JP2008277864A - Method for manufacturing electronic component - Google Patents

Method for manufacturing electronic component Download PDF

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JP2008277864A
JP2008277864A JP2008200972A JP2008200972A JP2008277864A JP 2008277864 A JP2008277864 A JP 2008277864A JP 2008200972 A JP2008200972 A JP 2008200972A JP 2008200972 A JP2008200972 A JP 2008200972A JP 2008277864 A JP2008277864 A JP 2008277864A
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insulating layer
electronic component
coil
conductor wiring
laminate
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JP4823278B2 (en
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Masahiro Yamamoto
昌裕 山本
Hiroshi Hayata
博 早田
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Panasonic Corp
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Panasonic Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electronic component, which can efficiently manufacture an electronic device, such as very small coil in which conductor wirings are hardly short-circuited each other, without entailing a large amount of time and work. <P>SOLUTION: The method includes the steps of winding or laminating a multilayer film 4 comprising a conductor wiring 2 and an insulating layer 3 so as to form a wound body 5 as a laminate; bonding the layers of the wound body 5; cutting the wound body 5 to be a predetermined thickness; etching a cutting surface of the wound body 5; after etching process, melting the insulating layer 3 which remains on the edge of the cutting surface, and covering the edge of the cutting surface of the electronic component with the insulating layer 3. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、電子部品の製造方法に関し、特に、小型かつ薄型の平面モータや、それらに使用されるコイルに適した電子部品の製造方法に関するものである。   The present invention relates to a method for manufacturing an electronic component, and more particularly to a method for manufacturing an electronic component suitable for a small and thin planar motor and a coil used for the same.

従来の平面モータとして、駆動用のコイルとマグネットとが対向されて配置され、電磁的な相互作用によってトルクを発生させる薄型の平面モータは既に知られている。この平面モータなどに使用されるコイルの製造方法は、例えば特許文献1〜3などに開示されているが、コイルの製造方法のひとつとして、絶縁層と導体層とからなるフィルムを巻き芯のまわりに巻回した後に所定の厚みに切断する方法がある。   As a conventional flat motor, a thin flat motor in which a driving coil and a magnet are arranged to face each other and torque is generated by electromagnetic interaction is already known. For example, Patent Documents 1 to 3 disclose a method for manufacturing a coil used in such a flat motor. As one of the coil manufacturing methods, a film made of an insulating layer and a conductor layer is wound around a winding core. There is a method of cutting to a predetermined thickness after winding.

以下、従来のコイルの製造方法について図6(a)〜(c)、(c’)を用いて説明する。図6(a)において、1は導電材料からなる巻き芯、2は導体配線、3は絶縁層である。導体配線2と絶縁層3とは接着されており、2層からなるフィルム4を形成している。巻き芯1は導電配線2と電気的導通を確保した上で接合され、テンションをかけながらフィルム4を巻き芯1に巻き付けることにより、図6(b)に示すような巻回体5を得る。次にこの巻回体5を所定の厚さに切断して図6(c)、(c’)に示すようなコイル6を得ていた。なお、切断の具体的方法としてはダイシングソー、ワイヤソー、放電加工等の方法が用いられてきた。
特開平10−303013号公報 特開平10−223427号公報 特開平10−341549号公報
A conventional coil manufacturing method will be described below with reference to FIGS. 6 (a) to 6 (c) and (c ′). In FIG. 6A, 1 is a winding core made of a conductive material, 2 is a conductor wiring, and 3 is an insulating layer. The conductor wiring 2 and the insulating layer 3 are bonded together to form a film 4 composed of two layers. The winding core 1 is joined to the conductive wiring 2 while ensuring electrical continuity, and the film 4 is wound around the winding core 1 while applying tension, thereby obtaining a wound body 5 as shown in FIG. Next, the wound body 5 was cut into a predetermined thickness to obtain a coil 6 as shown in FIGS. 6 (c) and 6 (c '). As a specific method of cutting, methods such as a dicing saw, a wire saw, and electric discharge machining have been used.
Japanese Patent Laid-Open No. 10-303013 JP-A-10-223427 Japanese Patent Laid-Open No. 10-341549

しかしながら、このような方法によって得られたコイル6は、図6(c)、(c’)に示すように、切断した状態で、一般的に、導体配線2の部分が外部に露出している。このため、図7(a)、(b)に示すように、このコイル6を基板上に接続するまでの工程、例えば、コイル6を吸着ノズル12により吸着してハンドリングするために載せ台13に一時的に押さえつけた際などに、コイル6の断面(切断工程で切断することで露出した外面部分)6aに、導電性を有する異物15が付着したり、コイル6の断面6a上に導電性を有する異物15が載って付着するなどしたりして、隣り合う導電配線2同士が接触し、層間ショート等の不良を生じる恐れがあった。   However, as shown in FIGS. 6C and 6C, the coil 6 obtained by such a method is generally cut out and the conductor wiring 2 is generally exposed to the outside. . For this reason, as shown in FIGS. 7A and 7B, the process until the coil 6 is connected to the substrate, for example, the coil 6 is attracted by the suction nozzle 12 to be handled on the platform 13. When temporarily pressed, for example, the conductive foreign material 15 adheres to the cross section 6a of the coil 6 (external surface exposed by cutting in the cutting process) 6a, or the cross section 6a of the coil 6 has conductivity. There is a possibility that the adjacent conductive wirings 2 may come into contact with each other due to the foreign matter 15 having the foreign matter 15 placed thereon, and cause a defect such as an interlayer short circuit.

