other semiconductor chip thereon. It is preferable to arrange it so as to be exposed on the side of the material 48 (right side in FIG. 1) (the third semiconductor chip 36 is arranged in the direction opposite to the left and right in FIG. 1).

本実施例1に係る半導体装置Aにおいては、前記下側の半導体チップ(第3半導体チップ)36と、下側の半導体チップ36の電極36aに対応する配線基板38の一部のパッド38bとが、上側の半導体チップ(第2半導体チップ)34の直下に位置するよう設けられている。
なお、本願において「上側の半導体チップの直下」とは、上側の半導体チップに対して上下方向(半導体チップの積層方向、または配線基板面に垂直な方向)に重なる箇所のことである。言い換えれば、上側の半導体チップの配線基板に向かう投影の像に含まれる箇所である。
In the semiconductor device A according to the first embodiment, the lower semiconductor chip (third semiconductor chip) 36 and some pads 38b of the wiring board 38 corresponding to the electrodes 36a of the lower semiconductor chip 36 are provided. The upper semiconductor chip (second semiconductor chip) 34 is located immediately below.
In the present application, “directly below the upper semiconductor chip” refers to a portion that overlaps the upper semiconductor chip in the vertical direction (the stacking direction of the semiconductor chips or the direction perpendicular to the wiring board surface). In other words, it is a location included in an image projected onto the wiring substrate of the upper semiconductor chip.

また、半導体装置Aは、半導体チップ32,34,36の電極32a,34a,36aと、配線基板38のパッド38a,38bとをそれぞれ接続するワイヤ42a,42b,42cを備える。この中で、上側の半導体チップ(第2半導体チップ)34の直下に位置するパッド38bに接続するワイヤ42cは、前記一組の半導体チップ(第2半導体チップ34と第3半導体チップ36)の間の間隙52を通って設けられている(図1(a)参照)。
第1および第2スペーサ材48,50の厚さは、ワイヤ42cを通すのに十分なだけの間隙52を確保できるよう設ける。特に限定されるものではないが、間隙52の幅は60〜80μm以上に設ければ、ワイヤ42cを十分通すことができる。
The semiconductor device A also includes wires 42a, 42b, and 42c that connect the electrodes 32a, 34a, and 36a of the semiconductor chips 32, 34, and 36 to the pads 38a and 38b of the wiring board 38, respectively. Among these, the wire 42c connected to the pad 38b located immediately below the upper semiconductor chip (second semiconductor chip) 34 is between the pair of semiconductor chips (second semiconductor chip 34 and third semiconductor chip 36). (See FIG. 1A).
The thickness of the first and second spacer members 48 and 50 is provided so as to ensure a gap 52 sufficient to pass the wire 42c. Although not particularly limited, if the width of the gap 52 is set to 60 to 80 μm or more, the wire 42c can be sufficiently passed.

さらに、半導体装置Aは、配線基板38の前記他面(上面)と、その面上に設けられた、前記第1〜第3半導体チップ32,34,36、第1〜第2スペーサ材48,50、およびワイヤ42a,42b,42cを封止する封止樹脂54を備える。   Further, the semiconductor device A includes the other surface (upper surface) of the wiring board 38, the first to third semiconductor chips 32, 34, 36, the first to second spacer members 48, provided on the surface. 50 and a sealing resin 54 for sealing the wires 42a, 42b, and 42c.

次に、本発明の実施例2に係る半導体装置Bの構成を説明する。図2は、本発明の実施例2に係る半導体装置Bの構成を示す説明図であり、(a)は断面図、(b)は上方から見た平面図である。なお、図2(b)において、破線部は、第1および第2半導体チップ32,34を透視して、その下側にある構成要素を表示したものである。
なお、以下、実施例1と同一の構成については同一の符号を付して説明を省略し、実施例1との相違点について説明を行う。
Next, the configuration of the semiconductor device B according to the second embodiment of the present invention will be described. 2A and 2B are explanatory views showing the configuration of the semiconductor device B according to the second embodiment of the present invention, where FIG. 2A is a cross-sectional view and FIG. 2B is a plan view seen from above. In FIG. 2B, the broken line portion is a perspective view of the components below the first and second semiconductor chips 32 and 34.
In the following description, the same components as those in the first embodiment are denoted by the same reference numerals, description thereof is omitted, and differences from the first embodiment are described.

本実施例2においては、実施例1の第2スペーサ材50の構成とは異なり、図2(a)に示すように、第2スペーサ材51が、下側の半導体チップ(第3半導体チップ)36上ではなく、配線基板38の上面に直接接着されて設けられている。   In the second embodiment, unlike the configuration of the second spacer member 50 of the first embodiment, as shown in FIG. 2A, the second spacer member 51 is a lower semiconductor chip (third semiconductor chip). It is provided on the upper surface of the wiring board 38, not directly on the board 36, but directly attached.

