JP2008282539A - Glass substrate for magnetic recording medium, and its manufacturing method - Google Patents

Glass substrate for magnetic recording medium, and its manufacturing method Download PDF

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JP2008282539A
JP2008282539A JP2008215300A JP2008215300A JP2008282539A JP 2008282539 A JP2008282539 A JP 2008282539A JP 2008215300 A JP2008215300 A JP 2008215300A JP 2008215300 A JP2008215300 A JP 2008215300A JP 2008282539 A JP2008282539 A JP 2008282539A
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glass substrate
peripheral end
recording medium
magnetic recording
end surface
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JP2008282539A5 (en
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Junichi Hashimoto
潤一 橋本
Kensuke Matsuno
賢介 松野
Takeo Watanabe
武夫 渡辺
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Hoya Corp
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Hoya Corp
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<P>PROBLEM TO BE SOLVED: To provide a glass substrate for a magnetic recording medium capable of preventing breakage of a magnetic disk and to provide its manufacturing method. <P>SOLUTION: The glass substrate 100 for the magnetic recording medium of a doughnut shape has a chamfered surface 104a for connecting a main surface 101a and an outer peripheral surface 102. The chamfered surface 104a consists of an annular curved surface part 104a' and a conical surface part 104a" connected to each other. The percentage ratio of the length d1 of the external form line of the annular curved surface part 104a' to the length L of the external form line 200 of the chamfered surface 104a at the section of the glass substrate 100 inclusive of a central line 106 of the glass substrate 100 is ≥20%. The radius R of curvature of the annular curved surface part 104a' is 0.10 to 0.50 mm. The angle θ formed by the main surface 101a and the conical surface part 104a" is 136 to 165°. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、磁気記録媒体用ガラス基板及びその製造方法に関する。   The present invention relates to a glass substrate for a magnetic recording medium and a method for manufacturing the same.

磁気ディスク等の磁気記録媒体用基板としては、アルミニウム基板が広く用いられてきたが、ノートブック型やモバイル型のPC(パーソナルコンピュータ)の普及に伴い、磁気ディスクには薄板化、記録面の高密度化の他、使用環境の変化に対する耐久性の要求が高まって来た。この要求に対処するために、近年では、高い耐衝撃性、剛性及び硬度と、使用環境の変化に対する高い化学的耐久性とを有し、且つ記録面の高密度化に欠かせないヘッドの低浮上化を実現する平坦度を有するガラス基板が広く用いられている。   As a substrate for a magnetic recording medium such as a magnetic disk, an aluminum substrate has been widely used. However, with the spread of notebook-type and mobile-type PCs (personal computers), the magnetic disk is made thinner and has a higher recording surface. In addition to increasing density, demands for durability against changes in the usage environment have increased. In order to cope with this requirement, in recent years, low impact of the head, which has high impact resistance, rigidity and hardness, and high chemical durability against changes in the use environment, is indispensable for increasing the recording surface density. A glass substrate having flatness that realizes floating is widely used.

一般に、ドーナツ状のガラス基板の内周端面及び外周端面の寸法を所定の寸法に調整する研削加工や、面取り面を所定の形状に加工する面取り加工等の機械的加工では、研削砥石に付着された砥粒がガラスを削り取ることにより所定の寸法や形状を実現する。   Generally, in mechanical processing such as grinding processing for adjusting the dimensions of the inner peripheral end surface and outer peripheral end surface of the doughnut-shaped glass substrate to predetermined dimensions and chamfering processing for processing the chamfered surface into a predetermined shape, the glass substrate is attached to the grinding wheel. A predetermined size and shape are realized by scraping off the glass with the abrasive grains.

砥粒がガラスを削り取るメカニズムは、回転する研削砥石に付着された砥粒が衝撃力によってガラス基板の表面にクラックを発生させ、且つ該クラックを成長させることにより、ガラス基板の表面から微量のガラスを剥離させるというものである。   The mechanism by which the abrasive grains scrape the glass is such that the abrasive grains attached to the rotating grinding wheel generate a crack on the surface of the glass substrate by impact force, and the crack grows, so that a small amount of glass is generated from the surface of the glass substrate. Is peeled off.

しかしながら、微量のガラスの剥離が不完全なときには、ガラス基板の表面に微小クラックが残存する。この微小クラックは、研削砥石によって加工されたガラス基板に、ガラス基板表面への成膜時に発生する熱衝撃や、ガラス基板を使用した磁気ディスクをHDD(Hard Disk Drive)に組込む時に発生する機械的衝撃や、磁気ディスクを組み込んだノートブック型やモバイル型のPCの使用環境の変化によって発生する機械的衝撃又は熱衝撃に基づく応力が全体に分散して発生するときには、殆ど成長しない一方、上記機械的衝撃又は熱衝撃に基づく応力が1個所に集中して発生し、且つ応力が集中して発生した個所が微小クラックの存在個所と一致したときには、かなりの早さで成長し、該成長した微小クラックはいわゆるクラックとなり、該クラックはガラス基板を使用する磁気ディスクを破損させる。   However, when a minute amount of glass has been peeled off, microcracks remain on the surface of the glass substrate. This microcrack is a mechanical shock that occurs when a magnetic disk using a glass substrate is incorporated into an HDD (Hard Disk Drive) on a glass substrate processed by a grinding wheel, or when a magnetic disk using the glass substrate is incorporated into an HDD (Hard Disk Drive). When the stress due to mechanical shock or thermal shock generated by impact or changes in the usage environment of a notebook or mobile type PC incorporating a magnetic disk is generated and dispersed throughout, the above machine When stress due to mechanical shock or thermal shock is concentrated at one place and the place where the stress is concentrated coincides with the existence of a microcrack, it grows at a considerably high speed. The crack becomes a so-called crack, and the crack damages the magnetic disk using the glass substrate.

この微小クラックの残存要因として、研削砥石に付着されたダイヤモンド砥粒の形状不良や粒度大、及び機械的加工の研削速度大等が挙げられる。   As the residual factors of the microcracks, there are a shape defect and a large particle size of the diamond abrasive grains attached to the grinding wheel, a large grinding speed of mechanical processing, and the like.

また、機械的衝撃又は熱衝撃に基づく応力は、内周端面及び外周端面の一方と面取り面との境界部に集中し易く、この境界部は、その両側から研削砥石で加工されるため、微小クラックが残存し易い。   In addition, stress based on mechanical shock or thermal shock is likely to be concentrated on the boundary portion between one of the inner peripheral end surface and the outer peripheral end surface and the chamfered surface, and since this boundary portion is processed with a grinding wheel from both sides, Cracks are likely to remain.

さらに、主表面と面取り面の境界部では機械的研削加工時に主表面側でガラスの剥離によるチッピングと呼ばれる小さなカケが発生し易く、このガラスの剥離の発生要因としては、面取り面と主表面との角度が135°以下の鈍角であることが挙げられる。   Furthermore, at the boundary between the main surface and the chamfered surface, small chipping called chipping due to glass peeling tends to occur on the main surface side during mechanical grinding, and the cause of this glass peeling is the chamfered surface and the main surface. Is an obtuse angle of 135 ° or less.

本発明の目的は、磁気記録媒体の破損を防止することができる磁気記録媒体用ガラス基板及びその製造方法を提供することにある。   An object of the present invention is to provide a glass substrate for a magnetic recording medium that can prevent damage to the magnetic recording medium and a method for manufacturing the same.

