JP2008293006A - Electrophotographic photoreceptor - Google Patents

Electrophotographic photoreceptor Download PDF

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JP2008293006A
JP2008293006A JP2008114655A JP2008114655A JP2008293006A JP 2008293006 A JP2008293006 A JP 2008293006A JP 2008114655 A JP2008114655 A JP 2008114655A JP 2008114655 A JP2008114655 A JP 2008114655A JP 2008293006 A JP2008293006 A JP 2008293006A
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Hiroyuki Tajima
寛之 田島
Yuuta Kumano
勇太 熊野
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Mitsubishi Chemical Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrophotographic photoreceptor having excellent wear resistance and electric characteristic, containing a binder resin and high stability of a coating solution. <P>SOLUTION: The electrophotographic photoreceptor comprises a conductive support and a photosensitive layer formed on the conductive support. The photosensitive layer has a repeating structure represented by the formula (1). In the formula (1), 0.5<äa/(a+b)}<1 is satisfied, where A is a divalent phenol residue of a 250 or less molecular weight, B is a divalent phenol residue, X is a structure represented by the following formula (2), and Y is a divalent carboxylic acid residue. In the formula (2), R<SP>1</SP>and R<SP>2</SP>are each independently a hydrogen atom, an alkyl group, an aryl group, a halogen group or an alkoxy group, and n<SP>1</SP>, m<SP>1</SP>are each independently an integer from 0 to 4. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は電子写真感光体に関し、より詳しくは、耐摩耗性等が良好な電子写真感光体に関する。   The present invention relates to an electrophotographic photosensitive member, and more particularly to an electrophotographic photosensitive member having good wear resistance and the like.

電子写真技術は、即時性、高品質の画像が得られること等から、複写機、各種プリンタ等の分野で広く使われている。電子写真技術の中核となる感光体については、無公害で成膜が容易、製造が容易である等の利点を有する有機系の光導電性物質を使用した感光体が使用されている。
有機系の光導電材料を用いた感光体としては、光導電性微粉末をバインダー樹脂中に分散させたいわゆる分散型感光体と、電荷発生層及び電荷移動層を積層した積層型感光体とが知られている。なかでも、積層型感光体は、それぞれ効率の高い電荷発生物質、及び電荷移動物質を組み合わせることにより高感度な感光体が得られること、材料選択範囲が広く安全性の高い感光体が得られること、また感光層を塗布により容易に形成可能で生産性が高く、コスト面でも有利なことから感光体の主流であり、鋭意開発され実用化されている。
The electrophotographic technology is widely used in the fields of copiers and various printers because of its immediacy and high quality images. As a photoreceptor which is the core of electrophotographic technology, a photoreceptor using an organic photoconductive material having advantages such as pollution-free, easy film formation, and easy manufacture is used.
As a photoconductor using an organic photoconductive material, a so-called dispersion type photoconductor in which a photoconductive fine powder is dispersed in a binder resin and a multi-layer type photoconductor in which a charge generation layer and a charge transfer layer are laminated. Are known. In particular, the laminated type photoconductor can provide a highly sensitive photoconductor by combining a highly efficient charge generating material and a charge transfer material, and can provide a highly safe photoconductor with a wide range of material selection. In addition, the photosensitive layer can be easily formed by coating, has high productivity, and is advantageous in terms of cost. Therefore, the photosensitive layer is the mainstream, and has been developed and put into practical use.

電子写真感光体は、電子写真プロセス、即ち、帯電、露光、現像、転写、クリーニング、除電等のサイクルで繰り返し使用されるため、その間様々なストレスを受け劣化する。このような劣化としては、例えば、帯電器として普通用いられるコロナ帯電器から発生する強酸化性のオゾンやNOxが感光層に与える化学的なダメージ、像露光で生成したキャリアー(電流)が感光層内を流れること、除電光または外部からの光による感光層組成物の分解等の化学的、電気的劣化がある。さらに、クリーニングブレード、磁気ブラシ等の摺擦、現像剤、紙との接触等による感光層表面の摩耗、傷の発生、膜の剥がれ等の機械的劣化がある。特に、このような感光層表面に生じる損傷は画像上に現れやすく、直接画像品質を損なうため感光体の寿命を制限する大きな要因となっている。   Since the electrophotographic photosensitive member is repeatedly used in an electrophotographic process, that is, a cycle of charging, exposure, development, transfer, cleaning, static elimination, etc., it is deteriorated by various stresses during that time. Such deterioration includes, for example, strongly oxidative ozone generated from a corona charger normally used as a charger, chemical damage caused by NOx to the photosensitive layer, and carrier (current) generated by image exposure. There are chemical and electrical deteriorations such as flowing in, decomposing the photosensitive layer composition due to static elimination light or external light. Furthermore, there is mechanical deterioration such as abrasion of the photosensitive layer surface due to rubbing of a cleaning blade, a magnetic brush or the like, contact with a developer or paper, generation of scratches, peeling of the film, and the like. In particular, such damage on the surface of the photosensitive layer is likely to appear on the image and directly impairs the image quality, which is a major factor limiting the life of the photoreceptor.

表面保護層等の機能層を設けない一般的な感光体の場合、感光層がこのような負荷を受ける。感光層は、通常、バインダー樹脂と光導電性物質とからなり、実質的に強度を決めるのはバインダー樹脂であるが、光導電性物質のドープ量が相当多いため充分な機械強度を持たせるには至っていない。また、高速印刷の要求の高まりから、より高速の電子写真プロセス対応の材料が求められている。この場合、感光体には高感度、高寿命であることの他に、露光されてから現像されるまでの時間が短くなるために応答性が良いことも必要となる。   In the case of a general photoreceptor not provided with a functional layer such as a surface protective layer, the photosensitive layer is subjected to such a load. The photosensitive layer is usually composed of a binder resin and a photoconductive material, and it is the binder resin that substantially determines the strength, but since the amount of the photoconductive material doped is considerably large, sufficient mechanical strength is provided. Has not reached. In addition, due to the increasing demand for high-speed printing, materials for a higher-speed electrophotographic process are required. In this case, in addition to high sensitivity and long life, the photosensitive member must have good responsiveness because the time from exposure to development is shortened.

また、これらの電子写真感光体を構成する各層は、通常、基体上に光導電性物質、バインダー樹脂等を含有する塗布液を、浸漬塗布、スプレー塗布、ノズル塗布、バーコート、ロールコート、ブレード塗布等により塗布して形成される。これらの層形成方法では、層に含有させる物質を溶剤に溶解させて得られる塗布溶液として、塗布する等の公知の方法が適用されている。   In addition, each layer constituting these electrophotographic photoreceptors is usually formed by applying a coating solution containing a photoconductive substance, a binder resin, etc. on a substrate by dip coating, spray coating, nozzle coating, bar coating, roll coating, blade It is formed by coating by coating or the like. In these layer forming methods, a known method such as coating is applied as a coating solution obtained by dissolving a substance contained in a layer in a solvent.

感光層のバインダー樹脂としては、ポリメチルメタクリレート、ポリスチレン、ポリ塩化ビニル等のビニル重合体、及びその共重合体、ポリカーボネート、ポリエステル、ポリスルホン、フェノキシ、エポキシ、シリコーン樹脂等の熱可塑性樹脂や種々の熱硬化性樹脂が用いられている。数あるバインダー樹脂のなかではポリカーボネート樹脂が比較的優れた性能を有しており、これまで種々のポリカーボネート樹脂が開発され実用に供されている(特許文献1〜特許文献3参照)。   Examples of the binder resin for the photosensitive layer include vinyl polymers such as polymethyl methacrylate, polystyrene, and polyvinyl chloride, and copolymers thereof, thermoplastic resins such as polycarbonate, polyester, polysulfone, phenoxy, epoxy, and silicone resin, and various kinds of heat. A curable resin is used. Among the various binder resins, the polycarbonate resin has relatively excellent performance, and various polycarbonate resins have been developed and put into practical use (see Patent Documents 1 to 3).

一方、商品名「U−ポリマー」として市販されているポリアリレート樹脂をバインダーとして用いた電子写真感光体は、ポリカーボネートを用いる場合と比較して感度が向上することが報告されている(特許文献4参照)。また、特定構造の2価フェノール成分を用いたポリアリレート樹脂をバインダー樹脂として用いる場合は、電子写真感光体を製造する際に用いる塗布溶液の安定性が向上し、さらに、電子写真感光体の機械的強度、耐摩耗性が改良されることが報告されている(特許文献5及び特許文献6参照)。   On the other hand, it has been reported that an electrophotographic photoreceptor using a polyarylate resin marketed under the trade name “U-polymer” as a binder has improved sensitivity compared to the case of using polycarbonate (Patent Document 4). reference). Further, when a polyarylate resin using a dihydric phenol component having a specific structure is used as a binder resin, the stability of the coating solution used for producing the electrophotographic photosensitive member is improved, and the electrophotographic photosensitive member machine is further improved. It has been reported that the mechanical strength and wear resistance are improved (see Patent Document 5 and Patent Document 6).

特開昭50−098332号公報JP 50-098332 A 特開昭59−071057号公報JP 59-071057 A 特開昭59−184251号公報JP 59-184251 特開昭56−135844号公報JP-A-56-135844 特開平03−006567号公報Japanese Patent Laid-Open No. 03-006567 特開平10−288845号公報Japanese Patent Laid-Open No. 10-288845

ところで、前述したような従来の電子写真感光体は、トナーによる現像、紙との摩擦、クリーニング部材(ブレード)による摩擦等の実用上の負荷により、電子写真感光体の表面が摩耗、表面に傷が生じる等の課題を有し、実用上は限られた印刷性能にとどまっているのが現状である。   By the way, the conventional electrophotographic photosensitive member as described above is worn and scratched on the surface of the electrophotographic photosensitive member due to practical loads such as development with toner, friction with paper, and friction with a cleaning member (blade). The present situation is that the printing performance is limited in practical use.

例えば、市販のポリアリレート樹脂「U−ポリマー」は、耐摩耗性、感度の点で向上が見られるものの、この樹脂を溶解して調製した塗布液の安定性が低く、塗布製造が困難な場合がある。また、特定構造のポリアリレート樹脂を用いることにより、溶解性や溶液安定性、機械的強度等を向上させることができるものの、電気特性、特に、応答性に関して不充分なものがある。ビスフェノール成分として、ビス(4−ヒドロキシ−3,5−ジメチルフェニル)メタン及び2,2−ビス(4−ヒドロキシフェニル)プロパンを用いるポリアリレート共重合体を使用する場合も、機械物性にやや向上は見られるが、電気特性、感度、応答性の面では充分な性能は得られず、基板との接着性が不充分な場合が多い。
そのため、電子写真感光体に用いられる樹脂として、機械的強度が高く、溶媒に対する溶解性が高く、液安定性に優れ、且つ、接着性、応答性に優れたバインダー樹脂が望まれているのが現状である。
For example, when a commercially available polyarylate resin “U-polymer” is improved in terms of wear resistance and sensitivity, the stability of the coating solution prepared by dissolving this resin is low, and coating production is difficult. There is. In addition, by using a polyarylate resin having a specific structure, solubility, solution stability, mechanical strength, and the like can be improved, but there are insufficient electrical properties, particularly responsiveness. Even when a polyarylate copolymer using bis (4-hydroxy-3,5-dimethylphenyl) methane and 2,2-bis (4-hydroxyphenyl) propane is used as the bisphenol component, the mechanical properties are slightly improved. As can be seen, sufficient performance cannot be obtained in terms of electrical characteristics, sensitivity, and responsiveness, and adhesion to the substrate is often insufficient.
Therefore, as a resin used for an electrophotographic photosensitive member, a binder resin having high mechanical strength, high solubility in a solvent, excellent liquid stability, and excellent adhesiveness and responsiveness is desired. Currently.

本発明は、このような課題を解決するためになされたものである。
即ち、本発明の目的は、実用上の負荷に対する耐摩耗性に優れ、高い機械的強度を保ちつつ電気特性に優れ、さらに、感光層形成用塗布液の安定性が高いバインダー樹脂を含有する電子写真感光体を提供することにある。
The present invention has been made to solve such problems.
That is, an object of the present invention is an electron containing a binder resin that has excellent wear resistance against a practical load, excellent electrical characteristics while maintaining high mechanical strength, and high stability of a coating solution for forming a photosensitive layer. It is to provide a photographic photoreceptor.

そこで本発明者等は鋭意検討の結果、感光層に特定の化学構造を有するポリエステル樹脂を含有させることにより、充分な機械的特性を有し、感光層形成用塗布液に用いる溶媒に対して高い溶解性及び優れた塗布液安定性を有し、且つ、電気特性に優れる電子写真感光体を得ることができることを見出し、かかる知見に基づき本発明を完成させるに至った。   Therefore, as a result of intensive studies, the present inventors have sufficient mechanical properties by including a polyester resin having a specific chemical structure in the photosensitive layer, and are higher than the solvent used in the coating solution for forming the photosensitive layer. It has been found that an electrophotographic photosensitive member having solubility and excellent coating solution stability and excellent electrical characteristics can be obtained, and the present invention has been completed based on such knowledge.

即ち、請求項1に係る発明は、導電性支持体と、前記導電性支持体上に形成された感光層と、を有し、前記感光層は、下記式(1)で表される繰り返し構造を有するポリエステル樹脂を含有することを特徴とする電子写真感光体である。   That is, the invention according to claim 1 has a conductive support and a photosensitive layer formed on the conductive support, and the photosensitive layer has a repeating structure represented by the following formula (1). An electrophotographic photosensitive member characterized by containing a polyester resin having

Figure 2008293006
Figure 2008293006

(式(1)中、0.5<{a/(a+b)}<1であり、Aは分子量250以下の2価フェノール残基、Bは2価フェノール残基、Xは下記式(2)に示す構造であり、Yは2価カルボン酸残基である。) (In formula (1), 0.5 <{a / (a + b)} <1, A is a divalent phenol residue having a molecular weight of 250 or less, B is a divalent phenol residue, and X is the following formula (2) And Y is a divalent carboxylic acid residue.)

Figure 2008293006
Figure 2008293006

(式(2)中、R及びRは、各々独立に水素原子、アルキル基、アリール基、ハロゲン基、またはアルコキシ基であり、n,mは、各々独立に0〜4の整数である。) (In Formula (2), R 1 and R 2 are each independently a hydrogen atom, an alkyl group, an aryl group, a halogen group, or an alkoxy group, and n 1 and m 1 are each independently an integer of 0 to 4) .)

請求項2に係る発明は、前記式(1)中のAが、下記式(3)に示す構造であることを特徴とする請求項1に記載の電子写真感光体である。   The invention according to claim 2 is the electrophotographic photosensitive member according to claim 1, wherein A in the formula (1) has a structure represented by the following formula (3).

Figure 2008293006
Figure 2008293006

(式(3)中、Rは水素原子またはアルキル基であり、R及びRは、各々独立にアルキル基である。) (In Formula (3), R 3 is a hydrogen atom or an alkyl group, and R 4 and R 5 are each independently an alkyl group.)

請求項3に係る発明は、前記式(1)中のBが、下記式(4)に示す構造であることを特徴とする請求項1又は2に記載の電子写真感光体である。   The invention according to claim 3 is the electrophotographic photosensitive member according to claim 1 or 2, wherein B in the formula (1) has a structure represented by the following formula (4).

Figure 2008293006
Figure 2008293006

(式(4)中、R及びRは、各々独立に水素原子、アルキル基、または互いに結合して環状構造を形成しても良い置換基であり、R及びRは、各々独立にアルキル基であり、n,mは、各々独立に1〜4の整数である。) (In Formula (4), R 6 and R 7 are each independently a hydrogen atom, an alkyl group, or a substituent that may be bonded to each other to form a cyclic structure, and R 8 and R 9 are each independently And n 2 and m 2 are each independently an integer of 1 to 4.)

請求項4に係る発明は、前記感光層は、さらに下記式(5)で表される化合物を含有することを特徴とする請求項1乃至3いずれか1項に記載の電子写真感光体である。   The invention according to claim 4 is the electrophotographic photoreceptor according to any one of claims 1 to 3, wherein the photosensitive layer further contains a compound represented by the following formula (5). .

Figure 2008293006
Figure 2008293006

(式(5)中、Ar〜Arは各々独立して、置換基を有しても良いアリーレン基または置換基を有しても良い2価の複素環基を表す。m,mは各々独立して0または1を表す。Qは、直接結合または2価の残基を表す。R10〜R17は各々独立して水素原子、置換基を有しても良いアルキル基、置換基を有しても良いアリール基、または置換基を有しても良い複素環基を表す。n〜nは各々独立して0〜4の整数を表す。また、Ar〜Arは互いに結合して環状構造を形成しても良い。) (In Formula (5), Ar 1 to Ar 6 each independently represents an arylene group which may have a substituent or a divalent heterocyclic group which may have a substituent. M 3 , m 4 each independently represents 0 or 1. Q represents a direct bond or a divalent residue, R 10 to R 17 each independently represents a hydrogen atom, an alkyl group which may have a substituent, An aryl group that may have a substituent or a heterocyclic group that may have a substituent, each of n 3 to n 6 independently represents an integer of 0 to 4. Ar 1 to Ar 6 may be bonded to each other to form a ring structure.)

本発明によれば、耐摩耗性等に優れた電子写真感光体が得られる。   According to the present invention, an electrophotographic photoreceptor excellent in wear resistance and the like can be obtained.

以下、本発明を実施するための最良の形態(以下、発明の実施の形態)について詳細に説明する。尚、本発明は、以下の実施の形態に限定されるものではなく、その要旨の範囲内で種々変形して実施することができる。   The best mode for carrying out the present invention (hereinafter, an embodiment of the present invention) will be described in detail below. In addition, this invention is not limited to the following embodiment, It can implement by changing variously within the range of the summary.

(電子写真感光体)
本実施の形態が適用される電子写真感光体は、導電性支持体上に設けた感光層を有し、感光層が、上述した式(1)で表される繰り返し構造を有するポリエステル樹脂を含有するものである。感光層の具体的な構成としては、例えば、導電性支持体上に、電荷発生物質を主成分とする電荷発生層と電荷輸送物質及びバインダー樹脂を主成分とする電荷輸送層とを積層した積層型感光体;導電性支持体上に、電荷輸送物質及びバインダー樹脂を含有する層中に電荷発生物質を分散させた感光層を有する分散型(単層型)感光体等が挙げられる。上述した式(1)で表される繰り返し構造を有するポリエステル樹脂は、通常、電荷輸送物質を含有する層に用いられ、好ましくは積層型感光体の電荷輸送層に用いられる。
(Electrophotographic photoreceptor)
The electrophotographic photosensitive member to which this exemplary embodiment is applied has a photosensitive layer provided on a conductive support, and the photosensitive layer contains a polyester resin having a repeating structure represented by the above formula (1). To do. As a specific configuration of the photosensitive layer, for example, a laminate in which a charge generation layer mainly composed of a charge generation material and a charge transport layer mainly composed of a charge transport material and a binder resin are stacked on a conductive support. Type photoreceptor; a dispersion type (single layer type) photoreceptor having a photosensitive layer in which a charge generating substance is dispersed in a layer containing a charge transport substance and a binder resin on a conductive support. The polyester resin having a repeating structure represented by the above formula (1) is usually used for a layer containing a charge transport material, and preferably used for a charge transport layer of a multilayer photoreceptor.

本実施の形態が適用される電子写真感光体に使用される感光層の具体的な構成としては、例えば、積層型感光体の場合は電荷輸送物質及びバインダー樹脂を含有し、静電荷を保持して露光により発生した電荷を輸送する電荷輸送層と、電荷発生物質を含有し、露光により電荷対を発生する電荷発生層と、を有する。また、その他にも必要に応じて、例えば、導電性支持体からの電荷注入を阻止する電荷阻止層、レーザ光等の光を拡散させて干渉縞の発生を防止する光拡散層等を有する場合がある。分散型(単層型)感光体の場合は、感光層は、電荷移動物質及び電荷発生物質がバインダー樹脂中に分散されている。   As a specific configuration of the photosensitive layer used in the electrophotographic photosensitive member to which the exemplary embodiment is applied, for example, in the case of a laminated type photosensitive member, it contains a charge transport material and a binder resin, and maintains an electrostatic charge. A charge transport layer that transports charges generated by exposure, and a charge generation layer that contains a charge generation material and generates charge pairs by exposure. In addition, if necessary, for example, a charge blocking layer for blocking charge injection from the conductive support, or a light diffusion layer for diffusing light such as laser light to prevent generation of interference fringes, etc. There is. In the case of a dispersion type (single layer type) photoreceptor, a charge transfer material and a charge generation material are dispersed in a binder resin in the photosensitive layer.

(ポリエステル樹脂)
本実施の形態が適用される電子写真感光体の感光層は、下記式(1)で表される繰り返し構造を有するポリエステル樹脂を含有する。
(Polyester resin)
The photosensitive layer of the electrophotographic photoreceptor to which this exemplary embodiment is applied contains a polyester resin having a repeating structure represented by the following formula (1).

Figure 2008293006
Figure 2008293006

式(1)中、Aは分子量250以下の2価フェノール残基である。この2価フェノール残基とは、ポリエステル樹脂を製造する際に原料として用いる2価フェノール化合物の2つの水酸基から2つの水素原子を除いた構造を示している。Aの分子量は250以下であるが、245以下、180以上が特に好ましい。   In the formula (1), A is a divalent phenol residue having a molecular weight of 250 or less. This divalent phenol residue indicates a structure in which two hydrogen atoms are removed from two hydroxyl groups of a divalent phenol compound used as a raw material when producing a polyester resin. The molecular weight of A is 250 or less, but 245 or less and 180 or more are particularly preferable.

式(1)中のAで表される2価フェノール残基を誘導する2価フェノール化合物の具体例としては、4,4’−ビフェノール、3,3’−ジメチル−4,4’−ジヒドロキシ−1,1’−ビフェニル、3,3’,5,5’−テトラメチル−4,4’−ジヒドロキシ−1,1’−ビフェニル、ビス(4−ヒドロキシフェニル)メタン、(2−ヒドロキシフェニル)(4−ヒドロキシフェニル)メタン、ビス(2−ヒドロキシフェニル)メタン、1,1−ビス(4−ヒドロキシフェニル)エタン、2,2−ビス(4−ヒドロキシフェニル)プロパン、ビス(4−ヒドロキシフェニル)ケトン、ビス(4−ヒドロキシフェニル)エーテル、ビス(4−ヒドロキシ−3−メチルフェニル)エーテル、ビス(4−ヒドロキシ−3−メチルフェニル)メタン、1,1−ビス(4−ヒドロキシ−3−メチルフェニル)エタン等が挙げられる。これらの二価フェノール成分は、複数組み合わせて用いることも可能である。
また、前記式(1)中のAが、下記式(3)に示す構造を有する化合物であることが好ましい。
Specific examples of the dihydric phenol compound for deriving the dihydric phenol residue represented by A in the formula (1) include 4,4′-biphenol, 3,3′-dimethyl-4,4′-dihydroxy- 1,1′-biphenyl, 3,3 ′, 5,5′-tetramethyl-4,4′-dihydroxy-1,1′-biphenyl, bis (4-hydroxyphenyl) methane, (2-hydroxyphenyl) ( 4-hydroxyphenyl) methane, bis (2-hydroxyphenyl) methane, 1,1-bis (4-hydroxyphenyl) ethane, 2,2-bis (4-hydroxyphenyl) propane, bis (4-hydroxyphenyl) ketone Bis (4-hydroxyphenyl) ether, bis (4-hydroxy-3-methylphenyl) ether, bis (4-hydroxy-3-methylphenyl) methane, 1,1 Bis (4-hydroxy-3-methylphenyl) ethane and the like. These dihydric phenol components can be used in combination.
Moreover, it is preferable that A in said Formula (1) is a compound which has a structure shown to following formula (3).

Figure 2008293006
Figure 2008293006

式(3)中、Rは水素原子またはアルキル基であり、R及びRは、各々独立にアルキル基である。 In formula (3), R 3 is a hydrogen atom or an alkyl group, and R 4 and R 5 are each independently an alkyl group.

式(3)中のRとしては、例えば、水素原子、炭素数1〜炭素数6のアルキル基が挙げられるが、式(3)で示される2価フェノール残基を誘導する2価フェノール化合物の製造上の簡便性を考慮すれば、Rとして、水素原子、炭素数4以下のアルキル基が好ましく、水素原子、炭素数1のアルキル基(メチル基)が特に好ましい。 Examples of R 3 in the formula (3) include a hydrogen atom and an alkyl group having 1 to 6 carbon atoms, and a divalent phenol compound that derives a divalent phenol residue represented by the formula (3). In view of the simplicity of production, R 3 is preferably a hydrogen atom or an alkyl group having 4 or less carbon atoms, particularly preferably a hydrogen atom or an alkyl group having 1 carbon atom (methyl group).

式(3)のR及びRとしては、炭素数1〜炭素数6のアルキル基が挙げられるが、式(3)で示される2価フェノール残基を誘導する2価フェノール化合物の製造上の簡便性を考慮すれば、Rとして、炭素数4以下のアルキル基が好ましく、炭素数1のアルキル基(メチル基)が特に好ましい。 Examples of R 4 and R 5 in formula (3) include alkyl groups having 1 to 6 carbon atoms, but in the production of a divalent phenol compound that derives a divalent phenol residue represented by formula (3). In view of the simplicity, R 3 is preferably an alkyl group having 4 or less carbon atoms, and particularly preferably an alkyl group having 1 carbon atom (methyl group).

式(3)の具体例としては、ビス(4−ヒドロキシ−3−メチルフェニル)メタン、1,1−ビス(4−ヒドロキシ−3−メチルフェニル)エタン等が挙げられる。これらの二価フェノール成分は、複数組み合わせて用いることも可能である。   Specific examples of formula (3) include bis (4-hydroxy-3-methylphenyl) methane, 1,1-bis (4-hydroxy-3-methylphenyl) ethane, and the like. These dihydric phenol components can be used in combination.

