JP2008260988A - Liquid leakage prevention structure for plating apparatus and plating apparatus using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid leakage prevention structure which prevents the leakage of a treating liquid and the surface of a tape-shaped base material from being scratched or subjected to elongation deformation. <P>SOLUTION: The liquid leakage prevention structure is provided in an inner cell of a treating tank for immersing a traveling tape-shaped base material T into a treating liquid and prevents the leakage of a treating liquid from a slit in the inner cell by a roller seal. The liquid leakage prevention structure is equipped with: a pair of tension rollers 41a, 41b which are arranged on one surface side and the other surface side, respectively, of the base material T for changing the traveling direction of the base material T; roller holders 44 which are provided at the both end sides of the tension rollers 41a, 41b and rotatably hold the tension rollers 41a, 41b in the inner cell; and guide members 42a, 42b which are provided on the inner wall of the inner cell and each have an inner peripheral surface for covering the outer peripheral surface of each tension roller 41a, 41b. The leakage of the treating liquid is prevented by the tension rollers 41a, 41b, the guide members 42a, 42b, and the inner wall of the inner cell 3. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a plating apparatus for immersing a traveling tape-like substrate in a treatment liquid, and more particularly to a liquid leakage prevention structure for preventing leakage of a treatment liquid from a slit of a tape-like substrate in each treatment tank.

  In the conventional plating apparatus, a treatment tank is installed in each process such as water washing, surface treatment, plating treatment, etc., and the tape-like base material drawn from the hoop material passes continuously through each treatment tank, Each processing tank is arranged so that reel-to-reel processing is performed.

  Each treatment tank of the plating apparatus includes a container body and an inner cell provided inside the container body. A treatment tank slit is provided at the inlet and outlet of the container body in order to allow the tape-like substrate to pass therethrough. The inside of the inner cell is filled with each processing solution, and the tape-like base material travels in the horizontal direction almost at the center of the inner cell, whereby each processing is performed on the base material. Similar to the container body, the inner cell is provided with an inner cell slit for allowing the tape-like base material to pass through the inlet and the outlet. The processing liquid leaks from the gap between each insertion port provided at the inlet and outlet of the inner cell and the traveling tape-like base material, and the leaked processing liquid flows into the inner cell from the inside of the container body. It is returning.

  However, it is unavoidable that the processing liquid leaking from the inner cell is ejected in the horizontal direction along the work surface of the tape-like substrate, and depending on the momentum, it does not stop inside the container body, and the inside of the processing tank of the next process This causes a problem that the processing liquid is taken out. Since such a problem greatly affects the concentration management of the processing liquid, waste liquid processing, and the like, a preventive measure is required.

  As a plating apparatus having a structure for preventing such liquid leakage from the treatment tank, for example, one disclosed in JP-T-9-505638 (Patent Document 1) is known.

  Patent Document 1 discloses a structure in which a sluice chamber is provided outside the inner cell slit, and a pair of rollers are loosely disposed in the vicinity of the slit of the sluice chamber to provide a seal for preventing liquid leakage. In the case of such a structure, the substrate is sandwiched between two rollers in a state where it is pressure-bonded by hydraulic pressure. However, since the hydraulic pressure around the rollers fluctuates, the sealing performance becomes insufficient and the processing liquid leaks. In addition, there is a problem that the substrate is damaged due to friction due to poor rotation of the roller. In addition, since the base material is sandwiched between the rollers by hydraulic pressure, a relatively large tensile force is required to run the base material. When the base material is a thin film-like tape-like base material, elongation deformation occurs. There is a problem that it occurs remarkably.

Japanese Patent Application Laid-Open No. 2004-256850 discloses a treatment liquid leakage prevention structure in which a brush seal is further provided outside the sluice chamber. In this structure, in order to prevent minute scratches due to friction from occurring on the base material due to contact with the brush seal, a resin sheet covering the tip of the brush seal is provided, and the base material is brought into contact with the tip of the resin sheet. By doing so, leakage of the treatment liquid is prevented. However, since the base material runs continuously, there is a problem that when the resin sheet comes into contact with the continuously moving base material, it may cause fine scratches due to friction.
Japanese National Patent Publication No. 9-505638 JP 2004-256850 A

  An object of the present invention is to provide a liquid leakage prevention structure for preventing the treatment liquid from leaking and preventing the surface of the tape-like substrate from being scratched or stretched in a plating apparatus. .