第1スペーサ材48および第2スペーサ材51は、それぞれ、上端面が、前記下側の半導体チップ(第3半導体チップ)36の上面よりも高くなるよう設けられる。すなわち、第1スペーサ材48および第2スペーサ材51の厚さは、下側の半導体チップ(第3半導体チップ)36の厚さよりも厚く形成されている。
前記上側の半導体チップ(第2半導体チップ)34は、二つのスペーサ材48,51にまたがって配置されている。
上記構成により、前記一組の半導体チップ(第2半導体チップ34と第3半導体チップ36)の間には、上下方向に間隙53が形成される。
第1および第2スペーサ材48,51の厚さは、ワイヤ42cを通すのに十分なだけの間隙53を確保できるよう設ける。特に限定されるものではないが、間隙53の幅は60〜80μm以上に設ければ、ワイヤ42cを十分通すことができる。
The first spacer material 48 and the second spacer material 51 are provided so that the upper end surfaces are higher than the upper surface of the lower semiconductor chip (third semiconductor chip) 36. That is, the thickness of the first spacer material 48 and the second spacer material 51 is formed to be thicker than the thickness of the lower semiconductor chip (third semiconductor chip) 36.
The upper semiconductor chip (second semiconductor chip) 34 is disposed across the two spacer members 48 and 51.
With the above configuration, a gap 53 is formed in the vertical direction between the pair of semiconductor chips (second semiconductor chip 34 and third semiconductor chip 36).
The thickness of the first and second spacer members 48 and 51 is provided so as to ensure a gap 53 sufficient to pass the wire 42c. Although not particularly limited, if the width of the gap 53 is set to 60 to 80 μm or more, the wire 42c can be sufficiently passed.

下側の半導体チップ(第3半導体チップ)36は、第1スペーサ材48と第2スペーサ材51との間に配設されている。さらに、図2(b)に示すように、下側の半導体チップ(第3半導体チップ)36の電極36aに対応するパッド38bも、上側の半導体チップ(第2半導体チップ)34の直下に位置するとともに、第1スペーサ材48と第2スペーサ材51との間に配設されている。   The lower semiconductor chip (third semiconductor chip) 36 is disposed between the first spacer material 48 and the second spacer material 51. Further, as shown in FIG. 2B, the pad 38b corresponding to the electrode 36a of the lower semiconductor chip (third semiconductor chip) 36 is also located immediately below the upper semiconductor chip (second semiconductor chip) 34. At the same time, it is disposed between the first spacer material 48 and the second spacer material 51.

上記実施例1および実施例2に係る半導体装置A,Bによれば、配線基板38の一部のパッド38bを、上側の半導体チップ34の搭載箇所に重なる位置に設けるため、従来のように全てのパッドを半導体チップの搭載箇所の外周部に配設する構成に比較して、配線基板上のパッドの配置を分散化することができる。
また、より大きい半導体チップ34の下側により小さい半導体チップ36を配置して、下側の小さい半導体チップ36の電極36aと、大きい半導体チップ34の直下のパッド38bとを近い距離でワイヤボンディングすることが可能となり、従来の様な中継チップを用いない設計が可能となる。
According to the semiconductor devices A and B according to the first and second embodiments, since some pads 38b of the wiring board 38 are provided at positions where they overlap the mounting positions of the upper semiconductor chip 34, all of them are conventionally provided. Compared to the configuration in which the pads are arranged on the outer peripheral portion of the mounting position of the semiconductor chip, the arrangement of the pads on the wiring board can be dispersed.
Also, a smaller semiconductor chip 36 is disposed below the larger semiconductor chip 34, and the electrodes 36a of the lower smaller semiconductor chip 36 and the pads 38b immediately below the larger semiconductor chip 34 are wire-bonded at a short distance. Therefore, it is possible to design without using a relay chip as in the prior art.

なお、上記実施例1および実施例2に係る半導体装置A,Bを製造する際には、まず下側の半導体チップ(第3半導体チップ)36を配線基板38上に接着し、その電極36aと配線基板38上のパッド38bとをワイヤボンディングする。続いて、第1および第2スペーサ材48,50(51)を、配線基板38上または下側の半導体チップ(第3半導体チップ)36上に設け、その上に第2半導体チップ34を接着し、さらに第2半導体チップ34の上に第1半導体チップ32を接着する。そして、第1および第2半導体チップ32,34の電極32a,34aと配線基板38上のパッド38aとをワイヤボンディングする。   When manufacturing the semiconductor devices A and B according to the first and second embodiments, the lower semiconductor chip (third semiconductor chip) 36 is first bonded onto the wiring substrate 38, and the electrodes 36a and 36 The pads 38b on the wiring board 38 are wire-bonded. Subsequently, the first and second spacer members 48 and 50 (51) are provided on the wiring substrate 38 or on the lower semiconductor chip (third semiconductor chip) 36, and the second semiconductor chip 34 is bonded thereon. Further, the first semiconductor chip 32 is bonded onto the second semiconductor chip 34. Then, the electrodes 32a and 34a of the first and second semiconductor chips 32 and 34 and the pads 38a on the wiring board 38 are wire-bonded.