これに対処する手法としては、コイル6の断面6aにおける導電配線2が露出している部分に、樹脂等の絶縁物の被膜を形成する工程を加えて、層間ショートを防止する対策がとられてきたが、実際には、導電材料からなる巻き芯1を電極として使用することが多いため、巻き芯1を避けるようにして絶縁物の皮膜を形成しなければならない。また、従来はコイル6の直径が数十mmから数mm程度の比較的大きなサイズであったが、近年、製品の小型化に伴って直径が1mm程度の微小なコイル6が必要となっており、さらに、高占積率の実現のために、層間の絶縁層3の厚みも薄くなっている。しかし、このような直径が5mm程度より小さい微小なコイル6では、絶縁物の皮膜を導体配線2および絶縁層3の外面部分だけに塗布することが困難であるため、多くの手間や時間がかかって生産性が低下するという問題があった。また、絶縁物の皮膜の供給装置自体を導体配線2に近づける必要があるため、この供給装置が導体配線2の外面に衝突してしまい、導体配線2同士がショートしたり、導体配線2の外面に供給装置に付着していた異物が付着したりするという課題もあった。   As a method for dealing with this, a measure for preventing an interlayer short circuit has been taken by adding a step of forming a coating film of an insulator such as a resin to a portion where the conductive wiring 2 is exposed in the cross section 6a of the coil 6. However, in practice, the winding core 1 made of a conductive material is often used as an electrode. Therefore, it is necessary to form an insulating film so as to avoid the winding core 1. Conventionally, the coil 6 has a relatively large diameter of several tens to several millimeters. However, in recent years, with the miniaturization of products, a minute coil 6 having a diameter of about 1 mm is required. Furthermore, in order to realize a high space factor, the thickness of the insulating layer 3 between layers is also reduced. However, in such a small coil 6 having a diameter smaller than about 5 mm, it is difficult to apply an insulating film only to the outer surface portions of the conductor wiring 2 and the insulating layer 3, so that much labor and time are required. As a result, productivity has been reduced. Further, since it is necessary to bring the insulating film supply device itself close to the conductor wiring 2, the supply device collides with the outer surface of the conductor wiring 2, and the conductor wirings 2 are short-circuited with each other, or the outer surface of the conductor wiring 2. In addition, there is a problem that foreign matter attached to the supply device adheres.

本発明は上記問題や課題を解決するもので、極めて小さいサイズであった場合でも導体配線同士が短絡し難いコイルなどの電子部品を、多くの手間や時間をかけることなく、能率的に製造することができる電子部品の製造方法を提供することを目的とするものである。   The present invention solves the above-mentioned problems and problems, and efficiently manufactures electronic parts such as coils that are difficult to short-circuit between conductor wirings even when the size is extremely small, without much time and effort. An object of the present invention is to provide a method for manufacturing an electronic component.

上記問題や課題を解決するために本発明の電子部品の製造方法は、少なくとも1層の導体層と少なくとも1層の絶縁層とからなる多層フィルムを巻回、あるいは積層して積層体を形成する工程と、積層体の層間を接着する工程と、積層体を所定厚みの形状に切断する工程と、積層体の切断面のエッチングを行う工程と、エッチング処理後に、切断面端面に残る絶縁層を溶解して電子部品の切断面端面を絶縁層で覆う工程とを有することを特徴とする。これにより、電子部品が極めて小さいサイズであった場合でも導体配線同士が短絡し難いコイルなどの電子部品を能率的に製造することができる。   In order to solve the above problems and problems, the electronic component manufacturing method of the present invention forms a laminate by winding or laminating a multilayer film comprising at least one conductor layer and at least one insulating layer. A step of bonding the layers of the laminate, a step of cutting the laminate into a shape having a predetermined thickness, a step of etching the cut surface of the laminate, and an insulating layer remaining on the end surface of the cut surface after the etching process And a step of melting and covering an end face of the cut surface of the electronic component with an insulating layer. As a result, even when the electronic component is extremely small in size, it is possible to efficiently manufacture an electronic component such as a coil in which the conductor wirings are not easily short-circuited.

また、本発明の電子部品の製造方法は、積層体の切断面のエッチングを行うことにより、絶縁層を導体配線よりも厚めに残る形状とすることを特徴とする。これにより、さらに生産能率が向上する。   In addition, the method for manufacturing an electronic component according to the present invention is characterized in that the insulating layer is formed to be thicker than the conductor wiring by etching the cut surface of the laminate. Thereby, the production efficiency is further improved.