上記目的を達成するために、請求項1記載の磁気記録媒体用ガラス基板は、主表面、外周端面及び内周端面を有し、前記主表面と前記外周端面及び内周端面の一方とを連接する面取り面を有するドーナツ状の磁気記録媒体用ガラス基板において、前記面取り面は互いに連接する錐面部及び環状曲面部から成り、前記ガラス基板の中心軸を含む前記ガラス基板の断面における前記面取り面の外形線の長さに対する前記環状曲面部の外形線の長さの百分率比が30%以上であり、前記面取り面と前記主表面とが成す角度が136〜165°であることを特徴とする。   To achieve the above object, a glass substrate for a magnetic recording medium according to claim 1 has a main surface, an outer peripheral end surface and an inner peripheral end surface, and connects the main surface and one of the outer peripheral end surface and the inner peripheral end surface. In the doughnut-shaped glass substrate for a magnetic recording medium having a chamfered surface, the chamfered surface includes a conical surface portion and an annular curved surface portion that are connected to each other, and the chamfered surface in a cross section of the glass substrate including a central axis of the glass substrate. The percentage ratio of the length of the outer shape line of the annular curved surface portion to the length of the outer shape line is 30% or more, and the angle formed by the chamfered surface and the main surface is 136 to 165 °.

請求項2記載のガラス基板は、請求項1記載のガラス基板において、前記百分率比が50%以上であることを特徴とする。   The glass substrate according to claim 2 is the glass substrate according to claim 1, wherein the percentage ratio is 50% or more.

請求項3記載のガラス基板は、請求項1又は2記載のガラス基板において、前記環状曲面部の外形線の曲率半径が0.10〜0.35mmであることを特徴とする。   The glass substrate according to claim 3 is characterized in that, in the glass substrate according to claim 1 or 2, the radius of curvature of the outline of the annular curved surface portion is 0.10 to 0.35 mm.

請求項4記載のガラス基板は、請求項3記載のガラス基板において、前記曲率半径が0.20〜0.35mmであることを特徴とする。   The glass substrate according to claim 4 is the glass substrate according to claim 3, wherein the radius of curvature is 0.20 to 0.35 mm.

請求項5記載のガラス基板は、請求項1乃至4のいずれか1項に記載のガラス基板において、前記面取り面と主表面とが成す角度が140〜155°であることを特徴とする。   The glass substrate according to claim 5 is the glass substrate according to any one of claims 1 to 4, wherein an angle formed between the chamfered surface and the main surface is 140 to 155 °.

請求項6記載のガラス基板は、請求項1乃至5のいずれか1項に記載のガラス基板において、破壊応力に基づいて算出したワイブル定数が20.0以上であることを特徴とする。   The glass substrate according to claim 6 is the glass substrate according to any one of claims 1 to 5, wherein the Weibull constant calculated based on the fracture stress is 20.0 or more.

請求項7記載のガラス基板は、請求項1乃至6のいずれか1項に記載のガラス基板において、ガラス基板の表面層中のアルカリ成分をイオン半径がより大きいものに置き換える化学強化処理が施されていることを特徴とする。   The glass substrate according to claim 7 is subjected to a chemical strengthening treatment in which the alkali component in the surface layer of the glass substrate is replaced with one having a larger ionic radius in the glass substrate according to any one of claims 1 to 6. It is characterized by.

上記目的を達成するために、請求項8記載の磁気記録媒体用ガラス基板の製造方法は、主表面、外周端面及び内周端面を有するドーナツ状の磁気記録媒体用ガラス基板において、前記主表面と前記外周端面及び内周端面の一方との間の角部に面取り加工を施して、請求項1乃至6のいずれか1項に記載の磁気記録媒体用ガラス基板を形成する面取り加工工程を有することを特徴とする。   In order to achieve the above object, a method for producing a glass substrate for a magnetic recording medium according to claim 8 is a donut-shaped glass substrate for a magnetic recording medium having a main surface, an outer peripheral end surface, and an inner peripheral end surface. 7. A chamfering process for forming a glass substrate for a magnetic recording medium according to any one of claims 1 to 6 by chamfering a corner between one of the outer peripheral end surface and the inner peripheral end surface. It is characterized by.

請求項9記載の製造方法は、請求項8記載の製造方法において、前記面取り加工工程後、前記主表面を5μm以上研磨する主表面研磨工程と、前記外周端面及び前記内周端面を5μm以上研磨する端面研磨工程とを有することを特徴とする。   The manufacturing method according to claim 9 is the manufacturing method according to claim 8, wherein after the chamfering step, a main surface polishing step of polishing the main surface by 5 μm or more, and polishing the outer peripheral end surface and the inner peripheral end surface by 5 μm or more. And an end face polishing step.

請求項10記載の製造方法は、請求項9記載の製造方法において、前記ガラス基板は、母ガラスがアルカリ酸化物成分としてLiO及びNaOのいずれか一方を含有するシリケートガラスから成り、前記製造方法は、前記主表面研磨工程後、前記主表面の表面層のアルカリ成分を前記アルカリ酸化物成分より大きなイオン半径を有するアルカリ成分に置換する化学強化処理工程を有することを特徴とする。 The manufacturing method according to claim 10 is the manufacturing method according to claim 9, wherein the glass substrate is made of a silicate glass in which the mother glass contains Li 2 O or Na 2 O as an alkali oxide component, The manufacturing method includes a chemical strengthening treatment step of replacing the alkali component of the surface layer on the main surface with an alkali component having an ionic radius larger than that of the alkali oxide component after the main surface polishing step.

請求項1記載のガラス基板によれば、ガラス基板の中心軸を含むガラス基板の断面における面取り面の外形線の長さに対する環状曲面部の外形線の長さの百分率比が30%以上であり、面取り面と主表面とが成す角度が136〜165°であるので、機械的衝撃又は熱衝撃によって外周端面及び内周端面の一方と面取り面との境界部に発生する応力を分散することができ、もって磁気記録媒体の破損を防止することができる。また、研削砥石による面取り面加工時にガラス基板の振れを防止し、面取り面の幅の狭隘化を阻止して面取り面に発生する応力を分散すると共に、未研削部の発生を防止して面取り面から微小クラックを除去することができ、加えて、主表面と面取り面との境界部でのチッピングの発生を防止して、チッピング除去のための研磨加工における研磨量を削減し、もって製造コストを削減することができる。   According to the glass substrate of claim 1, the percentage ratio of the length of the outline of the annular curved surface portion to the length of the outline of the chamfered surface in the cross section of the glass substrate including the central axis of the glass substrate is 30% or more. Since the angle formed between the chamfered surface and the main surface is 136 to 165 °, the stress generated at the boundary between the outer peripheral end surface and the inner peripheral end surface and the chamfered surface due to mechanical shock or thermal shock may be dispersed. Thus, damage to the magnetic recording medium can be prevented. In addition, the chamfered surface of the chamfered surface is prevented by preventing the wobbling of the glass substrate during chamfered surface processing with a grinding wheel, preventing the narrowing of the width of the chamfered surface and dispersing the stress generated on the chamfered surface. In addition, micro cracks can be removed from the surface, and in addition, the occurrence of chipping at the boundary between the main surface and the chamfered surface can be prevented, and the amount of polishing in the polishing process for chipping removal can be reduced. Can be reduced.

請求項2記載のガラス基板によれば、ガラス基板の中心軸を含むガラス基板の断面における面取り面の外形線の長さに対する環状曲面部の外形線の長さの百分率比が50%以上であるので、請求項1記載のガラス基板による効果をより確実に奏することができる。   According to the glass substrate of claim 2, the percentage ratio of the length of the outline of the annular curved surface portion to the length of the outline of the chamfered surface in the cross section of the glass substrate including the central axis of the glass substrate is 50% or more. Therefore, the effect by the glass substrate of Claim 1 can be show | played more reliably.

