JP2008233621A - Xy step exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an XY step exposure device which is free of maldistribution of fine common defects in colored pixels etc., even when intervals of proximity exposure are set while an exposure stage is moved in steps. <P>SOLUTION: A Z assist mechanism 10 which prevents a Z stage 71 from tilting forward on a pedestal 72 in a travel direction of the exposure stage at the end of step movement owing to inertia of the exposure stage 60 due to acceleration during speed reduction is provided between the Z stage and an XYθ fine movement stage, and the Z assist mechanism is placed in operation during the step movement to fix the Z stage and XYθ fine movement stage 80. A gradient of speed variation during speed reduction of the exposure stage is set to ≤400 mm/sec<SP>2</SP>. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an XY step exposure apparatus in which an exposure stage moves in an XY step, and in particular, even when the proximity exposure interval is set in parallel while the exposure stage is moved in steps, the pixel surface has a minute amount. The present invention relates to an XY step exposure apparatus in which common defects do not occur unevenly.

FIG. 14 is a plan view schematically showing an example of a color filter used in a liquid crystal display device. FIG. 15 is a sectional view taken along line XX ′ of the color filter shown in FIG.
As shown in FIGS. 14 and 15, the color filter used in the liquid crystal display device is a glass substrate (50) in which patterns such as a black matrix (51) and colored pixels (52) are sequentially formed. is there.
14 and 15 schematically show a color filter, and 12 colored pixels (52) are represented. In an actual color filter, for example, several hundreds are displayed on a 17-inch diagonal screen. A large number of colored pixels of about μm are arranged.

The black matrix (51) is a matrix having light shielding properties, and the colored pixels (52) have, for example, red, green, and blue filter functions.
The black matrix determines the position of the colored pixels of the color filter, makes the size uniform, and shields unwanted light when used in a display device, making the image of the display device uniform and uniform. In addition, it has a function of making an image with improved contrast.

This black matrix (51) is an example in which a resin is used as a black matrix material on a glass substrate (50).
The black matrix (51) pattern is formed on the glass substrate (50) by, for example, a photolithography method using a negative black photoresist for forming a black matrix, and is formed using a resin. This black matrix is referred to as a resin black matrix (51).

  Further, the pattern of the colored pixels (52) is a photo using a negative colored photoresist in which a pigment such as a pigment is dispersed on the glass substrate (50) on which the resin black matrix (51) is formed. It is formed as a colored pixel by lithography, that is, by exposure through a photomask to a coating film of a colored photoresist, and development processing. Red, green, and blue colored pixels are sequentially formed.

When a large number of color filters are manufactured, a color filter having a size corresponding to a single liquid crystal display device is often manufactured in a state of being multifaceted on a large glass substrate. For example, a 17-inch diagonal color filter is manufactured by attaching four faces to a large glass substrate of about 650 mm × 850 mm.
The exposure at this time is performed using a photomask in which, for example, a mask pattern for forming a color filter having a diagonal size of 17 inches is provided on a mask substrate having a size approximately equal to the size of the glass substrate. The method is widely adopted. This is a so-called batch exposure method in which the entire four screens of the four-sided mask pattern are collectively performed by one exposure.

In this batch exposure method, in the exposure apparatus, in order to prevent scratches caused by the photomask coming into close contact with the glass substrate, it is also possible to prevent pixels from becoming defective when dust adheres to the photomask. Therefore, the glass substrate on which the photoresist is applied and the photomask having a glass substrate size are subjected to proximity (proximity) exposure with a gap of about 80 μm, for example.

In this case, for example, multiple color filters of the same specification, that is, the same type of color filter, such as the thickness and the finished size of the colored pixels as the pattern, are applied. And in the manufacture, it considers in each process and manufactures so that the variation between surfaces may not occur.
That is, a manufacturing method by this collective exposure method in which a large size glass substrate is subjected to one-time exposure using a photomask on which a mask pattern is multifaceted and then subjected to batch development processing is a photolithographic method. Therefore, it can be said that the production method for producing a color filter is an excellent production method capable of producing a large amount of color filters at low cost.

  However, in order to solve the problem of the high cost due to the increase in mask size and the problem of bending due to the mask's own weight, the exposure method is changed from the batch exposure method from the fourth generation whose glass substrate size is, for example, about 730 mm × 920 mm. The uniaxial step exposure method has begun to be adopted, and the glass substrate size is changed to the XY (biaxial) step exposure method (so-called step-and-repeat method) from the fifth generation of, for example, about 1000 mm × 1200 mm. It has migrated.