The liquid leakage prevention structure of the present invention is provided in an inner cell of a treatment tank for immersing a traveling tape-shaped substrate in the treatment liquid, and prevents the treatment liquid from leaking from the slit of the inner cell by a roller seal. Leakage prevention structure,
A pair of tension rollers respectively disposed on one side and the other side of the tape-shaped substrate so as to change the traveling direction of the tape-shaped substrate;
A bearing member provided on both ends of the tension roller and rotatably supporting the tension roller on the inner cell;
A guide member provided on the inner wall of the inner cell and having an inner peripheral surface covering a part of the outer peripheral surface of the tension roller;
With
Leakage of the processing liquid is prevented by the tension roller, the guide member, and the inner wall of the inner cell.

  Specifically, the pair of tension rollers are arranged such that the rotation axes of the tension rollers are separated from each other by a predetermined interval in the running direction of the tape-shaped substrate, and are shorter than the sum of the radii of both tension rollers. The tape-like base material is arranged so as to be separated by a predetermined interval in a direction perpendicular to the running direction of the tape-like base material and so that the outer peripheral surfaces of both tension rollers are not in contact.

  It is preferable that the outer peripheral surface of the tension roller is formed of a thermoplastic elastomer.

  It is preferable that the holding angle of the outer peripheral surface of the tension roller that makes contact with the tape-shaped substrate is 1 ° to 180 °.

  It is preferable that a gap between the outer peripheral surface of the tension roller and the inner peripheral surface of the guide member is 0.1 mm to 1 mm.

  It is preferable that the minimum gap length between the outer peripheral surfaces of the pair of tension rollers is 0.01 mm to 2.27 mm.

  Moreover, the plating apparatus which concerns on this invention has a processing tank in which said liquid leak prevention structure is provided in the entrance and exit of the tape-shaped base material in the said inner cell.

In addition, in this plating apparatus, in addition to the above liquid leakage prevention structure,
In the inner cell,
A pair of tension rollers respectively disposed on one side and the other side of the tape-shaped substrate so as to change the traveling direction of the tape-shaped substrate;
A bearing member provided on both ends of the tension roller and rotatably supporting the tension roller on the inner cell;
It is preferable to further comprise a tension roller device comprising:

  According to the present invention, the contact between the traveling tape-like substrate and the rotating tension roller is brought into close contact with the tension at the inlet and outlet slits of the inner cell of each treatment tank of the plating apparatus. It can be surely prevented, and excellent sealing performance is stably exhibited in each treatment tank of the plating apparatus.

  In addition, since the tension roller rotates smoothly in a stable state by the bearing member that supports the tension roller and the guide member that covers a part of the outer peripheral surface of the tension roller, the tape-like substrate is damaged by friction. There is no.

  Furthermore, since the tape-shaped base material is not sandwiched between the rollers, the base material can be processed without causing elongation deformation even when the base material is in the form of a thin film.

  The best mode for carrying out the present invention will be described below with reference to the drawings.

  FIG. 1 shows a cross section along a plane direction of a plating treatment tank provided with an embodiment of a liquid leakage prevention structure in a plating apparatus according to the present invention. As shown in the figure, the plating tank 1 includes a container body 2 having a rectangular cross section and an inner cell 3 provided inside the container body 2. Treatment tank slits 5 for allowing the tape-shaped substrate T to pass through are provided on both side surfaces of the container body 2 in the traveling direction of the tape-shaped substrate T. The inner cell 3 is also provided with inner cell slits for allowing the tape-shaped substrate T to pass through on both side surfaces in the traveling direction of the tape-shaped substrate T, thereby forming an inlet 3a and an outlet 3b.

  In the vicinity of the inlet 3a and the outlet 3b, a liquid leakage prevention structure 4 for preventing the liquid leakage of the plating solution W from the slit is provided on the inner wall of the inner cell 3.

  FIG. 2 shows details of the liquid leakage prevention structure 4. FIG. 3 shows a cross section taken along the line AA of FIG. As illustrated, in the liquid leakage prevention structure 4, a pair of tension rollers 41 a and 41 b change the traveling direction of the tape-shaped substrate T on one side and the other surface side of the tape-shaped substrate T. In arrangement, it is provided. The tension rollers 41 a and 41 b extend longer than the slits of the inlet 3 a and the outlet 3 b and are arranged in the vertical direction of the plating tank 1. At both ends of each of the tension rollers 41a and 41b, a shaft portion extending from both sides of the roller portion is provided, and the shaft portion is rotatably supported by a bearing 441 which is one of the components of the bearing member. . The bearing 441 is supported in a roller holder 44 that is a bearing member. The roller holder 44 is fixedly supported on the inner wall or bottom surface of the inner cell by a predetermined means, whereby the tension rollers 41a and 41b are arranged at predetermined positions in the inner cell 3.