本発明によれば、エッチング処理後に、切断面端面に残る絶縁層を溶解して電子部品の端面を絶縁層で覆うことで、電子部品が極めて小さい場合でも、電子部品の切断面端面を能率的に絶縁層材料で覆うことができ、これにより、電子部品が極めて小さいサイズであった場合でも導体配線同士が短絡し難いコイルなどの電子部品を能率的に製造することができる。   According to the present invention, after the etching process, the insulating layer remaining on the end surface of the cut surface is melted and the end surface of the electronic component is covered with the insulating layer. Thus, even when the electronic components are extremely small in size, it is possible to efficiently manufacture electronic components such as coils that are difficult to short-circuit the conductor wires.

また、電子部品を基板に実装する時の熱処理で、端面に残る絶縁層を溶解する工程をも一括して行うことで、さらに生産能率が向上する。   Further, the production efficiency is further improved by collectively performing the process of melting the insulating layer remaining on the end face by the heat treatment when mounting the electronic component on the substrate.

請求項1に記載の発明は、少なくとも1層の導体層と少なくとも1層の絶縁層とからなる多層フィルムを巻回、あるいは積層して積層体を形成する工程と、積層体の層間を接着する工程と、積層体を所定厚みの形状に切断する工程と、積層体の切断面のエッチングを行う工程と、エッチング処理後に、切断面端面に残る絶縁層を溶解して電子部品の切断面端面を絶縁層で覆う工程とを有することを特徴とする。   According to the first aspect of the invention, a step of winding or laminating a multilayer film comprising at least one conductor layer and at least one insulating layer to form a laminate, and bonding the layers of the laminate A step of cutting the laminate into a shape having a predetermined thickness, a step of etching the cut surface of the laminate, and after the etching process, the insulating layer remaining on the end surface of the cut surface is dissolved to cut the end surface of the electronic component. And a step of covering with an insulating layer.

この方法によれば、切断面端面に残る絶縁層を溶解して電子部品の端面を絶縁層で覆うので、電子部品の切断面端面を能率的に絶縁層材料で覆うことができる。
請求項2に記載の発明は、請求項1に記載の電子部品の製造方法において、積層体の切断面のエッチングを行うことにより、絶縁層を導体配線よりも厚めに残る形状とすることを特徴とする。
According to this method, since the insulating layer remaining on the end surface of the cut surface is dissolved and the end surface of the electronic component is covered with the insulating layer, the end surface of the electronic component can be efficiently covered with the insulating layer material.
According to a second aspect of the present invention, in the method of manufacturing an electronic component according to the first aspect, the insulating layer is formed in a shape that remains thicker than the conductor wiring by etching the cut surface of the laminate. And

請求項3に記載の発明は、請求項1または2に記載の電子部品の製造方法において、電子部品を基板に実装する時の熱処理により、端面に残る絶縁層を溶解して電子部品の端面を絶縁層で覆うことを特徴とする。   According to a third aspect of the present invention, in the method of manufacturing an electronic component according to the first or second aspect, the insulating layer remaining on the end surface is melted by heat treatment when the electronic component is mounted on the substrate to thereby remove the end surface of the electronic component. It is characterized by covering with an insulating layer.

この方法によれば、電子部品を基板に実装する時の熱処理で、端面に残る絶縁層を溶解する工程をも一括して行うことができるので、それぞれを別工程で行う場合に比べて、生産能率が向上する。   According to this method, the process of melting the insulating layer remaining on the end face can be performed in a batch by the heat treatment when mounting the electronic component on the substrate. Efficiency is improved.

請求項4に記載の発明は、請求項1〜3の何れか1項に記載の電子部品の製造方法において、中心電極である第1の金属からなる巻き芯の周りに、絶縁層を挟みながら前記第1の金属と異なる第2の金属からなる導体配線をスパイラル状に配置して電子部品を形成する工程と、この後、前記電子部品全体をエッチング処理して前記導体配線の厚みを前記巻き芯の厚みよりも薄くする工程とを有することを特徴とする。   According to a fourth aspect of the present invention, in the method of manufacturing an electronic component according to any one of the first to third aspects, the insulating layer is sandwiched around the winding core made of the first metal as the center electrode. A step of forming a conductor wiring made of a second metal different from the first metal in a spiral shape to form an electronic component, and then etching the entire electronic component to determine the thickness of the conductor wiring. And a step of making it thinner than the thickness of the core.

この方法によれば、巻き芯の軸芯方向に沿う厚みが導体配線の厚みよりも厚くなるので、電子部品を載せ台などに載せた際に、巻き芯だけが載せ台に接触し、電子部品における導体配線の外面部が載せ台などから隙間を有した姿勢となり、異物が付着し難くなり、ひいては導体配線同士が短絡し難くなる。   According to this method, since the thickness along the axial direction of the winding core is thicker than the thickness of the conductor wiring, when the electronic component is placed on a mounting base, only the winding core contacts the mounting base. In this case, the outer surface of the conductor wiring is in a posture with a gap from the mounting base and the like, and it is difficult for foreign matter to adhere to the conductor wiring, thereby making it difficult to short-circuit the conductor wiring.