請求項3記載のガラス基板によれば、環状曲面部の外形線の曲率半径が0.10〜0.35mmであるので、環状曲面部を加工する研削砥石の曲率半径の下限の増大により研削砥石面の砥粒を均一に付着させることができ、もって砥粒の付着力の強化により研削砥石の交換寿命を長くすることができるのに加えて、上記曲率半径の上限の低減により錐面部と環状曲面部との境界部が不連続になるのを防止することができ、もって錐面部と環状曲面部との境界部に発生する応力を分散することができ、磁気ディスクの破損をより確実に防止することができる。   According to the glass substrate of claim 3, since the curvature radius of the contour line of the annular curved surface portion is 0.10 to 0.35 mm, the grinding wheel is increased by increasing the lower limit of the radius of curvature of the grinding wheel for processing the annular curved surface portion. In addition to the fact that the surface abrasive grains can be uniformly adhered, and the exchange life of the grinding wheel can be increased by strengthening the adhesive force of the abrasive grains, the conical surface portion and the annular shape can be reduced by reducing the upper limit of the radius of curvature. The boundary between the curved surface and the curved surface can be prevented from becoming discontinuous, and the stress generated at the boundary between the conical surface and the annular curved surface can be dispersed, preventing damage to the magnetic disk more reliably. can do.

請求項4記載のガラス基板によれば、請求項3記載のガラス基板による効果をより確実に奏することができる。   According to the glass substrate of Claim 4, the effect by the glass substrate of Claim 3 can be show | played more reliably.

請求項5記載のガラス基板によれば、面取り面と主表面とが成す角度が140〜155°であるので、請求項1乃至4のいずれか1項に記載のガラス基板による効果を確実に奏することができる。   According to the glass substrate of Claim 5, since the angle which a chamfering surface and a main surface comprise is 140-155 degrees, there exists reliably the effect by the glass substrate of any one of Claims 1 thru | or 4. be able to.

請求項6記載のガラス基板によれば、破壊応力に基づいて算出したワイブル定数が20.0以上であるので、磁気ディスクの破損を確実に防止できる。   According to the glass substrate of the sixth aspect, since the Weibull constant calculated based on the fracture stress is 20.0 or more, the magnetic disk can be reliably prevented from being damaged.

請求項7記載のガラス基板によれば、ガラス基板の表面層中のアルカリ成分をイオン半径がより大きいものに置き換える化学強化処理が施されているので、ガラス基板の強度を向上させることができる。   According to the glass substrate of Claim 7, since the chemical strengthening process which replaces the alkali component in the surface layer of a glass substrate with a thing with a larger ionic radius is performed, the intensity | strength of a glass substrate can be improved.

請求項8記載の磁気記録媒体用ガラス基板の製造方法によれば、前記主表面と前記外周端面及び内周端面の一方との間の角部に面取り加工を施して、請求項1乃至6のいずれか1項に記載の磁気記録媒体用ガラス基板を形成するので、機械的衝撃又は熱衝撃によって外周端面及び内周端面の一方と面取り面との境界部に発生する応力を分散することができ、もって磁気記録媒体の破損を防止することができる。   According to the method for manufacturing a glass substrate for a magnetic recording medium according to claim 8, chamfering is performed on a corner portion between the main surface and one of the outer peripheral end face and the inner peripheral end face. Since the glass substrate for a magnetic recording medium described in any one of the above items is formed, the stress generated at the boundary between the outer peripheral end surface and one of the inner peripheral end surfaces and the chamfered surface due to mechanical shock or thermal shock can be dispersed. Thus, damage to the magnetic recording medium can be prevented.

請求項9記載の製造方法によれば、ガラス基板の面取り加工後、その主表面を5μm以上研磨し、外周端面及び内周端面を5μm以上研磨するので、微小クラックを確実に除去することができ、もって磁気ディスクの破損を確実に防止することができる。   According to the manufacturing method of claim 9, after chamfering the glass substrate, the main surface is polished by 5 μm or more, and the outer peripheral end surface and the inner peripheral end surface are polished by 5 μm or more, so that microcracks can be reliably removed. Therefore, it is possible to reliably prevent the magnetic disk from being damaged.

請求項10記載の製造方法によれば、母ガラスがアルカリ酸化物成分としてLiO及びNaOのいずれか一方を含有するシリケートガラスから成るガラス基板の主表面における表面層のアルカリ成分をアルカリ酸化物成分より大きなイオン半径を有するアルカリ成分に置換するので、ガラス基板の強度を向上させることができる。 According to the manufacturing method of claim 10, the alkali component of the surface layer on the main surface of the glass substrate made of silicate glass in which the mother glass contains either Li 2 O or Na 2 O as an alkali oxide component is alkalinized. Since the alkali component having an ionic radius larger than that of the oxide component is substituted, the strength of the glass substrate can be improved.

本発明者は、上記目的を達成すべく鋭意検討を行った結果、主表面、外周端面及び内周端面を有し、前記主表面と前記外周端面及び内周端面の一方とを連接する面取り面を有するドーナツ状の磁気記録媒体用ガラス基板において、面取り面は互いに連接する錐面部及び環状曲面部から成り、ガラス基板の中心軸を含むガラス基板の断面における面取り面の外形線の長さに対する環状曲面部の外形線の長さの百分率比が20%以上、好ましくは50%以上であるときは、機械的衝撃又は熱衝撃によって外周端面及び内周端面の一方と面取り面との境界部に発生する応力を分散することができ、もって磁気記録媒体の破損を防止することができることを見出した。   As a result of intensive studies to achieve the above object, the present inventor has a main surface, an outer peripheral end surface and an inner peripheral end surface, and a chamfered surface connecting the main surface and one of the outer peripheral end surface and the inner peripheral end surface. In the doughnut-shaped glass substrate for magnetic recording medium, the chamfered surface is composed of a conical surface portion and an annular curved surface portion that are connected to each other, and is circular with respect to the length of the outline of the chamfered surface in the cross section of the glass substrate including the central axis of the glass substrate. When the percentage ratio of the length of the contour line of the curved surface portion is 20% or more, preferably 50% or more, it occurs at the boundary portion between one of the outer peripheral end surface and the inner peripheral end surface and the chamfered surface due to mechanical shock or thermal shock. It has been found that the stress to be distributed can be dispersed, and thus damage to the magnetic recording medium can be prevented.

また、本発明者は、主表面、外周端面及び内周端面を有し、主表面と外周端面及び内周端面の一方とを連接する面取り面を有するドーナツ状の磁気記録媒体用ガラス基板において、面取り面と主表面とが成す角度が136〜165°好ましくは140〜155°であるときは、研削砥石による面取り面加工時に磁気記録媒体用ガラス基板の振れを防止し、面取り面の幅の狭隘化を阻止して面取り面に発生する応力を分散すると共に、未研削部の発生を防止して面取り面から微小クラックを除去することができ、加えて、外周端面及び内周端面の一方と面取り面との境界部でのチッピングの発生を防止して、チッピング除去のための研磨加工における研磨量を削減し、もって製造コストを削減することができることを見出した。   The inventor has a main surface, an outer peripheral end surface and an inner peripheral end surface, and a doughnut-shaped glass substrate for a magnetic recording medium having a chamfered surface connecting the main surface and one of the outer peripheral end surface and the inner peripheral end surface. When the angle formed between the chamfered surface and the main surface is 136 to 165 °, preferably 140 to 155 °, the glass substrate for magnetic recording medium is prevented from shaking during chamfering processing with a grinding wheel, and the width of the chamfered surface is reduced. This prevents the generation of unground parts and removes microcracks from the chamfered surface, in addition to chamfering one of the outer peripheral end surface and the inner peripheral end surface. It has been found that chipping at the boundary with the surface can be prevented, the amount of polishing in the polishing process for chipping removal can be reduced, and thus the manufacturing cost can be reduced.

さらに、本発明者は、主表面、外周端面及び内周端面を有するドーナツ状の磁気記録媒体用ガラス基板において、前記主表面と前記外周端面及び内周端面の一方との間の角部に面取り加工を施して、請求項1乃至6のいずれか1項に記載の磁気記録媒体用ガラス基板を形成する面取り加工工程を有するとき、機械的衝撃又は熱衝撃によって外周端面及び内周端面の一方と面取り面との境界部に発生する応力を分散することができ、もって磁気記録媒体の破損を防止することができることを見出した。   Further, the present inventor has chamfered a corner portion between the main surface and one of the outer peripheral end surface and the inner peripheral end surface in a donut-shaped glass substrate for a magnetic recording medium having a main surface, an outer peripheral end surface, and an inner peripheral end surface. 7. A chamfering process for forming the glass substrate for a magnetic recording medium according to claim 1, wherein the outer peripheral end surface and the inner peripheral end surface are subjected to mechanical shock or thermal shock. It has been found that the stress generated at the boundary with the chamfered surface can be dispersed, thereby preventing damage to the magnetic recording medium.

