JPH11265506A - Glass substrate for magnetic disk and magnetic disk - Google Patents

Glass substrate for magnetic disk and magnetic disk

Info

Publication number
JPH11265506A
JPH11265506A JP6705398A JP6705398A JPH11265506A JP H11265506 A JPH11265506 A JP H11265506A JP 6705398 A JP6705398 A JP 6705398A JP 6705398 A JP6705398 A JP 6705398A JP H11265506 A JPH11265506 A JP H11265506A
Authority
JP
Japan
Prior art keywords
glass substrate
face
magnetic disk
disk
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP6705398A
Other languages
Japanese (ja)
Inventor
Kazufumi Nakano
和史 中野
Naoko Sakae
直子 坂榮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Techno Glass Co Ltd
Original Assignee
Asahi Techno Glass Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Techno Glass Corp filed Critical Asahi Techno Glass Corp
Priority to JP6705398A priority Critical patent/JPH11265506A/en
Publication of JPH11265506A publication Critical patent/JPH11265506A/en
Withdrawn legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent a dust evolution due to fine breakings of the end face of a glass substrate by chamfering end parts of the inner periphery and the outer periphery of the substrate and stipulating the angle formed by this end face and the chamfered surface to be within a prescribed range. SOLUTION: The width (a) of a disk end face is made to be equal to or larger than 0.05 mm and to be equal to or smaller than 0.35 mm. When the width (a) is smaller than 0.05 mm, a frequency in which the end face is breaked is increased by the concentration of stresses at the time of a contact with a jig because the width of the disk end face is small. Moreover, when the width (a) exceeds 0.35 mm, since the width (a) becomes wide, a contact area with the jig is increased and a dust evolution from the disk end face is increased. Moreover, the angle θ formed by the disk surface of the disk substrate and the chamfered surface of the end face is made to be equal to or larger than 48 deg. and to be equal to or smaller than 80 deg.. When the angle θ is smaller than 48 deg., since the angle between the end face and the chamfered surface is too sharp, an dust evolution from the part is not a few. Furthermore, when the angle θ exceeds 80 deg. since the effect of the chamferring is lessened in itself, the preventing of an dust evolution from the disk end face becomes impossible.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ハードディスクな
どに用いられる磁気ディスク用ガラス基板に関する。さ
らに詳しくはMRヘッドやGMRヘッドを用いた高密度
記録に適する磁気ディスク用ガラス基板に関する。
The present invention relates to a glass substrate for a magnetic disk used for a hard disk or the like. More specifically, the present invention relates to a glass substrate for a magnetic disk suitable for high-density recording using an MR head or a GMR head.

【0002】[0002]

【従来の技術】磁気記録用の基板として、従来はアルミ
ニウム基板が多く用いられてきたか、近年では磁気ディ
スクの小形化、薄板化に伴い、平滑性が得やすく薄板化
が可能なガラス基板を用いる割合が多くなっている。磁
気ディスク基板に用いられるガラス材料は、母材として
機械的強度の得られる強化ガラスや結晶化ガラスを用い
るのが一般的である。磁気ディスク用ガラス基板はこれ
らの母材を加工して研磨し、平滑な表面を作り上げたも
のである。
2. Description of the Related Art As a substrate for magnetic recording, an aluminum substrate has been conventionally used in many cases. In recent years, a glass substrate which can easily obtain a smoothness and can be made thinner is used as a magnetic disk becomes smaller and thinner. The percentage is increasing. As a glass material used for a magnetic disk substrate, it is common to use tempered glass or crystallized glass having a high mechanical strength as a base material. The magnetic disk glass substrate is obtained by processing and polishing these base materials to form a smooth surface.

【0003】磁気ディスク用ガラス基板は平坦であり、
かつ平滑であることはもとより、塵埃などの付着物のな
いことが必要条件となっている。最近ではMRヘッドや
GMRヘッドが採用されるようになって、その必要性は
ますます高まっており、僅かな発塵でさえ問題になって
いる。
The glass substrate for a magnetic disk is flat,
In addition to being smooth, it is a necessary condition that there is no attached matter such as dust. Recently, with the adoption of MR heads and GMR heads, the necessity thereof has been increasing, and even a small amount of dust has become a problem.