式(1)中、Bは2価フェノール残基である。この2価フェノール残基とは、Aと同様に、ポリエステル樹脂を製造する際に原料として用いる2価フェノール化合物の2つの水酸基から2つの水素原子を除いた構造を示している。2価フェノール残基であればBの構造には特に制限は無く、通常電子写真感光体の感光層を結着するのに用いられる公知の樹脂が有する構造であれば、どのような構造であってもかまわない。
式(1)中のBで表される2価フェノール残基を誘導する2価フェノール化合物の具体例としては、4,4’−ビフェノール、3,3’−ジメチル−4,4’−ジヒドロキシ−1,1’−ビフェニル、3,3’,5,5’−テトラメチル−4,4’−ジヒドロキシ−1,1’−ビフェニル、ビス(4−ヒドロキシフェニル)メタン、(2−ヒドロキシフェニル)(4−ヒドロキシフェニル)メタン、ビス(2−ヒドロキシフェニル)メタン、1,1−ビス(4−ヒドロキシフェニル)エタン、2,2−ビス(4−ヒドロキシフェニル)プロパン、1,1−ビス(4−ヒドロキシフェニル)シクロヘキサン、ビス(4−ヒドロキシフェニル)ケトン、ビス(4−ヒドロキシフェニル)エーテル、ビス(4−ヒドロキシ−3−メチルフェニル)メタン、1,1−ビス(4−ヒドロキシ−3−メチルフェニル)エタン、2,2−ビス(4−ヒドロキシ−3−メチルフェニル)プロパン、1,1−ビス(4−ヒドロキシ−3−メチルフェニル)シクロヘキサン、ビス(4−ヒドロキシ−3−メチルフェニル)エーテル、ビス(4−ヒドロキシ−3,5−ジメチルフェニル)メタン、1,1−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)エタン、2,2−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)プロパン、1,1−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)シクロヘキサン等が挙げられる。これらの二価フェノール成分は、複数組み合わせて用いることも可能である。
また、前記式(1)中のBが、下記式(4)に示す構造を有する化合物であることが好ましい。
In formula (1), B is a divalent phenol residue. This divalent phenol residue, like A, has a structure in which two hydrogen atoms are removed from two hydroxyl groups of a divalent phenol compound used as a raw material when producing a polyester resin. The structure of B is not particularly limited as long as it is a divalent phenol residue, and any structure can be used as long as it is a structure possessed by a known resin usually used for binding a photosensitive layer of an electrophotographic photoreceptor. It doesn't matter.
Specific examples of the dihydric phenol compound for deriving the dihydric phenol residue represented by B in the formula (1) include 4,4′-biphenol, 3,3′-dimethyl-4,4′-dihydroxy- 1,1′-biphenyl, 3,3 ′, 5,5′-tetramethyl-4,4′-dihydroxy-1,1′-biphenyl, bis (4-hydroxyphenyl) methane, (2-hydroxyphenyl) ( 4-hydroxyphenyl) methane, bis (2-hydroxyphenyl) methane, 1,1-bis (4-hydroxyphenyl) ethane, 2,2-bis (4-hydroxyphenyl) propane, 1,1-bis (4- Hydroxyphenyl) cyclohexane, bis (4-hydroxyphenyl) ketone, bis (4-hydroxyphenyl) ether, bis (4-hydroxy-3-methylphenyl) methane, -Bis (4-hydroxy-3-methylphenyl) ethane, 2,2-bis (4-hydroxy-3-methylphenyl) propane, 1,1-bis (4-hydroxy-3-methylphenyl) cyclohexane, bis ( 4-hydroxy-3-methylphenyl) ether, bis (4-hydroxy-3,5-dimethylphenyl) methane, 1,1-bis (4-hydroxy-3,5-dimethylphenyl) ethane, 2,2-bis (4-hydroxy-3,5-dimethylphenyl) propane, 1,1-bis (4-hydroxy-3,5-dimethylphenyl) cyclohexane and the like can be mentioned. These dihydric phenol components can be used in combination.
Moreover, it is preferable that B in the said Formula (1) is a compound which has a structure shown in following formula (4).

Figure 2008293006
Figure 2008293006

式(4)中、R及びRは、各々独立に水素原子、アルキル基、または互いに結合して環状構造を形成しても良い置換基であり、R及びRは、各々独立にアルキル基であり、n,mは、各々独立に1〜4の整数である。 In formula (4), R 6 and R 7 are each independently a hydrogen atom, an alkyl group, or a substituent that may be bonded to each other to form a cyclic structure, and R 8 and R 9 are each independently An alkyl group, and n 2 and m 2 are each independently an integer of 1 to 4;

式(4)中のR及びRとしては、水素原子、炭素数1〜炭素数6のアルキル基、または互いに結合したシクロヘキサン環が挙げられる。式(4)で示される2価フェノール残基を誘導する2価フェノール化合物の製造上の簡便性を考慮すれば、R及びRとして、水素原子、炭素数4以下のアルキル基、または互いに結合したシクロヘキサン環が好ましく、水素原子、炭素数1のアルキル基(メチル基)、または互いに結合したシクロヘキサン環が特に好ましい。 Examples of R 6 and R 7 in formula (4) include a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a cyclohexane ring bonded to each other. In consideration of the convenience in production of the dihydric phenol compound derived from the dihydric phenol residue represented by the formula (4), R 6 and R 7 may be a hydrogen atom, an alkyl group having 4 or less carbon atoms, or A bonded cyclohexane ring is preferable, and a hydrogen atom, an alkyl group having 1 carbon atom (methyl group), or a cyclohexane ring bonded to each other is particularly preferable.

式(4)中のR及びRとしては、炭素数1〜炭素数6のアルキル基が挙げられる。式(4)で示される2価フェノール残基を誘導する2価フェノール化合物の製造上の簡便性を考慮すれば、R及びRとして、炭素数4以下のアルキル基が好ましく、炭素数1のアルキル基(メチル基)が特に好ましい。 As R < 8 > and R < 9 > in Formula (4), a C1-C6 alkyl group is mentioned. In view of the convenience in production of the dihydric phenol compound for deriving the dihydric phenol residue represented by the formula (4), R 8 and R 9 are preferably alkyl groups having 4 or less carbon atoms, The alkyl group (methyl group) is particularly preferable.

式(4)中のn,mは、各々独立に1〜4の整数である。式(4)で示される2価フェノール残基を誘導する2価フェノール化合物の製造上の簡便性を考慮すれば、n,mとして好ましくは2以下であり、特に好ましくは1である。 N 2 and m 2 in the formula (4) are each independently an integer of 1 to 4. Considering the convenience in production of the dihydric phenol compound for deriving the dihydric phenol residue represented by the formula (4), n 2 and m 2 are preferably 2 or less, particularly preferably 1.

式(4)の具体例としては、ビス(4−ヒドロキシ−3−メチルフェニル)メタン、1,1−ビス(4−ヒドロキシ−3−メチルフェニル)エタン、2,2−ビス(4−ヒドロキシ−3−メチルフェニル)プロパン、ビス(4−ヒドロキシ−3,5−ジメチルフェニル)メタン、1,1−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)エタン、2,2−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)プロパン、1,1−ビス(4−ヒドロキシ−3−メチルフェニル)シクロヘキサン、1,1−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)シクロヘキサン等が挙げられる。これらの2価フェノール成分は、複数組み合わせて用いることも可能である。
式(1)中のXは、下記式(2)に示す構造を有する2価カルボン酸残基である。
Specific examples of the formula (4) include bis (4-hydroxy-3-methylphenyl) methane, 1,1-bis (4-hydroxy-3-methylphenyl) ethane, 2,2-bis (4-hydroxy- 3-methylphenyl) propane, bis (4-hydroxy-3,5-dimethylphenyl) methane, 1,1-bis (4-hydroxy-3,5-dimethylphenyl) ethane, 2,2-bis (4-hydroxy) -3,5-dimethylphenyl) propane, 1,1-bis (4-hydroxy-3-methylphenyl) cyclohexane, 1,1-bis (4-hydroxy-3,5-dimethylphenyl) cyclohexane and the like. These dihydric phenol components can be used in combination.
X in the formula (1) is a divalent carboxylic acid residue having a structure represented by the following formula (2).

Figure 2008293006
Figure 2008293006

式(2)中、R及びRは、各々独立に水素原子、アルキル基、アリール基、ハロゲン基、またはアルコキシ基であり、n,mは、各々独立に0〜4の整数である。 In Formula (2), R 1 and R 2 are each independently a hydrogen atom, an alkyl group, an aryl group, a halogen group, or an alkoxy group, and n 1 and m 1 are each independently an integer of 0 to 4. is there.

式(2)中のR及びRとしては、例えば、水素原子、炭素数1〜炭素数6のアルキル基;フェニル基、ナフチル基等のアリール基;フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン基;メトキシ基、エトキシ基、ブトキシ基等のアルコキシ基等が挙げられる。式(2)で示される2価カルボン酸残基を誘導する2価カルボン酸化合物の製造上の簡便性を考慮すれば、R及びRは、水素原子、炭素数1のアルキル基(メチル基)が特に好ましい。 Examples of R 1 and R 2 in formula (2) include a hydrogen atom, an alkyl group having 1 to 6 carbon atoms; an aryl group such as a phenyl group and a naphthyl group; a fluorine atom, a chlorine atom, a bromine atom, and iodine. Halogen groups such as atoms; alkoxy groups such as methoxy, ethoxy and butoxy groups. In view of the convenience in the production of the divalent carboxylic acid compound derived from the divalent carboxylic acid residue represented by the formula (2), R 1 and R 2 are a hydrogen atom, an alkyl group having 1 carbon atom (methyl Group) is particularly preferred.

,mは各々独立に、0〜4の整数であり、特に好ましくは、n=m=0である。
式(2)で示される2価カルボン酸残基を誘導する2価カルボン酸化合物の具体例としては、例えば、ジフェニルエーテル−2,2’−ジカルボン酸、ジフェニルエーテル−2,4’−ジカルボン酸、ジフェニルエーテル−4,4’−ジカルボン酸等が挙げられる。これらの中でも、製造上の簡便性を考慮すれば、ジフェニルエーテル−4,4’−ジカルボン酸が特に好ましい。これらの式(2)として例示した化合物は、必要に応じて複数の化合物を組み合わせて用いることも可能である。
n 1 and m 1 are each independently an integer of 0 to 4, and particularly preferably n 1 = m 1 = 0.
Specific examples of the divalent carboxylic acid compound derived from the divalent carboxylic acid residue represented by the formula (2) include, for example, diphenyl ether-2,2′-dicarboxylic acid, diphenyl ether-2,4′-dicarboxylic acid, diphenyl ether Examples include -4,4'-dicarboxylic acid. Among these, diphenyl ether-4,4′-dicarboxylic acid is particularly preferable in view of convenience in production. These compounds exemplified as the formula (2) can be used in combination with a plurality of compounds as necessary.

式(1)中のYは2価カルボン酸残基である。Yを誘導する2価カルボン酸化合物の具体例としては、例えば、アジピン酸、スベリン酸、セバシン酸、フタル酸、イソフタル酸、テレフタル酸、トルエン−2,5−ジカルボン酸、p−キシレン−2,5−ジカルボン酸、ピリジン−2,3−ジカルボン酸、ピリジン−2,4−ジカルボン酸、ピリジン−2,5−ジカルボン酸、ピリジン−2,6−ジカルボン酸、ピリジン−3,4−ジカルボン酸、ピリジン−3,5−ジカルボン酸、ナフタレン−1,4−ジカルボン酸、ナフタレン−2,3−ジカルボン酸、ナフタレン−2,6−ジカルボン酸、ビフェニル−2,2’−ジカルボン酸、ビフェニル−4,4’−ジカルボン酸、ジフェニルエーテル−2,2’−ジカルボン酸、ジフェニルエーテル−2,3’−ジカルボン酸、ジフェニルエーテル−2,4’−ジカルボン酸、ジフェニルエーテル−3,3’−ジカルボン酸、ジフェニルエーテル−3,4’−ジカルボン酸、ジフェニルエーテル−4,4’−ジカルボン酸が挙げられる。ジカルボン酸成分の製造の簡便性を考慮すれば、イソフタル酸、テレフタル酸、ジフェニルエーテル−4,4’−ジカルボン酸が特に好ましい。これらの式(1)中のYとして例示した化合物は、必要に応じて複数の化合物を組み合わせて用いることも可能である。   Y in Formula (1) is a divalent carboxylic acid residue. Specific examples of the divalent carboxylic acid compound that induces Y include, for example, adipic acid, suberic acid, sebacic acid, phthalic acid, isophthalic acid, terephthalic acid, toluene-2,5-dicarboxylic acid, p-xylene-2, 5-dicarboxylic acid, pyridine-2,3-dicarboxylic acid, pyridine-2,4-dicarboxylic acid, pyridine-2,5-dicarboxylic acid, pyridine-2,6-dicarboxylic acid, pyridine-3,4-dicarboxylic acid, Pyridine-3,5-dicarboxylic acid, naphthalene-1,4-dicarboxylic acid, naphthalene-2,3-dicarboxylic acid, naphthalene-2,6-dicarboxylic acid, biphenyl-2,2′-dicarboxylic acid, biphenyl-4, 4′-dicarboxylic acid, diphenyl ether-2,2′-dicarboxylic acid, diphenyl ether-2,3′-dicarboxylic acid, diphenyl ether Ether 2,4'-dicarboxylic acid, diphenyl ether-3,3'-dicarboxylic acid, diphenyl ether-3,4'-dicarboxylic acid, diphenyl ether-4,4'-dicarboxylic acid. Considering the simplicity of production of the dicarboxylic acid component, isophthalic acid, terephthalic acid, and diphenyl ether-4,4'-dicarboxylic acid are particularly preferable. The compounds exemplified as Y in these formulas (1) can be used in combination of a plurality of compounds as necessary.

尚、本実施の形態が適用される電子写真感光体における感光層には、前述した式(1)で表される繰り返し構造を有するポリエステル樹脂と他の樹脂とを混合して用いることも可能である。ここで混合される他の樹脂としては、例えば、ポリメチルメタクリレート、ポリスチレン、ポリ塩化ビニル等のビニル重合体またはその共重合体;ポリカーボネート樹脂、ポリエステル樹脂、ポリエステルポリカーボネート樹脂、ポリスルホン樹脂、フェノキシ樹脂、エポキシ樹脂、シリコーン樹脂等の熱可塑性樹脂または種々の熱硬化性樹脂等が挙げられる。これら樹脂のなかでもポリカーボネート樹脂とポリエステル樹脂が好ましい。また、併用する樹脂の混合割合は、特に限定されないが、通常、式(1)で表される繰り返し構造を有するポリエステル樹脂の割合を超えない範囲で併用することが好ましい。   The photosensitive layer in the electrophotographic photoreceptor to which the exemplary embodiment is applied can be used by mixing a polyester resin having a repeating structure represented by the above-described formula (1) with another resin. is there. Other resins mixed here include, for example, vinyl polymers such as polymethyl methacrylate, polystyrene, and polyvinyl chloride or copolymers thereof; polycarbonate resin, polyester resin, polyester polycarbonate resin, polysulfone resin, phenoxy resin, epoxy Examples thereof include thermoplastic resins such as resins and silicone resins, and various thermosetting resins. Of these resins, polycarbonate resins and polyester resins are preferred. Moreover, the mixing ratio of the resin to be used in combination is not particularly limited, but it is usually preferable to use the resin in a range not exceeding the ratio of the polyester resin having the repeating structure represented by the formula (1).

式(1)で表される繰り返し構造を有するポリエステル樹脂の粘度平均分子量(Mv)は、通常、10,000〜300,000、好ましくは、20,000〜200,000、特に好ましくは、25,000〜150,000の範囲である。粘度平均分子量(Mv)が過度に小さい場合、感光体を形成する等の膜として得たときの機械的強度が低下する傾向がある。また、粘度平均分子量(Mv)が過度に大きい場合は、塗布液としての粘度が上昇し、適当な膜厚に塗布することが困難になる傾向がある。   The viscosity average molecular weight (Mv) of the polyester resin having a repeating structure represented by the formula (1) is usually 10,000 to 300,000, preferably 20,000 to 200,000, particularly preferably 25, The range is from 000 to 150,000. When the viscosity average molecular weight (Mv) is excessively small, the mechanical strength when obtained as a film for forming a photoconductor tends to decrease. Moreover, when a viscosity average molecular weight (Mv) is too large, the viscosity as a coating liquid rises and it tends to become difficult to apply | coat to a suitable film thickness.

(ポリエステル樹脂の製造方法)
次に、本実施の形態が適用される電子写真感光体に使用する式(1)で表される繰り返し構造を有するポリエステル樹脂の製造方法について説明する。ポリエステル樹脂の製造方法としては、例えば、界面重合法、溶融重合法、溶液重合法等の公知の重合方法を用いることができる。ここでポリエステル樹脂の製造法の一例を説明する。
(Production method of polyester resin)
Next, the manufacturing method of the polyester resin which has a repeating structure represented by Formula (1) used for the electrophotographic photosensitive member to which this Embodiment is applied is demonstrated. As a method for producing the polyester resin, for example, a known polymerization method such as an interfacial polymerization method, a melt polymerization method, or a solution polymerization method can be used. Here, an example of the manufacturing method of a polyester resin is demonstrated.

界面重合法による製造の場合は、例えば、2価フェノール化合物をアルカリ水溶液に溶解した溶液と、芳香族ジカルボン酸クロライド化合物を溶解したハロゲン化炭化水素の溶液とを混合する。この際、触媒として、4級アンモニウム塩もしくは4級ホスホニウム塩を存在させることも可能である。重合温度は0℃〜40℃の範囲、重合時間は2時間〜20時間の範囲であるのが生産性の点で好ましい。重合終了後、水相と有機相とを分離し、有機相中に溶解しているポリマーを公知の方法で、洗浄、回収することにより、目的とする樹脂が得られる。   In the case of production by the interfacial polymerization method, for example, a solution in which a dihydric phenol compound is dissolved in an alkaline aqueous solution and a halogenated hydrocarbon solution in which an aromatic dicarboxylic acid chloride compound is dissolved are mixed. In this case, a quaternary ammonium salt or a quaternary phosphonium salt can be present as a catalyst. The polymerization temperature is preferably in the range of 0 ° C. to 40 ° C., and the polymerization time is preferably in the range of 2 hours to 20 hours from the viewpoint of productivity. After the completion of the polymerization, the water phase and the organic phase are separated, and the polymer dissolved in the organic phase is washed and recovered by a known method to obtain the intended resin.

界面重合法で用いられるアルカリ成分としては、例えば、水酸化ナトリウム、水酸化カリウム等のアルカリ金属の水酸化物等を挙げることができる。アルカリ成分の使用量としては、反応系中に含まれるフェノール性水酸基の1.01倍当量〜3倍当量の範囲が好ましい。   Examples of the alkali component used in the interfacial polymerization method include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide. As the usage-amount of an alkali component, the range of 1.01 times equivalent-3 times equivalent of the phenolic hydroxyl group contained in a reaction system is preferable.

ハロゲン化炭化水素としては、例えば、ジクロロメタン、クロロホルム、1,2−ジクロロエタン、トリクロロエタン、テトラクロロエタン、ジクロロベンゼン等が挙げられる。   Examples of the halogenated hydrocarbon include dichloromethane, chloroform, 1,2-dichloroethane, trichloroethane, tetrachloroethane, dichlorobenzene, and the like.

触媒として用いられる4級アンモニウム塩もしくは4級ホスホニウム塩としては、例えば、トリブチルアミンやトリオクチルアミン等の3級アルキルアミンの塩酸、臭素酸、ヨウ素酸等の塩;ベンジルトリエチルアンモニウムクロライド、ベンジルトリメチルアンモニウムクロライド、ベンジルトリブチルアンモニウムクロライド、テトラエチルアンモニウムクロライド、テトラブチルアンモニウムクロライド、テトラブチルアンモニウムブロマイド、トリオクチルメチルアンモニウムクロライド、テトラブチルホスホニウムブロマイド、トリエチルオクタデシルホスホニウムブロマイド、N−ラウリルピリジニウムクロライド、ラウリルピコリニウムクロライド等が挙げられる。   Examples of the quaternary ammonium salt or quaternary phosphonium salt used as the catalyst include, for example, salts of tertiary alkylamines such as tributylamine and trioctylamine such as hydrochloric acid, bromic acid and iodic acid; benzyltriethylammonium chloride, benzyltrimethylammonium Examples include chloride, benzyltributylammonium chloride, tetraethylammonium chloride, tetrabutylammonium chloride, tetrabutylammonium bromide, trioctylmethylammonium chloride, tetrabutylphosphonium bromide, triethyloctadecylphosphonium bromide, N-laurylpyridinium chloride, laurylpicolinium chloride It is done.

また、界面重合法では、分子量調節剤を使用することができる。分子量調節剤としては、例えば、フェノール、o,m,p−クレゾール、o,m,p−エチルフェノール、o,m,p−プロピルフェノール、o,m,p−(tert−ブチル)フェノール、ペンチルフェノール、ヘキシルフェノール、オクチルフェノール、ノニルフェノール、2,6−ジメチルフェノール誘導体、2−メチルフェノール誘導体等のアルキルフェノール類;o,m,p−フェニルフェノール等の1官能性のフェノール;酢酸クロライド、酪酸クロライド、オクチル酸クロライド、塩化ベンゾイル、ベンゼンスルホニルクロライド、ベンゼンスルフィニルクロライド、スルフィニルクロライド、ベンゼンホスホニルクロライドやそれらの置換体等の1官能性酸ハロゲン化物等が挙げられる。これら分子量調節剤の中でも、分子量調節能が高く、かつ溶液安定性の点で好ましいのは、o,m,p−(tert−ブチル)フェノール、2,6−ジメチルフェノール誘導体、2−メチルフェノール誘導体である。特に好ましくは、p−(tert−ブチル)フェノール、2,3,6−トリメチルフェノール、2,3,5−トリメチルフェノールである。   In the interfacial polymerization method, a molecular weight regulator can be used. Examples of the molecular weight regulator include phenol, o, m, p-cresol, o, m, p-ethylphenol, o, m, p-propylphenol, o, m, p- (tert-butyl) phenol, and pentyl. Alkylphenols such as phenol, hexylphenol, octylphenol, nonylphenol, 2,6-dimethylphenol derivatives, 2-methylphenol derivatives; monofunctional phenols such as o, m, p-phenylphenol; acetic acid chloride, butyric acid chloride, octyl Examples thereof include monofunctional acid halides such as acid chloride, benzoyl chloride, benzenesulfonyl chloride, benzenesulfinyl chloride, sulfinyl chloride, benzenephosphonyl chloride and substituted products thereof. Among these molecular weight regulators, o, m, p- (tert-butyl) phenol, 2,6-dimethylphenol derivatives, 2-methylphenol derivatives are preferred because of their high molecular weight controllability and solution stability. It is. Particularly preferred are p- (tert-butyl) phenol, 2,3,6-trimethylphenol, and 2,3,5-trimethylphenol.

(導電性支持体)
本実施の形態が適用される電子写真感光体に使用される導電性支持体の材料としては、例えば、アルミニウム、アルミニウム合金、ステンレス鋼、銅、ニッケル等の金属材料;金属、カーボン、酸化スズ等の導電性粉体を添加して導電性を付与した樹脂材料;アルミニウム、ニッケル、ITO(インジウム−スズ酸化物)等の導電性材料をその表面に蒸着又は塗布した樹脂、ガラス、紙等が挙げられる。
(Conductive support)
Examples of the material for the conductive support used in the electrophotographic photosensitive member to which this embodiment is applied include metal materials such as aluminum, aluminum alloy, stainless steel, copper, and nickel; metal, carbon, tin oxide, and the like. Resin material to which conductivity is imparted by adding conductive powder; resin, glass, paper, etc. deposited or coated with a conductive material such as aluminum, nickel, ITO (indium-tin oxide) on its surface It is done.

導電性支持体の形態としては、例えば、ドラム状、シート状、ベルト状等が挙げられる。また、金属材料を用いた導電性支持体の上に、導電性・表面性等の制御または欠陥被覆等を目的として、適当な抵抗値を有する導電性材料を塗布したものでも良い。   Examples of the form of the conductive support include a drum shape, a sheet shape, and a belt shape. Alternatively, a conductive material having an appropriate resistance value may be coated on a conductive support using a metal material for the purpose of controlling conductivity, surface properties, etc. or covering defects.

導電性支持体としてアルミニウム合金等の金属材料を用いる場合、予め、陽極酸化処理、化成皮膜処理等を施しても良い。尚、陽極酸化処理を施す場合には、公知の方法により封孔処理を施すのが望ましい。   When a metal material such as an aluminum alloy is used as the conductive support, anodization treatment, chemical conversion film treatment, or the like may be performed in advance. In addition, when performing an anodizing process, it is desirable to perform a sealing process by a well-known method.

導電性支持体の表面は、平滑であっても良いし、特別な切削方法または研磨処理により、または、導電性支持体を構成する材料に適当な粒径の粒子を混合することによって、粗面化されたものでも良い。また、安価化のためには、切削処理を施さず、引き抜き管をそのまま使用することも可能である。   The surface of the conductive support may be smooth, or may be roughened by a special cutting method or polishing treatment, or by mixing particles having an appropriate particle size with the material constituting the conductive support. It may be a simplified one. In order to reduce the cost, it is possible to use the drawing tube as it is without performing the cutting process.

(下引き層)
本実施の形態が適用される電子写真感光体は、導電性支持体と感光層との間に、接着性・ブロッキング性等の改善のため、下引き層を設けても良い。下引き層としては、例えば、樹脂、樹脂に金属酸化物等の粒子を分散したもの等が用いられる。下引き層に用いる金属酸化物粒子の例としては、例えば、酸化チタン、酸化アルミニウム、酸化ケイ素、酸化ジルコニウム、酸化亜鉛、酸化鉄等の1種の金属元素を含む金属酸化物粒子、チタン酸カルシウム、チタン酸ストロンチウム、チタン酸バリウム等の複数の金属元素を含む金属酸化物粒子等が挙げられる。これらの金属酸化物粒子は、1種類の粒子のみを用いても良いし、複数の種類の粒子を混合して用いても良い。
(Undercoat layer)
In the electrophotographic photosensitive member to which this exemplary embodiment is applied, an undercoat layer may be provided between the conductive support and the photosensitive layer in order to improve adhesion and blocking properties. As the undercoat layer, for example, a resin, a resin in which particles such as a metal oxide are dispersed, or the like is used. Examples of the metal oxide particles used for the undercoat layer include, for example, metal oxide particles containing one metal element such as titanium oxide, aluminum oxide, silicon oxide, zirconium oxide, zinc oxide, iron oxide, and calcium titanate. And metal oxide particles containing a plurality of metal elements such as strontium titanate and barium titanate. As these metal oxide particles, only one type of particle may be used, or a plurality of types of particles may be mixed and used.

