JP2008235642A - Gas ventilation method, gas ventilation apparatus and waste water treatment apparatus, and combustion apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas ventilation method and gas ventilation apparatus for stabilizing the generation of nitrogen gas and oxygen enrichment air in a nitrogen producing apparatus, stabilizing the supply of oxygen enrichment air to utilization equipment, and suppressing noise of an aspiration means. <P>SOLUTION: The gas ventilation apparatus includes: a nitrogen producing apparatus 1 for producing nitrogen gas by separation from raw material air; a blower 8 as an aspiration means for aspirating the oxygen enrichment air that is secondarily generated by the nitrogen producing apparatus 1; a compartment 5 for housing the blower 8; and an aerobic treatment vessel 19 as utilization equipment for utilizing the oxygen enrichment air. The oxygen enrichment air is caused to flow from an exhaust port 4a of the nitrogen producing apparatus 1 into the compartment 5 while the oxygen enrichment air is vented to the atmosphere, and the oxygen enrichment air in the compartment 5 is aspirated by the blower 8 housed in the compartment 5 and supplied to the aerobic treatment vessel 19. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a gas ventilation method and a gas ventilation device for supplying oxygen-enriched air obtained by a nitrogen production apparatus to utilization facilities.

  Conventionally, oxygen-enriched air, which is a by-product gas of a nitrogen production apparatus, is used in a combustion apparatus as a wastewater treatment apparatus that performs purification treatment by aeration of wastewater and fuel support air. Examples of the nitrogen production apparatus include a deep cooling type nitrogen production method and a PSA (pressure swing adsorption method) apparatus provided in semiconductor production equipment, liquid crystal production equipment and the like (hereinafter collectively referred to as semiconductor production equipment). Conventionally, the following are known as typical ones using oxygen-enriched air which is a by-product gas of a nitrogen production apparatus.

  An aeration tank having a raw water inflow section, an activated sludge inflow section, an oxygen supply section, a treated water outflow section, and an exhaust gas discharge section, and an oxygen generation capability for supplying oxygen to the oxygen supply section in an amount corresponding to a normal processing load The oxygen generating means, the aerator that stirs the liquid phase part in the aeration tank and makes the gas-liquid contact, and the pressure in the aeration tank is measured, and the oxygen supply part in the aeration tank is measured according to the measured tank internal pressure. Pressure adjusting means for adjusting the amount of oxygen supplied to the exhaust gas, adjusting the amount of exhaust gas discharged from the aeration tank to the exhaust gas discharge section, and oxygen concentration measuring means for measuring the oxygen concentration on the exhaust gas discharge section side of the aeration tank And a wastewater treatment apparatus by oxygen activated sludge treatment provided with an aerator adjusting means for adjusting the rotational speed of the aerator according to the oxygen concentration measured by the oxygen concentration measuring means (see, for example, Patent Document 1) ).

Also, a semiconductor manufacturing apparatus that uses high-purity nitrogen gas, a combustion-type abatement apparatus that burns and eliminates with a combustion flame that uses oxygen-enriched air with the exhaust gas discharged from the semiconductor manufacturing apparatus as a combustion gas, and a semiconductor A semiconductor manufacturing facility including a cryogenic separation type nitrogen manufacturing apparatus that manufactures high-purity nitrogen gas used in a manufacturing apparatus and oxygen-enriched air used in a combustion-type abatement apparatus. It is a semiconductor manufacturing facility equipped with means for adjusting the oxygen concentration of oxygen-enriched air supplied from the cold separation type nitrogen production device to the combustion type detoxification device to an appropriate concentration as a combustion support gas (for example, Patent Document 2).
JP 2001-137880 A JP 2003-68595 A

  Patent Documents 1 and 2 describe that a wastewater treatment apparatus or a wastewater treatment apparatus that adjusts the amount of oxygen-enriched air through a flow control valve provided in a pipe connected to a PSA or cryogenic separation type nitrogen production apparatus. Supply to combustion equipment. By adjusting the amount of oxygen-enriched air with the flow rate control valve, the flow path resistance changes and the pressure fluctuates with respect to the discharge of oxygen-enriched air from the nitrogen production apparatus. For this reason, there is a possibility that the generation of nitrogen gas and oxygen-enriched air in the nitrogen production apparatus may become unstable, which is not preferable in facilities using nitrogen gas. Further, when the flow control valve is clogged or the controller for controlling the flow control valve is broken, the discharge of oxygen-enriched air from the nitrogen production apparatus may be interrupted. Furthermore, due to fluctuations in the discharge pressure of oxygen-enriched air from the nitrogen production apparatus and variations in the flow rate control valve, the supply amount of oxygen-enriched air to the equipment used tends to fluctuate, and there is a problem in supply accuracy. In particular, when oxygen-enriched air is used in a combustion apparatus, the mixing ratio of fuel and air cannot be maintained within a predetermined range, and stable combustion may not be obtained.