【0004】このため、磁気ディスク用ガラス基板から
十分に塵埃を除く努力がなされたが、完全に除くことが
できないという問題が発生した。その原因について追及
を行った結果、ガラス基板自体から発塵しており、この
塵埃がガラス基板面に付着していることが判明した。さ
らにガラス基板からの発塵を調べたところ、主として端
面が擦れて微小な欠けを生じ、発塵していることが判明
した。
For this reason, efforts have been made to sufficiently remove dust from the glass substrate for a magnetic disk, but there has been a problem that the dust cannot be completely removed. As a result of investigating the cause, it was found that dust was generated from the glass substrate itself, and that the dust adhered to the glass substrate surface. Further, when the dust generation from the glass substrate was examined, it was found that the end face was mainly rubbed, and minute chips were generated, and dust was generated.

【0005】ところで、ガラス基板の輸送や、収納ケー
スからの出し入れの際に、端面が擦れて微小な欠けを生
じ、発塵をすることがあるとして、端面をエッチング処
理をしてこれを防ぐ方法が提案されている(特開平9−
124323)。しかしながら、端面をエッチング処理
するだけでは、高密度記録で問題となる微小の発塵まで
を防ぐには十分ではない。
[0005] By the way, when the glass substrate is transported, or when the glass substrate is taken in and out of the storage case, the end surface is rubbed to cause minute chipping and dust may be generated. Has been proposed (Japanese Patent Laid-Open No.
124323). However, merely etching the end face is not enough to prevent even minute dust generation which is a problem in high-density recording.

【0006】実際、ガラス基板にスパッタリングによっ
て磁性膜を形成する場合に、磁性膜に微小な欠陥が発生
し、この微小な欠陥が上記高密度記録では問題となるこ
とがわかった。調査の結果、ガラス端面の微小な欠けが
基板面に付着することが原因となることが判明した。そ
してこれはガラス基板に磁性膜をスパッタリングする際
に治具とガラス基板端面とが接触して微小な欠けを発生
し、これが基板面に付着することがわかった。
Actually, it has been found that when a magnetic film is formed on a glass substrate by sputtering, minute defects occur in the magnetic film, and these minute defects cause a problem in the high-density recording. As a result of the investigation, it was found that the minute chipping on the glass end face was caused by adhesion to the substrate surface. Then, it was found that when the magnetic film was sputtered on the glass substrate, the jig and the end face of the glass substrate were brought into contact with each other to generate minute chips, which adhered to the substrate surface.

【0007】この場合、微小な欠けの発生はスパッタリ
ング前にガラス基板をよく洗浄しても発生するものであ
り、スパッタリングの後によく洗浄して欠けを除去でき
たとしても、微小な欠けの付着していた部分は磁性膜の
ない欠陥部分となってしまうものである。しかもスパッ
タリング工程は磁気ディスク媒体製造の最終工程に近い
ので、そこでの不良の発生による歩留まり低下は磁気デ
ィスク媒体の製造コストを大幅に高めてしまう。
In this case, minute chips are generated even if the glass substrate is thoroughly washed before sputtering. Even if the chips can be removed by washing well after sputtering, the minute chips are not adhered. The portion which has been turned into a defective portion without a magnetic film. In addition, since the sputtering process is close to the final process of manufacturing the magnetic disk medium, a decrease in the yield due to the occurrence of the defect significantly increases the manufacturing cost of the magnetic disk medium.

【0008】従って、高密度記録用磁気ディスクに用い
るガラス基板において、端面の微細な欠けによる発塵を
防止することによって、欠陥の発生を防止し、磁気ディ
スク製造歩留まりを向上させること、そしてそのような
ガラス基板を用いることより、欠陥の少ない磁気ディス
クの製造を可能にすることが強く望まれている。
Accordingly, in a glass substrate used for a magnetic disk for high-density recording, dust is prevented from being generated due to minute chipping of an end face, thereby preventing generation of defects and improving the yield of magnetic disk production. It is strongly desired that a magnetic disk with few defects can be manufactured by using a simple glass substrate.

【0009】[0009]

【発明が解決しようとする課題】本発明はこのような問
題点を解決するためになされたもので、ガラス基板の端
面の微細な欠けによる発塵を防止することにより、欠陥
の発生が少なく、磁気ディスクの製造歩留まりの向上が
可能なガラス基板、および欠陥の少ない磁気ディスクを
提供することを目的としている。
SUMMARY OF THE INVENTION The present invention has been made in order to solve such a problem, and it is possible to prevent the generation of dust due to minute chipping of the end face of a glass substrate, thereby reducing the occurrence of defects. It is an object of the present invention to provide a glass substrate capable of improving the production yield of a magnetic disk and a magnetic disk with few defects.