以下、本発明の実施の形態に係る磁気記録媒体用ガラス基板について図面を参照して詳述する。   Hereinafter, a glass substrate for a magnetic recording medium according to an embodiment of the present invention will be described in detail with reference to the drawings.

図1は、本発明の実施の形態に係る磁気記録媒体用ガラス基板の断面図である。   FIG. 1 is a cross-sectional view of a glass substrate for a magnetic recording medium according to an embodiment of the present invention.

図1において、ドーナツ形状の磁気記録媒体用ガラス基板100は、2つの主表面101a,101bと、外周端面102と、内周端面103と、主表面101a及び外周端面102を連接する面取り面104aと、主表面101b及び外周端面102を連接する面取り面104bと、主表面101a及び内周端面103を連接する面取り面105aと、主表面101b及び内周端面103を連接する面取り面105bとを有する。   In FIG. 1, a glass substrate 100 for a doughnut-shaped magnetic recording medium includes two main surfaces 101a and 101b, an outer peripheral end surface 102, an inner peripheral end surface 103, and a chamfered surface 104a connecting the main surface 101a and the outer peripheral end surface 102. The chamfered surface 104b connecting the main surface 101b and the outer peripheral end surface 102, the chamfered surface 105a connecting the main surface 101a and the inner peripheral end surface 103, and the chamfered surface 105b connecting the main surface 101b and the inner peripheral end surface 103.

図2は、図1のガラス基板100の拡大断面図である。   FIG. 2 is an enlarged cross-sectional view of the glass substrate 100 of FIG.

面取り面104aは、互いに連接する環状曲面部104a’及び錐面部104a”から成る。   The chamfered surface 104a includes an annular curved surface portion 104a 'and a conical surface portion 104a' 'that are connected to each other.

ガラス基板100の中心軸106を含むガラス基板100の断面における面取り面104aの外形線200の長さLに対する環状曲面部104a’の外形線の長さd1の百分率比(d1/L)は20%以上、好ましくは50%以上である。これにより、機械的衝撃又は熱衝撃によって外周端面102と面取り面104aとの境界部に発生する応力を分散することができ、もって磁気記録媒体の破損を防止することができる。   The percentage ratio (d1 / L) of the length d1 of the outline of the circular curved surface portion 104a ′ to the length L of the outline 200 of the chamfered surface 104a in the cross section of the glass substrate 100 including the central axis 106 of the glass substrate 100 is 20%. Above, preferably 50% or more. As a result, the stress generated at the boundary between the outer peripheral end face 102 and the chamfered surface 104a due to mechanical shock or thermal shock can be dispersed, and damage to the magnetic recording medium can be prevented.

また、環状曲面部104a’の曲率半径Rは0.10〜0.50mm、好ましくは、0.20〜0.35mmである。これにより、環状曲面部104a’を加工する研削砥石の曲率半径の下限の増大により研削砥石面の砥粒を均一に付着させることができ、もって砥粒の付着力の強化により研削砥石の交換寿命を長くすることができるのに加えて、上記曲率半径の上限の低減により錐面部104a”と環状曲面部104a’との境界部が不連続になるのを防止することができ、もって錐面部104a”と環状曲面部104a’との境界部に発生する応力を分散することができ、磁気ディスクの破損をより確実に防止することができる。   The curvature radius R of the annular curved surface portion 104a 'is 0.10 to 0.50 mm, preferably 0.20 to 0.35 mm. As a result, it is possible to uniformly attach the abrasive grains on the grinding wheel surface by increasing the lower limit of the radius of curvature of the grinding wheel that processes the annular curved surface portion 104a ′, and thus the replacement life of the grinding wheel by strengthening the adhesion of the abrasive grains. In addition, it is possible to prevent the boundary portion between the conical surface portion 104a ″ and the annular curved surface portion 104a ′ from becoming discontinuous by reducing the upper limit of the radius of curvature, and thus the conical surface portion 104a. ”And the annular curved surface portion 104a ′ can be dispersed, and the magnetic disk can be more reliably prevented from being damaged.

また、主表面101aと錐面部104aとが成す角度θは136〜165°、好ましくは140〜155°である。これにより、研削砥石による面取り面加工時にガラス基板100の振れを防止し、面取り面104aの幅の狭隘化を阻止して面取り面104aに発生する応力を分散すると共に、未研削部の発生を防止して面取り面104aから微小クラックを除去することによって磁気ディスクの破損を防止することができ、加えて、主表面101aと面取り面104aとの境界部でのチッピングの発生を防止してチッピング除去のための研磨加工における研磨量を削減し、もって製造コストを削減することができる。   The angle θ formed between the main surface 101a and the conical surface portion 104a is 136 to 165 °, preferably 140 to 155 °. This prevents the glass substrate 100 from shaking during chamfering with a grinding wheel, prevents the chamfered surface 104a from narrowing, disperses the stress generated on the chamfered surface 104a, and prevents the occurrence of unground parts. By removing the microcracks from the chamfered surface 104a, the magnetic disk can be prevented from being damaged. In addition, the chipping removal at the boundary between the main surface 101a and the chamfered surface 104a is prevented. Therefore, the amount of polishing in the polishing process can be reduced, thereby reducing the manufacturing cost.

角度θが135°以下であるときには、主表面101aと面取り面104aの境界部においてチッピングが発生し易くなる一方、角度θが165°以上であるときには、研削砥石とガラス基板100との位置決めのズレによってガラス基板100の振れが発生し、全般的には外周交線200及び内周交線の長さLが長くなるため、面取り面104aを研磨することによって微小クラックを除去する際に面取り面104aを全て研磨することができず、その結果、未研磨部に微小クラックが残留し易くなる。   When the angle θ is 135 ° or less, chipping is likely to occur at the boundary between the main surface 101a and the chamfered surface 104a. On the other hand, when the angle θ is 165 ° or more, the positioning deviation between the grinding wheel and the glass substrate 100 is increased. As a result, the glass substrate 100 is shaken and generally the length L of the outer circumferential intersection line 200 and the inner circumferential intersection line is increased. Therefore, the chamfered surface 104a is removed when the microcracks are removed by polishing the chamfered surface 104a. As a result, fine cracks are likely to remain in the unpolished portion.

上記と同様のことが、面取り面104b,105a,105bにも云える。   The same can be said for the chamfered surfaces 104b, 105a, 105b.

また、ガラス基板100は、その母ガラスが、アルカリ等への化学的耐久性や剛性を有するシリケートガラスや、シリケートガラスを熱処理により結晶化した結晶化ガラスから成る。   Further, the glass substrate 100 is made of a silicate glass having chemical durability and rigidity against alkali or the like, or crystallized glass obtained by crystallizing silicate glass by heat treatment.