  The present invention solves the above-described conventional problems, stabilizes the generation of nitrogen gas and oxygen-enriched air in a nitrogen production apparatus, stabilizes the supply of oxygen-enriched air to the equipment used, and suppresses noise in the suction means. It is an object to provide a gas ventilation method.

  The gas ventilation method of the present invention includes a nitrogen production apparatus that produces nitrogen gas by separating from raw material air, a suction means that sucks oxygen-enriched air that is secondarily generated in the nitrogen production apparatus, and the suction means A compartment for storing the oxygen, and a facility for using the oxygen-enriched air, and oxygen-enriched air is allowed to flow into the compartment from an outlet of a pipe connected to the nitrogen production apparatus, The oxygen-enriched air in the compartment is sucked by the suction means housed in the compartment and supplied to the utilization facility.

  According to the gas ventilation method and the gas ventilation device of the present invention, the generation of nitrogen gas and oxygen-enriched air in the nitrogen production apparatus is stabilized, the supply of oxygen-enriched air to the utilization facility is stabilized, and the noise of the suction means is suppressed. can do.

  According to a first aspect of the present invention, there is provided a nitrogen production apparatus for producing nitrogen gas separated from raw material air, a suction means for sucking oxygen-enriched air produced by the nitrogen production apparatus, and the suction means And a suction means for containing oxygen-enriched air from the discharge port of the nitrogen production apparatus into the compartment in an open state and storing the compartment in the compartment. Thus, a gas ventilation method is provided in which oxygen-enriched air in the compartment is sucked and supplied to the utilization facility. Accordingly, there is no pressure fluctuation in the discharge port due to a change in flow path resistance with respect to the discharge of oxygen-enriched air, and the generation of nitrogen gas and oxygen-enriched air in the nitrogen production apparatus can be stabilized. Further, by sucking the oxygen-enriched air in the compartment by the suction means, it is possible to stabilize the supply amount of the oxygen-enriched air to the use facility and to suppress the noise of the suction means.

  In addition, since there is no need to provide an on-off valve or a flow rate control valve in the path from the nitrogen production device to the discharge port, oxygen-enriched air from the nitrogen production device due to a failure of the on-off valve, the flow rate control valve, or the controller that controls them. There is no risk of blocking the discharge. Furthermore, there is no fluctuation in the supply amount of oxygen-enriched air to the equipment used due to fluctuations in the discharge pressure of oxygen-enriched air from the nitrogen production apparatus and variations in the flow rate control valve.

  According to a second invention, in the first invention, when the oxygen-enriched air is sucked by the suction means and when the suction means is stopped, the pressure in the compartment is set in the discharge port for discharging the nitrogen production apparatus oxygen-enriched air. The gas ventilation method is characterized in that it is kept lower than the pressure. As a result, there is no fluctuation in the pressure in the discharge port due to the change in flow path resistance with respect to the discharge of oxygen-enriched air in any situation, and stable generation of high-purity nitrogen gas and oxygen-enriched air in the nitrogen production apparatus is performed. Is something that can be done.

  A third invention is a gas ventilation method according to the first or second invention, wherein the suction amount of oxygen-enriched air in the compartment is adjusted and supplied to the use facility. As a result, the amount of oxygen-enriched air supplied to the utilization facility can be controlled more finely, and the performance of the utilization facility can be further improved and stabilized.

  A fourth invention is the gas ventilation method according to any one of the first to third inventions, wherein the nitrogen production apparatus is a deep-cooled nitrogen production method. Thus, by using a cryogenic separation system for the nitrogen production apparatus, a relatively large amount of oxygen-enriched air can be obtained, so that it can be stably supplied to the equipment used.

  5th invention isolate | separates from raw material air, the nitrogen production apparatus which manufactures nitrogen gas, the suction means which attracts | sucks the oxygen-enriched air produced | generated by the said nitrogen production apparatus as a secondary, and the said suction means are accommodated And a suction means for containing oxygen-enriched air from the discharge port of the nitrogen production apparatus into the compartment in an open state and storing the compartment in the compartment. Thus, a gas ventilator is provided, wherein oxygen-enriched air in the compartment is sucked and supplied to the utilization facility. Accordingly, there is no pressure fluctuation in the discharge port due to a change in flow path resistance with respect to the discharge of oxygen-enriched air, and the generation of nitrogen gas and oxygen-enriched air in the nitrogen production apparatus can be stabilized. Further, by sucking the oxygen-enriched air in the compartment by the suction means, it is possible to stabilize the supply amount of the oxygen-enriched air to the use facility and to suppress the noise of the suction means.

  According to a sixth invention, in the fifth invention, when the oxygen-enriched air is sucked by the suction means and when the suction means is stopped, the pressure in the compartment is set in the discharge port for discharging the nitrogen-producing apparatus oxygen-enriched air. The gas ventilation device is characterized in that it is kept lower than the pressure. As a result, there is no fluctuation in the pressure in the discharge port due to the change in flow path resistance with respect to the discharge of oxygen-enriched air in any situation, and stable generation of high-purity nitrogen gas and oxygen-enriched air in the nitrogen production apparatus is performed. Is something that can be done.