【0010】[0010]

【課題を解決するための手段】本発明に係る磁気デスク
用ガラス基板は、ガラス組成物からなるガラス基板にお
いて、前記ガラス基板の内周または外周の端部が面取り
されており、前記内周または外周の端面の幅が0.05
mm以上、0.35mm以下であり、かつ、基板の板面
に対する端部の面取り面とのなす角度が48°以上80
°以下であることを特徴としている。また本発明に係る
磁気デスク用ガラス基板は、上記ガラス基板の内周部ま
たは外周部の端面が研磨加工の後、化学強化処理をされ
てなることを特徴としている。さらに本発明に係る磁気
デスクは、上記磁気ディスク基板に磁気記録層を設けて
なることを特徴としている。 本発明で用いるガラス基
板の母材となるガラス材料は、ガラス基板として必要な
平坦性、平滑性、高硬度、耐蝕性および耐熱性が得ら
れ、本発明の端部形状が形成できるガラス材料であれ
ば、特に制限されるものではない。そのようなガラス材
料として、例えばアルミノシリケートガラス、アルミノ
ボロシリケートガラス、ボロシリケートガラス、ソーダ
アルミノシリケートガラス、石英ガラス、ソーダ石灰ガ
ラス、などを挙げることができる。中でも結晶化ガラス
やイオン交換によって化学強化のできるガラス材料が高
強度が得られるので好ましい。化学強化のできるガラス
材料としては、アルミノシリケートガラスが軟化点が高
い上に化学強化の効果が顕著であるため特に好ましい。
According to the present invention, there is provided a glass substrate for a magnetic desk according to the present invention, wherein an inner or outer edge of the glass substrate is chamfered. Outer end face width is 0.05
mm or more and 0.35 mm or less, and the angle formed by the chamfered surface of the edge with respect to the plate surface of the substrate is 48 ° or more and 80 ° or more.
° or less. Further, the glass substrate for a magnetic desk according to the present invention is characterized in that an end surface of an inner peripheral portion or an outer peripheral portion of the glass substrate is subjected to a chemical strengthening treatment after polishing. Further, a magnetic desk according to the present invention is characterized in that a magnetic recording layer is provided on the magnetic disk substrate. The glass material used as the base material of the glass substrate used in the present invention is a glass material which can obtain the flatness, smoothness, high hardness, corrosion resistance and heat resistance required for the glass substrate and can form the end shape of the present invention. If there is, there is no particular limitation. Examples of such a glass material include aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, sodaaluminosilicate glass, quartz glass, soda-lime glass, and the like. Among them, crystallized glass and a glass material that can be chemically strengthened by ion exchange are preferable because high strength can be obtained. As a glass material that can be chemically strengthened, aluminosilicate glass is particularly preferable because it has a high softening point and a remarkable effect of chemical strengthening.

【0011】本発明のガラス基板および磁気ディスクの
製造方法は特に制限されるものではなく、例えば次のよ
うな工程によって製造することができる。
The method for producing the glass substrate and the magnetic disk of the present invention is not particularly limited, and can be produced, for example, by the following steps.

【0012】まず、上記ガラス母材をプレス成型や板成
型などを行ぃ、さらにダイヤモンド加工を行ってドーナ
ツ円板状にする。次に上下面のラッピングを行って、円
板の厚みが規定の範囲内に入るようにするとともに基板
の上下面の平行度を出す。
First, the above glass base material is subjected to press molding, plate molding, and the like, and is further subjected to diamond processing to form a donut disk shape. Next, lapping of the upper and lower surfaces is performed so that the thickness of the disk falls within a specified range, and the parallelism of the upper and lower surfaces of the substrate is obtained.

【0013】次に内周と外周の加工を行う。まず内周外
周の研削とラッピングを行い、次いで内周または外周の
端部の面取り加工を行う。
Next, the inner circumference and the outer circumference are processed. First, grinding and lapping of the inner periphery and outer periphery are performed, and then chamfering of the inner periphery or the outer periphery is performed.

【0014】その後上下面のポリッシングおよび必要に
応じ内周と外周のポリッシングを行って面仕上げを行
う。そして母材のガラスが化学強化用ガラスの場合に
は、溶融塩中に浸漬してイオン交換を行う化学強化処理
を行う。
Thereafter, the upper and lower surfaces and, if necessary, the inner and outer periphery are polished to finish the surface. When the glass of the base material is a glass for chemical strengthening, a chemical strengthening treatment of immersing in a molten salt and performing ion exchange is performed.