シリケートガラスとしては、例えば、建築用の窓ガラスに用いられるソーダライムシリケートガラス、アルミノシリケートガラス、硼珪酸シリケートガラス、易化学強化ガラス等が例示できる。易化学強化ガラスは、硝酸カリウム溶融塩にガラスを接触させてガラス中のリチウム成分やナトリウム成分をイオン半径がより大きなカリウムイオンに交換したり、又はガラスを硝酸ナトリウム溶融塩に接触させてガラス中のリチウムイオンをイオン半径がより大きなナトリウムイオンに交換することにより、表面層(約50〜200μm)に圧縮応力を形成したものである。このようなガラスとしては、主成分として質量%でSiO2:60〜65%、Al2O3:10〜20%、MgO:0〜5%、CaO:0〜5%、Li2O:2〜10%、Na2O:5〜15%を含有するものが例示できる。また、結晶化ガラスは、SiO2、Al2O3、Li2O、MgO、P2O3、ZrO、CeO2、TiO2、Na2O、K2Oから選択された成分を主成分とするものが例示できる。   Examples of the silicate glass include soda lime silicate glass, aluminosilicate glass, borosilicate silicate glass, and chemically tempered glass used for architectural window glass. Easily tempered glass is made by bringing glass into contact with potassium nitrate molten salt to exchange lithium or sodium components in the glass with potassium ions having a larger ionic radius, or bringing glass into contact with molten sodium nitrate to bring the glass into contact with the glass. By replacing lithium ions with sodium ions having a larger ion radius, compressive stress is formed on the surface layer (about 50 to 200 μm). As such glass, SiO2: 60 to 65%, Al2O3: 10 to 20%, MgO: 0 to 5%, CaO: 0 to 5%, Li2O: 2 to 10%, Na2O: What contains 5 to 15% can be illustrated. The crystallized glass can be exemplified by those having as a main component a component selected from SiO2, Al2O3, Li2O, MgO, P2O3, ZrO, CeO2, TiO2, Na2O, and K2O.

結晶化ガラスとしては、特にその組成が限定されていないが、例えば質量%でSiO2:70〜80%、Al2O3:2〜8%、K2O:1〜7%、Li2O:5〜15%、P2O5:1〜5%を含有するものが例示できる。   The composition of the crystallized glass is not particularly limited. For example, in terms of mass%, SiO2: 70 to 80%, Al2O3: 2 to 8%, K2O: 1 to 7%, Li2O: 5 to 15%, P2O5: What contains 1 to 5% can be illustrated.

ガラス基板100は、フロートガラス製造法、ダウンドロー製造法、リドロー製造法によって成型された板状のガラス素材から研磨砥石によってドーナツ状に形成されてもよく、溶融されたガラスから上型及び下型を用いたダイレクトプレスによって直接ドーナツ状に形成されてもよい。研磨砥石によってドーナツ状に形成するときには、研磨砥石を用いて板状のガラス素材の外径を円形に形成し、その後、円筒状の砥石を用いて外径を円形に形成されたガラス素材の中央部分をくり抜くことによって形成してもよい。   The glass substrate 100 may be formed into a donut shape by a polishing grindstone from a plate-like glass material molded by a float glass manufacturing method, a downdraw manufacturing method, or a redraw manufacturing method, and an upper mold and a lower mold are formed from molten glass. It may be formed directly in a donut shape by a direct press using. When forming a donut shape with a polishing grindstone, the outer diameter of the plate-shaped glass material is formed in a circle using a polishing grindstone, and then the center of the glass material formed in a circular outer diameter using a cylindrical grindstone You may form by hollowing out a part.

次に、本発明の実施の形態に係る磁気記録媒体用ガラス基板の製造方法について図面を参照して説明する。   Next, the manufacturing method of the glass substrate for magnetic recording media which concerns on embodiment of this invention is demonstrated with reference to drawings.

図3は、本発明の実施の形態に係る磁気記録媒体用ガラス基板の製造手順のフローチャートである。   FIG. 3 is a flowchart of the manufacturing procedure of the glass substrate for magnetic recording media according to the embodiment of the present invention.

本手順は、上述した本発明の実施の形態に係る磁気記録媒体用ガラス基板を製造するものである。   This procedure manufactures the glass substrate for magnetic recording media according to the embodiment of the present invention described above.

図3において、まず、フロートガラス製造法によって溶融金属上において板状に形成されたアルミノシリケートガラスのガラス組成を持つガラス素板を準備し、該準備されたガラス素板から超硬合金カッターを用いて外周と内周を同時に加工することによって、外径96mmφ、内径24mmφ及び厚み1.15mmのドーナツ状のガラス基板100を形成する(ステップS300)。   In FIG. 3, first, a glass base plate having a glass composition of aluminosilicate glass formed into a plate shape on a molten metal by a float glass manufacturing method is prepared, and a cemented carbide cutter is used from the prepared glass base plate. The doughnut-shaped glass substrate 100 having an outer diameter of 96 mmφ, an inner diameter of 24 mmφ and a thickness of 1.15 mm is formed by simultaneously processing the outer periphery and the inner periphery (step S300).

次いで、後述する図4の研削砥石を用いた研削加工によって、ガラス基板100の外周端面102の寸法を95mmφに調整し、且つ内周端面103の寸法を25mmφに調整すると共に、主表面101a及び外周端面102を連接する面取り面104aと、主表面101b及び外周端面102を連接する面取り面104bと、主表面101a及び内周端面103を連接する面取り面105aと、主表面101b及び内周端面103を連接する面取り面105bとを形成する。このとき、面取り面104a,104b,105a,105bの各々と、外周端面102及び内周端面103のいずれか一方との交差個所に存在する環状曲面部104a’の曲率半径Rを0.2mmに調整し、角度θを155°に調整する(ステップS301)。   Next, the size of the outer peripheral end face 102 of the glass substrate 100 is adjusted to 95 mmφ and the dimension of the inner peripheral end face 103 is adjusted to 25 mmφ by grinding using the grinding wheel of FIG. A chamfered surface 104 a connecting the end surface 102, a chamfered surface 104 b connecting the main surface 101 b and the outer peripheral end surface 102, a chamfered surface 105 a connecting the main surface 101 a and the inner peripheral end surface 103, a main surface 101 b and the inner peripheral end surface 103. The connecting chamfered surfaces 105b are formed. At this time, the curvature radius R of the annular curved surface portion 104a ′ existing at the intersection of each of the chamfered surfaces 104a, 104b, 105a, and 105b and any one of the outer peripheral end surface 102 and the inner peripheral end surface 103 is adjusted to 0.2 mm. Then, the angle θ is adjusted to 155 ° (step S301).

図4は、図3のステップS301において使用される研削砥石を示す図である。   FIG. 4 is a diagram showing the grinding wheel used in step S301 of FIG.

図4において、研削砥石は、外周端面102の寸法を調整する外周端面研削用砥石400と、内周端面103の寸法を調整する内周端面研削用砥石401とによって構成される。   In FIG. 4, the grinding wheel is constituted by an outer peripheral end face grinding grindstone 400 that adjusts the dimension of the outer peripheral end face 102 and an inner peripheral end face grinding grindstone 401 that adjusts the dimension of the inner peripheral end face 103.

外周端面研削用砥石400は、回転軸402と、砥石群404とで構成される。砥石群404は、その外径部に外周端面102及び面取り面104a,104bの形状が相補された形状の加工溝を有する環状の砥石403が所定数だけ積層されたものである。外周端面研削用砥石400は、回転軸402を中心に回転すると共に、加工溝を介して外周端面102と接触することによってガラス基板100の外周端面102の寸法を調整し、且つ面取り面104a,104bを所定の形状に形成する。   The outer peripheral end surface grinding wheel 400 includes a rotating shaft 402 and a grindstone group 404. The grindstone group 404 is formed by laminating a predetermined number of annular grindstones 403 having processing grooves in a shape in which the shapes of the outer peripheral end surface 102 and the chamfered surfaces 104a and 104b are complemented on the outer diameter portion thereof. The outer peripheral end surface grinding wheel 400 rotates around the rotation shaft 402, adjusts the dimension of the outer peripheral end surface 102 of the glass substrate 100 by contacting the outer peripheral end surface 102 through the processing groove, and chamfered surfaces 104a and 104b. Are formed into a predetermined shape.