FIG. 1 is a plan view for explaining an example of step exposure when a color filter is manufactured by an XY step exposure method.
The example shown in FIG. 1 is an example in which six exposures from the first exposure to the sixth exposure were performed on a large glass substrate (50). The exposure after the second exposure is performed every five step movements counted from the first exposure. Reference numerals (1Ex to 6Ex) represent first to sixth exposure regions, respectively.

2A is a cross-sectional view taken along line YY from the direction indicated by the white arrow in FIG.
2A to 2D are diagrams for explaining the relationship between the operation of the photomask and the exposure stage (60) (glass substrate (50)) in an example of step exposure.
As shown in FIG.1 and FIG.2, the photomask (PM) is arrange | positioned above the glass substrate (50) mounted on the exposure stage (60). The photomask (PM) is fixed in the exposure apparatus and does not move in the X, Y, and Z axis directions. The exposure stage (60) below the photomask (PM) performs XY (biaxial) step movement with the glass substrate (50) placed thereon.
Further, it can freely move up and down in the Z-axis direction.

Step movement refers to movement of one exposure area (one pitch) in the Y-axis direction of the exposure stage (60), as indicated by reference numeral (Py) in FIGS.
Further, in the X-axis direction, as indicated by a symbol (Px), it indicates the movement of the exposure stage (60) by one area (one pitch) of exposure in the X-axis direction.

FIG. 2A shows a state immediately after the first exposure through the photomask (PM) is performed on the photoresist coating (54) applied on the glass substrate (50). is there. A proximity exposure interval (G1) is set between the film surface (Y-axis surface) of the photomask (PM) and the coating film (54). The hatched portion in the coating film (54) represents the first exposure (1Ex) region.
FIG. 2B shows a state in which the exposure stage (60) is lowered by a sufficient distance (G2) in the downward direction of the Z axis in FIG.

FIG. 2C shows the way in which the exposure stage (60) is moving stepwise in the Y-axis direction.
As shown in FIGS. 2 (c) and 2 (d), the exposure stage (60) moves upward from the position in FIG. 2 (b) upward in the Z axis while stepping to the left in the Y axis in FIG. I do. That is, the exposure stage (60) moves upward to the left as shown by the white arrow in FIG. Do. The second exposure is performed at the stage where the step movement and the interval are set. Reference numeral (2Ex) represents a second exposure area.

  FIGS. 2A to 2D illustrate the step movement from the first exposure to the second exposure in FIG. 1, but the step in the X-axis direction from the second exposure to the third exposure in FIG. Similarly, after the exposure stage (60) has moved down by a sufficient distance, the step movement of 1 pitch (Px) in the X-axis direction and the setting of the interval (G1) for proximity exposure are performed in parallel. .

However, when XY step exposure is performed by the above-described operation, the shape of minute foreign matters attached to the film surface of the photomask is not formed on the black matrix, the colored pixels, etc. formed on the glass substrate (50) after the development processing. May be transferred and a large number of small common defects may occur.
In addition, there is a tendency that the location where the minute common defect occurs is unevenly distributed in the hatched portions (D2 to D6) in FIG.
JP-A-5-326361

  The present invention has been made to solve the above-described problem. In an XY step exposure apparatus in which an exposure stage moves in an XY step, the interval of proximity exposure is set in parallel while the exposure stage is moved in steps. However, an XY step exposure apparatus in which the shape of minute foreign matter attached to the film surface of the photomask is transferred to a black matrix or colored pixel after development processing, and minute common defects do not occur unevenly. It is a problem to provide.

The present invention provides an XY step exposure apparatus in which an exposure stage moves in an XY step.
A) 1) The exposure stage is sequentially provided by stacking an XY step mechanism, an XYθ fine movement stage, and a Z fine movement stage.
2) The Z fine movement stage is composed of a pedestal and the Z stage provided on the pedestal, and the pedestal composed of the left pedestal and the right pedestal is equivalent to the left pedestal and the right pedestal synchronized with each other in the opposite horizontal direction. When it is a mechanism that finely moves the Z stage on the pedestal in the Z-axis direction by fine movement,
B) 1) At the final stage of the X or Y step movement of the exposure stage, the Z stage, which is fixed integrally with the exposure stage by the inertia of the exposure stage due to the acceleration at the time of deceleration, is exposed on the pedestal. A Z assist mechanism for preventing the forward tilt in the traveling direction is provided between the Z stage and the XYθ fine movement stage,
2) An XY step exposure apparatus in which the Z assist mechanism is operated during the X or Y step movement of the exposure stage, and the Z stage and the XYθ fine movement stage are fixed via the Z assist mechanism.