【0015】本発明において用いられる化学強化処理方
法は特に制限されるものではないが、比較的低温でイオ
ン交換か可能な方法が好ましく用いられる。そして化学
強化に用いるアルカリ溶融塩としては、硝酸カリウム、
硝酸ナトリウムあるいはこれら混合硝酸塩が好ましく用
いられる。
The chemical strengthening treatment method used in the present invention is not particularly limited, but a method capable of performing ion exchange at a relatively low temperature is preferably used. And as the alkali molten salt used for chemical strengthening, potassium nitrate,
Sodium nitrate or a mixed nitrate thereof is preferably used.

【0016】本発明の磁気ディスクは上記処理のなされ
たガラス基板上に下地層、磁性層、保護層および必要に
応じて潤滑層を順次積層して製造する。下地層としては
Cr、Mo、TiTa、W、Alなどの金属や、それら
金属の組み合わせが用いられる。磁性層としては、Co
を主成分とする合金であるCoPtCr、CoCrT
a、CoNiCrTaなどが挙げられる。保護膜として
はC(炭素)膜のほか、SiO2 、ZrO2 、Crまた
はCr合金膜などが挙げられる。潤滑層としては必要に
応じてパーフロロポリエーテル、テトラアルコキシシラ
ンなどの潤滑剤を用いることができる。
The magnetic disk of the present invention is manufactured by sequentially laminating an underlayer, a magnetic layer, a protective layer and, if necessary, a lubricating layer on a glass substrate which has been subjected to the above processing. As the underlayer, a metal such as Cr, Mo, TiTa, W, or Al, or a combination of these metals is used. For the magnetic layer, Co
CoPtCr, CoCrT, which are alloys mainly composed of
a, CoNiCrTa and the like. Examples of the protective film include a C (carbon) film, a SiO 2 , ZrO 2 , Cr, or Cr alloy film. As the lubricating layer, a lubricant such as perfluoropolyether or tetraalkoxysilane can be used as needed.

【0017】本発明に係るディスク端部の模式的断面図
を図1に示す。図において、ディスク端面の幅aは0.
05mm以上、0.35mm以下である。ディスク端面
の幅aが0.05mm未満であると、ディスク端面の幅
が小さいため、治具との接触の際に応力の集中によって
端面の欠ける頻度が増加する。そして磁気ディスク装置
の組み立てにおいては、スピンドルへの固定のためのチ
ャッキング面積が少なくなるため、固定応力によって基
板が反り易くなる。またディスク端面の幅aが0.05
mmを超えると、ディスク端面の幅が広くなるため、治
具との接触面積が増し、この場合にもディスク端面から
の発塵が増す。ディスク端面の幅aは、0.1mm以
上、0.3mm以下であると、さらに好ましい。
FIG. 1 is a schematic sectional view of a disk end according to the present invention. In the drawing, the width a of the disk end face is 0.
It is not less than 05 mm and not more than 0.35 mm. If the width a of the disk end surface is less than 0.05 mm, the width of the disk end surface is small, and the frequency of chipping of the end surface increases due to concentration of stress when the disk comes into contact with the jig. In assembling the magnetic disk drive, the chucking area for fixing to the spindle is reduced, so that the substrate is easily warped due to the fixing stress. The width a of the disk end face is 0.05
If it exceeds mm, the width of the end face of the disk is increased, so that the contact area with the jig is increased. In this case as well, dust generation from the end face of the disk is increased. More preferably, the width a of the disk end face is 0.1 mm or more and 0.3 mm or less.

【0018】また図1において、本発明に係るディスク
の基板の板面に対する端部の面取り面とのなす角度θは
48°以上80°以下である。θが48°未満では端面
と面取り面との角度が鋭いために、その部分からの発塵
が少なくない。そして基板の記録面の面積に対し、面取
り部分の比率も無視できなくなる。また、θが80°を
超えると面取りの効果そのものが少なくなってしまい、
従ってディスク端部からの発塵が防止できなくなる。デ
ィスクの基板の板面に対する端部の面取り面とのなす角
度θは50°以上75°以下であると、さらに好まし
い。
In FIG. 1, the angle .theta. Formed by the chamfered surface of the end of the disk substrate according to the present invention with respect to the plate surface is not less than 48.degree. If θ is less than 48 °, the angle between the end surface and the chamfered surface is sharp, so that dust generation from that portion is not small. The ratio of the chamfered portion to the area of the recording surface of the substrate cannot be ignored. Also, if θ exceeds 80 °, the effect of chamfering itself decreases,
Therefore, dust generation from the end of the disk cannot be prevented. It is more preferable that the angle θ formed by the chamfered surface of the end portion with respect to the plate surface of the disk substrate is 50 ° or more and 75 ° or less.