これらの中でも、酸化チタン及び酸化アルミニウムが好ましく、特に酸化チタンが好ましい。酸化チタン粒子は、その表面に、酸化スズ、酸化アルミニウム、酸化アンチモン、酸化ジルコニウム、酸化ケイ素等の無機物、又はステアリン酸、ポリオール、シリコーン等の有機物による処理を施されていても良い。酸化チタン粒子の結晶型としては、ルチル、アナターゼ、ブルックカイト、アモルファスのいずれも用いることができる。複数の結晶状態のものが含まれていても良い。また、金属酸化物粒子の粒径としては、種々のものが利用できるが、中でも特性及び液の安定性の面から、平均1次粒径として10nm以上、100nm以下が好ましく、特に好ましいのは、10nm以上、50nm以下である。   Among these, titanium oxide and aluminum oxide are preferable, and titanium oxide is particularly preferable. The surface of the titanium oxide particles may be treated with an inorganic substance such as tin oxide, aluminum oxide, antimony oxide, zirconium oxide, or silicon oxide, or an organic substance such as stearic acid, polyol, or silicone. As the crystal form of the titanium oxide particles, any of rutile, anatase, brookite, and amorphous can be used. A thing of a several crystalline state may be contained. In addition, various particle diameters of the metal oxide particles can be used. Among these, from the viewpoint of characteristics and liquid stability, the average primary particle diameter is preferably 10 nm or more and 100 nm or less, and particularly preferably It is 10 nm or more and 50 nm or less.

下引き層は、金属酸化物粒子をバインダー樹脂に分散した形で形成するのが望ましい。下引き層に用いられるバインダー樹脂としては、フェノキシ樹脂、エポキシ樹脂、ポリビニルピロリドン樹脂、ポリビニルアルコール樹脂、カゼイン、ポリアクリル酸樹脂、セルロース類、ゼラチン、デンプン、ポリウレタン樹脂、ポリイミド樹脂、ポリアミド樹脂等が単独あるいは硬化剤とともに硬化した形で使用できる。これらの中でも、アルコール可溶性の共重合ポリアミド、変性ポリアミド等は、良好な分散性、塗布性を示し好ましい。   The undercoat layer is preferably formed in a form in which metal oxide particles are dispersed in a binder resin. The binder resin used for the undercoat layer is phenoxy resin, epoxy resin, polyvinyl pyrrolidone resin, polyvinyl alcohol resin, casein, polyacrylic resin, celluloses, gelatin, starch, polyurethane resin, polyimide resin, polyamide resin, etc. alone Alternatively, it can be used in a cured form together with a curing agent. Among these, alcohol-soluble copolymerized polyamide, modified polyamide, and the like are preferable because they exhibit good dispersibility and coating properties.

バインダー樹脂に対する金属酸化物粒子の配合組成比は、特に限定されないが、通常、10重量%〜500重量%の範囲で使用することが、分散液の安定性、塗布性の面で好ましい。尚、下引き層の膜厚は、特に限定されないが、感光体特性及び塗布性から0.1μm〜20μmが好ましい。また、下引き層には、公知の酸化防止剤等を添加しても良い。   The compounding composition ratio of the metal oxide particles with respect to the binder resin is not particularly limited, but it is usually preferable in the range of 10% by weight to 500% by weight in terms of stability of the dispersion and coatability. The thickness of the undercoat layer is not particularly limited, but is preferably 0.1 μm to 20 μm in view of the photoreceptor characteristics and applicability. Further, a known antioxidant or the like may be added to the undercoat layer.

(感光層)
本実施の形態が適用される電子写真感光体の感光層に含有される他の成分について説明する。
(Photosensitive layer)
Other components contained in the photosensitive layer of the electrophotographic photoreceptor to which the exemplary embodiment is applied will be described.

(電荷発生層)
本実施の形態が適用される電子写真感光体が積層型感光体である場合、感光層を構成する電荷発生層には電荷発生物質が含有される。電荷発生物質としては、例えば、セレニウム及びその合金、硫化カドミウム、その他無機系光導電材料;フタロシアニン顔料、アゾ顔料、キナクリドン顔料、インジゴ顔料、ペリレン顔料、多環キノン顔料、アントアントロン顔料、ベンズイミダゾール顔料等の有機顔料等の各種光導電材料が挙げられる。これらの中でも、特に、有機顔料、更に、フタロシアニン顔料、アゾ顔料が好ましい。
(Charge generation layer)
When the electrophotographic photosensitive member to which the exemplary embodiment is applied is a laminated type photosensitive member, the charge generating layer constituting the photosensitive layer contains a charge generating substance. Examples of charge generation materials include selenium and its alloys, cadmium sulfide, and other inorganic photoconductive materials; phthalocyanine pigments, azo pigments, quinacridone pigments, indigo pigments, perylene pigments, polycyclic quinone pigments, anthanthrone pigments, benzimidazole pigments And various photoconductive materials such as organic pigments. Among these, organic pigments, phthalocyanine pigments, and azo pigments are particularly preferable.

これらの電荷発生層物質の微粒子は、例えば、ポリビニルアセテート、ポリアクリル酸エステル、ポリメタクリル酸エステル、ポリエステル、ポリカーボネート、ポリビニルアセトアセタール、ポリビニルプロピオナール、ポリビニルブチラール、フェノキシ樹脂、エポキシ樹脂、ウレタン樹脂、セルロースエステル、セルロースエーテル等の各種バインダー樹脂で結着した形で使用される。   The fine particles of these charge generation layer materials are, for example, polyvinyl acetate, polyacrylate, polymethacrylate, polyester, polycarbonate, polyvinyl acetoacetal, polyvinyl propional, polyvinyl butyral, phenoxy resin, epoxy resin, urethane resin, cellulose. Used in a form bound with various binder resins such as esters and cellulose ethers.

電荷発生物質の使用量は、特に限定されないが、通常、バインダー樹脂100重量部に対して30重量部〜500重量部の範囲で使用される。尚、電荷発生層の膜厚は、通常、0.1μm〜1μm、好ましくは、0.15μm〜0.6μmが好適である。   Although the usage-amount of a charge generation substance is not specifically limited, Usually, it is used in 30 weight part-500 weight part with respect to 100 weight part of binder resin. The thickness of the charge generation layer is usually 0.1 μm to 1 μm, preferably 0.15 μm to 0.6 μm.

電荷発生物質としてフタロシアニン化合物を使用する場合、具体的には、無金属フタロシアニン、銅、インジウム、ガリウム、スズ、チタン、亜鉛、バナジウム、シリコン、ゲルマニウム等の金属またはその酸化物、ハロゲン化物等の配位したフタロシアニン類が使用される。   When a phthalocyanine compound is used as the charge generation material, specifically, a metal such as metal-free phthalocyanine, copper, indium, gallium, tin, titanium, zinc, vanadium, silicon, germanium, or an oxide or halide thereof. Phthalocyanines are used.

3価以上の金属原子への配位子の例としては、酸素原子、塩素原子の他、水酸基、アルコキシ基等が挙げられる。特に、感度の高いX型、τ型無金属フタロシアニン、A型、B型、D型等のチタニルフタロシアニン、バナジルフタロシアニン、クロロインジウムフタロシアニン、クロロガリウムフタロシアニン、ヒドロキシガリウムフタロシアニン等が好適である。   Examples of the ligand to a trivalent or higher metal atom include an oxygen atom, a chlorine atom, a hydroxyl group, an alkoxy group, and the like. In particular, highly sensitive X-type, τ-type metal-free phthalocyanine, A-type, B-type, D-type titanyl phthalocyanine, vanadyl phthalocyanine, chloroindium phthalocyanine, chlorogallium phthalocyanine, hydroxygallium phthalocyanine, and the like are suitable.

尚、ここで挙げたチタニルフタロシアニンの結晶型のうち、A型、B型については、W.HellerらによってそれぞれI相、II相として示されており(Zeit.Kristallogr.159(1982)173)、A型は安定型として知られているものである。D型は、CuKα線を用いた粉末X線回折において、回折角2θ±0.2°が27.3°に明瞭なピークを示す結晶型である。フタロシアニン化合物は単一の化合物のみを用いても良いし、いくつかの混合状態でも良い。ここでのフタロシアニン化合物または結晶状態における混合状態として、それぞれの構成要素を後から混合して用いても良いし、合成、顔料化、結晶化等のフタロシアニン化合物の製造・処理工程において混合状態を生じさせたものでも良い。このような処理としては、酸ペースト処理・磨砕処理・溶剤処理等が知られている。   Of the crystal forms of titanyl phthalocyanine mentioned here, A type and B type are described in W.W. It has been shown by Heller et al. As phase I and phase II, respectively (Zeit. Kristallogr. 159 (1982) 173), and type A is known as a stable type. The D type is a crystal type showing a clear peak at a diffraction angle 2θ ± 0.2 ° of 27.3 ° in powder X-ray diffraction using CuKα rays. As the phthalocyanine compound, only a single compound may be used, or several mixed states may be used. As the mixed state in the phthalocyanine compound or the crystalline state here, the respective constituent elements may be mixed and used later, or a mixed state is generated in the production / treatment process of the phthalocyanine compound such as synthesis, pigmentation, and crystallization. It can also be a As such treatment, acid paste treatment, grinding treatment, solvent treatment and the like are known.

(電荷輸送層)
本実施の形態が適用される電子写真感光体が積層型感光体である場合、感光層を構成する電荷輸送層には電荷輸送物質が含有される。電荷輸送物質としては、例えば、2,4,7−トリニトロフルオレノン等の芳香族ニトロ化合物;テトラシアノキノジメタン等のシアノ化合物;ジフェノキノン等のキノン類等の電子吸引性物質;カルバゾール誘導体、インドール誘導体、イミダゾール誘導体、オキサゾール誘導体、ピラゾール誘導体、オキサジアゾール誘導体、ピラゾリン誘導体、チアジアゾール誘導体等の複素環化合物;アニリン誘導体、ヒドラゾン誘導体、芳香族アミン誘導体、スチルベン誘導体、ブタジエン誘導体、エナミン化合物またはこれらの化合物が複数結合されたもの;あるいはこれらの化合物からなる基を主鎖もしくは側鎖に有する重合体等の電子供与性物質が挙げられる。これらの中でも、カルバゾール誘導体、ヒドラゾン誘導体、芳香族アミン誘導体、スチルベン誘導体、ブタジエン誘導体及びこれらの誘導体が複数結合されたものが好ましく、芳香族アミン誘導体、スチルベン誘導体、ブタジエン誘導体の複数結合されてなるものが好ましい。
電荷輸送物質のなかでも、下記式(5)で表される構造を有する化合物が好ましく用いられる。
(Charge transport layer)
When the electrophotographic photosensitive member to which this exemplary embodiment is applied is a laminated type photosensitive member, the charge transporting layer constituting the photosensitive layer contains a charge transporting substance. Examples of charge transport materials include aromatic nitro compounds such as 2,4,7-trinitrofluorenone; cyano compounds such as tetracyanoquinodimethane; electron-withdrawing materials such as quinones such as diphenoquinone; carbazole derivatives, indoles Heterocyclic compounds such as derivatives, imidazole derivatives, oxazole derivatives, pyrazole derivatives, oxadiazole derivatives, pyrazoline derivatives, thiadiazole derivatives; aniline derivatives, hydrazone derivatives, aromatic amine derivatives, stilbene derivatives, butadiene derivatives, enamine compounds or these compounds Or an electron donating substance such as a polymer having a group consisting of these compounds in the main chain or side chain. Among these, a carbazole derivative, a hydrazone derivative, an aromatic amine derivative, a stilbene derivative, a butadiene derivative, and a combination of these derivatives are preferable, and a combination of an aromatic amine derivative, a stilbene derivative, and a butadiene derivative is combined. Is preferred.
Among charge transport materials, compounds having a structure represented by the following formula (5) are preferably used.

Figure 2008293006
Figure 2008293006

式(5)中、Ar〜Arは各々独立して、置換基を有しても良いアリーレン基または置換基を有しても良い2価の複素環基を表す。m,mは各々独立して0または1を表す。m=0の場合のAr,m=0の場合のArは、それぞれ置換基を有しても良いアルキル基、置換基を有しても良いアリール基、または置換基を有しても良い1価の複素環基である。m=1の場合のAr,m=1の場合のArは、それぞれ置換基を有しても良いアルキレン基、置換基を有しても良いアリーレン基、または置換基を有しても良い2価の複素環基を表す。Qは、直接結合または2価の残基を表す。R10〜R17は各々独立して水素原子、置換基を有しても良いアルキル基、置換基を有しても良いアリール基、または置換基を有しても良い複素環基を表す。n〜nは各々独立して0〜4の整数を表す。また、Ar〜Arは互いに結合して環状構造を形成しても良い。 In formula (5), Ar 1 to Ar 6 each independently represents an arylene group which may have a substituent or a divalent heterocyclic group which may have a substituent. m 3 and m 4 each independently represents 0 or 1. Ar 5 in the case of m 3 = 0 and Ar 6 in the case of m 4 = 0 each have an alkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. It may be a monovalent heterocyclic group. Ar 5 in the case of m 3 = 1 and Ar 6 in the case of m 4 = 1 each have an alkylene group that may have a substituent, an arylene group that may have a substituent, or a substituent. The divalent heterocyclic group which may be sufficient. Q represents a direct bond or a divalent residue. R 10 to R 17 each independently represent a hydrogen atom, an alkyl group that may have a substituent, an aryl group that may have a substituent, or a heterocyclic group that may have a substituent. n 3 ~n 6 represents an integer of 0 to 4 each independently. Ar 1 to Ar 6 may be bonded to each other to form a cyclic structure.

さらに、式(5)中、R10〜R17は、各々独立して水素原子、置換基を有していても良いアルキル基、置換基を有していても良いアリール基、置換基を有していても良いアラルキル基、置換基を有していても良い複素環基を表す。 Further, in formula (5), R 10 to R 17 each independently have a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. An aralkyl group which may be substituted, or a heterocyclic group which may have a substituent.

式(5)中、アルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、ペンチル基、ヘキシル基、へプチル基、シクロペンチル基、シクロヘキシル基等が挙げられ、これらの内、炭素数1〜炭素数6のアルキル基が好ましい。アルキル基がアリール置換基を有する場合は、ベンジル基、フェネチル基等が挙げられ、炭素数7〜炭素数12のアルキル基が好ましい。   In formula (5), examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, a cyclopentyl group, and a cyclohexyl group. Of these, an alkyl group having 1 to 6 carbon atoms is preferred. When the alkyl group has an aryl substituent, examples thereof include a benzyl group and a phenethyl group, and an alkyl group having 7 to 12 carbon atoms is preferable.

アリール基としては、フェニル基、トリル基、キシリル基、ナフチル基、ピレニル基等が挙げられ、炭素数6〜炭素数12のアリール基が好ましい。
複素環基は、芳香族性を有する複素環が好ましく、例えば、フリル基、チエニル基、ピリジル基等が挙げられ、単環の芳香族複素環が更に好ましい。
10〜R17において、最も好ましいものは、メチル基及びフェニル基である。
Examples of the aryl group include a phenyl group, a tolyl group, a xylyl group, a naphthyl group, and a pyrenyl group, and an aryl group having 6 to 12 carbon atoms is preferable.
The heterocyclic group is preferably an aromatic heterocyclic ring, and examples thereof include a furyl group, a thienyl group, and a pyridyl group, and a monocyclic aromatic heterocyclic ring is more preferable.
In R 10 to R 17 , the most preferable are a methyl group and a phenyl group.

式(5)中、Ar〜Arは、各々独立して、置換基を有しても良いアリーレン基または置換基を有しても良い2価の複素環基を表す。m,mは各々独立して0または1を表す。m=0の場合のAr,m=0の場合のArは、それぞれ置換基を有しても良いアルキル基、置換基を有しても良いアリール基、または置換基を有しても良い1価の複素環基を表し、m=1の場合のAr,m=1の場合のArは、それぞれ置換基を有しても良いアルキレン基、置換基を有しても良いアリーレン基、または置換基を有しても良い2価の複素環基を表す。
具体的には、アリール基としては、フェニル基、トリル基、キシリル基、ナフチル基、ピレニル基等が挙げられる。なかでも、炭素数6〜炭素数14のアリール基が好ましい。
アリーレン基としては、フェニレン基、ナフチレン基等が挙げられ、フェニレン基が好ましい。
In formula (5), Ar 1 to Ar 6 each independently represents an arylene group which may have a substituent or a divalent heterocyclic group which may have a substituent. m 3 and m 4 each independently represents 0 or 1. Ar 5 in the case of m 3 = 0 and Ar 6 in the case of m 4 = 0 each have an alkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. Each represents a monovalent heterocyclic group, Ar 5 in the case of m 3 = 1, and Ar 6 in the case of m 4 = 1 each have an alkylene group and a substituent which may have a substituent. An arylene group which may be substituted, or a divalent heterocyclic group which may have a substituent.
Specifically, examples of the aryl group include a phenyl group, a tolyl group, a xylyl group, a naphthyl group, and a pyrenyl group. Among these, an aryl group having 6 to 14 carbon atoms is preferable.
Examples of the arylene group include a phenylene group and a naphthylene group, and a phenylene group is preferable.

式(5)中、1価の複素環基としては、芳香族性を有する複素環が好ましく、例えば、フリル基、チエニル基、ピリジル基等が挙げられ、単環の芳香族複素環が更に好ましい。2価の複素環基としては、芳香族性を有する複素環が好ましく、例えば、ピリジレン基、チエニレン基等が挙げられ、単環の芳香族複素環が更に好ましい。これらのうち、最も好ましいものは、Ar及びArはフェニレン基であり、Arはフェニル基である。 In the formula (5), the monovalent heterocyclic group is preferably an aromatic heterocyclic ring, and examples thereof include a furyl group, a thienyl group, and a pyridyl group, and a monocyclic aromatic heterocyclic ring is more preferable. . As the divalent heterocyclic group, an aromatic heterocyclic ring is preferable, and examples thereof include a pyridylene group and a thienylene group, and a monocyclic aromatic heterocyclic ring is more preferable. Of these, the most preferred are Ar 1 and Ar 2 are phenylene groups, and Ar 3 is a phenyl group.

式(5)中、R10〜R17及びAr〜Arで表される基のうち、アルキル基、アリール基、アラルキル基、複素環基は、さらに置換基を有していても良い。その置換基としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、シクロペンチル基、シクロヘキシル基等のアルキル基;メトキシ基、エトキシ基、プロピルオキシ基等のアルコキシ基;メチルチオ基、エチルチオ基等のアルキルチオ基;ビニル基、アリル基等のアルケニル基;ベンジル基、ナフチルメチル基、フェネチル基等のアラルキル基;フェノキシ基、トリロキシ基等のアリールオキシ基;ベンジルオキシ基、フェネチルオキシ基等のアリールアルコキシ基;フェニル基、ナフチル基等のアリール基;スチリル基、ナフチルビニル基等のアリールビニル基;アセチル基、ベンゾイル基等のアシル基;ジメチルアミノ基、ジエチルアミノ基等のジアルキルアミノ基;ジフェニルアミノ基、ジナフチルアミノ基等のジアリールアミノ基;ジベンジルアミノ基、ジフェネチルアミノ基等のジアラルキルアミノ基;ジピリジルアミノ基、ジチエニルアミノ基等のジ複素環アミノ基;ジアリルアミノ基または上述したアミノ基の置換基を組み合わせたジ置換アミノ基等の置換アミノ基;シアノ基、ニトロ基、水酸基等が挙げられる。これらの置換基は互いに結合して、単結合、メチレン基、エチレン基、カルボニル基、ビニリデン基、エチレニレン基等を介した環状炭化水素基や複素環基を形成しても良い。 Of the groups represented by R 10 to R 17 and Ar 1 to Ar 6 in formula (5), the alkyl group, aryl group, aralkyl group, and heterocyclic group may further have a substituent. Examples of the substituent include halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl. Group, pentyl group, hexyl group, cyclopentyl group, cyclohexyl group and other alkyl groups; methoxy group, ethoxy group, propyloxy group and other alkoxy groups; methylthio group, ethylthio group and other alkylthio groups; vinyl group, allyl group and other alkenyl groups An aralkyl group such as a benzyl group, a naphthylmethyl group or a phenethyl group; an aryloxy group such as a phenoxy group or a triloxy group; an arylalkoxy group such as a benzyloxy group or a phenethyloxy group; an aryl group such as a phenyl group or a naphthyl group; Aryl vinyl such as styryl group and naphthyl vinyl group Acyl groups such as acetyl group and benzoyl group; dialkylamino groups such as dimethylamino group and diethylamino group; diarylamino groups such as diphenylamino group and dinaphthylamino group; diaralkyls such as dibenzylamino group and diphenethylamino group; An amino group; a diheterocyclic amino group such as a dipyridylamino group or a dithienylamino group; a substituted amino group such as a diallylamino group or a combination of substituents of the amino group described above; a cyano group, a nitro group, a hydroxyl group; Etc. These substituents may be bonded to each other to form a cyclic hydrocarbon group or a heterocyclic group via a single bond, a methylene group, an ethylene group, a carbonyl group, a vinylidene group, an ethylenylene group or the like.

これらの中、好ましい置換基としては、ハロゲン原子、シアノ基、水酸基、炭素数1〜炭素数6のアルキル基、炭素数1〜炭素数6のアルコキシ基、炭素数1〜炭素数6のアルキルチオ基、炭素数6〜炭素数12のアリールオキシ基、炭素数6〜炭素数12のアリールチオ基、炭素数2〜炭素数8のジアルキルアミノ基が挙げられ、ハロゲン原子、炭素数1〜炭素数6のアルキル基、フェニル基が更に好ましく、メチル基、フェニル基が特に好ましい。   Among these, preferred substituents include a halogen atom, a cyano group, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and an alkylthio group having 1 to 6 carbon atoms. , An aryloxy group having 6 to 12 carbon atoms, an arylthio group having 6 to 12 carbon atoms, a dialkylamino group having 2 to 8 carbon atoms, a halogen atom, and having 1 to 6 carbon atoms. An alkyl group and a phenyl group are more preferable, and a methyl group and a phenyl group are particularly preferable.

式(5)中、n〜nは各々独立して0〜4の整数を表すが、0〜2が好ましく、1が特に好ましい。m,mは0又は1を表し、0が好ましい。 In formula (5), n 3 to n 6 each independently represents an integer of 0 to 4, preferably 0 to 2, and particularly preferably 1. m 3 and m 4 represent 0 or 1, and 0 is preferable.

式(5)中、Qは、直接結合又は2価の残基を表し、2価の残基として好ましいものは、16族原子、置換基を有しても良いアルキレン、置換基を有しても良いアリーレン基、置換基を有しても良いシクロアルキリデン基、またはこれらが互いに結合した、例えば[−O−Z−O−]、[−Z−O−Z−]、[−S−Z−S−]、[−Z−Z−]等が挙げられる(但し、Oは酸素原子、Sは硫黄原子、Zは置換基を有しても良いアリーレン基または置換基を有しても良いアルキレン基を表す)。   In formula (5), Q represents a direct bond or a divalent residue, and a preferable divalent residue is a group 16 atom, an alkylene which may have a substituent, or a substituent. A good arylene group, an optionally substituted cycloalkylidene group, or a group in which these are bonded to each other, for example, [—O—Z—O—], [—Z—O—Z—], [—S—Z -S-], [-ZZ-] and the like (provided that O is an oxygen atom, S is a sulfur atom, and Z may have an arylene group or a substituent which may have a substituent). Represents an alkylene group).

Qを構成するアルキレン基としては、炭素数1〜炭素数6のものが好ましく、中でもメチレン基及びエチレン基が更に好ましい。また、シクロアルキリデン基としては、炭素数5〜炭素数8のものが好ましく、中でもシクロペンチリデン基及びシクロヘキシリデン基が更に好ましい。アリーレン基としては、炭素数6〜炭素数14のものが好ましく、中でもフェニレン基及びナフチレン基が更に好ましい。   As an alkylene group which comprises Q, a C1-C6 thing is preferable, and a methylene group and ethylene group are still more preferable especially. Moreover, as a cycloalkylidene group, a C5-C8 thing is preferable and especially a cyclopentylidene group and a cyclohexylidene group are still more preferable. As the arylene group, those having 6 to 14 carbon atoms are preferable, and among them, a phenylene group and a naphthylene group are more preferable.

また、これらアルキレン基、アリーレン基、シクロアルキリデン基は置換基を有しても良い。好ましい置換基としては、例えば、水酸基、ニトロ基、シアノ基、ハロゲン原子、炭素数1〜炭素数6のアルキル基、炭素数1〜炭素数6のアルケニル基、炭素数6〜炭素数14のアリール基が挙げられる。   In addition, these alkylene group, arylene group, and cycloalkylidene group may have a substituent. Preferred examples of the substituent include a hydroxyl group, a nitro group, a cyano group, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 1 to 6 carbon atoms, and an aryl having 6 to 14 carbon atoms. Groups.

本実施の形態が適用される電子写真感光体の感光層を構成する電荷輸送層に含有される電荷輸送物質の具体例としては、例えば、特開平9−244278号公報に記載されるアリールアミン系化合物、特開2002−275133号公報に記載されるアリールアミン系化合物等が挙げられる。これらの電荷輸送物質は単独で用いても良いし、いくつかを混合しても良い。これらの電荷輸送物質がバインダー樹脂に結着した形で電荷輸送層が形成される。電荷輸送層は、単一の層から成っても良いし、構成成分あるいは組成比の異なる複数の層を重ねたものでも良い。   Specific examples of the charge transport material contained in the charge transport layer constituting the photosensitive layer of the electrophotographic photoreceptor to which the exemplary embodiment is applied include, for example, arylamine-based compounds described in JP-A-9-244278. Compounds, arylamine compounds described in JP-A-2002-275133, and the like. These charge transport materials may be used alone or in combination. The charge transport layer is formed in such a form that these charge transport materials are bound to the binder resin. The charge transport layer may be composed of a single layer, or may be a stack of a plurality of layers having different constituent components or composition ratios.