In the XY step exposure apparatus according to the present invention, 1) the Z assist mechanism is a) the upper side surface of the Z stage at a position on the upper surface of the XYθ fine movement stage and outside the upper side surface of the Z stage. A support column that is vertically higher than the top surface of the XYθ fine movement stage, and b) is horizontally provided on the upper side surface of the Z stage with its tip portion directed from the upper side surface of the Z stage to the upper side surface of the support column. The lock cylinder (air cylinder)
2) During the step movement of the exposure stage, the lock cylinder (air cylinder) is operated so that the tip of the lock cylinder (air cylinder) is pressed horizontally against the upper side surface of the support column, and the support column and the lock cylinder (air cylinder) The XY step exposure apparatus is characterized in that the Z stage and the XYθ fine movement stage are fixed via a cylinder).

  Further, the present invention is the XY step exposure apparatus according to the XY step exposure apparatus, wherein the Z assist mechanism is provided on the upper side surface of the fourth stage of the Z stage.

The present invention is the XY step exposure apparatus according to the XY step exposure apparatus, wherein an inclination of a speed change when the exposure stage is decelerated is 400 mm / sec ² or less.

In the present invention, A) 1) The exposure stage is integrated with the Z stage on the Z stage constituting the Z fine movement stage in which an XY step mechanism, an XYθ fine movement stage, and a Z fine movement stage are sequentially stacked. 2) The Z fine movement stage is composed of a pedestal and the Z stage provided on the pedestal, and the pedestal composed of a left pedestal and a right pedestal includes a left pedestal and a right pedestal. When the Z stage on the pedestal is finely moved in the Z-axis direction by the fine movements in the opposite horizontal directions synchronized with each other.
B) 1) At the final stage of the X or Y step movement of the exposure stage, the Z stage, which is fixed integrally with the exposure stage by the inertia of the exposure stage due to the acceleration at the time of deceleration, is exposed on the pedestal. A Z assist mechanism for preventing the forward tilt in the advancing direction is provided between the Z stage and the XYθ fine movement stage. 2) During the step movement of the exposure stage, the Z assist mechanism is operated to move the Z assist mechanism. Since the XY step exposure apparatus fixes the Z stage and the XYθ fine movement stage via the exposure stage, even if the proximity exposure interval is set in parallel while moving the exposure stage stepwise, the exposure stage moves in the traveling direction. Therefore, it does not tilt forward, and therefore, minute differences attached to the film surface of the photomask on the black matrix, colored pixels, etc. after development processing. The shape of the object is transferred, and an XY step exposure apparatus in which minute common defects are not unevenly generated.

  In the XY step exposure apparatus according to the present invention, the Z assist mechanism includes a support column provided vertically from the top surface of the XYθ fine movement stage and a lock cylinder (air cylinder) provided horizontally on the upper side surface of the Z stage. During the step movement of the exposure stage, the lock cylinder (air cylinder) is operated, the tip of the lock cylinder (air cylinder) is crimped to the support, and the Z stage and the XYθ fine movement stage are fixed. An XY step exposure apparatus having a mechanism is obtained.

In the XY step exposure apparatus according to the present invention, since the gradient of the speed change when the exposure stage is decelerated is 400 mm / sec ² or less, the proximity exposure interval is set in parallel while stepping the exposure stage. Even if it performs, it will become an XY step exposure apparatus by which the extent to which the exposure stage leans forward in the direction of travel is reduced.

Hereinafter, embodiments of the present invention will be described in detail.
The inventor of the present invention pays attention to the interval between the photomask and the glass substrate during the step movement because the occurrence of common defects in the black matrix and the colored pixels is unevenly distributed in the hatched portion in FIG. As a result of examining the relationship between the movement of the exposure stage and the change in the interval, the photomask film surface and the glass substrate upper surface are always in a parallel state during the step movement. Although a uniform interval was maintained, it was possible to observe a state in which this interval was not uniform.

During the descent of the exposure stage after exposure and during the initial to middle stages of the step movement, no non-uniform state was observed, but at the end of the step movement (just before the exposure stage stopped), the photomask and the glass substrate It was observed that the intervals of
That is, it was observed that the distance between the photomask and the end portion in the direction opposite to the glass substrate traveling direction in the exposure area exposed after the step movement becomes narrower than the preset proximity exposure distance.

  3 to 5 show an example of the step exposure by the six exposures shown in FIG. 1, paying attention to the distance between the photomask and the glass substrate, the movement of the exposure stage (glass substrate), the photomask and the glass substrate It is a top view explaining the content which observed the relationship of the change of a space | interval.