【0019】上述の本願発明に係る面取りは、内周端部
および外周端部について行うことが好ましいが、治具が
接触するいずれかの部分だけについて行っても効果のあ
るものである。
The above-described chamfering according to the present invention is preferably performed on the inner peripheral end portion and the outer peripheral end portion. However, it is also effective to perform the chamfering only on any part where the jig contacts.

【0020】次に本発明の作用について述べる。Next, the operation of the present invention will be described.

【0021】本発明によれば、ガラス基板端部の微小な
欠けが防止されるので、工程時の発塵が低減する。その
結果、本発明の基板を用いることにより、製造された磁
気ディスクの欠陥の低減が得られる。その際、ガラス基
板の内周および外周は研磨加工を行った後、化学強化処
理することにより、内周および外周面における欠け落ち
易い面の凹凸が除かれるとともに面強度が改善されるた
め、端部の欠けによる発塵の防止がより確実になる。
According to the present invention, minute chipping at the edge of the glass substrate is prevented, so that dust generation during the process is reduced. As a result, by using the substrate of the present invention, the defects of the manufactured magnetic disk can be reduced. At this time, the inner and outer circumferences of the glass substrate are polished and then subjected to chemical strengthening treatment, thereby removing irregularities on the inner and outer peripheral surfaces, which are easily chipped, and improving the surface strength. Prevention of dust generation due to chipping of the part becomes more reliable.

【0022】[0022]

【発明の実施の形態】以下、実施例に基づいて本発明の
発明の実施の形態を具体的に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The embodiments of the present invention will be specifically described below based on examples.

【0023】(実施例1)ガラス組成として、Si
2 :65重量%、Al2 3 :14重量%、Li
2O:6重量%、Na2 O:11重量%、ZrO2 :4
重量%のアルミノシリケートガラスを直径68mm、厚
さ1.8mmにプレス加工したものを母材とした。次に
粗いダイアモンド砥石を用いて上下面の研削を行い、厚
さを1.0mmにした。次いでスピードファム社製16
B研磨機を用いて、#500の炭化ケイ素を研磨剤とし
て上下面のラッピング加工を行った。
(Example 1) As a glass composition, Si was used.
O 2 : 65% by weight, Al 2 O 3 : 14% by weight, Li
2 O: 6% by weight, Na 2 O: 11% by weight, ZrO 2 : 4
A weight-% aluminosilicate glass pressed to a diameter of 68 mm and a thickness of 1.8 mm was used as a base material. Next, the upper and lower surfaces were ground using a rough diamond grindstone to a thickness of 1.0 mm. Next, Speed Fam 16
Using a polishing machine B, lapping of the upper and lower surfaces was performed using # 500 silicon carbide as an abrasive.

【0024】次に内周の下穴をあけ、内外周加工機を用
いて、内周面および外周面の加工を行った。そのあと内
周および外周の端部の面取り加工を行い、端部の形状を
a=0.3mm、面取り角θ=52°とした。
Next, a prepared hole was formed on the inner periphery, and the inner and outer peripheral surfaces were machined using an inner and outer peripheral processing machine. Thereafter, the inner and outer peripheral edges were chamfered, and the shape of the edge was a = 0.3 mm and the chamfer angle θ = 52 °.

【0025】次いで#1000のアルミナ砥粒で上下面
および内周、外周に対して研磨処理を行った。引き続い
て上下面の一次研磨を研磨材に酸化セリウムを用い、ポ
リッシャにポリウレタンパッド(ロデールニッタ社製M
HC14B)を用いて行った。さらにMRヘッドやGM
Rヘッド走行に適する平滑度を得るために、研磨材に酸
化セリウムを用い、ポリッシャーに発泡ポリウレタンパ
ッド(ロデールニッタ社製ポリテックス)を用いて二次
研磨を行い、表面粗さ0.35μm、平面度1.5μm
を得た。なお、表面粗さは原子間力顕微鏡(AFM)で
測定し、平面度はレーザ干渉計による測定値である。
Next, the upper and lower surfaces, the inner periphery, and the outer periphery were polished with # 1000 alumina abrasive grains. Subsequently, primary polishing of the upper and lower surfaces was performed using cerium oxide as an abrasive, and a polyurethane pad (Rodelnitta M) as a polisher.
HC14B). MR head and GM
In order to obtain a smoothness suitable for R head running, secondary polishing is performed using cerium oxide as an abrasive and a foamed polyurethane pad (Polytex manufactured by Rodel Nitta) as a polisher to obtain a surface roughness of 0.35 μm and flatness. 1.5 μm
I got The surface roughness is measured by an atomic force microscope (AFM), and the flatness is a value measured by a laser interferometer.