  A seventh aspect of the present invention is the gas ventilation apparatus according to the fifth or sixth aspect of the present invention, wherein the amount of oxygen-enriched air in the compartment is adjusted and supplied to the use facility. As a result, the amount of oxygen-enriched air supplied to the utilization facility can be controlled more finely, and the performance of the utilization facility can be further improved and stabilized.

  An eighth invention is the gas ventilation device according to any one of the fifth to seventh inventions, wherein the nitrogen production device is a deep-cooled nitrogen production method. Thus, by using a cryogenic separation system for the nitrogen production apparatus, a relatively large amount of oxygen-enriched air can be obtained, so that it can be stably supplied to the equipment used.

  A ninth invention is characterized in that oxygen-enriched air is supplied to the water to be treated in the aerobic treatment tank by the gas ventilation method or the gas ventilation device according to any one of the first to eighth inventions. This is a wastewater treatment device. As a result, the oxygen-enriched air that has flowed oxygen-enriched air into the compartment can be sucked by the suction means and stably supplied to the waste water treatment apparatus. It is possible to reduce the aeration load on the water to be treated and to quickly control the target dissolved oxygen concentration, thereby shortening the purification treatment time. Furthermore, the suction means can be reduced in size, power consumption can be reduced, and noise can be reduced by reducing the amount of aeration gas.

  A tenth aspect of the invention is a combustion apparatus that supplies oxygen-enriched air as combustion air by the gas ventilation method or the gas ventilation apparatus according to any one of the first to eighth aspects of the invention. . As a result, the oxygen-enriched air that has flowed into the compartment can be sucked by the suction means and stably supplied to the combustion apparatus. Furthermore, the supply amount of oxygen-enriched air can be accurately adjusted by controlling the suction means. Therefore, stable combustion can be achieved, and the adjustment range of the combustion amount can be made wider.

  An eleventh aspect of the invention is a semiconductor manufacturing facility comprising the gas ventilation device according to any one of the first to eighth aspects of the invention. Thereby, in a semiconductor manufacturing facility using high-purity nitrogen gas, oxygen-enriched air that is a by-product gas obtained by a nitrogen manufacturing apparatus provided in the semiconductor manufacturing facility is effectively used, and the entire semiconductor manufacturing facility Equipment cost, energy saving, and space saving. Furthermore, the nitrogen production device itself provided in the semiconductor production facility using high-purity nitrogen gas can be used as it is, and the flow resistance increases and the pressure fluctuates with respect to the discharge of oxygen-enriched air from the nitrogen production device. Thus, it is possible to stably produce high-purity nitrogen gas and oxygen-enriched air in the nitrogen production apparatus.

  Hereinafter, the gas ventilation apparatus of the Example of this invention is demonstrated, referring FIGS. 1-4. FIG. 1 is a basic configuration diagram of a gas ventilation configuration and a wastewater treatment apparatus according to the present invention, FIG. 2 is a system diagram showing a configuration of a nitrogen production apparatus, and FIG. 3 is a basic configuration diagram of another embodiment of the gas ventilation configuration and a wastewater treatment apparatus. FIG. 4 is a basic configuration diagram of a gas ventilation configuration and a combustion apparatus. In addition, the solid line arrow in a figure shows the flow of oxygen-enriched air.

  In FIG. 1 and FIG. 2, high-purity nitrogen gas obtained by cryogenic liquefaction separation of air by a cryogenic separation type nitrogen production apparatus 1 is supplied to a use point 3 of a semiconductor production facility via a pipe 2. To do. In addition, oxygen-enriched air, which is a by-product gas obtained simultaneously with high-purity nitrogen gas generation in the nitrogen production apparatus 1, is configured to be discharged from the discharge port 4 a at the tip of the pipe 4 through the pipe 4. .

  The suction port 6a of the pipe 6 provided in communication with the compartment 5 is positioned so as to surround the discharge port 4a at the tip of the pipe 4 for discharging the oxygen-enriched air obtained by the nitrogen production apparatus 1, and the opening 7a The discharge port 4a and the opening 7a communicate with each other in an open state, and oxygen-enriched air is allowed to flow into the compartment 5 from the discharge port 4a at the tip of the pipe 4.

  A blower 8 which is a suction means for sucking oxygen-enriched air from the suction port 8a is located in the compartment 5. The blower 8 is provided with a suction port 8b for sucking air in the atmosphere outside the compartment 5, and is connected to a pipe 9 and a flow rate control valve 9a. Oxygen-enriched air or air sucked by the blower 8 is discharged from the discharge port 8c.