  More specifically, the rotation shafts of the tension rollers 41a and 41b are separated by a predetermined distance in the running direction of the tape-shaped substrate T and in the direction perpendicular to the running direction. Note that, in the direction perpendicular to the running direction of the tape-shaped substrate T, the distance is shorter than the sum of the radii of both tension rollers. Further, the outer peripheral surfaces of both tension rollers are not in contact with each other.

  With this configuration, the tension roller 41a, 41b is given a holding angle with respect to the tape-like base material T, and the tape-like base material T moving in the running direction changes its direction to one side by contact with the outer peripheral surface of the tension roller 41a. Then, it comes into contact with the outer peripheral surface of the tension roller 41b. Further, the tape-shaped substrate T travels in a direction parallel to the traveling direction by changing the direction to the other surface side by contact with the outer peripheral surface of the tension roller 41b.

  The tension rollers 41a and 41b are supported by the bearings 441 and the roller holder 44 constituting the bearing member, so that the tension rollers 41a and 41b rotate with the traveling of the tape-shaped substrate T without any difference in speed. It becomes possible. Note that “synchronized” means that no slippage occurs between the outer peripheral surfaces of the tension rollers 41a and 41b and the tape-shaped substrate T, and that no speed difference is present means that the tension rollers 41a, 41b, This means that the rotational movement distance of a point on the outer peripheral surface of 41b is equal to the movement distance of the tape-shaped substrate T. Further, by maintaining the position at a predetermined position, the optimum holding angle is kept constant, and tension is held between the tension rollers 41a and 41b and the tape-like substrate T, and the plating solution W which is a processing solution. Is prevented from leaking in the slit direction.

  The minimum gap length between the outer peripheral surfaces of the tension rollers 41a and 41b is preferably 0.01 mm to 2.27 mm. If the minimum gap length is 2.27 mm or more, both ends of the tension rollers 41a and 41b do not come into contact with the tape-shaped substrate T (see the two-dot chain line in FIG. 2), so that the plating solution W may leak out. As a result, the holding angle is lost, the tension roller loses its rotational force, and the substrate is damaged. On the other hand, when the thickness is 0.01 mm or less, there is a possibility that a problem that the tape-shaped substrate T cannot pass is caused.

  The optimum holding angles θa and θb (shown in FIG. 4) of the contact surface between the tension rollers 41a and 41b and the tape-shaped substrate T are the eccentricity of the roller, the play of the bearing 441 (shown in FIG. 2) of the roller holder 44, etc. Is taken into consideration, and is set to 1 ° to 180 °. The holding angles θa and θb vary greatly depending on the angle of entry into the tension roller 41a and the angle of exit from the tension roller 41b, but the tension rollers 41a and 41b rotate reliably to reduce damage to the tape-shaped substrate T. Is preferably 5 ° or more.

  Guide members 42 a and 42 b are provided between the tension rollers 41 a and 41 b and the inner wall of the inner cell 3. The guide members 42a and 42b are substantially the same in length as the tension rollers 41a and 41b, and have a function of preventing leakage of the plating solution W from between the tension rollers 41a and 41b and the inner wall of the inner cell 3. The guide members 42a and 42b may be provided directly on the inner wall of the inner cell 3. For example, when the present invention is applied to an existing processing tank, the guide members 42a and 42b are attached to the wall surface of the inner cell 3, You may provide in the resistance board 43 which is a plate-shaped interposed member to comprise.

  The guide members 42a and 42b are formed with inner peripheral surfaces that face each other so as to cover a part of the outer peripheral surfaces of the tension rollers 41a and 41b. That is, a gap is formed between the outer peripheral surfaces of the tension rollers 41a and 41b and the inner peripheral surfaces of the guide members 42a and 42b. When the tension rollers 41a and 41b and the guide members 42a and 42b are arranged in such a way as to provide a gap, the plating solution W is prevented from leaking between the two, and the tension rollers 41a and 41b and the guide are provided. No sliding contact resistance is generated between the members 42a and 42b. Therefore, the tension rollers 41a and 41b can smoothly rotate with respect to the guide members 42a and 42b. Here, the gap between the outer peripheral surfaces of the tension rollers 41a and 41b and the inner peripheral surfaces of the guide members 42a and 42b is, for example, 0.1 mm to 1 mm. If the thickness is less than 0.1 mm, both members may come into contact with each other. If the thickness exceeds 1 mm, the processing liquid may leak out between both members depending on the type of the processing liquid.