【0026】このあと上記研磨加工を行ったガラス基板
を予熱し、硝酸カリウム60%と硝酸ナトリウム40%
の400℃混合融液に4時間浸漬することによる化学強
化処理を行った後、精密洗浄を行った。
Thereafter, the polished glass substrate is preheated, and potassium nitrate 60% and sodium nitrate 40%
After performing chemical strengthening treatment by immersing in a 400 ° C. mixed melt for 4 hours, precision cleaning was performed.

【0027】こうして得られたガラス基板を基板ケース
に収納し、振動篩にかけて15分間振動させた後、基板
表面を検査したところ、異物の付着は認められなかっ
た。
The glass substrate thus obtained was placed in a substrate case, and the glass substrate was vibrated through a vibrating sieve for 15 minutes. After that, the surface of the substrate was inspected.

【0028】さらに上述の工程で得られたガラス基板の
両面にCr下地層、CoPtCr磁性層、炭素保護層を
順次積層して磁気ディスクを得た。この工程でガラス基
板にスパッタリングを行う際の治具への着脱を3回繰り
返してから工程を進めたところ、得られた磁気ディスク
には欠陥が認められなかった。
Further, a Cr underlayer, a CoPtCr magnetic layer, and a carbon protective layer were sequentially laminated on both surfaces of the glass substrate obtained in the above-described process, to obtain a magnetic disk. In this step, when the process was carried out after repeating the attachment and detachment to and from the jig when performing sputtering on the glass substrate three times, no defect was found in the obtained magnetic disk.

【0029】(比較例1)実施例1において、面取り後
の端面の幅aを0.03、面取り角θを60°としたほ
かは、実施例1と同じ工程にてガラス基板を作成し、さ
らにこの基板に下地層、磁性層、保護層および潤滑層を
順次積層して磁気ディスクを作製した。作製されたガラ
ス基板に対し、実施例1と同じ条件で振動試験を行った
ところ、基板表面に異物の付着が認められた。また、実
施例1と同じ条件でスパッタリングを行う際の治具への
着脱試験を行ったところ、得られた磁気ディスクには欠
陥が認められた。調査の結果、原因はいずれも端部先端
に微小な欠けを発生し、発塵したことによるものと判明
した。
Comparative Example 1 A glass substrate was prepared in the same process as in Example 1, except that the width a of the end face after chamfering was set to 0.03 and the chamfer angle θ was set to 60 °. Further, an underlayer, a magnetic layer, a protective layer, and a lubricating layer were sequentially laminated on this substrate to produce a magnetic disk. When a vibration test was performed on the manufactured glass substrate under the same conditions as in Example 1, foreign substances were found to adhere to the substrate surface. In addition, when a test for attachment and detachment to and from a jig was performed when sputtering was performed under the same conditions as in Example 1, defects were found in the obtained magnetic disk. As a result of the investigation, it was found that all of the causes were due to the generation of fine chips at the tip of the end portion and the generation of dust.

【0030】(比較例2)実施例1において、面取り後
の端面の幅aを0.40、面取り角θを60°としたほ
かは、実施例1と同じ工程にてガラス基板を作成し、さ
らにこの基板に下地層、磁性層、保護層および潤滑層を
順次積層して磁気ディスクを作製した。作製されたガラ
ス基板に対し、実施例1と同じ条件で振動試験を行った
ところ、基板表面に異物の付着が認められた。また、実
施例1と同じ条件でスパッタリングを行う際の治具への
着脱試験を行ったところ、得られた磁気ディスクには欠
陥が認められた。調査の結果、原因はいずれも端面に微
小な欠けを発生し、発塵したことによるものと判明し
た。
Comparative Example 2 A glass substrate was prepared in the same process as in Example 1 except that the width a of the end face after chamfering was 0.40 and the chamfer angle θ was 60 °. Further, an underlayer, a magnetic layer, a protective layer, and a lubricating layer were sequentially laminated on this substrate to produce a magnetic disk. When a vibration test was performed on the manufactured glass substrate under the same conditions as in Example 1, foreign substances were found to adhere to the substrate surface. In addition, when a test for attachment and detachment to and from a jig was performed when sputtering was performed under the same conditions as in Example 1, defects were found in the obtained magnetic disk. As a result of the investigation, it was found that all of the causes were caused by minute chipping on the end face and dust generation.