式(1)で表される繰り返し構造を有するポリエステル樹脂からなるバインダー樹脂と電荷輸送物質との割合は、通常、バインダー樹脂100重量部に対して電荷輸送物質30重量部〜200重量部、好ましくは、40重量部〜150重量部の範囲で使用される。また電荷輸送層の膜厚は、通常、5μm〜50μm、好ましくは10μm〜45μmである。   The ratio of the binder resin composed of the polyester resin having the repeating structure represented by the formula (1) and the charge transport material is usually 30 parts by weight to 200 parts by weight, preferably 100 parts by weight of the binder resin. , 40 parts by weight to 150 parts by weight. The film thickness of the charge transport layer is usually 5 μm to 50 μm, preferably 10 μm to 45 μm.

尚、電荷輸送層には成膜性、可撓性、塗布性、耐汚染性、耐ガス性、耐光性等を向上させるために周知の可塑剤、酸化防止剤、紫外線吸収剤、電子吸引性化合物、染料、顔料、レベリング剤等の添加剤を含有させても良い。酸化防止剤の例としては、ヒンダードフェノール化合物、ヒンダードアミン化合物等が挙げられる。また染料、顔料の例としては、各種の色素化合物、アゾ化合物等が挙げられる。   It should be noted that the charge transport layer has well-known plasticizers, antioxidants, ultraviolet absorbers, and electron withdrawing properties in order to improve film forming properties, flexibility, coating properties, stain resistance, gas resistance, light resistance, etc. You may contain additives, such as a compound, dye, a pigment, and a leveling agent. Examples of the antioxidant include hindered phenol compounds and hindered amine compounds. Examples of dyes and pigments include various pigment compounds and azo compounds.

(分散型(単層型)感光層)
分散型感光層の場合には、上述したバインダー樹脂と電荷輸送物質とからなる電荷輸送媒体中に、前述した電荷発生物質が分散される。電荷発生物質の粒子径は充分小さいことが必要であり、好ましくは1μm以下、より好ましくは0.5μm以下で使用される。分散型感光層内に分散される電荷発生物質の量が過度に少ないと、充分な感度が得られず、過度に多いと、帯電性の低下、感度の低下等の弊害がある。電荷発生物質の使用量は、好ましくは0.5重量%〜50重量%、より好ましくは1重量%〜20重量%の範囲で使用される。
(Dispersion (single layer) photosensitive layer)
In the case of a dispersion type photosensitive layer, the above-described charge generating material is dispersed in a charge transport medium comprising the above-described binder resin and a charge transport material. The particle size of the charge generation material needs to be sufficiently small, and is preferably 1 μm or less, more preferably 0.5 μm or less. If the amount of the charge generating material dispersed in the dispersion type photosensitive layer is excessively small, sufficient sensitivity cannot be obtained, and if it is excessively large, there are problems such as a decrease in chargeability and a decrease in sensitivity. The amount of the charge generating material used is preferably in the range of 0.5 wt% to 50 wt%, more preferably 1 wt% to 20 wt%.

分散型感光層の膜厚は、通常5μm〜50μm、より好ましくは10μm〜45μmで使用される。またこの場合にも成膜性、可撓制、機械的強度等を改良するための公知の可塑剤、残留電位を抑制するための添加剤、分散安定性向上のための分散補助剤、塗布性を改善するためのレベリング剤、界面活性剤、例えば、シリコーンオイル、フッ素系オイル、その他の添加剤が添加されていても良い。分散型感光層の上に、分散型感光層の損耗を防止したり、帯電器等から発生する放電生成物等による分散型感光層の劣化を防止・軽減する目的で保護層を設けても良い。また、電子写真感光体表面の摩擦抵抗や、摩耗を軽減する目的で、表面の層には、フッ素系樹脂、シリコーン樹脂等を含んでいても良い。また、これらの樹脂からなる粒子や無機化合物の粒子を含んでいても良い。   The film thickness of the dispersion type photosensitive layer is usually 5 μm to 50 μm, more preferably 10 μm to 45 μm. Also in this case, known plasticizers for improving film formability, flexibility, mechanical strength, additives for suppressing residual potential, dispersion aids for improving dispersion stability, coatability A leveling agent and a surfactant, for example, silicone oil, fluorine oil, and other additives may be added to improve the above. On the dispersion type photosensitive layer, a protective layer may be provided for the purpose of preventing the wear of the dispersion type photosensitive layer or preventing or reducing the degradation of the dispersion type photosensitive layer due to discharge products generated from a charger or the like. . Further, for the purpose of reducing frictional resistance and wear on the surface of the electrophotographic photosensitive member, the surface layer may contain fluorine resin, silicone resin or the like. Moreover, the particle | grains which consist of these resin, and the particle | grains of an inorganic compound may be included.

(電子写真感光体の調製方法)
本実施の形態が適用される電子写真感光体の調製方法は、特に限定されないが、通常、導電性支持体上に、式(1)で表される繰り返し構造を有するポリエステル樹脂を含有する感光層形成塗布液を、例えば、浸漬塗布法、スプレー塗布法、ノズル塗布法、バーコート法、ロールコート法、ブレード塗布法等の公知の方法により塗布して形成される。これらの中でも生産性の高さから浸漬塗布法が好ましい。
(Method for preparing electrophotographic photoreceptor)
The method for preparing the electrophotographic photoreceptor to which the exemplary embodiment is applied is not particularly limited, but usually a photosensitive layer containing a polyester resin having a repeating structure represented by the formula (1) on a conductive support. For example, the forming coating solution is applied by a known method such as a dip coating method, a spray coating method, a nozzle coating method, a bar coating method, a roll coating method, or a blade coating method. Among these, the dip coating method is preferable because of its high productivity.

次に、本実施の形態が適用される電子写真感光体を用いた画像形成装置の一例について説明する。図1は、画像形成装置を説明する図である。図1に示された画像形成装置10は、所定の導電性支持体上に、前述した式(1)で表される繰り返し構造を有するポリエステル樹脂を含有する感光層を設けた電子写真感光体1と、電子写真感光体1を帯電させる帯電ローラーからなる帯電装置2と、電子写真感光体1の感光面に静電潜像を形成する露光装置3と、電子写真感光体1表面にトナー(T)を供給する現像装置4とを有する。
さらに、トナー(T)の帯電電位とは逆極性で所定電圧値(転写電圧)を印加し、電子写真感光体1に形成されたトナー像を記録紙(P)に転写する転写装置5と、電子写真感光体1に付着した残留トナーを掻き落とし回収するクリーニング装置6と、記録紙(P)に転写されたトナー像を定着させる定着装置7と、を有している。
Next, an example of an image forming apparatus using the electrophotographic photoreceptor to which the exemplary embodiment is applied will be described. FIG. 1 is a diagram illustrating an image forming apparatus. The image forming apparatus 10 shown in FIG. 1 includes an electrophotographic photoreceptor 1 in which a photosensitive layer containing a polyester resin having a repeating structure represented by the above-described formula (1) is provided on a predetermined conductive support. A charging device 2 comprising a charging roller for charging the electrophotographic photosensitive member 1, an exposure device 3 for forming an electrostatic latent image on the photosensitive surface of the electrophotographic photosensitive member 1, and a toner (T And a developing device 4 for feeding
Furthermore, a transfer device 5 that applies a predetermined voltage value (transfer voltage) with a polarity opposite to the charging potential of the toner (T) and transfers the toner image formed on the electrophotographic photosensitive member 1 to the recording paper (P); A cleaning device 6 that scrapes and collects residual toner attached to the electrophotographic photoreceptor 1 and a fixing device 7 that fixes the toner image transferred to the recording paper (P) are provided.

電子写真感光体1は、円筒状の導電性支持体の表面に上述したポリエステル樹脂を含有する感光層を設けたドラム状の形状を有している。
帯電装置2は、ローラー型の帯電ローラーを有している。尚、帯電装置2は、例えば、コロトロンまたはスコロトロン等のコロナ帯電装置、帯電ブラシ等の接触型帯電装置等が良く用いられる。尚、電子写真感光体1及び帯電装置2は、多くの場合、この両方を備えたカートリッジ(以下、感光体カートリッジと言うことがある。)として、画像形成装置10の本体から取り外し可能に設計されている。そして、例えば、電子写真感光体1や帯電装置2が劣化した場合に、この感光体カートリッジを画像形成装置10本体から取り外し、別の新しい感光体カートリッジを画像形成装置10本体に装着することができるようになっている(図示せず)。
The electrophotographic photoreceptor 1 has a drum shape in which a photosensitive layer containing the above-described polyester resin is provided on the surface of a cylindrical conductive support.
The charging device 2 has a roller-type charging roller. As the charging device 2, for example, a corona charging device such as corotron or scorotron, a contact charging device such as a charging brush, and the like are often used. In many cases, the electrophotographic photoreceptor 1 and the charging device 2 are designed to be removable from the main body of the image forming apparatus 10 as a cartridge having both of them (hereinafter also referred to as a photoreceptor cartridge). ing. For example, when the electrophotographic photoreceptor 1 or the charging device 2 deteriorates, the photoreceptor cartridge can be removed from the main body of the image forming apparatus 10 and another new photosensitive body cartridge can be mounted on the main body of the image forming apparatus 10. (Not shown).

露光装置3は、電子写真感光体1の感光面に静電潜像を形成できるものであれば、その種類に特に制限はない。具体例としては、ハロゲンランプ、蛍光灯、半導体レーザやHe−Neレーザ等のレーザ、LED等が挙げられる。また、感光体内部露光方式によって露光を行なうこともできる。露光を行なう際に使用する光は特に限定されないが、例えば、波長780nmの単色光、波長600nm〜700nmのやや短波長寄りの単色光、波長380nm〜500nmの短波長の単色光等が挙げられる。   The type of the exposure apparatus 3 is not particularly limited as long as it can form an electrostatic latent image on the photosensitive surface of the electrophotographic photoreceptor 1. Specific examples include halogen lamps, fluorescent lamps, lasers such as semiconductor lasers and He—Ne lasers, LEDs, and the like. The exposure can also be performed by a photoreceptor internal exposure method. The light used for the exposure is not particularly limited, and examples thereof include monochromatic light having a wavelength of 780 nm, monochromatic light having a wavelength slightly shorter than 600 nm to 700 nm, and monochromatic light having a short wavelength of 380 nm to 500 nm.

現像装置4は、内部にトナー(T)が貯留されている現像槽41を備え、さらに、現像槽41は、トナー(T)を撹拌するアジテータ42と、貯留されているトナー(T)を担持して後述する現像ローラー44に供給する供給ローラー43と、電子写真感光体1及び供給ローラー43に各々当接し、供給ローラー43によって供給されるトナー(T)を担持して電子写真感光体1の表面に接触させる現像ローラー44と、現像ローラー44に当接する規制部材45と、を有している。また、必要に応じ、ボトル、カートリッジ等の容器から現像槽41にトナー(T)を補給する補給装置(図示せず)を付帯させても良い。現像装置4の種類に特に制限は無く、例えば、カスケード現象、1成分導電トナー現象、2成分磁気ブラシ現像等の乾式現像方式や、湿式現像方法等の任意の装置を用いることができる。   The developing device 4 includes a developing tank 41 in which toner (T) is stored. Further, the developing tank 41 carries an agitator 42 for stirring the toner (T) and the stored toner (T). Then, a supply roller 43 to be supplied to a developing roller 44, which will be described later, and the electrophotographic photosensitive member 1 and the supply roller 43 are brought into contact with each other and carry the toner (T) supplied by the supply roller 43 and A developing roller 44 that is brought into contact with the surface and a regulating member 45 that is in contact with the developing roller 44 are provided. If necessary, a replenishing device (not shown) for replenishing toner (T) from a container such as a bottle or cartridge to the developing tank 41 may be attached. The type of the developing device 4 is not particularly limited, and any device such as a dry development method such as a cascade phenomenon, a one-component conductive toner phenomenon, a two-component magnetic brush development, or a wet development method can be used.

アジテータ42は、回転駆動機構によってそれぞれ回転されており、トナー(T)を撹拌するとともに、トナー(T)を供給ローラー43側に搬送する。アジテータ42は、羽根形状、大きさ等を違えて複数設けても良い。   The agitator 42 is rotated by a rotation driving mechanism, and agitates the toner (T) and conveys the toner (T) to the supply roller 43 side. A plurality of agitators 42 may be provided with different blade shapes and sizes.

供給ローラー43は、例えば、導電性スポンジ等から形成される。現像ローラー44は、鉄、ステンレス鋼、アルミニウム、ニッケル等の金属ロールまたは金属ロールにシリコーン樹脂、ウレタン樹脂、フッ素樹脂等を被覆した樹脂ロール等からなる。現像ローラー44の表面には、必要に応じて、平滑加工や粗面加工を加えても良い。規制部材45は、シリコーン樹脂やウレタン樹脂等の樹脂ブレード、ステンレス鋼、アルミニウム、銅、真鍮、リン青銅等の金属ブレード又は金属ブレードに樹脂を被覆したブレード等により形成されている。   The supply roller 43 is formed from, for example, a conductive sponge. The developing roller 44 is made of a metal roll such as iron, stainless steel, aluminum, or nickel, or a resin roll obtained by coating a metal roll with a silicone resin, a urethane resin, a fluororesin, or the like. The surface of the developing roller 44 may be smoothed or roughened as necessary. The regulating member 45 is formed of a resin blade such as a silicone resin or a urethane resin, a metal blade such as stainless steel, aluminum, copper, brass, phosphor bronze, or a blade obtained by coating a metal blade with a resin.

規制部材45は、現像ローラー44に当接し、バネ等によって現像ローラー44側に所定の力で押圧(一般的なブレード線圧は5〜500g/cm)される。必要に応じて、規制部材45にトナー(T)との摩擦帯電によりトナー(T)に帯電を付与する機能を設けても良い。尚、供給ローラー43及び現像ローラー44は、回転駆動機構(図示せず)によって回転される。   The regulating member 45 is in contact with the developing roller 44 and pressed against the developing roller 44 side with a predetermined force by a spring or the like (a general blade linear pressure is 5 to 500 g / cm). If necessary, the regulating member 45 may be provided with a function of charging the toner (T) by frictional charging with the toner (T). The supply roller 43 and the developing roller 44 are rotated by a rotation drive mechanism (not shown).

トナー(T)の種類は特に限定されないが、通常、粉状トナーのほか、懸濁重合法や乳化重合法等を用いた重合トナー等を用いることができる。特に、重合トナーを用いる場合には径が4〜8μm程度の小粒径のものが好ましく、また、トナー(T)の粒子の形状も球形に近いものからポテト状の球形から外れたものまで様々に使用することができる。重合トナーは、帯電均一性、転写性に優れ、高画質化に好適に用いられる。   The type of the toner (T) is not particularly limited, but normally, besides a powdery toner, a polymerized toner using a suspension polymerization method, an emulsion polymerization method, or the like can be used. In particular, when a polymerized toner is used, a toner having a small particle diameter of about 4 to 8 μm is preferable, and the toner (T) particles have a variety of shapes ranging from a nearly spherical shape to those outside a potato-like spherical shape. Can be used for The polymerized toner is excellent in charging uniformity and transferability and is suitably used for high image quality.

尚、トナー(T)は、多くの場合、トナーカートリッジ中に蓄えられて、画像形成装置10本体から取り外し可能に設計され、使用しているトナーカートリッジ中のトナー(T)が無くなった場合に、このトナーカートリッジを画像形成装置10本体から取り外し、別の新しいトナーカートリッジを装着することができるようになっている。更に、電子写真感光体1、帯電装置2及びトナー(T)が備えられたカートリッジを用いることもできる。   In many cases, the toner (T) is stored in the toner cartridge and designed to be removable from the main body of the image forming apparatus 10, and when the toner (T) in the used toner cartridge is used up, The toner cartridge can be removed from the main body of the image forming apparatus 10 and another new toner cartridge can be mounted. Further, a cartridge provided with the electrophotographic photoreceptor 1, the charging device 2, and the toner (T) can be used.

転写装置5は、図示しないが、電子写真感光体1に対向して配置された転写チャージャー、転写ローラー、転写ベルト等から構成されている。また、転写装置5の種類に特に制限は無く、例えば、コロナ転写、ローラー転写、ベルト転写等の静電転写法、圧力転写法、粘着転写法等、任意の方式を用いた装置を使用することができる。   Although not shown, the transfer device 5 includes a transfer charger, a transfer roller, a transfer belt, and the like that are disposed to face the electrophotographic photoreceptor 1. The type of the transfer device 5 is not particularly limited. For example, an apparatus using an arbitrary method such as an electrostatic transfer method such as corona transfer, roller transfer, or belt transfer, a pressure transfer method, or an adhesive transfer method is used. Can do.

クリーニング装置6は、特に限定はされないが、例えば、ブラシクリーナー、磁気ブラシクリーナー、静電ブラシクリーナー、磁気ローラークリーナー、ブレードクリーナー等、任意のクリーニング装置を用いることができる。   The cleaning device 6 is not particularly limited, and any cleaning device such as a brush cleaner, a magnetic brush cleaner, an electrostatic brush cleaner, a magnetic roller cleaner, a blade cleaner, or the like can be used.

定着装置7は、定着ローラーからなる上部定着部材71と、上部定着部材71に当接する定着ローラーからなる下部定着部材72と、上部定着部材71の内部に設けられた加熱装置73と、を有している。尚、加熱装置73は下部定着部材72内部に設けても良い。上部定着部材71または下部定着部材72は、ステンレス、アルミニウム等の金属素管にシリコーンゴムを被覆した定着ロール、テフロン(登録商標)樹脂で被覆した定着ロール、定着シート等の公知の熱定着部材を使用することができる。更に、上部定着部材71または下部定着部材72は、離型性を向上させるためにシリコーンオイル等の離型剤を供給する構成としてもよく、バネ等により互いに強制的に圧力を加える構成としても良い。尚、定着装置7の種類に特に制限は無く、例えば、熱ローラー定着、フラッシュ定着、オーブン定着、圧力定着等、任意の方式による定着装置を設けることができる。   The fixing device 7 includes an upper fixing member 71 made of a fixing roller, a lower fixing member 72 made of a fixing roller in contact with the upper fixing member 71, and a heating device 73 provided inside the upper fixing member 71. ing. The heating device 73 may be provided inside the lower fixing member 72. The upper fixing member 71 or the lower fixing member 72 is a known heat fixing member such as a fixing roll in which a metal base tube such as stainless steel or aluminum is coated with silicone rubber, a fixing roll in which Teflon (registered trademark) resin is coated, or a fixing sheet. Can be used. Further, the upper fixing member 71 or the lower fixing member 72 may be configured to supply a release agent such as silicone oil in order to improve the releasability, or may be configured to forcibly apply pressure to each other by a spring or the like. . The type of the fixing device 7 is not particularly limited, and for example, a fixing device using an arbitrary method such as heat roller fixing, flash fixing, oven fixing, pressure fixing, or the like can be provided.

次に、画像形成装置10の作用について説明する。
電子写真感光体1の表面(感光面)が、帯電装置2によって所定の電位(例えば、−600V)に帯電される。この際、直流電圧により帯電させても良く、直流電圧に交流電圧を重畳させて帯電させても良い。続いて、帯電された電子写真感光体1の感光面を、記録すべき画像に応じて露光装置3により露光し、感光面に静電潜像を形成する。
次に、電子写真感光体1の感光面に形成された静電潜像の現像を、現像装置4で行う。即ち、現像装置4は、供給ローラー43により供給されるトナー(T)を、現像ブレード等の規制部材45により薄層化するとともに、所定の極性(ここでは電子写真感光体1の帯電電位と同極性であり、負極性)に摩擦帯電させ、現像ローラー44に担持しながら搬送して、電子写真感光体1の表面に接触させる。
Next, the operation of the image forming apparatus 10 will be described.
The surface (photosensitive surface) of the electrophotographic photosensitive member 1 is charged to a predetermined potential (for example, −600 V) by the charging device 2. At this time, charging may be performed by a DC voltage, or charging may be performed by superimposing an AC voltage on the DC voltage. Subsequently, the photosensitive surface of the charged electrophotographic photosensitive member 1 is exposed by the exposure device 3 according to the image to be recorded, and an electrostatic latent image is formed on the photosensitive surface.
Next, development of the electrostatic latent image formed on the photosensitive surface of the electrophotographic photoreceptor 1 is performed by the developing device 4. That is, the developing device 4 thins the toner (T) supplied by the supply roller 43 with a regulating member 45 such as a developing blade and also has a predetermined polarity (here, the same as the charging potential of the electrophotographic photosensitive member 1). Polarity and negative polarity) are triboelectrically charged, conveyed while being carried on the developing roller 44, and brought into contact with the surface of the electrophotographic photosensitive member 1.

現像ローラー44に担持された帯電トナー(T)が電子写真感光体1の表面に接触すると、静電潜像に対応するトナー像が電子写真感光体1の感光面に形成される。続いて、このトナー像は、転写装置5によって記録紙(P)に転写される。この後、転写されずに電子写真感光体1の感光面に残留しているトナー(T)は、クリーニング装置6で除去される。記録紙(P)上に転写されたトナー(T)は、所定温度に加熱された上部定着部材71と下部定着部材72との間を通過する際、トナー(T)が溶融状態まで加熱され、通過後冷却されて記録紙(P)上にトナー(T)が定着され、最終的な画像が得られる。   When the charged toner (T) carried on the developing roller 44 comes into contact with the surface of the electrophotographic photoreceptor 1, a toner image corresponding to the electrostatic latent image is formed on the photosensitive surface of the electrophotographic photoreceptor 1. Subsequently, the toner image is transferred to the recording paper (P) by the transfer device 5. Thereafter, the toner (T) remaining on the photosensitive surface of the electrophotographic photosensitive member 1 without being transferred is removed by the cleaning device 6. When the toner (T) transferred onto the recording paper (P) passes between the upper fixing member 71 and the lower fixing member 72 heated to a predetermined temperature, the toner (T) is heated to a molten state, After passing, it is cooled and the toner (T) is fixed on the recording paper (P), and a final image is obtained.

尚、画像形成装置10は、上述した構成に加え、例えば、除電工程を行うことができる構成としても良い。除電工程は、電子写真感光体1に露光を行うことで電子写真感光体1の除電を行う工程であり、除電装置としては、蛍光灯、LED等が使用される。また除電工程で用いる光は、強度としては露光光の3倍以上の露光エネルギーを有する光である場合が多い。   In addition to the above-described configuration, the image forming apparatus 10 may have a configuration capable of performing a static elimination process, for example. The neutralization process is a process of neutralizing the electrophotographic photosensitive member 1 by exposing the electrophotographic photosensitive member 1, and a fluorescent lamp, an LED, or the like is used as the neutralizing device. In addition, the light used in the static elimination process is often light having an exposure energy that is at least three times that of the exposure light.

また、画像形成装置10は更に変形して構成しても良く、例えば、前露光工程、補助帯電工程等の工程を行うことができる構成としたり、オフセット印刷を行う構成としたり、更には複数種のトナー(T)を用いたフルカラータンデム方式の構成としても良い。   The image forming apparatus 10 may be further modified. For example, the image forming apparatus 10 may be configured to perform a pre-exposure process, an auxiliary charging process, or the like, or may be configured to perform offset printing. A full-color tandem configuration using the toner (T) may be used.

以下、実施例に基づき本実施の形態をさらに具体的に説明する。尚、本実施の形態は実施例に限定されない。尚、実施例及び比較例中の部及び%は、特に限定しない限り重量基準である。   Hereinafter, the present embodiment will be described more specifically based on examples. Note that this embodiment is not limited to the examples. In the examples and comparative examples, parts and% are based on weight unless otherwise specified.

(1)粘度平均分子量
ウベローデ型毛細管粘度計(ジクロロメタンの流下時間t0:135.40秒)を用いて、20.0℃において、樹脂のジクロロメタン溶液(濃度:C=6.00g/L)の流下時間(t)を測定し、以下の式に基づき、樹脂の粘度平均分子量(Mv)を算出した。ηsp=(t/t)−1
X=(0.2092×ηsp)+1.0734
Y=100×ηsp/C
C=6.00
η=Y/X
Mv=3207×(η1.205
(1) Viscosity average molecular weight Flowing down of the resin in dichloromethane (concentration: C = 6.00 g / L) at 20.0 ° C. using an Ubbelohde capillary viscometer (dichloromethane flow time t0: 135.40 seconds) The time (t) was measured, and the viscosity average molecular weight (Mv) of the resin was calculated based on the following formula. η sp = (t / t 0 ) −1
X = (0.2092 × η sp ) +1.0734
Y = 100 × η sp / C
C = 6.00
η = Y / X
Mv = 3207 × (η 1.205 )

(2)感光体シートの調製
10重量部のオキシチタニウムフタロシアニンと、150重量部の4−メトキシ−4−メチル−2−ペンタノンとを混合し、サンドグラインドミルにて粉砕分散処理を行い顔料分散液を製造した。尚、オキシチタニウムフタロシアニンは、CuKα線によるX線回折においてブラッグ角(2θ±0.2)9.3゜、10.6゜、13.2゜、15.1゜、15.7゜、16.1゜、20.8゜、23.3゜、26.3゜、27.1゜に強い回折ピークを示す。
(2) Preparation of photoreceptor sheet 10 parts by weight of oxytitanium phthalocyanine and 150 parts by weight of 4-methoxy-4-methyl-2-pentanone are mixed and pulverized and dispersed in a sand grind mill to obtain a pigment dispersion. Manufactured. Oxytitanium phthalocyanine has Bragg angles (2θ ± 0.2) of 9.3 °, 10.6 °, 13.2 °, 15.1 °, 15.7 °, 16.5 ° in X-ray diffraction by CuKα ray. Strong diffraction peaks are shown at 1 °, 20.8 °, 23.3 °, 26.3 °, and 27.1 °.