  FIG. 5 shows a longitudinal section of the tension roller 41a. As illustrated, the tension roller 41 a is made of metal, resin, or the like, and includes a shaft member 411 that forms a shaft, and an elastic material 412 that covers the outer peripheral surface of the shaft member 411. When the elastic material 412 is used, flapping of the tape-shaped substrate T is absorbed by the elasticity, and therefore the plating solution W is prevented from leaking from the gap between the tension rollers 41a and 41b and the tape-shaped substrate T. Can do.

  As a material of the elastic material 412, for example, it is preferable to use a thermoplastic elastomer. Among them, it is particularly preferable to use an olefinic thermoplastic elastomer (Shore hardness 63). Since the olefinic thermoplastic elastomer has a large contact resistance and follows the movement of the tape-shaped substrate T, it can move in synchronization with the tape-shaped substrate T. Moreover, when an olefin type thermoplastic elastomer is used, there exists an advantage that a damage | wound is hard to produce in the tape-shaped base material T rather than the case where the conventional vinyl chloride resin etc. are used.

  In the embodiment described above, the contact between the tape-shaped substrate T and the tension rollers 41a and 41b is in close contact with tension, so that liquid leakage can be surely prevented, and a stable and excellent seal can be obtained. Play performance.

  Also, a bearing 441 and a roller holder 44 that are provided on both ends of the tension rollers 41a and 41b and rotatably support the tension rollers 41a and 41b, and a guide that covers a part of the outer peripheral surface of the tension rollers 41a and 41b. Since the members 42a and 42b are provided and the tension rollers 41a and 41b rotate smoothly in a stable state, the tape-shaped substrate T is not damaged by friction.

  Further, since the tape-shaped substrate T is not sandwiched between the rollers, even when the tape-shaped substrate T is a thin film, it is difficult for elongation deformation to occur.

Although the present invention has been described above, the present invention is not limited to the above-described embodiments, and it goes without saying that various modifications can be made without departing from the essence thereof.
For example, in the above-described embodiment, the example in which the liquid leakage prevention structure 4 is provided in the vicinity of the inlet 3a and the outlet 3b of the inner cell 3 has been described. For example, as shown in FIG. The tension roller device 4a including the pair of tension rollers supported by the bearing member may be further installed.

  With such a configuration, the bending of the tape-shaped substrate T can be suppressed by the tension rollers 41a and 41b, and the tape-shaped substrate T can run more smoothly.

  Examples according to one embodiment of the present invention will be described below.

  The treatment tank shown in FIG. 1 was used as a plating treatment tank, and a tape-shaped substrate T having a width of 200 mm was subjected to a plating treatment of 4000 m.

  The overall dimensions of the plating treatment tank 1 are 1.3 m length × 0.3 m width × 0.4 m depth, and the overall dimensions of the inner cell 3 are 1.0 m length × 0.2 m width × 0 depth. It was .3m. The size of the slits at the inlet 3a and the outlet 3b provided on the inner wall of the inner cell 3 was 250 mm × 10 mm.

  As the tension rollers 41a and 41b, a roller having a length of 270 mm × φ15 mm and a periphery of a titanium shaft member 411 covered with a polyolefin elastic material 412 having a length of 266 mm × φ28 mm was used. The shaft members 411 at both ends of the tension rollers 41a and 41b are supported by a roller holder 44 fitted with a bearing 441, and the roller holder 44 is fixed to the resistance plate 43 with bolts.

  With respect to the arrangement of the tension rollers 41a and 41b, the distance between the central axes in the traveling direction of the tape-shaped substrate T is 11.5 mm, and the distance between the central axes in the direction perpendicular to the traveling direction of the tape-shaped substrate T. Was set to 26 mm. The minimum gap length between both rollers was 0.43 mm.

  The guide members 42a and 42b have a length of 270 mm, a width in the traveling direction of the tape-shaped substrate T of 42 mm (42a) and 21.5 mm (42b), and a direction perpendicular to the traveling direction of the tape-shaped substrate T. A polyolefin one having a width of 16.5 mm and having an inner peripheral surface covering the tension rollers 41a and 41b was used. The guide members 42a and 42b are also fixed to the resistance plate 43 with bolts.

  The outer peripheral surfaces of the tension rollers 41a and 41b and the inner peripheral surfaces of the guide members 42a and 42b face each other with a distance of 1 mm, and the angle at which the surfaces face each other is 90 °.

  Note that a slit having a size of 250 mm × 10 mm was formed in the center of the resistor plate 43 in accordance with the slit of the inner cell 3.

  Further, the tension roller device 4a in which similar tension rollers 41a and 41b are supported by the roller holder 44 is fixed to the bottom surface and the upper wall surface of the inner cell with bolts, so that the tape is formed at the central portion of the inner cell 3. It arrange | positioned in the passage part of the shaped base material T. FIG.