以下、本発明の実施の形態を、図1〜図4を用いて以下に説明する。
図1は本発明の実施の形態にかかるコイルとその製造方法を示す。
図1(a)において、1は最終的にコイル6(図1(d)参照)の中心電極となる巻き芯、2は導体箔からなる導体配線、3は接着層を兼ねた絶縁層である。ここで、中心電極となる巻き芯1は導電性のある材料を用いればよく、例えば、銅、アルミニウム、またはこれらを含む合金、鉄、ステンレス等を使用する。導体箔からなる導体配線2の材料は導電材料を用いればよく、例えば銅、アルミニウム、または、それらを含む合金等を用いればよい。さらに好ましくは、導体配線2として電気抵抗を低くするために銅がよい。また、絶縁層3としては、絶縁性を有する樹脂フィルム等を用いればよく、さらにその上に接着性を有する接着層を塗布すれば、導体配線2と絶縁層3との層間接着力を得ることができる。また、絶縁層3として、加熱処理により接着性を示す、例えばPET樹脂フィルムを用いれば、絶縁層3と接着層とを単一層で兼ねることができるため、さらによい。
Hereinafter, embodiments of the present invention will be described with reference to FIGS.
FIG. 1 shows a coil and a manufacturing method thereof according to an embodiment of the present invention.
In FIG. 1A, 1 is a winding core that finally becomes a central electrode of a coil 6 (see FIG. 1D), 2 is a conductor wiring made of a conductive foil, and 3 is an insulating layer that also serves as an adhesive layer. . Here, the core 1 used as a center electrode should just use an electroconductive material, for example, copper, aluminum, or an alloy containing these, iron, stainless steel, etc. are used. A conductive material may be used as the material of the conductor wiring 2 made of the conductive foil, and for example, copper, aluminum, or an alloy containing them may be used. More preferably, copper is preferable for the conductor wiring 2 in order to reduce the electric resistance. Moreover, as the insulating layer 3, an insulating resin film or the like may be used, and if an adhesive layer having an adhesive property is further coated thereon, an interlayer adhesive force between the conductor wiring 2 and the insulating layer 3 can be obtained. Can do. Moreover, if the insulating layer 3 is made of, for example, a PET resin film that exhibits adhesiveness by heat treatment, the insulating layer 3 and the adhesive layer can be used as a single layer, which is even better.

ここで、特に、巻き芯1の材料としては、金属を溶解するエッチング処理で、導体配線2よりも溶解され難い材料が選択されている。
上記のごときコイル6を得るための製造方法を、図1を用いて以下に示す。
Here, in particular, as the material of the winding core 1, a material that is more difficult to dissolve than the conductor wiring 2 in the etching process that dissolves the metal is selected.
A manufacturing method for obtaining the coil 6 as described above will be described below with reference to FIG.

先ず、図1(a)に示すように、導体配線2と絶縁層3との2層からなるフィルム4の端部を巻き芯1に接合する。巻き芯1と導体配線2との接合方法は導電性の接着剤やハンダによる接合や、超音波接合によって実現できる。   First, as shown in FIG. 1A, the end portion of the film 4 composed of two layers of the conductor wiring 2 and the insulating layer 3 is joined to the winding core 1. The joining method of the winding core 1 and the conductor wiring 2 can be realized by joining with a conductive adhesive or solder, or ultrasonic joining.

次に、巻き芯1の周りに前記2層のフィルム4を所定回数巻回して、図1(b)に示す巻回体5を作成する(巻回体作成工程)。例えば、巻き芯1の材料として直径が約1.0mm、長さ60mmの台形断面のものを用い、4μm厚の銅からなる導体配線2と1μm厚の接着層を兼ねたPETからなる絶縁層3との2層からなるフィルム4を巻き芯1に30回巻き付けた場合、巻回体5の直径は1.3mm程度になる。   Next, the two-layer film 4 is wound around the winding core 1 a predetermined number of times, and a wound body 5 shown in FIG. 1B is created (a wound body creating step). For example, a material having a trapezoidal cross section with a diameter of about 1.0 mm and a length of 60 mm is used as the material of the winding core 1, and a conductor wiring 2 made of copper having a thickness of 4 μm and an insulating layer 3 made of PET also serving as an adhesive layer having a thickness of 1 μm. Is wound around the core 1 30 times, the wound body 5 has a diameter of about 1.3 mm.

この巻回体5を120℃、30分の熱処理で層間接着を行った(層間接着工程)後、ダイシングソーを用いて250μm厚に切断して(切断工程)、図1(c)、図1(c’)に示すコイル6を得た。すなわち、コイル6には、中心電極である巻き芯1の周囲にCu層からなる導体配線2とPETからなる絶縁層3とが交互に配置されている。   The wound body 5 was subjected to interlayer adhesion by a heat treatment at 120 ° C. for 30 minutes (interlayer adhesion process), and then cut into a thickness of 250 μm using a dicing saw (cutting process). FIG. 1 (c) and FIG. The coil 6 shown in (c ′) was obtained. That is, in the coil 6, the conductor wiring 2 made of Cu layer and the insulating layer 3 made of PET are alternately arranged around the core 1 that is the center electrode.