  Next, this basic configuration will be described using the oxygen-enriched air utilization facility as a wastewater treatment device. Wastewater containing organic substances is supplied to the flow rate adjusting tank 10 via the pipe 12 and stored in a predetermined amount as the treated water 11. A diffuser pipe 15 having a plurality of diffuser holes 16 is provided in the water to be treated 11 of the flow rate adjusting tank 10, and the diffuser pipe 15 is connected to a blower 14 (suction means) via a pipe 13. The blower 14 is used to aerate the treated water 11 by ejecting air from the diffuser holes 16 of the diffuser pipe 15 into the treated water 11.

  The water to be treated 11 in the flow rate adjustment tank 10 is supplied to the aerobic treatment tank 19 by the pump 18 via the pipe 17 and stored in the aerobic treatment tank 19 as the water to be treated 20 in a predetermined amount. A diffuser tube 22 having a plurality of diffuser holes 23 and a dissolved oxygen concentration detector 24 are provided in the water to be treated 20 in the aerobic treatment tank 19, and the diffuser tube 22 is connected to the blower 8 (suction means) via the pipe 21. ) Is connected. The oxygen-enriched air in the compartment 5 sucked by the blower 8 is ejected from the diffuser hole 23 of the diffuser tube 22 into the treated water 20 to aerate the treated water 20.

  Further, the opening degree of the flow control valve 9a connected to the suction port 8b of the blower 8 is adjusted, and the mixing ratio of the suction amount of the oxygen-enriched air sucked from the suction port 8a and the air sucked from the pipe 9 is adjusted. The water to be treated 20 is aerated by being ejected into the water to be treated 20 from the air holes 23 of the air diffusion pipe 22.

  The treated water that has been biologically treated in the aerobic treatment tank 19 flows into the settling tank 26 by the drop pressure through the pipe 25 and is stored as a treated water 27 in a predetermined amount. In the sedimentation tank 26, sludge is precipitated and separated and discharged from the pipe 28. The sludge precipitated in the settling tank 26 is appropriately returned to the aerobic treatment tank 19 by the pump 30 through the pipe 29 or discharged from the on-off valve 31a through the pipe 31. The pipes 6 and 21 may be made of a material such as metal or resin, and a bendable duct can be used.

  Next, a basic configuration of a cryogenic separation type nitrogen production apparatus 1 that produces high-purity nitrogen gas and oxygen-enriched air by subjecting raw material air to cryogenic liquefaction separation will be described with reference to FIG. Dust is removed by a filter 41, and the sucked raw material air is compressed to a predetermined pressure by a compressor 42, heat of compression is removed by a cooler 43, and then introduced into an adsorber 45 through a pipe 44. Thus, impurities such as moisture and carbon dioxide in the air are removed. The purified raw material air led out from the adsorber 45 is introduced into a heat exchanger 47 through a pipe 46, where it is cooled by exchanging heat with a return gas of high-purity nitrogen gas, which is a cold fluid, and passes through a pipe 48. It is introduced into the lower part of the rectifying column 49. By liquefaction rectification in the rectifying column 49, the raw air is separated into nitrogen gas at the upper part of the tower and oxygen-enriched liquefied air at the lower part of the tower, and the nitrogen gas separated at the upper part of the rectifying tower 49 is usually 99.99. % High purity nitrogen gas with a purity of at least%.

  The nitrogen gas is extracted from the upper part of the rectifying column 49 into the pipe 50 and introduced into the heat exchanger 47. The nitrogen gas is heat-exchanged with the raw material air in the heat exchanger 47 to recover cold heat from the cold fluid (cold temperature) nitrogen gas, and is then led out from the heat exchanger 47 to the pipe 2. It is supplied to the use point 3 of each semiconductor manufacturing apparatus through the pipe 2.

  On the other hand, oxygen-enriched liquefied air having an oxygen concentration of about 30% is separated at the bottom of the rectifying column 49. This oxygen-enriched liquefied air is led out from the lower part of the rectifying column 49 to the pipe 51, and is decompressed to, for example, 0.2 to 0.5 MPa by the pressure reducing valve 52, and then introduced into the heat exchanger 47 through the pipe 53. Here, heat exchange is performed with the nitrogen gas, and it is vaporized by heating to become oxygen-enriched air. This oxygen-enriched air is led to the pipe 4.

  The pressure in the piping 4 and the discharge port 4a for discharging oxygen-enriched air connected to the nitrogen production apparatus 1 is, for example, a positive pressure of 0.2 to 0.5 MPa, and the discharge port 4a and the opening 7a are connected in an open state. Thus, the pressure in the compartment 5 is always kept lower than that in the pipe 4 and the discharge port 4a regardless of whether the blower 8 is driven. The amount of oxygen-enriched air generated in the nitrogen production apparatus 1 is set to a specification that can secure a necessary amount for aeration of the water to be treated 20 in the aerobic treatment tank 19. is there.