  When the tape-like base material T was passed through the liquid leakage prevention structure 4 having such a configuration, the holding angles of the tension rollers 41a and 41b were each 14 °.

  When the same plating process is performed using a conventional plating apparatus, a long line-shaped scratch called a “long scratch” caused by the speed difference between the roller and the tape-shaped substrate is found on the tape-shaped substrate in some places. As can be seen, in this embodiment, the tension rollers 41a and 41b follow the tape-like substrate T well, and the occurrence of long scratches is greatly reduced. In addition, the occurrence of fine scratches on the tape-like substrate due to contact between the roller and the tape-like substrate was reduced.

  In addition, the removal of the processing solution between the processing tanks was not confirmed. This confirmation was performed by examining the PH value of wastewater in the water washing step after the plating treatment. As a result, it was within the standard that can be treated as water, and it was not confirmed that the treatment liquid was taken out between treatment tanks.

  Next, except that the elastic material 412 constituting the outer peripheral surfaces of the tension rollers 41a and 41b is an olefin-based thermoplastic elastomer, plating is performed in the same manner as in the above-described embodiment. Was.

It is sectional drawing along the plane direction of the plating processing tank provided with one Embodiment of the liquid leakage prevention structure in the plating apparatus which concerns on this invention. It is explanatory drawing which shows one Embodiment of the liquid leak prevention structure of this invention. It is sectional drawing which follows the AA line of FIG. It is explanatory drawing which shows the holding angle of the contact surface of a tension roller and a tape-shaped base material. It is sectional drawing which shows the detail of a tension roller. It is explanatory drawing which shows the modification of the plating processing tank provided with one Embodiment of the liquid leak prevention structure of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Plating processing tank 2 Container body 3 Inner cell 3a Inlet 3b Outlet 4 Liquid leakage prevention structure 4a Tension roller device 41a, 41b Tension roller 411 Shaft member 412 Elastic material 42a, 42b Guide member 43 Resistance plate 44 Roller holder 441 Bearing 5 Processing tank Slit θa, θb Holding angle T Tape-shaped substrate W Plating solution

Claims (8)

A liquid leakage prevention structure provided in the inner cell of the treatment tank for immersing the traveling tape-like substrate in the treatment liquid, and preventing the treatment liquid from leaking from the slit of the inner cell by the roller seal,
A pair of tension rollers respectively disposed on one side and the other side of the tape-shaped substrate so as to change the traveling direction of the tape-shaped substrate;
A bearing member provided on both ends of the tension roller and rotatably supporting the tension roller on the inner cell;
A guide member provided on the inner wall of the inner cell and having an inner peripheral surface covering a part of the outer peripheral surface of the tension roller;
With
A liquid leakage prevention structure for a plating apparatus that prevents leakage of the processing liquid by the tension roller, the guide member, and an inner wall of the inner cell.   The pair of tension rollers are arranged so that the rotation axes of the tension rollers are separated from each other by a predetermined distance in the running direction of the tape-shaped substrate, and are shorter than the total radius of both tension rollers. The liquid leakage prevention structure according to claim 1, wherein the liquid leakage prevention structure is arranged so as to be separated by a predetermined interval in a direction perpendicular to the traveling direction and so that the outer peripheral surfaces of both tension rollers do not contact each other.   The liquid leakage prevention structure according to claim 1, wherein an outer peripheral surface of the tension roller is formed of a thermoplastic elastomer.   The liquid leakage prevention structure according to claim 1, wherein a holding angle with which the outer peripheral surface of the tension roller is in contact with the tape-shaped substrate is 1 ° to 180 °.   The liquid leakage prevention structure according to claim 1, wherein a gap between an outer peripheral surface of the tension roller and an inner peripheral surface of the guide member is 0.1 mm to 1 mm.   The liquid leakage prevention structure according to claim 1, wherein a minimum gap length between outer peripheral surfaces of the pair of tension rollers is 0.01 mm to 2.27 mm.   The plating apparatus which has a processing tank with which the liquid-leakage prevention structure in any one of Claims 1-5 is provided in the inlet_port | entrance and exit of the tape-shaped base material in the said inner cell. In the inner cell,
A pair of tension rollers respectively disposed on one side and the other side of the tape-shaped substrate so as to change the traveling direction of the tape-shaped substrate;
A bearing member provided on both ends of the tension roller and rotatably supporting the tension roller on the inner cell;
The plating apparatus according to claim 7, further comprising a tension roller device comprising:

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