JP2008266699A5 - - Google Patents

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Publication number
JP2008266699A5
JP2008266699A5 JP2007108884A JP2007108884A JP2008266699A5 JP 2008266699 A5 JP2008266699 A5 JP 2008266699A5 JP 2007108884 A JP2007108884 A JP 2007108884A JP 2007108884 A JP2007108884 A JP 2007108884A JP 2008266699 A5 JP2008266699 A5 JP 2008266699A5
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JP
Japan
Prior art keywords
target holder
vacuum
mounting table
facing
vacuum container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007108884A
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Japanese (ja)
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JP5194534B2 (en
JP2008266699A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2007108884A priority Critical patent/JP5194534B2/en
Priority claimed from JP2007108884A external-priority patent/JP5194534B2/en
Publication of JP2008266699A publication Critical patent/JP2008266699A/en
Publication of JP2008266699A5 publication Critical patent/JP2008266699A5/ja
Application granted granted Critical
Publication of JP5194534B2 publication Critical patent/JP5194534B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Claims (1)

真空維持可能な真空容器と、前記真空容器内に配置されかつ基板を載置する基板載置台と、前記基板載置台に対向して設けられたターゲットを載置するターゲットホルダーと、前記ターゲットホルダーに電力或いは高周波電力を印加する電源と、前記真空容器内にガスを導入或いは排気するガス供排気手段とを備える真空処理装置において、
前記基板載置台の外周でかつ前記ターゲットホルダーに対向して複数の開口部を有する防着板が設けられ、前記防着板のうち前記ターゲットホルダーと面する側に誘電体が形成され、かつ、前記ターゲットホルダーと面する側とは逆の面にゲッター材料が形成されていること
を特徴とする真空処理装置。 A vacuum container capable of maintaining a vacuum, a substrate mounting table disposed in the vacuum container and for mounting a substrate, a target holder for mounting a target provided opposite to the substrate mounting table, and a target holder in the vacuum processing apparatus and a gas supply exhaust means for introducing or exhausting gas to power or a power source for applying high frequency power, the vacuum container,
An adhesion preventing plate having a plurality of openings on the outer periphery of the substrate mounting table and facing the target holder is provided ; a dielectric is formed on a side of the adhesion preventing plate facing the target holder ; and A vacuum processing apparatus, wherein a getter material is formed on a surface opposite to a side facing the target holder .
JP2007108884A 2007-04-18 2007-04-18 Vacuum processing equipment Expired - Fee Related JP5194534B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007108884A JP5194534B2 (en) 2007-04-18 2007-04-18 Vacuum processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007108884A JP5194534B2 (en) 2007-04-18 2007-04-18 Vacuum processing equipment

Publications (3)

Publication Number Publication Date
JP2008266699A JP2008266699A (en) 2008-11-06
JP2008266699A5 true JP2008266699A5 (en) 2009-05-21
JP5194534B2 JP5194534B2 (en) 2013-05-08

Family

ID=40046578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007108884A Expired - Fee Related JP5194534B2 (en) 2007-04-18 2007-04-18 Vacuum processing equipment

Country Status (1)

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JP (1) JP5194534B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2663813C2 (en) * 2014-06-26 2018-08-10 Саес Геттерс С.П.А. Getter pumping system

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08277461A (en) * 1995-04-06 1996-10-22 Ulvac Japan Ltd Sputtering device and formation of dielectric film
IT1297013B1 (en) * 1997-12-23 1999-08-03 Getters Spa GETTER SYSTEM FOR THE PURIFICATION OF THE WORKING ATMOSPHERE IN PHYSICAL STEAM DEPOSITION PROCESSES
JP2001234326A (en) * 2000-02-25 2001-08-31 Sony Corp Vacuum processing equipment

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