  In addition, the said suction part 7 is located in the vicinity of the discharge port 4a of the piping 4 which the nitrogen manufacturing apparatus 1 itself has. Further, the suction part 7 is configured without any changes to the pipe 4 and the discharge port 4a, and the suction port of the pipe 6 is surrounded by the discharge port 4a at the tip of the pipe 4 that discharges oxygen-enriched air. 6a is positioned, and the discharge port 4a and the suction port 6a form an opening 7a and communicate with each other in an open state. As a result, the nitrogen production apparatus 1 itself provided in the semiconductor production facility using high-purity nitrogen gas can be used as it is, and further, the flow resistance is reduced against the discharge of oxygen-enriched air from the nitrogen production apparatus 1. The increase and pressure fluctuation can be eliminated, and the production of high-purity nitrogen gas and oxygen-enriched air in the nitrogen production apparatus 1 can be performed stably.

  Next, the basic operation | movement is demonstrated about the purification process of the to-be-processed water 20 in the aerobic processing tank 19 in a present Example. The oxygen-enriched air obtained by the nitrogen production apparatus 1 is sent through the pipe 4 and discharged from the discharge port 4a at the tip to the opening 7a of the pipe 6. The oxygen-enriched air discharged to the opening 7a flows into the compartment 5 from the suction port 6a and fills up. The oxygen-enriched air in the compartment 5 is sucked by the drive of the blower 8 and supplied to the water to be treated 20 in the aerobic treatment tank 19 through the pipe 21, the diffuser pipe 22 and the diffuser holes 23. As a result, oxygen is supplied to the water to be treated 20 in the aerobic treatment tank 19 and the organic matter in the water to be treated 20 is decomposed by the purification action by the aerobic microorganisms. At this time, the flow control valve 9a is closed and only oxygen-enriched air is supplied to the water to be treated 20.

  The treated water that decomposes and purifies the organic matter in the aerobic treatment tank 19 enters the sedimentation tank 26 through the pipe 25, separates sludge (activated sludge), confirms the purification level of the treated water, and then passes through the pipe 28 to the outside. It is intended to discharge water. The sludge precipitated in the sedimentation tank 26 is returned to the aerobic treatment tank 19 by driving the pump 30 through the pipe 29 as necessary. The surplus sludge is discharged to the outside through the pipe 31 by opening the on-off valve 31a.

  The pump 18 is driven from the flow rate adjusting tank 10 via the pipe 17 to supply the water to be treated 11 to the aerobic treatment tank 19 in accordance with the purification amount of the water to be treated 20 containing organic matter in the aerobic treatment tank 19. At this time, the pump 18 is driven continuously or intermittently, and the treated water 11 is supplied from the flow rate adjustment tank 10 to the aerobic treatment tank 19.

  Next, a method for controlling the supply amount of oxygen-enriched air to the water to be treated 20 when the organic matter is decomposed and purified in the aerobic treatment tank 19 will be described. When the dissolved oxygen concentration of the water to be treated 20 detected by the dissolved oxygen concentration detector 24 is lower than a predetermined value, the drive rotation speed of the blower 8 is increased, oxygen-enriched air is sucked from the compartment 5, and Aeration is performed by supplying water into the water 20 to be treated through the pipe 21, the air diffusion pipe 22 and the air diffusion holes 23. At this time, the flow rate adjusting valve 9a is closed.

  In this state, the oxygen-enriched air discharged from the discharge port 4a flows into the compartment 5 from the suction port 6a, and the oxygen-enriched air that has flowed in is sucked into the suction port 8a by driving the blower 8. Since the amount of oxygen-enriched air discharged from the discharge port 4a is larger than the amount of oxygen-enriched air sucked into the suction port 8a, part of the oxygen-enriched air is released into the atmosphere from the opening 7a. Accordingly, the treated water 20 is aerated only with the oxygen-enriched air generated by the nitrogen production apparatus 1, and a part of the surplus oxygen-enriched air is released into the atmosphere from the opening 7a.

  Further, when the amount of oxygen-enriched air discharged from the discharge port 4 a is less than the amount of oxygen-enriched air sucked into the suction port 8 a of the blower 8 due to the operating state of the nitrogen production apparatus 1. Then, air in the atmosphere is sucked from the opening 7a and supplied to the treated water 20 as a mixed air of oxygen-enriched air discharged from the discharge port 4a and air in the atmosphere, and aeration is performed.

  In addition, when the dissolved oxygen concentration of the water to be treated 20 detected by the dissolved oxygen concentration detector 24 is close to or higher than a predetermined value, the drive rotational speed of the blower 8 is decreased. This reduces the amount of oxygen-enriched air in the compartment 5 that is sucked into the suction port 8a of the blower 8 and prevents excessive aeration of the water 20 to be treated. At this time, part of the oxygen-enriched air is released into the atmosphere from the opening 7a.

  Further, even in the operation in this situation, when excessive aeration to the water to be treated 20 is performed, the flow rate control valve 9a is opened, and air in the atmosphere is sucked into the suction port 8b of the blower 8 to be oxygen-enriched air. And is supplied to the water to be treated 20. If excessive aeration occurs, the drive of the blower 8 is stopped.