この顔料分散液に、ポリビニルブチラール(電気化学工業株式会社製、商品名デンカブチラール♯6000C)の5重量%1,2−ジメトキシエタン溶液を50重量部、フェノキシ樹脂(ユニオンカーバイド株式会社製、商品名PKHH)の5重量%1,2−ジメトキシエタン溶液を50重量部混合し、更に、適量の1,2−ジメトキシエタンを加え、固形分濃度4.0%の電荷発生層形成用塗布液を調製した。この電荷発生層形成用塗布液を、表面にアルミ蒸着したポリエチレンテレフタレートシート上に、乾燥後の膜厚が0.4μmになるように塗布、乾燥して電荷発生層を設けた。   To this pigment dispersion, 50 parts by weight of a 5 wt% 1,2-dimethoxyethane solution of polyvinyl butyral (manufactured by Denki Kagaku Kogyo Co., Ltd., trade name Denkabutyral # 6000C), 50 parts by weight of a 5% by weight 1,2-dimethoxyethane solution of PKHH) is added, and an appropriate amount of 1,2-dimethoxyethane is added to prepare a coating solution for forming a charge generation layer having a solid content concentration of 4.0%. did. This charge generation layer forming coating solution was applied on a polyethylene terephthalate sheet having aluminum deposited on the surface so that the film thickness after drying was 0.4 μm and dried to provide a charge generation layer.

次に、この電荷発生層上に、電荷輸送層形成用塗布液を、乾燥後の膜厚が20μmとなるように塗布し、125℃で20分間乾燥して電荷輸送層を形成して、感光体シートを調製した。電荷輸送層形成用塗布液は、後述する表1及び表2に示すそれぞれの樹脂100重量部、酸化防止剤(イルガノックス1076)8重量部、レベリング剤としてシリコーンオイル0.03重量部、及び、下記に示す化学構造を有する電荷輸送物質(1)を主成分とする異性体からなる、特開2002−080432号公報の実施例1に記載の方法で製造した電荷輸送物質50重量部を、テトラヒドロフラン/トルエン混合溶媒(テトラヒドロフラン80重量%、トルエン20重量%)640重量部に混合して調製した。   Next, a coating solution for forming a charge transport layer is applied onto the charge generation layer so that the film thickness after drying is 20 μm, and dried at 125 ° C. for 20 minutes to form a charge transport layer. A body sheet was prepared. The coating solution for forming the charge transport layer comprises 100 parts by weight of each resin shown in Tables 1 and 2 described later, 8 parts by weight of an antioxidant (Irganox 1076), 0.03 parts by weight of silicone oil as a leveling agent, and 50 parts by weight of the charge transport material produced by the method described in Example 1 of JP-A No. 2002-080432, comprising isomers mainly composed of the charge transport material (1) having the chemical structure shown below, was added to tetrahydrofuran. / Toluene mixed solvent (tetrahydrofuran 80 wt%, toluene 20 wt%) 640 parts by weight was prepared.

Figure 2008293006
Figure 2008293006

(3)電気特性試験
電子写真学会測定標準に準拠した電子写真特性評価装置(続電子写真技術の基礎と応用、電子写真学会編、コロナ社、第404頁〜405頁記載)を使用し、予め調製した感光体シートをアルミニウム製ドラムに貼り付けて円筒状にし、アルミニウム製ドラムと感光体シートのアルミニウム基体との導通を取った上で、ドラムを一定回転数で回転させ、帯電、露光、電位測定、除電のサイクルによる電気特性評価試験を行った。
初期表面電位を−700V、露光光として780nm、除電光として660nmの単色光を用い、露光光を2.4μJ/cm照射した時点の表面電位(VL)を測定した。VL測定に際しては、露光から電位測定に要する時間を139msとした。測定環境は、温度25℃、相対湿度50%(NN環境)と、温度5℃、相対湿度10%(LL環境)とで行った。VL値の絶対値が小さいほど応答性が良い(単位:−V)。
(3) Electrical characteristics test Using an electrophotographic characteristic evaluation apparatus (basic and applied electrophotographic technology, edited by the Electrophotographic Society, Corona, pages 404 to 405) based on the Electrophotographic Society measurement standard, The prepared photosensitive sheet is affixed to an aluminum drum to form a cylinder, and the aluminum drum and the aluminum base of the photosensitive sheet are connected to each other. Then, the drum is rotated at a constant rotational speed to charge, expose, and potential. An electrical property evaluation test was performed by a cycle of measurement and static elimination.
The initial surface potential was −700 V, the exposure light was 780 nm, the neutralization light was 660 nm, and the surface potential (VL) was measured when the exposure light was irradiated at 2.4 μJ / cm 2 . In the VL measurement, the time required from the exposure to the potential measurement was 139 ms. The measurement environment was a temperature of 25 ° C. and a relative humidity of 50% (NN environment), and a temperature of 5 ° C. and a relative humidity of 10% (LL environment). The smaller the absolute value of the VL value, the better the response (unit: -V).

(4)摩耗試験
予め調製した感光体シートを直径10cmの円状に切断して試験片を調製し、これを、テーバー摩耗試験機(東洋精機社製)を用いて摩耗試験を行った。試験条件は、温度23℃、相対湿度50%の雰囲気下、摩耗輪CS−10Fを用いて、荷重なし(摩耗輪の自重)で1000回回転後の摩耗量を試験前後の重量を比較することにより測定した。摩耗量が少ないほど耐摩耗性が良好である(単位:mg)。
(4) Wear test A photoconductor sheet prepared in advance was cut into a circle having a diameter of 10 cm to prepare a test piece, and this was subjected to a wear test using a Taber abrasion tester (manufactured by Toyo Seiki Co., Ltd.). The test condition is to compare the weight before and after the test after 1000 rotations with no load (wear wheel's own weight) using wear wheel CS-10F in an atmosphere of temperature 23 ° C and relative humidity 50%. It was measured by. The smaller the amount of wear, the better the wear resistance (unit: mg).

(5)ポリエステル樹脂の製造例
以下の方法により、樹脂を製造した。
製造例1(樹脂1)
500mLビーカーに水酸化ナトリウム(10.81g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、ビス(4−ヒドロキシフェニル)メタン(以下、BP−a)、(2−ヒドロキシフェニル)(4−ヒドロキシフェニル)メタン(以下、BP−b)、ビス(2−ヒドロキシフェニル)メタン(以下、BP−c)の混合物(混合比率、BP−a:BP−b:BP−c=約35:48:17(以下、BP−d))(14.28g、繰り返し構造中の2価フェノール残基分子量198)と、ビス(4−ヒドロキシ−3−メチルフェニル)メタン(以下、BP−e)(6.98g、繰り返し構造中の2価フェノール残基分子量226)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
(5) Production Example of Polyester Resin A resin was produced by the following method.
Production Example 1 (Resin 1)
Sodium hydroxide (10.81 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, bis (4-hydroxyphenyl) methane (hereinafter referred to as BP-a), (2-hydroxyphenyl) (4-hydroxyphenyl) methane (hereinafter referred to as BP-b), bis (2-hydroxyphenyl) methane (hereinafter referred to as “BP”) BP-c) (mixing ratio, BP-a: BP-b: BP-c = about 35:48:17 (hereinafter referred to as BP-d)) (14.28 g, divalent phenol residue in the repetitive structure After adding, stirring and dissolving the base molecular weight 198) and bis (4-hydroxy-3-methylphenyl) methane (hereinafter BP-e) (6.98 g, divalent phenol residue molecular weight 226 in the repeating structure) The aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2699g)、および、p−(tert−ブチル)フェノール(0.5662g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(30.65g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2699 g) and p- (tert-butyl) phenol (0.5662 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (30.65 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.92mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂1を得た。得られた樹脂1の粘度平均分子量は25,000であった。樹脂1の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.92 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 1. The obtained resin 1 had a viscosity average molecular weight of 25,000. The repeating structure of Resin 1 is shown below.

Figure 2008293006
Figure 2008293006

製造例2(樹脂2)
500mLビーカーに水酸化ナトリウム(9.06g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−d(14.07g、繰り返し構造中の2価フェノール残基分子量198)と、2,2−ビス(4−ヒドロキシ−3−メチルフェニル)プロパン(以下、BP−f)(7.72g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 2 (Resin 2)
Sodium hydroxide (9.06 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-d (14.07 g, divalent phenol residue molecular weight 198 in the repetitive structure) and 2,2-bis (4-hydroxy-3-methylphenyl) propane (hereinafter referred to as BP-f) (7 .72 g, divalent phenol residue molecular weight 254) in the repeating structure was added, stirred and dissolved, and then this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2687g)、および、p−(tert−ブチル)フェノール(0.7236g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.75g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2687 g) and p- (tert-butyl) phenol (0.7236 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.75 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(1.29mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂2を得た。得られた樹脂2の粘度平均分子量は25,000であった。樹脂2の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (1.29 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 2. The obtained resin 2 had a viscosity average molecular weight of 25,000. The repeating structure of Resin 2 is shown below.

Figure 2008293006
Figure 2008293006

製造例3(樹脂3)
500mLビーカーに水酸化ナトリウム(10.70g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−a(14.15g、繰り返し構造中の2価フェノール残基分子量198)と、1,1−ビス(4−ヒドロキシ−3−メチルフェニル)エタン(以下、BP−g)(7.34g、繰り返し構造中の2価フェノール残基分子量240)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 3 (Resin 3)
Sodium hydroxide (10.70 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, BP-a (14.15 g, divalent phenol residue molecular weight 198 in the repeating structure) and 1,1-bis (4-hydroxy-3-methylphenyl) ethane (hereinafter referred to as BP-g) (7 .34 g, divalent phenol residue molecular weight 240) in the repetitive structure was added, stirred and dissolved, and then this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2674g)、および、p−(tert−ブチル)フェノール(0.5609g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(30.36g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2674 g) and p- (tert-butyl) phenol (0.5609 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (30.36 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.88mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂3を得た。得られた樹脂3の粘度平均分子量は44,800であった。樹脂3の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.88 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 3. The obtained resin 3 had a viscosity average molecular weight of 44,800. The repeating structure of resin 3 is shown below.

Figure 2008293006
Figure 2008293006

製造例4(樹脂4)
500mLビーカーに水酸化ナトリウム(10.71g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−a(14.16g、繰り返し構造中の2価フェノール残基分子量198)と、BP−f(7.77g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 4 (Resin 4)
Sodium hydroxide (10.71 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-a (14.16 g, divalent phenol residue molecular weight 198 in the repeating structure) and BP-f (7.77 g, divalent phenol residue molecular weight 254 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2676g)、および、p−(tert−ブチル)フェノール(0.5614g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.78g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2676 g) and p- (tert-butyl) phenol (0.5614 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.78 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.89mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂4を得た。得られた樹脂4の粘度平均分子量は51,600であった。樹脂4の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.89 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 4. The obtained resin 4 had a viscosity average molecular weight of 51,600. The repeating structure of the resin 4 is shown below.

Figure 2008293006
Figure 2008293006

製造例5(樹脂5)
500mLビーカーに水酸化ナトリウム(10.71g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−a(14.16g、繰り返し構造中の2価フェノール残基分子量198)と、ビス(4−ヒドロキシ−3,5−ジメチルフェニル)メタン(以下、BP−h)(7.77g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 5 (Resin 5)
Sodium hydroxide (10.71 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, BP-a (14.16 g, divalent phenol residue molecular weight 198 in the repetitive structure) and bis (4-hydroxy-3,5-dimethylphenyl) methane (hereinafter referred to as BP-h) (7.77 g) After adding, stirring and dissolving the divalent phenol residue molecular weight 254) in the repeating structure, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2676g)、および、p−(tert−ブチル)フェノール(0.5614g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.78g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2676 g) and p- (tert-butyl) phenol (0.5614 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.78 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.89mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂5を得た。得られた樹脂5の粘度平均分子量は40,600であった。樹脂5の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.89 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 5. The obtained resin 5 had a viscosity average molecular weight of 40,600. The repeating structure of the resin 5 is shown below.

Figure 2008293006
Figure 2008293006

製造例6(樹脂6)
500mLビーカーに水酸化ナトリウム(10.61g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−a(14.03g、繰り返し構造中の2価フェノール残基分子量198)と、1,1−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)エタン(以下、BP−i)(8.12g、繰り返し構造中の2価フェノール残基分子量268)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 6 (Resin 6)
Sodium hydroxide (10.61 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-a (14.03 g, divalent phenol residue molecular weight 198 in the repeating structure) and 1,1-bis (4-hydroxy-3,5-dimethylphenyl) ethane (hereinafter referred to as BP-i). (8.12 g, divalent phenol residue molecular weight 268 in the repetitive structure) was added, stirred and dissolved, and then this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2651g)、および、p−(tert−ブチル)フェノール(0.5561g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.50g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2651 g) and p- (tert-butyl) phenol (0.5561 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.50 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.85mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂6を得た。得られた樹脂6の粘度平均分子量は52,500であった。樹脂6の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.85 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 6. The obtained resin 6 had a viscosity average molecular weight of 52,500. The repeating structure of the resin 6 is shown below.

Figure 2008293006
Figure 2008293006

製造例7(樹脂7)
500mLビーカーに水酸化ナトリウム(10.52g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−a(13.90g、繰り返し構造中の2価フェノール残基分子量198)と、2,2−ビス(4−ヒドロキシ−3,5−ジメチルフェニル)プロパン(以下、BP−j)(8.46g、繰り返し構造中の2価フェノール残基分子量282)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 7 (Resin 7)
Sodium hydroxide (10.52 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-a (13.90 g, divalent phenol residue molecular weight 198 in the repeating structure) and 2,2-bis (4-hydroxy-3,5-dimethylphenyl) propane (hereinafter referred to as BP-j) After adding, stirring and dissolving (8.46 g, divalent phenol residue molecular weight 282 in the repetitive structure), this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2626g)、および、p−(tert−ブチル)フェノール(0.5510g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.23g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2626 g) and p- (tert-butyl) phenol (0.5510 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.23 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.81mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂7を得た。得られた樹脂7の粘度平均分子量は48,200であった。樹脂7の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.81 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 7. The resulting resin 7 had a viscosity average molecular weight of 48,200. The repeating structure of the resin 7 is shown below.

Figure 2008293006
Figure 2008293006

製造例8(樹脂8)
500mLビーカーに水酸化ナトリウム(10.43g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−a(13.79g、繰り返し構造中の2価フェノール残基分子量198)と、1,1−ビス(4−ヒドロキシ−3−メチルフェニル)シクロヘキサン(以下、BP−k)(8.75g、繰り返し構造中の2価フェノール残基分子量294)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 8 (Resin 8)
Sodium hydroxide (10.43 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. There, BP-a (13.79 g, divalent phenol residue molecular weight 198 in the repeating structure) and 1,1-bis (4-hydroxy-3-methylphenyl) cyclohexane (hereinafter referred to as BP-k) (8 .75 g of divalent phenol residue molecular weight 294) in the repetitive structure was added, stirred and dissolved, and then this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2606g)、および、p−(tert−ブチル)フェノール(0.5466g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.00g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2606 g) and p- (tert-butyl) phenol (0.5466 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.00 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.78mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂8を得た。得られた樹脂8の粘度平均分子量は52,000であった。樹脂8の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.78 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 8. The viscosity average molecular weight of the obtained resin 8 was 52,000. The repeating structure of the resin 8 is shown below.

Figure 2008293006
Figure 2008293006

製造例9(樹脂9)
500mLビーカーに水酸化ナトリウム(10.68g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、1,1−ビス(4−ヒドロキシフェニル)エタン(以下、BP−l)(15.10g、繰り返し構造中の2価フェノール残基分子量212)と、BP−e(6.90g、繰り返し構造中の2価フェノール残基分子量226)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 9 (Resin 9)
Sodium hydroxide (10.68 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, 1,1-bis (4-hydroxyphenyl) ethane (hereinafter referred to as BP-1) (15.10 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-e (6.90 g, repeating) After adding, stirring and dissolving the divalent phenol residue molecular weight 226) in the structure, this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2668g)、および、p−(tert−ブチル)フェノール(0.5596g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.69g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2668 g) and p- (tert-butyl) phenol (0.5596 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.69 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.87mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂9を得た。得られた樹脂9の粘度平均分子量は56,500であった。樹脂9の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.87 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 9. The obtained resin 9 had a viscosity average molecular weight of 56,500. The repeating structure of the resin 9 is shown below.

Figure 2008293006
Figure 2008293006

製造例10(樹脂10)
500mLビーカーに水酸化ナトリウム(10.58g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(14.96g、繰り返し構造中の2価フェノール残基分子量212)と、BP−g(7.25g、繰り返し構造中の2価フェノール残基分子量240)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 10 (Resin 10)
Sodium hydroxide (10.58 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-1 (14.96 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-g (7.25 g, divalent phenol residue molecular weight 240 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2643g)、および、p−(tert−ブチル)フェノール(0.5544g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.41g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2643 g) and p- (tert-butyl) phenol (0.5544 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.41 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.84mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂10を得た。得られた樹脂10の粘度平均分子量は54,300であった。樹脂10の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.84 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 10. The obtained resin 10 had a viscosity average molecular weight of 54,300. The repeating structure of the resin 10 is shown below.

Figure 2008293006
Figure 2008293006

製造例11(樹脂11)
500mLビーカーに水酸化ナトリウム(10.48g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(14.83g、繰り返し構造中の2価フェノール残基分子量212)と、BP−f(7.60g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 11 (Resin 11)
Sodium hydroxide (10.48 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-1 (14.83 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-f (7.60 g, divalent phenol residue molecular weight 254 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2618g)、および、p−(tert−ブチル)フェノール(0.5493g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.14g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2618 g) and p- (tert-butyl) phenol (0.5493 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.14 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.80mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂11を得た。得られた樹脂11の粘度平均分子量は46,300であった。樹脂11の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.80 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 11. The obtained resin 11 had a viscosity average molecular weight of 46,300. The repeating structure of the resin 11 is shown below.

Figure 2008293006
Figure 2008293006

製造例12(樹脂12)
500mLビーカーに水酸化ナトリウム(10.40g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(14.71g、繰り返し構造中の2価フェノール残基分子量212)と、1,1−ビス(4−ヒドロキシフェニル)シクロヘキサン(以下、BP−m)(7.89g、繰り返し構造中の2価フェノール残基分子量266)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 12 (Resin 12)
Sodium hydroxide (10.40 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-1 (14.71 g, divalent phenol residue molecular weight 212 in the repeating structure) and 1,1-bis (4-hydroxyphenyl) cyclohexane (hereinafter referred to as BP-m) (7.89 g, repeating) After adding, stirring, and dissolving the divalent phenol residue molecular weight 266) in the structure, this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2598g)、および、p−(tert−ブチル)フェノール(0.5450g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.91g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2598 g) and p- (tert-butyl) phenol (0.5450 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.91 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.77mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂12を得た。得られた樹脂12の粘度平均分子量は45,200であった。樹脂12の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.77 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 12. The obtained resin 12 had a viscosity average molecular weight of 45,200. The repeating structure of the resin 12 is shown below.

Figure 2008293006
Figure 2008293006

製造例13(樹脂13)
500mLビーカーに水酸化ナトリウム(10.39g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(14.69g、繰り返し構造中の2価フェノール残基分子量212)と、BP−i(7.94g、繰り返し構造中の2価フェノール残基分子量268)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 13 (Resin 13)
Sodium hydroxide (10.39 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. BP-l (14.69 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-i (7.94 g, divalent phenol residue molecular weight 268 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2594g)、および、p−(tert−ブチル)フェノール(0.5442g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.87g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2594 g) and p- (tert-butyl) phenol (0.5442 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.87 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.77mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂13を得た。得られた樹脂13の粘度平均分子量は55,600であった。樹脂13の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.77 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 13. The obtained resin 13 had a viscosity average molecular weight of 55,600. The repeating structure of the resin 13 is shown below.

Figure 2008293006
Figure 2008293006

製造例14(樹脂14)
500mLビーカーに水酸化ナトリウム(10.29g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(14.56g、繰り返し構造中の2価フェノール残基分子量212)と、BP−j(8.28g、繰り返し構造中の2価フェノール残基分子量282)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 14 (Resin 14)
Sodium hydroxide (10.29 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. BP-l (14.56 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-j (8.28 g, divalent phenol residue molecular weight 282 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2571g)、および、p−(tert−ブチル)フェノール(0.5393g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.61g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2571 g) and p- (tert-butyl) phenol (0.5393 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.61 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.73mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂14を得た。得られた樹脂14の粘度平均分子量は45,100であった。樹脂14の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.73 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 14. The resulting resin 14 had a viscosity average molecular weight of 45,100. The repeating structure of the resin 14 is shown below.

Figure 2008293006
Figure 2008293006

製造例15(樹脂15)
500mLビーカーに水酸化ナトリウム(10.21g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(14.44g、繰り返し構造中の2価フェノール残基分子量212)と、BP−k(8.56g、繰り返し構造中の2価フェノール残基分子量294)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 15 (Resin 15)
Sodium hydroxide (10.21 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-1 (14.44 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-k (8.56 g, divalent phenol residue molecular weight 294 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2551g)、および、p−(tert−ブチル)フェノール(0.5351g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.39g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2551 g) and p- (tert-butyl) phenol (0.5351 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.39 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.70mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂15を得た。得られた樹脂15の粘度平均分子量は59,700であった。樹脂15の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.70 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 15. The obtained resin 15 had a viscosity average molecular weight of 59,700. The repeating structure of the resin 15 is shown below.

Figure 2008293006
Figure 2008293006

製造例16(樹脂16)
500mLビーカーに水酸化ナトリウム(10.45g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、2,2−ビス(4−ヒドロキシフェニル)プロパン(以下、BP−n)(15.75g、繰り返し構造中の2価フェノール残基分子量226)と、BP−e(6.75g、繰り返し構造中の2価フェノール残基分子量226)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 16 (Resin 16)
Sodium hydroxide (10.45 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, 2,2-bis (4-hydroxyphenyl) propane (hereinafter referred to as BP-n) (15.75 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-e (6.75 g, repeating) After adding, stirring and dissolving the divalent phenol residue molecular weight 226) in the structure, this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2610g)、および、p−(tert−ブチル)フェノール(0.5476g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.05g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2610 g) and p- (tert-butyl) phenol (0.5476 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.05 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.79mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂16を得た。得られた樹脂16の粘度平均分子量は51,500であった。樹脂16の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.79 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 16. The obtained resin 16 had a viscosity average molecular weight of 51,500. The repeating structure of the resin 16 is shown below.

Figure 2008293006
Figure 2008293006

製造例17(樹脂17)
500mLビーカーに水酸化ナトリウム(10.36g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−n(15.60g、繰り返し構造中の2価フェノール残基分子量226)と、BP−g(7.10g、繰り返し構造中の2価フェノール残基分子量240)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 17 (Resin 17)
Sodium hydroxide (10.36 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-n (15.60 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-g (7.10 g, divalent phenol residue molecular weight 240 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2586g)、および、p−(tert−ブチル)フェノール(0.5426g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.79g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2586 g) and p- (tert-butyl) phenol (0.5426 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.79 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.76mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂17を得た。得られた樹脂17の粘度平均分子量は47,000であった。樹脂17の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.76 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 17. The obtained resin 17 had a viscosity average molecular weight of 47,000. The repeating structure of the resin 17 is shown below.

Figure 2008293006
Figure 2008293006

製造例18(樹脂18)
500mLビーカーに水酸化ナトリウム(10.26g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−n(15.46g、繰り返し構造中の2価フェノール残基分子量226)と、BP−f(7.44g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 18 (Resin 18)
Sodium hydroxide (10.26 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. BP-n (15.46 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-f (7.44 g, divalent phenol residue molecular weight 254 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2563g)、および、p−(tert−ブチル)フェノール(0.5377g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.53g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2563 g) and p- (tert-butyl) phenol (0.5377 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.53 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.72mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂18を得た。得られた樹脂18の粘度平均分子量は43,500であった。樹脂18の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.72 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 18. The obtained resin 18 had a viscosity average molecular weight of 43,500. The repeating structure of the resin 18 is shown below.

Figure 2008293006
Figure 2008293006

製造例19(樹脂19)
500mLビーカーに水酸化ナトリウム(10.26g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−n(15.46g、繰り返し構造中の2価フェノール残基分子量226)と、BP−h(7.44g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 19 (Resin 19)
Sodium hydroxide (10.26 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. BP-n (15.46 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-h (7.44 g, divalent phenol residue molecular weight 254 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2563g)、および、p−(tert−ブチル)フェノール(0.5377g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.53g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2563 g) and p- (tert-butyl) phenol (0.5377 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.53 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.72mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂19を得た。得られた樹脂19の粘度平均分子量は48,400であった。樹脂19の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.72 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 19. The resulting resin 19 had a viscosity average molecular weight of 48,400. The repeating structure of the resin 19 is shown below.

Figure 2008293006
Figure 2008293006

製造例20(樹脂20)
500mLビーカーに水酸化ナトリウム(10.18g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−n(15.34g、繰り返し構造中の2価フェノール残基分子量226)と、BP−m(7.73g、繰り返し構造中の2価フェノール残基分子量266)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 20 (Resin 20)
Sodium hydroxide (10.18 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-n (15.34 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-m (7.73 g, divalent phenol residue molecular weight 266 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2543g)、および、p−(tert−ブチル)フェノール(0.5335g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.31g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2543 g) and p- (tert-butyl) phenol (0.5335 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.31 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.69mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂20を得た。得られた樹脂20の粘度平均分子量は42,000であった。樹脂20の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.69 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 20. The obtained resin 20 had a viscosity average molecular weight of 42,000. The repeating structure of the resin 20 is shown below.

Figure 2008293006
Figure 2008293006

製造例21(樹脂21)
500mLビーカーに水酸化ナトリウム(10.17g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−n(15.32g、繰り返し構造中の2価フェノール残基分子量226)と、BP−i(7.78g、繰り返し構造中の2価フェノール残基分子量268)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 21 (Resin 21)
Sodium hydroxide (10.17 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-n (15.32 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-i (7.78 g, divalent phenol residue molecular weight 268 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2540g)、および、p−(tert−ブチル)フェノール(0.5329g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.27g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2540 g) and p- (tert-butyl) phenol (0.5329 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.27 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.69mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂21を得た。得られた樹脂21の粘度平均分子量は48,800であった。樹脂21の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.69 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 21. The obtained resin 21 had a viscosity average molecular weight of 48,800. The repeating structure of the resin 21 is shown below.