続いて、配線基板38の前記他面(上面)と、その面上に設けられた、前記第1〜第3半導体チップ32,34,36、第1〜第2スペーサ材48,50(51)、およびワイヤ42a,42b,42cを、樹脂で封止して封止樹脂54を形成する。
この樹脂封止の工程においては、トランスファーモールド法を用いると、上側の半導体チップ34と配線基板38との間にできるトンネル状の間隙部に完全に樹脂が充填されない恐れがあるため、コンプレッションモールド法を用いることが望ましい。
Subsequently, the other surface (upper surface) of the wiring board 38, and the first to third semiconductor chips 32, 34, and 36, and the first to second spacer members 48 and 50 (51) provided on the other surface. The wires 42a, 42b, and 42c are sealed with resin to form a sealing resin 54.
In this resin sealing process, if the transfer molding method is used, the tunnel-shaped gap formed between the upper semiconductor chip 34 and the wiring substrate 38 may not be completely filled with the resin. It is desirable to use

なお、上記実施例1および実施例2においては、下側の半導体チップ(第3半導体チップ)36の全体が、上側の半導体チップ(第2半導体チップ)34の直下にあるが、本発明はこれに限定されるものではない。例えば、下側の半導体チップは上側の半導体チップの直下から外して設け、下側の半導体チップの電極に対応する少なくとも一部のパッドのみを、上側の半導体チップの直下に設けても良い。また、下側の半導体チップを、その電極の一部のみが上側の半導体チップの直下に位置するように配設しても良い。
また、下側の半導体チップの電極に対応する、配線基板もパッドも、必ずしもその全てが上側の半導体チップの直下に設ける構成に限定されるものではない。すなわち、下側の半導体チップの電極に対応するパッドのうちの一部のみを、上側の半導体チップの直下に配設し、他のパッドは上側の半導体チップの直下から外れる位置に配設しても良い。
In the first and second embodiments, the entire lower semiconductor chip (third semiconductor chip) 36 is directly below the upper semiconductor chip (second semiconductor chip) 34. It is not limited to. For example, the lower semiconductor chip may be provided off the upper semiconductor chip, and at least a part of the pads corresponding to the electrodes of the lower semiconductor chip may be provided immediately below the upper semiconductor chip. Further, the lower semiconductor chip may be disposed so that only a part of the electrode is located directly below the upper semiconductor chip.
Further, the wiring board and the pads corresponding to the electrodes of the lower semiconductor chip are not necessarily limited to the configuration in which all of them are provided directly below the upper semiconductor chip. That is, only a part of the pads corresponding to the electrodes of the lower semiconductor chip is disposed immediately below the upper semiconductor chip, and the other pads are disposed at positions away from directly below the upper semiconductor chip. Also good.

本発明の実施例1に係る半導体装置を示す説明図であり、(a)は断面図、(b)は平面図である。BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing which shows the semiconductor device which concerns on Example 1 of this invention, (a) is sectional drawing, (b) is a top view. 本発明の実施例2に係る半導体装置を示す説明図であり、(a)は断面図、(b)は平面図である。It is explanatory drawing which shows the semiconductor device which concerns on Example 2 of this invention, (a) is sectional drawing, (b) is a top view. 従来の半導体装置を示す説明図であり、(a)は平面図、(b)は断面図である。It is explanatory drawing which shows the conventional semiconductor device, (a) is a top view, (b) is sectional drawing. 従来の半導体装置を示す説明図であり、(a)は断面図、(b)は平面図である。It is explanatory drawing which shows the conventional semiconductor device, (a) is sectional drawing, (b) is a top view. 従来の半導体装置を示す説明図であり、(a)は断面図、(b)は平面図である。It is explanatory drawing which shows the conventional semiconductor device, (a) is sectional drawing, (b) is a top view.