【0031】(比較例3)実施例1において、面取り後
の端面の幅aを0.25、面取り角θを30°としたほ
かは、実施例1と同じ工程にてガラス基板を作成し、さ
らにこの基板に下地層、磁性層、保護層および潤滑層を
順次積層して磁気ディスクを作製した。作製されたガラ
ス基板に対し、実施例1と同じ条件で振動試験を行った
ところ、基板表面に異物の付着が認められた。また、実
施例1と同じ条件でスパッタリングを行う際の治具への
着脱振動試験を行ったところ、得られた磁気ディスクに
は欠陥が認められた。調査の結果、原因はいずれも端面
と面取り面とのエッジ部に微小な欠けを発生し、発塵し
たことによるものと判明した。
Comparative Example 3 A glass substrate was prepared in the same process as in Example 1, except that the width a of the end face after chamfering was 0.25 and the chamfer angle θ was 30 °. Further, an underlayer, a magnetic layer, a protective layer, and a lubricating layer were sequentially laminated on this substrate to produce a magnetic disk. When a vibration test was performed on the manufactured glass substrate under the same conditions as in Example 1, foreign substances were found to adhere to the substrate surface. In addition, when a vibration test for attaching and detaching the jig when performing sputtering under the same conditions as in Example 1 was performed, a defect was recognized in the obtained magnetic disk. As a result of the investigation, it was found that all of the causes were due to generation of fine chips at the edges between the end face and the chamfered face, and generation of dust.

【0032】(比較例4)実施例1において、面取り後
の端面の幅aを0.25、面取り角θを85°としたほ
かは、実施例1と同じ工程にてガラス基板を作成し、さ
らにこの基板に下地層、磁性層、保護層および潤滑層を
順次積層して磁気ディスクを作製した。作製されたガラ
ス基板に対し、実施例1と同じ条件で振動試験を行った
ところ、基板表面に異物の付着が認められた。また、実
施例1と同じ条件でスパッタリングを行う際の治具への
着脱振動試験を行ったところ、得られた磁気ディスクに
は欠陥が認められた。調査の結果、原因はいずれも上下
面と面取り面とのエッジ部に微小な欠けを発生し、発塵
したことによるものと判明した。
Comparative Example 4 A glass substrate was prepared in the same process as in Example 1 except that the width a of the end face after chamfering was 0.25 and the chamfer angle θ was 85 °. Further, an underlayer, a magnetic layer, a protective layer, and a lubricating layer were sequentially laminated on this substrate to produce a magnetic disk. When a vibration test was performed on the manufactured glass substrate under the same conditions as in Example 1, foreign substances were found to adhere to the substrate surface. In addition, when a vibration test for attaching and detaching the jig when performing sputtering under the same conditions as in Example 1 was performed, a defect was recognized in the obtained magnetic disk. As a result of the investigation, it was found that all of the causes were due to the generation of fine chips at the edges of the upper and lower surfaces and the chamfered surfaces.

【0033】[0033]

【発明の効果】以上に詳述したように、本発明によれ
ば、ガラス基板の端面の微細な欠けによる発塵を防止す
ることができるので、欠陥の発生が少なく磁気ディスク
製造歩留まりの向上が得られる磁気ディスク用ガラス基
板が提供でき、さらにこのガラス基板を用いて磁気ディ
スクを製造することにより、磁気ディスクの欠陥の低減
が得られる。
As described in detail above, according to the present invention, dust generation due to minute chipping of the end surface of the glass substrate can be prevented, so that the occurrence of defects is small and the production yield of the magnetic disk is improved. The obtained glass substrate for a magnetic disk can be provided. Further, by manufacturing a magnetic disk using this glass substrate, defects of the magnetic disk can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のガラス基板の端部の形状を示す模式的
断面図
FIG. 1 is a schematic cross-sectional view showing the shape of an end of a glass substrate of the present invention.