Figure 2008293006
Figure 2008293006

製造例22(樹脂22)
500mLビーカーに水酸化ナトリウム(10.00g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−n(15.07g、繰り返し構造中の2価フェノール残基分子量226)と、BP−k(8.39g、繰り返し構造中の2価フェノール残基分子量294)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 22 (Resin 22)
Sodium hydroxide (10.00 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. BP-n (15.07 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-k (8.39 g, divalent phenol residue molecular weight 294 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2498g)、および、p−(tert−ブチル)フェノール(0.5241g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(27.81g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2498 g) and p- (tert-butyl) phenol (0.5241 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (27.81 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.63mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂22を得た。得られた樹脂22の粘度平均分子量は45,400であった。樹脂22の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.63 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 22. The obtained resin 22 had a viscosity average molecular weight of 45,400. The repeating structure of the resin 22 is shown below.

Figure 2008293006
Figure 2008293006

製造例23(樹脂23)
500mLビーカーに水酸化ナトリウム(10.66g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(16.06g、繰り返し構造中の2価フェノール残基分子量226)と、BP−a(6.04g、繰り返し構造中の2価フェノール残基分子量198)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 23 (Resin 23)
Sodium hydroxide (10.66 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-e (16.06 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-a (6.04 g, divalent phenol residue molecular weight 198 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2662g)、および、2,3,5−トリメチルフェノール(0.5064g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.63g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2662 g) and 2,3,5-trimethylphenol (0.5064 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.63 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.87mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂23を得た。得られた樹脂23の粘度平均分子量は51,800であった。樹脂23の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.87 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 23. The resulting resin 23 had a viscosity average molecular weight of 51,800. The repeating structure of the resin 23 is shown below.

Figure 2008293006
Figure 2008293006

製造例24(樹脂24)
500mLビーカーに水酸化ナトリウム(10.54g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(15.88g、繰り返し構造中の2価フェノール残基分子量226)と、ビス(4−ヒドロキシフェニル)エーテル(以下、BP−o)(6.03g、繰り返し構造中の2価フェノール残基分子量200)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 24 (Resin 24)
Sodium hydroxide (10.54 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, BP-e (15.88 g, divalent phenol residue molecular weight 226 in the repeating structure) and bis (4-hydroxyphenyl) ether (hereinafter referred to as BP-o) (6.03 g, 2 in the repeating structure) After adding, stirring and dissolving the valent phenol residue molecular weight 200), this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2632g)、および、2,3,5−トリメチルフェノール(0.5006g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.89g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2632 g) and 2,3,5-trimethylphenol (0.5006 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.89 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.82mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂24を得た。得られた樹脂24の粘度平均分子量は29,700であった。樹脂24の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.82 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 24. The obtained resin 24 had a viscosity average molecular weight of 29,700. The repeating structure of the resin 24 is shown below.

Figure 2008293006
Figure 2008293006

製造例25(樹脂25)
500mLビーカーに水酸化ナトリウム(10.56g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(15.91g、繰り返し構造中の2価フェノール残基分子量226)と、BP−l(6.40g、繰り返し構造中の2価フェノール残基分子量212)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 25 (Resin 25)
Sodium hydroxide (10.56 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-e (15.91 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-l (6.40 g, divalent phenol residue molecular weight 212 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2637g)、および、2,3,5−トリメチルフェノール(0.5017g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.36g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2637 g) and 2,3,5-trimethylphenol (0.5017 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.36 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.83mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂25を得た。得られた樹脂25の粘度平均分子量は57,600であった。樹脂25の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.83 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 25. The obtained resin 25 had a viscosity average molecular weight of 57,600. The repeating structure of the resin 25 is shown below.

Figure 2008293006
Figure 2008293006

製造例26(樹脂26)
500mLビーカーに水酸化ナトリウム(10.46g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(15.76g、繰り返し構造中の2価フェノール残基分子量226)と、BP−n(6.76g、繰り返し構造中の2価フェノール残基分子量226)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 26 (Resin 26)
Sodium hydroxide (10.46 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, BP-e (15.76 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-n (6.76 g, divalent phenol residue molecular weight 226 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2613g)、および、2,3,5−トリメチルフェノール(0.4970g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.08g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2613 g) and 2,3,5-trimethylphenol (0.4970 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.08 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.79mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂26を得た。得られた樹脂26の粘度平均分子量は59,400であった。樹脂26の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.79 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 26. The obtained resin 26 had a viscosity average molecular weight of 59,400. The repeating structure of the resin 26 is shown below.

Figure 2008293006
Figure 2008293006

製造例27(樹脂27)
500mLビーカーに水酸化ナトリウム(10.37g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(15.62g、繰り返し構造中の2価フェノール残基分子量226)と、BP−g(7.11g、繰り返し構造中の2価フェノール残基分子量240)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 27 (Resin 27)
Sodium hydroxide (10.37 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, BP-e (15.62 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-g (7.11 g, divalent phenol residue molecular weight 240 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2589g)、および、2,3,5−トリメチルフェノール(0.4925g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.82g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2589 g) and 2,3,5-trimethylphenol (0.4925 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.82 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.76mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂27を得た。得られた樹脂27の粘度平均分子量は63,400であった。樹脂27の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.76 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 27. The obtained resin 27 had a viscosity average molecular weight of 63,400. The repeating structure of the resin 27 is shown below.

Figure 2008293006
Figure 2008293006

製造例28(樹脂28)
500mLビーカーに水酸化ナトリウム(10.27g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(15.48g、繰り返し構造中の2価フェノール残基分子量226)と、BP−f(7.45g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 28 (Resin 28)
Sodium hydroxide (10.27 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-e (15.48 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-f (7.45 g, divalent phenol residue molecular weight 254 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2566g)、および、2,3,5−トリメチルフェノール(0.4880g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.56g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2566 g) and 2,3,5-trimethylphenol (0.4880 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.56 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.73mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂28を得た。得られた樹脂28の粘度平均分子量は53,800であった。樹脂28の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.73 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 28. The obtained resin 28 had a viscosity average molecular weight of 53,800. The repeating structure of the resin 28 is shown below.

Figure 2008293006
Figure 2008293006

製造例29(樹脂29)
500mLビーカーに水酸化ナトリウム(10.27g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(15.48g、繰り返し構造中の2価フェノール残基分子量226)と、BP−h(7.45g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 29 (Resin 29)
Sodium hydroxide (10.27 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-e (15.48 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-h (7.45 g, divalent phenol residue molecular weight 254 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2566g)、および、2,3,5−トリメチルフェノール(0.4880g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.56g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2566 g) and 2,3,5-trimethylphenol (0.4880 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.56 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.73mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂29を得た。得られた樹脂29の粘度平均分子量は54,300であった。樹脂29の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.73 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 29. The obtained resin 29 had a viscosity average molecular weight of 54,300. The repeating structure of the resin 29 is shown below.

Figure 2008293006
Figure 2008293006

製造例30(樹脂30)
500mLビーカーに水酸化ナトリウム(10.19g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(15.36g、繰り返し構造中の2価フェノール残基分子量226)と、BP−m(7.74g、繰り返し構造中の2価フェノール残基分子量266)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 30 (Resin 30)
Sodium hydroxide (10.19 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. There, BP-e (15.36 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-m (7.74 g, divalent phenol residue molecular weight 266 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2546g)、および、2,3,5−トリメチルフェノール(0.4843g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.34g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2546 g) and 2,3,5-trimethylphenol (0.4843 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.34 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.70mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂30を得た。得られた樹脂30の粘度平均分子量は49,300であった。樹脂30の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.70 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 30. The resulting resin 30 had a viscosity average molecular weight of 49,300. The repeating structure of the resin 30 is shown below.

Figure 2008293006
Figure 2008293006

製造例31(樹脂31)
500mLビーカーに水酸化ナトリウム(10.18g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(15.34g、繰り返し構造中の2価フェノール残基分子量226)と、BP−i(7.79g、繰り返し構造中の2価フェノール残基分子量268)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 31 (Resin 31)
Sodium hydroxide (10.18 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-e (15.34 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-i (7.79 g, divalent phenol residue molecular weight 268 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2543g)、および、2,3,5−トリメチルフェノール(0.4837g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.30g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2543 g) and 2,3,5-trimethylphenol (0.4837 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.30 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.69mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂31を得た。得られた樹脂31の粘度平均分子量は56,200であった。樹脂31の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.69 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 31. The obtained resin 31 had a viscosity average molecular weight of 56,200. The repeating structure of the resin 31 is shown below.

Figure 2008293006
Figure 2008293006

製造例32(樹脂32)
500mLビーカーに水酸化ナトリウム(8.83g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(16.68g、繰り返し構造中の2価フェノール残基分子量240)と、BP−d(5.91g、繰り返し構造中の2価フェノール残基分子量198)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 32 (Resin 32)
Sodium hydroxide (8.83 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (16.68 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-d (5.91 g, divalent phenol residue molecular weight 198 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2605g)、および、2,3,5−トリメチルフェノール(0.4955g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.00g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Subsequently, benzyltriethylammonium chloride (0.2605 g) and 2,3,5-trimethylphenol (0.4955 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.00 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(1.26mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂32を得た。得られた樹脂32の粘度平均分子量は48,600であった。樹脂32の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (1.26 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 32. The obtained resin 32 had a viscosity average molecular weight of 48,600. The repeating structure of the resin 32 is shown below.

Figure 2008293006
Figure 2008293006

製造例33(樹脂33)
500mLビーカーに水酸化ナトリウム(10.43g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(16.68g、繰り返し構造中の2価フェノール残基分子量240)と、BP−a(5.91g、繰り返し構造中の2価フェノール残基分子量198)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 33 (Resin 33)
Sodium hydroxide (10.43 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. BP-g (16.68 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-a (5.91 g, divalent phenol residue molecular weight 198 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2605g)、および、2,3,5−トリメチルフェノール(0.4955g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.00g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Subsequently, benzyltriethylammonium chloride (0.2605 g) and 2,3,5-trimethylphenol (0.4955 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.00 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.78mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂33を得た。得られた樹脂33の粘度平均分子量は40,000であった。樹脂33の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.78 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 33. The obtained resin 33 had a viscosity average molecular weight of 40,000. The repeating structure of the resin 33 is shown below.

Figure 2008293006
Figure 2008293006

製造例34(樹脂34)
500mLビーカーに水酸化ナトリウム(10.31g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(16.49g、繰り返し構造中の2価フェノール残基分子量240)と、BP−o(5.90g、繰り返し構造中の2価フェノール残基分子量200)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 34 (Resin 34)
Sodium hydroxide (10.31 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (16.49 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-o (5.90 g, divalent phenol residue molecular weight 200 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2576g)、および、2,3,5−トリメチルフェノール(0.4900g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.26g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2576 g) and 2,3,5-trimethylphenol (0.4900 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.26 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.74mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂34を得た。得られた樹脂34の粘度平均分子量は36,000であった。樹脂34の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.74 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 34. The obtained resin 34 had a viscosity average molecular weight of 36,000. The repeating structure of the resin 34 is shown below.

Figure 2008293006
Figure 2008293006

製造例35(樹脂35)
500mLビーカーに水酸化ナトリウム(10.34g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(16.53g、繰り返し構造中の2価フェノール残基分子量240)と、3,3’−ジメチル−4,4’−ジヒドロキシ−1,1’−ビフェニル(以下、BP−p)(6.26g、繰り返し構造中の2価フェノール残基分子量212)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 35 (Resin 35)
Sodium hydroxide (10.34 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (16.53 g, divalent phenol residue molecular weight 240 in the repeating structure) and 3,3′-dimethyl-4,4′-dihydroxy-1,1′-biphenyl (hereinafter referred to as BP-) p) (6.26 g, molecular weight 212 of the divalent phenol residue in the repeating structure) was added, stirred and dissolved, and then this aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2581g)、および、2,3,5−トリメチルフェノール(0.4910g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.73g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2581 g) and 2,3,5-trimethylphenol (0.4910 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.73 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.75mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂35を得た。得られた樹脂35の粘度平均分子量は29,300であった。樹脂35の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.75 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 35. The obtained resin 35 had a viscosity average molecular weight of 29,300. The repeating structure of the resin 35 is shown below.

Figure 2008293006
Figure 2008293006

製造例36(樹脂36)
500mLビーカーに水酸化ナトリウム(10.34g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(16.53g、繰り返し構造中の2価フェノール残基分子量240)と、BP−l(6.26g、繰り返し構造中の2価フェノール残基分子量212)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 36 (Resin 36)
Sodium hydroxide (10.34 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (16.53 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-1 (6.26 g, divalent phenol residue molecular weight 212 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2581g)、および、2,3,5−トリメチルフェノール(0.4910g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.73g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2581 g) and 2,3,5-trimethylphenol (0.4910 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.73 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.75mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂36を得た。得られた樹脂36の粘度平均分子量は43,900であった。樹脂36の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.75 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 36. The obtained resin 36 had a viscosity average molecular weight of 43,900. The repeating structure of the resin 36 is shown below.

Figure 2008293006
Figure 2008293006

製造例37(樹脂37)
500mLビーカーに水酸化ナトリウム(10.24g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(16.38g、繰り返し構造中の2価フェノール残基分子量240)と、BP−n(6.61g、繰り返し構造中の2価フェノール残基分子量226)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 37 (Resin 37)
Sodium hydroxide (10.24 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-g (16.38 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-n (6.61 g, divalent phenol residue molecular weight 226 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2558g)、および、2,3,5−トリメチルフェノール(0.4866g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.47g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2558 g) and 2,3,5-trimethylphenol (0.4866 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.47 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.71mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂37を得た。得られた樹脂37の粘度平均分子量は47,900であった。樹脂37の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.71 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 37. The obtained resin 37 had a viscosity average molecular weight of 47,900. The repeating structure of the resin 37 is shown below.

Figure 2008293006
Figure 2008293006

製造例38(樹脂38)
500mLビーカーに水酸化ナトリウム(10.24g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(16.25g、繰り返し構造中の2価フェノール残基分子量240)と、BP−e(6.56g、繰り返し構造中の2価フェノール残基分子量226)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
次いで、ベンジルトリエチルアンモニウムクロライド(0.2575g)、および、2,3,5−トリメチルフェノール(0.6785g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.46g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Production Example 38 (Resin 38)
Sodium hydroxide (10.24 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (16.25 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-e (6.56 g, divalent phenol residue molecular weight 226 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.
Then, benzyltriethylammonium chloride (0.2575 g) and 2,3,5-trimethylphenol (0.6785 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.46 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.71mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂38を得た。得られた樹脂38の粘度平均分子量は43,100であった。樹脂38の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.71 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 38. The obtained resin 38 had a viscosity average molecular weight of 43,100. The repeating structure of the resin 38 is shown below.

Figure 2008293006
Figure 2008293006

製造例39(樹脂39)
500mLビーカーに水酸化ナトリウム(10.15g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(16.23g、繰り返し構造中の2価フェノール残基分子量240)と、3,3’,5,5’−テトラメチル−4,4’−ジヒドロキシ−1,1’−ビフェニル(以下、BP−q)(6.96g、繰り返し構造中の2価フェノール残基分子量240)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 39 (Resin 39)
Sodium hydroxide (10.15 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. BP-g (16.23 g, divalent phenol residue molecular weight 240 in the repeating structure), 3,3 ′, 5,5′-tetramethyl-4,4′-dihydroxy-1,1′- Biphenyl (hereinafter referred to as BP-q) (6.96 g, molecular weight 240 of the divalent phenol residue in the repeating structure) was added, stirred and dissolved, and then the aqueous alkaline solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2535g)、および、2,3,5−トリメチルフェノール(0.4822g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.22g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2535 g) and 2,3,5-trimethylphenol (0.4822 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.22 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.68mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂39を得た。得られた樹脂39の粘度平均分子量は45,800であった。樹脂39の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.68 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 39. The obtained resin 39 had a viscosity average molecular weight of 45,800. The repeating structure of the resin 39 is shown below.

Figure 2008293006
Figure 2008293006

製造例40(樹脂40)
500mLビーカーに水酸化ナトリウム(10.06g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(15.97g、繰り返し構造中の2価フェノール残基分子量240)と、BP−f(7.24g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 40 (Resin 40)
Sodium hydroxide (10.06 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (15.97 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-f (7.24 g, divalent phenol residue molecular weight 254 in the repeating structure) were added and stirred. After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2529g)、および、2,3,5−トリメチルフェノール(0.6665g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(27.96g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2529 g) and 2,3,5-trimethylphenol (0.6665 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (27.96 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.65mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂40を得た。得られた樹脂40の粘度平均分子量は38,000であった。樹脂40の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.65 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 40. The obtained resin 40 had a viscosity average molecular weight of 38,000. The repeating structure of the resin 40 is shown below.

Figure 2008293006
Figure 2008293006

製造例41(樹脂41)
500mLビーカーに水酸化ナトリウム(10.06g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(15.97g、繰り返し構造中の2価フェノール残基分子量240)と、BP−h(7.24g、繰り返し構造中の2価フェノール残基分子量254)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 41 (Resin 41)
Sodium hydroxide (10.06 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-g (15.97 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-h (7.24 g, divalent phenol residue molecular weight 254 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2529g)、および、2,3,5−トリメチルフェノール(0.6665g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(27.96g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2529 g) and 2,3,5-trimethylphenol (0.6665 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (27.96 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.65mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂41を得た。得られた樹脂41の粘度平均分子量は39,800であった。樹脂41の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.65 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 41. The obtained resin 41 had a viscosity average molecular weight of 39,800. The repeating structure of the resin 41 is shown below.

Figure 2008293006
Figure 2008293006

製造例42(樹脂42)
500mLビーカーに水酸化ナトリウム(9.98g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(15.85g、繰り返し構造中の2価フェノール残基分子量240)と、BP−m(7.52g、繰り返し構造中の2価フェノール残基分子量266)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 42 (Resin 42)
Sodium hydroxide (9.98 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-g (15.85 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-m (7.52 g, divalent phenol residue molecular weight 266 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2511g)、および、2,3,5−トリメチルフェノール(0.6615g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(27.75g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2511 g) and 2,3,5-trimethylphenol (0.6615 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (27.75 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.62mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂42を得た。得られた樹脂42の粘度平均分子量は35,400であった。樹脂42の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.62 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 42. The resulting resin 42 had a viscosity average molecular weight of 35,400. The repeating structure of the resin 42 is shown below.

Figure 2008293006
Figure 2008293006

製造例43(樹脂43)
500mLビーカーに水酸化ナトリウム(10.03g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−h(16.97g、繰り返し構造中の2価フェノール残基分子量254)と、BP−n(6.48g、繰り返し構造中の2価フェノール残基分子量226)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 43 (Resin 43)
Sodium hydroxide (10.03 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-h (16.97 g, divalent phenol residue molecular weight 254 in the repeating structure) and BP-n (6.48 g, divalent phenol residue molecular weight 226 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2505g)、および、2,3,6−トリメチルフェノール(0.4765g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(27.88g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Subsequently, benzyltriethylammonium chloride (0.2505 g) and 2,3,6-trimethylphenol (0.4765 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (27.88 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.64mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂43を得た。得られた樹脂43の粘度平均分子量は45,700であった。樹脂43の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.64 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 43. The obtained resin 43 had a viscosity average molecular weight of 45,700. The repeating structure of the resin 43 is shown below.

Figure 2008293006
Figure 2008293006

製造例44(樹脂44)
500mLビーカーに水酸化ナトリウム(9.78g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−h(16.55g、繰り返し構造中の2価フェノール残基分子量254)と、BP−m(7.43g、繰り返し構造中の2価フェノール残基分子量266)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
次いで、ベンジルトリエチルアンモニウムクロライド(0.2444g)、および、2,3,6−トリメチルフェノール(0.4648g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(27.20g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Production Example 44 (Resin 44)
Sodium hydroxide (9.78 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-h (16.55 g, divalent phenol residue molecular weight 254 in the repeating structure) and BP-m (7.43 g, divalent phenol residue molecular weight 266 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.
Then, benzyltriethylammonium chloride (0.2444 g) and 2,3,6-trimethylphenol (0.4648 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (27.20 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.55mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂44を得た。得られた樹脂44の粘度平均分子量は39,900であった。樹脂44の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.55 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 44. The obtained resin 44 had a viscosity average molecular weight of 39,900. The repeating structure of the resin 44 is shown below.

Figure 2008293006
Figure 2008293006

製造例45(樹脂45)
500mLビーカーに水酸化ナトリウム(9.45g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−m(16.73g、繰り返し構造中の2価フェノール残基分子量266)と、BP−k(7.92g、繰り返し構造中の2価フェノール残基分子量294)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 45 (Resin 45)
Sodium hydroxide (9.45 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-m (16.73 g, divalent phenol residue molecular weight 266 in the repeating structure) and BP-k (7.92 g, divalent phenol residue molecular weight 294 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2360g)、および、p−(tert−ブチル)フェノール(0.4951g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(26.26g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2360 g) and p- (tert-butyl) phenol (0.4951 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (26.26 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.43mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂45を得た。得られた樹脂45の粘度平均分子量は47,300であった。樹脂45の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.43 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 45. The obtained resin 45 had a viscosity average molecular weight of 47,300. The repeating structure of the resin 45 is shown below.

Figure 2008293006
Figure 2008293006

製造例46(樹脂46)
500mLビーカーに水酸化ナトリウム(10.15g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(10.17g、繰り返し構造中の2価フェノール残基分子量212)と、BP−i(12.84g、繰り返し構造中の2価フェノール残基分子量268)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。
Production Example 46 (Resin 46)
Sodium hydroxide (10.15 g) and H 2 O (423 mL) were weighed in a 500 mL beaker and dissolved with stirring. Thereto, BP-1 (10.17 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-i (12.84 g, divalent phenol residue molecular weight 268 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel.

次いで、ベンジルトリエチルアンモニウムクロライド(0.2552g)、および、2,3,6−トリメチルフェノール(0.6725g)を順次反応槽に添加した。
別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.20g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
Then, benzyltriethylammonium chloride (0.2552 g) and 2,3,6-trimethylphenol (0.6725 g) were sequentially added to the reaction vessel.
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.20 g) and dichloromethane (211 mL) was transferred into the dropping funnel.

重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.68mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂46を得た。得られた樹脂46の粘度平均分子量は35,400であった。樹脂46の繰り返し構造を以下に示す。
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.68 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 46. The obtained resin 46 had a viscosity average molecular weight of 35,400. The repeating structure of the resin 46 is shown below.

Figure 2008293006
Figure 2008293006

(実施例1〜実施例42、比較例1〜比較例4)
前述した樹脂1〜樹脂46を用いて調製した感光体シートについて、電気特性試験及び摩耗試験を行った。樹脂1〜樹脂46の各粘度平均分子量(Mv)と併せて結果を表1及び表2に示す。尚、表3に、略語で示した2価フェノール残基Aを与える2価フェノール化合物及び2価フェノール残基Bを与える2価フェノール化合物の化合物名を示す。
(Examples 1 to 42, Comparative Examples 1 to 4)
Electrical characteristics tests and abrasion tests were performed on the photoreceptor sheets prepared using the above-described resins 1 to 46. The results are shown in Tables 1 and 2 together with the viscosity average molecular weights (Mv) of Resin 1 to Resin 46. Table 3 shows the compound names of the divalent phenol compound that gives the divalent phenol residue A and the divalent phenol compound that gives the divalent phenol residue B shown in abbreviations.

Figure 2008293006
Figure 2008293006

Figure 2008293006
Figure 2008293006

Figure 2008293006
Figure 2008293006

表1及び表2に示す結果から、分子量250以下の2価フェノール残基を用い、且つ、式(1)における{a/(a+b)}が0.7であるポリエステル樹脂(樹脂1〜樹脂42)を含有する感光体シート(実施例1〜実施例42)は、電気特性及び摩耗試験において良好な性能を示すことが分かる。
これに対して、分子量250以上の2価フェノール残基を用い、且つ、式(1)における{a/(a+b)}が0.7であるポリエステル樹脂(樹脂43、樹脂44、樹脂45)を含有する感光体シート(比較例1〜比較例3)は、摩耗試験において充分な結果が得られない。さらに、分子量250以下の2価フェノール残基を用い、且つ、式(1)における{a/(a+b)}が0.5であるポリエステル樹脂(樹脂46)を含有する感光体シート(比較例4)も、摩耗試験において充分な結果が得られないことが分かる。
From the results shown in Tables 1 and 2, a polyester resin (resin 1 to resin 42) using a divalent phenol residue having a molecular weight of 250 or less and {a / (a + b)} in the formula (1) being 0.7. ) -Containing photoreceptor sheets (Examples 1 to 42) show good performance in electrical properties and wear tests.
On the other hand, a polyester resin (resin 43, resin 44, resin 45) using a divalent phenol residue having a molecular weight of 250 or more and {a / (a + b)} in the formula (1) is 0.7. The photosensitive sheet contained (Comparative Examples 1 to 3) does not give sufficient results in the wear test. Further, a photoreceptor sheet containing a polyester resin (resin 46) using a divalent phenol residue having a molecular weight of 250 or less and {a / (a + b)} in formula (1) being 0.5 (Comparative Example 4) ) Also shows that sufficient results cannot be obtained in the wear test.

製造例47(樹脂47)
500mLビーカーに水酸化ナトリウム(10.57g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(14.86g、繰り返し構造中の2価フェノール残基分子量212)と、BP−g(7.20g、繰り返し構造中の2価フェノール残基分子量240)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。次いで、ベンジルトリエチルアンモニウムクロライド(0.2655g)、および、p−(tert−ブチル)フェノール(0.7292g)を順次反応槽に添加した。
Production Example 47 (Resin 47)
Sodium hydroxide (10.57 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-l (14.86 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-g (7.20 g, divalent phenol residue molecular weight 240 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel. Then, benzyltriethylammonium chloride (0.2655 g) and p- (tert-butyl) phenol (0.7292 g) were sequentially added to the reaction vessel.

別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.38g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.83mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂47を得た。得られた樹脂47の粘度平均分子量は42,100であった。樹脂47の繰り返し構造を以下に示す。
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.38 g) and dichloromethane (211 mL) was transferred into the dropping funnel.
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.83 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 47. The obtained resin 47 had a viscosity average molecular weight of 42,100. The repeating structure of the resin 47 is shown below.