  As described above, the amount of oxygen-enriched air supplied to the water to be treated 20 is adjusted by controlling the rotational speed of the blower 8 to control the dissolved oxygen concentration of the water to be treated. Furthermore, the amount of oxygen-enriched air supplied to the water to be treated 20 is adjusted by adjusting the ratio of the amount of oxygen-enriched air sucked from the compartment 5 and the amount of air sucked into the atmosphere by the opening of the flow control valve 9a. Can be done by adjusting. In this case, among the mixed gas of oxygen-enriched air and air in the atmosphere, the amount of oxygen-enriched air is adjusted steplessly by adjusting the opening of the flow control valve 9a, so that the oxygen-enriched air and the air in the atmosphere The dissolved oxygen concentration of the water to be treated is controlled by adjusting the air mixing ratio and supplying it to the water to be treated 20.

  Further, the amount of the mixed gas of aeration oxygen-enriched air supplied to the water to be treated 20 and air in the atmosphere is adjusted by controlling the drive rotational speed of the blower 8. As described above, the supply amount of oxygen-enriched air to the water to be treated 20 can be adjusted, and the total amount of aeration gas can be adjusted, so that the dissolved oxygen concentration of the water to be treated 20 can be controlled more finely. it can. Furthermore, by adjusting the total amount of gas for aeration, the agitation of the water to be treated 20 can be promoted to prevent the sludge from settling and agglomerating, and the purification of the water to be treated 20 in the aerobic treatment tank 19 can be promoted. .

  The whole control of the blowers 8 and 14, the pumps 18 and 30, the flow rate adjusting valve 9a, and the dissolved oxygen concentration detector 24 is performed by a controller (not shown). The blowers 8 and 14 are not limited to this, and a pump and a compressor may be used.

  As described above, the suction port 6a of the pipe 6 is positioned so as to surround the discharge port 4a at the tip of the pipe 4 that discharges the oxygen-enriched air obtained by the nitrogen production apparatus 1, and the discharge port 4a and the suction port 6a. Communicates with the atmosphere open. The discharge port 4a and the opening 7a are formed so that the opening 7a has a sufficient passage cross-sectional area so that the flow resistance is not increased when the oxygen-enriched air obtained in the nitrogen production apparatus 1 is discharged from the discharge port 4a. It is set. As a result, the pressure in the compartment 5 is maintained even in the situation where the blower 8 is driven, the drive rotational speed of the blower 8 is changed, and the air is sucked by the blower 8 from the pipe 9 by opening the flow rate control valve 9a. It is always kept lower than the inside of the pipe 4 and the discharge port 4a. Therefore, there is no pressure fluctuation in the pipe 4 and the discharge port 4a due to the change in flow path resistance with respect to the discharge of oxygen-enriched air, and the generation of high-purity nitrogen gas and oxygen-enriched air in the nitrogen production apparatus 1 is stable. Is something that can be done. Further, since it is not necessary to provide an on-off valve or a flow rate control valve in the path from the nitrogen production device 1 to the discharge port 4a of the pipe 4, the nitrogen production device 1 due to a failure of the on-off valve, the flow rate control valve, or a controller that controls these valves. There is no problem of blocking the discharge of oxygen-enriched air from the air.

  Furthermore, conventionally, the supply amount of oxygen-enriched air to the facility is likely to fluctuate due to fluctuations in the discharge pressure of oxygen-enriched air from the nitrogen production apparatus 1 and variations in the flow rate control valve. On the other hand, in this embodiment, the oxygen-enriched air that has flowed into the compartment 5 is sucked and discharged by the blower 8, so that the object to be treated in the aerobic treatment tank 19 of the wastewater treatment apparatus that is the utilization facility is used. The water 20 can be stably supplied.

  Further, by storing the blower 8 in the compartment 5, it is possible to prevent noise from leaking out of the compartment 5 due to rotation of motors and blades (not shown) constituting the blower 8, and to suppress noise. Further, when the cryogenic separation type nitrogen production apparatus 1 is used, the temperature of the oxygen-enriched air discharged from the discharge port 4a is, for example, 5 to 15 degrees C., which is lower than the normal temperature level. By inhaling the low-temperature oxygen-enriched air through the blower 8 housed in the compartment 5, the increase in the room temperature in the compartment 5 due to the heat generated by the motor of the blower 8 can be suppressed, and ventilation in the compartment 5 is unnecessary. Become.

  In addition, by supplying oxygen-enriched air to the wastewater treatment equipment that is the equipment used, it is possible to reduce the aeration load on the water to be treated 20 in the aerobic treatment tank 19 and to quickly control the target dissolved oxygen concentration. Thus, the purification processing time can be shortened. Further, the blower 8 can be reduced in size, power consumption can be reduced, and noise can be reduced by suppressing the amount of aeration gas.