また、内周端面研削用砥石401も、回転軸405と、砥石群407とで構成される。砥石群407は、その外径部に内周端面103及び面取り面105a,105bの形状が相補された形状の加工溝を有する砥石406が所定数だけ積層されたものである。内周端面研削用砥石401は、回転軸405を中心に回転すると共に、加工溝を介して内周端面103と接触することによってガラス基板100の内周端面103の寸法を調整し、且つ面取り面105a,105bを所定の形状に形成する。また、砥石403,406の加工溝の表面にはダイヤモンド砥粒が付着されている。   Further, the inner peripheral end face grinding grindstone 401 is also composed of a rotating shaft 405 and a grindstone group 407. The grindstone group 407 is formed by laminating a predetermined number of grindstones 406 each having a processing groove having a shape in which the shapes of the inner peripheral end surface 103 and the chamfered surfaces 105a and 105b are complemented on the outer diameter portion thereof. The inner peripheral end surface grinding wheel 401 rotates about the rotation shaft 405 and adjusts the dimension of the inner peripheral end surface 103 of the glass substrate 100 by contacting the inner peripheral end surface 103 via the machining groove, and also chamfered. 105a and 105b are formed in a predetermined shape. Further, diamond abrasive grains are attached to the surface of the processing groove of the grindstones 403 and 406.

図3に戻り、ガラス基板100の複数を、任意のガラス基板100の主表面101aと他のガラス基板100の主表面101bが接触するように積層して回転させ、該積層されたガラス基板100に研磨剤を水溶させたスラリーを掛けると共に、積層されたガラス基板100の外周端面102、内周端面103、及び面取り面104a,104b,105a,105bを5μm以上研磨ブラシによって研磨する(ステップS302)。   Returning to FIG. 3, a plurality of glass substrates 100 are stacked and rotated so that a main surface 101 a of any glass substrate 100 and a main surface 101 b of another glass substrate 100 are in contact with each other, and the stacked glass substrates 100 are rotated. A slurry in which an abrasive is dissolved in water is applied, and the outer peripheral end surface 102, the inner peripheral end surface 103, and the chamfered surfaces 104a, 104b, 105a, and 105b of the laminated glass substrate 100 are polished with a polishing brush of 5 μm or more (step S302).

続くステップS303では、ガラス基板100に粒度#1000の研磨材を用いてガラス基板100の上下の両主表面101a,101bをラッピングする。このとき、ガラス基板100の両主表面101a,101b等に残留した研磨材は、以下に説明するステップS304の第1研磨工程(主表面研磨工程)において、両主表面101a,101bのキズ等の要因となるため、ラッピングが終了した後に、ガラス基板100の全ての面を酸性又はアルカリ性の水溶液で洗浄する。   In subsequent step S303, the upper and lower main surfaces 101a and 101b of the glass substrate 100 are lapped to the glass substrate 100 using an abrasive having a particle size # 1000. At this time, the polishing material remaining on both the main surfaces 101a and 101b of the glass substrate 100 is damaged in the first polishing step (main surface polishing step) of step S304 described below, such as scratches on both the main surfaces 101a and 101b. Since it becomes a factor, after lapping is completed, all surfaces of the glass substrate 100 are washed with an acidic or alkaline aqueous solution.

次いで、酸化セリウムの懸濁液等の微粒研磨剤を用いて、ステップS304の第1研磨工程では、ステップS303のラッピングで発生した両主表面101a,101bのキズを除去し、続くステップS305の第2研磨工程(主表面研磨工程)では、精密研磨することによってガラス基板100の厚みを1.0mmに調整すると共に、両主表面101a,101bを滑面化する。ステップS304及びステップS305における研磨される厚みは合計すると5μm以上であり、その後、両主表面101a,101bを酸性又はアルカリ性の水溶液によって洗浄する。   Next, using a fine abrasive such as a suspension of cerium oxide, in the first polishing step of step S304, scratches on both the main surfaces 101a and 101b generated by the lapping of step S303 are removed, and the subsequent first step of step S305 is performed. In the 2 polishing step (main surface polishing step), the thickness of the glass substrate 100 is adjusted to 1.0 mm by precision polishing, and both the main surfaces 101a and 101b are made smooth. The total thickness to be polished in step S304 and step S305 is 5 μm or more, and then both main surfaces 101a and 101b are washed with an acidic or alkaline aqueous solution.

上記両主表面101a,101bが洗浄されたガラス基板100は、磁気ディスク高速回転時等の強度をより確実に確保すべく化学強化処理によりさらに強化され、温水、又はアルカリ洗浄水若しくは純水により洗浄され、本処理を終了する(ステップS306)。   The glass substrate 100 from which both the main surfaces 101a and 101b have been cleaned is further strengthened by a chemical strengthening process so as to ensure the strength at the time of high-speed rotation of the magnetic disk, and cleaned with warm water, alkaline cleaning water or pure water. Then, this process is terminated (step S306).

この化学強化処理は、ガラス基板100の表面層中のアルカリ成分をイオン半径がより大きいものに置き換えるものである。具体的には、400〜450℃の硝酸カリウム(KNO3)と硝酸ナトリウム(NaNo3)の溶融塩にガラス基板100を2〜5時間浸漬することにより、ガラス基板100の表面層中のナトリウムイオンをカリウムイオンに、リチウムイオンをナトリウムイオン上に置換して、ガラス基板100の強度を向上させるものである。   This chemical strengthening treatment replaces the alkali component in the surface layer of the glass substrate 100 with one having a larger ionic radius. Specifically, by immersing the glass substrate 100 in a molten salt of potassium nitrate (KNO 3) and sodium nitrate (NaNo 3) at 400 to 450 ° C. for 2 to 5 hours, sodium ions in the surface layer of the glass substrate 100 are converted into potassium ions. In addition, lithium ions are replaced with sodium ions to improve the strength of the glass substrate 100.

図3の手順によれば、機械的衝撃又は熱衝撃によって外周端面102及び内周端面103の1つと面取り面104a,104b,105a,105bの1つとの境界部に発生する応力を分散することができ、もって磁気記録媒体の破損を防止することができる。   According to the procedure of FIG. 3, the stress generated at the boundary between one of the outer peripheral end surface 102 and the inner peripheral end surface 103 and one of the chamfered surfaces 104a, 104b, 105a, 105b can be dispersed by mechanical shock or thermal shock. Thus, damage to the magnetic recording medium can be prevented.

次に、本発明の実施例を具体的に説明する。   Next, examples of the present invention will be specifically described.

まず、図3の手順をステップS302まで実行し、表1に示す10種類の磁気記録媒体用ガラス基板のテストピースを作製した(実施例1〜9、比較例1)。   First, the procedure of FIG. 3 was executed up to step S302, and test pieces of 10 types of glass substrates for magnetic recording media shown in Table 1 were produced (Examples 1 to 9, Comparative Example 1).

Figure 2008282539
Figure 2008282539

その後、これら10種類のテストピースの各々について、(株)島津製作所製強度試験器(商品名:AUTOGRAPH)(図5)を用いて破壊応力を測定し、該測定した破壊応力に基づいてワイブル定数を算出した。   Thereafter, for each of these 10 types of test pieces, the fracture stress was measured using a strength tester (trade name: AUTOGRAPH) (FIG. 5) manufactured by Shimadzu Corporation, and the Weibull constant was determined based on the measured fracture stress. Was calculated.

図5は、本発明の実施例で使用した強度試験器の概略構成を示す側面図である。   FIG. 5 is a side view showing a schematic configuration of the strength tester used in the example of the present invention.

図5において、テストピース500を鋼鉄製の置き台501上にセットし、該セットされたテストピース500の上に鋼鉄製のリング502をセットした。その後、置き台501とリング502との相対変位速度を0.5mm/分に調整して置き台501及びリング502を介してテストピース500に加圧し、テストピース500が破壊したときの荷重をロードセル503で検出した。   In FIG. 5, the test piece 500 was set on a steel table 501, and a steel ring 502 was set on the set test piece 500. Thereafter, the relative displacement speed between the cradle 501 and the ring 502 is adjusted to 0.5 mm / min, the test piece 500 is pressurized via the cradle 501 and the ring 502, and the load when the test piece 500 breaks is loaded into the load cell. 503 detected.