【符号の説明】[Explanation of symbols]

1……ガラス基板、 2……端面、 3……面取り部、
4……ガラス基板上面、 5……ガラス基板下面、
1 ... glass substrate, 2 ... end face, 3 ... chamfered part,
4 ... upper surface of glass substrate 5 ... lower surface of glass substrate

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ガラス組成物からなる磁気ディスク用ガ
ラス基板において、前記ガラス基板の内周または外周の
端部が面取りされており、前記内周または外周の端面の
幅が0.05mm以上0.35mm以下であり、かつ、
基板の板面に対する端部の面取り面とのなす角度が48
°以上80°以下であることを特徴とするガラス基板。
1. A glass substrate for a magnetic disk comprising a glass composition, wherein the inner or outer edge of the glass substrate is chamfered, and the width of the inner or outer edge is 0.05 mm or more. 35 mm or less, and
The angle between the edge and the chamfered surface with respect to the plate surface of the substrate is 48.
A glass substrate characterized by being at least 80 ° and at most 80 °.
【請求項2】 前記ガラス組成物からなるガラス基板の
内周部または外周部の端面が研磨加工の後、化学強化処
理をされてなることを特徴とする請求項1記載の磁気デ
ィスク用ガラス基板。
2. The glass substrate for a magnetic disk according to claim 1, wherein an end surface of an inner peripheral portion or an outer peripheral portion of the glass substrate made of the glass composition is subjected to a chemical strengthening process after polishing. .
【請求項3】 請求項1または請求項2記載の磁気ディ
スク用ガラス基板に磁気記録層を設けたことを特徴とす
る磁気ディスク。
3. A magnetic disk, wherein a magnetic recording layer is provided on the glass substrate for a magnetic disk according to claim 1.
JP6705398A 1998-03-17 1998-03-17 Glass substrate for magnetic disk and magnetic disk Withdrawn JPH11265506A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6705398A JPH11265506A (en) 1998-03-17 1998-03-17 Glass substrate for magnetic disk and magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6705398A JPH11265506A (en) 1998-03-17 1998-03-17 Glass substrate for magnetic disk and magnetic disk

Publications (1)

Publication Number Publication Date
JPH11265506A true JPH11265506A (en) 1999-09-28

Family

ID=13333721

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6705398A Withdrawn JPH11265506A (en) 1998-03-17 1998-03-17 Glass substrate for magnetic disk and magnetic disk

Country Status (1)

Country Link
JP (1) JPH11265506A (en)

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US6808784B2 (en) * 2001-05-14 2004-10-26 Hoya Corporation Glass substrate for magnetic recording media and manufacturing method thereof
US7083376B2 (en) 2002-10-10 2006-08-01 Maxtor Corporation Automated merge nest for pairs of magnetic storage disks
US7083502B2 (en) 2002-10-10 2006-08-01 Maxtor Corporation Method for simultaneous two-disk texturing
US7180709B2 (en) * 2002-05-09 2007-02-20 Maxtor Corporation Information-storage media with dissimilar outer diameter and/or inner diameter chamfer designs on two sides
JP2008282539A (en) * 2008-08-25 2008-11-20 Hoya Corp Glass substrate for magnetic recording medium, and its manufacturing method
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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6808784B2 (en) * 2001-05-14 2004-10-26 Hoya Corporation Glass substrate for magnetic recording media and manufacturing method thereof
CN100351910C (en) * 2001-05-14 2007-11-28 Hoya株式会社 Glass substrate for magnetic record medium and method for making same
US7180709B2 (en) * 2002-05-09 2007-02-20 Maxtor Corporation Information-storage media with dissimilar outer diameter and/or inner diameter chamfer designs on two sides
US7083376B2 (en) 2002-10-10 2006-08-01 Maxtor Corporation Automated merge nest for pairs of magnetic storage disks
US7083502B2 (en) 2002-10-10 2006-08-01 Maxtor Corporation Method for simultaneous two-disk texturing
US7748532B2 (en) 2002-10-10 2010-07-06 Seagate Technology Llc Cassette for holding disks of different diameters
JP2008282539A (en) * 2008-08-25 2008-11-20 Hoya Corp Glass substrate for magnetic recording medium, and its manufacturing method
JP2009277347A (en) * 2009-08-19 2009-11-26 Hoya Corp Manufacturing method of glass substrate for information recording medium
JP2011108355A (en) * 2010-12-20 2011-06-02 Hoya Corp Glass substrate for magnetic recording medium and method of manufacturing the same
JP6020754B1 (en) * 2015-12-25 2016-11-02 旭硝子株式会社 Glass substrate for magnetic recording medium, magnetic recording medium
WO2017110109A1 (en) * 2015-12-25 2017-06-29 旭硝子株式会社 Glass substrate for magnetic recording medium and magnetic recording medium
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