FIG. 3A is a plan view showing the positional relationship between the photomask and the glass substrate during the first exposure. As shown in FIG. 3A, the photomask (PM) disposed above the glass substrate (50) is fixed in the exposure apparatus so as not to move in the X, Y, and Z axis directions. It has become. The glass substrate (50) performs XY step movement in a state of being placed on an exposure stage (not shown), and can be moved up and down in the Z-axis direction.
Gap sensors (not shown) for controlling the interval of proximity exposure are provided at four corners (ad) of the photomask (PM), and step movement is performed using these four gap sensors. The behavior of the change in the distance between the photomask (PM) and the glass substrate (50) during the observation is observed.
FIG. 3B is a plan view showing the glass substrate (50) after the first exposure, and reference numeral (1Ex) represents a region of the first exposure.

An example of the movement of the exposure stage during the first exposure is as follows. First, from the position where the glass substrate is placed in the exposure apparatus, the center (O ₁ ) of the first exposure region on the glass substrate (50) to be exposed. ) Is moved to the center (O) of the photomask. This movement is performed horizontally while maintaining a sufficient distance (G2) below the Z axis shown in FIG. Next, the exposure stage is raised vertically upward in the Z-axis to set the proximity exposure interval (G1).
That is, there is no movement corresponding to the step movement (an operation in which the movement is performed obliquely upward and the step movement and the proximity exposure interval are set in parallel). In the observation with the four gap sensors, there is no change in the distance between the photomask (PM) and the glass substrate (50) in the movement of the exposure stage during the first exposure, and a uniform measurement value is obtained. Yes.

FIG. 4A is a plan view showing the positional relationship between the photomask and the glass substrate during the second exposure. As shown in FIG. 4A, the glass substrate (50) placed on the exposure stage moves stepwise by 1 pitch (Py) upward in the Y axis in FIG. ) The center (O ₂ ) of the second exposure area is moved to the center (O) of the photomask.
FIG. 4B is a plan view showing the glass substrate (50) after the second exposure, and reference numeral (2Ex) represents a region of the second exposure.

During the step movement of the exposure stage during the second exposure, the change in the distance between the photomask (PM) and the glass substrate (50) was observed with the four gap sensors. As a result, the signs (a) and (b) The distance between the two corners of the photomask (PM) shown and the two corners in the region of the second exposure indicated by reference numerals (a ′) and (b ′) on the corresponding glass substrate (50) (( A measured value in which a)-(a ′) and (b)-(b ′)) are smaller than a preset proximity exposure interval (G1) is obtained.
That is, in FIG. 4B, the double hatched portion indicated by reference numeral (N2) is a portion that is narrowly observed.

Further, between the two corners of the photomask (PM) indicated by reference numerals (c) and (d) and the two corners in the second exposure region indicated by the corresponding reference numerals (c ′) and (d ′), respectively. In ((c)-(c ′), (d)-(d ′)), no narrowed measurement value is obtained.
That is, during the step movement to the second exposure, during the lowering of the exposure stage after the first exposure, and during the initial to middle period of the step movement to the second exposure, the photomask (PM) and the glass substrate (50) The interval does not narrow, and the interval narrows at the end of step movement (just before the exposure stage stops).
The narrowed portion is the end portion in the direction opposite to the glass substrate traveling direction in the exposure region exposed after the step movement, and is the portion indicated by reference numeral (N2) in FIG.

FIG. 5A is a plan view showing the positional relationship between the photomask and the glass substrate during the third exposure. As shown in FIG. 5 (a), the glass substrate (50) placed on the exposure stage moves stepwise by one pitch (Px) to the right of the X axis in FIG. 50) The center (O ₃ ) of the third exposure area is moved to the center (O) of the photomask.
FIG. 5B is a plan view showing the glass substrate (50) after the third exposure, and reference numeral (3Ex) represents a region of the third exposure.

During the step movement of the exposure stage during the third exposure, the change in the distance between the photomask (PM) and the glass substrate (50) was observed with four gap sensors. As a result, the signs (a) and (d) The distance between the two corners of the photomask (PM) shown and the two corners in the region of the third exposure shown by reference numerals (a ′) and (d ′) on the corresponding glass substrate (50) (( Measurement values are obtained in which a)-(a ′) and (d)-(d ′)) are narrower than the preset proximity exposure interval (G1).
That is, in FIG. 5B, the double hatched portion indicated by reference numeral (N3) is a portion that is narrowly observed.