次に、巻回体5の切断面(コイル6の断面6a)における導体配線2の層間ショートを除去するために、4.9wt%の塩化第2鉄水溶液に温度範囲22.5℃±0.5℃において6分間エッチング処理を行った(エッチング工程)。さらに純水で超音波洗浄を5分、流水洗浄を10分間行って残留イオンを除去した。このエッチング処理によってコイル6の断面6aの導体配線2(Cu)が10〜20μm後退して層間ショートが完全に除去される。   Next, in order to remove the interlayer short of the conductor wiring 2 on the cut surface of the wound body 5 (cross section 6a of the coil 6), the temperature range is 22.5 ° C. ± 0. Etching was performed for 6 minutes at 5 ° C. (etching step). Furthermore, ultrasonic cleaning with pure water was performed for 5 minutes and cleaning with running water was performed for 10 minutes to remove residual ions. By this etching process, the conductor wiring 2 (Cu) of the cross section 6a of the coil 6 is retreated by 10 to 20 μm, and the interlayer short is completely removed.

このとき、巻き芯1の材料として、導体配線2や絶縁層3の材料よりもエッチングされ難い材料が用いられているため、図1(d)に示すように、中心電極としての巻き芯1の厚みが、導体配線2や絶縁層3の厚みよりも厚くなり、段差が生じる。この段差があることによって、図2に示すように、載せ台13上に異物15があった場合でも、吸着ノズル12を用いてハンドリングを行う際に、コイル6の断面6aに、異物15が接触したり、強く当たったりする確率が低くなり、異物15によりコイル6の断面6aを傷つける恐れを低減させることができる。また、コイル6の実装時に基板上に存在するダストや異物で傷つける可能性も低減できる。   At this time, as the material of the winding core 1, a material that is harder to be etched than the material of the conductor wiring 2 and the insulating layer 3 is used. Therefore, as shown in FIG. The thickness becomes thicker than the thickness of the conductor wiring 2 and the insulating layer 3, and a step is generated. Due to this step, as shown in FIG. 2, even when there is a foreign object 15 on the mounting table 13, the foreign object 15 contacts the cross section 6 a of the coil 6 when handling using the suction nozzle 12. The possibility of damaging the cross section 6a of the coil 6 by the foreign material 15 can be reduced. Further, it is possible to reduce the possibility of being damaged by dust or foreign matter existing on the substrate when the coil 6 is mounted.

なお、巻き芯1の厚みと導体配線2の厚みとの差は5μm以上あることが望ましく、この構成により、コイル6の断面6aに異物15が接触したり、強く当たったりする確率を低減できる。また、巻き芯1の厚みと導体配線2の厚みとの差を50μmよりも大きくなるようにするためには、エッチング処理での処理時間が極めて大きくなり、生産効率が低くなるので、巻き芯1の厚みと導体配線2の厚みとの差は50μm以下であることが望ましい。   The difference between the thickness of the winding core 1 and the thickness of the conductor wiring 2 is desirably 5 μm or more. With this configuration, it is possible to reduce the probability that the foreign matter 15 comes into contact with or strongly hits the cross section 6a of the coil 6. Further, in order to make the difference between the thickness of the winding core 1 and the thickness of the conductor wiring 2 larger than 50 μm, the processing time in the etching process becomes extremely long and the production efficiency is lowered. The difference between the thickness of the conductor wire 2 and the thickness of the conductor wiring 2 is desirably 50 μm or less.

また、金属を溶解するためのエッチング処理としては、薬液との化学的反応を利用しても、電気を通電することによる溶解反応を利用しても何れでもよい。
また、上記の実施の形態においては、エッチング処理を行った後に、超音波洗浄を5分間行ったため、絶縁層3の厚みが導体配線2の厚みとほぼ等しくなったが、これに代えて、超音波洗浄の時間を3分以下にしたり、超音波洗浄を行わなかったりしてもよい。これによれば、図1(e)に示すように、PETからなる絶縁層3が導体配線2よりも厚めに残る形状のコイル6を得ることができる。
In addition, the etching treatment for dissolving the metal may use either a chemical reaction with a chemical solution or a dissolution reaction by applying electricity.
In the above embodiment, since the ultrasonic cleaning is performed for 5 minutes after performing the etching process, the thickness of the insulating layer 3 is substantially equal to the thickness of the conductor wiring 2. The sonic cleaning time may be set to 3 minutes or less, or the ultrasonic cleaning may not be performed. According to this, as shown in FIG. 1 (e), a coil 6 having a shape in which the insulating layer 3 made of PET remains thicker than the conductor wiring 2 can be obtained.