Figure 2008293006
Figure 2008293006

製造例48(樹脂48)
500mLビーカーに水酸化ナトリウム(10.38g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−l(14.58g、繰り返し構造中の2価フェノール残基分子量212)と、BP−i(7.89g、繰り返し構造中の2価フェノール残基分子量268)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。次いで、ベンジルトリエチルアンモニウムクロライド(0.2608g)、および、p−(tert−ブチル)フェノール(0.7301g)を順次反応槽に添加した。
Production Example 48 (Resin 48)
Sodium hydroxide (10.38 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-1 (14.58 g, divalent phenol residue molecular weight 212 in the repeating structure) and BP-i (7.89 g, divalent phenol residue molecular weight 268 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel. Subsequently, benzyltriethylammonium chloride (0.2608 g) and p- (tert-butyl) phenol (0.7301 g) were sequentially added to the reaction vessel.

別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.85g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.76mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂48を得た。得られた樹脂48の粘度平均分子量は46,200であった。樹脂48の繰り返し構造を以下に示す。
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.85 g) and dichloromethane (211 mL) was transferred into the dropping funnel.
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.76 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 48. The resulting resin 48 had a viscosity average molecular weight of 46,200. The repeating structure of the resin 48 is shown below.

Figure 2008293006
Figure 2008293006

製造例49(樹脂49)
500mLビーカーに水酸化ナトリウム(10.66g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−e(16.03g、繰り返し構造中の2価フェノール残基分子量226)と、BP−d(6.03g、繰り返し構造中の2価フェノール残基分子量198)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。次いで、ベンジルトリエチルアンモニウムクロライド(0.2666g)、および、2,3,5−トリメチルフェノール(0.5465g)を順次反応槽に添加した。
Production Example 49 (Resin 49)
Sodium hydroxide (10.66 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-e (16.03 g, divalent phenol residue molecular weight 226 in the repeating structure) and BP-d (6.03 g, divalent phenol residue molecular weight 198 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel. Then, benzyltriethylammonium chloride (0.2666 g) and 2,3,5-trimethylphenol (0.5465 g) were sequentially added to the reaction vessel.

別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(29.63g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.86mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂49を得た。得られた樹脂49の粘度平均分子量は40,600であった。樹脂49の繰り返し構造を以下に示す。
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (29.63 g) and dichloromethane (211 mL) was transferred into the dropping funnel.
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.86 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered off and dried to obtain the desired resin 49. The obtained resin 49 had a viscosity average molecular weight of 40,600. The repeating structure of the resin 49 is shown below.

Figure 2008293006
Figure 2008293006

製造例50(樹脂50)
500mLビーカーに水酸化ナトリウム(10.27g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(18.75g、繰り返し構造中の2価フェノール残基分子量240)と、BP−l(4.14g、繰り返し構造中の2価フェノール残基分子量212)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。次いで、ベンジルトリエチルアンモニウムクロライド(0.2569g)、および、2,3,5−トリメチルフェノール(0.5268g)を順次反応槽に添加した。
Production Example 50 (Resin 50)
Sodium hydroxide (10.27 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (18.75 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-l (4.14 g, divalent phenol residue molecular weight 212 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel. Then, benzyltriethylammonium chloride (0.25569 g) and 2,3,5-trimethylphenol (0.5268 g) were sequentially added to the reaction vessel.

別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.55g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.73mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂50を得た。得られた樹脂50の粘度平均分子量は45,700であった。樹脂50の繰り返し構造を以下に示す。
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.55 g) and dichloromethane (211 mL) was transferred into the dropping funnel.
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.73 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 50. The obtained resin 50 had a viscosity average molecular weight of 45,700. The repeating structure of the resin 50 is shown below.

Figure 2008293006
Figure 2008293006

製造例51(樹脂51)
500mLビーカーに水酸化ナトリウム(10.40g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(14.23g、繰り返し構造中の2価フェノール残基分子量240)と、BP−l(8.39g、繰り返し構造中の2価フェノール残基分子量212)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。次いで、ベンジルトリエチルアンモニウムクロライド(0.2601g)、および、2,3,5−トリメチルフェノール(0.5332g)を順次反応槽に添加した。
Production Example 51 (Resin 51)
Sodium hydroxide (10.40 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (14.23 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-1 (8.39 g, divalent phenol residue molecular weight 212 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel. Then, benzyltriethylammonium chloride (0.2601 g) and 2,3,5-trimethylphenol (0.5332 g) were sequentially added to the reaction vessel.

別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.90g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.77mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂51を得た。得られた樹脂51の粘度平均分子量は43,400であった。樹脂51の繰り返し構造を以下に示す。
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.90 g) and dichloromethane (211 mL) was transferred into the dropping funnel.
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.77 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 51. The obtained resin 51 had a viscosity average molecular weight of 43,400. The repeating structure of the resin 51 is shown below.

Figure 2008293006
Figure 2008293006

製造例52(樹脂52)
500mLビーカーに水酸化ナトリウム(9.97g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−g(15.88g、繰り返し構造中の2価フェノール残基分子量240)と、BP−i(7.59g、繰り返し構造中の2価フェノール残基分子量268)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。次いで、ベンジルトリエチルアンモニウムクロライド(0.2500g)、および、2,3,5−トリメチルフェノール(0.5738g)を順次反応槽に添加した。
Production Example 52 (Resin 52)
Sodium hydroxide (9.97 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. BP-g (15.88 g, divalent phenol residue molecular weight 240 in the repeating structure) and BP-i (7.59 g, divalent phenol residue molecular weight 268 in the repeating structure) were added thereto, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel. Then, benzyltriethylammonium chloride (0.2500 g) and 2,3,5-trimethylphenol (0.5738 g) were sequentially added to the reaction vessel.

別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(27.72g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.62mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂52を得た。得られた樹脂52の粘度平均分子量は45,000であった。樹脂52の繰り返し構造を以下に示す。
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (27.72 g) and dichloromethane (211 mL) was transferred into the dropping funnel.
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.62 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was isolate | separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 52. The obtained resin 52 had a viscosity average molecular weight of 45,000. The repeating structure of the resin 52 is shown below.

Figure 2008293006
Figure 2008293006

製造例53(樹脂53)
500mLビーカーに水酸化ナトリウム(10.22g)とHO(423mL)を量り取り、撹拌しながら溶解させた。そこに、BP−h(17.40g、繰り返し構造中の2価フェノール残基分子量254)と、BP−d(5.83g、繰り返し構造中の2価フェノール残基分子量198)を添加、撹拌、溶解した後、このアルカリ水溶液を1L反応槽に移した。次いで、ベンジルトリエチルアンモニウムクロライド(0.2535g)、および、2,3,6−トリメチルフェノール(0.3038g)を順次反応槽に添加した。
Production Example 53 (Resin 53)
Sodium hydroxide (10.22 g) and H 2 O (423 mL) were weighed into a 500 mL beaker and dissolved with stirring. Thereto, BP-h (17.40 g, divalent phenol residue molecular weight 254 in the repeating structure) and BP-d (5.83 g, divalent phenol residue molecular weight 198 in the repeating structure) were added, stirred, After dissolution, this alkaline aqueous solution was transferred to a 1 L reaction vessel. Then, benzyltriethylammonium chloride (0.2535 g) and 2,3,6-trimethylphenol (0.3038 g) were sequentially added to the reaction vessel.

別途、ジフェニルエーテル−4,4’−ジカルボン酸クロライド(28.40g)とジクロロメタン(211mL)の混合溶液を滴下ロート内に移した。
重合槽の外温を20℃に保ち、反応槽内のアルカリ水溶液を撹拌しながら、滴下ロートよりジクロロメタン溶液を1時間かけて滴下した。さらに4時間撹拌を続けた後、ジクロロメタン(352mL)を加え、撹拌を6時間続けた。その後、酢酸(3.70mL)を加え30分撹拌した後、撹拌を停止し有機層を分離した。この有機層を0.1N水酸化ナトリウム水溶液(424mL)にて洗浄を2回行い、次に、0.1N塩酸(424mL)にて洗浄を4回行い、さらに、HO(424mL)にて洗浄を2回行った。
洗浄後の有機層をメタノール(2,820mL)に注いで得られた沈殿物を濾過にて取り出し、乾燥して目的の樹脂53を得た。得られた樹脂53の粘度平均分子量は42,800であった。樹脂53の繰り返し構造を以下に示す。
Separately, a mixed solution of diphenyl ether-4,4′-dicarboxylic acid chloride (28.40 g) and dichloromethane (211 mL) was transferred into the dropping funnel.
While maintaining the external temperature of the polymerization tank at 20 ° C. and stirring the aqueous alkali solution in the reaction tank, the dichloromethane solution was dropped from the dropping funnel over 1 hour. After further stirring for 4 hours, dichloromethane (352 mL) was added and stirring was continued for 6 hours. Then, after adding acetic acid (3.70 mL) and stirring for 30 minutes, stirring was stopped and the organic layer was separated. This organic layer was washed twice with 0.1N aqueous sodium hydroxide (424 mL), then washed four times with 0.1N hydrochloric acid (424 mL), and further with H 2 O (424 mL). Washing was performed twice.
The washed organic layer was poured into methanol (2,820 mL), and the resulting precipitate was filtered out and dried to obtain the desired resin 53. The resulting resin 53 had a viscosity average molecular weight of 42,800. The repeating structure of the resin 53 is shown below.

Figure 2008293006
Figure 2008293006

[感光体ドラムの製造]
<電荷発生層用分散液の製造>
CuKα線によるX線回折においてブラッグ角(2θ±0.2)9.3゜、10.6゜、13.2゜、15.1゜、15.7゜、16.1゜、20.8゜、23.3゜、26.3゜、27.1゜に強い回折ピークを示すオキシチタニウムフタロシアニン10重量部を、1,2−ジメトキシエタン150重量部に加え、サンドグラインドミルにて粉砕分散処理を行い、顔料分散液を製造した。
ポリビニルブチラール(電気化学工業株式会社製、商品名デンカブチラール#6000C)5重量部を1,2−ジメトキシエタン95重量部に溶解し、固形分濃度5%のバインダー溶液1を製造した。
[Manufacture of photosensitive drum]
<Manufacture of dispersion for charge generation layer>
Bragg angles (2θ ± 0.2) 9.3 °, 10.6 °, 13.2 °, 15.1 °, 15.7 °, 16.1 °, 20.8 ° in X-ray diffraction by CuKα ray , 10 parts by weight of oxytitanium phthalocyanine showing strong diffraction peaks at 23.3 °, 26.3 °, and 27.1 ° are added to 150 parts by weight of 1,2-dimethoxyethane, and pulverized and dispersed in a sand grind mill. And a pigment dispersion was produced.
5 parts by weight of polyvinyl butyral (trade name Denkabutyral # 6000C, manufactured by Denki Kagaku Kogyo Co., Ltd.) was dissolved in 95 parts by weight of 1,2-dimethoxyethane to produce a binder solution 1 having a solid content concentration of 5%.

フェノキシ樹脂(ユニオンカーバイド株式会社製、商品名PKHH)5重量部を1,2−ジメトキシエタン95重量部に溶解し、固形分濃度5%のバインダー溶液2を製造した。先に製造した顔料分散液160重量部に、バインダー溶液1を50重量部、バインダー溶液2を50重量部、適量の1,2−ジメトキシエタンと、適量の4−メトキシ−4−メチル−2−ペンタノンを加え固形分濃度4.0%、1,2−ジメトキシエタン:4−メトキシ−4−メチル−2−ペンタノン=9:1の電荷発生層用分散液αを調製した。   5 parts by weight of phenoxy resin (trade name PKHH, manufactured by Union Carbide Co., Ltd.) was dissolved in 95 parts by weight of 1,2-dimethoxyethane to produce a binder solution 2 having a solid content concentration of 5%. To 160 parts by weight of the previously prepared pigment dispersion, 50 parts by weight of binder solution 1, 50 parts by weight of binder solution 2, an appropriate amount of 1,2-dimethoxyethane, and an appropriate amount of 4-methoxy-4-methyl-2- Pentanone was added to prepare a charge generation layer dispersion α having a solid content concentration of 4.0% and 1,2-dimethoxyethane: 4-methoxy-4-methyl-2-pentanone = 9: 1.

実施例43
表面が鏡面仕上げされた外径30mm、長さ285mm、肉厚1.0mmのアルミニウム合金よりなるシリンダーの表面に、陽極酸化処理を行い、その後、酢酸ニッケルを主成分とする封孔剤によって封孔処理を行うことにより、約6μmの陽極酸化被膜(アルマイト被膜)を形成した。このシリンダーに、先に製造した電荷発生層用分散液αを浸漬塗布し、その乾燥後の膜厚が、約0.3μmとなるように電荷発生層を形成した。
次に、この電荷発生層を形成したシリンダーを、前記電荷輸送物質(1)を主成分とする異性体混合物よりなる電荷輸送物質50重量部と、電荷輸送層用バインダー樹脂として樹脂4を100重量部、シリコーンオイル(信越化学株式会社製、商品名KF96)0.05重量部をテトラヒドロフラン/トルエン混合溶媒(テトラヒドロフラン80重量%、トルエン20重量%)に溶解させた電荷輸送層形成用塗布液に浸漬塗布することにより、乾燥後の膜厚20μmの電荷輸送層を設けた。このようにして得られた感光体ドラムをL4とする。
Example 43
The surface of a cylinder made of an aluminum alloy having an outer diameter of 30 mm, a length of 285 mm, and a wall thickness of 1.0 mm, which has a mirror-finished surface, is anodized and then sealed with a sealing agent mainly composed of nickel acetate. By performing the treatment, an anodic oxide coating (alumite coating) of about 6 μm was formed. The charge generation layer dispersion α produced earlier was dip coated on this cylinder, and the charge generation layer was formed so that the film thickness after drying was about 0.3 μm.
Next, the cylinder in which the charge generation layer is formed is charged with 50 parts by weight of a charge transport material composed of an isomer mixture containing the charge transport material (1) as a main component and 100 parts by weight of resin 4 as a binder resin for the charge transport layer. Part, a silicone oil (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KF96) 0.05 part by weight is immersed in a coating solution for forming a charge transport layer dissolved in a tetrahydrofuran / toluene mixed solvent (tetrahydrofuran 80% by weight, toluene 20% by weight). By applying, a charge transport layer having a thickness of 20 μm after drying was provided. The photoreceptor drum thus obtained is designated L4.

実施例44
樹脂4を樹脂11に変えた以外は実施例43と同様にして、感光体ドラムL11を作成した。
Example 44
A photosensitive drum L11 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 11.

実施例45
樹脂4を樹脂47に変えた以外は実施例43と同様にして、感光体ドラムL47を作成した。
Example 45
A photoconductive drum L47 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 47.

実施例46
樹脂4を樹脂48に変えた以外は実施例43と同様にして、感光体ドラムL48を作成した。
Example 46
A photoconductor drum L48 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 48.

実施例47
樹脂4を樹脂18に変えた以外は実施例43と同様にして、感光体ドラムL18を作成した。
Example 47
A photosensitive drum L18 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 18.

実施例48
樹脂4を樹脂49に変えた以外は実施例43と同様にして、感光体ドラムL49を作成した。
Example 48
A photoconductive drum L49 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 49.

実施例49
樹脂4を樹脂25に変えた以外は実施例43と同様にして、感光体ドラムL25を作成した。
Example 49
A photoconductive drum L25 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 25.

実施例50
樹脂4を樹脂26に変えた以外は実施例43と同様にして、感光体ドラムL26を作成した。
Example 50
A photosensitive drum L26 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 26.

実施例51
樹脂4を樹脂27に変えた以外は実施例43と同様にして、感光体ドラムL27を作成した。
Example 51
A photoconductor drum L27 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 27.

実施例52
樹脂4を樹脂28に変えた以外は実施例43と同様にして、感光体ドラムL28を作成した。
Example 52
A photoconductor drum L28 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 28.

実施例53
樹脂4を樹脂29に変えた以外は実施例43と同様にして、感光体ドラムL29を作成した。
Example 53
A photoconductor drum L29 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 29.

実施例54
樹脂4を樹脂30に変えた以外は実施例43と同様にして、感光体ドラムL30を作成した。
Example 54
A photosensitive drum L30 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 30.

実施例55
樹脂4を樹脂32に変えた以外は実施例43と同様にして、感光体ドラムL32を作成した。
Example 55
A photosensitive drum L32 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 32.

実施例56
樹脂4を樹脂33に変えた以外は実施例43と同様にして、感光体ドラムL33を作成した。
Example 56
A photosensitive drum L33 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 33.

実施例57
樹脂4を樹脂50に変えた以外は実施例43と同様にして、感光体ドラムL50を作成した。
Example 57
A photoconductor drum L50 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 50.

実施例58
樹脂4を樹脂36に変えた以外は実施例43と同様にして、感光体ドラムL36を作成した。
Example 58
A photoconductor drum L36 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 36.

実施例59
樹脂4を樹脂51に変えた以外は実施例43と同様にして、感光体ドラムL51を作成した。
Example 59
A photosensitive drum L51 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 51.

実施例60
樹脂4を樹脂37に変えた以外は実施例43と同様にして、感光体ドラムL37を作成した。
Example 60
A photoconductor drum L37 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 37.

実施例61
樹脂4を樹脂38に変えた以外は実施例43と同様にして、感光体ドラムL38を作成した。
Example 61
A photoconductor drum L38 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 38.

実施例62
樹脂4を樹脂40に変えた以外は実施例43と同様にして、感光体ドラムL40を作成した。
Example 62
A photoconductor drum L40 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 40.

実施例63
樹脂4を樹脂41に変えた以外は実施例43と同様にして、感光体ドラムL41を作成した。
Example 63
A photoconductor drum L41 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 41.

実施例64
樹脂4を樹脂42に変えた以外は実施例43と同様にして、感光体ドラムL42を作成した。
Example 64
A photosensitive drum L42 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 42.

実施例65
樹脂4を樹脂52に変えた以外は実施例43と同様にして、感光体ドラムL52を作成した。
Example 65
A photoconductive drum L52 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 52.

比較例5
樹脂4を樹脂53に変えた以外は実施例43と同様にして、感光体ドラムL53を作成した。
Comparative Example 5
A photosensitive drum L53 was produced in the same manner as in Example 43 except that the resin 4 was changed to the resin 53.

[磨耗試験による膜減り量測定]
これらの感光体ドラムを市販のカラーレーザプリンタ(エプソン社製 LP3000C、スコロトロン帯電、非磁性一成分ジャンピング現像、中間転写方式、4サイクル方式)に装着して常温常湿環境下においてモノクロ(黒)モードで6,000枚のプリントを行った。プリント前後の膜厚の差から、膜減り量を計算した。結果を表4に示す。膜減り量が少ないほど、耐磨耗性が良好である。
[Measurement of film loss by wear test]
These photosensitive drums are mounted on a commercially available color laser printer (Epson LP3000C, scorotron charging, non-magnetic one-component jumping development, intermediate transfer method, four-cycle method), and monochrome (black) mode under normal temperature and humidity conditions 6,000 prints were made. The amount of film reduction was calculated from the difference in film thickness before and after printing. The results are shown in Table 4. The smaller the amount of film loss, the better the wear resistance.

Figure 2008293006
Figure 2008293006

<下引き層用分散液の作製>
平均一次粒径40nmのルチル型白色酸化チタン(石原産業株式会社製、製品名 TTO55N)と該酸化チタンに対して3重量%のメチルジメトキシラン(東芝シリコーン株式会社製 製品名TSL8117)を高速流動式混合混練機(株式会社カワタ製、製品名SMG300)に投入し、高速混合(回転周速 34.5m/秒)を行ない表面処理酸化チタンを得た。
該表面処理酸化チタンを、ボールミルによりメタノール/n−プロパノール=7/3の混合溶媒中で分散し、その酸化チタンスラリーに、下記構造式(1)の共重合ポリアミド溶解液を混合し、更に超音波分散処理を行い、溶媒組成が、メタノール/n−プロパノール=7/3で、酸化チタン/ポリアミド=3/1で、固形分濃度16重量%の分散液を調整し、下引き層用分散液を作製した。
<Preparation of dispersion for undercoat layer>
Rutile-type white titanium oxide with an average primary particle size of 40 nm (product name: TTO55N, manufactured by Ishihara Sangyo Co., Ltd.) and 3% by weight of methyldimethoxysilane (product name: TSL8117, manufactured by Toshiba Silicone Co., Ltd.) The mixture was introduced into a mixing and kneading machine (product name: SMG300, manufactured by Kawata Co., Ltd.), and high speed mixing (rotational peripheral speed: 34.5 m / sec) was performed to obtain surface-treated titanium oxide.
The surface-treated titanium oxide is dispersed in a mixed solvent of methanol / n-propanol = 7/3 by a ball mill, and the titanium oxide slurry is mixed with a copolymerized polyamide solution of the following structural formula (1). A sonic dispersion treatment was performed, and a dispersion having a solvent composition of methanol / n-propanol = 7/3, titanium oxide / polyamide = 3/1 and a solid content concentration of 16% by weight was prepared, and a dispersion for an undercoat layer Was made.

Figure 2008293006
Figure 2008293006

<電荷発生層用分散液の作製>
CuKα線によるX線回折においてブラッグ角(2θ±0.2)27.3゜に最大回折ピークを示すオキシチタニウムフタロシアニン10重量部を、1,2−ジメトキシエタン150重量部に加え、サンドグラインドミルにて粉砕分散処理を行い、顔料分散液を作製した。
<Preparation of dispersion for charge generation layer>
10 parts by weight of oxytitanium phthalocyanine, which shows a maximum diffraction peak at a Bragg angle (2θ ± 0.2) of 27.3 ° in X-ray diffraction using CuKα rays, is added to 150 parts by weight of 1,2-dimethoxyethane, and is added to a sand grind mill. Then, a pulverization dispersion treatment was performed to prepare a pigment dispersion.

この顔料分散液160重量部に、ポリビニルブチラール(電気化学工業株式会社製、商品名デンカブチラール#6000C)5重量部を1,2−ジメトキシエタン95重量部に溶解した、固形分濃度5重量%のバインダー溶液100重量部と、適量の1,2−ジメトキシエタン、適量の4−メトキシ−4−メチル−2−ペンタノンを加え、固形分濃度4.0重量%、1,2−ジメトキシエタン:4−メトキシ−4−メチル−2−ペンタノン=9:1の電荷発生層用分散液β1を作製した。   In 160 parts by weight of this pigment dispersion, 5 parts by weight of polyvinyl butyral (manufactured by Denki Kagaku Kogyo Co., Ltd., trade name: Denka Butyral # 6000C) was dissolved in 95 parts by weight of 1,2-dimethoxyethane, and the solid content concentration was 5% by weight. 100 parts by weight of the binder solution, an appropriate amount of 1,2-dimethoxyethane and an appropriate amount of 4-methoxy-4-methyl-2-pentanone were added, and the solid content concentration was 4.0% by weight, 1,2-dimethoxyethane: 4- A dispersion β1 for charge generation layer with methoxy-4-methyl-2-pentanone = 9: 1 was prepared.

CuKα線によるX線回折においてブラッグ角(2θ±0.2)9.3゜、10.6゜、13.2゜、15.1゜、15.7゜、16.1゜、20.8゜、23.3゜、26.3゜、27.1゜に強い回折ピークを示すオキシチタニウムフタロシアニン10重量部を、1,2−ジメトキシエタン150重量部に加え、サンドグラインドミルにて粉砕分散処理を行い、顔料分散液を作製した。   Bragg angles (2θ ± 0.2) 9.3 °, 10.6 °, 13.2 °, 15.1 °, 15.7 °, 16.1 °, 20.8 ° in X-ray diffraction by CuKα ray , 10 parts by weight of oxytitanium phthalocyanine showing strong diffraction peaks at 23.3 °, 26.3 °, and 27.1 ° are added to 150 parts by weight of 1,2-dimethoxyethane, and pulverized and dispersed in a sand grind mill. And a pigment dispersion was prepared.

この顔料分散液160重量部に、ポリビニルブチラール(電気化学工業株式会社製、商品名デンカブチラール#6000C)5重量部を1,2−ジメトキシエタン95重量部に溶解した、固形分濃度5重量%のバインダー溶液100重量部と、適量の1,2−ジメトキシエタン、適量の4−メトキシ−4−メチル−2−ペンタノンを加え、固形分濃度4.0%、1,2−ジメトキシエタン:4−メトキシ−4−メチル−2−ペンタノン=9:1の電荷発生層用分散液β2を作製した。
電荷発生層用分散液β1と電荷発生層用分散液β2を8:2の割合で混合し、電荷発生層用分散液βを調製した。
In 160 parts by weight of this pigment dispersion, 5 parts by weight of polyvinyl butyral (manufactured by Denki Kagaku Kogyo Co., Ltd., trade name: Denka Butyral # 6000C) was dissolved in 95 parts by weight of 1,2-dimethoxyethane, and the solid content concentration was 5% by weight. 100 parts by weight of the binder solution, an appropriate amount of 1,2-dimethoxyethane and an appropriate amount of 4-methoxy-4-methyl-2-pentanone were added, and the solid content concentration was 4.0%, 1,2-dimethoxyethane: 4-methoxy A charge generating layer dispersion β2 of -4-methyl-2-pentanone = 9: 1 was prepared.
Charge generation layer dispersion β1 and charge generation layer dispersion β2 were mixed at a ratio of 8: 2 to prepare charge generation layer dispersion β.