Further, between the two corners of the photomask (PM) indicated by reference numerals (b) and (c) and the two corners in the second exposure region indicated by the corresponding reference signs (b ′) and (c ′), respectively. In ((b)-(b ′), (c)-(c ′)), no narrowing measurement value is obtained.
That is, during the step movement to the third exposure, during the descent of the exposure stage after the second exposure, and in the initial to middle period of the step movement to the third exposure, the photomask (PM) and the glass substrate (50) The interval does not narrow, and the interval narrows at the end of step movement (just before the exposure stage stops).
The narrowed portion is the end portion in the direction opposite to the glass substrate traveling direction in the exposure region exposed after the step movement, and is the portion indicated by reference numeral (N3) in FIG.

  Moreover, as a result of observing also about 4th exposure-6th exposure, the measured value of the same tendency is obtained. That is, it has been observed that the interval between the end portions in the direction opposite to the glass substrate traveling direction in the exposure region exposed after the step movement becomes narrower than the preset proximity exposure interval.

  These observation results (FIGS. 4 and 5) that the interval between the photomask (PM) and the glass substrate (50) becomes narrow match the locations (D2 to D6) where the common defects shown in FIG. 1 occur. Therefore, the present inventor considered the cause, and at the end of the step movement, the tip of the exposure stage in the moving direction tilts forward and the end of the direction opposite to the moving direction rises due to the inertia due to the acceleration during deceleration. It was assumed that the coating film on the glass substrate at the end portion was in contact with the photomask.

  FIG. 6 is a schematic diagram for explaining the estimated cause. FIG. 6 shows the final state of the step movement of the exposure stage (60) to the second exposure shown in FIG. It was assumed that the end of the exposure stage (60) was lifted up by the inertia due to the acceleration at the end of the step movement, and that the part indicated by the symbol (S) was in contact with the photomask.

FIG. 7 is a cross-sectional view showing the structure of an example of an XY step exposure apparatus in which the exposure stage moves in XY steps. An example shown in FIG. 7 is an XY step exposure apparatus when the relationship between the movement of the exposure stage and the change in the interval is examined by paying attention to the interval between the photomask and the glass substrate during the step movement.
As shown in FIG. 7, the XY step exposure apparatus includes an XY step mechanism (90), an XYθ fine movement stage (80), a Z fine movement stage (70), and an exposure stage (60).

The XY step mechanism (90) is formed by integrating the stacked XYθ fine movement stage (80), Z fine movement stage (70), and exposure stage (60) in the Y-axis direction in FIG. As shown by (1), the movement (step movement) of one area (one pitch) of exposure in the Y-axis direction is performed, and the exposure in the X-axis direction is indicated by a symbol (Px) in the X-axis direction. This is a mechanism for moving (stepping) one area (one pitch).
The XYθ fine movement stage (80) is a mechanism for precisely aligning the photomask and the glass substrate on the exposure stage (60) in the X, Y, and θ directions after the step movement.

The Z fine movement stage (70) includes a pedestal (72) and a Z stage (71) provided on the pedestal, and the exposure stage (60) is integrally fixed on the Z stage with the Z stage (71). Is provided.
After precise alignment of the photomask and the glass substrate on the exposure stage (60) in the X-axis, Y-axis, and θ directions, the film surface of the photomask shown in FIGS. 2 (a) and 2 (b) This is a mechanism for setting a distance (G1) for proximity exposure between the coating film on the glass substrate and lowering a sufficient distance (G2) in the Z-axis direction when performing step movement.
Alternatively, as shown in FIGS. 2 (c) and 2 (d), the proximity exposure interval (G1) is set in parallel while moving the exposure stage (60) by one pitch (Py or Px). Mechanism.

  The exposure stage (60) places and fixes a glass substrate on its upper surface, and gives exposure through a photomask to the photoresist coating film formed on the glass substrate. The exposure stage (60) is provided integrally fixed with the Z stage (71) via the holding frame (61).

FIG. 8 is an enlarged cross-sectional view of the vicinity of the Z fine movement stage (70). FIG. 9 is a plan view showing the relationship between the Z fine movement stage (70) and the XYθ fine movement stage (80). FIG. 8 shows a cross section in the Y-axis direction of the Z fine movement stage (70).
As shown in FIGS. 8 and 9, the upper surface (75) and the lower surface (76) of the Z stage (71) have a flat rectangular shape. The upper side surface (73) of the Z stage (71) is a plane that is perpendicular to both the left and right sides. In FIG. 8 of the Z stage (71), the lower left side surface (74L) is a right inclined surface, and the lower right side surface (74R) is a left inclined surface.