この場合、エッチング処理により、導体配線2は10〜20μm後退するが、絶縁層3はそのまま残るため、絶縁層3が導体配線2よりも10〜20μm突出する。さらに、流水洗浄を20分行った後、清浄なガラス板10の上にコイル6を並べ、加熱炉で120℃、10分間加熱処理を行う。この加熱処理の際、絶縁層3が軟化し、その表面張力によって、巻き芯1を除くコイル断面6aの表面に1〜10μm程度の絶縁層3の材料からなる保護層9が形成される。この方法により、極めて小さいコイル6に対しても、巻き芯1を除くコイル断面6aの表面に保護層9を良好に形成することができる。   In this case, the conductor wiring 2 retreats by 10 to 20 μm by the etching process, but the insulating layer 3 remains as it is, so that the insulating layer 3 protrudes from the conductor wiring 2 by 10 to 20 μm. Further, after washing with running water for 20 minutes, the coils 6 are arranged on a clean glass plate 10 and subjected to heat treatment at 120 ° C. for 10 minutes in a heating furnace. During the heat treatment, the insulating layer 3 is softened, and the protective layer 9 made of the material of the insulating layer 3 having a thickness of about 1 to 10 μm is formed on the surface of the coil cross section 6a excluding the winding core 1 by the surface tension. By this method, the protective layer 9 can be satisfactorily formed on the surface of the coil cross section 6a excluding the winding core 1 even for an extremely small coil 6.

すなわち、従来から、コイル断面6aの保護のために断面に樹脂を塗布する方法等が試みられてきており、コイルのサイズが直径5mm以上のような大きなものであれば、コイル6の導体配線2の配線幅w(図1(d)参照)も比較的大きく、塗布し易かったけれども、上記実施の形態に示すように、直径が概ね5mm以下の小型のコイル6の場合は、配線幅wが0.15mm程度しかなく塗布が困難であった。しかし、上記実施の形態によれば、極めて小さいコイル6に対しても、保護層9の形成を良好に行うことができる。   That is, conventionally, a method of applying a resin to the cross section for protecting the coil cross section 6a has been tried. If the size of the coil is as large as 5 mm or more, the conductor wiring 2 of the coil 6 is used. The wiring width w (see FIG. 1D) was relatively large and easy to apply. However, as shown in the above embodiment, in the case of the small coil 6 having a diameter of approximately 5 mm or less, the wiring width w is Application was difficult because it was only about 0.15 mm. However, according to the above embodiment, the protective layer 9 can be satisfactorily formed even for the extremely small coil 6.

また、この熱処理工程は図3や図4に示すように、コイル6を基板に実装する基板実装時に同時に行ってもよく、この場合、特別に加熱工程を設ける必要がないため、生産性を低下させるおそれがない。なお、図3(a),(b)においては、吸着ノズル12の先端部にヒータ10を設け、コイル6を基板11上のランド14に搬送して、コイル6の巻き芯1を基板11上のランド14に実装する際に、前記ヒータ10によりコイル6を加熱して、保護層9を形成した場合を示す。また、図4(a),(b)においては、基板11自体をヒータ10上に載置して、コイル6を基板11上のランド14に搬送し、コイル6の巻き芯1を基板11上のランド14に実装する際に、前記ヒータ10により基板11を通してコイル6を加熱して、保護層9を形成した場合を示す。   Further, as shown in FIGS. 3 and 4, this heat treatment step may be performed simultaneously with the mounting of the coil 6 on the substrate, and in this case, it is not necessary to provide a special heating step. There is no fear. 3A and 3B, a heater 10 is provided at the tip of the suction nozzle 12, the coil 6 is conveyed to the land 14 on the substrate 11, and the winding core 1 of the coil 6 is placed on the substrate 11. The case where the protective layer 9 is formed by heating the coil 6 with the heater 10 when mounted on the land 14 is shown. 4A and 4B, the substrate 11 itself is placed on the heater 10, the coil 6 is conveyed to the land 14 on the substrate 11, and the winding core 1 of the coil 6 is placed on the substrate 11. The case where the protective layer 9 is formed by heating the coil 6 through the substrate 11 by the heater 10 when mounted on the land 14 is shown.

さらに、図5に示すように、基板11におけるコイル6の巻き芯1を実装する箇所に、凹部16を形成してもよい。すなわち、巻き芯1の軸芯方向に沿う厚みを導体配線2の厚みより厚くすることで、コイル6には巻き芯1の段差部分からなる凸部17が形成されるが、この凸部17を、基板11上に設けられた凹部16に嵌め込んで実装してもよい。   Furthermore, as shown in FIG. 5, a recess 16 may be formed at a location on the substrate 11 where the winding core 1 of the coil 6 is mounted. That is, by making the thickness along the axial direction of the winding core 1 thicker than the thickness of the conductor wiring 2, the coil 6 is formed with a convex portion 17 consisting of a stepped portion of the winding core 1. Alternatively, it may be mounted by being fitted into a recess 16 provided on the substrate 11.

この方法によれば、巻き芯1自身からなる凸部17を、基板11の凹部16に嵌め込んで位置あわせすることができるので、基板11に対するコイル6の芯合わせであるアライメントを簡単かつ正確に行うことができる。   According to this method, since the convex portion 17 formed of the winding core 1 itself can be fitted into the concave portion 16 of the substrate 11 and aligned, alignment that is the alignment of the coil 6 with the substrate 11 can be performed easily and accurately. It can be carried out.