  Further, by adjusting the supply amount of oxygen-enriched air to the water to be treated 20 in the aerobic treatment tank 19, the dissolved oxygen concentration of the water to be treated 20 can be controlled to an optimum value for the purification treatment. Thus, the processing time can be further shortened. In addition, by adjusting the mixing ratio of oxygen-enriched air and air in the atmosphere, the supply amount of oxygen-enriched air to the water to be treated 20 can be adjusted, and the total amount of aeration gas can be adjusted. The dissolved oxygen concentration of the water to be treated 20 can be controlled more finely. Further, by adjusting the total amount of gas for aeration, the agitation of the water to be treated 20 in the aerobic treatment tank 19 can be promoted to prevent the sludge from settling and agglomerating.

  In particular, in a semiconductor manufacturing facility that uses high-purity nitrogen gas, oxygen-enriched air that is a by-product gas obtained by the nitrogen manufacturing apparatus 1 provided in the semiconductor manufacturing facility is effectively used, and the semiconductor manufacturing facility By supplying the water to be treated 20 of the aerobic treatment tank 19 containing the organic matter discharged from the tank, a dedicated oxygen-enriched air supply source (for example, oxygen gas supply equipment) is not required, and the equipment cost as a total system is reduced. Reduction, energy saving, and space saving can be achieved. Further, in the semiconductor manufacturing facility, the nitrogen production apparatus 1 is continuously operated, and oxygen-enriched air is also obtained continuously. Further, by making the nitrogen production apparatus 1 a cryogenic separation type, the oxygen-enriched air is obtained. By being obtained in a relatively large amount, the water to be treated 20 in the aerobic treatment tank 19 can be stably supplied.

  The blower 14 is accommodated in the compartment 5 and the oxygen-enriched air obtained by the nitrogen production apparatus 1 is also supplied to the water to be treated 11 in the flow rate adjusting tank 10, so that the inside of the aerobic processing tank 19 is maintained. Reduction of the aeration load on the water to be treated 20 and quick control to the target dissolved oxygen concentration are possible, and the purification treatment time can be further shortened. Furthermore, the blower 8 and 14 can be reduced in size, power consumption can be reduced, and noise can be reduced by suppressing the amount of aeration gas blown into the water to be treated 11 and 20 in the flow rate adjustment tank 10 and the aerobic treatment tank 19. be able to.

  Next, another embodiment of the gas ventilation configuration is shown in FIG. The difference from the configuration shown in FIG. 1 and FIG. 2 is that the compartment 5 is provided with openings 5a and 5b to communicate with the atmosphere. The same parts as those in FIG. 1 and FIG. . The compartment 5 is opened to the atmosphere through the openings 5 a and 5 b, and oxygen-enriched air is caused to flow into the compartment 5 from the discharge port 4 a at the tip of the pipe 4 through the suction part 7 and the pipe 6. Oxygen-enriched air is sucked by the blower 8 housed in the compartment 5 and supplied to the treated water 20 in the aerobic treatment tank 19. Even in this embodiment, the same effect as the configuration shown in FIG. 1 and FIG. 2 can be obtained, but particularly in the situation where the blower 8 is stopped by providing the compartments 5 with the openings 5a and 5b in the vertical direction. The oxygen-enriched air from the nitrogen production apparatus 1 is discharged into the atmosphere through the openings 5a and 5b, so that the discharge of the oxygen-enriched air from the nitrogen production apparatus 1 is not hindered, and the high purity in the nitrogen production apparatus 1 Generation of nitrogen gas and oxygen-enriched air can be performed stably.

  Next, an embodiment of the gas ventilation configuration and the combustion apparatus is shown in FIG. 1 and FIG. 2 is different from the configuration shown in FIG. 1 in that oxygen-enriched air obtained by the nitrogen production apparatus 1 is supplied from the compartment 5 to the combustion apparatus 57 via the pipe 58, and liquid fuel or gas fuel is supplied to the fuel. The gas is supplied from the supply unit 59 to the combustion device 57 via the pipe 60 and mixed and burned. The same parts as those in FIG. 1 and FIG.

  As described above, conventionally, the supply amount of oxygen-enriched air to the combustion apparatus, which is the equipment used, tends to fluctuate due to fluctuations in the discharge pressure of the oxygen-enriched air from the nitrogen production apparatus 1 and variations in the flow rate control valve. As a result, the mixing ratio of fuel and air cannot be maintained within a predetermined range, and stable combustion may not be obtained. On the other hand, in this embodiment, the oxygen-enriched air that has flowed into and filled into the compartment 5 is sucked by the blower 8 serving as the suction means and supplied to the combustion device 57, so the supply amount of oxygen-enriched air In addition, the supply amount of the oxygen-enriched air can be accurately adjusted by controlling the rotational speed of the blower 8. Therefore, stable combustion can be achieved and the amount of combustion can be adjusted more widely.