The pedestal (72) of the Z fine movement stage (70) is composed of a pair of a left pedestal (72L) and a right pedestal (72R). The cross-sectional shape of the left pedestal (72L) is a right triangle. It is a right triangle having a horizontal bottom surface, a side surface positioned at right angles to the bottom surface, and a right inclined surface (77L) facing the right vertex. The cross-sectional shape of the right pedestal (72R) is a right triangle having a left inclined surface (77R) facing the right vertex.
The pair of the left pedestal (72L) and the right pedestal (72R) has a right inclined surface (77L) and a left inclined surface (77R) at positions symmetrical with respect to the central axis (Z ₀ ) of the Z fine movement stage (70). Are provided facing each other.

The Z stage (71) is provided on the pedestal (72), and the Z stage (72) on the pedestal (72) is moved by the fine movements of the left pedestal (72L) and the right pedestal (72R) that are synchronized with each other in the opposite horizontal directions. 71) is finely moved in the Z-axis direction.
For example, as shown by solid arrows in FIG. 8, the Z stage (71) (exposure stage (60)) is moved by fine movement in the direction of the central axis (Z ₀ ) of the left pedestal (72L) and the right pedestal (72R). Slightly rises in the Z-axis direction. Further, the Z stage (71) (exposure stage (60)) slightly falls due to the fine movement of the left pedestal (72L) and the right pedestal (72R) in the direction opposite to the central axis (Z ₀ ).
The Z stage (71) is not fixed to the pedestal (72).

Now, as described above, the cause of the forward tilt of the exposure stage at the end of the step movement, which is inferred from the observation result based on the structure and operation of the XY step exposure apparatus shown in this example, is as shown in FIG. The Z stage (71) provided integrally fixed to the exposure stage (60) by the inertia of the exposure stage (60) due to the acceleration at the time of deceleration of the XY step mechanism (90) is mounted on the pedestal (72). The present inventor found that the XY step mechanism is tilted forward in the direction of travel.
That is, due to the forward tilt of the Z stage (71), the tip of the exposure stage (60) provided in an integral manner with the Z stage (71) tilts forward, and the forward direction of the exposure stage (60) is opposite to the forward direction. The end will rise.

FIG. 11 is a sectional view showing an embodiment of the XY step exposure apparatus according to the present invention. FIG. 12 is a plan view showing the relationship between the Z stage (71) and the XYθ fine movement stage (80) of the XY step exposure apparatus shown in FIG.
As shown in FIGS. 11 and 12, the XY step exposure apparatus includes an XY step mechanism (90), an XYθ fine movement stage (80), a Z fine movement stage (70), an exposure stage (60), and the Z in the present invention. It consists of an assist mechanism (10).

The XY step mechanism (90) integrates the stacked XYθ fine movement stage (80), Z fine movement stage (70), exposure stage (60), and Z assist mechanism (10) in an X-axis direction or a Y-axis direction. It is a mechanism that moves the step.
The XYθ fine movement stage (80) is a mechanism for precisely aligning the photomask and the glass substrate on the exposure stage (60) in the X, Y, and θ directions after the step movement.

The Z fine movement stage (70) includes a pedestal (72) and a Z stage (71) provided on the pedestal, and the exposure stage (60) is fixed integrally with the Z stage (71) on the Z stage. Is provided.
The Z fine movement stage (70) is moved by the Z stage (71) (exposure stage (60)) on the pedestal (72) by fine movement in the opposite horizontal directions in which the left pedestal (72L) and the right pedestal (72R) are synchronized. Is finely moved in the Z-axis direction.
The Z stage (71) is not fixed to the pedestal (72).

  The exposure stage (60) mounts and fixes a glass substrate on its upper surface, and gives exposure through a photomask to a coating film of a photoresist formed on the glass substrate.

The Z assist mechanism (10) in one embodiment of the XY step exposure apparatus according to the present invention includes a support column (12) and a lock cylinder (air cylinder) (11). In one embodiment shown in FIGS. 11 and 12, the Z assist mechanism (10) is provided on the fourth side of the upper side surface (73) of the Z stage (71).

The support (12) of the Z assist mechanism (10) is positioned on the upper surface of the XYθ fine movement stage (80) on the outer side of the upper side surface (73) of the Z stage (71). The XYθ fine movement stage (80) has a height higher than the height from the upper surface of the fine movement stage (80) and is provided vertically from the upper surface of the XYθ fine movement stage (80).
Further, the lock cylinder (air cylinder) (11) is provided on the upper side surface (73) of the Z stage (71), from the upper side surface (73) of the Z stage to the upper side surface (12a) of the support column (12). 11a) is provided horizontally.