また、上記実施の形態においては、電子部品としてのコイル6を製造する場合について説明したが、これに限るものではなく、他の電子部品やその製造方法に適用することも可能である。   Moreover, in the said embodiment, although the case where the coil 6 as an electronic component was manufactured was demonstrated, it is not restricted to this, It is also possible to apply to another electronic component and its manufacturing method.

また、これらの実施の形態に示したコイル6(基板11付きのものを含む)を、電子機器の1例としての平面モータに用いることで、平面モータとしても、小型かつ薄型で、かつ信頼性が高いものを実現できる。さらに、この平面モータを電子機器の他の例としての振動モータに用いることで、小型かつ薄型で、かつ信頼性が高い振動モータを実現できる。   Further, by using the coil 6 (including the one with the substrate 11) shown in these embodiments for a planar motor as an example of an electronic apparatus, the planar motor is small and thin, and is reliable. Can achieve something high. Furthermore, by using this planar motor for a vibration motor as another example of an electronic device, a vibration motor that is small and thin and has high reliability can be realized.

また、この振動モータを電子機器のその他の例としての携帯端末の受信時動作用等に用いることで、携帯端末としても、小型かつ薄型で、かつ信頼性が高いものを実現でき、さらに、前記平面モータを記録媒体の回転手段として使用することで、電子機器のさらに他の例としての磁気記録用、あるいは層変化記録用、あるいは光磁気記録用のドライブ装置を、小型かつ薄型化して、かつ信頼性を向上させることができる。   In addition, by using this vibration motor for receiving operation of a mobile terminal as another example of an electronic device, it is possible to realize a small, thin, and highly reliable mobile terminal, By using a planar motor as a rotating means of a recording medium, a drive device for magnetic recording, layer change recording, or magneto-optical recording as still another example of an electronic device can be reduced in size and thickness, and Reliability can be improved.

(a)〜(f)は本発明の実施の形態に係る電子部品としてのコイルを示すもので、(a)はコイルの巻き芯とフィルムの斜視図、(b)は巻回体作成工程を示す斜視図、(c)は同コイルの巻回体を切断した直後の状態の正面図、(c’)は同コイルの巻回体を切断した直後の状態の断面図、(d)は同コイルの断面図、(e)は本発明の他の実施の形態に係るコイルの加熱前の断面図、(f)は同コイルの過熱後の断面図(A)-(f) shows the coil as an electronic component which concerns on embodiment of this invention, (a) is a winding core of a coil, and a perspective view of a film, (b) is a wound body preparation process. (C) is a front view of a state immediately after cutting the wound body of the coil, (c ′) is a cross-sectional view of the state immediately after cutting the wound body of the coil, and (d) is the same as FIG. Sectional view of coil, (e) is a sectional view before heating a coil according to another embodiment of the present invention, (f) is a sectional view after overheating of the coil 本発明の実施の形態に係る電子部品としてのコイルを吸着ノズルでハンドリングした状態を概略的に示す図The figure which shows schematically the state which handled the coil as an electronic component which concerns on embodiment of this invention with the suction nozzle. (a)および(b)は本発明の他の実施の形態に係る電子部品としてのコイルを吸着ノズルで実装する前の状態および実装した後の状態をそれぞれ概略的に示す図(A) And (b) is a figure which shows schematically the state before mounting the coil as an electronic component which concerns on other embodiment of this invention with a suction nozzle, and the state after mounting, respectively. (a)および(b)は本発明のその他の実施の形態に係る電子部品としてのコイルを吸着ノズルで実装する前の状態および実装した後の状態をそれぞれ概略的に示す図(A) And (b) is a figure which shows schematically the state before mounting the coil as an electronic component which concerns on other embodiment of this invention with a suction nozzle, and the state after mounting, respectively. (a)および(b)は本発明のさらに他の実施の形態に係る電子部品としてのコイルを吸着ノズルで実装する前の状態および実装した後の状態をそれぞれ概略的に示す図(A) And (b) is a figure which shows schematically the state before mounting the coil as an electronic component which concerns on further another embodiment of this invention with a suction nozzle, and the state after mounting, respectively. (a)〜(c’)は従来のコイルを示すもので、(a)は従来のコイルの巻き芯とフィルムの斜視図、(b)は同従来のコイルの巻回体作成工程を示す斜視図、(c)は同従来のコイルの巻回体を切断した直後の状態の正面図、(c’)は同従来のコイルの巻回体を切断した直後の状態の断面図(A)-(c ') shows the conventional coil, (a) is a perspective view of the winding core and film of the conventional coil, (b) is a perspective view which shows the wound body preparation process of the conventional coil. (C) is a front view of the state immediately after cutting the winding body of the conventional coil, and (c ') is a cross-sectional view of the state immediately after cutting the winding body of the conventional coil. (a)は従来のコイルを吸着ノズルでハンドリングした状態を概略的に示す図、(b)は同従来のコイル上に異物が付着した状態を概略的に示す図(A) is a figure which shows the state which handled the conventional coil with the suction nozzle schematically, (b) is the figure which shows the state where the foreign substance has adhered on the conventional coil