以上の破壊荷重の検出を各種テストピース500毎に100回行い、検出した破壊荷重を破壊応力データに換算し、100回分の破壊応力データに基づいてワイブル定数を算出した。   The detection of the above breaking load was performed 100 times for each test piece 500, the detected breaking load was converted to the breaking stress data, and the Weibull constant was calculated based on the breaking stress data for 100 times.

また、磁気ディスクの面記録密度が7ギガビット/平方インチとなる膜を各種テストピース500毎に10000枚ずつ成膜し、10000枚の成膜されたテストピース500のうち破損した枚数を成膜時破損率として集計した。   In addition, 10,000 films each having a surface recording density of 7 gigabits / in 2 on the magnetic disk are formed for each of the test pieces 500, and the damaged number of the 10,000 test pieces 500 is formed. Calculated as damage rate.

さらに、主表面101a,101bの1つと面取り面104a,104b,105a,105bの1つとの境界部に発生するチッピングの発生確率をチッピング不良率として算出した。   Further, the probability of occurrence of chipping occurring at the boundary between one of the main surfaces 101a and 101b and one of the chamfered surfaces 104a, 104b, 105a, and 105b was calculated as a chipping failure rate.

これらのワイブル定数、成膜時破損率及びチッピング不良率も上記表1に示されている。   Table 1 also shows the Weibull constant, the damage rate during film formation, and the chipping failure rate.

上記表1から明らかなように、比較例1は、外形線200の長さLに対する環状曲面部104a’の長さd1の百分率比が17%と小さい、即ち、外周端面102と面取り面104a,104bとの境界部に応力が集中し易いので、定数値が小さいほど強度信頼性が低いことを表すワイブル定数は15.2であって、成膜時破損率は5/10000と高い値を示した一方、実施例9は環状曲面部104a’の百分比率が30%と大きい、即ち、外周端面102と面取り面104a,104bとの境界部に応力が集中し難いので、ワイブル定数は20.0であって、成膜時破損率は2/10000と強度信頼性を満足する値を示した。さらに、実施例5は環状曲面部104a’の百分比率が56%とより大きい、即ち、外周端面102と面取り面104a,104bとの境界部に応力がより集中し難いので、ワイブル定数は22.0であって、成膜時破損率は1/10000と、より強度信頼性を満足する値を示した。これにより、環状曲面部104a’の百分比率は30%以上、好ましくは50%以上であれば、磁気ディスクの破損を確実に防止できることを確認できた。   As apparent from Table 1 above, in Comparative Example 1, the percentage ratio of the length d1 of the annular curved surface portion 104a ′ to the length L of the outline 200 is as small as 17%, that is, the outer peripheral end surface 102 and the chamfered surface 104a, Since the stress tends to concentrate on the boundary with 104b, the Weibull constant indicating that the strength reliability is lower as the constant value is smaller is 15.2, and the damage rate during film formation is as high as 5/10000. On the other hand, in Example 9, the percentage of the annular curved surface portion 104a ′ is as large as 30%, that is, the stress is difficult to concentrate on the boundary portion between the outer peripheral end surface 102 and the chamfered surfaces 104a and 104b. In addition, the damage rate during film formation was 2/10000, which was a value satisfying strength reliability. Furthermore, in Example 5, the percentage of the annular curved surface portion 104a ′ is as large as 56%, that is, the stress is less likely to concentrate at the boundary between the outer peripheral end surface 102 and the chamfered surfaces 104a and 104b. It was 0, and the damage rate during film formation was 1/10000, which was a value satisfying the strength reliability. Thus, it was confirmed that damage to the magnetic disk can be reliably prevented if the percentage of the annular curved surface portion 104a 'is 30% or more, preferably 50% or more.

また、上記表1から明らかなように、比較例1は環状曲面部104a’の曲率半径Rが0.05mmと小さい、即ち、環状曲面部104a’に応力が集中し易いので、ワイブル定数は15.2であって、成膜時破損率は5/10000と高い値を示した一方、実施例4は環状曲面部104a’の曲率半径Rが0.10mmと大きい、即ち、環状曲面部104a’に応力が集中し難いので、ワイブル定数は20.0であって、成膜時破損率は2/10000と強度信頼性を満足する値を示した。さらに、実施例7は環状曲面部104a’の曲率半径Rが0.20mmとより大きい、即ち、環状曲面部104a’に応力がより集中し難いので、ワイブル定数は21.8であって、成膜時破損率は1/10000と、より強度信頼性を満足する値を示した。これにより、環状曲面部104a’の曲率半径Rが0.10mm以上であれば、磁気ディスクの破損を防止でき、好ましくは、0.20mm以上であれば、磁気ディスクの破損を確実に防止できることを確認できた。   Further, as apparent from Table 1 above, in Comparative Example 1, the radius of curvature R of the annular curved surface portion 104a ′ is as small as 0.05 mm, that is, stress tends to concentrate on the annular curved surface portion 104a ′, so the Weibull constant is 15 2 and the damage rate during film formation was as high as 5/10000, while in Example 4, the radius of curvature R of the annular curved surface portion 104a ′ was as large as 0.10 mm, that is, the annular curved surface portion 104a ′. Since the stress is difficult to concentrate, the Weibull constant is 20.0, and the damage rate during film formation is 2/10000, which satisfies the strength reliability. Further, in Example 7, the radius of curvature R of the annular curved surface portion 104a ′ is larger than 0.20 mm, that is, the stress is less likely to concentrate on the annular curved surface portion 104a ′, and the Weibull constant is 21.8. The film breakage rate was 1/10000, a value more satisfying strength reliability. Thereby, if the radius of curvature R of the annular curved surface portion 104a ′ is 0.10 mm or more, the magnetic disk can be prevented from being damaged. Preferably, if it is 0.20 mm or more, the magnetic disk can be reliably prevented from being damaged. It could be confirmed.

さらに、上記表1から明らかなように、実施例2は環状曲面部104a’の曲率半径Rが0.35mmと小さい、即ち、環状曲面部104a’に応力がより集中し難いので、ワイブル定数は21.5であって、成膜時破損率は1/10000と、強度信頼性を満足する値を示した。これにより、環状曲面部104a’の曲率半径Rが0.50mm以下、好ましくは0.35mm以下であれば、磁気ディスクの破損を確実に防止できることを確認できた。   Further, as apparent from Table 1 above, in Example 2, the radius of curvature R of the annular curved surface portion 104a ′ is as small as 0.35 mm, that is, the stress is less likely to concentrate on the annular curved surface portion 104a ′. It was 21.5, and the failure rate during film formation was 1/10000, which was a value satisfying the strength reliability. As a result, it was confirmed that the magnetic disk could be reliably prevented from being damaged if the radius of curvature R of the annular curved surface portion 104a 'was 0.50 mm or less, preferably 0.35 mm or less.

また、上記表1から明らかなように、実施例6は角度θが165°と小さい、即ち、ガラス基板100の振れに基づいて面取り面の幅が狭くなる部分(以下「狭隘部」という。)が発生し難いので、ワイブル定数は20.0であって、成膜時破損率は2/10000と強度信頼性を満足する値を示した。さらに、実施例3は角度θが155°とより小さい、即ち、狭隘部がより発生し難いので、ワイブル定数は20.8であって、成膜時破損率は1/10000と、より強度信頼性を満足する値を示した。これにより、角度θが165°以下、好ましくは155°以下であれば、磁気ディスクの破損を確実に防止できることを確認できた。   Further, as apparent from Table 1 above, in Example 6, the angle θ is as small as 165 °, that is, a portion where the width of the chamfered surface is narrowed based on the shake of the glass substrate 100 (hereinafter referred to as “narrow portion”). Therefore, the Weibull constant was 20.0, and the damage rate during film formation was 2/10000, which was a value satisfying strength reliability. Further, in Example 3, the angle θ is smaller than 155 °, that is, the narrow portion is less likely to occur. Therefore, the Weibull constant is 20.8, the damage rate during film formation is 1/10000, and the strength is more reliable. A value satisfying the property was shown. As a result, it was confirmed that damage to the magnetic disk could be reliably prevented if the angle θ was 165 ° or less, preferably 155 ° or less.