  FIGS. 13A and 13B are cross-sectional views illustrating the operation of the Z assist mechanism (10). FIG. 13A is a cross-sectional view when the Z assist mechanism (10) does not fix the Z stage (71) and the XYθ fine movement stage (80). As shown in FIG. 13A, no pressurized air is supplied to the lock cylinder (air cylinder) (11), and the lock cylinder (air cylinder) (11) is not operating. The distal end portion (11a) of the lock cylinder (air cylinder) is not in pressure contact with the upper side surface (12a) of the support column.

  FIG. 13B is a cross-sectional view when the Z assist mechanism (10) fixes the Z stage (71) and the XYθ fine movement stage (80). As shown in FIG. 13B, pressurized air is supplied to the lock cylinder (air cylinder) (11), and the lock cylinder (air cylinder) (11) is operating. The distal end portion (11a) of the lock cylinder (air cylinder) is in a state of being crimped to the upper side surface (12a) of the support column.

During the step movement of the exposure stage (60), the lock cylinder (air cylinder) (11) is operated, and the tip (11a) of the lock cylinder (air cylinder) is horizontally pressed against the upper side surface (12a) of the column, The Z stage (71) and the XYθ fine movement stage (80) are fixed via the column (12) and the lock cylinder (air cylinder) (11).
When the exposure stage (60) is not moving stepwise, the lock cylinder (air cylinder) (11) is not operated, and the Z stage (71) and the XYθ fine movement stage (80) are not fixed.

  In the XY step exposure apparatus according to the present invention, as described above, the Z assist mechanism (10) is provided between the Z stage (71) and the XYθ fine movement stage (80), and the exposure stage (60) is moving stepwise. Operates the Z assist mechanism (10) and fixes the Z stage (71) and the XYθ fine movement stage (80) via the Z assist mechanism (10), so that the X or Y step movement of the exposure stage (60) can be performed. In the last stage, due to the inertia of the exposure stage due to the acceleration at the time of deceleration, the Z stage (71) provided integrally fixed with the exposure stage (60) moves on the pedestal (72) in the traveling direction of the exposure stage (60) Can be prevented from tilting forward.

  In addition, when the exposure stage (60) is not moving stepwise, the Z assist mechanism (10) is not operated, so that the operation of various mechanisms of the XY step exposure apparatus is not hindered.

According to a fourth aspect of the present invention, there is provided an XY step exposure apparatus characterized in that the gradient of the speed change when the exposure stage (60) is decelerated is 400 mm / sec ² or less.
As described above, the present inventor has found that the cause of the forward tilt of the exposure stage (60) at the end of the step movement is the exposure stage (60 due to acceleration during deceleration of the XY step mechanism (90) as shown in FIG. ), The Z stage (71) provided integrally with the exposure stage (60) is tilted forward in the advancing direction of the XY step mechanism (90) on the base (72). It was.

At the same time, the inventor of the present invention pays attention to reducing the inclination of the speed change during deceleration of the exposure stage (60) in order to reduce the forward tilt of the exposure stage (60) due to this inertia. As a result of scrutinizing the slope of the speed change that reduces the forward tilt of the exposure stage (60), it has been found that it is effective to set the slope of the speed change during deceleration of the exposure stage (60) to 400 mm / sec ² or less. It was.

For example, when the set value of the maximum speed of the exposure stage (60) is 500 mm / sec, the deceleration stop time is about 1.3 sec. (500 mm / sec / 1.3 sec = 385 mm / sec ² ).

It is a top view explaining an example of step exposure at the time of manufacturing a color filter by XY step exposure system. (A)-(d) is explanatory drawing of the relationship between the operation | movement of the photomask and exposure stage in an example of step exposure. (A) is a top view which shows the positional relationship of a photomask and a glass substrate in the case of 1st exposure. (B) is a top view which shows the glass substrate after 1st exposure. (A) is a top view which shows the positional relationship of a photomask and a glass substrate in the case of 2nd exposure. (B) is a top view which shows the glass substrate after 2nd exposure. (A) is a top view which shows the positional relationship of a photomask and a glass substrate in the case of 3rd exposure. (B) is a top view which shows the glass substrate after 3rd exposure. It is a schematic diagram explaining the estimated cause. It is sectional drawing which shows the structure of an example of the XY step exposure apparatus with which an exposure stage carries out XY step movement. It is sectional drawing to which the vicinity of Z fine movement stage was expanded. It is a top view which shows the relationship between Z fine movement stage and XY (theta) fine movement stage. It is explanatory drawing in which Z stage inclines forward in the advancing direction on a base by the inertia of an exposure stage. It is sectional drawing which shows one Example of the XY step exposure apparatus by this invention. It is a top view which shows the relationship between Z stage and XY (theta) fine movement stage of the XY step exposure apparatus shown in FIG. (A) is sectional drawing when the Z assist mechanism does not fix the Z stage and the XYθ fine movement stage. FIG. 6B is a cross-sectional view when the Z assist mechanism fixes the Z stage and the XYθ fine movement stage. It is the top view which showed typically an example of the color filter used for a liquid crystal display device. It is sectional drawing in the X-X 'line | wire of the color filter shown in FIG.