符号の説明Explanation of symbols

1 巻き芯
2 導体配線
3 絶縁層
4 フィルム
5 巻回体
6 コイル
6a 断面
9 保護層
10 ヒータ
11 基板
12 吸着ノズル
13 載せ台
14 ランド
15 異物
16 凹部
17 凸部
DESCRIPTION OF SYMBOLS 1 Winding core 2 Conductor wiring 3 Insulating layer 4 Film 5 Winding body 6 Coil 6a Section 9 Protective layer 10 Heater 11 Substrate 12 Adsorption nozzle 13 Platform 14 Land 15 Foreign substance 16 Concave part 17 Convex part

Claims (4)

少なくとも1層の導体配線と少なくとも1層の絶縁層とからなる多層フィルムを巻回、あるいは積層して積層体を形成する工程と、
積層体の層間を接着する工程と、
積層体を所定厚みの形状に切断する工程と、
積層体の切断面のエッチングを行う工程と、
エッチング処理後に、切断面端面に残る絶縁層を溶解して電子部品の切断面端面を絶縁層で覆う工程と
を有することを特徴とした電子部品の製造方法。
Winding a multilayer film comprising at least one layer of conductor wiring and at least one layer of insulating layer, or laminating to form a laminate;
Bonding the layers of the laminate,
Cutting the laminate into a predetermined thickness; and
Etching the cut surface of the laminate;
And a step of dissolving the insulating layer remaining on the end surface of the cut surface after the etching process and covering the end surface of the electronic component with the insulating layer.
積層体の切断面のエッチングを行うことにより、絶縁層を導体配線よりも厚めに残る形状とすることを特徴とした請求項1に記載の電子部品の製造方法。   The method of manufacturing an electronic component according to claim 1, wherein the insulating layer is formed to be thicker than the conductor wiring by etching the cut surface of the laminate. 電子部品を基板に実装する時の熱処理により、端面に残る絶縁層を溶解して電子部品の端面を絶縁層で覆うことを特徴とした請求項1または2に記載の電子部品の製造方法。   3. The method of manufacturing an electronic component according to claim 1, wherein the insulating layer remaining on the end surface is melted by heat treatment when the electronic component is mounted on the substrate, and the end surface of the electronic component is covered with the insulating layer. 中心電極である第1の金属からなる巻き芯の周りに、絶縁層を挟みながら前記第1の金属と異なる第2の金属からなる導体配線をスパイラル状に配置して電子部品を形成する工程と、
この後、前記電子部品全体をエッチング処理して前記導体配線の厚みを前記巻き芯の厚みよりも薄くする工程と
を有することを特徴とした請求項1〜3の何れか1項に記載の電子部品の製造方法。
A step of forming an electronic component by arranging a conductor wire made of a second metal different from the first metal in a spiral manner around a winding core made of the first metal as a center electrode, with an insulating layer interposed therebetween; ,
The electronic device according to claim 1, further comprising a step of etching the entire electronic component to make the thickness of the conductor wiring thinner than the thickness of the winding core. A manufacturing method for parts.
JP2008200972A 2008-08-04 2008-08-04 Coil manufacturing method Expired - Fee Related JP4823278B2 (en)

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JPS637608A (en) * 1986-06-28 1988-01-13 Sony Chem Corp Manufacture of flat coil
JPS63213327A (en) * 1987-02-28 1988-09-06 Sony Chem Corp Flat coil
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JPH0555507U (en) * 1991-12-24 1993-07-23 株式会社三協精機製作所 Thin coil
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Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4976059A (en) * 1972-11-27 1974-07-23
JPS5666020A (en) * 1979-11-01 1981-06-04 West Electric Co Ltd Inductor device and manufacture therefor and inverter transformer employing it
JPS6077648A (en) * 1983-09-30 1985-05-02 Pioneer Electronic Corp Manufacture of coil
JPS61258637A (en) * 1985-05-10 1986-11-17 Satoru Nawata Shaping method for copper foil coil
JPS62277048A (en) * 1986-05-23 1987-12-01 Toshiba Corp Manufacture of stator coil
JPS637608A (en) * 1986-06-28 1988-01-13 Sony Chem Corp Manufacture of flat coil
JPS63213327A (en) * 1987-02-28 1988-09-06 Sony Chem Corp Flat coil
JPS63289914A (en) * 1987-05-22 1988-11-28 Sony Corp Manufacture of coil
JPS6429809A (en) * 1987-07-24 1989-01-31 Brother Ind Ltd Method for coupling substrate of optical integrated circuit and optical fiber
JPH02153502A (en) * 1988-12-05 1990-06-13 Sony Chem Corp Flat coil mounting method
JPH0555507U (en) * 1991-12-24 1993-07-23 株式会社三協精機製作所 Thin coil
JPH0670208U (en) * 1993-01-22 1994-09-30 東芝ホームテクノ株式会社 coil

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