<感光体ドラムの作製>
実施例66
表面が粗切削(Rmax=0.8)された外径30mm、長さ254mm、肉厚0.75mmのアルミニウム合金よりなるシリンダーを、先に調製した下引き層用分散液に浸漬塗布し、膜厚約1.3μmの下引き層を形成した。このシリンダーを先に調製した電荷発生層用分散液βに浸漬塗布し、乾燥後の重量が0.3g/m(膜厚約0.3μm)となるように電荷発生層を形成した。
次に、この電荷発生層を形成したシリンダーを、前記電荷輸送物質(1)を主成分とする異性体混合物よりなる電荷輸送物質50重量部と、電荷輸送層用バインダー樹脂として樹脂4を100重量部、シリコーンオイル(信越化学株式会社製、商品名KF96)0.05重量部をテトラヒドロフラン/トルエン混合溶媒(テトラヒドロフラン80重量%、トルエン20重量%)640重量部に溶解させた液に浸漬塗布することにより、乾燥後の膜厚25μmの電荷輸送層を設けた。このようにして得られた感光体ドラムをS4とする。
<Production of photosensitive drum>
Example 66
A cylinder made of an aluminum alloy having an outer diameter of 30 mm, a length of 254 mm, and a wall thickness of 0.75 mm, whose surface is roughly cut (Rmax = 0.8), is dip-coated in the previously prepared dispersion for the undercoat layer to form a film. An undercoat layer having a thickness of about 1.3 μm was formed. This cylinder was dip-coated in the charge generation layer dispersion β prepared earlier, and a charge generation layer was formed so that the weight after drying was 0.3 g / m 2 (film thickness: about 0.3 μm).
Next, the cylinder in which the charge generation layer is formed is charged with 50 parts by weight of a charge transport material composed of an isomer mixture containing the charge transport material (1) as a main component and 100 parts by weight of resin 4 as a binder resin for the charge transport layer. Dip coating in a solution obtained by dissolving 0.05 part by weight of silicone oil (trade name KF96, manufactured by Shin-Etsu Chemical Co., Ltd.) in 640 parts by weight of a tetrahydrofuran / toluene mixed solvent (tetrahydrofuran 80% by weight, toluene 20% by weight). Thus, a charge transport layer having a thickness of 25 μm after drying was provided. The photosensitive drum thus obtained is designated S4.

実施例67
樹脂4を樹脂11に変えた以外は実施例66と同様にして、感光体ドラムS11を作成した。
Example 67
A photosensitive drum S11 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 11.

実施例68
樹脂4を樹脂47に変えた以外は実施例66と同様にして、感光体ドラムS47を作成した。
Example 68
A photosensitive drum S47 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 47.

実施例69
樹脂4を樹脂48に変えた以外は実施例66と同様にして、感光体ドラムS48を作成した。
Example 69
A photosensitive drum S48 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 48.

実施例70
樹脂4を樹脂18に変えた以外は実施例66と同様にして、感光体ドラムS18を作成した。
Example 70
A photosensitive drum S18 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 18.

実施例71
樹脂4を樹脂49に変えた以外は実施例66と同様にして、感光体ドラムS49を作成した。
Example 71
A photosensitive drum S49 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 49.

実施例72
樹脂4を樹脂25に変えた以外は実施例66と同様にして、感光体ドラムS25を作成した。
Example 72
A photosensitive drum S25 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 25.

実施例73
樹脂4を樹脂26に変えた以外は実施例66と同様にして、感光体ドラムS26を作成した。
Example 73
A photosensitive drum S26 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 26.

実施例74
樹脂4を樹脂27に変えた以外は実施例66と同様にして、感光体ドラムS27を作成した。
Example 74
A photosensitive drum S27 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 27.

実施例75
樹脂4を樹脂28に変えた以外は実施例66と同様にして、感光体ドラムS28を作成した。
Example 75
A photoconductor drum S28 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 28.

実施例76
樹脂4を樹脂29に変えた以外は実施例66と同様にして、感光体ドラムS29を作成した。
Example 76
A photosensitive drum S29 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 29.

実施例77
樹脂4を樹脂30に変えた以外は実施例66と同様にして、感光体ドラムS30を作成した。
Example 77
A photosensitive drum S30 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 30.

実施例78
樹脂4を樹脂32に変えた以外は実施例66と同様にして、感光体ドラムS32を作成した。
Example 78
A photosensitive drum S32 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 32.

実施例79
樹脂4を樹脂33に変えた以外は実施例66と同様にして、感光体ドラムS33を作成した。
Example 79
A photosensitive drum S33 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 33.

実施例80
樹脂4を樹脂50に変えた以外は実施例66と同様にして、感光体ドラムS50を作成した。
Example 80
A photosensitive drum S50 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 50.

実施例81
樹脂4を樹脂36に変えた以外は実施例66と同様にして、感光体ドラムS36を作成した。
Example 81
A photosensitive drum S36 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 36.

実施例82
樹脂4を樹脂51に変えた以外は実施例66と同様にして、感光体ドラムS51を作成した。
Example 82
A photosensitive drum S51 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 51.

実施例83
樹脂4を樹脂37に変えた以外は実施例66と同様にして、感光体ドラムS37を作成した。
Example 83
A photosensitive drum S37 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 37.

実施例84
樹脂4を樹脂38に変えた以外は実施例66と同様にして、感光体ドラムS38を作成した。
Example 84
A photosensitive drum S38 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 38.

実施例85
樹脂4を樹脂40に変えた以外は実施例66と同様にして、感光体ドラムS40を作成した。
Example 85
A photosensitive drum S40 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 40.

実施例86
樹脂4を樹脂41に変えた以外は実施例66と同様にして、感光体ドラムS41を作成した。
Example 86
A photosensitive drum S41 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 41.

実施例87
樹脂4を樹脂42に変えた以外は実施例66と同様にして、感光体ドラムS42を作成した。
Example 87
A photosensitive drum S42 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 42.

実施例88
樹脂4を樹脂52に変えた以外は実施例66と同様にして、感光体ドラムS52を作成した。
Example 88
A photosensitive drum S52 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 52.

比較例6
樹脂4を樹脂53に変えた以外は実施例66と同様にして、感光体ドラムS53を作成した。
Comparative Example 6
A photosensitive drum S53 was produced in the same manner as in Example 66 except that the resin 4 was changed to the resin 53.

[磨耗試験による膜減り量測定]
これらの感光体ドラムを市販のモノクロレーザプリンタ(レックスマーク社製、Optra S2450、A4縦送りで24枚/分、直流電圧印加のローラー帯電、非磁性一成分接触現像、ローラー転写)に装着して常温常湿下において30,000枚のプリントを行った。プリント前後の膜厚の差から、膜減り量を計算した。結果を表5に示す。膜減り量が少ないほど、耐磨耗性が良好である。
[Measurement of film loss by wear test]
Mount these photosensitive drums on a commercially available monochrome laser printer (manufactured by Lexmark, Optra S2450, 24 sheets per minute at A4 vertical feed, roller charging with DC voltage application, non-magnetic one-component contact development, roller transfer) 30,000 sheets were printed under normal temperature and humidity. The amount of film reduction was calculated from the difference in film thickness before and after printing. The results are shown in Table 5. The smaller the amount of film loss, the better the wear resistance.

Figure 2008293006
Figure 2008293006

実施例89
表面が粗切削(Rmax=1.0)された外径30mm、長さ346mm、肉厚1.0mmのアルミニウム合金よりなるシリンダーの表面に、陽極酸化処理を行い、その後酢酸ニッケルを主成分とする封孔剤によって封孔処理を行うことにより、約6μmの陽極酸化被膜(アルマイト被膜)を形成した。
このシリンダーを先に調製した下引き層用分散液に浸漬塗布し、乾燥後の膜厚約1.3μmの下引き層を形成した。
さらに先に作製した電荷発生層用分散液β1に浸漬塗布し、乾燥後の重量が0.3g/m(膜厚約0.3μm)となるように電荷発生層を形成した。
Example 89
The surface of a cylinder made of an aluminum alloy having an outer diameter of 30 mm, a length of 346 mm, and a wall thickness of 1.0 mm, whose surface has been roughly cut (Rmax = 1.0), is subjected to anodizing treatment, and then nickel acetate as a main component. By performing sealing treatment with a sealing agent, an anodic oxide coating (alumite coating) of about 6 μm was formed.
This cylinder was dip-coated in the previously prepared dispersion for the undercoat layer to form an undercoat layer having a thickness of about 1.3 μm after drying.
Further, the charge generation layer was formed by dip-coating in the charge generation layer dispersion β1 prepared earlier so that the weight after drying was 0.3 g / m 2 (film thickness: about 0.3 μm).

次に、この電荷発生層を形成したシリンダーを、前記電荷輸送物質(1)を主成分とする異性体混合物よりなる電荷輸送物質30重量部と、酸化防止剤(チバガイギー社製、Irganox1076)4重量部、電荷輸送層用バインダー樹脂として樹脂11を100重量部、シリコーンオイル(信越化学株式会社製、商品名KF96)0.05重量部をテトラヒドロフラン/トルエン混合溶媒(テトラヒドロフラン80重量%、トルエン20重量%)640重量部に溶解させた液に浸漬塗布することにより、乾燥後の膜厚25μmの電荷輸送層を設けた。このようにして得られた感光体ドラムをD11とする。   Next, the cylinder in which the charge generation layer is formed is charged with 30 parts by weight of a charge transport material composed of an isomer mixture containing the charge transport material (1) as a main component and 4 weights of an antioxidant (Irganox 1076, manufactured by Ciba Geigy). 100 parts by weight of resin 11 as a binder resin for the charge transport layer, 0.05 parts by weight of silicone oil (trade name KF96, manufactured by Shin-Etsu Chemical Co., Ltd.), tetrahydrofuran / toluene mixed solvent (80% by weight of tetrahydrofuran, 20% by weight of toluene) ) A charge transport layer having a thickness of 25 μm after drying was provided by dip coating in a solution dissolved in 640 parts by weight. The photosensitive drum thus obtained is designated as D11.

実施例90
樹脂11を樹脂48に変えた以外は実施例89と同様にして、感光体ドラムD48を作成した。
Example 90
A photosensitive drum D48 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 48.

実施例91
樹脂11を樹脂18に変えた以外は実施例89と同様にして、感光体ドラムD18を作成した。
Example 91
A photosensitive drum D18 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 18.

実施例92
樹脂11を樹脂49に変えた以外は実施例89と同様にして、感光体ドラムD49を作成した。
Example 92
A photosensitive drum D49 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 49.

実施例93
樹脂11を樹脂25に変えた以外は実施例89と同様にして、感光体ドラムD25を作成した。
Example 93
A photosensitive drum D25 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 25.

実施例94
樹脂11を樹脂26に変えた以外は実施例89と同様にして、感光体ドラムD26を作成した。
Example 94
A photosensitive drum D26 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 26.

実施例95
樹脂11を樹脂27に変えた以外は実施例89と同様にして、感光体ドラムD27を作成した。
Example 95
A photoconductive drum D27 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 27.

実施例96
樹脂11を樹脂28に変えた以外は実施例89と同様にして、感光体ドラムD28を作成した。
Example 96
A photoconductor drum D28 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 28.

実施例97
樹脂11を樹脂29に変えた以外は実施例89と同様にして、感光体ドラムD29を作成した。
Example 97
A photoconductive drum D29 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 29.

実施例98
樹脂11を樹脂30に変えた以外は実施例89と同様にして、感光体ドラムD30を作成した。
Example 98
A photosensitive drum D30 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 30.

実施例99
樹脂11を樹脂32に変えた以外は実施例89と同様にして、感光体ドラムD32を作成した。
Example 99
A photosensitive drum D32 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 32.

実施例100
樹脂11を樹脂50に変えた以外は実施例89と同様にして、感光体ドラムD50を作成した。
Example 100
A photosensitive drum D50 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 50.

実施例101
樹脂11を樹脂36に変えた以外は実施例89と同様にして、感光体ドラムD36を作成した。
Example 101
A photosensitive drum D36 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 36.

実施例102
樹脂11を樹脂51に変えた以外は実施例89と同様にして、感光体ドラムD51を作成した。
Example 102
A photosensitive drum D51 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 51.

実施例103
樹脂11を樹脂37に変えた以外は実施例89と同様にして、感光体ドラムD37を作成した。
Example 103
A photoconductive drum D37 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 37.

実施例104
樹脂11を樹脂38に変えた以外は実施例89と同様にして、感光体ドラムD38を作成した。
Example 104
A photosensitive drum D38 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 38.

実施例105
樹脂11を樹脂40に変えた以外は実施例89と同様にして、感光体ドラムD40を作成した。
Example 105
A photosensitive drum D40 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 40.

実施例106
樹脂11を樹脂41に変えた以外は実施例89と同様にして、感光体ドラムD41を作成した。
Example 106
A photosensitive drum D41 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 41.

実施例107
樹脂11を樹脂42に変えた以外は実施例89と同様にして、感光体ドラムD42を作成した。
Example 107
A photosensitive drum D42 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 42.

比較例7
樹脂11を樹脂53に変えた以外は実施例89と同様にして、感光体ドラムD53を作成した。
Comparative Example 7
A photoconductive drum D53 was produced in the same manner as in Example 89 except that the resin 11 was changed to the resin 53.

[磨耗試験による膜減り量測定]
これらの感光体を市販のデジタル複合機(パナソニックコミュニケーションズ社製、WORKIO3200、A4横送りで32枚/分、交流重畳直流電圧印加のローラー帯電、磁性1成分ジャンピング現像、解像度600dpi×600dpi)に装着して常温常湿下において30,000枚のプリントを行った。プリント前後の膜厚の差から、10,000枚あたりの膜減り量を計算した。結果を表6に示す。膜減り量が少ないほど、耐磨耗性が良好である。
[Measurement of film loss by wear test]
These photoconductors are mounted on a commercially available digital multifunction machine (manufactured by Panasonic Communications, WORKIO3200, A4 horizontal feed 32 sheets / minute, roller charging with AC superimposed DC voltage applied, magnetic single component jumping development, resolution 600 dpi × 600 dpi). 30,000 sheets were printed under normal temperature and humidity. The amount of film reduction per 10,000 sheets was calculated from the difference in film thickness before and after printing. The results are shown in Table 6. The smaller the amount of film loss, the better the wear resistance.

Figure 2008293006
Figure 2008293006

実施例108
表面が鏡面仕上げされた外径30mm、長さ246mm、肉厚0.75mmのアルミニウム製シリンダーの表面に、陽極酸化処理を行ない、その後、酢酸ニッケルを主成分とする封孔剤によって封孔処理を行なうことにより、約6μmの陽極酸化被膜(アルマイト被膜)を形成した。このシリンダーを、先に作製した電荷発生層用分散液β1に浸漬塗布して、その乾燥後の膜厚が約0.4μmとなるように電荷発生層を形成した。
Example 108
The surface of an aluminum cylinder having an outer diameter of 30 mm, a length of 246 mm, and a wall thickness of 0.75 mm, which has a mirror-finished surface, is anodized, and then sealed with a sealant mainly composed of nickel acetate. By performing, an anodic oxide film (alumite film) of about 6 μm was formed. This cylinder was dip-coated in the charge generation layer dispersion β1 prepared previously, and the charge generation layer was formed so that the film thickness after drying was about 0.4 μm.

次に、前記電荷輸送物質(1)を主成分とする異性体混合物よりなる電荷輸送物質50重量部、電荷輸送層用バインダー樹脂として樹脂47を100重量部、酸化防止剤(チバガイギー社製、Irganox1076)8重量部、シリコーンオイル(信越化学株式会社製、商品名KF96)0.05重量部を、テトラヒドロフラン/トルエン混合溶媒(テトラヒドロフラン80重量%、トルエン20重量%)640重量部に混合し、電荷輸送層形成用塗布液を調製した。
この電荷輸送層形成用塗布液に、先に電荷発生層を形成したシリンダーを浸漬塗布して、乾燥後の膜厚18μmの電荷輸送層を形成した。このようにして得られた感光体ドラムをC47とする。
Next, 50 parts by weight of a charge transport material comprising an isomer mixture containing the charge transport material (1) as a main component, 100 parts by weight of resin 47 as a binder resin for a charge transport layer, an antioxidant (Irganox 1076, manufactured by Ciba Geigy) ) 8 parts by weight, 0.05 part by weight of silicone oil (trade name KF96, manufactured by Shin-Etsu Chemical Co., Ltd.) is mixed with 640 parts by weight of a tetrahydrofuran / toluene mixed solvent (tetrahydrofuran 80% by weight, toluene 20% by weight), and charge transport is performed. A layer forming coating solution was prepared.
The cylinder on which the charge generation layer was previously formed was dip-coated in this charge transport layer forming coating solution to form a 18 μm thick charge transport layer after drying. The photoreceptor drum thus obtained is designated as C47.

実施例109
樹脂47を樹脂48に変えた以外は実施例108と同様にして、感光体ドラムC48を作成した。
Example 109
A photoconductive drum C48 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 48.

実施例110
樹脂47を樹脂18に変えた以外は実施例108と同様にして、感光体ドラムC18を作成した。
Example 110
A photosensitive drum C18 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 18.

実施例111
樹脂47を樹脂49に変えた以外は実施例108と同様にして、感光体ドラムC49を作成した。
Example 111
A photoconductive drum C49 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 49.

実施例112
樹脂47を樹脂25に変えた以外は実施例108と同様にして、感光体ドラムC25を作成した。
Example 112
A photosensitive drum C25 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 25.

実施例113
樹脂47を樹脂26に変えた以外は実施例108と同様にして、感光体ドラムC26を作成した。
Example 113
A photoconductive drum C26 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 26.

実施例114
樹脂47を樹脂27に変えた以外は実施例108と同様にして、感光体ドラムC27を作成した。
Example 114
A photosensitive drum C27 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 27.

実施例115
樹脂47を樹脂28に変えた以外は実施例108と同様にして、感光体ドラムC28を作成した。
Example 115
A photosensitive drum C28 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 28.

実施例116
樹脂47を樹脂29に変えた以外は実施例108と同様にして、感光体ドラムC29を作成した。
Example 116
A photosensitive drum C29 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 29.

実施例117
樹脂47を樹脂30に変えた以外は実施例108と同様にして、感光体ドラムC30を作成した。
Example 117
A photosensitive drum C30 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 30.

実施例118
樹脂47を樹脂32に変えた以外は実施例108と同様にして、感光体ドラムC32を作成した。
Example 118
A photosensitive drum C32 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 32.

実施例119
樹脂47を樹脂50に変えた以外は実施例108と同様にして、感光体ドラムC50を作成した。
Example 119
A photosensitive drum C50 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 50.

実施例120
樹脂47を樹脂36に変えた以外は実施例108と同様にして、感光体ドラムC36を作成した。
Example 120
A photosensitive drum C36 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 36.

実施例121
樹脂47を樹脂51に変えた以外は実施例108と同様にして、感光体ドラムC51を作成した。
Example 121
A photosensitive drum C51 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 51.

実施例122
樹脂47を樹脂37に変えた以外は実施例108と同様にして、感光体ドラムC37を作成した。
Example 122
A photoconductive drum C37 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 37.

実施例123
樹脂47を樹脂38に変えた以外は実施例108と同様にして、感光体ドラムC38を作成した。
Example 123
A photoconductive drum C38 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 38.

実施例124
樹脂47を樹脂40に変えた以外は実施例108と同様にして、感光体ドラムC40を作成した。
Example 124
A photoconductor drum C40 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 40.

実施例125
樹脂47を樹脂41に変えた以外は実施例108と同様にして、感光体ドラムC41を作成した。
Example 125
A photoconductive drum C41 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 41.

実施例126
樹脂47を樹脂42に変えた以外は実施例108と同様にして、感光体ドラムC42を作成した。
Example 126
A photoconductive drum C42 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 42.

実施例127
樹脂47を樹脂52に変えた以外は実施例108と同様にして、感光体ドラムC52を作成した。
Example 127
A photosensitive drum C52 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 52.

比較例8
樹脂47を樹脂53に変えた以外は実施例108と同様にして、感光体ドラムC53を作成した。
Comparative Example 8
A photosensitive drum C53 was produced in the same manner as in Example 108 except that the resin 47 was changed to the resin 53.

これらの感光体を市販のカラータンデムプリンタ(株式会社沖データ製C3100、直流電圧印加の接触ローラー帯電、600dpi、LED露光、非磁性一成分接触現像)に装着して常温常湿下において10,000枚のプリントを行い、プリント前後の膜厚の差から、膜減り量を計算した。結果を表7に示す。膜減り量が少ないほど、耐磨耗性が良好である。   These photoreceptors are mounted on a commercially available color tandem printer (C3100 manufactured by Oki Data Corporation, contact roller charging with DC voltage application, 600 dpi, LED exposure, non-magnetic one-component contact development) and 10,000 at normal temperature and humidity. Sheets were printed, and the amount of film reduction was calculated from the difference in film thickness before and after printing. The results are shown in Table 7. The smaller the amount of film loss, the better the wear resistance.

Figure 2008293006
Figure 2008293006

表4、表5、表6、表7に示す結果から、分子量250以下の2価フェノール残基を用い、且つ、一般式(1)における{a/(a+b)}が0.6〜0.8であるポリエステル樹脂を含有する感光体ドラム(実施例43〜実施例127)は、摩耗試験において良好な性能を示すことが分かる。
これに対して、分子量250以上の2価フェノール残基を用い、且つ、一般式(1)における{a/(a+b)}が0.7であるポリエステル樹脂を含有する感光体ドラム(比較例5〜比較例8)は、摩耗試験において充分な結果が得られないことが分かる。
From the results shown in Table 4, Table 5, Table 6, and Table 7, a divalent phenol residue having a molecular weight of 250 or less was used, and {a / (a + b)} in the general formula (1) was 0.6-0. It can be seen that the photosensitive drum containing the polyester resin No. 8 (Example 43 to Example 127) shows good performance in the abrasion test.
In contrast, a photosensitive drum using a divalent phenol residue having a molecular weight of 250 or more and containing a polyester resin having {a / (a + b)} of 0.7 in the general formula (1) (Comparative Example 5) It can be seen that Comparative Example 8) does not provide sufficient results in the wear test.

画像形成装置を説明する図である。It is a figure explaining an image forming apparatus.

符号の説明Explanation of symbols

1…電子写真感光体、2…帯電装置、3…露光装置、4…現像装置、5…転写装置、6…クリーニング装置、7…定着装置、41…現像槽、42…アジテータ、43…供給ローラー、44…現像ローラー、45…規制部材、71…上部定着部材、72…下部定着部材、73…加熱装置、T…トナー、P…記録紙 DESCRIPTION OF SYMBOLS 1 ... Electrophotographic photosensitive member, 2 ... Charging device, 3 ... Exposure device, 4 ... Developing device, 5 ... Transfer device, 6 ... Cleaning device, 7 ... Fixing device, 41 ... Developing tank, 42 ... Agitator, 43 ... Supply roller , 44 ... developing roller, 45 ... regulating member, 71 ... upper fixing member, 72 ... lower fixing member, 73 ... heating device, T ... toner, P ... recording paper

Claims (4)

導電性支持体と、
前記導電性支持体上に形成された感光層と、を有し、
前記感光層は、下記式(1)で表される繰り返し構造を有するポリエステル樹脂を含有する
ことを特徴とする電子写真感光体。
Figure 2008293006
(式(1)中、0.5<{a/(a+b)}<1であり、Aは分子量250以下の2価フェノール残基、Bは2価フェノール残基、Xは下記式(2)に示す構造であり、Yは2価カルボン酸残基である。)
Figure 2008293006
(式(2)中、R及びRは、各々独立に水素原子、アルキル基、アリール基、ハロゲン基、またはアルコキシ基であり、n,mは、各々独立に0〜4の整数である。)
A conductive support;
A photosensitive layer formed on the conductive support,
The electrophotographic photoreceptor, wherein the photosensitive layer contains a polyester resin having a repeating structure represented by the following formula (1).
Figure 2008293006
(In formula (1), 0.5 <{a / (a + b)} <1, A is a divalent phenol residue having a molecular weight of 250 or less, B is a divalent phenol residue, and X is the following formula (2) And Y is a divalent carboxylic acid residue.)
Figure 2008293006
(In Formula (2), R 1 and R 2 are each independently a hydrogen atom, an alkyl group, an aryl group, a halogen group, or an alkoxy group, and n 1 and m 1 are each independently an integer of 0 to 4) .)
前記式(1)中のAが、下記式(3)に示す構造であることを特徴とする請求項1に記載の電子写真感光体。
Figure 2008293006
(式(3)中、Rは水素原子またはアルキル基であり、R及びRは、各々独立にアルキル基である。)
2. The electrophotographic photosensitive member according to claim 1, wherein A in the formula (1) has a structure represented by the following formula (3).
Figure 2008293006
(In Formula (3), R 3 is a hydrogen atom or an alkyl group, and R 4 and R 5 are each independently an alkyl group.)
前記式(1)中のBが、下記式(4)に示す構造であることを特徴とする請求項1又は2に記載の電子写真感光体。
Figure 2008293006
(式(4)中、R及びRは、各々独立に水素原子、アルキル基、または互いに結合して環状構造を形成しても良い置換基であり、R及びRは、各々独立にアルキル基であり、n,mは、各々独立に1〜4の整数である。)
The electrophotographic photosensitive member according to claim 1 or 2, wherein B in the formula (1) has a structure represented by the following formula (4).
Figure 2008293006
(In Formula (4), R 6 and R 7 are each independently a hydrogen atom, an alkyl group, or a substituent that may be bonded to each other to form a cyclic structure, and R 8 and R 9 are each independently And n 2 and m 2 are each independently an integer of 1 to 4.)
前記感光層は、さらに下記式(5)で表される化合物を含有することを特徴とする請求項1乃至3いずれか1項に記載の電子写真感光体。
Figure 2008293006
(式(5)中、Ar〜Arは各々独立して、置換基を有しても良いアリーレン基または置換基を有しても良い2価の複素環基を表す。m,mは各々独立して0または1を表す。Qは、直接結合または2価の残基を表す。R10〜R17は各々独立して水素原子、置換基を有しても良いアルキル基、置換基を有しても良いアリール基、または置換基を有しても良い複素環基を表す。n〜nは各々独立して0〜4の整数を表す。また、Ar〜Arは互いに結合して環状構造を形成しても良い。)
The electrophotographic photoreceptor according to any one of claims 1 to 3, wherein the photosensitive layer further contains a compound represented by the following formula (5).
Figure 2008293006
(In Formula (5), Ar 1 to Ar 6 each independently represents an arylene group which may have a substituent or a divalent heterocyclic group which may have a substituent. M 3 , m 4 each independently represents 0 or 1. Q represents a direct bond or a divalent residue, R 10 to R 17 each independently represents a hydrogen atom, an alkyl group which may have a substituent, An aryl group that may have a substituent or a heterocyclic group that may have a substituent, each of n 3 to n 6 independently represents an integer of 0 to 4. Ar 1 to Ar 6 may be bonded to each other to form a ring structure.)
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