符号の説明Explanation of symbols

A,B 半導体装置
32 第1半導体チップ
34 第2半導体チップ(上側の半導体チップ)
36 第3半導体チップ(下側の半導体チップ)
32a,34a,36a 電極
38 配線基板
38a パッド
38b パッド(上側の半導体チップの直下のパッド)
42a,42b,42c ワイヤ
46 半田ボール(外部接続端子)
48,50,51 スペーサ材
52,53 間隙
54 封止樹脂
A, B Semiconductor device 32 First semiconductor chip 34 Second semiconductor chip (upper semiconductor chip)
36 Third semiconductor chip (lower semiconductor chip)
32a, 34a, 36a Electrode 38 Wiring board 38a Pad 38b Pad (pad just below the upper semiconductor chip)
42a, 42b, 42c Wire 46 Solder ball (external connection terminal)
48, 50, 51 Spacer material 52, 53 Gap 54 Sealing resin

Claims (7)

一面に複数の外部接続端子が設けられ、他面に各外部接続端子と電気的に連通するパッドが設けられた配線基板と、
該配線基板上に、上下に重なるよう配設された少なくとも一組の半導体チップと、
該各半導体チップの電極と前記配線基板のパッドとを電気的に接続するワイヤとを備え、
前記一組の半導体チップのうちの下側の半導体チップの電極に対応する、前記配線基板の少なくとも一部のパッドが、上側の半導体チップの直下に位置するよう設けられていることを特徴とする半導体装置。
A wiring board provided with a plurality of external connection terminals on one surface and pads provided on the other surface in electrical communication with each external connection terminal;
On the wiring board, at least one set of semiconductor chips disposed so as to overlap vertically, and
A wire for electrically connecting the electrode of each semiconductor chip and the pad of the wiring board;
At least a part of the pads of the wiring board corresponding to the electrodes of the lower semiconductor chip of the set of semiconductor chips is provided so as to be located immediately below the upper semiconductor chip. Semiconductor device.
前記上側の半導体チップの直下に位置する前記パッドに対応する、前記下側の半導体チップの少なくとも一部の電極が、上側の半導体チップの直下に位置するよう設けられていることを特徴とする請求項1記載の半導体装置。   The at least part of the electrode of the lower semiconductor chip corresponding to the pad positioned immediately below the upper semiconductor chip is provided so as to be positioned immediately below the upper semiconductor chip. Item 14. A semiconductor device according to Item 1. 上端面が前記下側の半導体チップの上面よりも高くなるよう設けられたスペーサ材または他の半導体チップ上に、前記上側の半導体チップが配置されることで、該一組の半導体チップの間には上下方向に間隙が形成され、
前記上側の半導体チップの直下に位置するパッドに接続するワイヤは、前記間隙を通って設けられていることを特徴とする請求項1または2記載の半導体装置。
The upper semiconductor chip is arranged on a spacer material or another semiconductor chip provided so that the upper end surface is higher than the upper surface of the lower semiconductor chip, so that the upper semiconductor chip is interposed between the pair of semiconductor chips. Has a gap in the vertical direction,
3. The semiconductor device according to claim 1, wherein a wire connected to a pad located immediately below the upper semiconductor chip is provided through the gap.
前記上側の半導体チップは、複数の前記スペーサ材または前記他の半導体チップの間にまたがって配置されていることを特徴とする請求項3記載の半導体装置。   4. The semiconductor device according to claim 3, wherein the upper semiconductor chip is disposed between a plurality of the spacer materials or the other semiconductor chips. 前記上側の半導体チップの直下に位置するパッドのうちの少なくとも一部は、前記複数のスペーサ材または他の半導体チップの間に配設されていることを特徴とする請求項4記載の半導体装置。   5. The semiconductor device according to claim 4, wherein at least a part of the pads located immediately below the upper semiconductor chip is disposed between the plurality of spacer materials or other semiconductor chips. 前記下側の半導体チップは、前記複数のスペーサ材または他の半導体チップの間に配設されていることを特徴とする請求項4または5記載の半導体装置。   6. The semiconductor device according to claim 4, wherein the lower semiconductor chip is disposed between the plurality of spacer materials or other semiconductor chips. 前記スペーサ材および前記他の半導体チップの少なくとも一つが、前記下側の半導体チップ上に配置されていることを特徴とする請求項3〜5のうちのいずれか一項記載の半導体装置。   6. The semiconductor device according to claim 3, wherein at least one of the spacer material and the other semiconductor chip is disposed on the lower semiconductor chip.
JP2007159815A 2007-06-18 2007-06-18 Semiconductor device Pending JP2008311551A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11705405B2 (en) 2020-08-19 2023-07-18 Samsung Electronics Co., Ltd. Packaged semiconductor devices having spacer chips with protective groove patterns therein

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11705405B2 (en) 2020-08-19 2023-07-18 Samsung Electronics Co., Ltd. Packaged semiconductor devices having spacer chips with protective groove patterns therein

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