また、上記表1から明らかなように、比較例1は角度θが135°と小さいので、チッピング不良率は3.0%と高い値を示した一方、実施例5は角度θが136°であるので、チッピング不良率は1.0%を示した。さらに、実施例7は角度θが140°であるので、チッピング不良率は0.8%を示した。これにより、角度θが136°以上であれば、製造コストを削減することができ、好ましくは、140°以上であれば、製造コストをより削減することができることを確認できた。   Further, as apparent from Table 1 above, since Comparative Example 1 has a small angle θ of 135 °, the chipping failure rate showed a high value of 3.0%, while Example 5 had an angle θ of 136 °. Therefore, the chipping failure rate was 1.0%. Further, in Example 7, since the angle θ was 140 °, the chipping defect rate was 0.8%. Thus, it was confirmed that the manufacturing cost can be reduced when the angle θ is 136 ° or more, and that the manufacturing cost can be further reduced when the angle θ is preferably 140 ° or more.

本発明の実施の形態に係る磁気記録媒体用ガラス基板の断面図である。It is sectional drawing of the glass substrate for magnetic recording media which concerns on embodiment of this invention. 図1の磁気記録媒体用ガラス基板100の拡大断面図である。It is an expanded sectional view of the glass substrate 100 for magnetic recording media of FIG. 本発明の実施の形態に係る磁気記録媒体用ガラス基板の製造手順のフローチャートである。It is a flowchart of the manufacture procedure of the glass substrate for magnetic recording media which concerns on embodiment of this invention. 図3のステップS301において使用される研削砥石を示す図である。It is a figure which shows the grinding wheel used in step S301 of FIG. 図5は、本発明の実施例で使用した強度試験器の概略構成を示す側面図である。FIG. 5 is a side view showing a schematic configuration of the strength tester used in the example of the present invention.

符号の説明Explanation of symbols

100 磁気記録媒体用ガラス基板
101 主表面
102 外周端面
103 内周端面
104a,104b,105a,105b 面取り面
104a’ 環状曲面部
104a” 錐面部
200 外形線
400 外周端面研削用砥石
401 内周端面研削用砥石
402,405 回転軸
403,406 砥石
404,407 砥石群
DESCRIPTION OF SYMBOLS 100 Glass substrate 101 for magnetic recording media Main surface 102 Outer peripheral end surface 103 Inner peripheral end surface 104a, 104b, 105a, 105b Chamfered surface 104a 'Annular curved surface part 104a "Conical surface part 200 Outline line 400 Outer peripheral end face grinding wheel 401 For inner peripheral end face grinding Grinding stone 402,405 Rotating shaft 403,406 Grinding stone 404,407 Grinding wheel group

Claims (10)

主表面、外周端面及び内周端面を有し、前記主表面と前記外周端面及び内周端面の一方とを連接する面取り面を有するドーナツ状の磁気記録媒体用ガラス基板において、
前記面取り面は互いに連接する錐面部及び環状曲面部から成り、前記ガラス基板の中心軸を含む前記ガラス基板の断面における前記面取り面の外形線の長さに対する前記環状曲面部の外形線の長さの百分率比が30%以上であり、
前記面取り面と前記主表面とが成す角度が136〜165°であること
を特徴とする磁気記録媒体用ガラス基板。
In a doughnut-shaped glass substrate for a magnetic recording medium having a main surface, an outer peripheral end surface and an inner peripheral end surface, and having a chamfered surface connecting the main surface and one of the outer peripheral end surface and the inner peripheral end surface;
The chamfered surface is composed of a conical surface portion and an annular curved surface portion connected to each other, and the length of the contour line of the annular curved surface portion with respect to the length of the contour line of the chamfered surface in the cross section of the glass substrate including the central axis of the glass substrate. The percentage ratio is 30% or more,
The glass substrate for a magnetic recording medium, wherein an angle formed by the chamfered surface and the main surface is 136 to 165 °.
前記百分率比が50%以上であることを特徴とする請求項1記載の磁気記録媒体用ガラス基板。   The glass substrate for a magnetic recording medium according to claim 1, wherein the percentage ratio is 50% or more. 前記環状曲面部の外形線の曲率半径が0.10〜0.35mmであることを特徴とする請求項1又は2記載の磁気記録媒体用ガラス基板。   3. The glass substrate for a magnetic recording medium according to claim 1, wherein a radius of curvature of an outer shape line of the annular curved surface portion is 0.10 to 0.35 mm. 前記曲率半径が0.20〜0.35mmであることを特徴とする請求項3記載の磁気記録媒体用ガラス基板。   The glass substrate for a magnetic recording medium according to claim 3, wherein the radius of curvature is 0.20 to 0.35 mm. 前記面取り面と前記主表面とが成す角度が140〜155°であることを特徴とする請求項1乃至4のいずれか1項に記載の磁気記録媒体用ガラス基板。   5. The glass substrate for a magnetic recording medium according to claim 1, wherein an angle formed by the chamfered surface and the main surface is 140 to 155 °. 破壊応力に基づいて算出したワイブル定数が20.0以上であることを特徴とする請求項1乃至5のいずれか1項に記載の磁気記録媒体用ガラス基板。   6. The glass substrate for a magnetic recording medium according to claim 1, wherein the Weibull constant calculated based on the breaking stress is 20.0 or more. ガラス基板の表面層中のアルカリ成分をイオン半径がより大きいものに置き換える化学強化処理が施されていることを特徴とする請求項1乃至6のいずれか1項に記載の磁気記録媒体用ガラス基板。   7. The glass substrate for a magnetic recording medium according to claim 1, wherein a chemical strengthening treatment is performed to replace an alkali component in a surface layer of the glass substrate with a material having a larger ionic radius. . 主表面、外周端面及び内周端面を有するドーナツ状の磁気記録媒体用ガラス基板の製造方法において、
前記主表面と前記外周端面及び内周端面の一方との間の角部に面取り加工を施して、請求項1乃至6のいずれか1項に記載の磁気記録媒体用ガラス基板を形成する面取り加工工程を有することを特徴とする磁気記録媒体用ガラス基板の製造方法。
In the method for manufacturing a glass substrate for a donut-shaped magnetic recording medium having a main surface, an outer peripheral end surface and an inner peripheral end surface,
A chamfering process for forming a glass substrate for a magnetic recording medium according to any one of claims 1 to 6, wherein a chamfering process is performed on a corner portion between the main surface and one of the outer peripheral end surface and the inner peripheral end surface. A method for producing a glass substrate for a magnetic recording medium, comprising a step.
前記面取り加工工程後、前記主表面を5μm以上研磨する主表面研磨工程と、前記外周端面及び前記内周端面を5μm以上研磨する端面研磨工程とを有することを特徴とする請求項8記載の磁気記録媒体用ガラス基板の製造方法。   9. The magnetism according to claim 8, further comprising a main surface polishing step for polishing the main surface by 5 μm or more after the chamfering step, and an end surface polishing step for polishing the outer peripheral end surface and the inner peripheral end surface by 5 μm or more. A method for producing a glass substrate for a recording medium. 前記ガラス基板は、母ガラスがアルカリ酸化物成分としてLiO及びNaOのいずれか一方を含有するシリケートガラスから成り、前記製造方法は、前記主表面研磨工程後、前記主表面の表面層のアルカリ成分を前記アルカリ酸化物成分より大きなイオン半径を有するアルカリ成分に置換する化学強化処理工程を有することを特徴とする請求項9記載の磁気記録媒体用ガラス基板の製造方法。 The glass substrate is made of silicate glass in which a mother glass contains either Li 2 O or Na 2 O as an alkali oxide component, and the manufacturing method includes a surface layer of the main surface after the main surface polishing step. The method for producing a glass substrate for a magnetic recording medium according to claim 9, further comprising a chemical strengthening treatment step of substituting the alkali component of the component with an alkali component having an ionic radius larger than that of the alkali oxide component.
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