Explanation of symbols

1Ex to 6Ex... First exposure to sixth exposure region 10... Z assist mechanism 11 in the present invention... Lock cylinder (air cylinder) of the Z assist mechanism
11a: distal end 12 of lock cylinder (air cylinder) ... post 12a of Z assist mechanism ... upper side surface 47L of support post ... lower left side surface 47Z of Z stage ... lower right side surface of Z stage DESCRIPTION OF SYMBOLS 50 ... Glass substrate 51 ... (Resin) Black matrix 52 ... Colored pixel 54 ... Photoresist coating film 60 on glass substrate ... Exposure stage 61 ... Connection part 70 ... Z fine movement stage 71 ... Z stage 72 ... pedestal 72L ... left pedestal 72R ... right pedestal 73 ... upper side surface 74L of Z stage ... lower left side surface 74R of Z stage ... Z Lower right side surface 75 of stage ... Upper surface 76 of Z stage ... Lower surface 77L of Z stage ... Right inclined surface 77R of left pedestal ... Left inclined surface 80 of right pedestal ... XYθ fine movement stage 90 XY step mechanism D2 to D6: G1 where common defects are unevenly distributed G1: Distance G2 between adjacent exposures: Sufficient descending distances N2, N3 downward in the Z-axis and photomask The portion O where the gap between the glass substrates is observed narrowly: the center O _{1 of the} photomask: the center O ₂ of the first exposure region on the glass substrate O ₂ the center O of the second exposure region on the glass substrate ₃ ... Center PM of the third exposure area on the glass substrate ... Photomask Py ... Movement for one area (one pitch) of exposure in the Y-axis direction Px ... In the X-axis direction Movement for one area (one pitch) of exposure S ... Location where photomask and glass substrate are in contact Z ₀ ... Z axis of fine movement stage θ ... Pre-tilt angle of exposure stage ad · Four corners a ′ to d ′ of the photomask: on the glass substrate corresponding to the four corners of the photomask position

Claims (4)

In an XY step exposure apparatus in which the exposure stage moves in an XY step,
A) 1) The exposure stage is sequentially provided by stacking an XY step mechanism, an XYθ fine movement stage, and a Z fine movement stage.
2) The Z fine movement stage is composed of a pedestal and the Z stage provided on the pedestal, and the pedestal composed of the left pedestal and the right pedestal is equivalent to the left pedestal and the right pedestal synchronized with each other in the opposite horizontal direction. When it is a mechanism that finely moves the Z stage on the pedestal in the Z-axis direction by fine movement,
B) 1) At the final stage of the X or Y step movement of the exposure stage, the Z stage, which is fixed integrally with the exposure stage by the inertia of the exposure stage due to the acceleration at the time of deceleration, is exposed on the pedestal. A Z assist mechanism for preventing the forward tilt in the traveling direction is provided between the Z stage and the XYθ fine movement stage,
2) An XY step exposure apparatus, wherein the Z assist mechanism is operated during the X or Y step movement of the exposure stage, and the Z stage and the XYθ fine movement stage are fixed via the Z assist mechanism. 1) The Z assist mechanism is provided vertically at a position outside the upper side surface of the Z stage on the upper surface of the XYθ fine movement stage, higher than the height of the upper side surface of the Z stage from the upper surface of the XYθ fine movement stage. And b) a lock cylinder (air cylinder) provided horizontally on the upper side surface of the Z stage, with its tip portion directed from the upper side surface of the Z stage to the upper side surface of the column.
2) During the step movement of the exposure stage, the lock cylinder (air cylinder) is operated so that the tip of the lock cylinder (air cylinder) is pressed horizontally against the upper side surface of the support column, and the support column and the lock cylinder (air cylinder) The XY step exposure apparatus according to claim 1, wherein the Z stage and the XYθ fine movement stage are fixed via a cylinder).   3. The XY step exposure apparatus according to claim 1, wherein the Z assist mechanism is provided on an upper side surface of a fourth even of the Z stage. 4. The XY step exposure apparatus according to claim 1, wherein an inclination of a speed change at the time of deceleration of the exposure stage is set to 400 mm / sec ² or less.

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