  In particular, in a semiconductor manufacturing facility that uses high-purity nitrogen gas, oxygen-enriched air that is a by-product gas obtained by the nitrogen manufacturing apparatus 1 provided in the semiconductor manufacturing facility is effectively used, and the semiconductor manufacturing facility By supplying to the combustion device 57 that burns the gas discharged from the chamber and detoxifies it, there is no need for a dedicated oxygen-enriched air supply source, reducing the total equipment cost, saving energy, and saving space. Can be planned. Further, in the semiconductor manufacturing facility, the nitrogen production apparatus 1 is continuously operated, and oxygen-enriched air is also obtained continuously. Further, by making the nitrogen production apparatus 1 a cryogenic separation type, the oxygen-enriched air is obtained. By being obtained in a relatively large amount, it can be stably supplied to the combustion device 57.

  Moreover, by providing the gas ventilation device of the present invention in a semiconductor manufacturing facility, oxygen-enriched air, which is a by-product gas obtained by a nitrogen manufacturing device provided in the semiconductor manufacturing facility, is effectively used, and the semiconductor manufacturing The equipment cost of the entire equipment can be reduced, energy saving and space saving can be achieved. Furthermore, the nitrogen production device itself provided in the semiconductor production facility using high-purity nitrogen gas can be used as it is, and the flow resistance increases and the pressure fluctuates with respect to the discharge of oxygen-enriched air from the nitrogen production device. Thus, it is possible to stably produce high-purity nitrogen gas and oxygen-enriched air in the nitrogen production apparatus.

  It can also be applied to a wide range of apparatus applications that require oxygen-enriched air.

Basic configuration diagram of an embodiment of the gas ventilation configuration and waste water treatment apparatus of the present invention System diagram showing the configuration of the nitrogen production system Basic configuration diagram in another embodiment of gas ventilation configuration and waste water treatment equipment Basic configuration diagram of an embodiment of a gas ventilation configuration and a combustion apparatus

Explanation of symbols

1 Nitrogen production equipment 2, 4, 6, 9, 12, 13, 17, 21, 25, 28, 29, 31, 46, 48, 50, 53, 55, 58, 60 Piping 3 Use point 4a, 8c Discharge port 5 compartment 5a, 5b, 7a opening 6a suction port 7 suction part 8, 14 blower 8a, 8b suction port 9a flow control valve 10 flow control tank 11, 20 treated water 15, 22 air diffuser 16, 16, air diffuser 18, DESCRIPTION OF SYMBOLS 30 Pump 19 Aerobic processing tank 24 Dissolved oxygen concentration detector 26 Precipitation tank 27 Treated water 31a On-off valve 41 Filter 42 Compressor 43 Cooler 45 Adsorber 47 Heat exchanger 49 Rectifying tower 52 Pressure reducing valve 57 Combustion device 59 Fuel supply part

Claims (11)

A nitrogen production apparatus for producing nitrogen gas by separating from the raw air, a suction means for sucking oxygen-enriched air produced by the nitrogen production apparatus, a compartment for storing the suction means, A use facility that utilizes oxygen-enriched air; oxygen-enriched air is allowed to flow into the compartment from the discharge port of the nitrogen production apparatus in an open state; and oxygen enrichment in the compartment is achieved by suction means stored in the compartment. A gas ventilation method characterized by sucking the chemical air and supplying it to the utilization facility. The pressure in the compartment is kept lower than the pressure in the discharge port for discharging the oxygen-enriched air of the nitrogen production apparatus when the oxygen-enriched air is sucked by the suction means and when the suction means is stopped. The gas ventilation method according to claim 1. The gas ventilation method according to claim 1 or 2, wherein the suction amount of the oxygen-enriched air in the compartment is adjusted and supplied to the use facility. The gas ventilation method according to any one of claims 1 to 3, wherein the nitrogen production apparatus is a deep-cooled nitrogen production method. A nitrogen production apparatus for producing nitrogen gas by separating from the raw air, a suction means for sucking oxygen-enriched air produced by the nitrogen production apparatus, a compartment for storing the suction means, A use facility that utilizes oxygen-enriched air; oxygen-enriched air is allowed to flow into the compartment from the discharge port of the nitrogen production apparatus in an open state; and oxygen enrichment in the compartment is achieved by suction means stored in the compartment. A gas ventilator characterized by sucking the gasified air and supplying it to the utilization facility. The pressure in the compartment is kept lower than the pressure in the discharge port for discharging the oxygen-enriched air of the nitrogen production apparatus when the oxygen-enriched air is sucked by the suction means and when the suction means is stopped. The gas ventilation device according to claim 5. The gas ventilation device according to claim 5 or 6, wherein the amount of oxygen-enriched air in the compartment is adjusted and supplied to the utilization facility. The gas ventilation device according to any one of claims 5 to 7, wherein the nitrogen production device is a deep-cooled nitrogen production method. A wastewater treatment apparatus characterized in that oxygen-enriched air is supplied to the treated water in an aerobic treatment tank by the gas ventilation method or gas ventilation apparatus according to any one of claims 1 to 8. The combustion apparatus characterized by supplying oxygen-enriched air as combustion air by the gas ventilation method or gas ventilation apparatus in any one of Claims 1-8. A semiconductor manufacturing facility comprising the gas ventilation device according to claim 5.

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